CA2337586C - Alkylation process and novel hydroxyphenylbenztriazoles - Google Patents
Alkylation process and novel hydroxyphenylbenztriazoles Download PDFInfo
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- CA2337586C CA2337586C CA002337586A CA2337586A CA2337586C CA 2337586 C CA2337586 C CA 2337586C CA 002337586 A CA002337586 A CA 002337586A CA 2337586 A CA2337586 A CA 2337586A CA 2337586 C CA2337586 C CA 2337586C
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
- A61K8/49—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing heterocyclic compounds
- A61K8/494—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing heterocyclic compounds with more than one nitrogen as the only hetero atom
- A61K8/496—Triazoles or their condensed derivatives, e.g. benzotriazoles
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61P—SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
- A61P17/00—Drugs for dermatological disorders
- A61P17/16—Emollients or protectives, e.g. against radiation
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
- A61Q17/00—Barrier preparations; Preparations brought into direct contact with the skin for affording protection against external influences, e.g. sunlight, X-rays or other harmful rays, corrosive materials, bacteria or insect stings
- A61Q17/04—Topical preparations for affording protection against sunlight or other radiation; Topical sun tanning preparations
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- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
- C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
- C07D249/18—Benzotriazoles
- C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
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Abstract
The invention relates to a process for the manufacture of compounds of the general formula I (see formula I) wherein R1 is alkyl; R2, R3, R4 R5 and R6 are, independently, hydrogen, alkyl or alkenyl; X is hydrogen, halogen, alkyl or alkoxy; and the dotted bond is an optional bond; to novel light screening compositions containing certain of the compounds of formula I; and to certain novel compounds of the formula I and other novel 2-substituted phenyl- benzotriazole compounds.
Description
Case 20579 The invention relates to a process for alkylating 2-hydroxyphenyl-benztriazoles which are effective in absorbing ultra violet radiation. In a further aspect, the invention relates to novel alkylated 2-hydroxyphenyl-benztriazoles, to novel cosmetic or dermatological sunscreen compositions containing alkylated 2-hydroxyphenyl-benztriazoles, and to their use as UV screening agents.
US patent No. 4 587 346 discloses a process for alkylating 2-(2-hydroxy-5-methylphenyl)-2H-benzotriazoles by reaction with alkene compounds ion the presence of a catalyst. The process produces random mixtures of isomers.
UV screening compositions comprising 2-hydroxyphenyl-benztriazoles are described in the European patent publications EP 0 711 778 A. and EP 0 392 883 A, US
patents Nos. 4 316 033 and 4 349 602, and International patent application WO
94/06404.
It has been found that alkylated 2-(2-hydroxy-5-methylphenyl)-2H-benzotriazoles can be obtained in substantially pure form. Further, it has been found that certain novel 2-hydroxyphenyl-benztriazoles have improved solubilty and extinction and are more economical to prepare than those of the prior art quoted above.
Thus, in one aspect, the present invention relates to a process for the preparation of compounds of the general formula I
HO
N~ R5 X ::::CNN
Rl Grn/ 14.11.00 wherein R' is alkyl; R2, R3, R4 R5 and R6 are, independently, hydrogen, alkyl or alkenyl; X is hydrogen, halogen, alkyl or alkoxy; and the dotted bond is an optional bond, which comprises the steps of a) reacting a compound of the general formula III
HO
/ N~
X ~ :NN ~ ~ ( III ) Rl to with a compound of the general formula I
Y
R3 ( IV ) to obtain a compound of the general formula II
R \ Ra O
/ ~~N N R5 ( II ) X
~ N
Rl Rz R3 HO
(IA ) / ~N - R5 X N
~ ~N
R' b) heating the compound of the general formula II obtained in step a) to yield a compound of the general formula I A, and, if desired, c) hydrogenating the double bond in the compound of the general formula I A to obtain a compound of the general formula I wherein the dotted bond is absent;
io wherein in the above formulae IA, II, III and IV, R', R', R3, R4 R5, R6, X
and the dotted bond are as defined in formula I, and Y is a leaving group.
Of the compounds of the general formula I above, those wherein X, R" R', R3, R4 R' and R6 and the dotted bond are as defined in claim 1, with the proviso that if the dotted bond is present, one of R2, R4, R5 and R6 is alkenyl, and if the dotted bond is absent, one of R2 and R6 is alkenyl or branched alkyl; as well as the compounds 2-(Benzotriazole-2-yl)-4-methyl-6-(1-octen-3-yl)-phenol, 2- (Benzotriazole-2-yl) -4-methyl-6- (3-octen-2-yl) -phenol 2-(Benzotriazole-2-yl)-4-(1,1,3,3-tetramethylbutyl)-6-(1-hexen-3-yl)-phenol, 2-(Benzotriazole-2-yl)-4-methyl-6-(1-decen-3-yl)-phenol, 2o 2-(Benzotriazole-2-yl)-4-methyl-6-(1-hexen-3-yl)-phenol, 2-(Benzotriazole-2-yl)-4-methyl-6-(1-dodecen-3-yl)-phenol, 2-( Benzotriazole-2-yl)-4-methyl-6-(1-hexadecen-3-yl)-phenol, 2-(Benzotriazole-2-yl)-4-methyl-6-(3-octyl)-phenol, 2-(Benzotriazole-2-yl)-4-(1,1,3,3-tetramethylbutyl)-6-(3-hexyl)-phenol, 2- (Benzotriazole-2-yl)-4-methyl-6- (3-hexyl) -phenol, 2-(Benzotriazole-2-yl)-4-methyl-6-( 3-decyl)-phenol, 2- (Benzotriazole-2-yl) -4-methyl-6- (3-dodecyl) -phenol, 2- (Benzotriazole-2-yl) -4-methyl-6- (3 -hexadecyl) -phenol, 2-(Benzotriazole-2-yl) -4-methyl-6-(3,7-dimethyl-2-octenyl) -phenol, 2- (Benzotriazole-2-yl) -4-methyl-6-(3,7-dimethyl-3-octyl) -phenol, 2-(Benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-1-octen-3-yl)-phenol, 2-( Benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-3-octyl)-phenol, 2- (Benzotriazole-2-yl) -4-methyl-6- (3,7-dimethyl-3-octen-2-yl) -phenol and 2-(Benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-2-octyl)-phenol are novel compounds and as such are also an object of the present invention.
Further examples of novel compounds of the present invention are 2-(Benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-2,6-octadienyl)-phenol, to 2- (Benzotriazole-2-yl) -4-methyl-6- (3,7-dimethyl- 1,6-octadienyl) -phenol and 2-(Benzotriazole-2-yl) -4-methyl-6- (3,7-dimethyl-3,6-octadienyl) -phenol.
In still another aspect, the invention relates to novel cosmetic or dermatological UV light screening compositions containing a 2-hydroxyphenyl-benzotriazole of formula I above, wherein X, Rl, R2, R3, R4, R5, R6, and the dotted bond are as defined in claim 1, with the proviso that either R4 or R5 is an alkyl having at least 2 carbon atoms or is alkenyl. In yet another aspect, the invention relates to novel UV light screening compositions containing a 2-hydroxyphenyl-benztriazole of the general formula I above, wherein X, R', R2, R3, R4 R5 and R6 and the dotted bond are as defined in claim 1, with the proviso that one of R4 and R5 is alkyl having at least 2 carbon atoms or is alkenyl; and at least one additional UV-A and/or UV-B screening agent.
Finally, the present invention relates to the use of the novel 2-hydroxyphenyl-benztriazoles of the general formula I as defined earlier as UV light screening agents.
Especially preferred compounds for use as UV light screening agents are 2-( Benzotriazole-2-yl)-4-methyl-6-(1-octen-3-yl)-phenol, 2-(Benzotriazole-2-yl)-4-(1,1,3,3-tetramethylbutyl)-6-(1-hexen-3-yl)-phenol, 2-(Benzotriazole-2-yl)-4-methyl-6-(3-octyl)-phenol and 2-(Benzotriazole-2-yl)-4-(1,1,3,3-tetramethylbutyl)-6-(3-hexyl)-phenol.
Most preferred is 2-(Benzotriazole-2-yl)-4-methyl-6-(1-octen-3-yl)-phenol.
As used herein the term alkyl denotes saturated straight or branched chain hydrocarbon groups containing 1 to 21, preferably 1 to 8 carbon atoms, such as methyl, 3o ethyl, propyl, isopropyl, butyl, sec. butyl, isobutyl, pentyl, neopentyl, hexyl, 2-ethyl-hexyl, and octyl. Similarly, the term alkoxy denotes denotes saturated straight or branched chain hydrocarbon groups which are bound through an oxygen atom and which contain 1 to 21, preferably 1 to 8 carbon atoms, such as methoxy, ethoxy, propoxy, isopropoxy, butoxy, sec. butoxy, isobutoxy, pentyloxy, neopentyloxy, hexyloxy, 2-ethyl-hexyloxy and octyloxy.
The term alkenyl denotes straight or branched chain hydrocarbon groups containing at least one double bond and 2 to 21, preferably 2 to 8 carbon atoms. Examples of such alkenyl groups are propen-2-yl, propen-3-yl, buten-3-yl, buten-4-yl, penten-4-yl, and penten-5-yl. The term halogen denotes fluoro, chloro, bromo and iodo.
US patent No. 4 587 346 discloses a process for alkylating 2-(2-hydroxy-5-methylphenyl)-2H-benzotriazoles by reaction with alkene compounds ion the presence of a catalyst. The process produces random mixtures of isomers.
UV screening compositions comprising 2-hydroxyphenyl-benztriazoles are described in the European patent publications EP 0 711 778 A. and EP 0 392 883 A, US
patents Nos. 4 316 033 and 4 349 602, and International patent application WO
94/06404.
It has been found that alkylated 2-(2-hydroxy-5-methylphenyl)-2H-benzotriazoles can be obtained in substantially pure form. Further, it has been found that certain novel 2-hydroxyphenyl-benztriazoles have improved solubilty and extinction and are more economical to prepare than those of the prior art quoted above.
Thus, in one aspect, the present invention relates to a process for the preparation of compounds of the general formula I
HO
N~ R5 X ::::CNN
Rl Grn/ 14.11.00 wherein R' is alkyl; R2, R3, R4 R5 and R6 are, independently, hydrogen, alkyl or alkenyl; X is hydrogen, halogen, alkyl or alkoxy; and the dotted bond is an optional bond, which comprises the steps of a) reacting a compound of the general formula III
HO
/ N~
X ~ :NN ~ ~ ( III ) Rl to with a compound of the general formula I
Y
R3 ( IV ) to obtain a compound of the general formula II
R \ Ra O
/ ~~N N R5 ( II ) X
~ N
Rl Rz R3 HO
(IA ) / ~N - R5 X N
~ ~N
R' b) heating the compound of the general formula II obtained in step a) to yield a compound of the general formula I A, and, if desired, c) hydrogenating the double bond in the compound of the general formula I A to obtain a compound of the general formula I wherein the dotted bond is absent;
io wherein in the above formulae IA, II, III and IV, R', R', R3, R4 R5, R6, X
and the dotted bond are as defined in formula I, and Y is a leaving group.
Of the compounds of the general formula I above, those wherein X, R" R', R3, R4 R' and R6 and the dotted bond are as defined in claim 1, with the proviso that if the dotted bond is present, one of R2, R4, R5 and R6 is alkenyl, and if the dotted bond is absent, one of R2 and R6 is alkenyl or branched alkyl; as well as the compounds 2-(Benzotriazole-2-yl)-4-methyl-6-(1-octen-3-yl)-phenol, 2- (Benzotriazole-2-yl) -4-methyl-6- (3-octen-2-yl) -phenol 2-(Benzotriazole-2-yl)-4-(1,1,3,3-tetramethylbutyl)-6-(1-hexen-3-yl)-phenol, 2-(Benzotriazole-2-yl)-4-methyl-6-(1-decen-3-yl)-phenol, 2o 2-(Benzotriazole-2-yl)-4-methyl-6-(1-hexen-3-yl)-phenol, 2-(Benzotriazole-2-yl)-4-methyl-6-(1-dodecen-3-yl)-phenol, 2-( Benzotriazole-2-yl)-4-methyl-6-(1-hexadecen-3-yl)-phenol, 2-(Benzotriazole-2-yl)-4-methyl-6-(3-octyl)-phenol, 2-(Benzotriazole-2-yl)-4-(1,1,3,3-tetramethylbutyl)-6-(3-hexyl)-phenol, 2- (Benzotriazole-2-yl)-4-methyl-6- (3-hexyl) -phenol, 2-(Benzotriazole-2-yl)-4-methyl-6-( 3-decyl)-phenol, 2- (Benzotriazole-2-yl) -4-methyl-6- (3-dodecyl) -phenol, 2- (Benzotriazole-2-yl) -4-methyl-6- (3 -hexadecyl) -phenol, 2-(Benzotriazole-2-yl) -4-methyl-6-(3,7-dimethyl-2-octenyl) -phenol, 2- (Benzotriazole-2-yl) -4-methyl-6-(3,7-dimethyl-3-octyl) -phenol, 2-(Benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-1-octen-3-yl)-phenol, 2-( Benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-3-octyl)-phenol, 2- (Benzotriazole-2-yl) -4-methyl-6- (3,7-dimethyl-3-octen-2-yl) -phenol and 2-(Benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-2-octyl)-phenol are novel compounds and as such are also an object of the present invention.
Further examples of novel compounds of the present invention are 2-(Benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-2,6-octadienyl)-phenol, to 2- (Benzotriazole-2-yl) -4-methyl-6- (3,7-dimethyl- 1,6-octadienyl) -phenol and 2-(Benzotriazole-2-yl) -4-methyl-6- (3,7-dimethyl-3,6-octadienyl) -phenol.
In still another aspect, the invention relates to novel cosmetic or dermatological UV light screening compositions containing a 2-hydroxyphenyl-benzotriazole of formula I above, wherein X, Rl, R2, R3, R4, R5, R6, and the dotted bond are as defined in claim 1, with the proviso that either R4 or R5 is an alkyl having at least 2 carbon atoms or is alkenyl. In yet another aspect, the invention relates to novel UV light screening compositions containing a 2-hydroxyphenyl-benztriazole of the general formula I above, wherein X, R', R2, R3, R4 R5 and R6 and the dotted bond are as defined in claim 1, with the proviso that one of R4 and R5 is alkyl having at least 2 carbon atoms or is alkenyl; and at least one additional UV-A and/or UV-B screening agent.
Finally, the present invention relates to the use of the novel 2-hydroxyphenyl-benztriazoles of the general formula I as defined earlier as UV light screening agents.
Especially preferred compounds for use as UV light screening agents are 2-( Benzotriazole-2-yl)-4-methyl-6-(1-octen-3-yl)-phenol, 2-(Benzotriazole-2-yl)-4-(1,1,3,3-tetramethylbutyl)-6-(1-hexen-3-yl)-phenol, 2-(Benzotriazole-2-yl)-4-methyl-6-(3-octyl)-phenol and 2-(Benzotriazole-2-yl)-4-(1,1,3,3-tetramethylbutyl)-6-(3-hexyl)-phenol.
Most preferred is 2-(Benzotriazole-2-yl)-4-methyl-6-(1-octen-3-yl)-phenol.
As used herein the term alkyl denotes saturated straight or branched chain hydrocarbon groups containing 1 to 21, preferably 1 to 8 carbon atoms, such as methyl, 3o ethyl, propyl, isopropyl, butyl, sec. butyl, isobutyl, pentyl, neopentyl, hexyl, 2-ethyl-hexyl, and octyl. Similarly, the term alkoxy denotes denotes saturated straight or branched chain hydrocarbon groups which are bound through an oxygen atom and which contain 1 to 21, preferably 1 to 8 carbon atoms, such as methoxy, ethoxy, propoxy, isopropoxy, butoxy, sec. butoxy, isobutoxy, pentyloxy, neopentyloxy, hexyloxy, 2-ethyl-hexyloxy and octyloxy.
The term alkenyl denotes straight or branched chain hydrocarbon groups containing at least one double bond and 2 to 21, preferably 2 to 8 carbon atoms. Examples of such alkenyl groups are propen-2-yl, propen-3-yl, buten-3-yl, buten-4-yl, penten-4-yl, and penten-5-yl. The term halogen denotes fluoro, chloro, bromo and iodo.
A preferred group of compounds within formula I are those wherein the dotted bond is present. Also preferred are compounds of formula I wherein R5 and R6 are hydrogen. Further preferred are compounds wherein one of R2 to R4 is alkyl having at least three carbon atoms and the other two of R2 to R4 are hydrogen. The total number of carbon atoms in R2 to R6 is preferably 3 to 21, more particularly 3 to 9 carbon atoms, most to preferably 3 to 5. Especially preferred are compounds of formula I Wherein R 2 and R 3 are hydrogen and R4 is alkyl having 3 to 5 carbon atoms. R' is preferably methyl or 1,1,3,3-tetramethylbutyl. X is preferably hydrogen, methoxy or chloro, and most preferably hydrogen.
In accordance with the novel process of this invention, the compounds of the general formula I are prepared as shown in Scheme 1 below:
Scheme 1 R \ R4 HO 6 R2 1. step: t 0 / Y Base / CN\ RS
X \ CN\ N N + R solvent X \ N N
R' R5 R4 heat (III) (II) R' (IV) 2. step:
heat 50-300 C (180-250 C) R R4 -with or without solvent HO
/ - N~ R5 X N
\ -N (IA) RI
3. step (optional) :
hydrogenation R R4 HO
/ N - R X \ C-NN (IB) R' In the first reaction step the benzotriazolyl phenol is reacted with an alkene compound carrying a leaving group Y, such as halogen, e.g., chloro, bromo, or a sulfonyloxy group, e.g., tosyloxy or mesyloxy. The reaction can be carried out in a manner known per se for the alkenylation of phenolic hydroxy groups, i.e., in the presence of a base such as an alkali carbonate, e.g., sodium carbonate, alkali hydroxide or alkali alcoholates, e.g., sodium methylate; an amine such as triethyl amine,, N,N-dimethylamino pyridine or 1,4-diazabicyclo[2.2.2] octane (DABCO); in a polar solvent e.g., an alcohol such as n-butanol, an ether such as diethyleneglycol monomethyl ether, tetrahydrofuran or dioxan; or in dimethyl formamide, dimethyl sulfoxide, N,N-dimethyl propylene urea or 1-methyl pyrrolidone, or in a solvent which simultaneously may serve as a base, such as N,N-dimethylamino pyridine, at temperatures from room temperature up to the boiling point of the reaction mixture. The phenol ether obtained can be rearranged by heating, suitably to a temperature of from 50 to 300 C, if desired, in a solvent, suitably in a solvent that is conventionally used in Claisen rearrangements, e.g., in diethyl aniline or trichloro benzene to afford the corresponding compound of formula I wherein the dotted bond is present.
2o The olefinic double bond can be hydrogenated in a manner known per se, e.g., with elemental hydrogen in the presence of a noble metal catalyst such as Pd, or with Rany-Ni, preferably with elemental hydrogen in the presence of an appropriate catalyst which does not attack the triazole ring, e.g., a partially inactivated noble metal catalyst such as a Lindlar catalyst.
The starting compounds of formulae III and IV are known or can be prepared by methods known per se or described hereinafter. For instance, compounds of formula III
can be prepared by a reaction sequence that comprises converting an X-substituted o-nitro aniline by reaction with sodium nitrite to the corresponding diazonium salt followed by a diazotation reaction with a R1-substituted phenol to form the diazo compound and 3o reduction of the remaining nitro group with concomitant cyclisation to form the triazole ring. Compounds of formula IV can be prepared following Scheme 2:
In accordance with the novel process of this invention, the compounds of the general formula I are prepared as shown in Scheme 1 below:
Scheme 1 R \ R4 HO 6 R2 1. step: t 0 / Y Base / CN\ RS
X \ CN\ N N + R solvent X \ N N
R' R5 R4 heat (III) (II) R' (IV) 2. step:
heat 50-300 C (180-250 C) R R4 -with or without solvent HO
/ - N~ R5 X N
\ -N (IA) RI
3. step (optional) :
hydrogenation R R4 HO
/ N - R X \ C-NN (IB) R' In the first reaction step the benzotriazolyl phenol is reacted with an alkene compound carrying a leaving group Y, such as halogen, e.g., chloro, bromo, or a sulfonyloxy group, e.g., tosyloxy or mesyloxy. The reaction can be carried out in a manner known per se for the alkenylation of phenolic hydroxy groups, i.e., in the presence of a base such as an alkali carbonate, e.g., sodium carbonate, alkali hydroxide or alkali alcoholates, e.g., sodium methylate; an amine such as triethyl amine,, N,N-dimethylamino pyridine or 1,4-diazabicyclo[2.2.2] octane (DABCO); in a polar solvent e.g., an alcohol such as n-butanol, an ether such as diethyleneglycol monomethyl ether, tetrahydrofuran or dioxan; or in dimethyl formamide, dimethyl sulfoxide, N,N-dimethyl propylene urea or 1-methyl pyrrolidone, or in a solvent which simultaneously may serve as a base, such as N,N-dimethylamino pyridine, at temperatures from room temperature up to the boiling point of the reaction mixture. The phenol ether obtained can be rearranged by heating, suitably to a temperature of from 50 to 300 C, if desired, in a solvent, suitably in a solvent that is conventionally used in Claisen rearrangements, e.g., in diethyl aniline or trichloro benzene to afford the corresponding compound of formula I wherein the dotted bond is present.
2o The olefinic double bond can be hydrogenated in a manner known per se, e.g., with elemental hydrogen in the presence of a noble metal catalyst such as Pd, or with Rany-Ni, preferably with elemental hydrogen in the presence of an appropriate catalyst which does not attack the triazole ring, e.g., a partially inactivated noble metal catalyst such as a Lindlar catalyst.
The starting compounds of formulae III and IV are known or can be prepared by methods known per se or described hereinafter. For instance, compounds of formula III
can be prepared by a reaction sequence that comprises converting an X-substituted o-nitro aniline by reaction with sodium nitrite to the corresponding diazonium salt followed by a diazotation reaction with a R1-substituted phenol to form the diazo compound and 3o reduction of the remaining nitro group with concomitant cyclisation to form the triazole ring. Compounds of formula IV can be prepared following Scheme 2:
Scheme 2 R5 PAr3 + R2 Wittig HO R3 R5 / Br R4 ~ PBr R4 R2 R6 O BuLi HO R2 SOC12 R5 CI
R5---f R5 H2/Lindlar catalyst R2R6 R4 R2 R4 or LiAIH4 ifR3=R6=H
The phenol ether derivatives of formula II obtained in the first reaction step are novel compounds and as such are also an object of the present invention.
The novel compounds of the general formula I have adsorption maxima in both the UV-A and the UV-B region. They have a good liposolubility and photostability.
For the preparation of light screening agents, especially of preparations for dermatological or cosmetic use, such as skin protection and sunscreen formulations for everyday cosmetics a compound of formula I can be incorporated in auxiliary agents, e.g. a cosmetic base, which are conventionally used for such formulations. Where convenient, other conventional UV-A and/or UV-B screening agents may also be added. The preparation of said light screening agents is well known to the skilled artisan in this field.
2o The amount of compounds of the general formula I and other known UV-filters is not critical. Suitable amounts are about 0.5 to about 12% of active ingredient, i.e., a compound of the general formula I and, if desired, any additional UV-A or UV-B
screening agent.
Examples of UV B screening agents, i.e. substances having absorption maxima between about 290 and 320 nm, which come into consideration for combination with the compounds of the present invention are for example the following organic and inorganic compounds :
--- Acrylates such as 2-ethylhexyl 2-cyano-3,3-diphenylacrylate (octocrylene, PARSOL 340), ethyl 2-cyano-3,3-diphenylacrylate and the like;
R5---f R5 H2/Lindlar catalyst R2R6 R4 R2 R4 or LiAIH4 ifR3=R6=H
The phenol ether derivatives of formula II obtained in the first reaction step are novel compounds and as such are also an object of the present invention.
The novel compounds of the general formula I have adsorption maxima in both the UV-A and the UV-B region. They have a good liposolubility and photostability.
For the preparation of light screening agents, especially of preparations for dermatological or cosmetic use, such as skin protection and sunscreen formulations for everyday cosmetics a compound of formula I can be incorporated in auxiliary agents, e.g. a cosmetic base, which are conventionally used for such formulations. Where convenient, other conventional UV-A and/or UV-B screening agents may also be added. The preparation of said light screening agents is well known to the skilled artisan in this field.
2o The amount of compounds of the general formula I and other known UV-filters is not critical. Suitable amounts are about 0.5 to about 12% of active ingredient, i.e., a compound of the general formula I and, if desired, any additional UV-A or UV-B
screening agent.
Examples of UV B screening agents, i.e. substances having absorption maxima between about 290 and 320 nm, which come into consideration for combination with the compounds of the present invention are for example the following organic and inorganic compounds :
--- Acrylates such as 2-ethylhexyl 2-cyano-3,3-diphenylacrylate (octocrylene, PARSOL 340), ethyl 2-cyano-3,3-diphenylacrylate and the like;
--- Camphor derivatives such as 4-methyl benzylidene camphor (PARSOL 5000), 3-benzylidene camphor, camphor benzalkonium methosulfate, polyacrylamidomethyl benzylidene camphor, sulfo benzylidene camphor, sulphomethyl benzylidene camphor, therephthalidene dicamphor sulfonic acid and the like;
--- Cinnamate derivatives such as octyl methoxycinnamate (PARSOL MCX), 1o ethoxyethyl methoxycinnamate, diethanolamine methoxycinnamate (PARSOL
Hydro), isoamyl methoxycinnamate and the like as well as cinnamic acid derivatives bond to siloxanes;
---Organosiloxane compounds containing benzmalonate groups as described in the European Patent Publications EP 0358584 B1, EP 0538431 B1 and EP 0709080 A1;
--- Pigments such as microparticulated Ti02, and the like. The term "microparticulated" refers to a particle size from about 5 nm to about 200 nm, particularly from about 15 nm to about 100 nm. The TiOZ particles may also be coated by metal oxides such as e.g. aluminum or zirconium oxides or by organic coatings such as e.g.
polyols, methicone, aluminum stearate, alkyl silane. Such coatings are well known in the art.
--- Imidazole derivatives such as e.g. 2-phenyl benzimidazole sulfonic acid and its salts (PARSOL HS). Salts of 2-phenyl benzimidazole sulfonic acid are e.g.
alkali salts such as sodium- or potassium salts, ammonium salts, morpholine salts, salts of primary, sec.
and tert. amines like monoethanolamine salts, diethanolamine salts and the like.
--- Salicylate derivatives such as isopropylbenzyl salicylate, benzyl salicylate, butyl salicylate, octyl salicylate (NEO HELIOPAN OS), isooctyl salicylate or homomenthyl salicylate (homosalate, HELIOPAN) and the like;
--- Triazone derivatives such as octyl triazone (UVINUL T-150), dioctyl butamido triazone (UVASORB HEB) and the like.
Examples of UV A screening agents i.e. substances having absorption maxima 3o between about 320 and 400 nm, which come into consideration for combination with the compounds of the present invention are for example the following organic and inorganic compounds :
----Dibenzoylmethane derivatives such as 4-tert. butyl-4'-methoxydibenzoyl-methane (PARSOL 1789), dimethoxydibenzoylmethane, isopropyldibenzoylmethane and the like;
----Benzotriazole derivatives such as 2,2'-methylene-bis-(6-(2H-benzotriazole-yl)-4-(1,1,3,3,-tetramethylbutyl)-phenol (TINOSORB M) and the like;
--- Cinnamate derivatives such as octyl methoxycinnamate (PARSOL MCX), 1o ethoxyethyl methoxycinnamate, diethanolamine methoxycinnamate (PARSOL
Hydro), isoamyl methoxycinnamate and the like as well as cinnamic acid derivatives bond to siloxanes;
---Organosiloxane compounds containing benzmalonate groups as described in the European Patent Publications EP 0358584 B1, EP 0538431 B1 and EP 0709080 A1;
--- Pigments such as microparticulated Ti02, and the like. The term "microparticulated" refers to a particle size from about 5 nm to about 200 nm, particularly from about 15 nm to about 100 nm. The TiOZ particles may also be coated by metal oxides such as e.g. aluminum or zirconium oxides or by organic coatings such as e.g.
polyols, methicone, aluminum stearate, alkyl silane. Such coatings are well known in the art.
--- Imidazole derivatives such as e.g. 2-phenyl benzimidazole sulfonic acid and its salts (PARSOL HS). Salts of 2-phenyl benzimidazole sulfonic acid are e.g.
alkali salts such as sodium- or potassium salts, ammonium salts, morpholine salts, salts of primary, sec.
and tert. amines like monoethanolamine salts, diethanolamine salts and the like.
--- Salicylate derivatives such as isopropylbenzyl salicylate, benzyl salicylate, butyl salicylate, octyl salicylate (NEO HELIOPAN OS), isooctyl salicylate or homomenthyl salicylate (homosalate, HELIOPAN) and the like;
--- Triazone derivatives such as octyl triazone (UVINUL T-150), dioctyl butamido triazone (UVASORB HEB) and the like.
Examples of UV A screening agents i.e. substances having absorption maxima 3o between about 320 and 400 nm, which come into consideration for combination with the compounds of the present invention are for example the following organic and inorganic compounds :
----Dibenzoylmethane derivatives such as 4-tert. butyl-4'-methoxydibenzoyl-methane (PARSOL 1789), dimethoxydibenzoylmethane, isopropyldibenzoylmethane and the like;
----Benzotriazole derivatives such as 2,2'-methylene-bis-(6-(2H-benzotriazole-yl)-4-(1,1,3,3,-tetramethylbutyl)-phenol (TINOSORB M) and the like;
--- Pigments such as microparticulated ZnO and the like. The term "microparticulated" refers to a particle size from about 5 nm to about 200 nm, particularly from about 15 nm to about 100 nm. The ZnO particles may also be coated by metal oxides such as e.g. aluminum or zirconium oxides or by organic coatings such as e.g.
polyols, methicone, aluminum stearate, alkyl silane. Such coatings are well known in the art.
As dibenzoylmethane derivatives are photolabile it may be desirable to photostabilize these UV-A screening agents. Thus, the term "conventional UV-A screening agent" also refers to dibenzoylmethane derivatives such as e.g. PARSOL 1789 stabilized by, e.g., --- 3,3-Diphenylacrylate derivatives as described in the European Patent Publications EP 0 514 491 B1 and EP 0 780 119 A1;
---- Benzylidene camphor derivatives as described in the US Patent No.
5,605,680;
---- Organosiloxanes containing benzmalonate groups as described in the European Patent Publications EP 0358584 B1, EP 0538431 B1 and EP 0709080 Al.
As cosmetic bases conventional for light screening compositions in the scope of the present invention there can be used any conventional preparation which corresponds to the cosmetic requirements, e.g. creams, lotions, emulsions, salves, gels, solutions, sprays, sticks and milks; see also: Sunscreens, Development, Evaluation and Regulatory Aspects, ed. N.Y. Lowe, N.A. Shaath, Marcel Dekker, Inc. New York and Basel, 1990.
Having regard to their good lipophility, the compounds of the general formula I can be incorporated well into oil and fat containing cosmetic preparations.
The following Examples illustrate the invention in more detail, but do not limit its scope in any manner. In the Examples, tlc. means thin layer chromatography.
Example 1 a) To a mixture of 7g of 2-(benzotriazole-2-yl)-4-methyl-6-phenol (Tinuvin P, CIBA
SA.) in 35 ml of 1-methyl-pyrrolidone, 8.2g of anhydrous sodium carbonate and 2 mg of potassium iodide. 8.5g (44.7 mmol) of 1-bromo-2-octene (prepared from 1-octene-3-ol by the method of L. Miginiac and B. Mauze, Bull. Soc. Chim. France 1968, 2544, 2547) was added slowly under nitrogen atmosphere. The reaction mixture was left to stir for two hours at room temperature and for 18 hours at 100 C. The reaction was traced by tlc.
(hexane : ethylacetate = 3:1). The reaction mixture was then cooled to 20 C, poored on water and extracted (3x) with ethyl acetate. The combined organic phases were washed with water, 2n NaOH (2x) and brine and dried over sodium sulfate. After concentration and drying in high vacuum 10.7g of crude liquid 2-(2-oct-2-enyloxy-5-methyl-phenyl)-2H-benzotriazole as identified by NMR and MS was obtained.
b) 4g (11.9 mmol) of 2-(2-oct-2-enyloxy-5-methyl-phenyl)-2H-benzotriazole prepared as described above in 5 ml of N,N-diethylaniline were heated to reflux (230 C.)under nitrogen atmosphere. The reaction was traced by tlc. (hexane : ethyl acetate =
2:1). After 165 min the reaction was complete, and a solution of 2n HCl was added to the cold reaction mixture, followed by extraction with ether (3x). The combined organic phases were washed with a 10% KOH solution, and the latter acidified to pH 3-4 with 5n HCl and extracted with ether. The combined ether phases were dried over sodium sulfate and concentrated to yield 3.75g (94%) of a brown liquid, which contained 8% of 2-(benzotriazole-2-yl)-4-methyl-6-(3-octen-2-yl)-phenol. These 8% of the byproduct were identified by NMR (CDC13): 0.87 ppm (Tr/3Pr); 1.26-1.4 (M/7Pr); 2.05 (D x Tr/2Pr); 2.38 (S/3Pr); 4.03 (Q x D/1Pr); 5.57 (D x Tr/lPr); 5.72 (D x D x Tr/lPr); 7.05 (D/lPr); 7.46 (M/2Pr); 7.90 (M/2Pr); 8.07 (D/lPr) and 11.4 (S/lPr), UV(CH2CI2) 306 and 344 nm. After chromatography on silica gel (Merck) with hexane/ diethyl ether slightly yellow crystals of the main product were formed. M.P. 37-38 C. UV(CHZC12) 306 nm (16'800) and 344 nm (16'555); MS: 335 (Mt), 264, 145 (100%), 117; NMR (CDC13): 0.87 ppm (Tr/3Pr);
1.26-1.4 (M/6Pr); 1.77 (D x Tr/2Pr); 2.38 (S/3Pr); 3.90 (D x Tr/1Pr); 5.05 (D/lPr);
5.10 (D/1Pr);
6.04 (D x D x D/lPr); 7.05 (D/1Pr); 7.46 (M/2Pr); 7.90 (M/2Pr); 8.07 (D/lPr) and 11.4 (S/1Pr).
In a separate reaction lg of the above starting material was heated without solvent in a Kugelrohr oven for 270 min to 220 C. Practically pure 2-Benzotriazole-2-yl-4-methyl-6-(1-octen-3-yl)-phenol was obtained in quantitative yield.
The product is easily mixable with cosmetic solverts like e.g. Cetiol LC
(Cocoyl caprylate caprate). When irradiated in high dilution with a Heraeus 150 W Hg-lamp the product has been shown to be photostable.
Example 2 a) To 7.98g (24.7mmo1) of 2-(benzotriazole-2-yl)-4-(1,1,3,3-tetramethyl-butyl)-phenol (Aldrich) in 40 ml of 1-methyl-pyrrolidone and 6.5g of anhydrous sodium carbonate, 5.8g (35.7 mmol) of 1-bromo-2-hexene (prepared from 1-hexene-3-ol by the method of L. Miginiac and B. Mauze, Biill. Soc. Chim. France 1968, 2544, 2547) were added slowly under nitrogen atmosphere. The reaction mixture was left to stir for two hours at room temperature and for 18 hours at 80 C. The reaction was traced by tlc.
(hexane : ether : CHZC12 = 3:1:1). The reaction mixture was then cooled to 20 C and distributed (3x) between water and ethyl acetate. The combined organic phases were washed with water, 2n NaOH (2x) and brine and dried over sodium sulfate. After concentration a crude crystalline product was obtained, which was recrystallised from hexane to yield 6.17g of 2-(2-hex-2-enyloxy-5-(1,1,3,3-tetramethylbutyl)-phenyl)-2H-benzotriazole, M.p.
80-81 C;
UV(CHZC12): 287 nm (16'305); MS: 405 (M+), 323, 252 (100%).
b) 5.6g (13.8 mmol) of 2-(2-hex-2-enyloxy-5-(1,1,3,3-tetramethylbutyl)-phenyl)-benzotriazole prepared as described above in 100 ml of N,N-dimethylaniline were heated to to reflux. The reaction was traced by tlc. (hexane : ethyl acetate = 7:3).
After 22 hours the reaction was complete. N,N-dimethylaniline was destilled off and the product freed from residual amine in high vacuum to yield 4.7g (84%) of 2-(benzotriazole-2-yl)-4-(1,1,3,3-tetramethylbutyl)-6-(1-hexen-3-yl)-phenol as an orange liquid. UV(CH2C12): 305 nm (16'007) and 343 nm (14'359); MS: 405 (M '-), 334 (100%).
The product is easily mixable with cosmetic solverts like e.g. Cetiol LC
(Cocoyl caprylate caprate). When irradiated in high dilution with a Heraeus 150 W Hg-lamp the product has been shown to be photostable.
Example 3 0.5g of 2-(benzotriazole-2-yl)-4-methyl-6-(1-octen-3-yl)-phenol and a trace of "Lindlar catalyst" (Fluka) in 20 ml of hexane was hydrogenated for 4 hours under normal pressure of hydrogen. Then the reaction mixture was filtered and concentrated to yield (quantitatively) 2-(benzotriazole-2-yl)-4-methyl-6-(3-octyl) -phenol as a yellow liquid.
UV(CH2CIZ): 306 nm (14'602) and 346 nm (13'850); MS: 337 (M+), 308, 266, 238 (100%).
The product is easily mixable with cosmetic solverts like e.g. Cetiol LC
(Cocoyl caprylate caprate). When irradiated in high dilution with a Heraeus 150 W Hg-lamp the product has been shown to be photostable.
Example 4 2g of 2-(benzotriazole-2-yl)-4-(1,1,3,3-tetramethylbutyl)-6-(1-hexen-3-yl)-phenol and a trace of "Lindlar catalyst" (Fluka) in 25 ml of hexane was hydrogenated for 5 hours under normal pressure of hydrogen. Then the reaction mixture was filtered and concentrated to yield 2g of 2-(benzotriazole-2-yl)-4-(1,1,3,3-tetramethylbutyl)-6-(3-hexyl) -phenol as an orange liquid. UV(CH2C12): 306 nm (15' 121) and 346 nm (13' 120);
MS: 407 (Mt), 336 (100%).
The product is easily mixable with cosmetic solverts like e.g. Cetiol LC
(Cocoyl caprylate caprate). When irradiated in high dilution with a Heraeus 150 W Hg-lamp the product has been shown to be photostable.
polyols, methicone, aluminum stearate, alkyl silane. Such coatings are well known in the art.
As dibenzoylmethane derivatives are photolabile it may be desirable to photostabilize these UV-A screening agents. Thus, the term "conventional UV-A screening agent" also refers to dibenzoylmethane derivatives such as e.g. PARSOL 1789 stabilized by, e.g., --- 3,3-Diphenylacrylate derivatives as described in the European Patent Publications EP 0 514 491 B1 and EP 0 780 119 A1;
---- Benzylidene camphor derivatives as described in the US Patent No.
5,605,680;
---- Organosiloxanes containing benzmalonate groups as described in the European Patent Publications EP 0358584 B1, EP 0538431 B1 and EP 0709080 Al.
As cosmetic bases conventional for light screening compositions in the scope of the present invention there can be used any conventional preparation which corresponds to the cosmetic requirements, e.g. creams, lotions, emulsions, salves, gels, solutions, sprays, sticks and milks; see also: Sunscreens, Development, Evaluation and Regulatory Aspects, ed. N.Y. Lowe, N.A. Shaath, Marcel Dekker, Inc. New York and Basel, 1990.
Having regard to their good lipophility, the compounds of the general formula I can be incorporated well into oil and fat containing cosmetic preparations.
The following Examples illustrate the invention in more detail, but do not limit its scope in any manner. In the Examples, tlc. means thin layer chromatography.
Example 1 a) To a mixture of 7g of 2-(benzotriazole-2-yl)-4-methyl-6-phenol (Tinuvin P, CIBA
SA.) in 35 ml of 1-methyl-pyrrolidone, 8.2g of anhydrous sodium carbonate and 2 mg of potassium iodide. 8.5g (44.7 mmol) of 1-bromo-2-octene (prepared from 1-octene-3-ol by the method of L. Miginiac and B. Mauze, Bull. Soc. Chim. France 1968, 2544, 2547) was added slowly under nitrogen atmosphere. The reaction mixture was left to stir for two hours at room temperature and for 18 hours at 100 C. The reaction was traced by tlc.
(hexane : ethylacetate = 3:1). The reaction mixture was then cooled to 20 C, poored on water and extracted (3x) with ethyl acetate. The combined organic phases were washed with water, 2n NaOH (2x) and brine and dried over sodium sulfate. After concentration and drying in high vacuum 10.7g of crude liquid 2-(2-oct-2-enyloxy-5-methyl-phenyl)-2H-benzotriazole as identified by NMR and MS was obtained.
b) 4g (11.9 mmol) of 2-(2-oct-2-enyloxy-5-methyl-phenyl)-2H-benzotriazole prepared as described above in 5 ml of N,N-diethylaniline were heated to reflux (230 C.)under nitrogen atmosphere. The reaction was traced by tlc. (hexane : ethyl acetate =
2:1). After 165 min the reaction was complete, and a solution of 2n HCl was added to the cold reaction mixture, followed by extraction with ether (3x). The combined organic phases were washed with a 10% KOH solution, and the latter acidified to pH 3-4 with 5n HCl and extracted with ether. The combined ether phases were dried over sodium sulfate and concentrated to yield 3.75g (94%) of a brown liquid, which contained 8% of 2-(benzotriazole-2-yl)-4-methyl-6-(3-octen-2-yl)-phenol. These 8% of the byproduct were identified by NMR (CDC13): 0.87 ppm (Tr/3Pr); 1.26-1.4 (M/7Pr); 2.05 (D x Tr/2Pr); 2.38 (S/3Pr); 4.03 (Q x D/1Pr); 5.57 (D x Tr/lPr); 5.72 (D x D x Tr/lPr); 7.05 (D/lPr); 7.46 (M/2Pr); 7.90 (M/2Pr); 8.07 (D/lPr) and 11.4 (S/lPr), UV(CH2CI2) 306 and 344 nm. After chromatography on silica gel (Merck) with hexane/ diethyl ether slightly yellow crystals of the main product were formed. M.P. 37-38 C. UV(CHZC12) 306 nm (16'800) and 344 nm (16'555); MS: 335 (Mt), 264, 145 (100%), 117; NMR (CDC13): 0.87 ppm (Tr/3Pr);
1.26-1.4 (M/6Pr); 1.77 (D x Tr/2Pr); 2.38 (S/3Pr); 3.90 (D x Tr/1Pr); 5.05 (D/lPr);
5.10 (D/1Pr);
6.04 (D x D x D/lPr); 7.05 (D/1Pr); 7.46 (M/2Pr); 7.90 (M/2Pr); 8.07 (D/lPr) and 11.4 (S/1Pr).
In a separate reaction lg of the above starting material was heated without solvent in a Kugelrohr oven for 270 min to 220 C. Practically pure 2-Benzotriazole-2-yl-4-methyl-6-(1-octen-3-yl)-phenol was obtained in quantitative yield.
The product is easily mixable with cosmetic solverts like e.g. Cetiol LC
(Cocoyl caprylate caprate). When irradiated in high dilution with a Heraeus 150 W Hg-lamp the product has been shown to be photostable.
Example 2 a) To 7.98g (24.7mmo1) of 2-(benzotriazole-2-yl)-4-(1,1,3,3-tetramethyl-butyl)-phenol (Aldrich) in 40 ml of 1-methyl-pyrrolidone and 6.5g of anhydrous sodium carbonate, 5.8g (35.7 mmol) of 1-bromo-2-hexene (prepared from 1-hexene-3-ol by the method of L. Miginiac and B. Mauze, Biill. Soc. Chim. France 1968, 2544, 2547) were added slowly under nitrogen atmosphere. The reaction mixture was left to stir for two hours at room temperature and for 18 hours at 80 C. The reaction was traced by tlc.
(hexane : ether : CHZC12 = 3:1:1). The reaction mixture was then cooled to 20 C and distributed (3x) between water and ethyl acetate. The combined organic phases were washed with water, 2n NaOH (2x) and brine and dried over sodium sulfate. After concentration a crude crystalline product was obtained, which was recrystallised from hexane to yield 6.17g of 2-(2-hex-2-enyloxy-5-(1,1,3,3-tetramethylbutyl)-phenyl)-2H-benzotriazole, M.p.
80-81 C;
UV(CHZC12): 287 nm (16'305); MS: 405 (M+), 323, 252 (100%).
b) 5.6g (13.8 mmol) of 2-(2-hex-2-enyloxy-5-(1,1,3,3-tetramethylbutyl)-phenyl)-benzotriazole prepared as described above in 100 ml of N,N-dimethylaniline were heated to to reflux. The reaction was traced by tlc. (hexane : ethyl acetate = 7:3).
After 22 hours the reaction was complete. N,N-dimethylaniline was destilled off and the product freed from residual amine in high vacuum to yield 4.7g (84%) of 2-(benzotriazole-2-yl)-4-(1,1,3,3-tetramethylbutyl)-6-(1-hexen-3-yl)-phenol as an orange liquid. UV(CH2C12): 305 nm (16'007) and 343 nm (14'359); MS: 405 (M '-), 334 (100%).
The product is easily mixable with cosmetic solverts like e.g. Cetiol LC
(Cocoyl caprylate caprate). When irradiated in high dilution with a Heraeus 150 W Hg-lamp the product has been shown to be photostable.
Example 3 0.5g of 2-(benzotriazole-2-yl)-4-methyl-6-(1-octen-3-yl)-phenol and a trace of "Lindlar catalyst" (Fluka) in 20 ml of hexane was hydrogenated for 4 hours under normal pressure of hydrogen. Then the reaction mixture was filtered and concentrated to yield (quantitatively) 2-(benzotriazole-2-yl)-4-methyl-6-(3-octyl) -phenol as a yellow liquid.
UV(CH2CIZ): 306 nm (14'602) and 346 nm (13'850); MS: 337 (M+), 308, 266, 238 (100%).
The product is easily mixable with cosmetic solverts like e.g. Cetiol LC
(Cocoyl caprylate caprate). When irradiated in high dilution with a Heraeus 150 W Hg-lamp the product has been shown to be photostable.
Example 4 2g of 2-(benzotriazole-2-yl)-4-(1,1,3,3-tetramethylbutyl)-6-(1-hexen-3-yl)-phenol and a trace of "Lindlar catalyst" (Fluka) in 25 ml of hexane was hydrogenated for 5 hours under normal pressure of hydrogen. Then the reaction mixture was filtered and concentrated to yield 2g of 2-(benzotriazole-2-yl)-4-(1,1,3,3-tetramethylbutyl)-6-(3-hexyl) -phenol as an orange liquid. UV(CH2C12): 306 nm (15' 121) and 346 nm (13' 120);
MS: 407 (Mt), 336 (100%).
The product is easily mixable with cosmetic solverts like e.g. Cetiol LC
(Cocoyl caprylate caprate). When irradiated in high dilution with a Heraeus 150 W Hg-lamp the product has been shown to be photostable.
Example 5 Preparation of a O/W anionic sunscreen lotion UV-B and UV-A:
Broad spectrum sunscreen lotion containing 4% of a compound of example 4.
wt.% compound supplier chemical name Part A
3 PARSOL MCX Octyl methoxycinnamate 4 product of example 4 3 PARSOL 500 4-Methylbenzylidene camphor 4 PARSOL 1789 4-t-Butyl-4'-methoxy-dibenzoyl-methane 2 Glyceryl monostearate Glyceryl stearate 2 Cetyl alcohol extra Cetyl alcohol 2 Ganex V-220 2) PVP/Eicosene copolymer 4 Ceraphyl 375 2) Isostearyl neopentanoate 4 Ceraphyl 847 2) Octyldodecyl stearoyl stearate 2 Amphisol K 1) Potassium cetylphosphate 0.1 Edeta BD Disodium EDTA
0.6 Phenonip 3) Phenoxyethanol & Methyl-, Ethyl-, Propyl- & Butyl-paraben Part B
11.15 water deion. water deion.
50 Carbopo1934 1% solution 4) Carbomer 5 Propyleneglycol 1,2-Propanediol * Trademark 0.15 Nipagin M 3) Methylparaben 3 KOH (10%) Potassium hydroxyde q.s. Perfume oil Fragrance Part A is heated in a reactor to 85 C. When homogeneous, add Part B, followed by addition of preheated KOH (75 C), cooling and degassing of the emulsion.
Example 6 Preparation of a O/W sunscreen lotion UV-B and UV-A:
1o Broad spectrum sunscreen lotion containing 2% of a compound of example 3.
wt.% compound supplier chemical name 2 PARSOL MCX Octyl methoxycinnamate 2 product of example 3 3 PARSOL 1789 4-t-Butyl-4'-methoxy-dibenzoyl-methane 12 Cetiol LC 6) Cocoyl-caprylate/caprate 4 Dermol 185 6) Isostearyl neopentanoate 0.25 Diethyleneglycol monostearate PEG-2-stearate 1 Cetylalcohol Cetylalcohol 0.25 MPOB/PPOB Methyl-propylparabene 0.1 EDTA BD EDTA-sodium salt I Amphisol DEA 1) Diethanolamine cetylphosphate Part B
20 Permulene TR-1 (+%) 4) Acrylate C10-C30 Alkylacrylate 48.6 water deion. water deion.
* Trademark Propyleneglycol 1,2-Propanediol 0.8 KOH (10%) Potassium hydroxyde 5 Part A is heated in a reactor to 85 C.
Part B is slowly added within 10 min., followed by addition of KOH, cooling and degassing of the emulsion.
Suppliers 1) F. HOFFMANN - LA ROCHE LTD, CH-4070 Basel / Switzerland 2) International Specialty Products ISP
3) NIPA LABORATORIES LTD, Mid Glam. - CF38 2SN / England 4) B.F. GOODRICH COMPANY, Brecksville - OH 44141 / USA
5) HENKEL K.G, Dusseldorf/Germany 6) BERNEL Chemical Co. INC. Englwood NJ. USA
Broad spectrum sunscreen lotion containing 4% of a compound of example 4.
wt.% compound supplier chemical name Part A
3 PARSOL MCX Octyl methoxycinnamate 4 product of example 4 3 PARSOL 500 4-Methylbenzylidene camphor 4 PARSOL 1789 4-t-Butyl-4'-methoxy-dibenzoyl-methane 2 Glyceryl monostearate Glyceryl stearate 2 Cetyl alcohol extra Cetyl alcohol 2 Ganex V-220 2) PVP/Eicosene copolymer 4 Ceraphyl 375 2) Isostearyl neopentanoate 4 Ceraphyl 847 2) Octyldodecyl stearoyl stearate 2 Amphisol K 1) Potassium cetylphosphate 0.1 Edeta BD Disodium EDTA
0.6 Phenonip 3) Phenoxyethanol & Methyl-, Ethyl-, Propyl- & Butyl-paraben Part B
11.15 water deion. water deion.
50 Carbopo1934 1% solution 4) Carbomer 5 Propyleneglycol 1,2-Propanediol * Trademark 0.15 Nipagin M 3) Methylparaben 3 KOH (10%) Potassium hydroxyde q.s. Perfume oil Fragrance Part A is heated in a reactor to 85 C. When homogeneous, add Part B, followed by addition of preheated KOH (75 C), cooling and degassing of the emulsion.
Example 6 Preparation of a O/W sunscreen lotion UV-B and UV-A:
1o Broad spectrum sunscreen lotion containing 2% of a compound of example 3.
wt.% compound supplier chemical name 2 PARSOL MCX Octyl methoxycinnamate 2 product of example 3 3 PARSOL 1789 4-t-Butyl-4'-methoxy-dibenzoyl-methane 12 Cetiol LC 6) Cocoyl-caprylate/caprate 4 Dermol 185 6) Isostearyl neopentanoate 0.25 Diethyleneglycol monostearate PEG-2-stearate 1 Cetylalcohol Cetylalcohol 0.25 MPOB/PPOB Methyl-propylparabene 0.1 EDTA BD EDTA-sodium salt I Amphisol DEA 1) Diethanolamine cetylphosphate Part B
20 Permulene TR-1 (+%) 4) Acrylate C10-C30 Alkylacrylate 48.6 water deion. water deion.
* Trademark Propyleneglycol 1,2-Propanediol 0.8 KOH (10%) Potassium hydroxyde 5 Part A is heated in a reactor to 85 C.
Part B is slowly added within 10 min., followed by addition of KOH, cooling and degassing of the emulsion.
Suppliers 1) F. HOFFMANN - LA ROCHE LTD, CH-4070 Basel / Switzerland 2) International Specialty Products ISP
3) NIPA LABORATORIES LTD, Mid Glam. - CF38 2SN / England 4) B.F. GOODRICH COMPANY, Brecksville - OH 44141 / USA
5) HENKEL K.G, Dusseldorf/Germany 6) BERNEL Chemical Co. INC. Englwood NJ. USA
Claims (9)
1. A cosmetic or dermatological light screening composition comprising a compound of the general formula I
wherein R1 is alkyl; R2, R3, R4, R5 and R6 are, independently, hydrogen, alkyl or alkenyl; X is hydrogen, halogen, alkyl or alkoxy; and the dotted bond is an optional bond, with the proviso that one of R4 and R5 is alkyl having at least 2 carbon atoms or is alkenyl;
and a carrier material conventionally used in such compositions.
wherein R1 is alkyl; R2, R3, R4, R5 and R6 are, independently, hydrogen, alkyl or alkenyl; X is hydrogen, halogen, alkyl or alkoxy; and the dotted bond is an optional bond, with the proviso that one of R4 and R5 is alkyl having at least 2 carbon atoms or is alkenyl;
and a carrier material conventionally used in such compositions.
2. The composition as in claim 1 wherein the compound of formula I is selected from the group consisting of 2-(benzotriazole-2-yl)-4-methyl-6-(1-octen-3-yl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3-octen-2-yl)-phenol, 2-(benzotriazole-2-yl)-4-(1,1,3,3-tetramethylbutyl)-6-(1-hexen-3-yl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(1-decen-3-yl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(1-hexen-3-yl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(1-dodecen-3-yl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(1-hexadecen-3-yl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3-octyl)-phenol, 2-(benzotriazole-2-yl)-4-(1,1,3,3-tetramethylbutyl)-6-(3-hexyl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3-hexyl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3-decyl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3-decyl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3-dodecyl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3-hexadecyl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-2-octenyl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-3-octyl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-1-octen-3-yl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-3-octen-2-yl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-2,6-octadienyl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-1,t-octadienyl)-phenol and 2-(benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-3,6-octadienyl phenol.
3. The composition as in claim 1 wherein the compound of the formula I is 2-(benzotriazole-2-yl)-4-methyl-6-(1-octen-3-yl)-phenol, 2-(benzotriazole-2-yl)-
4-(1,1,3,3-tetramethylbutyl)-6-(1-hexen-3-yl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3-octyl)-phenol or 2-(benzotriazole-2-yl)-4-(1,1,3,3-tetramethylbutyl)-6-(3-hexyl)-phenol.
4. The cosmetic or dermatological light screening composition of claim 1 wherein the compound of formula I is 2-(benzotriazole-2-yl)-4-methyl-6-(3-octen-2-yl)-phenol.
4. The cosmetic or dermatological light screening composition of claim 1 wherein the compound of formula I is 2-(benzotriazole-2-yl)-4-methyl-6-(3-octen-2-yl)-phenol.
5. The composition as in any one of claims 1 to 4 which comprises at least one additional UV-A and/or UV-B screening agent.
6. Use of a compound selected from the group consisting of 2-(benzotriazole-2-yl)-4-methyl-6-(1-octen-3-yl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3-octen-2-yl)-phenol, 2-(benzotriazole-2-yl)-4-(1,1,3,3-tetramethylbutyl)-6-(1-hexen-3-yl)-phenol, 2-(benezotriazole-2-yl)-4-methyl-6-(1-decen-3-yl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(1-hexen-3-yl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(1-dodecen-3-yl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(1-hexadecen-3-yl)-phenol, 2-(benzotriazole-2-yl)-4-(1,1,3,3-tetramethylbutyl)-6-(3-hexyl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3-hexyl)-phenol, 2-(benzotriazole-2-yl)-methyl-6-(3,7-dimethyl-2-octenyl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-3-octyl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-1-octen-3-yl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-3-octen-2-yl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-2,6-octadienyl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-1,6-octadienyl)-phenol and 2-(benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-3,6-octadienyl)-phenol as a UV
light screening agent.
light screening agent.
7. The use as in claim 6 wherein the compound of the formula I is selected from the group consisting of 2-(benzotriazole-2-yl)-4-methyl-6-(1-octen-3-yl)-phenol, 2-(benzotriazole-2-yl)-4-(1,1,3,3-tetramethylbutyl)-6-(1-hexen-3-yl)-phenol, and (benzotriazole-2-yl)-4-(1,1,3,3-tetramethylbutyl)-6-(3-hexyl)-phenol.
8. The use as in claim 6 wherein the compound of the formula I is 2-(benzotriazole-2-yl)-4-methyl-6-(1-octen-3-yl)-phenol.
9. Compound selected from the group consisting of 2-(benzotriazole-2-yl)-4-methyl-6-(1-octen-3-yl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3-octen-2-yl)-phenol, 2-(benzotriazole-2-yl)-4-(1,1,3,3-tetramethylbutyl)-6-(1-hexen-3-yl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(1-decen-3-yl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(1-hexen-3-yl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(1-dodecen-3-yl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(1-hexadecen-3-yl)-phenol, 2-(benzotriazole-2-yl)-4-(1,1,3,3-tetramethylbutyl)-6-(3-hexyl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3-hexyl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-2-octenyl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-3-octyl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-1-octen-3-yl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-3-octen-2-yl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-2,6-octadienyl)-phenol, 2-(benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-1,6-octadienyl)-phenol and 2-(benzotriazole-2-yl)-4-methyl-6-(3,7-dimethyl-3,6-octadienyl)-phenol.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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EP00103592.2 | 2000-02-21 | ||
EP00103592 | 2000-02-21 |
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CA2337586A1 CA2337586A1 (en) | 2001-08-21 |
CA2337586C true CA2337586C (en) | 2008-08-05 |
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CA002337586A Expired - Fee Related CA2337586C (en) | 2000-02-21 | 2001-02-20 | Alkylation process and novel hydroxyphenylbenztriazoles |
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US (1) | US6489486B2 (en) |
JP (1) | JP2001278870A (en) |
KR (1) | KR100745864B1 (en) |
CN (1) | CN1247549C (en) |
AU (1) | AU778933B2 (en) |
BR (1) | BR0100650A (en) |
CA (1) | CA2337586C (en) |
ES (1) | ES2392394T3 (en) |
ID (1) | ID29324A (en) |
MX (1) | MXPA01001857A (en) |
NO (1) | NO20010803L (en) |
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ATE456605T1 (en) * | 2002-07-16 | 2010-02-15 | Dsm Ip Assets Bv | SUNSCREEN |
JP2005289916A (en) * | 2004-04-01 | 2005-10-20 | Shiseido Co Ltd | Ultraviolet absorber and skin external preparation containing the same |
US8361446B2 (en) * | 2005-04-28 | 2013-01-29 | Basf Se | Use of benzotriazole derivatives for photostabilisation |
EP2192143B1 (en) * | 2008-12-01 | 2011-09-07 | DSM IP Assets B.V. | Novel method |
US8481775B2 (en) * | 2008-12-01 | 2013-07-09 | Dsm Ip Assets B.V. | Method for improving the color index of organopolysiloxanes |
CN103126673B (en) | 2011-11-25 | 2016-08-03 | 东芝医疗系统株式会社 | A kind of apparatus and method for determining trigger timing that CE-MRA scans |
CN106699677B (en) * | 2016-12-28 | 2019-07-09 | 利安隆(中卫)新材料有限公司 | The preparation method of ultraviolet absorbing agent UV-571 |
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BE630549A (en) * | 1961-06-16 | |||
US4373060A (en) * | 1980-05-30 | 1983-02-08 | General Electric Company | Silicone coating for unprimed plastic substrate and coated articles |
US4316033A (en) | 1980-05-30 | 1982-02-16 | General Electric Company | Alkoxysilylbenzotriazoles |
US4349602A (en) | 1980-05-30 | 1982-09-14 | General Electric Company | Substrates coated with a thermoset acrylic primer and an alkoxysilylbenzotriazole UV stabilizer |
US4812575A (en) | 1983-09-29 | 1989-03-14 | The United States Of America As Represented By The United States Department Of Energy | Process for the preparation of benozotriazoles and their polymers, and 2(2-hydroxy-5-isopropenylphenyl)2H-benzotriazole produced thereby |
US4587346A (en) | 1985-01-22 | 1986-05-06 | Ciba-Geigy Corporation | Liquid 2-(2-hydroxy-3-higher branched alkyl-5-methyl-phenyl)-2H-benzotriazole mixtures, stabilized compositions and processes for preparing liquid mixtures |
JPS63250647A (en) * | 1987-04-07 | 1988-10-18 | Konica Corp | Method for processing silver halide photographic sensitive material |
GB8720365D0 (en) * | 1987-08-28 | 1987-10-07 | Sandoz Ltd | Organic compounds |
JPH04187679A (en) * | 1990-11-20 | 1992-07-06 | Shipuro Kasei Kk | Preparation of 2-(2-hydroxyphenyl)benzotriazole derivative |
US5164462A (en) * | 1991-04-25 | 1992-11-17 | Allergan, Inc. | Ultraviolet light absorbing compounds and silicone compositions |
US5352753A (en) * | 1991-04-25 | 1994-10-04 | Allergan, Inc. | Ultraviolet light absorbing compounds, silicone compositions and methods for making same |
JPH0598242A (en) * | 1991-09-25 | 1993-04-20 | Shipuro Kasei Kk | Liquid ultraviolet absorber and its production |
CH693032A5 (en) * | 1996-11-07 | 2003-01-31 | Ciba Sc Holding Ag | Benzotriazole UV absorbent with increased durability. |
JPH10212469A (en) * | 1997-01-28 | 1998-08-11 | Dai Ichi Kogyo Seiyaku Co Ltd | Ultraviolet absorber |
JPH11295855A (en) * | 1998-04-09 | 1999-10-29 | Konica Corp | Halogenated silver photographic sensitive material container |
JPH11295848A (en) * | 1998-04-09 | 1999-10-29 | Konica Corp | Heat-developable photosensitive material |
-
2001
- 2001-01-18 US US09/765,268 patent/US6489486B2/en not_active Expired - Lifetime
- 2001-02-09 ID IDP20010121D patent/ID29324A/en unknown
- 2001-02-16 NO NO20010803A patent/NO20010803L/en not_active Application Discontinuation
- 2001-02-20 CA CA002337586A patent/CA2337586C/en not_active Expired - Fee Related
- 2001-02-20 MX MXPA01001857A patent/MXPA01001857A/en unknown
- 2001-02-20 KR KR1020010008319A patent/KR100745864B1/en not_active IP Right Cessation
- 2001-02-20 BR BR0100650-9A patent/BR0100650A/en not_active Application Discontinuation
- 2001-02-21 ES ES01104114T patent/ES2392394T3/en not_active Expired - Lifetime
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- 2001-02-21 JP JP2001044831A patent/JP2001278870A/en active Pending
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MXPA01001857A (en) | 2002-08-06 |
AU2316101A (en) | 2001-08-23 |
AU778933B2 (en) | 2004-12-23 |
ES2392394T3 (en) | 2012-12-10 |
ID29324A (en) | 2001-08-23 |
US20010023293A1 (en) | 2001-09-20 |
KR100745864B1 (en) | 2007-08-02 |
US6489486B2 (en) | 2002-12-03 |
CN1310178A (en) | 2001-08-29 |
NO20010803D0 (en) | 2001-02-16 |
KR20010083184A (en) | 2001-08-31 |
CA2337586A1 (en) | 2001-08-21 |
BR0100650A (en) | 2001-10-09 |
JP2001278870A (en) | 2001-10-10 |
NO20010803L (en) | 2001-08-22 |
CN1247549C (en) | 2006-03-29 |
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