CA2368180A1 - Traitement de graines ou d'autre matiere vivante par depot par plasma froid - Google Patents

Traitement de graines ou d'autre matiere vivante par depot par plasma froid Download PDF

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Publication number
CA2368180A1
CA2368180A1 CA002368180A CA2368180A CA2368180A1 CA 2368180 A1 CA2368180 A1 CA 2368180A1 CA 002368180 A CA002368180 A CA 002368180A CA 2368180 A CA2368180 A CA 2368180A CA 2368180 A1 CA2368180 A1 CA 2368180A1
Authority
CA
Canada
Prior art keywords
plasma
seeds
gas
living matter
power
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA002368180A
Other languages
English (en)
Inventor
John Volin
Raymond A. Young
Sorin O. Manolache
Ferencz S. Denes
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wisconsin Alumni Research Foundation
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of CA2368180A1 publication Critical patent/CA2368180A1/fr
Abandoned legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
    • A—HUMAN NECESSITIES
    • A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01C—PLANTING; SOWING; FERTILISING
    • A01C1/00—Apparatus, or methods of use thereof, for testing or treating seed, roots, or the like, prior to sowing or planting
    • A01C1/06—Coating or dressing seed
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Soil Sciences (AREA)
  • Environmental Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Pretreatment Of Seeds And Plants (AREA)
  • Cultivation Of Plants (AREA)

Abstract

Selon l'invention, une matière vivante, telle que des graines, est traitée par exposition de la matière vivante à un plasma froid aux fins de former un dépôt par réaction plasmatique sur les surfaces de la matière vivante. Le traitement au plasma peut être réalisé dans des conditions qui n'affectent pas notablement la viabilité de graines vivantes ou autre matière vivante appropriée. Il peut aussi être réalisé aux fins de conserver le niveau d'humidité à l'intérieur des graines ou même de réduire l'humidité au cours du processus de traitement. Pendant le traitement, le gaz est alimenté d'une source gazeuse à partir de laquelle le dépôt peut être formé par réaction plasmatique. Un plasma froid est enflammé dans le gaz et la matière exposée au plasma pendant une durée déterminée pour former un dépôt sur les surfaces exposées par réaction plasmatique. La matière vivante peut être culbutée pendant qu'elle est soumise au processus de dépôt plasmatique afin de permettre une formation uniforme du dépôt sur les surfaces de la matière vivante.
CA002368180A 1999-06-24 2000-06-23 Traitement de graines ou d'autre matiere vivante par depot par plasma froid Abandoned CA2368180A1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14090899P 1999-06-24 1999-06-24
US60/140,908 1999-06-24
PCT/US2000/017214 WO2000078124A1 (fr) 1999-06-24 2000-06-23 Traitement de graines ou d'autre matiere vivante par depot par plasma froid

Publications (1)

Publication Number Publication Date
CA2368180A1 true CA2368180A1 (fr) 2000-12-28

Family

ID=22493322

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002368180A Abandoned CA2368180A1 (fr) 1999-06-24 2000-06-23 Traitement de graines ou d'autre matiere vivante par depot par plasma froid

Country Status (6)

Country Link
EP (1) EP1191834A1 (fr)
JP (1) JP2003502066A (fr)
AU (1) AU5759000A (fr)
CA (1) CA2368180A1 (fr)
MX (1) MXPA01013290A (fr)
WO (1) WO2000078124A1 (fr)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005120219A1 (fr) * 2004-06-07 2005-12-22 Sharp Kabushiki Kaisha Installations et procédé servant à élever un animal ou à cultiver une plante, animal élevé ou plante cultivée par les installations et le procédé et appareil servant à générer du gaz actif
NL2006212C2 (en) * 2011-02-16 2012-08-20 Synthesis B V Device and method for disinfecting plant seeds.
CN103999593B (zh) * 2014-05-28 2016-01-20 唐欣 一种冷等离子体处理的小麦育种方法
WO2015192923A1 (fr) * 2014-06-16 2015-12-23 Incotec Holding B.V. Traitement pour semences de plantes
CN104584728B (zh) * 2015-01-05 2016-08-31 虞建明 冷等离子体对中、大颗粒种子改性处理设备
CN104620719B (zh) * 2015-03-05 2017-01-25 山东省种子有限责任公司 一种冷等离子体处理的大豆育种方法
JP6505523B2 (ja) * 2015-06-29 2019-04-24 株式会社電子技研 プラズマ粉体処理装置およびプラズマ粉体処理方法
CN105493685B (zh) * 2016-01-28 2017-11-07 中国农业大学 一种旋转仓式冷等离子体种子处理仪及其处理方法
AU2018281812A1 (en) * 2017-06-09 2020-01-30 Greenpath Industries, Llc Non-thermal plasma treatment apparatus, method and system
JP7141036B2 (ja) * 2018-08-03 2022-09-22 国立大学法人東海国立大学機構 イネの生産方法
CN108901245A (zh) * 2018-08-20 2018-11-30 界首市王集镇顺义家庭农场 一种提高德国洋甘菊种子活力的处理方法
GB201908902D0 (en) * 2019-06-21 2019-08-07 Univ Loughborough Plasma treatment
EP4017246B1 (fr) * 2020-11-11 2024-06-19 Interkorn Semenarstvo In Obnovljivi Viri D.O.O. Procédé de stérilisation de récoltes

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU843804A1 (ru) * 1977-07-21 1981-07-07 Всесоюзный Научно-Исследовательскийинститут Электрификации Сельскогохозяйства Установка дл обеззараживани СЕМ Н
FR2580897B1 (fr) * 1985-04-25 1988-01-15 Tessier Michel Procede et dispositif d'une unite de traitement bio-physique avec reactifs de resonances destinee a optimiser et a accelerer les processus de germination et de croissance des vegetaux.
US5531834A (en) * 1993-07-13 1996-07-02 Tokyo Electron Kabushiki Kaisha Plasma film forming method and apparatus and plasma processing apparatus
RU2076555C1 (ru) * 1995-07-05 1997-04-10 Санкт-Петербургский государственный университет Устройство для плазменной обработки семян растений

Also Published As

Publication number Publication date
WO2000078124A1 (fr) 2000-12-28
MXPA01013290A (es) 2002-07-02
JP2003502066A (ja) 2003-01-21
EP1191834A1 (fr) 2002-04-03
AU5759000A (en) 2001-01-09

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FZDE Dead