CA2314668A1 - Surface-active photoinitiators - Google Patents
Surface-active photoinitiators Download PDFInfo
- Publication number
- CA2314668A1 CA2314668A1 CA002314668A CA2314668A CA2314668A1 CA 2314668 A1 CA2314668 A1 CA 2314668A1 CA 002314668 A CA002314668 A CA 002314668A CA 2314668 A CA2314668 A CA 2314668A CA 2314668 A1 CA2314668 A1 CA 2314668A1
- Authority
- CA
- Canada
- Prior art keywords
- formula
- photoinitiator
- compounds
- mixture
- radical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000000203 mixture Substances 0.000 claims abstract description 162
- 238000009472 formulation Methods 0.000 claims abstract description 46
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 20
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 15
- 239000001257 hydrogen Substances 0.000 claims abstract description 11
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims abstract 7
- 150000001875 compounds Chemical class 0.000 claims description 100
- -1 siloxanes Chemical class 0.000 claims description 81
- 238000000034 method Methods 0.000 claims description 60
- 238000000576 coating method Methods 0.000 claims description 55
- 230000008569 process Effects 0.000 claims description 30
- 229920005989 resin Polymers 0.000 claims description 27
- 239000011347 resin Substances 0.000 claims description 27
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 26
- 239000008199 coating composition Substances 0.000 claims description 24
- 239000000843 powder Substances 0.000 claims description 24
- 229910052757 nitrogen Inorganic materials 0.000 claims description 19
- 239000000758 substrate Substances 0.000 claims description 19
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 18
- 238000002360 preparation method Methods 0.000 claims description 18
- 239000000654 additive Substances 0.000 claims description 14
- 239000011230 binding agent Substances 0.000 claims description 14
- 229920005862 polyol Polymers 0.000 claims description 13
- 229920000877 Melamine resin Polymers 0.000 claims description 12
- 229920000058 polyacrylate Polymers 0.000 claims description 12
- 150000003077 polyols Chemical class 0.000 claims description 11
- 239000007858 starting material Substances 0.000 claims description 10
- 239000005056 polyisocyanate Substances 0.000 claims description 9
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 8
- 229920001228 polyisocyanate Polymers 0.000 claims description 8
- 230000009471 action Effects 0.000 claims description 7
- 230000005670 electromagnetic radiation Effects 0.000 claims description 7
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 7
- 229910052736 halogen Inorganic materials 0.000 claims description 6
- 150000002367 halogens Chemical group 0.000 claims description 6
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 claims description 6
- 239000003365 glass fiber Substances 0.000 claims description 4
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 4
- 239000002131 composite material Substances 0.000 claims description 3
- 229920000582 polyisocyanurate Polymers 0.000 claims description 3
- 230000003678 scratch resistant effect Effects 0.000 claims description 3
- 125000000882 C2-C6 alkenyl group Chemical group 0.000 claims description 2
- 150000007974 melamines Chemical class 0.000 claims description 2
- 239000011495 polyisocyanurate Substances 0.000 claims description 2
- 150000002431 hydrogen Chemical class 0.000 claims 3
- 125000004642 (C1-C12) alkoxy group Chemical group 0.000 claims 2
- 125000004648 C2-C8 alkenyl group Chemical group 0.000 claims 2
- 125000002861 (C1-C4) alkanoyl group Chemical group 0.000 claims 1
- 125000006552 (C3-C8) cycloalkyl group Chemical group 0.000 claims 1
- 229920005906 polyester polyol Polymers 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 abstract description 11
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 268
- 239000000306 component Substances 0.000 description 65
- 229910014033 C-OH Inorganic materials 0.000 description 50
- 229910014570 C—OH Inorganic materials 0.000 description 50
- 238000005160 1H NMR spectroscopy Methods 0.000 description 31
- 239000003054 catalyst Substances 0.000 description 28
- 238000006243 chemical reaction Methods 0.000 description 27
- 239000003999 initiator Substances 0.000 description 25
- 229910052799 carbon Inorganic materials 0.000 description 23
- 150000003254 radicals Chemical class 0.000 description 23
- 238000001723 curing Methods 0.000 description 22
- 239000000047 product Substances 0.000 description 22
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 21
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 21
- 229920000642 polymer Polymers 0.000 description 21
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 20
- 239000011248 coating agent Substances 0.000 description 20
- 229920001577 copolymer Polymers 0.000 description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 19
- YYCUCYKNOQSLPT-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-(4-prop-2-enoxyphenyl)propan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=C(OCC=C)C=C1 YYCUCYKNOQSLPT-UHFFFAOYSA-N 0.000 description 18
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 18
- 229940048053 acrylate Drugs 0.000 description 18
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 18
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 17
- 229910052751 metal Inorganic materials 0.000 description 17
- 239000002184 metal Substances 0.000 description 17
- 239000002904 solvent Substances 0.000 description 17
- 239000002253 acid Substances 0.000 description 15
- 239000004814 polyurethane Substances 0.000 description 15
- 229920002635 polyurethane Polymers 0.000 description 15
- 239000000243 solution Substances 0.000 description 14
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 13
- 101150041968 CDC13 gene Proteins 0.000 description 12
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 12
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 12
- 125000000524 functional group Chemical group 0.000 description 12
- 239000000178 monomer Substances 0.000 description 12
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 12
- 239000004593 Epoxy Substances 0.000 description 11
- 125000001931 aliphatic group Chemical group 0.000 description 11
- 150000001412 amines Chemical class 0.000 description 11
- 239000000049 pigment Substances 0.000 description 11
- 229920000728 polyester Polymers 0.000 description 11
- 239000012948 isocyanate Substances 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 10
- 229920000647 polyepoxide Polymers 0.000 description 10
- 238000001228 spectrum Methods 0.000 description 10
- SWGZAKPJNWCPRY-UHFFFAOYSA-N methyl-bis(trimethylsilyloxy)silicon Chemical compound C[Si](C)(C)O[Si](C)O[Si](C)(C)C SWGZAKPJNWCPRY-UHFFFAOYSA-N 0.000 description 9
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 8
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 8
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 8
- 150000001735 carboxylic acids Chemical class 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 7
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 7
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 7
- 229910018557 Si O Inorganic materials 0.000 description 7
- 125000003277 amino group Chemical group 0.000 description 7
- 125000004432 carbon atom Chemical group C* 0.000 description 7
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 7
- 150000002513 isocyanates Chemical class 0.000 description 7
- 229940063557 methacrylate Drugs 0.000 description 7
- 229920000570 polyether Polymers 0.000 description 7
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- 239000000600 sorbitol Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 6
- 229910003849 O-Si Inorganic materials 0.000 description 6
- 229910003872 O—Si Inorganic materials 0.000 description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 238000007792 addition Methods 0.000 description 6
- 150000002148 esters Chemical class 0.000 description 6
- 238000001914 filtration Methods 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- 150000002739 metals Chemical class 0.000 description 6
- 239000000725 suspension Substances 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 5
- 239000004721 Polyphenylene oxide Substances 0.000 description 5
- 229910018560 Si IN Inorganic materials 0.000 description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 5
- 125000002947 alkylene group Chemical group 0.000 description 5
- 125000003118 aryl group Chemical group 0.000 description 5
- 239000012965 benzophenone Substances 0.000 description 5
- BJFLSHMHTPAZHO-UHFFFAOYSA-N benzotriazole Chemical compound [CH]1C=CC=C2N=NN=C21 BJFLSHMHTPAZHO-UHFFFAOYSA-N 0.000 description 5
- 239000012964 benzotriazole Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000000470 constituent Substances 0.000 description 5
- 150000002009 diols Chemical class 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 239000000975 dye Substances 0.000 description 5
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical class OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 5
- 239000004922 lacquer Substances 0.000 description 5
- 238000001819 mass spectrum Methods 0.000 description 5
- 229940091868 melamine Drugs 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000001029 thermal curing Methods 0.000 description 5
- 239000002023 wood Substances 0.000 description 5
- 229910052725 zinc Inorganic materials 0.000 description 5
- 239000011701 zinc Substances 0.000 description 5
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 4
- DJRWYZYGAQGXSC-UHFFFAOYSA-N 2-methyl-2-prop-2-enoxy-1-(4-prop-2-enoxyphenyl)propan-1-one Chemical compound C=CCOC(C)(C)C(=O)C1=CC=C(OCC=C)C=C1 DJRWYZYGAQGXSC-UHFFFAOYSA-N 0.000 description 4
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 4
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- 239000007983 Tris buffer Substances 0.000 description 4
- 229920000180 alkyd Polymers 0.000 description 4
- MDFFNEOEWAXZRQ-UHFFFAOYSA-N aminyl Chemical compound [NH2] MDFFNEOEWAXZRQ-UHFFFAOYSA-N 0.000 description 4
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 4
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 4
- 229910052794 bromium Inorganic materials 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- 238000006482 condensation reaction Methods 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 4
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 239000012074 organic phase Substances 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000003973 paint Substances 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- 229920006305 unsaturated polyester Polymers 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 3
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 3
- SITYOOWCYAYOKL-UHFFFAOYSA-N 2-[4,6-bis(2,4-dimethylphenyl)-1,3,5-triazin-2-yl]-5-(3-dodecoxy-2-hydroxypropoxy)phenol Chemical compound OC1=CC(OCC(O)COCCCCCCCCCCCC)=CC=C1C1=NC(C=2C(=CC(C)=CC=2)C)=NC(C=2C(=CC(C)=CC=2)C)=N1 SITYOOWCYAYOKL-UHFFFAOYSA-N 0.000 description 3
- RXFCIXRFAJRBSG-UHFFFAOYSA-N 3,2,3-tetramine Chemical compound NCCCNCCNCCCN RXFCIXRFAJRBSG-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Natural products CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 3
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- 238000005481 NMR spectroscopy Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- 239000004952 Polyamide Substances 0.000 description 3
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 3
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 3
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 3
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 3
- 239000006096 absorbing agent Substances 0.000 description 3
- 150000003926 acrylamides Chemical class 0.000 description 3
- 238000007259 addition reaction Methods 0.000 description 3
- 150000008064 anhydrides Chemical class 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 3
- RSOILICUEWXSLA-UHFFFAOYSA-N bis(1,2,2,6,6-pentamethylpiperidin-4-yl) decanedioate Chemical compound C1C(C)(C)N(C)C(C)(C)CC1OC(=O)CCCCCCCCC(=O)OC1CC(C)(C)N(C)C(C)(C)C1 RSOILICUEWXSLA-UHFFFAOYSA-N 0.000 description 3
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 3
- 239000011093 chipboard Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 239000003431 cross linking reagent Substances 0.000 description 3
- 229910021419 crystalline silicon Inorganic materials 0.000 description 3
- 125000004122 cyclic group Chemical group 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 150000002170 ethers Chemical class 0.000 description 3
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 3
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 3
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 3
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 235000013980 iron oxide Nutrition 0.000 description 3
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 3
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 3
- 229910052748 manganese Inorganic materials 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910001507 metal halide Inorganic materials 0.000 description 3
- 150000005309 metal halides Chemical class 0.000 description 3
- 229940102838 methylmethacrylate Drugs 0.000 description 3
- 238000004452 microanalysis Methods 0.000 description 3
- UKJARPDLRWBRAX-UHFFFAOYSA-N n,n'-bis(2,2,6,6-tetramethylpiperidin-4-yl)hexane-1,6-diamine Chemical compound C1C(C)(C)NC(C)(C)CC1NCCCCCCNC1CC(C)(C)NC(C)(C)C1 UKJARPDLRWBRAX-UHFFFAOYSA-N 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 239000000123 paper Substances 0.000 description 3
- 229960003742 phenol Drugs 0.000 description 3
- 150000003003 phosphines Chemical class 0.000 description 3
- 238000000016 photochemical curing Methods 0.000 description 3
- 229920000768 polyamine Polymers 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- 229920001169 thermoplastic Polymers 0.000 description 3
- 239000004416 thermosoftening plastic Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229940096522 trimethylolpropane triacrylate Drugs 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- 229910052726 zirconium Inorganic materials 0.000 description 3
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 2
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- VNQXSTWCDUXYEZ-UHFFFAOYSA-N 1,7,7-trimethylbicyclo[2.2.1]heptane-2,3-dione Chemical compound C1CC2(C)C(=O)C(=O)C1C2(C)C VNQXSTWCDUXYEZ-UHFFFAOYSA-N 0.000 description 2
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical group CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- GXURZKWLMYOCDX-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)propane-1,3-diol;dihydroxyphosphanyl dihydrogen phosphite Chemical compound OP(O)OP(O)O.OCC(CO)(CO)CO GXURZKWLMYOCDX-UHFFFAOYSA-N 0.000 description 2
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical group CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 2
- HCLJOFJIQIJXHS-UHFFFAOYSA-N 2-[2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOCCOC(=O)C=C HCLJOFJIQIJXHS-UHFFFAOYSA-N 0.000 description 2
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 2
- PTJWCLYPVFJWMP-UHFFFAOYSA-N 2-[[3-hydroxy-2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)COCC(CO)(CO)CO PTJWCLYPVFJWMP-UHFFFAOYSA-N 0.000 description 2
- JECYUBVRTQDVAT-UHFFFAOYSA-N 2-acetylphenol Chemical compound CC(=O)C1=CC=CC=C1O JECYUBVRTQDVAT-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- 229910014559 C-Si-O Inorganic materials 0.000 description 2
- 125000006519 CCH3 Chemical group 0.000 description 2
- 102100038916 Caspase-5 Human genes 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 2
- 101100112336 Homo sapiens CASP5 gene Proteins 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- 101100273286 Mus musculus Casp4 gene Proteins 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 2
- 239000005062 Polybutadiene Substances 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- QQONPFPTGQHPMA-UHFFFAOYSA-N Propene Chemical compound CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 2
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 229940081735 acetylcellulose Drugs 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 239000004411 aluminium Substances 0.000 description 2
- 235000010210 aluminium Nutrition 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 2
- 150000004056 anthraquinones Chemical class 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- KXHPPCXNWTUNSB-UHFFFAOYSA-M benzyl(trimethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)(C)CC1=CC=CC=C1 KXHPPCXNWTUNSB-UHFFFAOYSA-M 0.000 description 2
- 229930006711 bornane-2,3-dione Natural products 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- 150000007942 carboxylates Chemical class 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 238000004587 chromatography analysis Methods 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 230000000295 complement effect Effects 0.000 description 2
- 238000004590 computer program Methods 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 239000007859 condensation product Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 150000004985 diamines Chemical class 0.000 description 2
- 239000012975 dibutyltin dilaurate Substances 0.000 description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 description 2
- 125000005442 diisocyanate group Chemical group 0.000 description 2
- 229960001760 dimethyl sulfoxide Drugs 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000009977 dual effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000839 emulsion Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 2
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 238000003818 flash chromatography Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 239000012949 free radical photoinitiator Substances 0.000 description 2
- 239000001530 fumaric acid Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 150000004658 ketimines Chemical class 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 229910052745 lead Inorganic materials 0.000 description 2
- 239000004611 light stabiliser Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 150000002736 metal compounds Chemical class 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- UJRDRFZCRQNLJM-UHFFFAOYSA-N methyl 3-[3-(benzotriazol-2-yl)-5-tert-butyl-4-hydroxyphenyl]propanoate Chemical compound CC(C)(C)C1=CC(CCC(=O)OC)=CC(N2N=C3C=CC=CC3=N2)=C1O UJRDRFZCRQNLJM-UHFFFAOYSA-N 0.000 description 2
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 description 2
- 125000002757 morpholinyl group Chemical group 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 239000012860 organic pigment Substances 0.000 description 2
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical class C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 2
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 2
- 239000003208 petroleum Substances 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- PZXHOJFANUNWGC-UHFFFAOYSA-N phenyl 2-oxoacetate Chemical class O=CC(=O)OC1=CC=CC=C1 PZXHOJFANUNWGC-UHFFFAOYSA-N 0.000 description 2
- ZQBAKBUEJOMQEX-UHFFFAOYSA-N phenyl salicylate Chemical compound OC1=CC=CC=C1C(=O)OC1=CC=CC=C1 ZQBAKBUEJOMQEX-UHFFFAOYSA-N 0.000 description 2
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 2
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 125000003386 piperidinyl group Chemical group 0.000 description 2
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920002857 polybutadiene Polymers 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 239000004848 polyfunctional curative Substances 0.000 description 2
- 229920001195 polyisoprene Polymers 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- UOHMMEJUHBCKEE-UHFFFAOYSA-N prehnitene Chemical compound CC1=CC=C(C)C(C)=C1C UOHMMEJUHBCKEE-UHFFFAOYSA-N 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- MWWATHDPGQKSAR-UHFFFAOYSA-N propyne Chemical group CC#C MWWATHDPGQKSAR-UHFFFAOYSA-N 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000003847 radiation curing Methods 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical compound OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 2
- 150000003573 thiols Chemical class 0.000 description 2
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- XFNJVJPLKCPIBV-UHFFFAOYSA-N trimethylenediamine Chemical compound NCCCN XFNJVJPLKCPIBV-UHFFFAOYSA-N 0.000 description 2
- 229920006337 unsaturated polyester resin Polymers 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- 150000003673 urethanes Chemical class 0.000 description 2
- 238000009736 wetting Methods 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- 235000014692 zinc oxide Nutrition 0.000 description 2
- DNIAPMSPPWPWGF-VKHMYHEASA-N (+)-propylene glycol Chemical compound C[C@H](O)CO DNIAPMSPPWPWGF-VKHMYHEASA-N 0.000 description 1
- BJGZXKKYBXZLAM-UHFFFAOYSA-N (2,4-ditert-butyl-6-methylphenyl) 3,5-ditert-butyl-4-hydroxybenzoate Chemical compound CC1=CC(C(C)(C)C)=CC(C(C)(C)C)=C1OC(=O)C1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 BJGZXKKYBXZLAM-UHFFFAOYSA-N 0.000 description 1
- KJYSXRBJOSZLEL-UHFFFAOYSA-N (2,4-ditert-butylphenyl) 3,5-ditert-butyl-4-hydroxybenzoate Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC=C1OC(=O)C1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 KJYSXRBJOSZLEL-UHFFFAOYSA-N 0.000 description 1
- HQEPZWYPQQKFLU-UHFFFAOYSA-N (2,6-dihydroxyphenyl)-phenylmethanone Chemical compound OC1=CC=CC(O)=C1C(=O)C1=CC=CC=C1 HQEPZWYPQQKFLU-UHFFFAOYSA-N 0.000 description 1
- HJIAMFHSAAEUKR-UHFFFAOYSA-N (2-hydroxyphenyl)-phenylmethanone Chemical class OC1=CC=CC=C1C(=O)C1=CC=CC=C1 HJIAMFHSAAEUKR-UHFFFAOYSA-N 0.000 description 1
- ATLWFAZCZPSXII-UHFFFAOYSA-N (2-octylphenyl) 2-hydroxybenzoate Chemical compound CCCCCCCCC1=CC=CC=C1OC(=O)C1=CC=CC=C1O ATLWFAZCZPSXII-UHFFFAOYSA-N 0.000 description 1
- LNAZSHAWQACDHT-XIYTZBAFSA-N (2r,3r,4s,5r,6s)-4,5-dimethoxy-2-(methoxymethyl)-3-[(2s,3r,4s,5r,6r)-3,4,5-trimethoxy-6-(methoxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6r)-4,5,6-trimethoxy-2-(methoxymethyl)oxan-3-yl]oxyoxane Chemical compound CO[C@@H]1[C@@H](OC)[C@H](OC)[C@@H](COC)O[C@H]1O[C@H]1[C@H](OC)[C@@H](OC)[C@H](O[C@H]2[C@@H]([C@@H](OC)[C@H](OC)O[C@@H]2COC)OC)O[C@@H]1COC LNAZSHAWQACDHT-XIYTZBAFSA-N 0.000 description 1
- UXDCSXDWLVYCQF-UHFFFAOYSA-N (3-methyloxiran-2-yl)methyl 2-methylprop-2-enoate Chemical compound CC1OC1COC(=O)C(C)=C UXDCSXDWLVYCQF-UHFFFAOYSA-N 0.000 description 1
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 1
- GOZHNJTXLALKRL-UHFFFAOYSA-N (5-benzoyl-2,4-dihydroxyphenyl)-phenylmethanone Chemical compound OC1=CC(O)=C(C(=O)C=2C=CC=CC=2)C=C1C(=O)C1=CC=CC=C1 GOZHNJTXLALKRL-UHFFFAOYSA-N 0.000 description 1
- 125000006656 (C2-C4) alkenyl group Chemical group 0.000 description 1
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- KWEKXPWNFQBJAY-UHFFFAOYSA-N (dimethyl-$l^{3}-silanyl)oxy-dimethylsilicon Chemical compound C[Si](C)O[Si](C)C KWEKXPWNFQBJAY-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- CGXOAAMIQPDTPE-UHFFFAOYSA-N 1,2,2,6,6-pentamethylpiperidin-4-amine Chemical compound CN1C(C)(C)CC(N)CC1(C)C CGXOAAMIQPDTPE-UHFFFAOYSA-N 0.000 description 1
- NWHNXXMYEICZAT-UHFFFAOYSA-N 1,2,2,6,6-pentamethylpiperidin-4-ol Chemical compound CN1C(C)(C)CC(O)CC1(C)C NWHNXXMYEICZAT-UHFFFAOYSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- KOMNUTZXSVSERR-UHFFFAOYSA-N 1,3,5-tris(prop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical compound C=CCN1C(=O)N(CC=C)C(=O)N(CC=C)C1=O KOMNUTZXSVSERR-UHFFFAOYSA-N 0.000 description 1
- BLWNLYFYKIIZKR-UHFFFAOYSA-N 1,3,7,9-tetratert-butyl-11-(6-methylheptoxy)-5h-benzo[d][1,3,2]benzodioxaphosphocine Chemical compound C1C2=CC(C(C)(C)C)=CC(C(C)(C)C)=C2OP(OCCCCCC(C)C)OC2=C1C=C(C(C)(C)C)C=C2C(C)(C)C BLWNLYFYKIIZKR-UHFFFAOYSA-N 0.000 description 1
- MYMKXVFDVQUQLG-UHFFFAOYSA-N 1,3,7,9-tetratert-butyl-11-fluoro-5-methyl-5h-benzo[d][1,3,2]benzodioxaphosphocine Chemical compound CC1C2=CC(C(C)(C)C)=CC(C(C)(C)C)=C2OP(F)OC2=C1C=C(C(C)(C)C)C=C2C(C)(C)C MYMKXVFDVQUQLG-UHFFFAOYSA-N 0.000 description 1
- VDYWHVQKENANGY-UHFFFAOYSA-N 1,3-Butyleneglycol dimethacrylate Chemical compound CC(=C)C(=O)OC(C)CCOC(=O)C(C)=C VDYWHVQKENANGY-UHFFFAOYSA-N 0.000 description 1
- YPFDHNVEDLHUCE-UHFFFAOYSA-N 1,3-propanediol Substances OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- 150000005208 1,4-dihydroxybenzenes Chemical class 0.000 description 1
- HUXBPJVVEDIIEO-UHFFFAOYSA-N 1-(4-hydroxyphenyl)-2-methylpropan-1-one Chemical compound CC(C)C(=O)C1=CC=C(O)C=C1 HUXBPJVVEDIIEO-UHFFFAOYSA-N 0.000 description 1
- ZDQNWDNMNKSMHI-UHFFFAOYSA-N 1-[2-(2-prop-2-enoyloxypropoxy)propoxy]propan-2-yl prop-2-enoate Chemical compound C=CC(=O)OC(C)COC(C)COCC(C)OC(=O)C=C ZDQNWDNMNKSMHI-UHFFFAOYSA-N 0.000 description 1
- 125000004973 1-butenyl group Chemical group C(=CCC)* 0.000 description 1
- NFDXQGNDWIPXQL-UHFFFAOYSA-N 1-cyclooctyldiazocane Chemical compound C1CCCCCCC1N1NCCCCCC1 NFDXQGNDWIPXQL-UHFFFAOYSA-N 0.000 description 1
- OZCMOJQQLBXBKI-UHFFFAOYSA-N 1-ethenoxy-2-methylpropane Chemical compound CC(C)COC=C OZCMOJQQLBXBKI-UHFFFAOYSA-N 0.000 description 1
- ZIKLJUUTSQYGQI-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxypropoxy)propane Chemical compound CCOCC(C)OCC(C)OCC ZIKLJUUTSQYGQI-UHFFFAOYSA-N 0.000 description 1
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 1
- 125000006039 1-hexenyl group Chemical group 0.000 description 1
- OTCWVYFQGYOYJO-UHFFFAOYSA-N 1-o-methyl 10-o-(1,2,2,6,6-pentamethylpiperidin-4-yl) decanedioate Chemical compound COC(=O)CCCCCCCCC(=O)OC1CC(C)(C)N(C)C(C)(C)C1 OTCWVYFQGYOYJO-UHFFFAOYSA-N 0.000 description 1
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical group CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 1
- BUZMJVBOGDBMGI-UHFFFAOYSA-N 1-phenylpropylbenzene Chemical compound C=1C=CC=CC=1C(CC)C1=CC=CC=C1 BUZMJVBOGDBMGI-UHFFFAOYSA-N 0.000 description 1
- VOBUAPTXJKMNCT-UHFFFAOYSA-N 1-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound CCCCCC(OC(=O)C=C)OC(=O)C=C VOBUAPTXJKMNCT-UHFFFAOYSA-N 0.000 description 1
- YIKSHDNOAYSSPX-UHFFFAOYSA-N 1-propan-2-ylthioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2C(C)C YIKSHDNOAYSSPX-UHFFFAOYSA-N 0.000 description 1
- YEBQUUKDSJCPIX-UHFFFAOYSA-N 12h-benzo[a]thioxanthene Chemical compound C1=CC=CC2=C3CC4=CC=CC=C4SC3=CC=C21 YEBQUUKDSJCPIX-UHFFFAOYSA-N 0.000 description 1
- VVZRKVYGKNFTRR-UHFFFAOYSA-N 12h-benzo[a]xanthene Chemical compound C1=CC=CC2=C3CC4=CC=CC=C4OC3=CC=C21 VVZRKVYGKNFTRR-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- RKMGAJGJIURJSJ-UHFFFAOYSA-N 2,2,6,6-Tetramethylpiperidine Substances CC1(C)CCCC(C)(C)N1 RKMGAJGJIURJSJ-UHFFFAOYSA-N 0.000 description 1
- BWJKLDGAAPQXGO-UHFFFAOYSA-N 2,2,6,6-tetramethyl-4-octadecoxypiperidine Chemical compound CCCCCCCCCCCCCCCCCCOC1CC(C)(C)NC(C)(C)C1 BWJKLDGAAPQXGO-UHFFFAOYSA-N 0.000 description 1
- FTVFPPFZRRKJIH-UHFFFAOYSA-N 2,2,6,6-tetramethylpiperidin-4-amine Chemical compound CC1(C)CC(N)CC(C)(C)N1 FTVFPPFZRRKJIH-UHFFFAOYSA-N 0.000 description 1
- DCOZBPTXZNTCFM-UHFFFAOYSA-N 2,2-bis(2,2,6,6-tetramethyl-1-octoxypiperidin-3-yl)decanedioic acid Chemical compound CC1(C)N(OCCCCCCCC)C(C)(C)CCC1C(CCCCCCCC(O)=O)(C(O)=O)C1C(C)(C)N(OCCCCCCCC)C(C)(C)CC1 DCOZBPTXZNTCFM-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- QBDAFARLDLCWAT-UHFFFAOYSA-N 2,3-dihydropyran-6-one Chemical compound O=C1OCCC=C1 QBDAFARLDLCWAT-UHFFFAOYSA-N 0.000 description 1
- PUNGSQUVTIDKNU-UHFFFAOYSA-N 2,4,6,8,10-pentamethyl-1,3,5,7,9,2$l^{3},4$l^{3},6$l^{3},8$l^{3},10$l^{3}-pentaoxapentasilecane Chemical compound C[Si]1O[Si](C)O[Si](C)O[Si](C)O[Si](C)O1 PUNGSQUVTIDKNU-UHFFFAOYSA-N 0.000 description 1
- WZJUBBHODHNQPW-UHFFFAOYSA-N 2,4,6,8-tetramethyl-1,3,5,7,2$l^{3},4$l^{3},6$l^{3},8$l^{3}-tetraoxatetrasilocane Chemical compound C[Si]1O[Si](C)O[Si](C)O[Si](C)O1 WZJUBBHODHNQPW-UHFFFAOYSA-N 0.000 description 1
- PYSDCISFYPIRDA-UHFFFAOYSA-N 2,6-dichloro-4-cyclohexyl-2h-1,3,5-triazin-1-amine Chemical compound N1=C(Cl)N(N)C(Cl)N=C1C1CCCCC1 PYSDCISFYPIRDA-UHFFFAOYSA-N 0.000 description 1
- HWRLEEPNFJNTOP-UHFFFAOYSA-N 2-(1,3,5-triazin-2-yl)phenol Chemical class OC1=CC=CC=C1C1=NC=NC=N1 HWRLEEPNFJNTOP-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- QRHHZFRCJDAUNA-UHFFFAOYSA-N 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(OC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 QRHHZFRCJDAUNA-UHFFFAOYSA-N 0.000 description 1
- ZMWRRFHBXARRRT-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-4,6-bis(2-methylbutan-2-yl)phenol Chemical compound CCC(C)(C)C1=CC(C(C)(C)CC)=CC(N2N=C3C=CC=CC3=N2)=C1O ZMWRRFHBXARRRT-UHFFFAOYSA-N 0.000 description 1
- LHPPDQUVECZQSW-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-4,6-ditert-butylphenol Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC(N2N=C3C=CC=CC3=N2)=C1O LHPPDQUVECZQSW-UHFFFAOYSA-N 0.000 description 1
- IYAZLDLPUNDVAG-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-4-(2,4,4-trimethylpentan-2-yl)phenol Chemical compound CC(C)(C)CC(C)(C)C1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 IYAZLDLPUNDVAG-UHFFFAOYSA-N 0.000 description 1
- ITLDHFORLZTRJI-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-5-octoxyphenol Chemical compound OC1=CC(OCCCCCCCC)=CC=C1N1N=C2C=CC=CC2=N1 ITLDHFORLZTRJI-UHFFFAOYSA-N 0.000 description 1
- RTNVDKBRTXEWQE-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-6-butan-2-yl-4-tert-butylphenol Chemical compound CCC(C)C1=CC(C(C)(C)C)=CC(N2N=C3C=CC=CC3=N2)=C1O RTNVDKBRTXEWQE-UHFFFAOYSA-N 0.000 description 1
- VQMHSKWEJGIXGA-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-6-dodecyl-4-methylphenol Chemical compound CCCCCCCCCCCCC1=CC(C)=CC(N2N=C3C=CC=CC3=N2)=C1O VQMHSKWEJGIXGA-UHFFFAOYSA-N 0.000 description 1
- FJGQBLRYBUAASW-UHFFFAOYSA-N 2-(benzotriazol-2-yl)phenol Chemical class OC1=CC=CC=C1N1N=C2C=CC=CC2=N1 FJGQBLRYBUAASW-UHFFFAOYSA-N 0.000 description 1
- PTBAHIRKWPUZAM-UHFFFAOYSA-N 2-(oxiran-2-yl)ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC1CO1 PTBAHIRKWPUZAM-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- PFHOSZAOXCYAGJ-UHFFFAOYSA-N 2-[(2-cyano-4-methoxy-4-methylpentan-2-yl)diazenyl]-4-methoxy-2,4-dimethylpentanenitrile Chemical compound COC(C)(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)(C)OC PFHOSZAOXCYAGJ-UHFFFAOYSA-N 0.000 description 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- MCNPOZMLKGDJGP-UHFFFAOYSA-N 2-[2-(4-methoxyphenyl)ethenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(OC)=CC=C1C=CC1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 MCNPOZMLKGDJGP-UHFFFAOYSA-N 0.000 description 1
- HWSSEYVMGDIFMH-UHFFFAOYSA-N 2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOC(=O)C(C)=C HWSSEYVMGDIFMH-UHFFFAOYSA-N 0.000 description 1
- PSMYELRXRQIDAX-UHFFFAOYSA-N 2-[4,6-bis(2,4-dimethylphenyl)-1,3,5-triazin-2-yl]-5-(2-hydroxy-3-tridecoxypropoxy)phenol Chemical compound OC1=CC(OCC(O)COCCCCCCCCCCCCC)=CC=C1C1=NC(C=2C(=CC(C)=CC=2)C)=NC(C=2C(=CC(C)=CC=2)C)=N1 PSMYELRXRQIDAX-UHFFFAOYSA-N 0.000 description 1
- ZSSVCEUEVMALRD-UHFFFAOYSA-N 2-[4,6-bis(2,4-dimethylphenyl)-1,3,5-triazin-2-yl]-5-(octyloxy)phenol Chemical compound OC1=CC(OCCCCCCCC)=CC=C1C1=NC(C=2C(=CC(C)=CC=2)C)=NC(C=2C(=CC(C)=CC=2)C)=N1 ZSSVCEUEVMALRD-UHFFFAOYSA-N 0.000 description 1
- DBYBHKQEHCYBQV-UHFFFAOYSA-N 2-[4,6-bis(2,4-dimethylphenyl)-1,3,5-triazin-2-yl]-5-dodecoxyphenol Chemical compound OC1=CC(OCCCCCCCCCCCC)=CC=C1C1=NC(C=2C(=CC(C)=CC=2)C)=NC(C=2C(=CC(C)=CC=2)C)=N1 DBYBHKQEHCYBQV-UHFFFAOYSA-N 0.000 description 1
- WPMUMRCRKFBYIH-UHFFFAOYSA-N 2-[4,6-bis(2-hydroxy-4-octoxyphenyl)-1,3,5-triazin-2-yl]-5-octoxyphenol Chemical compound OC1=CC(OCCCCCCCC)=CC=C1C1=NC(C=2C(=CC(OCCCCCCCC)=CC=2)O)=NC(C=2C(=CC(OCCCCCCCC)=CC=2)O)=N1 WPMUMRCRKFBYIH-UHFFFAOYSA-N 0.000 description 1
- NPUPWUDXQCOMBF-UHFFFAOYSA-N 2-[4,6-bis(4-methylphenyl)-1,3,5-triazin-2-yl]-5-octoxyphenol Chemical compound OC1=CC(OCCCCCCCC)=CC=C1C1=NC(C=2C=CC(C)=CC=2)=NC(C=2C=CC(C)=CC=2)=N1 NPUPWUDXQCOMBF-UHFFFAOYSA-N 0.000 description 1
- HHIVRACNDKRDTF-UHFFFAOYSA-N 2-[4-(2,4-dimethylphenyl)-6-(2-hydroxy-4-propoxyphenyl)-1,3,5-triazin-2-yl]-5-propoxyphenol Chemical compound OC1=CC(OCCC)=CC=C1C1=NC(C=2C(=CC(C)=CC=2)C)=NC(C=2C(=CC(OCCC)=CC=2)O)=N1 HHIVRACNDKRDTF-UHFFFAOYSA-N 0.000 description 1
- VARDNKCBWBOEBW-UHFFFAOYSA-N 2-[4-(4-methoxyphenyl)-6-phenyl-1,3,5-triazin-2-yl]phenol Chemical compound C1=CC(OC)=CC=C1C1=NC(C=2C=CC=CC=2)=NC(C=2C(=CC=CC=2)O)=N1 VARDNKCBWBOEBW-UHFFFAOYSA-N 0.000 description 1
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 1
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 1
- DOTYDHBOKPPXRB-UHFFFAOYSA-N 2-butyl-2-[(3,5-ditert-butyl-4-hydroxyphenyl)methyl]propanedioic acid Chemical compound CCCCC(C(O)=O)(C(O)=O)CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 DOTYDHBOKPPXRB-UHFFFAOYSA-N 0.000 description 1
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- 229940093475 2-ethoxyethanol Drugs 0.000 description 1
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 1
- AWEVLIFGIMIQHY-UHFFFAOYSA-N 2-ethylhexyl 3-[3-tert-butyl-5-(5-chlorobenzotriazol-2-yl)-4-hydroxyphenyl]propanoate Chemical compound CC(C)(C)C1=CC(CCC(=O)OCC(CC)CCCC)=CC(N2N=C3C=C(Cl)C=CC3=N2)=C1O AWEVLIFGIMIQHY-UHFFFAOYSA-N 0.000 description 1
- NLGDWWCZQDIASO-UHFFFAOYSA-N 2-hydroxy-1-(7-oxabicyclo[4.1.0]hepta-1,3,5-trien-2-yl)-2-phenylethanone Chemical compound OC(C(=O)c1cccc2Oc12)c1ccccc1 NLGDWWCZQDIASO-UHFFFAOYSA-N 0.000 description 1
- FHFVUEXQSQXWSP-UHFFFAOYSA-N 2-hydroxy-2,2-dimethoxy-1-phenylethanone Chemical compound COC(O)(OC)C(=O)C1=CC=CC=C1 FHFVUEXQSQXWSP-UHFFFAOYSA-N 0.000 description 1
- 239000012957 2-hydroxy-2-methyl-1-phenylpropanone Substances 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 1
- JLZIXYIYQIKFHP-UHFFFAOYSA-N 2-methyl-1-(4-methylphenyl)-2-morpholin-4-ylpropane-1-thione Chemical compound C1=CC(C)=CC=C1C(=S)C(C)(C)N1CCOCC1 JLZIXYIYQIKFHP-UHFFFAOYSA-N 0.000 description 1
- LETDRANQSOEVCX-UHFFFAOYSA-N 2-methyl-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound CC1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 LETDRANQSOEVCX-UHFFFAOYSA-N 0.000 description 1
- UFFYQSOLZWNGSO-UHFFFAOYSA-N 2-methyl-n-[3-[1-[3-(2-methylprop-2-enoylamino)propoxy]ethoxy]propyl]prop-2-enamide Chemical compound CC(=C)C(=O)NCCCOC(C)OCCCNC(=O)C(C)=C UFFYQSOLZWNGSO-UHFFFAOYSA-N 0.000 description 1
- RUMACXVDVNRZJZ-UHFFFAOYSA-N 2-methylpropyl 2-methylprop-2-enoate Chemical compound CC(C)COC(=O)C(C)=C RUMACXVDVNRZJZ-UHFFFAOYSA-N 0.000 description 1
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 description 1
- VFZKVQVQOMDJEG-UHFFFAOYSA-N 2-prop-2-enoyloxypropyl prop-2-enoate Chemical compound C=CC(=O)OC(C)COC(=O)C=C VFZKVQVQOMDJEG-UHFFFAOYSA-N 0.000 description 1
- WMRCTEPOPAZMMN-UHFFFAOYSA-N 2-undecylpropanedioic acid Chemical compound CCCCCCCCCCCC(C(O)=O)C(O)=O WMRCTEPOPAZMMN-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- AGIJRRREJXSQJR-UHFFFAOYSA-N 2h-thiazine Chemical compound N1SC=CC=C1 AGIJRRREJXSQJR-UHFFFAOYSA-N 0.000 description 1
- GUCMKIKYKIHUTM-UHFFFAOYSA-N 3,3,5,5-tetramethyl-1-[2-(3,3,5,5-tetramethyl-2-oxopiperazin-1-yl)ethyl]piperazin-2-one Chemical compound O=C1C(C)(C)NC(C)(C)CN1CCN1C(=O)C(C)(C)NC(C)(C)C1 GUCMKIKYKIHUTM-UHFFFAOYSA-N 0.000 description 1
- XIRDTMSOGDWMOX-UHFFFAOYSA-N 3,4,5,6-tetrabromophthalic acid Chemical compound OC(=O)C1=C(Br)C(Br)=C(Br)C(Br)=C1C(O)=O XIRDTMSOGDWMOX-UHFFFAOYSA-N 0.000 description 1
- WZHHYIOUKQNLQM-UHFFFAOYSA-N 3,4,5,6-tetrachlorophthalic acid Chemical compound OC(=O)C1=C(Cl)C(Cl)=C(Cl)C(Cl)=C1C(O)=O WZHHYIOUKQNLQM-UHFFFAOYSA-N 0.000 description 1
- JTFIUWWKGBGREU-UHFFFAOYSA-N 3,4-dihydroxybutyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC(O)CO JTFIUWWKGBGREU-UHFFFAOYSA-N 0.000 description 1
- AIBRSVLEQRWAEG-UHFFFAOYSA-N 3,9-bis(2,4-ditert-butylphenoxy)-2,4,8,10-tetraoxa-3,9-diphosphaspiro[5.5]undecane Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC=C1OP1OCC2(COP(OC=3C(=CC(=CC=3)C(C)(C)C)C(C)(C)C)OC2)CO1 AIBRSVLEQRWAEG-UHFFFAOYSA-N 0.000 description 1
- SSADPHQCUURWSW-UHFFFAOYSA-N 3,9-bis(2,6-ditert-butyl-4-methylphenoxy)-2,4,8,10-tetraoxa-3,9-diphosphaspiro[5.5]undecane Chemical compound CC(C)(C)C1=CC(C)=CC(C(C)(C)C)=C1OP1OCC2(COP(OC=3C(=CC(C)=CC=3C(C)(C)C)C(C)(C)C)OC2)CO1 SSADPHQCUURWSW-UHFFFAOYSA-N 0.000 description 1
- YLUZWKKWWSCRSR-UHFFFAOYSA-N 3,9-bis(8-methylnonoxy)-2,4,8,10-tetraoxa-3,9-diphosphaspiro[5.5]undecane Chemical compound C1OP(OCCCCCCCC(C)C)OCC21COP(OCCCCCCCC(C)C)OC2 YLUZWKKWWSCRSR-UHFFFAOYSA-N 0.000 description 1
- PZRWFKGUFWPFID-UHFFFAOYSA-N 3,9-dioctadecoxy-2,4,8,10-tetraoxa-3,9-diphosphaspiro[5.5]undecane Chemical compound C1OP(OCCCCCCCCCCCCCCCCCC)OCC21COP(OCCCCCCCCCCCCCCCCCC)OC2 PZRWFKGUFWPFID-UHFFFAOYSA-N 0.000 description 1
- DEBPUUUXCGIKMB-UHFFFAOYSA-N 3-(3-butyl-2,4,6-tritert-butyl-3-ethylcyclohexa-1,5-dien-1-yl)oxydioxaphosphirane Chemical compound C(CCC)C1(C(C=C(C(OP2OO2)=C1C(C)(C)C)C(C)(C)C)C(C)(C)C)CC DEBPUUUXCGIKMB-UHFFFAOYSA-N 0.000 description 1
- ZAMLGGRVTAXBHI-UHFFFAOYSA-N 3-(4-bromophenyl)-3-[(2-methylpropan-2-yl)oxycarbonylamino]propanoic acid Chemical compound CC(C)(C)OC(=O)NC(CC(O)=O)C1=CC=C(Br)C=C1 ZAMLGGRVTAXBHI-UHFFFAOYSA-N 0.000 description 1
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 1
- SAEZGDDJKSBNPT-UHFFFAOYSA-N 3-dodecyl-1-(1,2,2,6,6-pentamethylpiperidin-4-yl)pyrrolidine-2,5-dione Chemical compound O=C1C(CCCCCCCCCCCC)CC(=O)N1C1CC(C)(C)N(C)C(C)(C)C1 SAEZGDDJKSBNPT-UHFFFAOYSA-N 0.000 description 1
- FBIXXCXCZOZFCO-UHFFFAOYSA-N 3-dodecyl-1-(2,2,6,6-tetramethylpiperidin-4-yl)pyrrolidine-2,5-dione Chemical compound O=C1C(CCCCCCCCCCCC)CC(=O)N1C1CC(C)(C)NC(C)(C)C1 FBIXXCXCZOZFCO-UHFFFAOYSA-N 0.000 description 1
- PAKGDPSCXSUALC-UHFFFAOYSA-N 3-methylbuta-1,2-diene Chemical group CC(C)=C=C PAKGDPSCXSUALC-UHFFFAOYSA-N 0.000 description 1
- FQMIAEWUVYWVNB-UHFFFAOYSA-N 3-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OC(C)CCOC(=O)C=C FQMIAEWUVYWVNB-UHFFFAOYSA-N 0.000 description 1
- ULVDMKRXBIKOMK-UHFFFAOYSA-N 4,5,6,7-tetrachloro-2,3-dihydroisoindol-1-one Chemical compound ClC1=C(Cl)C(Cl)=C2CNC(=O)C2=C1Cl ULVDMKRXBIKOMK-UHFFFAOYSA-N 0.000 description 1
- HPFWYRKGZUGGPB-UHFFFAOYSA-N 4,6-dichloro-n-(2,4,4-trimethylpentan-2-yl)-1,3,5-triazin-2-amine Chemical compound CC(C)(C)CC(C)(C)NC1=NC(Cl)=NC(Cl)=N1 HPFWYRKGZUGGPB-UHFFFAOYSA-N 0.000 description 1
- XOJWAAUYNWGQAU-UHFFFAOYSA-N 4-(2-methylprop-2-enoyloxy)butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCOC(=O)C(C)=C XOJWAAUYNWGQAU-UHFFFAOYSA-N 0.000 description 1
- UQAMDAUJTXFNAD-UHFFFAOYSA-N 4-(4,6-dichloro-1,3,5-triazin-2-yl)morpholine Chemical compound ClC1=NC(Cl)=NC(N2CCOCC2)=N1 UQAMDAUJTXFNAD-UHFFFAOYSA-N 0.000 description 1
- STEYNUVPFMIUOY-UHFFFAOYSA-N 4-Hydroxy-1-(2-hydroxyethyl)-2,2,6,6-tetramethylpiperidine Chemical compound CC1(C)CC(O)CC(C)(C)N1CCO STEYNUVPFMIUOY-UHFFFAOYSA-N 0.000 description 1
- NQKXXZJNWGZAAQ-UHFFFAOYSA-N 4-[2-(4,6-diphenyl-1,3,5-triazin-2-yl)phenoxy]hexan-2-ol Chemical compound CC(O)CC(CC)OC1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=NC(C=2C=CC=CC=2)=N1 NQKXXZJNWGZAAQ-UHFFFAOYSA-N 0.000 description 1
- FROCQMFXPIROOK-UHFFFAOYSA-N 4-[4,6-bis(2,4-dimethylphenyl)-1,3,5-triazin-2-yl]benzene-1,3-diol Chemical compound CC1=CC(C)=CC=C1C1=NC(C=2C(=CC(C)=CC=2)C)=NC(C=2C(=CC(O)=CC=2)O)=N1 FROCQMFXPIROOK-UHFFFAOYSA-N 0.000 description 1
- HVCNXQOWACZAFN-UHFFFAOYSA-N 4-ethylmorpholine Chemical compound CCN1CCOCC1 HVCNXQOWACZAFN-UHFFFAOYSA-N 0.000 description 1
- NDWUBGAGUCISDV-UHFFFAOYSA-N 4-hydroxybutyl prop-2-enoate Chemical compound OCCCCOC(=O)C=C NDWUBGAGUCISDV-UHFFFAOYSA-N 0.000 description 1
- CNPURSDMOWDNOQ-UHFFFAOYSA-N 4-methoxy-7h-pyrrolo[2,3-d]pyrimidin-2-amine Chemical compound COC1=NC(N)=NC2=C1C=CN2 CNPURSDMOWDNOQ-UHFFFAOYSA-N 0.000 description 1
- ZCILGMFPJBRCNO-UHFFFAOYSA-N 4-phenyl-2H-benzotriazol-5-ol Chemical compound OC1=CC=C2NN=NC2=C1C1=CC=CC=C1 ZCILGMFPJBRCNO-UHFFFAOYSA-N 0.000 description 1
- DBOSBRHMHBENLP-UHFFFAOYSA-N 4-tert-Butylphenyl Salicylate Chemical compound C1=CC(C(C)(C)C)=CC=C1OC(=O)C1=CC=CC=C1O DBOSBRHMHBENLP-UHFFFAOYSA-N 0.000 description 1
- UWSMKYBKUPAEJQ-UHFFFAOYSA-N 5-Chloro-2-(3,5-di-tert-butyl-2-hydroxyphenyl)-2H-benzotriazole Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC(N2N=C3C=C(Cl)C=CC3=N2)=C1O UWSMKYBKUPAEJQ-UHFFFAOYSA-N 0.000 description 1
- NJCDRURWJZAMBM-UHFFFAOYSA-N 6-phenyl-1h-1,3,5-triazin-2-one Chemical compound OC1=NC=NC(C=2C=CC=CC=2)=N1 NJCDRURWJZAMBM-UHFFFAOYSA-N 0.000 description 1
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 1
- VPOKLVDHXARWQB-UHFFFAOYSA-N 7,7,9,9-tetramethyl-3-octyl-1,3,8-triazaspiro[4.5]decane-2,4-dione Chemical compound O=C1N(CCCCCCCC)C(=O)NC11CC(C)(C)NC(C)(C)C1 VPOKLVDHXARWQB-UHFFFAOYSA-N 0.000 description 1
- BDJJXYDGLDDYDU-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-5-yl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCC2OC12 BDJJXYDGLDDYDU-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- RAZWNFJQEZAVOT-UHFFFAOYSA-N 8-acetyl-3-dodecyl-7,7,9,9-tetramethyl-1,3,8-triazaspiro[4.5]decane-2,4-dione Chemical compound O=C1N(CCCCCCCCCCCC)C(=O)NC11CC(C)(C)N(C(C)=O)C(C)(C)C1 RAZWNFJQEZAVOT-UHFFFAOYSA-N 0.000 description 1
- DGZNXJPBIXMBJR-UHFFFAOYSA-N 9-(oxiran-2-yl)nonyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCCCCCCC1CO1 DGZNXJPBIXMBJR-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- GJCOSYZMQJWQCA-UHFFFAOYSA-N 9H-xanthene Chemical compound C1=CC=C2CC3=CC=CC=C3OC2=C1 GJCOSYZMQJWQCA-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 1
- 125000004399 C1-C4 alkenyl group Chemical group 0.000 description 1
- XTJYYRKHFBFRJV-UHFFFAOYSA-N CC1(NC(CC(C1)C(C(=O)O)N(C(C(=O)O)C1CC(NC(C1)(C)C)(C)C)C(C(=O)O)C1CC(NC(C1)(C)C)(C)C)(C)C)C Chemical compound CC1(NC(CC(C1)C(C(=O)O)N(C(C(=O)O)C1CC(NC(C1)(C)C)(C)C)C(C(=O)O)C1CC(NC(C1)(C)C)(C)C)(C)C)C XTJYYRKHFBFRJV-UHFFFAOYSA-N 0.000 description 1
- SXNICUVVDOTUPD-UHFFFAOYSA-N CC1=CC(C)=CC(C)=C1C(=O)P(=O)C1=CC=CC=C1 Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)C1=CC=CC=C1 SXNICUVVDOTUPD-UHFFFAOYSA-N 0.000 description 1
- 101150085479 CHS2 gene Proteins 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- 102100025597 Caspase-4 Human genes 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- 239000005749 Copper compound Substances 0.000 description 1
- 229920000089 Cyclic olefin copolymer Polymers 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- 229920001174 Diethylhydroxylamine Polymers 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 238000003747 Grignard reaction Methods 0.000 description 1
- 101100273284 Homo sapiens CASP4 gene Proteins 0.000 description 1
- 101000801643 Homo sapiens Retinal-specific phospholipid-transporting ATPase ABCA4 Proteins 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-L Malonate Chemical compound [O-]C(=O)CC([O-])=O OFOBLEOULBTSOW-UHFFFAOYSA-L 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 1
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-O N-dimethylethanolamine Chemical compound C[NH+](C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-O 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 229920002292 Nylon 6 Polymers 0.000 description 1
- 229920002302 Nylon 6,6 Polymers 0.000 description 1
- BEAWHIRRACSRDJ-UHFFFAOYSA-N OCC(CO)(CO)CO.OC(=O)CC(=C)C(O)=O.OC(=O)CC(=C)C(O)=O Chemical compound OCC(CO)(CO)CO.OC(=O)CC(=C)C(O)=O.OC(=O)CC(=C)C(O)=O BEAWHIRRACSRDJ-UHFFFAOYSA-N 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- YIKSCQDJHCMVMK-UHFFFAOYSA-N Oxamide Chemical class NC(=O)C(N)=O YIKSCQDJHCMVMK-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 1
- 229910019032 PtCl2 Inorganic materials 0.000 description 1
- NRCMAYZCPIVABH-UHFFFAOYSA-N Quinacridone Chemical compound N1C2=CC=CC=C2C(=O)C2=C1C=C1C(=O)C3=CC=CC=C3NC1=C2 NRCMAYZCPIVABH-UHFFFAOYSA-N 0.000 description 1
- 102100033617 Retinal-specific phospholipid-transporting ATPase ABCA4 Human genes 0.000 description 1
- 229910007161 Si(CH3)3 Inorganic materials 0.000 description 1
- 229910002808 Si–O–Si Inorganic materials 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- 206010043268 Tension Diseases 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- FWYSQESTRBWMHU-UHFFFAOYSA-N [(2,4-dipentoxyphenyl)-(2,4,6-trimethylbenzoyl)phosphanyl]-(2,4,6-trimethylphenyl)methanone Chemical compound CCCCCOC1=CC(OCCCCC)=CC=C1P(C(=O)C=1C(=CC(C)=CC=1C)C)C(=O)C1=C(C)C=C(C)C=C1C FWYSQESTRBWMHU-UHFFFAOYSA-N 0.000 description 1
- LFOXEOLGJPJZAA-UHFFFAOYSA-N [(2,6-dimethoxybenzoyl)-(2,4,4-trimethylpentyl)phosphoryl]-(2,6-dimethoxyphenyl)methanone Chemical compound COC1=CC=CC(OC)=C1C(=O)P(=O)(CC(C)CC(C)(C)C)C(=O)C1=C(OC)C=CC=C1OC LFOXEOLGJPJZAA-UHFFFAOYSA-N 0.000 description 1
- YTEISYFNYGDBRV-UHFFFAOYSA-N [(dimethyl-$l^{3}-silanyl)oxy-dimethylsilyl]oxy-dimethylsilicon Chemical compound C[Si](C)O[Si](C)(C)O[Si](C)C YTEISYFNYGDBRV-UHFFFAOYSA-N 0.000 description 1
- GQPVFBDWIUVLHG-UHFFFAOYSA-N [2,2-bis(hydroxymethyl)-3-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)(CO)COC(=O)C(C)=C GQPVFBDWIUVLHG-UHFFFAOYSA-N 0.000 description 1
- CQHKDHVZYZUZMJ-UHFFFAOYSA-N [2,2-bis(hydroxymethyl)-3-prop-2-enoyloxypropyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(CO)COC(=O)C=C CQHKDHVZYZUZMJ-UHFFFAOYSA-N 0.000 description 1
- JUDXBRVLWDGRBC-UHFFFAOYSA-N [2-(hydroxymethyl)-3-(2-methylprop-2-enoyloxy)-2-(2-methylprop-2-enoyloxymethyl)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)(COC(=O)C(C)=C)COC(=O)C(C)=C JUDXBRVLWDGRBC-UHFFFAOYSA-N 0.000 description 1
- SWHLOXLFJPTYTL-UHFFFAOYSA-N [2-methyl-3-(2-methylprop-2-enoyloxy)-2-(2-methylprop-2-enoyloxymethyl)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(C)(COC(=O)C(C)=C)COC(=O)C(C)=C SWHLOXLFJPTYTL-UHFFFAOYSA-N 0.000 description 1
- HSZUHSXXAOWGQY-UHFFFAOYSA-N [2-methyl-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(C)(COC(=O)C=C)COC(=O)C=C HSZUHSXXAOWGQY-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- YIMQCDZDWXUDCA-UHFFFAOYSA-N [4-(hydroxymethyl)cyclohexyl]methanol Chemical compound OCC1CCC(CO)CC1 YIMQCDZDWXUDCA-UHFFFAOYSA-N 0.000 description 1
- FHLPGTXWCFQMIU-UHFFFAOYSA-N [4-[2-(4-prop-2-enoyloxyphenyl)propan-2-yl]phenyl] prop-2-enoate Chemical compound C=1C=C(OC(=O)C=C)C=CC=1C(C)(C)C1=CC=C(OC(=O)C=C)C=C1 FHLPGTXWCFQMIU-UHFFFAOYSA-N 0.000 description 1
- BEIOEBMXPVYLRY-UHFFFAOYSA-N [4-[4-bis(2,4-ditert-butylphenoxy)phosphanylphenyl]phenyl]-bis(2,4-ditert-butylphenoxy)phosphane Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC=C1OP(C=1C=CC(=CC=1)C=1C=CC(=CC=1)P(OC=1C(=CC(=CC=1)C(C)(C)C)C(C)(C)C)OC=1C(=CC(=CC=1)C(C)(C)C)C(C)(C)C)OC1=CC=C(C(C)(C)C)C=C1C(C)(C)C BEIOEBMXPVYLRY-UHFFFAOYSA-N 0.000 description 1
- HZEWFHLRYVTOIW-UHFFFAOYSA-N [Ti].[Ni] Chemical compound [Ti].[Ni] HZEWFHLRYVTOIW-UHFFFAOYSA-N 0.000 description 1
- NBJODVYWAQLZOC-UHFFFAOYSA-L [dibutyl(octanoyloxy)stannyl] octanoate Chemical compound CCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCC NBJODVYWAQLZOC-UHFFFAOYSA-L 0.000 description 1
- GDDVTIGTERZVBW-UHFFFAOYSA-N [dimethyl(trimethylsilyloxy)silyl]oxy-dimethylsilicon Chemical compound C[Si](C)O[Si](C)(C)O[Si](C)(C)C GDDVTIGTERZVBW-UHFFFAOYSA-N 0.000 description 1
- GUCYFKSBFREPBC-UHFFFAOYSA-N [phenyl-(2,4,6-trimethylbenzoyl)phosphoryl]-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C(=O)C1=C(C)C=C(C)C=C1C GUCYFKSBFREPBC-UHFFFAOYSA-N 0.000 description 1
- 229940022663 acetate Drugs 0.000 description 1
- 150000008062 acetophenones Chemical class 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000000999 acridine dye Substances 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 239000002671 adjuvant Substances 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- BHELZAPQIKSEDF-UHFFFAOYSA-N allyl bromide Chemical compound BrCC=C BHELZAPQIKSEDF-UHFFFAOYSA-N 0.000 description 1
- DTOSIQBPPRVQHS-PDBXOOCHSA-N alpha-linolenic acid Chemical compound CC\C=C/C\C=C/C\C=C/CCCCCCCC(O)=O DTOSIQBPPRVQHS-PDBXOOCHSA-N 0.000 description 1
- 235000020661 alpha-linolenic acid Nutrition 0.000 description 1
- 229940003214 aluminium chloride Drugs 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229940051881 anilide analgesics and antipyretics Drugs 0.000 description 1
- 239000001000 anthraquinone dye Substances 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 150000008365 aromatic ketones Chemical class 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- JPNZKPRONVOMLL-UHFFFAOYSA-N azane;octadecanoic acid Chemical class [NH4+].CCCCCCCCCCCCCCCCCC([O-])=O JPNZKPRONVOMLL-UHFFFAOYSA-N 0.000 description 1
- 239000000987 azo dye Substances 0.000 description 1
- IRERQBUNZFJFGC-UHFFFAOYSA-L azure blue Chemical compound [Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Al+3].[Al+3].[Al+3].[Al+3].[Al+3].[Al+3].[S-]S[S-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-] IRERQBUNZFJFGC-UHFFFAOYSA-L 0.000 description 1
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 1
- 229920005601 base polymer Polymers 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- WURBFLDFSFBTLW-UHFFFAOYSA-N benzil Chemical compound C=1C=CC=CC=1C(=O)C(=O)C1=CC=CC=C1 WURBFLDFSFBTLW-UHFFFAOYSA-N 0.000 description 1
- 150000008641 benzimidazolones Chemical class 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 150000001559 benzoic acids Chemical class 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- VCCBEIPGXKNHFW-UHFFFAOYSA-N biphenyl-4,4'-diol Chemical group C1=CC(O)=CC=C1C1=CC=C(O)C=C1 VCCBEIPGXKNHFW-UHFFFAOYSA-N 0.000 description 1
- OSIVCXJNIBEGCL-UHFFFAOYSA-N bis(2,2,6,6-tetramethyl-1-octoxypiperidin-4-yl) decanedioate Chemical compound C1C(C)(C)N(OCCCCCCCC)C(C)(C)CC1OC(=O)CCCCCCCCC(=O)OC1CC(C)(C)N(OCCCCCCCC)C(C)(C)C1 OSIVCXJNIBEGCL-UHFFFAOYSA-N 0.000 description 1
- GOJOVSYIGHASEI-UHFFFAOYSA-N bis(2,2,6,6-tetramethylpiperidin-4-yl) butanedioate Chemical compound C1C(C)(C)NC(C)(C)CC1OC(=O)CCC(=O)OC1CC(C)(C)NC(C)(C)C1 GOJOVSYIGHASEI-UHFFFAOYSA-N 0.000 description 1
- XITRBUPOXXBIJN-UHFFFAOYSA-N bis(2,2,6,6-tetramethylpiperidin-4-yl) decanedioate Chemical compound C1C(C)(C)NC(C)(C)CC1OC(=O)CCCCCCCCC(=O)OC1CC(C)(C)NC(C)(C)C1 XITRBUPOXXBIJN-UHFFFAOYSA-N 0.000 description 1
- SVNCDHBIQPXHHA-UHFFFAOYSA-N bis(2,4-ditert-butyl-6-methylphenyl) ethyl phosphate Chemical compound CC=1C=C(C(C)(C)C)C=C(C(C)(C)C)C=1OP(=O)(OCC)OC1=C(C)C=C(C(C)(C)C)C=C1C(C)(C)C SVNCDHBIQPXHHA-UHFFFAOYSA-N 0.000 description 1
- AJCHRUXIDGEWDK-UHFFFAOYSA-N bis(ethenyl) butanedioate Chemical compound C=COC(=O)CCC(=O)OC=C AJCHRUXIDGEWDK-UHFFFAOYSA-N 0.000 description 1
- FSIJKGMIQTVTNP-UHFFFAOYSA-N bis(ethenyl)-methyl-trimethylsilyloxysilane Chemical compound C[Si](C)(C)O[Si](C)(C=C)C=C FSIJKGMIQTVTNP-UHFFFAOYSA-N 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- FQUNFJULCYSSOP-UHFFFAOYSA-N bisoctrizole Chemical compound N1=C2C=CC=CC2=NN1C1=CC(C(C)(C)CC(C)(C)C)=CC(CC=2C(=C(C=C(C=2)C(C)(C)CC(C)(C)C)N2N=C3C=CC=CC3=N2)O)=C1O FQUNFJULCYSSOP-UHFFFAOYSA-N 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 239000002981 blocking agent Substances 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- OCWYEMOEOGEQAN-UHFFFAOYSA-N bumetrizole Chemical compound CC(C)(C)C1=CC(C)=CC(N2N=C3C=C(Cl)C=CC3=N2)=C1O OCWYEMOEOGEQAN-UHFFFAOYSA-N 0.000 description 1
- GKRVGTLVYRYCFR-UHFFFAOYSA-N butane-1,4-diol;2-methylidenebutanedioic acid Chemical compound OCCCCO.OC(=O)CC(=C)C(O)=O.OC(=O)CC(=C)C(O)=O GKRVGTLVYRYCFR-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- IAQRGUVFOMOMEM-UHFFFAOYSA-N butene Natural products CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 1
- 125000004063 butyryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- VHRGRCVQAFMJIZ-UHFFFAOYSA-N cadaverine Chemical compound NCCCCCN VHRGRCVQAFMJIZ-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- CJOBVZJTOIVNNF-UHFFFAOYSA-N cadmium sulfide Chemical compound [Cd]=S CJOBVZJTOIVNNF-UHFFFAOYSA-N 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000012952 cationic photoinitiator Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 1
- 229920003086 cellulose ether Polymers 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 150000008422 chlorobenzenes Chemical class 0.000 description 1
- YGHUUVGIRWMJGE-UHFFFAOYSA-N chlorodimethylsilane Chemical compound C[SiH](C)Cl YGHUUVGIRWMJGE-UHFFFAOYSA-N 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- PMMYEEVYMWASQN-IMJSIDKUSA-N cis-4-Hydroxy-L-proline Chemical compound O[C@@H]1CN[C@H](C(O)=O)C1 PMMYEEVYMWASQN-IMJSIDKUSA-N 0.000 description 1
- 150000001880 copper compounds Chemical class 0.000 description 1
- 229940120693 copper naphthenate Drugs 0.000 description 1
- SEVNKWFHTNVOLD-UHFFFAOYSA-L copper;3-(4-ethylcyclohexyl)propanoate;3-(3-ethylcyclopentyl)propanoate Chemical compound [Cu+2].CCC1CCC(CCC([O-])=O)C1.CCC1CCC(CCC([O-])=O)CC1 SEVNKWFHTNVOLD-UHFFFAOYSA-L 0.000 description 1
- VNZQQAVATKSIBR-UHFFFAOYSA-L copper;octanoate Chemical compound [Cu+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O VNZQQAVATKSIBR-UHFFFAOYSA-L 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- MGNCLNQXLYJVJD-UHFFFAOYSA-N cyanuric chloride Chemical compound ClC1=NC(Cl)=NC(Cl)=N1 MGNCLNQXLYJVJD-UHFFFAOYSA-N 0.000 description 1
- 150000001923 cyclic compounds Chemical class 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- IFDVQVHZEKPUSC-UHFFFAOYSA-N cyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC=CC1C(O)=O IFDVQVHZEKPUSC-UHFFFAOYSA-N 0.000 description 1
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 1
- VKIRRGRTJUUZHS-UHFFFAOYSA-N cyclohexane-1,4-diamine Chemical compound NC1CCC(N)CC1 VKIRRGRTJUUZHS-UHFFFAOYSA-N 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- BOXSCYUXSBYGRD-UHFFFAOYSA-N cyclopenta-1,3-diene;iron(3+) Chemical class [Fe+3].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 BOXSCYUXSBYGRD-UHFFFAOYSA-N 0.000 description 1
- NUUPJBRGQCEZSI-UHFFFAOYSA-N cyclopentane-1,3-diol Chemical compound OC1CCC(O)C1 NUUPJBRGQCEZSI-UHFFFAOYSA-N 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000012973 diazabicyclooctane Substances 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- JGFBRKRYDCGYKD-UHFFFAOYSA-N dibutyl(oxo)tin Chemical compound CCCC[Sn](=O)CCCC JGFBRKRYDCGYKD-UHFFFAOYSA-N 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- FVCOIAYSJZGECG-UHFFFAOYSA-N diethylhydroxylamine Chemical compound CCN(O)CC FVCOIAYSJZGECG-UHFFFAOYSA-N 0.000 description 1
- AOJHDNSYXUZCCE-UHFFFAOYSA-N dimethylsilyloxy(trimethyl)silane Chemical compound C[SiH](C)O[Si](C)(C)C AOJHDNSYXUZCCE-UHFFFAOYSA-N 0.000 description 1
- OBISXEJSEGNNKL-UHFFFAOYSA-N dinitrogen-n-sulfide Chemical compound [N-]=[N+]=S OBISXEJSEGNNKL-UHFFFAOYSA-N 0.000 description 1
- PPSZHCXTGRHULJ-UHFFFAOYSA-N dioxazine Chemical compound O1ON=CC=C1 PPSZHCXTGRHULJ-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 150000002019 disulfides Chemical class 0.000 description 1
- GTZOYNFRVVHLDZ-UHFFFAOYSA-N dodecane-1,1-diol Chemical compound CCCCCCCCCCCC(O)O GTZOYNFRVVHLDZ-UHFFFAOYSA-N 0.000 description 1
- QFTYSVGGYOXFRQ-UHFFFAOYSA-N dodecane-1,12-diamine Chemical compound NCCCCCCCCCCCCN QFTYSVGGYOXFRQ-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229940060296 dodecylbenzenesulfonic acid Drugs 0.000 description 1
- MCPKSFINULVDNX-UHFFFAOYSA-N drometrizole Chemical compound CC1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 MCPKSFINULVDNX-UHFFFAOYSA-N 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000001652 electrophoretic deposition Methods 0.000 description 1
- 238000007590 electrostatic spraying Methods 0.000 description 1
- YQGOJNYOYNNSMM-UHFFFAOYSA-N eosin Chemical compound [Na+].OC(=O)C1=CC=CC=C1C1=C2C=C(Br)C(=O)C(Br)=C2OC2=C(Br)C(O)=C(Br)C=C21 YQGOJNYOYNNSMM-UHFFFAOYSA-N 0.000 description 1
- IINNWAYUJNWZRM-UHFFFAOYSA-L erythrosin B Chemical compound [Na+].[Na+].[O-]C(=O)C1=CC=CC=C1C1=C2C=C(I)C(=O)C(I)=C2OC2=C(I)C([O-])=C(I)C=C21 IINNWAYUJNWZRM-UHFFFAOYSA-L 0.000 description 1
- 229940011411 erythrosine Drugs 0.000 description 1
- 235000012732 erythrosine Nutrition 0.000 description 1
- 239000004174 erythrosine Substances 0.000 description 1
- BLCTWBJQROOONQ-UHFFFAOYSA-N ethenyl prop-2-enoate Chemical compound C=COC(=O)C=C BLCTWBJQROOONQ-UHFFFAOYSA-N 0.000 description 1
- CJMZLCRLBNZJQR-UHFFFAOYSA-N ethyl 2-amino-4-(4-fluorophenyl)thiophene-3-carboxylate Chemical compound CCOC(=O)C1=C(N)SC=C1C1=CC=C(F)C=C1 CJMZLCRLBNZJQR-UHFFFAOYSA-N 0.000 description 1
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 description 1
- OCJKUQIPRNZDTK-UHFFFAOYSA-N ethyl 4,4,4-trifluoro-3-oxobutanoate Chemical compound CCOC(=O)CC(=O)C(F)(F)F OCJKUQIPRNZDTK-UHFFFAOYSA-N 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 229920001002 functional polymer Polymers 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 239000010440 gypsum Substances 0.000 description 1
- 229910052602 gypsum Inorganic materials 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- NZYMWGXNIUZYRC-UHFFFAOYSA-N hexadecyl 3,5-ditert-butyl-4-hydroxybenzoate Chemical compound CCCCCCCCCCCCCCCCOC(=O)C1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NZYMWGXNIUZYRC-UHFFFAOYSA-N 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- AVIYEYCFMVPYST-UHFFFAOYSA-N hexane-1,3-diol Chemical compound CCCC(O)CCO AVIYEYCFMVPYST-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 150000002443 hydroxylamines Chemical class 0.000 description 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- VBMVTYDPPZVILR-UHFFFAOYSA-N iron(2+);oxygen(2-) Chemical class [O-2].[Fe+2] VBMVTYDPPZVILR-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- PXZQEOJJUGGUIB-UHFFFAOYSA-N isoindolin-1-one Chemical compound C1=CC=C2C(=O)NCC2=C1 PXZQEOJJUGGUIB-UHFFFAOYSA-N 0.000 description 1
- GWVMLCQWXVFZCN-UHFFFAOYSA-N isoindoline Chemical compound C1=CC=C2CNCC2=C1 GWVMLCQWXVFZCN-UHFFFAOYSA-N 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- QDLAGTHXVHQKRE-UHFFFAOYSA-N lichenxanthone Natural products COC1=CC(O)=C2C(=O)C3=C(C)C=C(OC)C=C3OC2=C1 QDLAGTHXVHQKRE-UHFFFAOYSA-N 0.000 description 1
- 229960004488 linolenic acid Drugs 0.000 description 1
- KQQKGWQCNNTQJW-UHFFFAOYSA-N linolenic acid Natural products CC=CCCC=CCC=CCCCCCCCC(O)=O KQQKGWQCNNTQJW-UHFFFAOYSA-N 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 150000002688 maleic acid derivatives Chemical class 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000000434 metal complex dye Substances 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 125000005394 methallyl group Chemical group 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 description 1
- NQVJUHCFWKRBCA-UHFFFAOYSA-N methyl 2-hydroxy-2-(2-methylprop-2-enoylamino)acetate Chemical compound COC(=O)C(O)NC(=O)C(C)=C NQVJUHCFWKRBCA-UHFFFAOYSA-N 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- CAAULPUQFIIOTL-UHFFFAOYSA-N methyl dihydrogen phosphate Chemical compound COP(O)(O)=O CAAULPUQFIIOTL-UHFFFAOYSA-N 0.000 description 1
- 150000004702 methyl esters Chemical class 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- OHSYWAVRSCQMHG-UHFFFAOYSA-N methyl-[methyl(trimethylsilyloxy)-$l^{3}-silanyl]oxy-trimethylsilyloxysilicon Chemical compound C[Si](C)(C)O[Si](C)O[Si](C)O[Si](C)(C)C OHSYWAVRSCQMHG-UHFFFAOYSA-N 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- GRVDJDISBSALJP-UHFFFAOYSA-N methyloxidanyl Chemical compound [O]C GRVDJDISBSALJP-UHFFFAOYSA-N 0.000 description 1
- 239000011325 microbead Substances 0.000 description 1
- 238000005065 mining Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000012452 mother liquor Substances 0.000 description 1
- 238000003541 multi-stage reaction Methods 0.000 description 1
- IZRZMBCKGLWYSC-UHFFFAOYSA-N n'-(2-aminoethyl)ethane-1,2-diamine;2-methylprop-2-enamide Chemical compound CC(=C)C(N)=O.CC(=C)C(N)=O.CC(=C)C(N)=O.NCCNCCN IZRZMBCKGLWYSC-UHFFFAOYSA-N 0.000 description 1
- YIMHRDBSVCPJOV-UHFFFAOYSA-N n'-(2-ethoxyphenyl)-n-(2-ethylphenyl)oxamide Chemical compound CCOC1=CC=CC=C1NC(=O)C(=O)NC1=CC=CC=C1CC YIMHRDBSVCPJOV-UHFFFAOYSA-N 0.000 description 1
- ZJFPXDGPJMHQMW-UHFFFAOYSA-N n,n'-bis[3-(dimethylamino)propyl]oxamide Chemical compound CN(C)CCCNC(=O)C(=O)NCCCN(C)C ZJFPXDGPJMHQMW-UHFFFAOYSA-N 0.000 description 1
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 1
- YQCFXPARMSSRRK-UHFFFAOYSA-N n-[6-(prop-2-enoylamino)hexyl]prop-2-enamide Chemical compound C=CC(=O)NCCCCCCNC(=O)C=C YQCFXPARMSSRRK-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- DARUEKWVLGHJJT-UHFFFAOYSA-N n-butyl-1-[4-[4-(butylamino)-2,2,6,6-tetramethylpiperidin-1-yl]-6-chloro-1,3,5-triazin-2-yl]-2,2,6,6-tetramethylpiperidin-4-amine Chemical compound CC1(C)CC(NCCCC)CC(C)(C)N1C1=NC(Cl)=NC(N2C(CC(CC2(C)C)NCCCC)(C)C)=N1 DARUEKWVLGHJJT-UHFFFAOYSA-N 0.000 description 1
- FDAKZQLBIFPGSV-UHFFFAOYSA-N n-butyl-2,2,6,6-tetramethylpiperidin-4-amine Chemical compound CCCCNC1CC(C)(C)NC(C)(C)C1 FDAKZQLBIFPGSV-UHFFFAOYSA-N 0.000 description 1
- BLBLVDQTHWVGRA-UHFFFAOYSA-N n-butyl-3-[4-[4-(butylamino)-1,2,2,6,6-pentamethylpiperidin-3-yl]-6-chloro-1,3,5-triazin-2-yl]-1,2,2,6,6-pentamethylpiperidin-4-amine Chemical compound CCCCNC1CC(C)(C)N(C)C(C)(C)C1C1=NC(Cl)=NC(C2C(N(C)C(C)(C)CC2NCCCC)(C)C)=N1 BLBLVDQTHWVGRA-UHFFFAOYSA-N 0.000 description 1
- 125000005609 naphthenate group Chemical group 0.000 description 1
- 229910001000 nickel titanium Inorganic materials 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- OEIJHBUUFURJLI-UHFFFAOYSA-N octane-1,8-diol Chemical compound OCCCCCCCCO OEIJHBUUFURJLI-UHFFFAOYSA-N 0.000 description 1
- 125000005474 octanoate group Chemical group 0.000 description 1
- XZZXKVYTWCYOQX-UHFFFAOYSA-J octanoate;tin(4+) Chemical compound [Sn+4].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O.CCCCCCCC([O-])=O.CCCCCCCC([O-])=O XZZXKVYTWCYOQX-UHFFFAOYSA-J 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 229920002601 oligoester Polymers 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- SOWBFZRMHSNYGE-UHFFFAOYSA-N oxamic acid Chemical compound NC(=O)C(O)=O SOWBFZRMHSNYGE-UHFFFAOYSA-N 0.000 description 1
- 150000002918 oxazolines Chemical class 0.000 description 1
- MMCOUVMKNAHQOY-UHFFFAOYSA-L oxido carbonate Chemical compound [O-]OC([O-])=O MMCOUVMKNAHQOY-UHFFFAOYSA-L 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical compound [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229940059574 pentaerithrityl Drugs 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 125000004817 pentamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- UWJJYHHHVWZFEP-UHFFFAOYSA-N pentane-1,1-diol Chemical compound CCCCC(O)O UWJJYHHHVWZFEP-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 150000002976 peresters Chemical class 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- PIZOACXKIKXRDJ-UHFFFAOYSA-N phenyl 2-methylpropanoate Chemical compound CC(C)C(=O)OC1=CC=CC=C1 PIZOACXKIKXRDJ-UHFFFAOYSA-N 0.000 description 1
- 229960000969 phenyl salicylate Drugs 0.000 description 1
- ZPNJBTBYIHBSIG-UHFFFAOYSA-N phenyl-(2,2,6,6-tetramethylpiperidin-4-yl)methanone Chemical compound C1C(C)(C)NC(C)(C)CC1C(=O)C1=CC=CC=C1 ZPNJBTBYIHBSIG-UHFFFAOYSA-N 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 1
- XRBCRPZXSCBRTK-UHFFFAOYSA-N phosphonous acid Chemical class OPO XRBCRPZXSCBRTK-UHFFFAOYSA-N 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N phthalic anhydride Chemical compound C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- XKJCHHZQLQNZHY-UHFFFAOYSA-N phthalimide Chemical compound C1=CC=C2C(=O)NC(=O)C2=C1 XKJCHHZQLQNZHY-UHFFFAOYSA-N 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 125000004193 piperazinyl group Chemical group 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002401 polyacrylamide Chemical group 0.000 description 1
- 229920002239 polyacrylonitrile Chemical group 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229940068886 polyethylene glycol 300 Drugs 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920000909 polytetrahydrofuran Polymers 0.000 description 1
- 229920000166 polytrimethylene carbonate Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 150000004032 porphyrins Chemical class 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 150000003138 primary alcohols Chemical class 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 1
- INCIMLINXXICKS-UHFFFAOYSA-M pyronin Y Chemical compound [Cl-].C1=CC(=[N+](C)C)C=C2OC3=CC(N(C)C)=CC=C3C=C21 INCIMLINXXICKS-UHFFFAOYSA-M 0.000 description 1
- FYNROBRQIVCIQF-UHFFFAOYSA-N pyrrolo[3,2-b]pyrrole-5,6-dione Chemical compound C1=CN=C2C(=O)C(=O)N=C21 FYNROBRQIVCIQF-UHFFFAOYSA-N 0.000 description 1
- 150000003856 quaternary ammonium compounds Chemical class 0.000 description 1
- IZMJMCDDWKSTTK-UHFFFAOYSA-N quinoline yellow Chemical compound C1=CC=CC2=NC(C3C(C4=CC=CC=C4C3=O)=O)=CC=C21 IZMJMCDDWKSTTK-UHFFFAOYSA-N 0.000 description 1
- 230000036647 reaction Effects 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 229920003987 resole Polymers 0.000 description 1
- 238000007763 reverse roll coating Methods 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 150000003304 ruthenium compounds Chemical class 0.000 description 1
- ORIHZIZPTZTNCU-YVMONPNESA-N salicylaldoxime Chemical compound O\N=C/C1=CC=CC=C1O ORIHZIZPTZTNCU-YVMONPNESA-N 0.000 description 1
- 239000006120 scratch resistant coating Substances 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 231100000489 sensitizer Toxicity 0.000 description 1
- 229920005573 silicon-containing polymer Polymers 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229940086735 succinate Drugs 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-L succinate(2-) Chemical compound [O-]C(=O)CCC([O-])=O KDYFGRWQOYBRFD-UHFFFAOYSA-L 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 235000012222 talc Nutrition 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 description 1
- 150000001911 terphenyls Chemical class 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- NZNAAUDJKMURFU-UHFFFAOYSA-N tetrakis(2,2,6,6-tetramethylpiperidin-4-yl) butane-1,2,3,4-tetracarboxylate Chemical compound C1C(C)(C)NC(C)(C)CC1OC(=O)CC(C(=O)OC1CC(C)(C)NC(C)(C)C1)C(C(=O)OC1CC(C)(C)NC(C)(C)C1)CC(=O)OC1CC(C)(C)NC(C)(C)C1 NZNAAUDJKMURFU-UHFFFAOYSA-N 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- JOUDBUYBGJYFFP-FOCLMDBBSA-N thioindigo Chemical compound S\1C2=CC=CC=C2C(=O)C/1=C1/C(=O)C2=CC=CC=C2S1 JOUDBUYBGJYFFP-FOCLMDBBSA-N 0.000 description 1
- KSBAEPSJVUENNK-UHFFFAOYSA-L tin(ii) 2-ethylhexanoate Chemical compound [Sn+2].CCCCC(CC)C([O-])=O.CCCCC(CC)C([O-])=O KSBAEPSJVUENNK-UHFFFAOYSA-L 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 238000005809 transesterification reaction Methods 0.000 description 1
- AYNNSCRYTDRFCP-UHFFFAOYSA-N triazene Chemical compound NN=N AYNNSCRYTDRFCP-UHFFFAOYSA-N 0.000 description 1
- KKFOMYPMTJLQGA-UHFFFAOYSA-N tribenzyl phosphite Chemical compound C=1C=CC=CC=1COP(OCC=1C=CC=CC=1)OCC1=CC=CC=C1 KKFOMYPMTJLQGA-UHFFFAOYSA-N 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- IVIIAEVMQHEPAY-UHFFFAOYSA-N tridodecyl phosphite Chemical compound CCCCCCCCCCCCOP(OCCCCCCCCCCCC)OCCCCCCCCCCCC IVIIAEVMQHEPAY-UHFFFAOYSA-N 0.000 description 1
- BDZBKCUKTQZUTL-UHFFFAOYSA-N triethyl phosphite Chemical compound CCOP(OCC)OCC BDZBKCUKTQZUTL-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- FDGZUBKNYGBWHI-UHFFFAOYSA-N trioctadecyl phosphate Chemical compound CCCCCCCCCCCCCCCCCCOP(=O)(OCCCCCCCCCCCCCCCCCC)OCCCCCCCCCCCCCCCCCC FDGZUBKNYGBWHI-UHFFFAOYSA-N 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- AZSKHRTUXHLAHS-UHFFFAOYSA-N tris(2,4-di-tert-butylphenyl) phosphate Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC=C1OP(=O)(OC=1C(=CC(=CC=1)C(C)(C)C)C(C)(C)C)OC1=CC=C(C(C)(C)C)C=C1C(C)(C)C AZSKHRTUXHLAHS-UHFFFAOYSA-N 0.000 description 1
- WGKLOLBTFWFKOD-UHFFFAOYSA-N tris(2-nonylphenyl) phosphite Chemical compound CCCCCCCCCC1=CC=CC=C1OP(OC=1C(=CC=CC=1)CCCCCCCCC)OC1=CC=CC=C1CCCCCCCCC WGKLOLBTFWFKOD-UHFFFAOYSA-N 0.000 description 1
- XHGIFBQQEGRTPB-UHFFFAOYSA-N tris(prop-2-enyl) phosphate Chemical compound C=CCOP(=O)(OCC=C)OCC=C XHGIFBQQEGRTPB-UHFFFAOYSA-N 0.000 description 1
- 235000013799 ultramarine blue Nutrition 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000004670 unsaturated fatty acids Chemical class 0.000 description 1
- 235000021122 unsaturated fatty acids Nutrition 0.000 description 1
- LSGOVYNHVSXFFJ-UHFFFAOYSA-N vanadate(3-) Chemical compound [O-][V]([O-])([O-])=O LSGOVYNHVSXFFJ-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- KAKZBPTYRLMSJV-UHFFFAOYSA-N vinyl-ethylene Natural products C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 1
- 125000002348 vinylic group Chemical group 0.000 description 1
- 239000011345 viscous material Substances 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- CHJMFFKHPHCQIJ-UHFFFAOYSA-L zinc;octanoate Chemical compound [Zn+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O CHJMFFKHPHCQIJ-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
- C07F7/02—Silicon compounds
- C07F7/21—Cyclic compounds having at least one ring containing silicon, but no carbon in the ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
- C07F7/0838—Compounds with one or more Si-O-Si sequences
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S522/904—Monomer or polymer contains initiating group
- Y10S522/905—Benzophenone group
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Abstract
The invention relates to the use of surface-active photoinitiators of formula I (see formula I), the units being arranged randomly or in blocks, and wherein n is a number from 1 to 1000; m is a number from 0 to 100;
p is a number from 0 to 10 000; x is the number 1, or, when n is 1, x may also be the number 2; A1 and A2 are, for example, C1-C18,alkyl; or A1 and A2 together are a single bond;
R1, R2 and R3 are, for example, each independently of the others C1-C18alkyl, phenyl or C5-C8cycloalkyl; R4 is, for example, unsubstituted or substituted C1-C18alkyl, unsubstituted or substituted phenyl or C5-C8cycloalkyl; IN, when x is 1, is a radical of formula (see formula II); or IN, when x is 2 is a radical of formula (see formula 3); R13 and R14 are, for example, each independently of the other C1-C12alkyl; Y is, for example, -(CH2)a-O-; X
is OR15 or N(R16)(R17); R15 is, for example, hydrogen or C1-C4alkyl; R16 and R17, are, for example, hydrogen or C1-C12alkyl; X, has, for example, one of the meanings of X; and R18 is, for example, -(CH2)a-;
in photochemically and combined photochemically and thermally crosslinkable formulations.
p is a number from 0 to 10 000; x is the number 1, or, when n is 1, x may also be the number 2; A1 and A2 are, for example, C1-C18,alkyl; or A1 and A2 together are a single bond;
R1, R2 and R3 are, for example, each independently of the others C1-C18alkyl, phenyl or C5-C8cycloalkyl; R4 is, for example, unsubstituted or substituted C1-C18alkyl, unsubstituted or substituted phenyl or C5-C8cycloalkyl; IN, when x is 1, is a radical of formula (see formula II); or IN, when x is 2 is a radical of formula (see formula 3); R13 and R14 are, for example, each independently of the other C1-C12alkyl; Y is, for example, -(CH2)a-O-; X
is OR15 or N(R16)(R17); R15 is, for example, hydrogen or C1-C4alkyl; R16 and R17, are, for example, hydrogen or C1-C12alkyl; X, has, for example, one of the meanings of X; and R18 is, for example, -(CH2)a-;
in photochemically and combined photochemically and thermally crosslinkable formulations.
Description
_1_ Surface-active photoinitiators The invention relates to a process for the preparation of scratch-resistant durable coatings in which siloxane-containing photoinitiators are used as surface-active initiators, and to new surface-active photoinitiators.
In order to improve the miscibility of photoinitiators with silicone-containing substrates (com-patibility) that are to be photochemically crosslinked, WO 97/49768, US
5776658, US 4391963 and EP 88842, for example, propose photoinitiators, e.g. of the hydroxy-ketone, aminoketone, benzoin ether, benzophenone or thioxanthone type, that have been modified with silyl radicals, especially with polymeric silyl radicals. Patent Specifications US 4536265, US 4534838 and EP 162572 also describe a wide variety of photoinitiator structures pro-vided with organopolysiloxane radicals. Those compounds are derived, for example, from dialkoxyacetophenones and have enhanced solubility in silicone substrates. US
discloses silyl-group-containing diketo photoinitiators as photoinitiators that are readily solu-ble in silicone polymers, and also the polymers obtained with those initiators. US 4477326 describes self-polymerising siloxane polymers that contain photoinitiator units as groups that trigger the polymerisation reaction. Polymeric photoinitiators containing siloxane radicals are described in US 4587276.
In J.M.S. Pure Appl. Chem. A31(3) (1994), 305-318, A. Kolar, H.F. Gruber and G. Greber describe reactive silyl-derived a-hydroxyketone photoinitiators. The literature references mentioned are concerned especially with solving the problem of improving the miscibility of the photoinitiators with the substrate to be polymerised, that is to say distributing the initiator in the substrate as homogeneously as possible. WO 98/00456 proposes certain coating compositions, and a curing process by means of which the properties of the coating surface can be improved.
New energy-saving curing mechanisms and applications that result in as few emissions as possible are sought by the coatings industry in order to produce durable, scratch-resistant coatings. There is especially a need to improve the surface of coatings, especially in respect of hardness, durability and gloss properties.
It has now been found that the desired properties can be obtained using certain photo-initiators in the coatings that are to be cured. For that purpose, the photoinitiator is not dis-tributed as homogeneously as possible in the formulation to be cured but is concentrated in targeted manner at the surface of the coating to be cured; the initiator is thus oriented in tar-geted manner towards the surface of the formulation. For that purpose it is necessary to use photoinitiators that have been designed in a particular manner.
The invention relates to a process for the preparation of coatings having scratch-resistant du-rable surfaces, in which (I) a photocurable formulation comprising (A) an ethylenically unsaturated polymerisable compound; and (B) a photoinitiator;
is prepared;
(II) that formulation is applied to a support; and (III) the formulation is cured either solely by irradiation with electromagnetic radiation of a wavelength of from 200 to 600 nm, or by irradiation with electromagnetic radiation of a wavelength of from 200 to 600 nm and by prior, simultaneous and/or subsequent action of heat;
in which process the formulation comprises as photoinitiator (B) at least one surface-active photoinitiator that is concentrated at the surface of the formulation.
A surface-active photoinitiator is used as photoinitiator (B). Photoinitiator (B) is a photo-initator compound that is incompatible with the formulation to be cured, that is to say has poor miscibility therewith, and is therefore able to concentrate at the surface of the formula-tion.
A suitable surface-active photoinitiator (B) in the process described above is a compound comprising a customary photocleavable photoinitiator molecule moiety (b1 ) and a molecule moiety (b2) that is incompatible with the formulation to be cured.
Customary photocleavable molecule moieties are known to the person skilled in the art, and are, for example, a-cleaving radicals. Of special interest are compounds in which the photocleavable photoinitiator molecule moiety (b1 ) contains a group The molecule moiety (b2) having poor compatibility with the formulation to be cured is a si-loxane radical.
Suitable photoinitiators (B) are especially compounds of formula I, Rz R3 ii-O ii O Az (I) m R° P
x wherein the units of formulae la, Ib and/or Ic I Rz Rs sl-o (la), ~ I-o (Ib), sl-o (Ic) H Ra IN
l are arranged randomly or in blocks, and wherein n is a number from 1 to 1000, or, when the siloxane starting material is a mixture of oli-gomeric siloxanes, n may also be less than 1, but greater than 0;
m is a number from 0 to 100;
p is a number from 0 to 10 000;
x is the number 1 or 2;
Rs A, is C,-C,aalkyl or a radical of formula -~- i i-Ra ;
R~
la A2 is C,-C,8alkyl or a radical of formula - i ~-Rs ;
Rio or A, and Az together are a single bond;
R,, R2, R3, Rs, R6, R~, Ra, R9 and R,o are each independently of the others C,-C,ealkyl, phenyl, C2-Cahydroxyalkyl, C2-Csaminoalkyl or Cs-Cacycloalkyl;
R4 is C,-C,aalkyl; C,-C,aalkyl substituted by hydroxy, C,-C,2alkoxy, halogen, C3-Ca-cycloalkyl andlor by N(R")(R,2); or R4 is phenyl; phenyl substituted by C,-C,2alkyl, C,-C,2-alkoxy, halogen, hydroxy andlor by N(R")(R,2); or R4 is Cs-Cacycloalkyl;
In order to improve the miscibility of photoinitiators with silicone-containing substrates (com-patibility) that are to be photochemically crosslinked, WO 97/49768, US
5776658, US 4391963 and EP 88842, for example, propose photoinitiators, e.g. of the hydroxy-ketone, aminoketone, benzoin ether, benzophenone or thioxanthone type, that have been modified with silyl radicals, especially with polymeric silyl radicals. Patent Specifications US 4536265, US 4534838 and EP 162572 also describe a wide variety of photoinitiator structures pro-vided with organopolysiloxane radicals. Those compounds are derived, for example, from dialkoxyacetophenones and have enhanced solubility in silicone substrates. US
discloses silyl-group-containing diketo photoinitiators as photoinitiators that are readily solu-ble in silicone polymers, and also the polymers obtained with those initiators. US 4477326 describes self-polymerising siloxane polymers that contain photoinitiator units as groups that trigger the polymerisation reaction. Polymeric photoinitiators containing siloxane radicals are described in US 4587276.
In J.M.S. Pure Appl. Chem. A31(3) (1994), 305-318, A. Kolar, H.F. Gruber and G. Greber describe reactive silyl-derived a-hydroxyketone photoinitiators. The literature references mentioned are concerned especially with solving the problem of improving the miscibility of the photoinitiators with the substrate to be polymerised, that is to say distributing the initiator in the substrate as homogeneously as possible. WO 98/00456 proposes certain coating compositions, and a curing process by means of which the properties of the coating surface can be improved.
New energy-saving curing mechanisms and applications that result in as few emissions as possible are sought by the coatings industry in order to produce durable, scratch-resistant coatings. There is especially a need to improve the surface of coatings, especially in respect of hardness, durability and gloss properties.
It has now been found that the desired properties can be obtained using certain photo-initiators in the coatings that are to be cured. For that purpose, the photoinitiator is not dis-tributed as homogeneously as possible in the formulation to be cured but is concentrated in targeted manner at the surface of the coating to be cured; the initiator is thus oriented in tar-geted manner towards the surface of the formulation. For that purpose it is necessary to use photoinitiators that have been designed in a particular manner.
The invention relates to a process for the preparation of coatings having scratch-resistant du-rable surfaces, in which (I) a photocurable formulation comprising (A) an ethylenically unsaturated polymerisable compound; and (B) a photoinitiator;
is prepared;
(II) that formulation is applied to a support; and (III) the formulation is cured either solely by irradiation with electromagnetic radiation of a wavelength of from 200 to 600 nm, or by irradiation with electromagnetic radiation of a wavelength of from 200 to 600 nm and by prior, simultaneous and/or subsequent action of heat;
in which process the formulation comprises as photoinitiator (B) at least one surface-active photoinitiator that is concentrated at the surface of the formulation.
A surface-active photoinitiator is used as photoinitiator (B). Photoinitiator (B) is a photo-initator compound that is incompatible with the formulation to be cured, that is to say has poor miscibility therewith, and is therefore able to concentrate at the surface of the formula-tion.
A suitable surface-active photoinitiator (B) in the process described above is a compound comprising a customary photocleavable photoinitiator molecule moiety (b1 ) and a molecule moiety (b2) that is incompatible with the formulation to be cured.
Customary photocleavable molecule moieties are known to the person skilled in the art, and are, for example, a-cleaving radicals. Of special interest are compounds in which the photocleavable photoinitiator molecule moiety (b1 ) contains a group The molecule moiety (b2) having poor compatibility with the formulation to be cured is a si-loxane radical.
Suitable photoinitiators (B) are especially compounds of formula I, Rz R3 ii-O ii O Az (I) m R° P
x wherein the units of formulae la, Ib and/or Ic I Rz Rs sl-o (la), ~ I-o (Ib), sl-o (Ic) H Ra IN
l are arranged randomly or in blocks, and wherein n is a number from 1 to 1000, or, when the siloxane starting material is a mixture of oli-gomeric siloxanes, n may also be less than 1, but greater than 0;
m is a number from 0 to 100;
p is a number from 0 to 10 000;
x is the number 1 or 2;
Rs A, is C,-C,aalkyl or a radical of formula -~- i i-Ra ;
R~
la A2 is C,-C,8alkyl or a radical of formula - i ~-Rs ;
Rio or A, and Az together are a single bond;
R,, R2, R3, Rs, R6, R~, Ra, R9 and R,o are each independently of the others C,-C,ealkyl, phenyl, C2-Cahydroxyalkyl, C2-Csaminoalkyl or Cs-Cacycloalkyl;
R4 is C,-C,aalkyl; C,-C,aalkyl substituted by hydroxy, C,-C,2alkoxy, halogen, C3-Ca-cycloalkyl andlor by N(R")(R,2); or R4 is phenyl; phenyl substituted by C,-C,2alkyl, C,-C,2-alkoxy, halogen, hydroxy andlor by N(R")(R,2); or R4 is Cs-Cacycloalkyl;
R" and R,2 are each independently of the other hydrogen, C,-C,2alkyl or C,-C,2hydroxy-alkyl, or R" and R,2 together are C2-Caalkylene, which may be interrupted by an oxygen atom;
O R~3 IN when x is 1, is a radical of formula - ~c-c-x ; or ~Y
Ria O R~3 IN when x is 2, is a radical of formula -Y~c-c-x;
R~4 R,3 and R,4 are each independently of the other C,-C,2alkyl, C2-CBalkenyl, Cs-Cscycloalkyl, phenyl-C,-C3alkyl; or R,3 and R,4 together are C2-Csalkylene, C3-C9oxaalkylene or C3-C9-azaalkylene;
Y is -(CH2)a , -(CH2)a-O-, -O-(CH2)a O-, -(CH2)b-O-(CH2)a-, -(CH2)b-O-(CH2)a-O-, -(CH2)a N(R,2)- -(CHZ)b-O-(CH2)a-N(Rm)-, -(C2-C,oalkenylene)-O-, -(C2-C~oalkenylene)-N(R,2)-, -(C2-C,oalkenylene)-O-(CH2)a O- or -(C2-C,oalkenylene)-O-(CH2)a N(R~2)- ;
a and b are each independently of the other a number from 0 to 10;
X is OR,S or N(R,s)(R,~);
R,5 is hydrogen, C,-Caalkyl, C2-CBalkenyl or C,-C4alkanoyl;
R,s and R,~ are each independently of the other hydrogen, C,-C,2alkyl or C2-Csalkenyl; or R,s and R» together are C4-Csalkylene and, together with the nitrogen atom to which they are bonded, form a 5- or 6-membered ring, which may be interrupted by O or by N(R,2); and X, is a radical -O-, -O-(CH2)a or -N(R,2)-(CH2)a A number of compounds of formula I are novel and form part of the subject matter of the pre-sent Application.
C,-C,sAlkyl is linear or branched and is, for example, C,-C,2-, C,-Cs-, C,-Cs-or C,-C4-alkyl.
Examples thereof are methyl, ethyl, propyl, isopropyl, n-butyl, sec-butyl, isobutyl, tert-butyl, pentyl, hexyl, heptyl, 2,4,4-trimethylpentyl, 2-ethylhexyl, octyl, nonyl, decyl, undecyl, dodecyl, hexadecyl and octadecyl. For example, R,, R2, R3, R4, R5, Rs, R,, Ra, R9 and R,o are C,-CBalkyl, especially C,-Csalkyl, preferably C~-C4alkyl, such as methyl or butyl, especially methyl.
O R~3 IN when x is 1, is a radical of formula - ~c-c-x ; or ~Y
Ria O R~3 IN when x is 2, is a radical of formula -Y~c-c-x;
R~4 R,3 and R,4 are each independently of the other C,-C,2alkyl, C2-CBalkenyl, Cs-Cscycloalkyl, phenyl-C,-C3alkyl; or R,3 and R,4 together are C2-Csalkylene, C3-C9oxaalkylene or C3-C9-azaalkylene;
Y is -(CH2)a , -(CH2)a-O-, -O-(CH2)a O-, -(CH2)b-O-(CH2)a-, -(CH2)b-O-(CH2)a-O-, -(CH2)a N(R,2)- -(CHZ)b-O-(CH2)a-N(Rm)-, -(C2-C,oalkenylene)-O-, -(C2-C~oalkenylene)-N(R,2)-, -(C2-C,oalkenylene)-O-(CH2)a O- or -(C2-C,oalkenylene)-O-(CH2)a N(R~2)- ;
a and b are each independently of the other a number from 0 to 10;
X is OR,S or N(R,s)(R,~);
R,5 is hydrogen, C,-Caalkyl, C2-CBalkenyl or C,-C4alkanoyl;
R,s and R,~ are each independently of the other hydrogen, C,-C,2alkyl or C2-Csalkenyl; or R,s and R» together are C4-Csalkylene and, together with the nitrogen atom to which they are bonded, form a 5- or 6-membered ring, which may be interrupted by O or by N(R,2); and X, is a radical -O-, -O-(CH2)a or -N(R,2)-(CH2)a A number of compounds of formula I are novel and form part of the subject matter of the pre-sent Application.
C,-C,sAlkyl is linear or branched and is, for example, C,-C,2-, C,-Cs-, C,-Cs-or C,-C4-alkyl.
Examples thereof are methyl, ethyl, propyl, isopropyl, n-butyl, sec-butyl, isobutyl, tert-butyl, pentyl, hexyl, heptyl, 2,4,4-trimethylpentyl, 2-ethylhexyl, octyl, nonyl, decyl, undecyl, dodecyl, hexadecyl and octadecyl. For example, R,, R2, R3, R4, R5, Rs, R,, Ra, R9 and R,o are C,-CBalkyl, especially C,-Csalkyl, preferably C~-C4alkyl, such as methyl or butyl, especially methyl.
C,-C,2AIkyl, C,-C,oalkyl and C,-Csalkyl are also linear or branched and have, for example, the meanings given above up to the corresponding number of carbon atoms.
Substituted alkyl is, for example, mono- to penta-substituted, mono- to tri-substituted or mono- or di-substituted.
Alkyl substituted by halogen is substituted, for example, by fluorine, chlorine, bromine or iodine.
Alkyl substituted by OH is mono- or poly-substituted, especially mono-substituted, by OH.
Examples thereof are 2-hydroxyeth-1-yl, 3-hydroxyprop-1-yl and hydroxymethyl.
C2-CsHydroxyalkyl is hydroxy-substituted C2-Csalkyl, wherein the alkyl has the meanings given above according to the number of carbon atoms.
C2-C6Aminoalkyl is C2-Csalkyl substituted by an amino radical, especially by -NH2, wherein the alkyl has the meanings given above according to the number of carbon atoms.
C2-CaAlkylene is linear or branched, such as ethylene, propylene, isopropylene, n-butylene, sec-butylene, isobutylene, tert-butylene, pentylene, hexylene, heptylene or octylene. When R,3 and R,4 together are C2-CBalkylene, they are especially pentylene, that is to say, together with the carbon atom to which they are bonded, they form a cyclohexyl ring, the following structure being intended -~~ X~~ , _ o especially -C3-C90xaalkylene and C3-C9azaalkylene are alkylene, as described above, interrupted by O-or by N(R,2).
C5-C$Cycloalkyl is linear or branched alkyl containing at least one ring, for example cyclo-pentyl, methylcyclopentyl, cyclohexyl, methyl- or dimethyl-cyclohexyl or cyclooctyl, especially cyclopentyl and cyclohexyl.
C,-C,2AIkoxy denotes linear or branched radicals and is, for example, C,-C8-, C,-C6- or C,-C4-alkoxy. Examples thereof are methoxy, ethoxy, propoxy, isopropoxy, n-butyloxy, sec-butyloxy, isobutyloxy, tert-butyloxy, pentyloxy, hexyloxy, heptyloxy, 2,4,4-trimethylpentyloxy, 2-ethylhexyloxy, octyloxy, nonyloxy, decyloxy and dodecyloxy, especially methoxy, ethoxy, propoxy, isopropoxy, n-butyloxy, sec-butyloxy, isobutyloxy, tert-butyloxy, preferably methoxy.
Substituted alkyl is, for example, mono- to penta-substituted, mono- to tri-substituted or mono- or di-substituted.
Alkyl substituted by halogen is substituted, for example, by fluorine, chlorine, bromine or iodine.
Alkyl substituted by OH is mono- or poly-substituted, especially mono-substituted, by OH.
Examples thereof are 2-hydroxyeth-1-yl, 3-hydroxyprop-1-yl and hydroxymethyl.
C2-CsHydroxyalkyl is hydroxy-substituted C2-Csalkyl, wherein the alkyl has the meanings given above according to the number of carbon atoms.
C2-C6Aminoalkyl is C2-Csalkyl substituted by an amino radical, especially by -NH2, wherein the alkyl has the meanings given above according to the number of carbon atoms.
C2-CaAlkylene is linear or branched, such as ethylene, propylene, isopropylene, n-butylene, sec-butylene, isobutylene, tert-butylene, pentylene, hexylene, heptylene or octylene. When R,3 and R,4 together are C2-CBalkylene, they are especially pentylene, that is to say, together with the carbon atom to which they are bonded, they form a cyclohexyl ring, the following structure being intended -~~ X~~ , _ o especially -C3-C90xaalkylene and C3-C9azaalkylene are alkylene, as described above, interrupted by O-or by N(R,2).
C5-C$Cycloalkyl is linear or branched alkyl containing at least one ring, for example cyclo-pentyl, methylcyclopentyl, cyclohexyl, methyl- or dimethyl-cyclohexyl or cyclooctyl, especially cyclopentyl and cyclohexyl.
C,-C,2AIkoxy denotes linear or branched radicals and is, for example, C,-C8-, C,-C6- or C,-C4-alkoxy. Examples thereof are methoxy, ethoxy, propoxy, isopropoxy, n-butyloxy, sec-butyloxy, isobutyloxy, tert-butyloxy, pentyloxy, hexyloxy, heptyloxy, 2,4,4-trimethylpentyloxy, 2-ethylhexyloxy, octyloxy, nonyloxy, decyloxy and dodecyloxy, especially methoxy, ethoxy, propoxy, isopropoxy, n-butyloxy, sec-butyloxy, isobutyloxy, tert-butyloxy, preferably methoxy.
C,-CBAIkoxy is also linear or branched and has, for example, the meanings given above up to the corresponding number of carbon atoms.
C2-CSAlkenyl is mono- or poly-unsaturated and linear or branched, and is, for example, C2-C6-or C2-C4-alkenyl. Examples thereof are allyl, methallyl, 1,1-dimethylallyl, 1-butenyl, 2-butenyl, 1,3-pentadienyl, 1-hexenyl and 1-octenyl, especially allyl. R,3 and R,4 as C2-C$alkenyl are, for example, C2-Csalkenyl, especially C2-C4alkenyl.
C2-C,oAlkenylene is a divalent radical that is mono- or poly-unsaturated and linear or branched, and is, for example, C2-C6- or C2-C4-alkenylene. Examples thereof are allylene, methallylene, 1,1-dimethylallylene, vinylene, 1-butenylene, 2-butenylene, 1,3-pentadienyl-ene, 1-hexenylene and 1-octenylene, especially allylene.
C,-C4AIkanoyl is linear or branched and is, for example, formyl, acetyl, propionyl, butanoyl or isobutanoyl.
Halogen is fluorine, chlorine, bromine or iodine, for example fluorine, chlorine or bromine, especially chlorine or fluorine.
Phenyl-C,-C3alkyl is, for example, benzyl, phenylethyl, a-methylbenzyl or a,a-dimethylbenzyl, especially benzyl.
When R~6 and R,~ together with the nitrogen atom to which they are bonded form a 6-membered aliphatic ring, which may be interrupted by a further nitrogen or oxygen atom, it is, for example, a morpholinyl, piperidinyl or piperazinyl ring.
When R" and R,2 together are C2-C8alkylene that may be interrupted by an oxygen atom, they form together with the nitrogen atom to which they are bonded, for example, a piperidi-nyl or morpholinyl ring.
The units of formulae la, Ib and/or Ic are arranged randomly or in blocks, that is to say in the formula drawing given for formula I the units may be arranged in any order.
For example, blocks of units of formulae la, Ib and Ic may follow one another, but the individual units may also be linked in random distribution, depending upon the siloxane used during preparation.
_7_ The expression "and/or" indicates that not just one of the defined alternatives (e.g. substi-tuents) may be present, but that it is also possible for a plurality of different defined alternati-ves (e.g. substituents) to be present together, that is to say mixtures of different alternatives (e.g. substituents) may be present.
The expression "at least one" is intended to mean one or more than one, for example one or two or three, preferably one or two.
R,3 and R~4 are, for example, C,-C4alkyl, especially methyl. Preferably R13 and R,4 are methyl or together are C3-Cealkylene; in particular, together with the carbon atom to which they are bonded they form a cyclohexylring, or R,3 is C,-C4alkyl, especially ethyl, and R~4 is allyl or benzyl.
"a" is preferably a number from 0 to 10, e.g. from 0 to 3, especially 3; "n"
is preferably from 1 to 100; "p" is, for example, from 1 to 1000, from 1 to 100, from 1 to 50 or from 1 to 25; and "m" is from 0 to 100, e.g. from 0 to 50 or from 0 to 25, especially 0.
When the siloxane starting material is a mixture of oligomeric siloxanes, "n"
may also be less than 1, but greater than 0. In that case, "n" is, for example, a number from 0.1 to 1000, from 0.5 to 1000, from 0.8 to 1000, etc..
X is preferably OR,S and R,5 is preferably hydrogen.
Y is preferably -(CHZ)a O- , -(CH2)a-O-(CH2)a- or -(CH2)a O-(CH2)a O-, where a is especially 3.
In the IN group, Y is especially positioned on the phenyl ring in the para-position relative to the carbonyl group.
R,6 and R" are especially C,-C4alkyl, preferably methyl, or together with the nitrogen atom to which they are bonded form a morpholinyl radical.
R,, R2 and R3 are preferably C,-C4alkyl, especially methyl.
R4 is especially C,-C4alkyl, for example methyl.
Preference is given to a process as described above in which the su rface-active photo--8_ initiator (B) is a compound of formula I, wherein n is a number from 1 to 10, or, when the siloxane starting material is a mixture of oli-gomeric siloxanes, n may also be less than 1, but greater than 0;
m is a number from 0 to 25;
p is a number from 0 to 25;
Rs A, is C,-C4alkyl or a radical of formula -o-s.-R6 ;
R~
Re A2 is C,-C4alkyl or a radical of formula -si-R9 ;
Rio or A, and A2 together are a single bond;
R,, R2, R3, R5, Rs, R,, R8, R9 and R,o are each independently of the others C,-C4alkyl;
R4 is C,-C4alkyl;
R,3 and R,4 are each independently of the other C,-C4alkyl; or R,3 and R,4 together are C2-Cgalkylene;
Y is -(CH2)a O-, -(CH2)b-O-(CH2)a- or -(CH2)b-O-(CH2)a O- ;
a and b are each independently of the other the number 2 or 3;
R,5 is hydrogen;
R,6 and R" together are C4-CSalkylene and together with the nitrogen atom to which they are bonded form a 6-membered ring interrupted by O; and X, is a radical -O-(CH2)a .
CH3 _ O CH3 Of special interest are the compounds ~CH3)3SrO~2Sl-(CHZ)3 O ~ / CI- i -off , CHI
CH3 _ O CH3 CH3 ~CH3)~Si-OtSi-(CHZ)3 O \ ~ IC- i O (CHZ)3-g1~0-SI(CH3)3~ 2 , J 2 CHs _g_ H3C-Si-CH3 _ O CH
O CH3 ~ / (CHx)s O \ / C-C-OH
CH3 CH3 CH3 ~ I ~ , H3C-Si CH
H3C-Si-O-Si-O-Si-(CH2)3 O \ ~ C-C-OH O
CH3 CH3 CH3 CH3 H3C-Si _ O CH3 O ~ (CH2)3 O \ / C-C-OH
H3C-Si-CH3 CH3 CH _ O CH3 H3C-Si 3 (CHZ)3 O \ ~ C-C-OH H3C (CH -O~OC-CHOH
~r'H3 ~ /~ 2)3 \ / I
I ~ H3C-Si CH3 H C-Si-CH p I
_ O CH3 H3C-SI _ ~ CH3 H3C-Si-(CH2)3 O \ ~ C-C-OH H C ~(CH2)3 O \ / C-C-OH
3p HO-CH CI ~ \ O
CH3 ~CHz)3 O CHs H3C Si-O~ CHs ~ I I
CH p Si-(CH2r0 \ / C-C-OH
HO-,C 3C / ~ O~CHz)3 Si~ ,O CH3 H3C O CH ~ ~ i-CH3 _ O CH3 (CHZ)3 O \ ~ C-C-OH
CH30 _ ~~ i Ha HO-~-IC ~ ~ O-(\ 2)' ~(CH2)3 O \ / C-C-OH
CH \ .O- i W CH3 H3CiSi CH3 ; /CH3 _ O H3 iH3il _ Si,~CH3 ~I~(CHZ)3 p ~ ~ C-~-pH
HO- i -C \ / O-(CHZ)3 10 ~Si~-CH _ O CH CH3 CH3 (CHZ)3~0 C-C 30H
i H3C-Si-CH3 H3C-Si-CH3 I
O _ O CH3 O
2 3 Si-CH
H3C-Si-H-~-(CHZ)2 O 2 \ / C C O (CH ) p z CH3 O
H C-Si-CH
H3C-SrCH3 3 I 3 H3C-Si-CH3 _ O CH CH3 CH3 - O CH3 H3C-Si-(CH2)3 O ~ ~ C-C-N ~ H3C-Si-O-Si-(CH2)3 O ~ ~ C-C-N O
p CH V CH3 CH3 CH3 U
H3C-Si-CH3 CHa CHa CHa H C-Si-CH H3C-Si-CHa H3C-Si-CHa 3 ~ 3 _ O CH O _ O CHa O
H3C-Oi (CHZ)3 O (CHZ)a ~ / C CHOH ~ H3C p (CH2)a O (CHZ)a ~ / C CHO (CHZ)a Si-CHa H C-Si'CHa H3C-$i'CHa HaC-Si-CHa a CHa CHa CHa ~H3 CHa H3C-Si-CHa H3C-Si-CH3 'O' CHa ~ H C-OSi-NCH ) O-(CH ) O ~ / OC
H3C-Si-(CHZ)3 O-(CHZ)a ~ ~ c-c-N o and 3 I z a a z HO
O CH ~/ O
H C-$i'CHa H3C-Si-CHa a CH CHa The compounds of formula I are prepared according to customary methods known to the person skilled in the art.
Thus, compounds of formula I may be obtained, for example, by reacting a photoinitiator with at least one alkenyl radical (IV) or (IVa) and a siloxane (V) in the presence of a suitable catalyst:
R~3 ~ 13 x-c-c ~ x-c-c I Il~r-c=cH2 I II Y-C-C=CH2 IVa R~4 O H (IV) Or R~4 O Hz H ( ) IN IN
R~ Rz Ra ( ) A~ i i-O i i-O Si-O Az H L H LRa m P
catalyst _ 11 _ A, ~ i-O i i-O Si-O A2 n H m Ra P
IN
wherein IN, R,, R2, R3, R4, R,3, R,4, X, Y, A,, A2, n, m and p are as defined above.
In order to prepare compounds of formula I wherein x = 2, suitably modified photoinitiators are used, that is to say those having, for example, 2 alkylene units.
The alkylene unit may, for example, be present at a different position on the photoinitiator molecule and the linkage to the siloxane is then effected in that position:
O OH
ii I
Catalyst ~ C-~-(CH2)a ~~-R~
CFi HZ H Chl2 + (V) ~ , CH3 n H-SrR2 m R4 Si-R3 ~P
Such reactions are described, for example, in US 4391963, EP 162572 or N.S.
Allen et al., J.Photochem. Photobiol. A: Chem. 62 (1991), 125-139.
Reaction conditions for such reactions will be known to the person skilled in the art. The molar ratios of the alkenyl-modified compound (IV) and the siloxane compound (V) are de-pendent upon the desired product and are generally not critical. For example, the amount of (IV) to be used will be selected according to the content of free Si-H groups in (V) and the desired degree of substitution of those groups in the particular case. If all the groups are to react, it is advantageous, for example, to use (IV) in excess. It is also possible, however, to use an excess of component (V).
The reaction temperatures are advantageously kept within a range of from 20 to 150°C, pref-erably from 60 to 110°C. It is also advantageous to carry out the reaction, for example, in a suitable aprotic organic solvent, such as tetrahydrofuran (THF), dioxane, hexane, heptane, cyclohexane, toluene, xylene, benzene or chlorobenzene. The reaction may, however, also be carried out, for example, without solvent.
The reaction mixture will usually be stirred while the reaction is being carried out.
It is also advantageous to carry out the reaction under inert conditions, for example under an argon or nitrogen atmosphere.
Catalysts suitable for carrying out the reaction are, for example, noble metal catalysts, such as platinum or rhodium catalysts. Examples thereof are HZPtCIs and PtCl2(C6H5-CH=CHZ)2.
Such catalysts may, for example, also be applied to suitable support materials, for example aluminium oxide, such as PtIAl203 (for example, obtainable from Heraeus).
Examples of suitable catalysts are platinum, palladium, rhodium, nickel, cobalt, or other metals in pow-dered form or in complexes; platinum sponge, platinum black, chloroplatinic acid, the reac-tion product of chloroplatinic acid and alcohol, a complex of chloroplatinic acid and vinyl si-loxane. Such catalysts are commercially available, for example platinum/-carbonyl/cyclovin-ylmethylsiloxane complex, platinum/divinyltetramethyldisiloxane complex, plati-numloctanealdehyde/octanol complex, or may be obtained according to methods customary in the art and known to the person skilled in the art.
The concentration of the catalyst is advantageously, for example, from 1 to 1000 ppm, for example from 150 to 400 ppm.
A further possible method of preparing the surface-active photoinitiators is to react a photo-initiator that contains a suitable silyl group with an alkenyl-modified siloxane:
A~
i Ai Rz I catalyst H-Si-IN ~- H2C=C-R'-Si-R, R~ Si-R'-C-C-Si-IN
R3 H ~ p Hz Hz Rs R,, RZ, R3, IN and A, are as defined above; R' is an alkylene radical;
"...." indicates that the radical of the siloxane molecule moiety defined in formula I is attached at that position (according to formula I in this reaction in the starting material m must be 0).
The reaction conditions for this method correspond to those described above.
Such reac-tions are described in the literature, for example, in US 4 391 963 and in JMS
Pure Applied Chem. A31 (3) (1994), 305.
The surface-active photoinitiators may, for example, also be obtained by reacting an OH-group-containing initiator with a siloxane:
A~
A~
HO-IN + H-Si-R~ ~' iN-O Si-R~
~n H Si Rz ~m R4 Si-R3 ~P
Az R~, R2, R3, IN, A~, n, m, p, R4 and A2 are as defined above; "...." indicates that the radical of the siloxane molecule moiety defined in formula I is attached at that position.
Suitable catalysts for this reaction are, for example, tin octoate, dibutyltin dilaurate, zinc oc-tanoate, tin octanoate and zinc octanoate. Examples of such reactions (although the exam-ples contain a sensitiser unit instead of a photoinitiator unit) can be found in US 4921589.
In JMS Pure Appl. Chem. A 34(11 ) (1997), 2335-2353, L. Lecamp et al. describe a method for preparing siloxane-containing initiators in which an initiator containing an Si(OR)~_3 group and a siloxane having an Si-(OH),_2 group are reacted. The catalyst used is, for example, di-butyltin dilaurate:
A R
z A R Si , = ~' ' O-Si-IN
Si IN + HO- i i-R, O O
R"O
OR" I A~
Si-R~
. O
... I
IN, R,, R2 and A, are as defined above; R" is alkyl, especially methyl; "...."
indicates that the radical of the siloxane molecule moiety defined in formula I is attached at that position.
Surface-active photoinitiators according to the present invention can also be obtained, for example, by reacting a photoinitiator containing at least one carbonyl group on the aromatic ring with a siloxane containing a C-C double bond as terminal group (e.g.
allyl or vinyl).
R\
~C ~
O A
O
C Rx __ _ _ ~ ~_ --~ HzC\
+ FizC H R~ i i R' C-R'-gi_R
/ Hz O , R, and A, are as defined above; Rx together with the adjacent carbonyl group forms a ben-zoin, an a-hydroxyketone or an a-aminoketone; R' is alkylene; "...." indicates that the radical of the siloxane molecule moiety defined in formula I is attached at that position.
That reaction is published in US 5776658. Suitable catalysts for that reaction are, for exam-ple, ruthenium compounds, as described by Mural et al. in Nature 366 (1993) 529.
US 4 477 326 and JP 9-328522-A describe the polymerisation or copolymerisation of polyal-koxysiloxanes in the presence of a base or of an acid catalyst. The method described is suitable also for the preparation of surface-active initiators:
z Rz -R~- H+ or -OH IN-Si-O-S
IN-Si-OR" + R O Si OR p OR" Rz Si-IN, R~ and Rz are as defined above; R" is alkyl.
In that reaction it is possible to obtain both polymeric and cyclic products.
A further possible method of preparing surface-active photoinitiators is described, for exam-ple, in US 4587276 and US 4477276, namely the polymerisation or copolymerisation of si-loxanes having hydrolysable groups (e.g. Si-CI) in the presence of water:
A, R, A, R-Si-R H2O R2 Si-O-Si-R' IN-Si-Ra + a I ' ~' ~N of Rz IN, R,, R2 and A~ are as defined above; Ra is, for example, CI or OCH3; "...."
indicates that the radical of the siloxane molecule moiety defined in formula I is attached at that position.
In J.M.S. Pure Appl. Chem. A 31 (3) (1994), 305-318, A. Kolar et al. describe the preparation of photoinitiators containing siloxane radicals starting from 1,4-dichlorobenzene. A Grignard reaction creates a reactive centre, which is reacted with dirnethyldichlorosilane or dimethyl-monochlorosilane to form the corresponding silyl-modified chlorobenzene, into which the ap-propriate a-cleavable photoinitiator carbonyl radical is introduced by further reactions.
In Makromol. Chem. 193 (1992) 1273-1282, L. Pouliquen et al. published a multi-step reac-tion of photoinitiators having acid groups and a siloxane having epoxy radicals in the pres-ence of acetic anhydride (the photoinitiator compounds in that reference are of the phe-noneltert-amine type) H3C-C=O
O p'~ O O
II p ~ ii n O
IN- C - OH + ~R'- i i-R, + H3C.C_O.C.CH3 _~ O HC-R~- i i-R~
IN, A~ and R~ are as defined above; R' is alkylene; "...." indicates that the radical of the silox-ane molecule moiety defined in formula I is attached at that position.
Isocyanate-group-containing photoinitiators and siloxanes having hydroxyl or amine groups may also be reacted to form surface-active photoinitiators:
A H A
I' ,N. ~z,~ I' Z- i-R~ IN C Si-R~
IN-N=C=O + ~ O
IN, A, and R, are as defined above; Z is NH2 or OH; Z, is NH or O; "...."
indicates that the radical of the siloxane molecule moiety defined in formula I is attached at that position.
Such reactions are described, for example, in WO 96/20919.
Photoinitiators substituted by cyclic siloxane radicals may be obtained, for example, by carrying out the reactions described above with a cyclic siloxane, for example O-Si(R2)2 O
Si(R2)2 i I(R2)2 y O-Si(R2)-O
H
In order to prepare photoinitiators provided with cyclic siloxane radicals, it is also possible, however, firstly to introduce linear siloxane radicals, for example by means of the methods described above, and subsequently to cyclise them by the action of a base, for example so-dium hydroxide, or by the action of an acid.
The synthesis of surface-active photoinitiators containing cyclic siloxane radicals can be car-ried out, for example, as described above by reacting a cyclic siloxane with the initiator moi-ety in question:
H IN
I .R, I .R, si s~
IN + o~ jo y --~ o~ jo y si ~s~~
R~ ~H Ri IN
(IN and R~ are as defined above; y determines the size of the ring) or by a cyclisation reaction of an OR-group-containing siloxane-modified initiator moiety in the presence of an acid or alkali:
IN
R _ I.R
H+ or OH ~ Sip IN-Si-(OR")b O~ /O y ~Si R \IN
(R, and IN are as defined above; R" is alkyl; a= 0 or 1; b=1 or 2, where the sum of a+b=3;
depending upon the value of a and b, R is either R, or OR") Cyclic compounds can also be formed by reacting an OR-group-containing siloxane-modified initiator moiety with an OR-group-containing siloxane:
IN
~,R~
_ Si IN-Si- OR" + R-Si-(OR") H+ or OH
( )2 2 2 y O
j~ i RZ R
' y1 (IN, R, and R2 are as defined above; R" is alkyl; the sum of y and y1 determines the number of ring members) The distribution of the Si(IN)(R,) and Si(R~)(R2) groups will be either random or in blocks.
The preparation of the surface-active photoinitiators may also yield mixtures of active com-pounds. Such mixtures can be separated by customary methods, such as distillation, crys-tallisation or chromatography, or they may be used as such as surface-active photoinitiators in compositions to be polymerised.
The invention relates also to photoinitiator mixtures comprising CH3 ~ ~H3 Hs _ ~ CH3 CH3 ~(CH3)3SI-o~2$I~CHz)3 0 ~ ~ CI-C-off ~ CCH3)3Si-O~2 1-~CHZ)3 O ~ ~ C-C-O-S1~0-SI(CH3)3] 2 , i H3 - O CH3 i H3 i Hs ~~ CH3 [CH3)3Si-O~-Si-O ~ ~ C-C-O-Si-EO-Si(CH3)3] 2 and/or (CH3)3Sj-O SI-O ~ ~ C-C-OH
s 2 CHs 2 CHs ~Hs O CH3 CH3 or mixtures comprising CCH3)3SI-O~-SI-(CHZ)3 O ~ ~ C-C-O-(CH2)3 Si~O-Si(CH3)~
, CH3 O CH3 CH3 i Hs _ ~ CH3 [CH3)3Si-0~2Si-O ~ ~ C-C-O-Si-~O-Si(CH3)3]2 ~ [(CH3)sSwO~"SI-O ~ ~ c-CH off and/or z i H3 _ ~ ~ Hs [(CH3)3SI-O~Si~CHz)3 O ~ ~ C-C-OH ;
or mixtures comprising ~ 3 ~ 3 ~ 3 ~II I , H3C-Si-O-Si-O-Si-(CH2)3 O ~ ~ C-C-OH
CH CH CH _ O CH3 CH3 CH3 CH3 H C-Si-O-Si-O-Si 3(CH ) O ~ ~ CI-C-O-$i-O-Si-O-I~ i-CH3 ' 3 CH3 CH3 CH3 z s CH3 ICH3 CH3 CH3 O CH CH CH I I I H
HZC=H-H-O ~ ~ CI-CH3 O-~i-O-Si O-1~ i CH3 andlOr H3C SH30--SHO SHO ~ ~ C-C 3 OH
z CH3 CH3 CH3 CH3 CH3 CH3 CH3 CH
H3 CH3 CH3 a _ O CH
or mixtures comprising Ho-~-c ~ ~ o-(cH2)3 ~Si-o-si-(cH2)3 0 ~ ~ c-c-off H-Si-O-Si-O-C-C ~ ~ O-(CH2)3 Si-O-Si-(CH2)3 O~C-C-OH
CH3 CH3 CHI CH3 CH \ / CH
CH3 CH3 CH3 _ O CH3 HO-C-C ~ ~ O-Si-O-Si-(CH2)3 O ~ ~ C-C-OH and/or CH3 / ~ CH3 CH3 O CH3 Ho-c-c-O-o-si-o-si-o ~ ~ c-c-off ; or mixtures comprising compounds of R' H C-Si-O CH3 _ O CH
formula 43~~ Si R2 (llla) wherein R'=R2=R3=R4= -(CH2)3 0 ~ ~ c-c-off , R-Sip ~O CH3 O-Si-CH3 _ O CH
compounds of formula Illa wherein R'=R2=R3= -(cHz)3 0 ~ ~ c-c-off and R4= H, _ O CH3 and/or compounds of formula Illa wherein R'=R2=R3= -(CH2)3 O ~ ~ C-C-OH and R' ~Si R4= -(CH2)2CH3 ; or mixtures comprising compounds of formula 5 0' ~o'S~~o (Illb) R jSi,~ Si~O~s3w R a~ R
_ O CH3 wherein R'=R2=R3=R4= R5= -(cHz)3 0 ~ ~ c-c-off , compounds of formula Illb _ O CH
wherein R'=R2=R3=R4= -tcH2)3 0 ~ ~ c-c-off and R5= H and/or compounds of _ O CH
formula Illb wherein R'=R2=R3= -(cHz)3 0 ~ ~ c-c-off and R4=R5 = H;
H3C-Si-GH3 O' C-C-OH
or mixtures comprising H3C-Si-H~(CHz)z-O 2 \ / CH
H3C-Si-CH3 CH3 ~ Hs H3C~g~-CH3 H3C-SnCH3 _ O CH3 O O Hz H2C=c-C-o-C-c-o ~ ~ C-c-O-Si-CH3 and/or H3C-Si-O-C-C - O CH3 H Hz H2 Hz CH3 O O Hz O ~ ~ C-C-OH
H C.Si CH3 H3C-SI CHs H3C-Si'CH3 H3C-Si-CH3 i or mixtures comprising H3c-o-H-f -(cH2)2 0 2 ~ ~ c-c-o-(cH2)3 si-cH3 z CH3 O
1 H C-Si-CH
H3C-Si-CH3 H3C-Si-CH3 _ O _ O CH
H3C O (CHz)3 O-(CHz)z O ~ ~ OC-CHOC3H~ and/or H3C-Si-iCHz)3-O-(CHz)2 O ~ ~ C-C-OH
H3C-Si-CH3 H3C-Si-CH3 H3C-Si-CH3 H3C-Si-CH3 O _ O CH3~--~ O CH3 _ O CH3~
or mixtures comprising H3C-Si-(CHZ)3 O ~ ~ C-C-N O , H3C-Si-H-CHZ O ~ ~ C-C-N~
O CH ~ O CH3 H3C-SI-CH3 3 H3C-Si-CH3 H3C- igi-CH3 H C--OSi-O ~ ~ C-C~HN~
and/or O CHs H3C-Si-CH3 CH3 CH3 _ O CH3 ~
or mixtures comprising H3C-Si-O-Si-(CHZ)3 0 ~ ~ c-c-ni o and CH3 CH3 CH3 ~
CH3 CH3 _ ~ CH3 ~
H3c-si-o-si-o ~ ~ c-c-N o ; or mixtures comprising CH3 CH3 CH3~/
CH3 i H3 H3C-Si-CH3 H C-Si''CH3 i (' O ' H3 3 ~ ~H3 _ O H3 f H3C-Si-(CHZ)3 O-(CH2)3 ~ ~ C C OH ' H3C-Si-H-H-O-(CH2)3 ~ / C ~ OH
p CH3 O 2 CH3 H C-$i'CHs H3C-~i-CH3 OH _ O CH3 andlOr H3C-Si-(CHZ)3 O-(CHZ)3 ~ ~ C-C-OH ; or mixtures comprising H3C-Si-CH3 H3C-Si-CH3 p - O CH3 O
i H3C-Si-(CH2)3 O-(CH2)3 ~ ~ C-C-O-(CH2)3 Si-CH3 and p CH3 O
i H3C-Si'CHs H3C-Si-CH3 j "3 H3C-Si-CH3 _ p CH3 H3C-Si-(CH2)3 O-(CH2)3 ~ ~ C-C-OH
O CHs i H_C-Si'CH3 The alkenyl-modified photoinitiators (IV) can be prepared according to methods known to the person skilled in the art, for example according to the method described in EP
281941. Suit-able processes have also been published in WO 97/49768.
Some of the siloxane compounds (V) are commercially available, or they can be obtained according to methods known to the person skilled in the art. For example, preparation meth-ods and literature references for preparation can be found in the catalogue of the Geleste company, "ABCR Geleste 2000", pages 434-447.
The photoinitiators are used according to the invention in the curing of free-radically poly-merisable systems, with the aim of obtaining a cured surface having excellent properties. A
crucial factor is that the photoinitiator concentrates at the surface of the formulation to be cured. As explained above, this is achieved by providing suitable substituents on the photo-initiator. Improved surface properties can be obtained using such initiators not only in purely photocurable systems, but also in mixed thermocurable/photocurable formulations. The pre-sent invention accordingly relates also to the use of photoinitiators of formula I in purely photocurable formulations and also to the use of photoinitiators of formula I
in mixed photo-chemically and thermally curable formulations. Thermal curing can be effected before, dur-ing or after the irradiation.
The invention accordingly relates also to a process as described above, in which the photo-curable formulation comprises as further component at least one thermally crosslinkable compound (C), and the curing of the formulation is carried out by irradiation with light of a wavelength of from 200 to 600 nm and by prior, simultaneous and/or subsequent action of heat.
According to the invention the compounds of formula I may be used as surface-active photoinitiators for the photopolymerisation of ethylenically unsaturated compounds or mix-tures comprising such compounds, and become oriented towards the surface of the formula-tion in question. According to the invention the initiators of formula (I) are not used in com-positions that contain siloxane-modified resin components since concentration at the surface cannot occur therein, but instead the initiators are compatible with the formulation and are therefore readily miscible or compatible therewith.
The photoinitiators can also be used in combination with other photoinitiators (E) and/or fu r-ther additives (D).
The invention accordingly relates also to photopolymerisable compositions, comprising (A) at least one ethylenically unsaturated free-radically photopolymerisable compound; and (B) at least one surface-active photoinitiator of formula I, provided that the composition does not contain any siloxane-modified resins in addition to the photoinitiator.
The invention relates also to photopolymerisable compositions, comprising (A) at least one ethylenically unsaturated free-radically photopolymerisable compound;
(B) at least one surface-active photoinitiator of formula I, and (C) at least one thermally crosslinkable compound;
provided that the composition does not contain any siloxane-modified resins in addition to the photoinitiator.
According to the invention, the compositions may also comprise further different photo-initiators (E) andlor further additives (D).
It is also possible to add catalysts for the thermal crosslinking. Suitable examples are listed below.
The unsaturated compounds (A) may contain one or more olefinic double bonds.
They may be low molecular weight (monomeric) or higher molecular weight (oligomeric).
Examples of monomers having a double bond are alkyl and hydroxyalkyl acrylates and methacrylates, such as methyl, ethyl, butyl, 2-ethylhexyl and 2-hydroxyethyl acrylate, isobornyl acrylate and methyl and ethyl methacrylate. Further examples thereof are acrylonitrile, acrylamide, meth-acrylamide, N-substituted (meth)acrylamides, vinyl esters, such as vinyl acetate, vinyl ethers, such as isobutyl vinyl ether, styrene, alkyl- and halo-styrenes, N-vinylpyrrolidone, vinyl chloride and vinylidene chloride.
Examples of monomers having several double bonds are ethylene glycol diacrylate, propyl-ene glycol diacrylate, neopentyl glycol diacrylate, hexamethylene glycol diacrylate and bisphenol A diacrylate, 4,4'-bis(2-acryloyloxyethoxy)diphenylpropane, trimethylolpropane tri-acrylate, pentaerythritol triacrylate or tetraacrylate, vinyl acrylate, divinyl benzene, divinyl succinate, diallyl phthalate, triallyl phosphate, triallyl isocyanurate and tris(2-acryloylethyl) isocyanurate.
Examples of higher molecular weight (oligomeric) poly-unsaturated compounds are acrylated epoxy resins, acrylated or vinyl-ether- or epoxy-group-containing polyesters, polyurethanes and polyethers. Further examples of unsaturated oligomers are unsaturated polyester res-ins, which are usually prepared from malefic acid, phthalic acid and one or more diols and have molecular weights of approximately from 500 to 3000. Vinyl ether monomers and oli-gomers, and maleate-terminated oligomers having polyester, polyurethane, polyether, poly-vinyl ether and epoxy main chains can also be used. In particular, combinations of vinyl-ether-group-carrying oligomers and polymers, as described in WO 90/01512, are very suit-able. Also suitable are copolymers of monomers functionalised with vinyl ether and malefic acid. Such unsaturated oligomers can also be referred to as prepolymers.
Functionalised acrylates are also suitable. Examples of suitable monomers that are normally used to form the backbone (the base polymer) of such functionalised acrylate and meth-acrylate polymers are, for example, acrylate, methacrylate, methyl methacrylate, ethyl acry-late, ethyl methacrylate, n-butyl acrylate, n-butyl methacrylate, isobutyl acrylate, isobutyl methacrylate, 2-ethylhexyl acrylate, 2-ethylhexyl methacrylate, etc.. In addition, suitable amounts of functional monomers are copolymerised during the polymerisation so as to obtain the functional polymers. Acid-functionalised acrylate or methacrylate polymers are obtained using acid-functional monomers, such as acrylic acid and methacrylic acid.
Hydroxy-functional acrylate or methacrylate polymers are produced from hydroxy-functional mono-mers, such as 2-hydroxyethyl methacrylate,~ 2-hydroxypropyl methacrylate and 3,4-dihydroxybutyl methacrylate. Epoxy-functionalised acrylate or methacrylate polymers are obtained using epoxy-functional monomers, such as glycidyl methacrylate, 2,3-epoxybutyl methacrylate, 3,4-epoxybutyl methacrylate, 2,3-epoxycyclohexyl methacrylate, 10,11-epoxyundecyl methacrylate, etc.. It is also possible to prepare e.g.
isocyanate-functionalised polymers from isocyanate-functionalised monomers, such as meta-isopropenyl-a,a-di-methylbenzyl isocyanate.
Especially suitable are, for example, esters of ethylenically unsaturated mono-or poly-functional carboxylic acids and polyols or polyepoxides, and polymers having ethylenically unsaturated groups in the chain or in side groups, such as unsaturated polyesters, poly-amides and polyurethanes and copolymers thereof, alkyd resins, polybutadiene and buta-diene copolymers, polyisoprene and isoprene copolymers, polymers and copolymers having (meth)acrylic groups in side chains, and mixtures of one or more such polymers.
Examples of suitable mono- or poly-functional unsaturated carboxylic acids are acrylic acid, methacrylic acid, crotonic acid, itaconic acid, cinnamic acid, malefic acid and fumaric acid and unsaturated fatty acids, such as linolenic acid or oleic acid. Preference is given to acrylic acid and methacrylic acid.
Saturated di- or poly-carboxylic acids in admixture with unsaturated carboxylic acids may, however, also be used. Examples of suitable saturated di- or poly-carboxylic acids include, for example, tetrachlorophthalic acid, tetrabromophthalic acid, phthalic acid anhydride, adipic acid, tetrahydrophthalic acid, isophthalic acid, terephthalic acid, trimellitic acid, heptanedicarboxylic acid, sebacic acid, dodecanedicarboxylic acid, hexahydrophthalic acid, etc..
Suitable polyols are aromatic and especially aliphatic and cycloaliphatic polyols. Examples of aromatic polyols are hydroquinone, 4,4'-dihydroxydiphenyl, 2,2-di(4-hydroxyphenyl)-propane, and novolaks and resoles. Examples of polyepoxides are those based on the poly-ols mentioned, especially the aromatic polyols and epichlorohydrin. Also suitable as polyols are polymers and copolymers containing hydroxyl groups in the polymer chain or in side groups, such as polyvinyl alcohol and copolymers thereof or polymethacrylic acid hydroxyalkyl esters or copolymers thereof. Further suitable polyols are oligoesters having hydroxyl terminal groups.
Examples of aliphatic and cycloaliphatic polyols are alkylenediols having preferably from 2 to 12 carbon atoms, such as ethylene glycol, 1,2- or 1,3-propanediol, 1,2-, 1,3-or 1,4-butanediol, pentanediol, hexanediol, octanediol, dodecanediol, diethylene glycol, triethylene glycol, polyethylene glycols having molecular weights of preferably from 200 to 1500, 1,3-cyclopentanediol, 1,2-, 1,3- or 1,4-cyclohexanediol, 1,4-dihydroxymethylcyclohexane, glycerol, tris(~i-hydroxy-ethyl)amine, trimethylolethane, trimethylolpropane, pentaerythritol, dipentaerythritol and sorbitol.
The polyols may be partially or fully esterified by one or by different unsaturated carboxylic acid(s), it being possible for the free hydroxyl groups in partial esters to have been modified, for example etherified, or esterified with other carboxylic acids.
Examples of esters are:
trimethylolpropane triacrylate, trimethylolethane triacrylate, trimethylolpropane trimethacry-late, trimethylolethane trimethacrylate, tetramethylene glycol dimethacrylate, tri-ethylene glycol dimethacrylate, tetraethylene glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol diacrylate, dipenta-erythritol triacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipenta-erythritol hexaacrylate, tripentaerythritol octaacrylate, pentaerythritol dimethacrylate, penta-erythritol trimethacrylate, dipentaerythritol dimethacrylate, dipentaerythritol tetra-methacrylate, tripentaerythritol octamethacrylate, pentaerythritol diitaconate, dipenta-erythritol trisitaconate, dipentaerythritol pentaitaconate, dipentaerythritol hexaitaconate, ethylene glycol diacrylate, 1,3-butanediol diacrylate, 1,3-butanediol dimethacrylate, 1,4-butanediol diitaconate, sorbitol triacrylate, sorbitol tetraacrylate, pentaerythritol-modified tria-crylate, sorbitol tetramethacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate, oligo-ester acrylates and methacrylates, glycerol di- and tri-acrylate, 1,4-cyclohexane diacrylate, bisacrylates and bismethacrylates of polyethylene glycol having a molecular weight of from 200 to 1500, and mixtures thereof.
Suitable components (A) are also the amides of identical or different unsaturated carboxylic acids and aromatic, cycloaliphatic and aliphatic polyamines having preferably from 2 to 6, especially from 2 to 4, amino groups. Examples of such polyamines are ethylenediamine, 1,2- or 1,3-propylenediamine, 1,2-, 1,3- or 1,4-butylenediamine, 1,5-pentylenediamine, 1,6-hexylenediamine, octylenediamine, dodecylenediamine, 1,4-diaminocyclohexane, isopho-ronediamine, phenylenediamine, bisphenylenediamine, di-[i-aminoethyl ether, diethylenetri-amine, triethylenetetraamine and di([3-aminoethoxy)- or di([3-aminopropoxy)ethane. Further suitable polyamines are polymers and copolymers which may have additional amino groups in the side chain and oligoamides having amino terminal groups. Examples of such unsatu-rated amides are: methylene bisacrylamide, 1,6-hexamethylene bisacrylamide, diethylene-triamine trismethacrylamide, bis(methacrylamidopropoxy)ethane, [3-methacrylamidoethyl methacrylate and N-[([3-hydroxyethoxy)ethyl]-acrylamide.
Suitable unsaturated polyesters and polyamides are derived, for example, from malefic acid and diols or diamines. The malefic acid may have been partially replaced by other dicarbox-ylic acids. They can be used together with ethylenically unsaturated comonomers, for exam-ple styrene. The polyesters and polyamides can also be derived from dicarboxylic acids and ethylenically unsaturated diols or diamines, especially from those having longer chains of, for example, from 6 to 20 carbon atoms. Examples of polyurethanes are those composed of saturated diisocyanates and unsaturated diols, or unsaturated diisocyanates and saturated diols.
Polybutadiene and polyisoprene and copolymers thereof are known. Suitable comonomers include, for example, olefins, such as ethylene, propene, butene, hexene, (meth)acrylates, acrylonitrile, styrene and vinyl chloride. Polymers having (meth)acrylate groups in the side chain are also known. They may be, for example, reaction products of novolak-based epoxy resins with (meth)acrylic acid; homo- or co-polymers of vinyl alcohol or hydroxyalkyl deriva-tives thereof that have been esterified with (meth)acrylic acid; or homo- and co-polymers of (meth)acrylates that have been esterified with hydroxyalkyl (meth)acrylates.
The photopolymerisable compounds (A) may be used on their own or in any desired mix-tures. Preference is given to mixtures of polyol (meth)acrylates.
Binders may also be added to the compositions according to the invention, this being espe-cially advantageous when the photopolymerisable compounds are liquid or viscous sub-stances. The amount of binder may be, for example, from 5 to 95 % by weight, preferably from 10 to 90 % by weight and especially from 40 to 90 % by weight, based on total solids.
The binder will be selected according to the field of use and the properties required therefor, such as developability in aqueous and organic solvent systems, adhesion to substrates and sensitivity to oxygen.
Suitable binders are, for example, polymers having a molecular weight of approximately from 5000 to 2 000 000, preferably from 10 000 to 1 000 000. Examples thereof are:
homo- and co-polymers of acrylates and methacrylates, for example copolymers of methyl meth-acryl-ate/ethyl acrylate/methacrylic acid, poly(methacrylic acid alkyl esters), poly(acrylic acid alkyl esters); cellulose esters and ethers, such as cellulose acetate, cellulose acetate butyrate, methyl cellulose, ethyl cellulose; polyvinyl butyral, polyvinylformal, cyclised rubber, polyeth-ers, such as polyethylene oxide, polypropylene oxide, polytetrahydrofuran;
polystyrene, poly-carbonate, polyurethane, chlorinated polyolefins, polyvinyl chloride, copolymers of vinyl chlo-ride/vinylidene chloride, copolymers of vinylidene chloride with acrylonitrile, methyl meth-acrylate and vinyl acetate, polyvinyl acetate, copoly(ethylenelvinyl acetate), polymers such as polycaprolactam and poly(hexamethyleneadipamide), polyesters such as polyethylene glycol terephthalate) and poly(hexamethylene glycol succinate).
The resins mentioned below under (C1 ) may also be used as component (A), that is to say as UV-curable component. Of particular interest are, for example, unsaturated acrylates having reactive functional groups. The reactive functional group may be selected, for exam-ple, from a hydroxyl, thiol, isocyanate, epoxy, anhydride, carboxyl, amino or blocked amino group. Examples of OH-group-containing unsaturated acrylates are hydroxyethyl and hy-droxybutyl acrylates and also glycidyl acrylates.
The unsaturated compounds may also be used in admixture with non-photopolymerisable film-forming components. These may be, for example, polymers that can be dried physically or solutions thereof in organic solvents, such as nitrocellulose or cellulose acetobutyrate.
They may alternatively be chemically or thermally curable resins, such as polyisocyanates, polyepoxides or melamine resins. The concomitant use of thermally curable resins is im-portant for use in so-called hybrid systems which are both photopolymerised and thermally crosslinked.
Component (A) may, for example, be a coating composition comprising (A1 ) compounds having one or more free-radically polymerisable double bonds that addi-tionally contain at least one further functional group that is reactive in terms of an addition and/or condensation reaction (examples are given above), (A2) compounds having one or more free-radically polymerisable double bonds that addi-tionally contain at least one further functional group that is reactive in terms of an addition and/or condensation reaction, the additional reactive functional group being complementary or reactive towards the additional reactive functional groups of component (A1 ), (A3) optionally at least one monomeric, oligomeric and/or polymeric compound having at least one functional group that is reactive in terms of an addition and/or condensation reac-tion towards the functional groups of component (A1 ) or component (A2) that are present in addition to the free-radically polymerisable double bonds.
Component (A2) in each case carries the groups complementary or reactive towards compo-nent (A1 ). Different types of functional groups may also be present in a component. Com-ponent (A3) provides a further component that contains functional groups that are reactive in terms of an addition andlor condensation reaction and that are able to react with the func-tional groups of (A1 ) or (A2) that are present in addition to the free-radically polymerisable double bonds. Component (A3) contains no free-radically polymerisable double bonds. Ex-amples of such combinations (A1 ), (A2), (A3) can be found in WO 99/55785.
Examples of suitable reactive functional groups are selected, for example, from hydroxyl, isocyanate, epoxy, anhydride, carboxyl and blocked amino groups. Examples have been described above.
Constituents of component (C) are, for example, thermally curable lacquer or coating system constituents customary in the art. Component (C) accordingly may consist of a number of constituents.
Examples of component (C) are, for example, oligomers and/or polymers derived from a,~3-unsaturated acids and derivatives thereof, for example polyacrylates and polymethacrylates, polymethyl methacrylates impact-resistant-modified with butyl acrylate, polyacrylamides and polyacrylonitriles. Further examples of component (C) are urethanes, polyurethanes derived from on the one hand polyethers, polyesters and polyacrylates having free hydroxyl groups and on the other hand aliphatic or aromatic polyisocyanates, and pre-products thereof.
Component (C) accordingly also includes, for example, crosslinkable acrylic resins derived from substituted acrylic acid esters, for example epoxy acrylates, urethane acrylates and po-lyester acrylates. Alkyd resins, polyester resins and acrylate resins and modifications thereof that are crosslinked with melamine resins, urea resins, isocyanates, isocyanurates, polyiso-cyanates, polyisocyanurates and epoxy resins, may also be a constituent of component (C).
Component (C) is, for example, generally a film-forming binder based on a thermoplastic or thermocurable resin, predominantly on a thermocurable resin. Examples thereof are alkyd, acrylic, polyester, phenol, melamine, epoxy and polyurethane resins and mixtures thereof.
Examples thereof are described, for example, in Ullmann's Encyclopedia of Industrial Chem-istry, 5th Ed., Vol. A18, pp. 368-426, VCH, Weinheim 1991.
Component (C) may be a cold-curable or hot-curable binder, with the addition of a curing catalyst possibly being advantageous. Suitable catalysts that accelerate the full cure of the binder are described, for example, in Ullmann's Encyclopedia of Industrial Chemistry, Vol.
A18, page 469, VCH Verlagsgesellschaft, Weinheim 1991.
Examples of specific binders suitable as component (C) are:
1. surface-coatings based on cold- or hot-crosslinkable alkyd, acrylate, polyester, epoxy or melamine resins or mixtures of such resins, optionally with the addition of a curing catalyst;
2. two-component polyurethane surface-coatings based on hydroxyl-group-containing acry-late, polyester or polyether resins and aliphatic or aromatic isocyanates, isocyanurates or polyisocyanates;
3. one-component polyurethane surface-coatings based on blocked isocyanates, isocyanu-rates or polyisocyanates, which are de-blocked during stoving; it is also possible to add melamine resins as appropriate;
4. one-component polyurethane surface-coatings based on aliphatic or aromatic urethanes or polyurethanes and hydroxyl-group-containing acrylate, polyester or polyether resins;
5. one-component polyurethane surface-coatings based on aliphatic or aromatic urethane acrylates or polyurethane acrylates having free amine groups in the urethane structure and melamine resins or polyether resins, optionally with the addition of a curing catalyst;
6. two-component surface-coatings based on (poly)ketimines and aliphatic or aromatic iso-cyanates, isocyanurates or polyisocyanates;
C2-CSAlkenyl is mono- or poly-unsaturated and linear or branched, and is, for example, C2-C6-or C2-C4-alkenyl. Examples thereof are allyl, methallyl, 1,1-dimethylallyl, 1-butenyl, 2-butenyl, 1,3-pentadienyl, 1-hexenyl and 1-octenyl, especially allyl. R,3 and R,4 as C2-C$alkenyl are, for example, C2-Csalkenyl, especially C2-C4alkenyl.
C2-C,oAlkenylene is a divalent radical that is mono- or poly-unsaturated and linear or branched, and is, for example, C2-C6- or C2-C4-alkenylene. Examples thereof are allylene, methallylene, 1,1-dimethylallylene, vinylene, 1-butenylene, 2-butenylene, 1,3-pentadienyl-ene, 1-hexenylene and 1-octenylene, especially allylene.
C,-C4AIkanoyl is linear or branched and is, for example, formyl, acetyl, propionyl, butanoyl or isobutanoyl.
Halogen is fluorine, chlorine, bromine or iodine, for example fluorine, chlorine or bromine, especially chlorine or fluorine.
Phenyl-C,-C3alkyl is, for example, benzyl, phenylethyl, a-methylbenzyl or a,a-dimethylbenzyl, especially benzyl.
When R~6 and R,~ together with the nitrogen atom to which they are bonded form a 6-membered aliphatic ring, which may be interrupted by a further nitrogen or oxygen atom, it is, for example, a morpholinyl, piperidinyl or piperazinyl ring.
When R" and R,2 together are C2-C8alkylene that may be interrupted by an oxygen atom, they form together with the nitrogen atom to which they are bonded, for example, a piperidi-nyl or morpholinyl ring.
The units of formulae la, Ib and/or Ic are arranged randomly or in blocks, that is to say in the formula drawing given for formula I the units may be arranged in any order.
For example, blocks of units of formulae la, Ib and Ic may follow one another, but the individual units may also be linked in random distribution, depending upon the siloxane used during preparation.
_7_ The expression "and/or" indicates that not just one of the defined alternatives (e.g. substi-tuents) may be present, but that it is also possible for a plurality of different defined alternati-ves (e.g. substituents) to be present together, that is to say mixtures of different alternatives (e.g. substituents) may be present.
The expression "at least one" is intended to mean one or more than one, for example one or two or three, preferably one or two.
R,3 and R~4 are, for example, C,-C4alkyl, especially methyl. Preferably R13 and R,4 are methyl or together are C3-Cealkylene; in particular, together with the carbon atom to which they are bonded they form a cyclohexylring, or R,3 is C,-C4alkyl, especially ethyl, and R~4 is allyl or benzyl.
"a" is preferably a number from 0 to 10, e.g. from 0 to 3, especially 3; "n"
is preferably from 1 to 100; "p" is, for example, from 1 to 1000, from 1 to 100, from 1 to 50 or from 1 to 25; and "m" is from 0 to 100, e.g. from 0 to 50 or from 0 to 25, especially 0.
When the siloxane starting material is a mixture of oligomeric siloxanes, "n"
may also be less than 1, but greater than 0. In that case, "n" is, for example, a number from 0.1 to 1000, from 0.5 to 1000, from 0.8 to 1000, etc..
X is preferably OR,S and R,5 is preferably hydrogen.
Y is preferably -(CHZ)a O- , -(CH2)a-O-(CH2)a- or -(CH2)a O-(CH2)a O-, where a is especially 3.
In the IN group, Y is especially positioned on the phenyl ring in the para-position relative to the carbonyl group.
R,6 and R" are especially C,-C4alkyl, preferably methyl, or together with the nitrogen atom to which they are bonded form a morpholinyl radical.
R,, R2 and R3 are preferably C,-C4alkyl, especially methyl.
R4 is especially C,-C4alkyl, for example methyl.
Preference is given to a process as described above in which the su rface-active photo--8_ initiator (B) is a compound of formula I, wherein n is a number from 1 to 10, or, when the siloxane starting material is a mixture of oli-gomeric siloxanes, n may also be less than 1, but greater than 0;
m is a number from 0 to 25;
p is a number from 0 to 25;
Rs A, is C,-C4alkyl or a radical of formula -o-s.-R6 ;
R~
Re A2 is C,-C4alkyl or a radical of formula -si-R9 ;
Rio or A, and A2 together are a single bond;
R,, R2, R3, R5, Rs, R,, R8, R9 and R,o are each independently of the others C,-C4alkyl;
R4 is C,-C4alkyl;
R,3 and R,4 are each independently of the other C,-C4alkyl; or R,3 and R,4 together are C2-Cgalkylene;
Y is -(CH2)a O-, -(CH2)b-O-(CH2)a- or -(CH2)b-O-(CH2)a O- ;
a and b are each independently of the other the number 2 or 3;
R,5 is hydrogen;
R,6 and R" together are C4-CSalkylene and together with the nitrogen atom to which they are bonded form a 6-membered ring interrupted by O; and X, is a radical -O-(CH2)a .
CH3 _ O CH3 Of special interest are the compounds ~CH3)3SrO~2Sl-(CHZ)3 O ~ / CI- i -off , CHI
CH3 _ O CH3 CH3 ~CH3)~Si-OtSi-(CHZ)3 O \ ~ IC- i O (CHZ)3-g1~0-SI(CH3)3~ 2 , J 2 CHs _g_ H3C-Si-CH3 _ O CH
O CH3 ~ / (CHx)s O \ / C-C-OH
CH3 CH3 CH3 ~ I ~ , H3C-Si CH
H3C-Si-O-Si-O-Si-(CH2)3 O \ ~ C-C-OH O
CH3 CH3 CH3 CH3 H3C-Si _ O CH3 O ~ (CH2)3 O \ / C-C-OH
H3C-Si-CH3 CH3 CH _ O CH3 H3C-Si 3 (CHZ)3 O \ ~ C-C-OH H3C (CH -O~OC-CHOH
~r'H3 ~ /~ 2)3 \ / I
I ~ H3C-Si CH3 H C-Si-CH p I
_ O CH3 H3C-SI _ ~ CH3 H3C-Si-(CH2)3 O \ ~ C-C-OH H C ~(CH2)3 O \ / C-C-OH
3p HO-CH CI ~ \ O
CH3 ~CHz)3 O CHs H3C Si-O~ CHs ~ I I
CH p Si-(CH2r0 \ / C-C-OH
HO-,C 3C / ~ O~CHz)3 Si~ ,O CH3 H3C O CH ~ ~ i-CH3 _ O CH3 (CHZ)3 O \ ~ C-C-OH
CH30 _ ~~ i Ha HO-~-IC ~ ~ O-(\ 2)' ~(CH2)3 O \ / C-C-OH
CH \ .O- i W CH3 H3CiSi CH3 ; /CH3 _ O H3 iH3il _ Si,~CH3 ~I~(CHZ)3 p ~ ~ C-~-pH
HO- i -C \ / O-(CHZ)3 10 ~Si~-CH _ O CH CH3 CH3 (CHZ)3~0 C-C 30H
i H3C-Si-CH3 H3C-Si-CH3 I
O _ O CH3 O
2 3 Si-CH
H3C-Si-H-~-(CHZ)2 O 2 \ / C C O (CH ) p z CH3 O
H C-Si-CH
H3C-SrCH3 3 I 3 H3C-Si-CH3 _ O CH CH3 CH3 - O CH3 H3C-Si-(CH2)3 O ~ ~ C-C-N ~ H3C-Si-O-Si-(CH2)3 O ~ ~ C-C-N O
p CH V CH3 CH3 CH3 U
H3C-Si-CH3 CHa CHa CHa H C-Si-CH H3C-Si-CHa H3C-Si-CHa 3 ~ 3 _ O CH O _ O CHa O
H3C-Oi (CHZ)3 O (CHZ)a ~ / C CHOH ~ H3C p (CH2)a O (CHZ)a ~ / C CHO (CHZ)a Si-CHa H C-Si'CHa H3C-$i'CHa HaC-Si-CHa a CHa CHa CHa ~H3 CHa H3C-Si-CHa H3C-Si-CH3 'O' CHa ~ H C-OSi-NCH ) O-(CH ) O ~ / OC
H3C-Si-(CHZ)3 O-(CHZ)a ~ ~ c-c-N o and 3 I z a a z HO
O CH ~/ O
H C-$i'CHa H3C-Si-CHa a CH CHa The compounds of formula I are prepared according to customary methods known to the person skilled in the art.
Thus, compounds of formula I may be obtained, for example, by reacting a photoinitiator with at least one alkenyl radical (IV) or (IVa) and a siloxane (V) in the presence of a suitable catalyst:
R~3 ~ 13 x-c-c ~ x-c-c I Il~r-c=cH2 I II Y-C-C=CH2 IVa R~4 O H (IV) Or R~4 O Hz H ( ) IN IN
R~ Rz Ra ( ) A~ i i-O i i-O Si-O Az H L H LRa m P
catalyst _ 11 _ A, ~ i-O i i-O Si-O A2 n H m Ra P
IN
wherein IN, R,, R2, R3, R4, R,3, R,4, X, Y, A,, A2, n, m and p are as defined above.
In order to prepare compounds of formula I wherein x = 2, suitably modified photoinitiators are used, that is to say those having, for example, 2 alkylene units.
The alkylene unit may, for example, be present at a different position on the photoinitiator molecule and the linkage to the siloxane is then effected in that position:
O OH
ii I
Catalyst ~ C-~-(CH2)a ~~-R~
CFi HZ H Chl2 + (V) ~ , CH3 n H-SrR2 m R4 Si-R3 ~P
Such reactions are described, for example, in US 4391963, EP 162572 or N.S.
Allen et al., J.Photochem. Photobiol. A: Chem. 62 (1991), 125-139.
Reaction conditions for such reactions will be known to the person skilled in the art. The molar ratios of the alkenyl-modified compound (IV) and the siloxane compound (V) are de-pendent upon the desired product and are generally not critical. For example, the amount of (IV) to be used will be selected according to the content of free Si-H groups in (V) and the desired degree of substitution of those groups in the particular case. If all the groups are to react, it is advantageous, for example, to use (IV) in excess. It is also possible, however, to use an excess of component (V).
The reaction temperatures are advantageously kept within a range of from 20 to 150°C, pref-erably from 60 to 110°C. It is also advantageous to carry out the reaction, for example, in a suitable aprotic organic solvent, such as tetrahydrofuran (THF), dioxane, hexane, heptane, cyclohexane, toluene, xylene, benzene or chlorobenzene. The reaction may, however, also be carried out, for example, without solvent.
The reaction mixture will usually be stirred while the reaction is being carried out.
It is also advantageous to carry out the reaction under inert conditions, for example under an argon or nitrogen atmosphere.
Catalysts suitable for carrying out the reaction are, for example, noble metal catalysts, such as platinum or rhodium catalysts. Examples thereof are HZPtCIs and PtCl2(C6H5-CH=CHZ)2.
Such catalysts may, for example, also be applied to suitable support materials, for example aluminium oxide, such as PtIAl203 (for example, obtainable from Heraeus).
Examples of suitable catalysts are platinum, palladium, rhodium, nickel, cobalt, or other metals in pow-dered form or in complexes; platinum sponge, platinum black, chloroplatinic acid, the reac-tion product of chloroplatinic acid and alcohol, a complex of chloroplatinic acid and vinyl si-loxane. Such catalysts are commercially available, for example platinum/-carbonyl/cyclovin-ylmethylsiloxane complex, platinum/divinyltetramethyldisiloxane complex, plati-numloctanealdehyde/octanol complex, or may be obtained according to methods customary in the art and known to the person skilled in the art.
The concentration of the catalyst is advantageously, for example, from 1 to 1000 ppm, for example from 150 to 400 ppm.
A further possible method of preparing the surface-active photoinitiators is to react a photo-initiator that contains a suitable silyl group with an alkenyl-modified siloxane:
A~
i Ai Rz I catalyst H-Si-IN ~- H2C=C-R'-Si-R, R~ Si-R'-C-C-Si-IN
R3 H ~ p Hz Hz Rs R,, RZ, R3, IN and A, are as defined above; R' is an alkylene radical;
"...." indicates that the radical of the siloxane molecule moiety defined in formula I is attached at that position (according to formula I in this reaction in the starting material m must be 0).
The reaction conditions for this method correspond to those described above.
Such reac-tions are described in the literature, for example, in US 4 391 963 and in JMS
Pure Applied Chem. A31 (3) (1994), 305.
The surface-active photoinitiators may, for example, also be obtained by reacting an OH-group-containing initiator with a siloxane:
A~
A~
HO-IN + H-Si-R~ ~' iN-O Si-R~
~n H Si Rz ~m R4 Si-R3 ~P
Az R~, R2, R3, IN, A~, n, m, p, R4 and A2 are as defined above; "...." indicates that the radical of the siloxane molecule moiety defined in formula I is attached at that position.
Suitable catalysts for this reaction are, for example, tin octoate, dibutyltin dilaurate, zinc oc-tanoate, tin octanoate and zinc octanoate. Examples of such reactions (although the exam-ples contain a sensitiser unit instead of a photoinitiator unit) can be found in US 4921589.
In JMS Pure Appl. Chem. A 34(11 ) (1997), 2335-2353, L. Lecamp et al. describe a method for preparing siloxane-containing initiators in which an initiator containing an Si(OR)~_3 group and a siloxane having an Si-(OH),_2 group are reacted. The catalyst used is, for example, di-butyltin dilaurate:
A R
z A R Si , = ~' ' O-Si-IN
Si IN + HO- i i-R, O O
R"O
OR" I A~
Si-R~
. O
... I
IN, R,, R2 and A, are as defined above; R" is alkyl, especially methyl; "...."
indicates that the radical of the siloxane molecule moiety defined in formula I is attached at that position.
Surface-active photoinitiators according to the present invention can also be obtained, for example, by reacting a photoinitiator containing at least one carbonyl group on the aromatic ring with a siloxane containing a C-C double bond as terminal group (e.g.
allyl or vinyl).
R\
~C ~
O A
O
C Rx __ _ _ ~ ~_ --~ HzC\
+ FizC H R~ i i R' C-R'-gi_R
/ Hz O , R, and A, are as defined above; Rx together with the adjacent carbonyl group forms a ben-zoin, an a-hydroxyketone or an a-aminoketone; R' is alkylene; "...." indicates that the radical of the siloxane molecule moiety defined in formula I is attached at that position.
That reaction is published in US 5776658. Suitable catalysts for that reaction are, for exam-ple, ruthenium compounds, as described by Mural et al. in Nature 366 (1993) 529.
US 4 477 326 and JP 9-328522-A describe the polymerisation or copolymerisation of polyal-koxysiloxanes in the presence of a base or of an acid catalyst. The method described is suitable also for the preparation of surface-active initiators:
z Rz -R~- H+ or -OH IN-Si-O-S
IN-Si-OR" + R O Si OR p OR" Rz Si-IN, R~ and Rz are as defined above; R" is alkyl.
In that reaction it is possible to obtain both polymeric and cyclic products.
A further possible method of preparing surface-active photoinitiators is described, for exam-ple, in US 4587276 and US 4477276, namely the polymerisation or copolymerisation of si-loxanes having hydrolysable groups (e.g. Si-CI) in the presence of water:
A, R, A, R-Si-R H2O R2 Si-O-Si-R' IN-Si-Ra + a I ' ~' ~N of Rz IN, R,, R2 and A~ are as defined above; Ra is, for example, CI or OCH3; "...."
indicates that the radical of the siloxane molecule moiety defined in formula I is attached at that position.
In J.M.S. Pure Appl. Chem. A 31 (3) (1994), 305-318, A. Kolar et al. describe the preparation of photoinitiators containing siloxane radicals starting from 1,4-dichlorobenzene. A Grignard reaction creates a reactive centre, which is reacted with dirnethyldichlorosilane or dimethyl-monochlorosilane to form the corresponding silyl-modified chlorobenzene, into which the ap-propriate a-cleavable photoinitiator carbonyl radical is introduced by further reactions.
In Makromol. Chem. 193 (1992) 1273-1282, L. Pouliquen et al. published a multi-step reac-tion of photoinitiators having acid groups and a siloxane having epoxy radicals in the pres-ence of acetic anhydride (the photoinitiator compounds in that reference are of the phe-noneltert-amine type) H3C-C=O
O p'~ O O
II p ~ ii n O
IN- C - OH + ~R'- i i-R, + H3C.C_O.C.CH3 _~ O HC-R~- i i-R~
IN, A~ and R~ are as defined above; R' is alkylene; "...." indicates that the radical of the silox-ane molecule moiety defined in formula I is attached at that position.
Isocyanate-group-containing photoinitiators and siloxanes having hydroxyl or amine groups may also be reacted to form surface-active photoinitiators:
A H A
I' ,N. ~z,~ I' Z- i-R~ IN C Si-R~
IN-N=C=O + ~ O
IN, A, and R, are as defined above; Z is NH2 or OH; Z, is NH or O; "...."
indicates that the radical of the siloxane molecule moiety defined in formula I is attached at that position.
Such reactions are described, for example, in WO 96/20919.
Photoinitiators substituted by cyclic siloxane radicals may be obtained, for example, by carrying out the reactions described above with a cyclic siloxane, for example O-Si(R2)2 O
Si(R2)2 i I(R2)2 y O-Si(R2)-O
H
In order to prepare photoinitiators provided with cyclic siloxane radicals, it is also possible, however, firstly to introduce linear siloxane radicals, for example by means of the methods described above, and subsequently to cyclise them by the action of a base, for example so-dium hydroxide, or by the action of an acid.
The synthesis of surface-active photoinitiators containing cyclic siloxane radicals can be car-ried out, for example, as described above by reacting a cyclic siloxane with the initiator moi-ety in question:
H IN
I .R, I .R, si s~
IN + o~ jo y --~ o~ jo y si ~s~~
R~ ~H Ri IN
(IN and R~ are as defined above; y determines the size of the ring) or by a cyclisation reaction of an OR-group-containing siloxane-modified initiator moiety in the presence of an acid or alkali:
IN
R _ I.R
H+ or OH ~ Sip IN-Si-(OR")b O~ /O y ~Si R \IN
(R, and IN are as defined above; R" is alkyl; a= 0 or 1; b=1 or 2, where the sum of a+b=3;
depending upon the value of a and b, R is either R, or OR") Cyclic compounds can also be formed by reacting an OR-group-containing siloxane-modified initiator moiety with an OR-group-containing siloxane:
IN
~,R~
_ Si IN-Si- OR" + R-Si-(OR") H+ or OH
( )2 2 2 y O
j~ i RZ R
' y1 (IN, R, and R2 are as defined above; R" is alkyl; the sum of y and y1 determines the number of ring members) The distribution of the Si(IN)(R,) and Si(R~)(R2) groups will be either random or in blocks.
The preparation of the surface-active photoinitiators may also yield mixtures of active com-pounds. Such mixtures can be separated by customary methods, such as distillation, crys-tallisation or chromatography, or they may be used as such as surface-active photoinitiators in compositions to be polymerised.
The invention relates also to photoinitiator mixtures comprising CH3 ~ ~H3 Hs _ ~ CH3 CH3 ~(CH3)3SI-o~2$I~CHz)3 0 ~ ~ CI-C-off ~ CCH3)3Si-O~2 1-~CHZ)3 O ~ ~ C-C-O-S1~0-SI(CH3)3] 2 , i H3 - O CH3 i H3 i Hs ~~ CH3 [CH3)3Si-O~-Si-O ~ ~ C-C-O-Si-EO-Si(CH3)3] 2 and/or (CH3)3Sj-O SI-O ~ ~ C-C-OH
s 2 CHs 2 CHs ~Hs O CH3 CH3 or mixtures comprising CCH3)3SI-O~-SI-(CHZ)3 O ~ ~ C-C-O-(CH2)3 Si~O-Si(CH3)~
, CH3 O CH3 CH3 i Hs _ ~ CH3 [CH3)3Si-0~2Si-O ~ ~ C-C-O-Si-~O-Si(CH3)3]2 ~ [(CH3)sSwO~"SI-O ~ ~ c-CH off and/or z i H3 _ ~ ~ Hs [(CH3)3SI-O~Si~CHz)3 O ~ ~ C-C-OH ;
or mixtures comprising ~ 3 ~ 3 ~ 3 ~II I , H3C-Si-O-Si-O-Si-(CH2)3 O ~ ~ C-C-OH
CH CH CH _ O CH3 CH3 CH3 CH3 H C-Si-O-Si-O-Si 3(CH ) O ~ ~ CI-C-O-$i-O-Si-O-I~ i-CH3 ' 3 CH3 CH3 CH3 z s CH3 ICH3 CH3 CH3 O CH CH CH I I I H
HZC=H-H-O ~ ~ CI-CH3 O-~i-O-Si O-1~ i CH3 andlOr H3C SH30--SHO SHO ~ ~ C-C 3 OH
z CH3 CH3 CH3 CH3 CH3 CH3 CH3 CH
H3 CH3 CH3 a _ O CH
or mixtures comprising Ho-~-c ~ ~ o-(cH2)3 ~Si-o-si-(cH2)3 0 ~ ~ c-c-off H-Si-O-Si-O-C-C ~ ~ O-(CH2)3 Si-O-Si-(CH2)3 O~C-C-OH
CH3 CH3 CHI CH3 CH \ / CH
CH3 CH3 CH3 _ O CH3 HO-C-C ~ ~ O-Si-O-Si-(CH2)3 O ~ ~ C-C-OH and/or CH3 / ~ CH3 CH3 O CH3 Ho-c-c-O-o-si-o-si-o ~ ~ c-c-off ; or mixtures comprising compounds of R' H C-Si-O CH3 _ O CH
formula 43~~ Si R2 (llla) wherein R'=R2=R3=R4= -(CH2)3 0 ~ ~ c-c-off , R-Sip ~O CH3 O-Si-CH3 _ O CH
compounds of formula Illa wherein R'=R2=R3= -(cHz)3 0 ~ ~ c-c-off and R4= H, _ O CH3 and/or compounds of formula Illa wherein R'=R2=R3= -(CH2)3 O ~ ~ C-C-OH and R' ~Si R4= -(CH2)2CH3 ; or mixtures comprising compounds of formula 5 0' ~o'S~~o (Illb) R jSi,~ Si~O~s3w R a~ R
_ O CH3 wherein R'=R2=R3=R4= R5= -(cHz)3 0 ~ ~ c-c-off , compounds of formula Illb _ O CH
wherein R'=R2=R3=R4= -tcH2)3 0 ~ ~ c-c-off and R5= H and/or compounds of _ O CH
formula Illb wherein R'=R2=R3= -(cHz)3 0 ~ ~ c-c-off and R4=R5 = H;
H3C-Si-GH3 O' C-C-OH
or mixtures comprising H3C-Si-H~(CHz)z-O 2 \ / CH
H3C-Si-CH3 CH3 ~ Hs H3C~g~-CH3 H3C-SnCH3 _ O CH3 O O Hz H2C=c-C-o-C-c-o ~ ~ C-c-O-Si-CH3 and/or H3C-Si-O-C-C - O CH3 H Hz H2 Hz CH3 O O Hz O ~ ~ C-C-OH
H C.Si CH3 H3C-SI CHs H3C-Si'CH3 H3C-Si-CH3 i or mixtures comprising H3c-o-H-f -(cH2)2 0 2 ~ ~ c-c-o-(cH2)3 si-cH3 z CH3 O
1 H C-Si-CH
H3C-Si-CH3 H3C-Si-CH3 _ O _ O CH
H3C O (CHz)3 O-(CHz)z O ~ ~ OC-CHOC3H~ and/or H3C-Si-iCHz)3-O-(CHz)2 O ~ ~ C-C-OH
H3C-Si-CH3 H3C-Si-CH3 H3C-Si-CH3 H3C-Si-CH3 O _ O CH3~--~ O CH3 _ O CH3~
or mixtures comprising H3C-Si-(CHZ)3 O ~ ~ C-C-N O , H3C-Si-H-CHZ O ~ ~ C-C-N~
O CH ~ O CH3 H3C-SI-CH3 3 H3C-Si-CH3 H3C- igi-CH3 H C--OSi-O ~ ~ C-C~HN~
and/or O CHs H3C-Si-CH3 CH3 CH3 _ O CH3 ~
or mixtures comprising H3C-Si-O-Si-(CHZ)3 0 ~ ~ c-c-ni o and CH3 CH3 CH3 ~
CH3 CH3 _ ~ CH3 ~
H3c-si-o-si-o ~ ~ c-c-N o ; or mixtures comprising CH3 CH3 CH3~/
CH3 i H3 H3C-Si-CH3 H C-Si''CH3 i (' O ' H3 3 ~ ~H3 _ O H3 f H3C-Si-(CHZ)3 O-(CH2)3 ~ ~ C C OH ' H3C-Si-H-H-O-(CH2)3 ~ / C ~ OH
p CH3 O 2 CH3 H C-$i'CHs H3C-~i-CH3 OH _ O CH3 andlOr H3C-Si-(CHZ)3 O-(CHZ)3 ~ ~ C-C-OH ; or mixtures comprising H3C-Si-CH3 H3C-Si-CH3 p - O CH3 O
i H3C-Si-(CH2)3 O-(CH2)3 ~ ~ C-C-O-(CH2)3 Si-CH3 and p CH3 O
i H3C-Si'CHs H3C-Si-CH3 j "3 H3C-Si-CH3 _ p CH3 H3C-Si-(CH2)3 O-(CH2)3 ~ ~ C-C-OH
O CHs i H_C-Si'CH3 The alkenyl-modified photoinitiators (IV) can be prepared according to methods known to the person skilled in the art, for example according to the method described in EP
281941. Suit-able processes have also been published in WO 97/49768.
Some of the siloxane compounds (V) are commercially available, or they can be obtained according to methods known to the person skilled in the art. For example, preparation meth-ods and literature references for preparation can be found in the catalogue of the Geleste company, "ABCR Geleste 2000", pages 434-447.
The photoinitiators are used according to the invention in the curing of free-radically poly-merisable systems, with the aim of obtaining a cured surface having excellent properties. A
crucial factor is that the photoinitiator concentrates at the surface of the formulation to be cured. As explained above, this is achieved by providing suitable substituents on the photo-initiator. Improved surface properties can be obtained using such initiators not only in purely photocurable systems, but also in mixed thermocurable/photocurable formulations. The pre-sent invention accordingly relates also to the use of photoinitiators of formula I in purely photocurable formulations and also to the use of photoinitiators of formula I
in mixed photo-chemically and thermally curable formulations. Thermal curing can be effected before, dur-ing or after the irradiation.
The invention accordingly relates also to a process as described above, in which the photo-curable formulation comprises as further component at least one thermally crosslinkable compound (C), and the curing of the formulation is carried out by irradiation with light of a wavelength of from 200 to 600 nm and by prior, simultaneous and/or subsequent action of heat.
According to the invention the compounds of formula I may be used as surface-active photoinitiators for the photopolymerisation of ethylenically unsaturated compounds or mix-tures comprising such compounds, and become oriented towards the surface of the formula-tion in question. According to the invention the initiators of formula (I) are not used in com-positions that contain siloxane-modified resin components since concentration at the surface cannot occur therein, but instead the initiators are compatible with the formulation and are therefore readily miscible or compatible therewith.
The photoinitiators can also be used in combination with other photoinitiators (E) and/or fu r-ther additives (D).
The invention accordingly relates also to photopolymerisable compositions, comprising (A) at least one ethylenically unsaturated free-radically photopolymerisable compound; and (B) at least one surface-active photoinitiator of formula I, provided that the composition does not contain any siloxane-modified resins in addition to the photoinitiator.
The invention relates also to photopolymerisable compositions, comprising (A) at least one ethylenically unsaturated free-radically photopolymerisable compound;
(B) at least one surface-active photoinitiator of formula I, and (C) at least one thermally crosslinkable compound;
provided that the composition does not contain any siloxane-modified resins in addition to the photoinitiator.
According to the invention, the compositions may also comprise further different photo-initiators (E) andlor further additives (D).
It is also possible to add catalysts for the thermal crosslinking. Suitable examples are listed below.
The unsaturated compounds (A) may contain one or more olefinic double bonds.
They may be low molecular weight (monomeric) or higher molecular weight (oligomeric).
Examples of monomers having a double bond are alkyl and hydroxyalkyl acrylates and methacrylates, such as methyl, ethyl, butyl, 2-ethylhexyl and 2-hydroxyethyl acrylate, isobornyl acrylate and methyl and ethyl methacrylate. Further examples thereof are acrylonitrile, acrylamide, meth-acrylamide, N-substituted (meth)acrylamides, vinyl esters, such as vinyl acetate, vinyl ethers, such as isobutyl vinyl ether, styrene, alkyl- and halo-styrenes, N-vinylpyrrolidone, vinyl chloride and vinylidene chloride.
Examples of monomers having several double bonds are ethylene glycol diacrylate, propyl-ene glycol diacrylate, neopentyl glycol diacrylate, hexamethylene glycol diacrylate and bisphenol A diacrylate, 4,4'-bis(2-acryloyloxyethoxy)diphenylpropane, trimethylolpropane tri-acrylate, pentaerythritol triacrylate or tetraacrylate, vinyl acrylate, divinyl benzene, divinyl succinate, diallyl phthalate, triallyl phosphate, triallyl isocyanurate and tris(2-acryloylethyl) isocyanurate.
Examples of higher molecular weight (oligomeric) poly-unsaturated compounds are acrylated epoxy resins, acrylated or vinyl-ether- or epoxy-group-containing polyesters, polyurethanes and polyethers. Further examples of unsaturated oligomers are unsaturated polyester res-ins, which are usually prepared from malefic acid, phthalic acid and one or more diols and have molecular weights of approximately from 500 to 3000. Vinyl ether monomers and oli-gomers, and maleate-terminated oligomers having polyester, polyurethane, polyether, poly-vinyl ether and epoxy main chains can also be used. In particular, combinations of vinyl-ether-group-carrying oligomers and polymers, as described in WO 90/01512, are very suit-able. Also suitable are copolymers of monomers functionalised with vinyl ether and malefic acid. Such unsaturated oligomers can also be referred to as prepolymers.
Functionalised acrylates are also suitable. Examples of suitable monomers that are normally used to form the backbone (the base polymer) of such functionalised acrylate and meth-acrylate polymers are, for example, acrylate, methacrylate, methyl methacrylate, ethyl acry-late, ethyl methacrylate, n-butyl acrylate, n-butyl methacrylate, isobutyl acrylate, isobutyl methacrylate, 2-ethylhexyl acrylate, 2-ethylhexyl methacrylate, etc.. In addition, suitable amounts of functional monomers are copolymerised during the polymerisation so as to obtain the functional polymers. Acid-functionalised acrylate or methacrylate polymers are obtained using acid-functional monomers, such as acrylic acid and methacrylic acid.
Hydroxy-functional acrylate or methacrylate polymers are produced from hydroxy-functional mono-mers, such as 2-hydroxyethyl methacrylate,~ 2-hydroxypropyl methacrylate and 3,4-dihydroxybutyl methacrylate. Epoxy-functionalised acrylate or methacrylate polymers are obtained using epoxy-functional monomers, such as glycidyl methacrylate, 2,3-epoxybutyl methacrylate, 3,4-epoxybutyl methacrylate, 2,3-epoxycyclohexyl methacrylate, 10,11-epoxyundecyl methacrylate, etc.. It is also possible to prepare e.g.
isocyanate-functionalised polymers from isocyanate-functionalised monomers, such as meta-isopropenyl-a,a-di-methylbenzyl isocyanate.
Especially suitable are, for example, esters of ethylenically unsaturated mono-or poly-functional carboxylic acids and polyols or polyepoxides, and polymers having ethylenically unsaturated groups in the chain or in side groups, such as unsaturated polyesters, poly-amides and polyurethanes and copolymers thereof, alkyd resins, polybutadiene and buta-diene copolymers, polyisoprene and isoprene copolymers, polymers and copolymers having (meth)acrylic groups in side chains, and mixtures of one or more such polymers.
Examples of suitable mono- or poly-functional unsaturated carboxylic acids are acrylic acid, methacrylic acid, crotonic acid, itaconic acid, cinnamic acid, malefic acid and fumaric acid and unsaturated fatty acids, such as linolenic acid or oleic acid. Preference is given to acrylic acid and methacrylic acid.
Saturated di- or poly-carboxylic acids in admixture with unsaturated carboxylic acids may, however, also be used. Examples of suitable saturated di- or poly-carboxylic acids include, for example, tetrachlorophthalic acid, tetrabromophthalic acid, phthalic acid anhydride, adipic acid, tetrahydrophthalic acid, isophthalic acid, terephthalic acid, trimellitic acid, heptanedicarboxylic acid, sebacic acid, dodecanedicarboxylic acid, hexahydrophthalic acid, etc..
Suitable polyols are aromatic and especially aliphatic and cycloaliphatic polyols. Examples of aromatic polyols are hydroquinone, 4,4'-dihydroxydiphenyl, 2,2-di(4-hydroxyphenyl)-propane, and novolaks and resoles. Examples of polyepoxides are those based on the poly-ols mentioned, especially the aromatic polyols and epichlorohydrin. Also suitable as polyols are polymers and copolymers containing hydroxyl groups in the polymer chain or in side groups, such as polyvinyl alcohol and copolymers thereof or polymethacrylic acid hydroxyalkyl esters or copolymers thereof. Further suitable polyols are oligoesters having hydroxyl terminal groups.
Examples of aliphatic and cycloaliphatic polyols are alkylenediols having preferably from 2 to 12 carbon atoms, such as ethylene glycol, 1,2- or 1,3-propanediol, 1,2-, 1,3-or 1,4-butanediol, pentanediol, hexanediol, octanediol, dodecanediol, diethylene glycol, triethylene glycol, polyethylene glycols having molecular weights of preferably from 200 to 1500, 1,3-cyclopentanediol, 1,2-, 1,3- or 1,4-cyclohexanediol, 1,4-dihydroxymethylcyclohexane, glycerol, tris(~i-hydroxy-ethyl)amine, trimethylolethane, trimethylolpropane, pentaerythritol, dipentaerythritol and sorbitol.
The polyols may be partially or fully esterified by one or by different unsaturated carboxylic acid(s), it being possible for the free hydroxyl groups in partial esters to have been modified, for example etherified, or esterified with other carboxylic acids.
Examples of esters are:
trimethylolpropane triacrylate, trimethylolethane triacrylate, trimethylolpropane trimethacry-late, trimethylolethane trimethacrylate, tetramethylene glycol dimethacrylate, tri-ethylene glycol dimethacrylate, tetraethylene glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol diacrylate, dipenta-erythritol triacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipenta-erythritol hexaacrylate, tripentaerythritol octaacrylate, pentaerythritol dimethacrylate, penta-erythritol trimethacrylate, dipentaerythritol dimethacrylate, dipentaerythritol tetra-methacrylate, tripentaerythritol octamethacrylate, pentaerythritol diitaconate, dipenta-erythritol trisitaconate, dipentaerythritol pentaitaconate, dipentaerythritol hexaitaconate, ethylene glycol diacrylate, 1,3-butanediol diacrylate, 1,3-butanediol dimethacrylate, 1,4-butanediol diitaconate, sorbitol triacrylate, sorbitol tetraacrylate, pentaerythritol-modified tria-crylate, sorbitol tetramethacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate, oligo-ester acrylates and methacrylates, glycerol di- and tri-acrylate, 1,4-cyclohexane diacrylate, bisacrylates and bismethacrylates of polyethylene glycol having a molecular weight of from 200 to 1500, and mixtures thereof.
Suitable components (A) are also the amides of identical or different unsaturated carboxylic acids and aromatic, cycloaliphatic and aliphatic polyamines having preferably from 2 to 6, especially from 2 to 4, amino groups. Examples of such polyamines are ethylenediamine, 1,2- or 1,3-propylenediamine, 1,2-, 1,3- or 1,4-butylenediamine, 1,5-pentylenediamine, 1,6-hexylenediamine, octylenediamine, dodecylenediamine, 1,4-diaminocyclohexane, isopho-ronediamine, phenylenediamine, bisphenylenediamine, di-[i-aminoethyl ether, diethylenetri-amine, triethylenetetraamine and di([3-aminoethoxy)- or di([3-aminopropoxy)ethane. Further suitable polyamines are polymers and copolymers which may have additional amino groups in the side chain and oligoamides having amino terminal groups. Examples of such unsatu-rated amides are: methylene bisacrylamide, 1,6-hexamethylene bisacrylamide, diethylene-triamine trismethacrylamide, bis(methacrylamidopropoxy)ethane, [3-methacrylamidoethyl methacrylate and N-[([3-hydroxyethoxy)ethyl]-acrylamide.
Suitable unsaturated polyesters and polyamides are derived, for example, from malefic acid and diols or diamines. The malefic acid may have been partially replaced by other dicarbox-ylic acids. They can be used together with ethylenically unsaturated comonomers, for exam-ple styrene. The polyesters and polyamides can also be derived from dicarboxylic acids and ethylenically unsaturated diols or diamines, especially from those having longer chains of, for example, from 6 to 20 carbon atoms. Examples of polyurethanes are those composed of saturated diisocyanates and unsaturated diols, or unsaturated diisocyanates and saturated diols.
Polybutadiene and polyisoprene and copolymers thereof are known. Suitable comonomers include, for example, olefins, such as ethylene, propene, butene, hexene, (meth)acrylates, acrylonitrile, styrene and vinyl chloride. Polymers having (meth)acrylate groups in the side chain are also known. They may be, for example, reaction products of novolak-based epoxy resins with (meth)acrylic acid; homo- or co-polymers of vinyl alcohol or hydroxyalkyl deriva-tives thereof that have been esterified with (meth)acrylic acid; or homo- and co-polymers of (meth)acrylates that have been esterified with hydroxyalkyl (meth)acrylates.
The photopolymerisable compounds (A) may be used on their own or in any desired mix-tures. Preference is given to mixtures of polyol (meth)acrylates.
Binders may also be added to the compositions according to the invention, this being espe-cially advantageous when the photopolymerisable compounds are liquid or viscous sub-stances. The amount of binder may be, for example, from 5 to 95 % by weight, preferably from 10 to 90 % by weight and especially from 40 to 90 % by weight, based on total solids.
The binder will be selected according to the field of use and the properties required therefor, such as developability in aqueous and organic solvent systems, adhesion to substrates and sensitivity to oxygen.
Suitable binders are, for example, polymers having a molecular weight of approximately from 5000 to 2 000 000, preferably from 10 000 to 1 000 000. Examples thereof are:
homo- and co-polymers of acrylates and methacrylates, for example copolymers of methyl meth-acryl-ate/ethyl acrylate/methacrylic acid, poly(methacrylic acid alkyl esters), poly(acrylic acid alkyl esters); cellulose esters and ethers, such as cellulose acetate, cellulose acetate butyrate, methyl cellulose, ethyl cellulose; polyvinyl butyral, polyvinylformal, cyclised rubber, polyeth-ers, such as polyethylene oxide, polypropylene oxide, polytetrahydrofuran;
polystyrene, poly-carbonate, polyurethane, chlorinated polyolefins, polyvinyl chloride, copolymers of vinyl chlo-ride/vinylidene chloride, copolymers of vinylidene chloride with acrylonitrile, methyl meth-acrylate and vinyl acetate, polyvinyl acetate, copoly(ethylenelvinyl acetate), polymers such as polycaprolactam and poly(hexamethyleneadipamide), polyesters such as polyethylene glycol terephthalate) and poly(hexamethylene glycol succinate).
The resins mentioned below under (C1 ) may also be used as component (A), that is to say as UV-curable component. Of particular interest are, for example, unsaturated acrylates having reactive functional groups. The reactive functional group may be selected, for exam-ple, from a hydroxyl, thiol, isocyanate, epoxy, anhydride, carboxyl, amino or blocked amino group. Examples of OH-group-containing unsaturated acrylates are hydroxyethyl and hy-droxybutyl acrylates and also glycidyl acrylates.
The unsaturated compounds may also be used in admixture with non-photopolymerisable film-forming components. These may be, for example, polymers that can be dried physically or solutions thereof in organic solvents, such as nitrocellulose or cellulose acetobutyrate.
They may alternatively be chemically or thermally curable resins, such as polyisocyanates, polyepoxides or melamine resins. The concomitant use of thermally curable resins is im-portant for use in so-called hybrid systems which are both photopolymerised and thermally crosslinked.
Component (A) may, for example, be a coating composition comprising (A1 ) compounds having one or more free-radically polymerisable double bonds that addi-tionally contain at least one further functional group that is reactive in terms of an addition and/or condensation reaction (examples are given above), (A2) compounds having one or more free-radically polymerisable double bonds that addi-tionally contain at least one further functional group that is reactive in terms of an addition and/or condensation reaction, the additional reactive functional group being complementary or reactive towards the additional reactive functional groups of component (A1 ), (A3) optionally at least one monomeric, oligomeric and/or polymeric compound having at least one functional group that is reactive in terms of an addition and/or condensation reac-tion towards the functional groups of component (A1 ) or component (A2) that are present in addition to the free-radically polymerisable double bonds.
Component (A2) in each case carries the groups complementary or reactive towards compo-nent (A1 ). Different types of functional groups may also be present in a component. Com-ponent (A3) provides a further component that contains functional groups that are reactive in terms of an addition andlor condensation reaction and that are able to react with the func-tional groups of (A1 ) or (A2) that are present in addition to the free-radically polymerisable double bonds. Component (A3) contains no free-radically polymerisable double bonds. Ex-amples of such combinations (A1 ), (A2), (A3) can be found in WO 99/55785.
Examples of suitable reactive functional groups are selected, for example, from hydroxyl, isocyanate, epoxy, anhydride, carboxyl and blocked amino groups. Examples have been described above.
Constituents of component (C) are, for example, thermally curable lacquer or coating system constituents customary in the art. Component (C) accordingly may consist of a number of constituents.
Examples of component (C) are, for example, oligomers and/or polymers derived from a,~3-unsaturated acids and derivatives thereof, for example polyacrylates and polymethacrylates, polymethyl methacrylates impact-resistant-modified with butyl acrylate, polyacrylamides and polyacrylonitriles. Further examples of component (C) are urethanes, polyurethanes derived from on the one hand polyethers, polyesters and polyacrylates having free hydroxyl groups and on the other hand aliphatic or aromatic polyisocyanates, and pre-products thereof.
Component (C) accordingly also includes, for example, crosslinkable acrylic resins derived from substituted acrylic acid esters, for example epoxy acrylates, urethane acrylates and po-lyester acrylates. Alkyd resins, polyester resins and acrylate resins and modifications thereof that are crosslinked with melamine resins, urea resins, isocyanates, isocyanurates, polyiso-cyanates, polyisocyanurates and epoxy resins, may also be a constituent of component (C).
Component (C) is, for example, generally a film-forming binder based on a thermoplastic or thermocurable resin, predominantly on a thermocurable resin. Examples thereof are alkyd, acrylic, polyester, phenol, melamine, epoxy and polyurethane resins and mixtures thereof.
Examples thereof are described, for example, in Ullmann's Encyclopedia of Industrial Chem-istry, 5th Ed., Vol. A18, pp. 368-426, VCH, Weinheim 1991.
Component (C) may be a cold-curable or hot-curable binder, with the addition of a curing catalyst possibly being advantageous. Suitable catalysts that accelerate the full cure of the binder are described, for example, in Ullmann's Encyclopedia of Industrial Chemistry, Vol.
A18, page 469, VCH Verlagsgesellschaft, Weinheim 1991.
Examples of specific binders suitable as component (C) are:
1. surface-coatings based on cold- or hot-crosslinkable alkyd, acrylate, polyester, epoxy or melamine resins or mixtures of such resins, optionally with the addition of a curing catalyst;
2. two-component polyurethane surface-coatings based on hydroxyl-group-containing acry-late, polyester or polyether resins and aliphatic or aromatic isocyanates, isocyanurates or polyisocyanates;
3. one-component polyurethane surface-coatings based on blocked isocyanates, isocyanu-rates or polyisocyanates, which are de-blocked during stoving; it is also possible to add melamine resins as appropriate;
4. one-component polyurethane surface-coatings based on aliphatic or aromatic urethanes or polyurethanes and hydroxyl-group-containing acrylate, polyester or polyether resins;
5. one-component polyurethane surface-coatings based on aliphatic or aromatic urethane acrylates or polyurethane acrylates having free amine groups in the urethane structure and melamine resins or polyether resins, optionally with the addition of a curing catalyst;
6. two-component surface-coatings based on (poly)ketimines and aliphatic or aromatic iso-cyanates, isocyanurates or polyisocyanates;
7. two-component surface-coatings based on (poly)ketimines and an unsaturated acrylate resin or a polyacetoacetate resin or a methacrylamidoglycolate methyl ester;
8. two-component surface-coatings based on carboxyl- or amino-group-containing polyacry-lates and polyepoxides;
9. two-component surface-coatings based on anhydride-group-containing acrylate resins and a polyhydroxy or polyamino component;
10. two-component surface-coatings based on acrylate-containing anhydrides and polyepoxides;
11. two-component surface-coatings based on (poly)oxazolines and anhydride-group-' containing acrylate resins or unsaturated acrylate resins or aliphatic or aromatic isocyanates, isocyanurates or polyisocyanates;
12. two-component surface-coatings based on unsaturated polyacrylates and polyma-lonates;
13. thermoplastic polyacrylate surface-coatings based on thermoplastic acrylate resins or extrinsically crosslinking acrylate resins in combination with etherified melamine resins;
14. surface-coating systems based on urethane (meth)acrylate having (meth)acryloyl groups and free isocyanate groups and on one or more compounds that react with isocyanates, for example free or esterified polyols. Such systems have been published, for example, in EP
928800.
Blocked isocyanates, as may also be used in component (C), are described, for example, in Organischer Metallschutz: Entwicklung and Anwendung von Beschichtungsstoffen, pages 159-160, Vincentz Verlag, Hanover (1993). These are compounds in which the highly reac-tive NCO group is "blocked" by reaction with specific radicals, for example primary alcohols, phenol, acetoacetic ester, ~-caprolactam, phthalimide, imidazole, oxime or amine. The blocked isocyanate is stable in liquid systems and also in the presence of hydroxy groups.
Upon heating, the blocking agent is removed again and the NCO group is freed.
1-Component (1 C) and 2-component (2C) systems may be used as component (C).
Exam-ples of such systems are described in Ullmann's Encyclopedia of Industrial Chemistry, Vol.
A18, Paints and Coatings, pages 404-407, VCH Verlagsgesellschaft mbH, Weinheim (1991 ).
It is possible to optimise the composition by specially adapting the formulation, for example by varying the binder/crosslinking agent ratio. Such measures will be known to the person skilled in the art of surface-coating technology.
In the curing process according to the invention, component (C) is preferably a mixture based on acrylate/melamine (and melamine derivates), 2-component polyurethane, 1-component polyurethane, 2-component epoxy/carboxy or 1-component epoxy/carboxy.
Mixtures of those systems are also possible, for example the addition of melamine (or de-rivatives thereof) to 1-component polyurethanes.
Component (C) is preferably a binder based on a polyacrylate with melamine or on a mela-mine derivative. Preference is also given to a system based on a polyacrylate andlor poly-ester polyol with an unblocked polyisocyanate or polyisocyanurate.
Component (C) may also comprise monomeric and/or oligomeric compounds having eth-ylenically unsaturated bonds (prepolymers) that additionally contain at least one or more OH, NH2, COOH, epoxy or NCO groups (= C1 ) that are capable of reaction with the binder and/or the crosslinking agent constituent of component (C). After application and thermal curing, the ethylenically unsaturated bonds are converted to a crosslinked, high molecular weight form by UV radiation. Examples of such components (C) are described, for example, in the above-mentioned publication, Ullmann's Encyclopedia of Industrial Chemistry, 5th Ed., Vol.
A18, pages 451-453, or by S. Urano, K. Aoki, N. Tsuboniva and R. Mizuguchi in Progress in Organic Coatings, 20 (1992), 471-486, or by H. Terashima and O. Isozaki in (6), 222.
(C1 ) may, for example, be an OH-group-containing unsaturated acrylate, for example hy-droxyethyl or hydroxybutyl acrylate or a glycidyl acrylate. Component (C1 ) may be of any desired structure (for example it may contain units of polyester, polyacrylate, polyether, etc..), provided that it contains an ethylenically unsaturated double bond and additionally free OH, COOH, NH2, epoxy or NCO groups.
(C1 ) may, for example, also be obtained by reacting an epoxy-functional oligomer with acrylic acid or methacrylic acid. A typical example of an OH-functional oligomer having vinylic dou-ble bonds is O IH OH
CH2=CH-C-OCH2 CH-CH2 O ~-~ C ~-~ O-CHz CH-CH20-C-CH=CHZ obtained by reaction of CH2=CHCOOH Wlth HZC CH-CHZ-O ~-~ CH3 ~-~ O-CHZ CHO\CH2 , Another possible method of preparing component (C1 ) is, for example, the reaction of an oli-gomer that contains only one epoxy group and has a free OH group at another position in the molecule.
The quantity ratio of components (A) to (C) in the UV- and thermally-crosslinking formula-tions is not critical. "Dual-cure" systems are known to the person skilled in the art, who will therefore be familiar with the optimum ratios of the UV- and thermally-crosslinkable compo-nents for a particular desired use. For example, compositions may contain components (A) and (C), for example, in a ratio of from 5:95 to 95:5, from 20:80 to 80:20 or from 30:70 to 70:30, for example from 40:60 to 60:40.
Examples of "dual-cure" systems, that is to say systems comprising both UV-curable and thermally curable components, can be found inter aiia in US 5 922 473, columns 6 to 10.
It is also possible to add solvent or water to the compositions used in the process according to the invention. If the compositions are used without solvent, they are, for example, powder coating formulations. Suitable solvents are solvents known to the person skilled in the art, especially those customary in surface-coating technology. Examples thereof are various or-ganic solvents, such as ketones, for example methyl ethyl ketone, cyclohexanone; aromatic hydrocarbons, for example toluene, xylene and tetramethylbenzene; glycol ethers, such as diethylene glycol monoethyl ether, dipropylene glycol diethyl ether; esters, for example ethyl acetate; aliphatic hydrocarbons, such as hexane, octane, decane; and petroleum solvents, for example petroleum ether.
The compounds and mixtures thereof according to the invention may also be used as free-radical photoinitiators or photoinitiating systems for radiation-curable powder coating compo-sitions. The powder coating compositions may be based on solid resins and monomers containing reactive double bonds, for example maleates, vinyl ethers, acrylates, acryl-amides and mixtures thereof. A free-radically UV-curable powder coating composition can be for-mulated by mixing unsaturated polyester resins with solid acrylamides (for example methyla-crylamidoglycolate methyl ester) and a free-radical photoinitiator according to the invention, as described, for example, in the presentation "Radiation Curing of Powder Coating", Con-ference Proceedings, Radtech Europe 1993 by M. Wittig and Th. Gohmann. Free-radically UV-curable powder coating compositions can also be formulated by mixing unsaturated polyester resins with solid acrylates, methacrylates or vinyl ethers and a photoinitiator (or photoinitiator mixture) according to the invention. The powder coating compositions may also comprise binders, as described, for example, in DE 4228514 and EP 636669.
The powder coating formulations described in EP 636669 comprise, for example, a) an unsaturated resin from the group of (semi)crystalline or amorphous unsaturated polyes-ters, unsaturated polyacrylates or mixtures thereof with unsaturated polyesters, special pref-erence being given to those derived from malefic acid or fumaric acid; b) an oligomeric or polymeric crosslinking agent having vinyl ether-, vinyl ester- or (meth)acrylate-functional groups, special preference being given to vinyl ether oligomers, such as divinyl-ether-functionalised urethanes; c) the photoinitiator.
The UV-curable powder coating compositions may also comprise white or coloured pig-ments. Thus, for example, especially rutile titanium dioxide can be used in concentrations of up to 50 % by weight in order to obtain a cured powder coating having good covering power.
The process normally comprises spraying the powder electrostatically or tribostatically onto the substrate, for example metal or wood, melting the powder by heating and, once a smooth film has been produced, radiation-curing the coating with ultraviolet and/or visible light, for example using medium-pressure mercury lamps, metal halide lamps or xenon lamps. A par-ticular advantage of radiation-curable powder coating compositions over corresponding thermally curable powder coating compositions is that the flow time after the powder particles have been melted can be prolonged as desired to ensure the formation of a smooth high-gloss coating. Unlike thermally curable systems, radiation-curable powder coating composi-tions can be so formulated that they melt at relatively low temperatures, without the undesir-able effect of their useful life being shortened. For that reason they are also suitable as coatings for heat-sensitive substrates, such as wood or plastics.
If the powder coating compositions are to be applied to substrates that are not heat-sensitive, for example to metals (automotive coatings), it is also possible to provide "dual cure" powder coating formulations using the photoinitiators according to the invention.
Such formulations are known to the person skilled in the art and are both thermally cured and UV-cured. Such formulations can be found, for example, in US 5 922 473.
The powder coating formulations may also comprise UV-absorbers in addition to the photo-initiators according to the invention. Suitable examples thereof are listed below.
The photopolymerisable mixtures may comprise various additives (D) in addition to the pho-toinitiator. Examples thereof are thermal inhibitors, the purpose of which is to prevent pre-mature polymerisation, for example hydroquinone, hydroquinone derivatives, p-methoxyphenol, [3-naphthol and sterically hindered phenols, for example 2,6-di(tert-butyl)-p-cresol. In order to increase stability to dark storage, it is possible, for example, to use copper compounds, such as copper naphthenate, stearate or octoate, phosphorus compounds, for example triphenylphosphine, tributylphosphine, triethyl phosphite, triphenyl phosphite or tribenzyl phosphite, quaternary ammonium compounds, for example tetramethylammonium chloride or trimethylbenzylammonium chloride, or hydroxylamine derivatives, for example N-i diethylhydroxylamine. In order to exclude atmospheric oxygen during polymerisation, it is possible to add paraffin or similar wax-like substances that, being insufficiently soluble in the polymer, migrate to the surface at the beginning of the polymerisation and form a transparent surface layer which prevents the ingress of air. Equally possible is the application of an oxy-gen-impermeable layer. UV-Absorbers, for example of the hydroxyphenyl-benzotriazole, hy-droxyphenyl-benzophenone, oxalic acid amide or hydroxyphenyl-s-triazine type, may be added as light stabilisers. Individual compounds or mixtures of those compounds may be used with or without the use of sterically hindered amines (HALS).
Examples of such UV-absorbers and light stabilisers are 1. 2-(2'-Hydroxyphenyl)benzotriazoles, for example 2-(2'-hydroxy-5'-methylphenyl)benzo-triazole, 2-(3',5'-di-tert-butyl-2'-hydroxyphenyl)benzotriazole, 2-(5'-tert-butyl-2'-hydroxy-phe-nyl)benzotriazole, 2-(2'-hydroxy-5'-(1,1,3,3-tetramethylbutyl)phenyl)benzotriazole, 2-(3',5'-di-tert-butyl-2'-hydroxyphenyl)-5-chloro-benzotriazole, 2-(3'-tert-butyl-2'-hydroxy-5'-methylphe-nyl)-5-chloro-benzotriazole, 2-(3'-sec-butyl-5'-tert-butyl-2'-hydroxyphenyl)benzo-triazole, 2-(2'-hydroxy-4'-octyloxyphenyl)benzotriazole, 2-(3',5'-di-tert-amyl-2'-hydroxy-phenyl)benzotri-azole, 2-(3',5'-bis-(a,a-dimethylbenzyl)-2'-hydroxyphenyl)benzotriazole, 2-(3'-tert-butyl-2'-hy-droxy-5'-(2-octyloxycarbonylethyl)phenyl)-5-chloro-benzotriazole, 2-(3'-tert-butyl-5'-[2-(2-eth-ylhexyloxy)-carbonylethyl]-2'-hydroxyphenyl)-5-chloro-benzotriazole, 2-(3'-tert-butyl-2'-hydr-oxy-5'-(2-methoxycarbonylethyl)phenyl)-5-chloro-benzotriazole, 2-(3'-tert-butyl-2'-hydroxy-5'-(2-methoxycarbonylethyl)phenyl)benzotriazole, 2-(3'-tert-butyl-2'-hydroxy-5'-(2-octyloxycarbo-nylethyl)phenyl)benzotriazole, 2-(3'-tert-butyl-5'-[2-(2-ethylhexyl-oxy)carbonylethyl]-2'-hydrox-yphenyl)benzotriazole, 2-(3'-dodecyl-2'-hydroxy-5'-methyl-phenyl)benzotriazole, 2-(3'-tert-bu-tyl-2'-hydroxy-5'-(2-isooctyloxycarbonylethyl)-phenyl-benzotriazole, 2,2'-methylene-bis[4-(1,-1,3,3-tetramethylbutyl)-6-benzotriazol-2-yl-phenol]; the transesterification product of 2-[3'-tert-butyl-5'-(2-methoxycarbonylethyl)-2'-hydroxyphenyl]-2H-benzotriazole with polyethylene gly-col 300; [R-CH2CH2-COO-CH2CH2]2- where R = 3'-tert-butyl-4'-hydroxy-5'-2H-benzotriazol-2-ylphenyl, 2-[2'-hydroxy-3'-(a,a-dimethylbenzyl)-5'-(1,1,3,3-tetramethylbutyl)-phenylJbenz-otriazole; 2-[2'-hydroxy-3'-(1,1,3,3-tetramethylbutyl)-5'-(a,a-dimethylbenzyl)-phenyl]benzotri-azole.
2. 2-Hydroxybenzophenones, for example the 4-hydroxy, 4-methoxy, 4-octyloxy, 4-decyloxy, 4-dodecyloxy, 4-benzyloxy, 4,2',4'-trihydroxy and 2'-hydroxy-4,4'-dimethoxy derivatives.
3. Esters of substituted and unsubstituted benzoic acids, as for example 4-tert-butyl-phenyl salicylate, phenyl salicylate, octylphenyl salicylate, dibenzoyl resorcinol, bis(4-tert-butylben-zoyl) resorcinol, benzoyl resorcinol, 2,4-di-tert-butylphenyl 3,5-di-tert-butyl-4-hydroxybenzo-ate, hexadecyl 3,5-di-tert-butyl-4-hydroxybenzoate, octadecyl 3,5-di-tert-butyl-4-hydroxyben-zoate, 2-methyl-4,6-di-tert-butylphenyl 3,5-di-tert-butyl-4-hydroxybenzoate.
4. Acrylates, for example ethyl a-cyano-[i,[3-diphenylacrylate, isooctyl a-cyano-[i,[i-diphenyl-acrylate, methyl a-methoxycarbonylcinnamate, methyl a-cyano-a-methyl-p-methoxy-cinna-mate, butyl a-cyano-[i-methyl-p-methoxy-cinnamate, methyl a-methoxycarbonyl-p-methoxy-cinnamate and N-([i-methoxycarbonyl-~-cyanovinyl)-2-methylindoline.
5. Sterically hindered amines, for example bis(2,2,6,6-tetramethyl-4-piperidyl)sebacate, bis-(2,2,6,6-tetramethyl-4-piperidyl)succinate, bis(1,2,2,6,6-pentamethyl-4-piperidyl)-sebacate, bis(1-octyloxy-2,2,6,6-tetramethyl-4-piperidyl)sebacate, bis(1,2,2,6,6-yenta-methyl-4-piperid-yl) n-butyl-3,5-di-tert-butyl-4-hydroxybenzylmalonate, the condensate of 1-(2-hydroxyethyl)-2,2,6,6-tetramethyl-4-hydroxypiperidine and succinic acid, linear or cyclic condensates of N,N'-bis(2,2,6,6-tetramethyl-4-piperidyl)hexamethylenediamine and 4-tert-octylamino-2,6-di-chloro-1,3,5-triazine, tris(2,2,6,6-tetramethyl-4-piperidyl)nitrilotriacetate, tetrakis(2,2,6,6-tetra-methyl-4-piperidyl)-1,2,3,4-butane-tetracarboxylate, 1,1'-(1,2-ethane-diyl)-bis(3,3,5,5-tetra-methylpiperazinone), 4-benzoyl-2,2,6,6-tetramethylpiperidine, 4-stearyl-oxy-2,2,6,6-tetrame-thylpiperidine, bis(1,2,2,6,6-pentamethylpiperidyl)-2-n-butyl-2-(2-hydroxy-3,5-di-tert-butylben-zyl)malonate, 3-n-octyl-7,7,9,9-tetramethyl-1,3,8-triazaspiro-[4.5]decane-2,4-dione, bis(1-oct-yloxy-2,2,6,6-tetramethylpiperidyl)sebacate, bis(1-octyloxy-2,2,6,6-tetramethylpiperidyl)suc-cinate, linear or cyclic condensates of N,N'-bis-(2,2,6,6-tetramethyl-4-piperidyl)hexamethyle-nediamine and 4-morpholino-2,6-dichloro-1,3,5-triazine, the condensate of 2-chloro-4,6-bis-(4-n-butylamino-2,2,6,6-tetramethylpiperidyl)-1,3,5-triazine and 1,2-bis(3-aminopropylamino)-ethane, the condensate of 2-chloro-4,6-di-(4-n-butylamino-1,2,2,6,6-pentamethylpiperidyl)-1,3,5-triazine and 1,2-bis(3-aminopropyl-amino)ethane, 8-acetyl-3-dodecyl-7,7,9,9-tetrame-thyl-1,3,8-triazaspiro[4.5]decane-2,4-dione, 3-dodecyl-1-(2,2,6,6-tetramethyl-4-piperidyl)pyr-rolidine-2,5-dione, 3-dodecyl-1-(1,2,2,6,6-pentamethyl-4-piperidyl)pyrrolidine-2,5-dione, a mixture of 4-hexadecyloxy- and 4-stearyloxy-2,2,6,6-tetramethylpiperidine, a condensation product of N,N'-bis(2,2,6,6-tetramethyl-4-piperidyl)hexamethylenediamine and 4-cyclohexyl-amino-2,6-dichloro-1,3,5-triazine, a condensation product of 1,2-bis(3-aminopropylamino)eth-ane and 2,4,6-trichloro-1,3,5-triazine as well as 4-butylamino-2,2,6,6-tetramethylpiperidine (CAS Reg. No. [136504-96-6]); N-(2,2,6,6-tetramethyl-4-piperidyl)-n-dodecylsuccinimide, N-(1,2,2,6,6-pentamethyl-4-piperidyl)-n-dodecylsuccinimide, 2-undecyl-7,7,9,9-tetramethyl-1-oxa-3,8-diaza-4-oxo-spiro(4,5]decane, a reaction product of 7,7,9,9-tetramethyl-2-cyclounde-cyl-1-oxa-3,8-diaza-4-oxospiro[4,5]decane and epichlorohydrin, 1,1-bis(1,2,2,6,6-pentame-thyl-4-piper-idyloxycarbonyl)-2-(4-methoxyphenyl)ethene, N,N'-bis-formyl-N,N'-bis(2,2,6,6-te-tra-methyl-4-piperidyl)hexamethylenediamine, diester of 4-methoxy-methylene-malonic acid with 1,2,2,6,6-pentamethyl-4-hydroxypiperidine, poly[methylpropyl-3-oxy-4-(2,2,6,6-tetrame-thyl-4-piperidyl)]siloxane, reaction product of malefic acid anhydride-a-olefin-copolymer with 2,2,6,6-tetramethyl-4-aminopiperidine or 1,2,2,6,6-pentamethyl-4-aminopiperidine.
6. Oxamides, for example 4,4'-dioctyloxyoxanilide, 2,2'-diethoxyoxanilide, 2,2'-dioctyloxy-5,5'-di-tert-butoxanilide, 2,2'-didodecyloxy-5,5'-di-tert-butoxanilide, 2-ethoxy-2'-ethyloxanilide, N,N'-bis(3-dimethylaminopropyl)oxamide, 2-ethoxy-5-tert-butyl-2'-ethoxanilide and its mixture with 2-ethoxy-2'-ethyl-5,4'-di-tert-butoxanilide, mixtures of o- and p-methoxy-disubstituted ox-anilides and mixtures of o- and p-ethoxy-disubstituted oxanilides.
7. 2-(2-Hydroxyphenyl)-1,3,5-triazines, for example 2,4,6-tris(2-hydroxy-4-octyloxyphenyl)-1,3,5-triazine, 2-(2-hydroxy-4-octyloxyphenyl)-4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine, 2-(2,4-dihydroxyphenyl)-4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine, 2,4-bis(2-hydroxy-4-propyl-oxyphenyl)-6-(2,4-dimethylphenyl)-1,3,5-triazine, 2-(2-hydroxy-4-octyloxyphenyl)-4,6-bis(4-methylphenyl)-1,3,5-triazine, 2-(2-hydroxy-4-dodecyloxyphenyl)-4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine, 2-(2-hydroxy-4-tridecyloxyphenyl)-4,6-bis{2,4-dimethylphenyl)-1,3,5-triazine, 2-(2-hydroxy-4-(2-hydroxy-3-butyloxy-propoxy)phenyl]-4,6-bis(2,4-dimethyl)-1,3,5-triazine, 2-[2-hydroxy-4-(2-hydroxy-3-octyloxy-propyloxy)phenyl]-4,6-bis(2,4-dimethyl)-1,3,5-triazine, 2-[4-(dodecyloxy/tridecyloxy-2-hydroxypropoxy)-2-hydroxy-phenyl]-4,6-bis(2,4-dimethyl-phenyl)-1,3,5-triazine, 2-[2-hydroxy-4-(2-hydroxy-3-dodecyloxy-propoxy)phenyl]-4,6-bis(2,4-dimethyl-phenyl)-1,3,5-triazine, 2-(2-hydroxy-4-hexyloxy)phenyl-4,6-diphenyl-1,3,5-triazine, 2-(2-hy-droxy-4-methoxyphenyl)-4,6-diphenyl-1,3,5-triazine, 2,4,6-tris[2-hydroxy-4-(3-butoxy-2-hy-droxy-propoxy)phenyl]-1,3,5-triazine, 2-(2-hydroxyphenyl)-4-(4-methoxyphenyl)-6-phenyl-1,3,5-triazine, 2-{2-hydroxy-4-[3-(2-ethylhexyl-1-oxy)-2-hydroxypropyloxy]phenyl}-4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine.
8. Phosphites and phosphonites, for example triphenyl phosphite, diphenyl alkyl phosphites, phenyl dialkyl phosphites, tris(nonylphenyl) phosphite, trilauryl phosphite, trioctadecyl phos-phate, distearyl pentaerythritol diphosphite, tris(2,4-di-tert-butylphenyl) phosphate, diisodecyl pentaerythritol diphosphite, bis(2,4-di-tert-butylphenyl) pentaerythritol diphosphite, bis(2,6-di-tert-butyl-4-methylphenyl)-pentaerythritol diphosphite, diisodecyloxypentaerythritol diphos-phite, bas(2,4-di-tert-butyl-6-methylphenyl)pentaerythritol diphosphite, bis(2,4,6-tris(tert-butyl-phenyl)pentaerythritol diphosphite, tristearyl sorbitol triphosphite, tetrakis(2,4-di-tert-butyl-phenyl) 4,4'-biphenylene diphosphonite, 6-isooctyloxy-2,4,8,10-tetra-tert-butyl-12H-dibenz-[d,g]-1,3,2-dioxaphosphocine, bas(2,4-di-tert-butyl-6-methylphenyl) methyl phosphate, bis(2,4-di-tert-butyl-6-methylphenyl) ethyl phosphate, 6-fluoro-2,4,8,10-tetra-tert-butyl-12-methyl-di-benz[d,g]-1,3,2-dioxaphosphocine, 2,2',2"-nitrilo[triethyltris(3,3',5,5'-tetra-tert-butyl-1,1'-biphe-nyl-2,2'-diyl)phosphite], 2-ethylhexyl(3,3',5,5'-tetra-tert-butyl-1,1'-biphenyl-2,2'-diyl)phosphite, 5-butyl-5-ethyl-2-(2,4,6-tri-tert-butylphenoxy)-1,3,2-dioxaphosphirane.
Additives customary in the art, such as antistatics, flow improvers, levelling agents and ad-hesion promoters, may also be used.
The photoinitiators of formula I provided with siloxane radicals can also serve as flow im-provers since they are oriented towards the surface and influence the surface properties by way of the siloxane radical. It is also possible to add further flow improvers customary in the art. Examples thereof are siloxane compounds and fluorohydrocarbon compounds, such as are widely available commercially.
The invention relates also to the use of compounds of formula I as flow improvers, optionally in combination with other customary flow improvers.
Flow is defined, according to DIN 55945, as "the ability, to a greater or lesser degree, of a still liquid paint to level out, by itself, any unevenness arising during its application" (see J.
Bielemann, Lackadditive, VCH Weinheim 1998, Chapter 6). The flow of a coating composi-tion is highly dependent upon its flow behaviour and its surface tension. The term "flow im-prover" is used to denote a substance that, by lowering the viscosity andlor the surface ten-sion, enables wet coatings to become evenly flowing films. In the case of powder coating compositions, flow improvers also lower the melt viscosity and the glass transition tempera-ture, and they also act as de-gassing agents. The use of flow improvers eliminates flow and surface faults that impair the overall appearance of the coating. Flow and surface faults in-clude, inter alia, orange peel effect, structure formation, scratching, fisheye formation, sensi-tivity to draught, substrate wetting problems, brush application marks, run formation, stip-pling, pinholes, etc.. The use of the compounds according to the invention as flow improvers enables the surface tension to be lowered. The surface tension can be calculated by deter-mining the wetting angle of a drop of liquid on a surface (contact angle measurement).
In order to accelerate the photopolymerisation it is possible to add as further additives (D) amines, for example triethanolamine, N-methyl-diethanolamine, p-dimethylaminobenzoic acid ethyl ester or Michler's ketone. The action of the amines can be enhanced by the addi-tion of aromatic ketones of the benzophenone type. Amines that can be used as oxygen capture agents are, for example, substituted N,N-dialkylanilines, as described in EP 339841.
Further accelerators, co-initiators and auto-oxidizers are thiols, thin ethers, disulfides and phosphines, as described, for example, in EP 438123 and GB 2180358.
It is also possible to add to the compositions according to the invention chain-transfer rea-gents customary in the art, examples of which are mercaptans, amines and benzothiazole.
Photopolymerisation can also be accelerated by adding as further additives (D) photosensi-tisers that shift or broaden the spectral sensitivity. These include especially aromatic car-bonyl compounds, such as benzophenone and thioxanthone, especially also isopropylthiox-anthone, anthraquinone and 3-acylcoumarin derivatives, terphenyls, styryl ketones, and 3-(aroylmethylene)-thiazolines, camphorquinone, and also eosin, rhodamine and erythrosine dyes.
The above-mentioned amines may, for example, also be regarded as photosensitisers.
The curing process, especially in the case of pigmented compositions (for example composi-tions pigmented with titanium dioxide) may also be assisted by the use of an additional addi-tive (D) that is a component that forms free radicals under thermal conditions, for example an azo compound, such as 2,2'-azobis(4-methoxy-2,4-dimethylvaleronitrile), a triazene, diazo-sulfide, pentaazadiene or a peroxy compound, such as a hydrogen peroxide or peroxycar-bonate, for example tert-butyl hydroperoxide, as described, for example, in EP
245639.
The compositions may also comprise as further additives (D), for example, a photoreducible dye, for example xanthene, benzoxanthene, benzothioxanthene, thiazine, pyronine, porphy-rin or acridine dyes, andlor a radiation-cleavable trihalomethyl compound.
Similar composi-tions are described, for example, in EP 445624.
Further customary additives (D) are - depending upon the intended use -optical brighteners, fillers, for example kaolin, talcum, barytes, gypsum, chalk or silicate-like fillers, pigments, dyes, wetting agents and flow improvers.
For the curing of thick and pigmented coatings it is suitable to add glass microbeads or pul-verised glass fibres, as described, for example, in US 5013768.
The formulations may also comprise colourants and/or white or coloured pigments. De-pending upon the intended use, both inorganic and organic pigments may be used. Such additives are known to the person skilled in the art; some examples thereof are titanium di-oxide pigments, for example of the rutile or anatase type, carbon black, zinc oxide, such as zinc white, iron oxides, such as iron oxide yellow, iron oxide red, chromium yellow, chromium green, nickel titanium yellow, ultramarine blue, cobalt blue, bismuth vanadate, cadmium yel-low and cadmium red. Examples of organic pigments are mono- and bis-azo pigments, and metal complexes thereof, phthalocyanine pigments, polycyclic pigments, such as perylene, anthraquinone, thioindigo, quinacridone and triphenylmethane pigments, and diketo-pyrrolo-pyrrole, isoindolinone, for example tetrachloroisoindolinone, isoindoline, dioxazine, benzimi-dazolone and quinophthalone pigments.
The pigments may be used individually or in admixture in the formulations.
Depending upon the intended use, the pigments are added to the formulations in amounts customary in the art, for example in an amount of from 1 to 60 % by weight, or from 10 to 30 by weight, based on the total weight.
The formulations may, for example, also comprise organic colourants of a wide variety of classes, examples of which are azo dyes, methine dyes, anthraquinone dyes and metal complex dyes. Customary concentrations are, for example, from 0.1 to 20 %, especially from 1 to 5 %, based on the total weight.
The choice of additives will depend upon the field of use in question and upon the properties desired for that field. The additives (D) described above are customary in the art and are ac-cordingly used in amounts customary in the art.
In certain cases it may be advantageous to use mixtures of two or more of the photoinitiators of formula I; for example it is advantageous to use mixtures formed directly during prepara-tion. It is, of course, also possible to use mixtures with known photoinitiators (E), for example mixtures with camphorquinone, benzophenone, benzophenone derivatives, acetophenone, acetophenone derivatives, such as a-hydroxycycloalkylphenylketones or 2-hydroxy-2-methyl-1-phenyl-propanone, dialkoxyacetophenones, a-hydroxy- or a-amino-acetophenones, for ex-ample (4-methylthiobenzoyl)-1-methyl-1-morpholino-ethane, (4-morpholino-benzoyl)-1-benzyl-1-dimethylamino-propane, 4-aroyl-1,3-dioxolanes, benzoin alkyl ethers and benzil ketals, for example benzil dimethyl ketal, phenyl glyoxalates and derivatives thereof, dimeric phenyl glyoxalates, peresters, for example benzophenone tetracarboxylic acid peresters, as described, for example, in EP 126541, monoacylphosphine oxides, for example (2,4,6-trimethylbenzoyl)-phenyl-phosphine oxide, bisacylphosphine oxides, for example bis(2,6-dimethoxybenzoyl)-(2,4,4-trimethyl-pent-1-yl)phosphine oxide, bis(2,4,6-trimethyibenzoyl)-phenyl-phosphine oxide or bis(2,4,6-trimethylbenzoyl)-(2,4-dipentoxyphenyl)phosphine ox-ide, trisacylphosphine oxides, halomethyltriazines, for example 2-[2-(4-methoxy-phenyl)-vinyl]-4,6-bis-trichloromethyl-[1,3,5]triazine, 2-(4-methoxy-phenyl)-4,6-bis-trichloromethyl-[1,3,5]triazine, 2-(3,4-dimethoxy-phenyl)-4,6-bis-trichloro-methyl-[1,3,5]triazine, 2-methyl-4,6-bis-trichloromethyl-[1,3,5]triazine, hexaarylbisimidazole/co-initiator systems, for example or-tho-chlorohexaphenyl-bisimidazole together with 2-mercaptobenzothiazole, ferrocenium compounds or titanocenes, for example dicyclopentadienyl-bis(2,6-difluoro-3-pyrrolo-phenyl)titanium or borate photoinitiators.
When the photoinitiators according to the invention are used in hybrid systems, that is to say in systems that are both free-radically and cationically curable, in addition to the free-radical hardeners of formula I and optionally further free-radical hardeners there are used cationic photoinitiators, for example benzoyl peroxide (other suitable peroxides are described in US 4950581, column 19, lines 17-25), aromatic sulfonium, phosphonium or iodonium salts, as described, for example, in US 4950581, column 18, line 60 to column 19, line 10.
The photopolymerisable compositions contain the photoinitiator advantageously in an amount of from 0.05 to 15 % by weight, preferably from 0.1 to 5 % by weight, based on the composition. The amount of photoinitiator indicated relates to the sum of all the photoinitia-tors added when mixtures thereof are used, that is to say either to the photoinitiator (B) or to the photoinitiators (B) + (E).
The photopolymerisable compositions may be used for a variety of purposes, for example as printing inks, as clear lacquer, as white surface-coating compositions, as colour-pigmented surface-coating compositions, for example for wood or metal, as powder coating composi-tions, as paint, inter alia, for paper, wood, metal or plastics, as daylight-curable paint for marking structures and roads, for photographic reproduction processes, for holographic re-cording materials, for image recording processes or for the production of printing plates that are to be developed with organic solvents or using aqueous/alkaline media, in the production of masks for screen-printing, as dental filling compounds, as adhesives, as pressure-sensitive adhesives, as laminating resins, as etch resists or permanent resists, liquid films and dry films, as photostructurable dielectrics, and as solder masks for electronic circuits, as resists in the manufacture of colour filters for any type of screen or for producing structures in the manufacturing process of plasma displays and electroluminescent displays, in the manufacture of optical switches, optical gratings (interference gratings), in the manufacture of three-dimensional articles by means of bulk curing (UV-curing in transparent moulds) or using the stereolithography process, as described, for example, in US 4575330, in the manufacture of composites (e.g. styrene polyesters that may optionally include glass fibres andlor other fibres and other adjuvants) and other thick-layered compositions, in the coating or sealing of electronic components or as coatings for optical fibres. The compositions are also suitable for the manufacture of optical lenses, for example contact lenses or Fresnel lenses, and also in the manufacture of medical apparatus, aids or implants.
The compositions can also be used in the manufacture of gels having thermotropic proper-ties, as described, for example, in DE 19700064 and EP 678 534.
The compounds of formula I can also be used as initiators for emulsion, bead or suspension polymerisations or as initiators of a polymerisation for fixing the orientation states of liquid crystalline monomers and oligomers, and as initiators for fixing dyes on organic materials.
The photocurable compositions according to the invention are suitable, for example, as coating materials for all kinds of substrates, for example wood, textiles, paper, ceramics, glass, plastics, such as polyesters, polyethylene terephthalate, polyolefins or cellulose ace-tate, especially in the form of films, and metals such as AI, Cu, Ni, Fe, Zn, Mg or Co and GaAs, Si or Si02, to which a protective layer is to be applied or an image is to be applied by image-wise exposure.
The coating of the substrates can be effected by applying a liquid composition, a solution or suspension to the substrate. The choice of solvent and the concentration are governed chiefly by the nature of the composition and by the coating method. The solvent should be inert, that is to say it should not enter into any chemical reaction with the components and it should be capable of being removed again upon drying after the coating operation. Exam-ples of suitable solvents are ketones, ethers and esters, such as methyl ethyl ketone, isobu-tyl methyl ketone, cyclopentanone, cyclohexanone, N-methylpyrrolidone, dioxane, tetrahy-drofuran, 2-methoxyethanol, 2-ethoxyethanol, 1-methoxy-2-propanol, 1,2-dimethoxyethane, ethyl acetate, n-butyl acetate and ethyl 3-ethoxy-propionate.
The formulation is applied uniformly to a substrate by known coating methods, for example by spin-coating, immersion, knife coating, curtain pouring, brush application or spraying, es-pecially by electrostatic spraying and reverse-roll coating, and by electrophoretic deposition.
It is also possible to apply the photosensitive layer to a temporary flexible support and then coat the final substrate by transferring the layer by lamination.
The amount applied (layer thickness) and the type of substrate (layer support) are dependent upon the desired field of use. The dry layer thickness range generally includes values from about 0.1 pm to more than 100 p.m, preferably from 0.02 to 2 cm.
A further field of use for photocuring is in metal coating, for example in the surface-coating of metal sheets and tubes, cans or bottle closures, and photocuring on plastics coatings, for example of PVC-based floor or wall coverings.
Examples of photocuring of paper coatings are the application of a colourless surface-coating to labels, record sleeves or book covers.
The photosensitivity of the compositions according to the invention generally ranges from about 200 nm to about 600 nm (UV field). Suitable radiation is present, for example, in sun-light or light from artificial light sources. Accordingly, a large number of widely varying types of light sources may be used. Point sources and also planiform radiators (lamp carpets) are suitable. Examples thereof include: carbon arc lamps, xenon arc lamps, medium-, high- and low-pressure mercury arc lamps, doped where appropriate with metal halides (metal halide lamps), microwave-excited metal vapour lamps, excimer lamps, superactinic fluorescent tubes, fluorescent lamps, argon incandescent lamps, flashlamps, photographic flood lights, light-emitting diodes (LED), electron beams and X-rays. The distance between the lamp and the substrate to be irradiated can vary according to the intended use and upon the type and strength of the lamp, and may be, for example, from 2 cm to 150 cm. Laser light sources, for example excimer lasers, such as Krypton F lasers for irradiation at 248 nm, are especially suitable. Lasers in the visible range can also be used.
As already mentioned, in the process according to the invention curing can be effected solely by irradiation with electromagnetic radiation, but, depending upon the composition of the formulation to be cured, thermal curing before, during or after the irradiation is advantageous.
The thermal curing is carried out according to methods known to the person skilled in the art.
Curing is generally carried out in an oven, for example a circulating-air oven, on a hotplate or by irradiation with IR lamps. Curing at room temperature without aids is also possible, de-pending upon the binder system used. The curing temperatures are generally from room temperature to 150°C, for example from 25°C to 150°C or from 50°C to 150°C. In the case of powder coating compositions or "coil coat" surface-coatings, the curing temperatures may even be higher, for example up to 350°C.
According to the invention, when the formulation comprises thermally curable components (C) it is also possible to add thermal drying or curing catalysts as additional additives (D) to the formulation. Examples of possible drying catalysts, or thermal curing catalysts, are or-ganic metal compounds, amines and/or phosphines. Organic metal compounds are, for ex-ample, metal carboxylates, especially those of the metals Pb, Mn, Co, Zn, Zr or Cu, or metal chelates, especially those of the metals AI, Ti or Zr, or organometal compounds, for example organotin compounds. Examples of metal carboxylates are the stearates of Pb, Mn or Zn, the octoates of Co, Zn or Cu, the naphthenates of Mn and Co or the corresponding linoleates or tallates. Examples of metal chelates are the aluminium, titanium or zirconium chelates of acetylacetone, ethyl acetylacetate, salicylaldehyde, salicylaldoxime, o-hydroxyacetophenone or ethyl trifluoroacetylacetate and the alkoxides of those metals. Examples of organotin compounds are dibutyltin oxide, dibutyltin dilaurate and dibutyltin dioctoate.
Examples of amines are especially tertiary amines, for example tributylamine, triethanolamine, N-methyl-diethanolamine, N-dimethylethanolamine, N-ethylmorpholine, N-methylmorpholine or diaza-bicyclooctane (triethylenediamine) and salts thereof. Further examples are quaternary am-monium salts, for example trimethylbenzylammonium chloride. Phosphines, for example triphenylphosphine, can also be used as curing catalyst. Suitable catalysts are also de-scribed, for example, in J. Bielemann, Lackadditive, Wiley-VCH Verlag GmbH, Weinheim, 1998, pages 244-247. Examples thereof are carboxylic acids, such as p-toluenesulfonic acid, dodecylbenzenesulfonic acid, dinonylnaphthalenesulfonic acid and dinonylnaphthale-nedisulfonic acid. Latent or blocked sulfonic acids may, for example, also be used, it being possible for the blocking of the acid to be ionic or non-ionic.
Such catalysts are used in concentrations customary in the art and known to the person skilled in the art.
The invention relates also to a process for the photopolymerisation of non-volatile mono-meric, oligomeric or polymeric compounds having at least one ethylenically unsaturated dou-ble bond, in which process a composition as described above is irradiated with electromag-netic radiation in the range of from 200 nm to 600 nm.
The invention relates also to the use of the above-described composition and to a process for the preparation of pigmented and non-pigmented surface-coatings, powder coating com-positions, composites and glass fibre cable coatings.
The invention relates also to a coated substrate that is coated on at least one surface with a composition as described above.
The following Examples illustrate the invention further, but it is not intended to limit the inven-tion to the Examples. As in the remainder of the description and in the claims, unless other-wise indicated, parts and percentages relate to weight. Where mention is made of alkyl radi-cals having more than three carbon atoms without reference to the isomer, it is always the n-isomers that are intended.
Example A: Preparation of the photoinitiator unit A-1: Preparation of phenyl isobutyrate ~~'C~H cHs ii O
In a flask equipped with a thermometer, cooling device and dropping funnel, 176.6 g of phe-nol are cooled to 5°C under nitrogen. Over the course of 40 minutes, 250 g of iso-butylic acid chloride are added dropwise, and the solution is stirred at 5°C
for one hour. The tem-perature is increased to room temperature and stirring is continued for 2 hours. The mixture is distilled (bp = 95-100°C (20 mbar)) and 298 g of the pure product are obtained (97 %).
'H-NMR (CDC13) [ppm]: 7.39 (m, 2 H arom.); 7.22 (m, 1 H arom.); 7.10 (m, 2 H
arom.); 3.54 (q x q, J = 6.99, 1 H); 1.33 (d, J = 7.00, 6 H, 2 CH3).
_ CH3 A-2: Preparation of 1-(4-hydroxyphenyl)-2-methyl-1-propanone Ho ~ / ~ H'cH
In a flask equipped with a thermometer, cooling device and dropping funnel, 580.8 g of alu-minium chloride are added to 1 litre of chlorobenzene at 0-5°C under nitrogen. The mixture is stirred at room temperature for 45 minutes. 298 g of the product prepared as described in A.1 are added dropwise over the course of 45 minutes, the temperature being maintained at 20-25°C. The resulting suspension is stirred at room temperature for 2 days. The mixture is poured into a mixture of ice (3 kg) and hydrochloric acid (450 ml) and extracted with toluene.
The organic phases are washed with salt water. After drying over MgS04 and filtration, the solvent is removed in vacuo. 1 litre of water is added to the residue, and the pH value of the solution is raised to 14 with 30 % sodium hydroxide solution, whilst maintaining the tem-perature at 20°C. The solution is extracted with ethyl acetate. The aqueous phase is cooled to 0°C and the pH value is adjusted to 0 with concentrated hydrochloric acid, the organic phase is dried over MgS04 and filtered and the solvent is removed in vacuo, resulting in a liquid which solidifies in a freezer. The pure product is obtained in the form of a white solid (213 g, 71 %).
'H-NMR (CDC13) [ppm]: 7.90 (m, 2 H arom.); 6.94 (m, 2 H arom.); 3.54 (q x q, J
= 6.84, 1 H);
1.20 (d, J = 6.82, 6 H, 2 CH3).
A-3: Preparation of 2-hydroxy-1-(4-hydroxy- o cH3 phenyl)-2-methyl-1-propanone Ho / ~ c~-~-off A solution of 213 g of the product prepared in A.2 in 475 ml of dioxane is cooled to 0°C.
228 g of bromine are added dropwise over the course of one hour, whilst maintaining the temperature at 10-15°C. The orange-coloured mixture is stirred at room temperature for 2 hours. The solution is poured into water (5.4 litres) and extracted with ethyl acetate. After drying the organic phases over MgSOa and filtering, the solvent is removed in vacuo, result-ing in a brown oil. 3 litres of water are added to the oil, and the beige-coloured emulsion that forms is treated with 650 g of 30 % sodium hydroxide solution. The mixture is stirred at room temperature for 3 hours. 293 ml of concentrated HCI are then added to adjust the pH value of the solution to 7. The resulting white suspension is stirred at 0°C
for 4 hours and at room temperature overnight. The mixture is then cooled to 5°C and filtered.
The crystals are washed with water and dried in vacuo at 40°C. Initially 137.8 g are obtained in the form of dirty-white crystals. A further 47.8 g of a contaminated compound are obtained from the ex-tracted mother liquor. Both products are purified in toluene and 135 g (58 %) of pure product and 27 g (12 %) of a product that is not quite pure are isolated.
'H-NMR (DMSOds) [ppm]: 10.23 (s, OH); 8.12 (m, 2 H arom.); 6.79 (m, 2 H
arom.); 5.59 (s, OH); 1.37 (s, 6 H, 2 CH3). Microanalysis: calc.: C 66.65; H 6.71; found: C
65.60; H 6.52.
A_4: Preparation of 2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone (A4a) and 2-methyl-2-(2-propenyloxy)-1-[4-(2-propenyloxy)phenyl]-1-propanone (A4b) O CHs H2C=C-C-O ~ ~ C-C-OH (A4a) HZC C C-O ~ ~ CI-C-O-H-H CH2 (A4b) H H2 CH3 z A solution of 75 g of the compound prepared as described in A.3 in 300 ml of dimethyl sul-foxide (DMSO) is added over the course of one hour, at room temperature under argon, to a suspension of NaH (20 g; 55-60 % in oil) in 950 ml of DMSO. The solution is stirred for 15 minutes at room temperature and for a further 15 minutes at 35-40°C.
A solution of 38.7 ml of allyl bromide in 75 ml of DMSO is added over the course of 15 minutes and the resulting mixture is heated at 45°C for 30 minutes. The orange-coloured mixture is poured into an ice/water mixture (2.5 litres) and extracted with tert-butyl methyl ether. The organic phases are washed with water and dried over magnesium sulphate. Filtration, removal of the solvent by evaporation and chromatography (eluant hexane/ethyl acetate 5:1 to 4:1 ) yield 2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone (53 g, 58 %) in the form of a slightly yellowish solid and 2-methyl-2-(2-propenyloxy)-1-[4-(2-propenyloxy)phenyl]-1-propanone (17.6 g; 16 %) in the form of an oil.
A4a: 2-Hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone:
U.V. (CH3CN) max. at 273 nm (e 16 482). IR (KBr film, cm-'): 3452 (OH); 1663 (CO). 'H-NMR (CDCI3) [ppm]: 8.02 (m, 2 H arom.); 6.92 (m, 2 H arom.); 6.01 (m, 1 H, allyl); 5.37 (m, 2 H, allyl); 4.60 (m, 2 H, CH2-O); 4.28 (s, OH); 1.62 (s, 6 H, 2 CH3). '3C-NMR
(CDCI3) [ppm]:
162.5 (Carom-); 132.5 (CH allyl); 132.4 Carom.); 118.3 (CH2 allyl); 114.4 Carom.); 75.8 (C(CH3)20H); 69.0 (CH2-O-Ph); 28.8 (CH3). Microanalysis: calc.: C 70.89; H
7.32; found:
C 70.86; H 7.42 A4b: 2-Methyl-2-(2-propenyloxy)-1-[4-(2-propenyloxy)phenyl]-1-propanone U.V. (CH3CN) max. at 275 nm (e 16 467). 'H-NMR (CDC13) [ppm]: 8.30 (m, 2 H
arom.); 6.92 (m, 2 H arom.); 6.05 (m, 1 H, allyl); 5.80 (m, 1 H, allyl); 5.45-5.08 (m, 4 H, allyl); 4.60 (m, 2 H, CH2-O); 3.82 (m, 2 H, CH2-O); 1.54 (s, 6 H, 2 CH3).
C CI C
Example B: Preparation of a catalyst ~ \ ~C' Pt C
CI
A mixture of 20 ml of freshly distilled styrene and 1 g of platinum(II) chloride is stirred at room temperature for 40 hours. The orange-coloured suspension is filtered and the resulting solid is washed with toluene and hexane.
'H-NMR (DMSO-ds) : 7.35 (m, 5 H arom.); 6.72 (dd, J = 10.9, J = 17.6, 1 H, Ph-CH); 5.81 (d, J = 17.6, 1 H); 5.25 (d, J = 10.8, 1 H). Microanalysis: calc: C 40.52; H 3.40;
found: C 40.45;
H 3.03.
H3C-Si-CH3 0 _ ~ CH3 Example 1: H3C-Si--{CH2)3 O ~ ~ C-C-OH
H3C-Si-CH3 (n = 1, m = p = 0, x = 1, R, ~ R5~ Rs, R~, Rs, Rs~ R,o, R~s~ R,a = CH3, Y = -(CH2)s-O-~ x = OH) A mixture of one equivalent of 2-hydroxy-2-methyl-1-(4-(2-propenyloxy)phenyl]-1-propanone and one equivalent of 1,1,1,3,5,5,5-heptamethyltrisiloxane in toluene is heated at 90°C for 18 hours in the presence of 0.012 equivalent (120 ppm, based on the Pt content) of a Pt catalyst supported by aluminium oxide. The mixture is then filtered and the resulting solution is treated with activated carbon. Filtration and removal of the solvent by evaporation yield the compound quantitatively in the form of an oil.
U.V. (CH3CN) max. at 274 nm (E 16 299). ~ H-NMR (CDCI3) b [ppm]: 8.02 (m, 2 H, ArH); 6.94 (m, 2 H, ArH); 4.30 (s, OH); 3.99 (m, 2 H, Ph-OCHZ); 1.83 (m, 2 H, Ph-OCH2-CHz); 1.59 (s, 6 H, 2 CH3); 0.58 (m, 2 H, CHZ-Si); 0.05 (s, 21 H, 7 Si-CH3). m/z (EI) 427 (M+-15); according to the mass spectrum, small amounts of further compounds are also present: 647 (M+-15);
605 (M+-15); 385 (M+-15); 220 {M+); 180 (M+).
Title product M = 442 CH3 i Hs CH3 H3C-Si-CH3 CH3 H3C-Si-CH3 H3C-O -CH3 O CH3 Ip H3C-Si-CH3 p CH O
~I I I ~ ~I) I 3 I
H3C-Si-(CHZ)3 O ~ ~ C-C-O-Si-CH3 ~ H3C-O -O ~ / C-CH O-Si-CH3 s M = 662 CH3 O H3C-Si-CH3 3 O
H C Si-CH H3C=Si-CH3 CH M = 620 HsC-Si-CH3 H C-Si-CH
O CHa O GHa CH3 _ _ H3C-Si-O ~ ~ C-C-OH , HZC=H-H-O ~ / C-C-OH ~ HO ~ / C-C-OH
4 CH3 2 CHs M = 180 CH3 H3C-Si-CH3 M = 400 M = 220 A sample is purified by flash chromatography and a product of M = 442 and 85 %
purity (determined by gas chromatography) is obtained. Impurity remains as a result of the product of M = 400.
U.V. (CH3CN) max. at 274 nm (s 16 761 ).
H3C-Si-CH3 H3C-Si-CH3 Example 2: H3C-Si-(CH2)3 O ~ ~ C-C-O-(CH2)3 Si-CH3 H3C-Si-CH3 H3C-Si-CH3 (x = 2; n = 1; m, p = 0; R,, Rs, Rs, R~, t'~s, Rs, Rio, Ris, R,4 = CH3; Y, X~
_ -(CH2)a-O-) The compound of Example 2 is prepared according to the method described in Example 1, using 1 molar equivalent of 2-methyl-2-(2-propenyloxy)-1-[4-(2-propenyloxy)phenyl]-1-propanone and 2 molar equivalents of 1,1,1,3,5,5,5-heptamethyltrisiloxane.
U.V. (CH3CN) max. at 275 nm (E 14 666). 1 H-NMR (CDCI3) 8 [ppm]: 8.30 (m, 2 H, arom.);
6.87 (m, 2 H, arom.); 3.98 (m, 2 H, Ph-OCHZ); 3.23 (m, 2 H, Ph-C(O)-C(CH3)2-OCH ); 1.80 (m, 2 H, Ph-OCH2-Cue); 1.54 (m, 2 H, Ph-C(O)-C(CH3)2-O-CH2-CHz); 1.50 (s, 6 H, 2 CH3);
0.60 (m, 2 H, CH2-Si); 0.34 (m, 2 H, CHz-Si); 0.10 (m, 42 H, 14 Si-CH3). mlz (CI) : 705 {MH+);
according to the mass spectrum, small amounts of further compounds are also present: 663 (MH+); 621 (MH+); 443 (MH+); 401 (MH+); 459 (MH+); 265 (MH+); 239 (MH+).
M = 662, M = 620, M = 442, M = 400 cf. the structures shown in Example 1. The values MH+
= 459, 265 and 239 are to be assigned to different siloxane chains.
CH3 CH3 CH3 ~ ~ ~ Hs Example 3: H C-Si-O-Si-O-Si-(CH ) O ~ ~ C-C-OH
3 CH3 CH3 CH3 z 3 CH
(x, n, p = 1; m = 0~ R,, A,, Rs, R4, Rs, Rs, Rio, R,3, R,4 = CH3; Y = -(CH2)s-O-~ X = OH) The compound of Example 3 is obtained according to the method described in Example 1, reacting 1 molar equivalent of 2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone and 1 molar equivalent of 1,1,3,3,5,5,5-heptamethyltrisiloxane.
U.V. (CH3CN) max. at 274 nm (E 24 989). 'H-NMR (CDCI3) 8 [ppm]: 7.94 (m, 2 H
atom.);
6.81 (m, 2 H atom.); 4.34 (OH); 3.91 (m, 2 H, Ph-OCH2); 1.80 (m, 2 H, Ph-OCH2-CHz); 1.55 (s, 6 H, 2 CH3); 0.57 (m, 2 H, CH2-Si); 0.01 (m, 21 H, 7 Si-CH3). m/z (EI) (%
ratio determined ' by GC-MS): 663 (MH+)(18 %); 443 (MH+)(57 %); 441 (MH+)(3 %); 401 (MH+)(3 %);
221 (MH+)(8); 181 (MH+)(8 %).
Title product M = 442 CH CH CH _ O CH3 CH3 CH3 CH3 3 ~ 3 ~ 3 ~~ i ~ I
H3C-Si-O-Si-O-Si-(CH2)3 O ~ ~ C-C-O-$i-O-Si-O-Si-CH3 CH3 CH3 CH3 CHs ICH3 CH3 CH3 M = 662 H2C H H2 O ~ ~ C) CH O $i O Si-O- ~ i-CH3 , M = 440 3 'CH3 CH3 CH3 CH3 CH3 CH3 ~ ~ i H3 H3c-~Si-o-si-o-si-o ~ / c-c-off , M = 220 and M = 180 cf. Example 1.
M = 400 A sample is purified by flash chromatography and the pure product of M = 442 is isolated.
U.V. (CH3CN) max. at 274 nm (e 27 180).
H3C-Si-CH3 _ O CH
~ /(CH2)3 O ~ ~ C-C-OH
H3C-Si CH
Example 4: 0 H3C-Si - O CH3 O \ (CH2)3 O ~ ~ C-C-OH
H3C-Si-CH3 CH3 (n = 2~ x = 1 ~ m, p = 0; R,, Rs, Rs, R~, Ra, Rs, R,o, R,s, R,a = CH3; Y = -(CH2)s-O-; X = OH) A mixture of 2 molar equivalents of 2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone and 1 molar equivalent of 1,1,1,3,5,7,7,7-octamethyltetrasiloxane in 50 ml of tolu-ene is heated for 18 hours at 60°C in the presence of 0.01 equivalent of a styrene/platinum dichloride complex (prepared as described in Example B). A further 0.1 equivalent of the catalyst is added, and the mixture is heated again for 22 hours. Filtration is then carried out over diatomaceous earth ("Celite"). Removal of the solvent by evaporation yields a brown t oil, which is taken up in ethyl acetate and treated with activated carbon.
Filtration and re-moval of the solvent by evaporation yield the desired product in a quantitative yield in the form of a yellow oil.
U.V. (CH3CN) max. at 274 (E 22 657). 'H-NMR (CDC13) 8 [ppm]: 7.91 (m, 4 H
arom.); 6.83 (m, 4 H arom.); 4.21-3.85 (m, 4 H, 2 Ph-OCH2); 1.76 (m, 4 H, 2 Ph-OCH2-CHz);
1.52 (br. s, 12 H, 4 CH3); 0.95 (m, 2 H, CH2-Si); 0.55 (m, 2 H, CH2-Si); 0.01 (m, 24 H, 8 Si-CH3). mlz (EI) 707 (M+-15); 221 (MH+). Title product: M = 722; M = 220 cf. Example 1.
_ O CH3 H3C-SH3 (CHZ)3 O ~ ~ C-C-OH
O CHs Example 5: H3C-Si-CH3 O _ O CH3 H3C-Si-(CH2)3 O ~ ~ C-C-OH
(n = 2; p, x = 1; m = 0; R~, Rs, Rc, A,, A2, R,s, R,4 = CH3; Y = -(CH2)s-O-; X
= OH) The compound of Example 5 is obtained according to the method described in Example 1, using 2 molar equivalents of 2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone and 1 molar equivalent of 1,1,3,3,5,5-hexamethyltrisiloxane.
U.V. (CH3CN) max. at 274 (e 25 286). 'H-NMR (CDC13), 8 [ppm]: 7.97 (m, 4 H
arom.); 6.78 (m, 4 H arom.); 4.20 (OH), 3.95 (m, 4 H, 2 Ph-OCH2); 1.73 (m, 4 H, Ph-OCH2-CH
); 1.49 (s, 12 H, 4 CH3); 0.48 (m, 4 H, 2 CH2-Si); 0.01 (m, 18 H, 6 Si-CH3). m/z (CI) :
631 (M+-18); 613 (M+-(2 x 18)); 221 (MH+).
H3C _ O CH3 /(CH2)3 O ~ ~ C-C-OH
Example 6: H3~-Si CH3 H3C-Si _ O CH3 H3~ ~(CH2)3 O ~ ~ C-C-OH
(n = 2; x = 1; m, p = 0; R,, A,, A2, R,3, R,4 = CH3; Y = -(CH2)3-O-; X = OH) The compound of Example 6 is prepared according to the method described in Example 1, using 2 molar equivalents of 2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone and 1 molar equivalent of 1,1,3,3-tetramethyldisiloxane. According to the'H-NMR spectrum, approximately 50% of the 2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone (starting material, "sm") remain unreacted.
U.V. (CH3CN) max. at 274 (s 32 443). 'H-NMR (CDCI3) 8 [ppm]: 8.19 (m, 2 H
arom. sm);
7.97 (m, 4 H arom.); 6.78 (m, 4 H arom.); 5.99 (m, 1 H allyl sm); 5.31 (m; 2 H
allyl sm); 4.41 (m, 2 H allyl sm); 4.20 (br. s, OH); 3.95 (m, 4 H, 2 Ph-OCH2); 1.80 (m, 4 H, 2 Ph-OCH2-CHz);
1.56 (s, 12 H, 4 CH3); 0.56 (m, 4 H, 2 CH2-Si); 0.01 (m, 12 H, 4 Si-CH3). m/z (CI) : 707 (MH+);
575 (MH+); 533 (MH+); 491 (MH+); 221 (MH+); 181 (MH+). Title product: M = 574 H3C _ O CH CH CH
II I 3 I 3 ~ 3 _ O ~rHg /(CHz)3 O ~ ~ C-C-O-Si-O-Si-H H3 ~ ~O ~ ~ C-C-OH
I
H3C-Si _ O CH3 H3C-Si _ O CH3 H3C ~(CHZ)3 O ~ ~ C-C-OH H C ~(CHZ)3 O ~ ~ C-C-OH
M = 7O6 CH3 M = 532 CH3 _ O CH3 H3 ~ /O ~ ~ C-C-OH
H3C-Si CH3 o , M = 220 and M = 180 cf. Example 1.
I
H3C-Si _ O CH3 H3C ~ O ~ ~ C-C-OH
M = 490 HO-CH CI ~ ~ O
CH3 ICH2)s HsC_ ~ i-Ow CHs O ~ H3 Example 7: CH3 O~ S~-(CH2r0 ~ ~ C-C-OH
HO-C-C ~ ~ O-(CHZ)3-Si~O-Si-OCH CH3 H3C O CH3 ~ 3 ~ CH3 (CH2)3 O ~ ~ C-C-OH
(n = 4; x = 1; m, p = 0; A~+A2 = single bond; R,, R,3, R~4 = CH3; Y = -(CHZ)3-O-; X = OH) The compound of Example 7 is prepared according to the method described in Example 1, using 4 molar equivalents of 2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone and 1 molar equivalent of 2,4,6,8-tetramethylcyclotetrasiloxane. According to the 'H-NMR
spectrum, after the reaction the mixture still contains approximately 36 % 2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone (starting material, "sm").
U.V. (CH3CN) max. at 274 (~ 58 856). 'H-NMR (CDCI3) 8 [ppm]: 7.90 (m, 8 H
atom.); 6.77 (m, 8 H atom.); 5.9 (m, 1 H allyl sm); 5.25 (m, 2 H allyl sm); 4.41 (m, 2 H
allyl sm); 4.10 (m, OH); 3.90 (m, 8 H, 4 Ph-OCH2); 1.71 (m, 8 H, 4 Ph-OCH2-CHz); 1.47 (s, 24 H, 8 CH3); 0.54 (m, 8 H, 4 CH2-Si); 0.01 (m, 12 H, 4 Si-CH3). '3C-NMR (CDC13) 8 [ppm]: 202.5 (CO); 162.9, 162.5, 160.8 (Carom-O)~ 132.3-114.0 (atom.); 75.9 (C(CH3)20H); 70.2 (CH2-O-Ph); 28.6 (CH3);
22.7 (CH2-CH2-O-Ph); 13.0 (CH2-Si); -0.7 (CH3-Si); m/z (CI): 1121 (MH+); 943 (MH+); 901 (MH+); m/z 221 (MH+);
Title product: M = 1120 R~
I
H C-Si-O CH3 _ O CH3 43~~ S~-R2 ; R'=R2=R3= -(CH2)3 ~ ~ ~ C-C-OH ~ R4 = H; M = 900 R-Sip ~O CH3 O-Si-CH3 HO-CH3CI / \ O
CH3 ICHz)s H3C-Si-O~ CH3 CH p Si-(CH2)2CH3 HO-,C 3C ~ ~ O-(CHZ)3-SiwO-Si OCH
H3C O CH3 ~ 3 - ~ CH3 M = 942 (CH2)3 O ~ ~ C-C-OH
HO- ~(CHZ)3O ~ / O- ~HOH
O-(CH
) i -Si ~ /
Z
O
~ p CH
Example 8: CH3 H CH 3 C''S~ 1 CH
3 / p 3 _ CH
II\(CH
) ~ H3 ~l H' O 3 O ~ ~ C
i~-C z ~
~ -OH
O ~ i"_CH3O CH CH3 HO- i -C ~ / O'_-(CHz)3 CH3 (CHZ)3~~~ ~~ ~ _..
(n = 5; x = 1; m, p = 0; A~+A2= single bond; R~, R,3, R~4 = CH3; Y = -(CH2)3-O-; X = OH) The compound of Example 8 is obtained according to the method described in Example 1, using 5 molar equivalents of 2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone and 1 molar equivalent of 2,4,6,8,10-pentamethylcyclopentasiloxane.
U.V. (CH3CN) max. at 275 (s 61 882). 'H-NMR (CDCIg) 8 [ppm]: 7.87 (m, 10 H
arom.); 6.72 (m; 10 H arom.); 4.10 (m, OH); 3.7 (m, 10 H, 5 Ph-OCH2); 1.7-0.8 (m, 40 H, 5 Ph-OCH2-CHz and 10 CH3); 0.5 (m, 10 H, 5 CH2-Si); 0.01 (m, 15 H, 5 Si-CH3). m/z (CI) :
1401 (MH+); 1181 (MH+); 960 (MH+); 221 (MH+).
Title compound M = 1400 R' ~Si ~~R _ O CH
R~~i .o~Si.O R~ = R2 = R3 = R4 = -(CH2)3 0 \ / C-C-off , Rs = H, M = 1180;
CH
/SI~O SI~Ois3W
R 4~ R
_ O CH3 R' = R2 = R3 = -(cH2)3 0 ~ ~ c-c-off , R4 = R5 = H, M = 960; M = 220, cf.
Example 1.
CH3 i H3 i H3 CH3 i H3 O CH3 Example 9: H3C- i i-O Si-O i i-O i i-O i i-CH3 IN = -(CH2)3 O ~ / C-C-OH
n m P
(n = 0.8; m - 0.4; p = 23.75; x = 1; R,, R2, R3, Ra, R5, Rs, R~, R8, Rs, Rlo, R,s, R,a = CHs;
Y = -(CH2)3-O-; X = OH) The compound of Example 9 is obtained according to the method described in Example 1, using 29 molar equivalents of 2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone and 1 molar equivalent of methylhydrosiloxane / dimethylsiloxane copolymer having 6-7 mol % methylhydrosiloxane groups and a molecular weight of from 1900 to (HMS 071, Gelest, DE).
According to the'H-NMR spectrum, the product still contains approximately 33 %
2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone (starting material "sm"). The 'H-NMR
spectrum also shows that the content of methylhydrosiloxane groups is 5 %, of which 67 ' have been substituted by a photoinitiator group (IN), that is to say n =
0.83, m = 0.41, p =
23.75.
'H-NMR (CDCI3) 8 [ppm]: 7.94 (m, H arom.); 6.85 (m, H arom.); 5.95 (m, H allyl sm); 5.28 (m, H allyl sm); 4.52 (m, H allyl sm); 4.24 (m, OH); 3.90 (m, Ph-OCH2); 1.76 (m, Ph-OCH2-CHz); 1.55 (s, CH3); 0.56 (m, CH2-Si); 0.01 (m, Si-CH3). '3C-NMR (CDC13) : 202 (CO); 163 (Carom'); 132.3-114.0 Carom.); 70.5 (C(CH3)20H); 68.9 (CH2-O-Ph); 28.7 (CH3);
22.8 (CH2-CH2-O-Ph); 13.3 (CH2-Si); 1.1, 1.0, 0.8 (CH3-Si).
i H3 CHs i Ha CHa i H3 _ O CH
Example 10: H3c-si-o si-o i i-o i i-o si-cH3 IN = -(cH2)3 0 ~ / c-c-off n m P
The compound of Example 10 is prepared analogously to the method described in Exam-ple 1, using 1 molar equivalent (based on the Si-H groups) of 2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone and 1 molar equivalent of methylhydrosiloxane I dimethyl-siloxane copolymer with 1.78 mmollg(resin) of methylhydrosiloxane groups (VXL
Fluid, Witco).
'H-NMR (CDCI3) 8 [ppm]: 7.95 (m, H arom.); 6.8 (m, H arom.); 4.25 (m, OH); 3.9 (m, Ph-OCH2); 1.75 (m, Ph-OCH2-Cue); 1.5 (s, CH3); 0.55 (m, CH2-Si); 0.01 (m, Si-CH3).
I H3 CH3 ~ H3 ~ H3 CHs ~O CH3 Example 11: H3c-si-o si-o i i-o i ~-o si-cH3 IN = -(cH2>3 0 ~ / c-c-off n m P
The compound of Example 11 is prepared according to the method described in Example 1, using 1 molar equivalent (based on the Si-H groups) of 2-hydroxy-2-methyl-1-[4-(2-propenyl-oxy)phenyl]-1-propanone and 1 molar equivalent of methylhydrosiloxane/dimethylsiloxane copolymer with 7.05 mmol/g(resin) of methylhydrosiloxane groups (Y 12183, Witco).
'H-NMR (CDCI3) 8 [ppm]: 7.9 (m, H arom.); 6.75 (m, H arom.); 4.15 (m, OH);
3.85 (m, Ph-OCH2); 1.75 (m, Ph-OCH2-CHz); 1.45 (br. s, CH3); 0.55 (m, CH2-Si); 0.01 (m, Si-CH3).
i H3 ~ H3 i H3 ~ H3 ~ H3 _ O CH3 Example 12: H3c- ~ i-o s~-o i i-o i i-o si-cH3 IN = --ccH2>3 0 ~ / c-c-off n m P
The compound of Example 12 is prepared as described in Example 1, using 1 molar equiva-lent (based on Si-H groups) of 2-hydroxy-2-methyl-1-(4-(2-propenyloxy)phenyl]-1-propanone and 1 molar equivalent of methylhydrosiloxane/dimethylsiloxane copolymer with 15.62 mmollg(resin) of methylhydrosiloxane groups (Fluid L31, Witco).
According to the'H-NMR spectrum, the product still contains approximately 33 %
2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone ( starting material "sm").
'H-NMR (CDC13) 8 [ppm]: 7.94 (m, H arom.); 6.85 (m, H arom.); 5.95 (m, H ally) sm); 5.25 (m, H allyl sm); 4.52 (m, H allyl sm); 4.22 (m, OH); 3.90 (m, Ph-OCH2); 1.65 (m, Ph-OCH2-CH ); 1.55 (s, CH3); 0.6 (m, CH2-Si); 0.01 (m, Si-CH3).
H3C-Si-CH3 C-C-OH
Example 13: H3C-Si-H~(CHZ)2 0 2 ~ ~ CH
H3C-Si-CH3 The compound of Example 13 is prepared according to the process described in Example 1, using 1 molar equivalent of 1-[4-(2-allyloxy-ethoxy)-phenyl]-2-hydroxy-2-methyl-propan-1-one and 1 molar equivalent of 1,1,1,3,5,5,5-heptamethyltrisiloxane.
U.V. (CH3CN) max. at 273 nm (E 13 811).'H-NMR (CDCI3): 7.96 (m, 2 H, arom.);
6.87 (m, 2 H, arom.); 4.38 (OH); 4.09 (m, 2 H, Ph-OCH2); 3.71 (m, 2 H, Ph-O(CH2)2-O-CH
); 3.40 (m, 2 H, Ph-OCH2C~); 1.53 (m, 2 H, Ph-O(CH2)2-OCH2-CH ); 1.53 (s, 6 H, 2 CH3);
0.38 (m, 2 H, CH2-Si); 0.01 (m, 21 H, 7 Si-CH3). mlz (EI and CI) : 486 (M+); according to the MS spectrum, small amounts of the following compounds are also present: 486 (M+) (second signal); 442 (M+); 264 (M+)(2 signals); 246 (M+); 238 (M+). The values M = 264 (second signal) and 238 are assigned to different siloxane chains.
CHs CHs HsC~Si-CHs HsC-Si-CHs _ O CHs O O H
HZC=C-C-O-C-C-O ~ / C-C-O-Si-CHs H3C-Si-O-C-C? _ O CHs H Hz Hz Hz CHs O ~ Hz O ~ / C-C-OH
i M = 486 HsC,Si-CHs HsC-Sip CHs (second signal) CHs CH3CHs M = 442 /~_ O CHs _ O CHz H C=C-C-O-C-C-O-( C-C-OH H C=C-C-O-C-C-O~C-C
z H Hz Hz Hz ~~/ CH z H Hz Hz Hz ~ / CHs M=264 M=246 CHs CHs H3C-Si-CHs H3C-Si-CHs i O _ O CHs O
i Example 14: H3C-Si-H-~(CHz)z-O 2 ~ / C-C-O-(CHz)3 Si-CH3 p z CHs O
H C-Si-CH
H3Cr-SI-CH3 3 ~ 3 CH3 CHs The compound of Example 14 is prepared as described in Example 1, using 1 molar equiva-lent of 2-allyloxy-1-[4-(2-allyloxy-ethoxy)-phenyl]-2-methyl-propan-1-one and 2 molar equivalents of 1,1,1,3,5,5,5-heptamethyltrisiloxane.
U.V. (CH3CN) max. at 276 nm (E 11 693). 'H-NMR (CDCI3): 8.24 (m, 2 H, arom.);
5.94 (m, 2 H, arom.); 4.09 (m, 2 H, Ph-OCH2); 3.71 (m, 2 H, Ph-O(CH2)2-O-CH ); 3.40 (m, 2 H, Ph-OCH2C~); 3.13 (m, 2 H, C(CH3)2-OCHz); 1.54 (m, 4 H, Ph-O(CH2)2-OCH2-CH and C(CH3)2-OCH2-CH ); 1.42 (s, 6 H, 2 CH3); 0.38 (m, 4 H, 2 CH2-Si); 0.01 (m, 42 H, 14 Si-CH3). m/z (EI
and CI) : 748 (M+); according to the MS spectrum, small amounts of compounds of 528 (M+);
and 486 (M+) are also present.
H3C-Si-CH3 H3C-Si-CH3 _ O O CH
H3C-O-(CH2)3-O-(CHz)2-O ~ ~ OC CHOC3H~ H3C-Si-(CHZ)3 O-(CH2)2 O ~ ~ C-C-OH
H C-Si-CH H3C-Si-CH3 M = 486 3 CH 3 M = 528 CHs H3C-Si-CH3 _ O CH3~--~
Example 15: H3C-O-(CHZ)3 O ~ ~ C Chi H3C-Si-CH3 The compound of Example 15 is prepared according to the method described in Example 1, using 1 molar equivalent of 1-(4-allyloxy-phenyl)-2-methyl-2-morpholin-4-yl-propan-1-one and 1 molar equivalent of 1,1,1,3,5,5,5-heptamethyltrisiloxane.
U.V. (CH3CN) max. at 273 nm (E 15 248). 'H-NMR (CDC13): 8.47 (m, 2 H, arom.);
6.79 (m, 2 H, arom.); 4.09 (t, 2 H, Ph-OCH2, J = 6); 3.58 (m, 4 H, N=(CH2-CHz)2=O);
2.46 (m, 4 H, N=(CH -CH2)2=O); 1.73 (m, 2 H, Ph-O-CH2CH2); 1.21 (s, 6 H, 2 CH3); 0.49 (m, 2 H, CH2-Si);
0.01 (m, 21 H, 7 Si-CH3). m/z (EI and CI) : 512 (MH+); according to the MS
spectrum, small amounts of compounds 512 (MH+)(second signal); 470 (MH+); and 265 (MH+) are also pres-ent. The value MH+ = 265 is assigned to a siloxane chain.
H3C-Si-CH3 H3C-Si-CH3 _ O CH ~ _ H3C Oi-H C CH2 O ~ ~ C-C- ~ H3C Oi O ~ ~ OC-C(HN~ O
O CHs V O, CH3 H3C-Si-CH3 H3C-Si-CH3 CH3 M = 512 (second signal) CH3 M = 470 CH3 CH3 _ O CH3 ~
Example 16: H3C-Si-O-Si-(CHZ)3 O ~ ~ C-C- V
The compound of Example 16 is prepared according to the method described in Example 1, using 1 molar equivalent of 1-(4-allyloxy-phenyl)-2-methyl-2-morpholin-4-yl-propan-1-one and 1 molar equivalent of 1,1,3,3,3-pentamethyldisiloxane.
U.V. (CH3CN) max. at 273 nm (s 14 281). 'H-NMR (CDCI3): 8.51 (m, 2 H, arom.);
6.79 (m, 2 H, arom.); 3.90 (t, 2 H, Ph-OCH2, J = 6); 3.60 (m, 4 H, N=(CH2-CH2)2=O);
2.48 (m, 4 H, N=(CHz-CH2)2=O); 1.77 (m, 2 H, Ph-O-CH2CH2); 1.23 (s, 6 H, 2 CH3); 0.56 (m, 2 H, CH2-Si);
0.01 (m, 15 H, 5 Si-CH3). m/z (EI and CI) : 438 (MH+) (CI); according to the MS spectrum, small amounts of compounds 396 (MH+); and 290 (MH+) are also present.
3 CH _ O CH ~ _ O CH3 H C SH O-Si 3 O C-C-N O H2C H-H-O ~ ~ C-C-N~ O
3 i CH3 CH3 CH3~ 2 CH3 M = 289 M = 395 H3C-Si-CH3 p - O CH3 Example 17: H3C-Si-(CH2)3 O-(CHZ)3 ~ ~ C-C-OH
O CHs H3C-Si'CH3 The compound of Example 17 is obtained according to the method described in Example 1, using 1 molar equivalent of 1-[4-(3-allyloxy-propyl)-phenyl]-2-hydroxy-2-methyl-propan-1-one and 1 molar equivalent of 1,1,1,3,5,5,5-heptamethyltrisiloxane.
U.V. (CH3CN) max. at 255 nm (s 13 289). 'H-NMR (CDC13): 7.89 (m, 2 H, arom.);
7.18 (m, 2 H, arom.); 3.30 (m, 4 H, Ph-(CH2)2-CH2-O-CH ); 2.63 (m, 2 H, Ph-CH2); 1.84 (m, 2 H, Ph-(CH2)3-O-CH2-CHz); 1.54 (s, 6 H, 2 CH3); 1.47 (m, 2 H, Ph-CH2-Cue); 0.38 (m, 2 H, CH2-Si);
0.01 (m, 21 H, 7 Si-CH3). m/z (EI and CI): 484 (M+); according to the mass spectrum, small amounts of 484 (M+) (second isomer); 338 (M+); 310 (M+ = 338 - 18); 262 (M+);
244 (M+ _ 262 - 18); 222 (M+); and 204 (M+ = 222 - 18) are also present.
Hs ~CH
CH3 O CH ~H - O CH3 H3C O~ H H O (CHZ)3 ~ / C CFiOH H3C-Si-(CH2)3 O-(CH2)3 ~ ~ C C OH
OH CHs H3C-~Si-CH3 M = 484 M = 338 _ O CH3 _ O CH
HZC=C-C-O-(CHZ)3 ~ ~ C-C-OH HO-(CH2)3 ~ ~ C-'C-OH
M = 262 M = 222 H3C-Si-CH3 H3C-Si-CHs p - O CH3 O
Example 18: H3C-Si-(CH2)3 O-(CH2)3 ~ ~ C C O (CH2)3 Si-CH3 O CHs O
H3C-$i'CHs H3C-Si-CH3 i The compound of Example 18 is prepared according to the method described in Example 1, using 1 molar equivalent of 2-allyloxy-1-[4-(3-allyloxy-propyl)-phenyl]-2-methyl-propan-1-one and 2 molar equivalents of 1,1,1,3,5,5,5-heptamethyltrisiloxane.
U.V. (CH3CN) max. at 256 nm (~ 9542).'H-NMR (CDC13): 8.14 (m, 2 H, arom.);
7.19 (m, 2 H, arom.); 3.30 (m, 4 H, Ph-(CH2)2-CH -O-CH2); 3.14 (m, 2 H, C(CH3)2-OCHz); 2.65 (m, 2 H, Ph-CH2); 1.82 (m, 2 H, Ph-(CH2)3-O-CH2-CH2); 1.48 (m, 2 H, C(CH3)2-OCH2-CH );
1.42 (s, 6 H, 2 CH3); 1.15 (m, 2H, Ph-CH2-CH ); 0.38 (m, 4 H, 2 CH2-Si); 0.01 (m, 42 H, 14 Si-CH3). m/z (EI
and CI) : 746 (M+); according to the MS spectrum, small amounts of compounds 484 (M+);
and 238 (M+) are also present. The value M = 238 is assigned to a siloxane chain.
H3C-Si-CH3 p _ p CH3 H3C-Si-(CH2)3 O-(CHZ)3 ~ ~ C-C-OH
O CHs HsC_Si.CHs CH3 M = 484 H3C-Si-CH3 p _ O CH3 Example 19: H3C-Si-(CHZ)3 O-(CH2)3 ~ ~ C-C-N O
HsC_$i.CHs The compound of Example 19 is prepared according to the method described in Example 1, using 1 molar equivalent of 1-[4-(3-allyloxy-propyl)-phenyl]-2-methyl-2-morpholin-4-yl-propan-1-one and 1 molar equivalent of 1,1,1,3,5,5,5-heptamethyltrisiloxane.
U.V. (CH3CN) max. at 253 nm (s 14 930). 'H-NMR (CDCI3): 8.38 (m, 2 H, arom.);
7.14 (m, 2 H, arom.); 3.60 (m, 4 H, N=(CH2-CHz)2=O); 3.30 (m, 4 H, Ph-(CH2)2-CH -O-CHI); 2.65 (t, 2 H, J = 6, Ph-CH2); 2.48 (m, 2 H, N=(CHz-CH2)2=O ); 1.83 (m, 2 H, Ph-CH2CHz);
1.51 (m, 2 H, Ph-(CH2)3-O-CH2-Cue); 1.21 (s, 6 H, 2 CH3); 0.38 (m, 2 H, CHZ-Si); 0.01 (m, 21 H, 7 Si-CH3). m/z (EI and CI) : 553 (M+); according to the mass spectrum, small amounts of the compounds of 333 (M+); 331 (M+); and 238 (M+) are also still present. The value M = 238 is assigned to a siloxane chain.
_ O CH3 ~ _ O CH3 ~--~
H~C3 O (CHZ)3 \ / C CHN~ HZC H H O (CHz)3 \ / C CH
M=333 M=331 H3C-Si-CH3 Examele 20: H3C OS~ i-(CH2)3 O-(CH2)Z O ~ / CO~
O HO
i H3C-Si-CH3 The compound of Example 20 is obtained according to the method described in Example 1, using 1 molar equivalent of [4-(2-allyloxy-ethoxy)-phenyl]-(1-hydroxy-cyclohexyl)-methanone and 1 molar equivalent of 1,1,1,3,5,5,5-heptamethyltrisiloxane.
U.V. (CH3CN) max. at 274 nm (>r 11 211). 'H-NMR (CDC13): 8.01 (m, 2 H, arom.);
6.87 (m, 2 H, arom.); 4.07 (m, 2 H, Ph-OCH2); 3.71 (m, 2 H, Ph-O(CH2)2-O-CH ); 3.40 (m, 2 H, Ph-OCH2CH2); 1.95 (m, 2 H, Ph-O-(CH2)2-OCH2-CH2); 1.68-1.20 {m, 11 H, -C6H»);
0.38 (m, 2 H, CHZ-Si); 0.01 (m, 21 H, 7 Si-CH3). m/z (EI and CI) : 526 (M+); according to the mass spec-trum, small amounts of the compounds 304 (M+)(2 signals); 264 (M+) and 238 (M+) are also present. The values M = 264 and 238 are assigned to siloxane chains.
_ o /~ ~ z)z HZC=C-C-O-(CH2)2 O ~ / C~ HO CH -O \ /
H HZ HO~ ~ .,O
M = 304 M = 304 HzC-H~H2 Example 21: Curing of a UV-curable clear lacquer A UV-curable clear lacquer is prepared by mixing the following components:
50.0 parts of a difunctional urethane acrylate (RT""Actylan 200, Akcros) 25.0 parts tripropylene glycol diacrylate (SR 306, Cray Valley) 15.0 parts trimethylolpropane triacrylate (UCB) 10.0 parts dipentaerythritol pentaacrylate (SR 399, Cray Valley) 2 % of the photoinitiator from Example 1 are added to the mixture. The mixture is applied to a white chipboard panel and is cured using a UV processor below two 80 W/cm lamps at a band speed of 3 mlmin. A non-sticky cured film approximately 50 ~m thick is obtained.
30 minutes after curing, the pendulum hardness according to Konig (DIN 53157) is deter-mined in seconds. The higher the value, the greater is the hardness of the crosslinked sur-face. The static water contact angle (8) is also determined. For that purpose there is used a Kruss G10 contact angle measuring system. In that procedure, after the formulation has been cured, a drop of water is applied thereto. The contact angle is determined from the equilibrium of forces at the three-phase interface (airlwaterlcoating). A
computer program matches the profile of the lying drop of water to a general conic section equation. The differ-ential of the equation at the base line gives the slope at the three-phase contact point and thus the contact angle. The greater the contact angle measured, the better are the moisture-resistance and scratch-resistance of the cured surface. (The following publications give fur-ther explanation of the determination of contact angles: "Contact Angle, Wettability, and Ad-hesion", Advances in Chemistry Series 43, Am. Chem. Soc. 1964; Kruss User Manual, Drop Shape Analysis, Kruss GmbH, Hamburg 1997; G. Hirsch "Bestimmung der Oberflach-enspannung von Festkorpern aus Randwinkelmessungen and ihre Bedeutung bei Benetzungsproblemen" Chemie-Ing.-Techn 40.Jahrg. 1968, Volume 13, 639-645.) The pendulum hardness measured is 130 s; the contact angle B is 81 °.
Example 22: Curing of a UVlthermally curable system (Dual Cure) A "Dual-Cure" clear lacquer is prepared by mixing the following components:
21.1 parts of a hydroxy-functional polyacrylate (RT""Desmophen LS 2009/1, Bayer AG) 32.3 parts of a urethane acrylate based on isocyanurate in 80 % butyl acetate (RTnnRoskydal FWO 2518C, Bayer AG) 0.3 part flow improver in 10 % xylene (RT""Baysilone OL 17, Bayer AG) 0.3 part flow improver (Rr""Modaflow, Monsanto) 26.0 parts 1-methoxy-2-propanol (Fluka Chemicals) 0.5 part flow improver (RT""Byk 306, Byk-Chemie) 11.2 parts urethane acrylate containing isocyanate groups (RT""Roskydal FWO
2545 E, Bayer AG) To the resulting mixture there are added 2.635 % of the photoinitiator from Example 1, 0.375 bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide (RT""Irgacure 819, Ciba Specialty Chemicals), 1.5 % of a mixture of 2-[4-[(2-hydroxy-3-dodecyloxypropyl)oxy]-2-hydroxy phenyl]-4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine and 2-[4-[(2-hydroxy-3-tridecyloxy-propyl) oxy]-2-hydroxyphenyl]-4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine (RT""Tinuvin 400) and 1 % of a mixture of bis(1,2,2,6,6-pentamethyl-4-piperidinyl)sebacate and 1-(methyl)-8-(1,2,2,6,6-pentamethyl-4-piperidinyl)-sebacate (Rr""Tinuvin 292, Ciba Specialty Chemicals). The mix-ture is applied to a white-coated aluminium sheet, air-dried for 5 minutes at room tempera-ture and heated on a hotplate for 10 minutes at 80°C. The irradiation is carried out thereafter using a UV processor below two 120 W/cm lamps at a band speed of 5 m/min. A
non-sticky cured film approximately 40 ~m thick is obtained. 45 minutes after curing, the pendulum hardness according to Konig (DIN 53157) is determined in seconds. The higher the value, the greater is the hardness of the crosslinked surface. The static water contact angle (8) is also determined, as described in Example 13, using a Kruss G10 contact angle measuring system. The greater the contact angle measured, the better are the moisture-resistance and scratch-resistance of the cured surface. The pendulum hardness measured is 85 s; the contact angle 8 is 92°.
Example 23: Siloxane-containing photoinitiator as flow improver A formulation is prepared by mixing the following components:
57.0 parts of a hexa-functional aliphatic urethane acrylate (made by UCB) 13.0 parts hexanediol diacrylate (made by UCB) 2 % of the compound from Example 13 are dissolved in the formulation. The formulation is then applied using a 100 mm slotted knife to a chipboard panel coated with white primer and the contact angle of the coating relative to water is determined (for a description of contact angle measurement, see Example 21 ). For that purpose a drop of water of a specific volume is applied to the coated surface and the angle 8 of a tangent to the contact surface of the drop relative to the surface is measured using a special lens system and a computer pro-gram. The greater the contact angle, the better is the flow of the coating on the substrate in question (in this case a white chipboard panel), that is to say the lower is the surface tension.
The contact angle 8 for the present formulation is 51.56°.
928800.
Blocked isocyanates, as may also be used in component (C), are described, for example, in Organischer Metallschutz: Entwicklung and Anwendung von Beschichtungsstoffen, pages 159-160, Vincentz Verlag, Hanover (1993). These are compounds in which the highly reac-tive NCO group is "blocked" by reaction with specific radicals, for example primary alcohols, phenol, acetoacetic ester, ~-caprolactam, phthalimide, imidazole, oxime or amine. The blocked isocyanate is stable in liquid systems and also in the presence of hydroxy groups.
Upon heating, the blocking agent is removed again and the NCO group is freed.
1-Component (1 C) and 2-component (2C) systems may be used as component (C).
Exam-ples of such systems are described in Ullmann's Encyclopedia of Industrial Chemistry, Vol.
A18, Paints and Coatings, pages 404-407, VCH Verlagsgesellschaft mbH, Weinheim (1991 ).
It is possible to optimise the composition by specially adapting the formulation, for example by varying the binder/crosslinking agent ratio. Such measures will be known to the person skilled in the art of surface-coating technology.
In the curing process according to the invention, component (C) is preferably a mixture based on acrylate/melamine (and melamine derivates), 2-component polyurethane, 1-component polyurethane, 2-component epoxy/carboxy or 1-component epoxy/carboxy.
Mixtures of those systems are also possible, for example the addition of melamine (or de-rivatives thereof) to 1-component polyurethanes.
Component (C) is preferably a binder based on a polyacrylate with melamine or on a mela-mine derivative. Preference is also given to a system based on a polyacrylate andlor poly-ester polyol with an unblocked polyisocyanate or polyisocyanurate.
Component (C) may also comprise monomeric and/or oligomeric compounds having eth-ylenically unsaturated bonds (prepolymers) that additionally contain at least one or more OH, NH2, COOH, epoxy or NCO groups (= C1 ) that are capable of reaction with the binder and/or the crosslinking agent constituent of component (C). After application and thermal curing, the ethylenically unsaturated bonds are converted to a crosslinked, high molecular weight form by UV radiation. Examples of such components (C) are described, for example, in the above-mentioned publication, Ullmann's Encyclopedia of Industrial Chemistry, 5th Ed., Vol.
A18, pages 451-453, or by S. Urano, K. Aoki, N. Tsuboniva and R. Mizuguchi in Progress in Organic Coatings, 20 (1992), 471-486, or by H. Terashima and O. Isozaki in (6), 222.
(C1 ) may, for example, be an OH-group-containing unsaturated acrylate, for example hy-droxyethyl or hydroxybutyl acrylate or a glycidyl acrylate. Component (C1 ) may be of any desired structure (for example it may contain units of polyester, polyacrylate, polyether, etc..), provided that it contains an ethylenically unsaturated double bond and additionally free OH, COOH, NH2, epoxy or NCO groups.
(C1 ) may, for example, also be obtained by reacting an epoxy-functional oligomer with acrylic acid or methacrylic acid. A typical example of an OH-functional oligomer having vinylic dou-ble bonds is O IH OH
CH2=CH-C-OCH2 CH-CH2 O ~-~ C ~-~ O-CHz CH-CH20-C-CH=CHZ obtained by reaction of CH2=CHCOOH Wlth HZC CH-CHZ-O ~-~ CH3 ~-~ O-CHZ CHO\CH2 , Another possible method of preparing component (C1 ) is, for example, the reaction of an oli-gomer that contains only one epoxy group and has a free OH group at another position in the molecule.
The quantity ratio of components (A) to (C) in the UV- and thermally-crosslinking formula-tions is not critical. "Dual-cure" systems are known to the person skilled in the art, who will therefore be familiar with the optimum ratios of the UV- and thermally-crosslinkable compo-nents for a particular desired use. For example, compositions may contain components (A) and (C), for example, in a ratio of from 5:95 to 95:5, from 20:80 to 80:20 or from 30:70 to 70:30, for example from 40:60 to 60:40.
Examples of "dual-cure" systems, that is to say systems comprising both UV-curable and thermally curable components, can be found inter aiia in US 5 922 473, columns 6 to 10.
It is also possible to add solvent or water to the compositions used in the process according to the invention. If the compositions are used without solvent, they are, for example, powder coating formulations. Suitable solvents are solvents known to the person skilled in the art, especially those customary in surface-coating technology. Examples thereof are various or-ganic solvents, such as ketones, for example methyl ethyl ketone, cyclohexanone; aromatic hydrocarbons, for example toluene, xylene and tetramethylbenzene; glycol ethers, such as diethylene glycol monoethyl ether, dipropylene glycol diethyl ether; esters, for example ethyl acetate; aliphatic hydrocarbons, such as hexane, octane, decane; and petroleum solvents, for example petroleum ether.
The compounds and mixtures thereof according to the invention may also be used as free-radical photoinitiators or photoinitiating systems for radiation-curable powder coating compo-sitions. The powder coating compositions may be based on solid resins and monomers containing reactive double bonds, for example maleates, vinyl ethers, acrylates, acryl-amides and mixtures thereof. A free-radically UV-curable powder coating composition can be for-mulated by mixing unsaturated polyester resins with solid acrylamides (for example methyla-crylamidoglycolate methyl ester) and a free-radical photoinitiator according to the invention, as described, for example, in the presentation "Radiation Curing of Powder Coating", Con-ference Proceedings, Radtech Europe 1993 by M. Wittig and Th. Gohmann. Free-radically UV-curable powder coating compositions can also be formulated by mixing unsaturated polyester resins with solid acrylates, methacrylates or vinyl ethers and a photoinitiator (or photoinitiator mixture) according to the invention. The powder coating compositions may also comprise binders, as described, for example, in DE 4228514 and EP 636669.
The powder coating formulations described in EP 636669 comprise, for example, a) an unsaturated resin from the group of (semi)crystalline or amorphous unsaturated polyes-ters, unsaturated polyacrylates or mixtures thereof with unsaturated polyesters, special pref-erence being given to those derived from malefic acid or fumaric acid; b) an oligomeric or polymeric crosslinking agent having vinyl ether-, vinyl ester- or (meth)acrylate-functional groups, special preference being given to vinyl ether oligomers, such as divinyl-ether-functionalised urethanes; c) the photoinitiator.
The UV-curable powder coating compositions may also comprise white or coloured pig-ments. Thus, for example, especially rutile titanium dioxide can be used in concentrations of up to 50 % by weight in order to obtain a cured powder coating having good covering power.
The process normally comprises spraying the powder electrostatically or tribostatically onto the substrate, for example metal or wood, melting the powder by heating and, once a smooth film has been produced, radiation-curing the coating with ultraviolet and/or visible light, for example using medium-pressure mercury lamps, metal halide lamps or xenon lamps. A par-ticular advantage of radiation-curable powder coating compositions over corresponding thermally curable powder coating compositions is that the flow time after the powder particles have been melted can be prolonged as desired to ensure the formation of a smooth high-gloss coating. Unlike thermally curable systems, radiation-curable powder coating composi-tions can be so formulated that they melt at relatively low temperatures, without the undesir-able effect of their useful life being shortened. For that reason they are also suitable as coatings for heat-sensitive substrates, such as wood or plastics.
If the powder coating compositions are to be applied to substrates that are not heat-sensitive, for example to metals (automotive coatings), it is also possible to provide "dual cure" powder coating formulations using the photoinitiators according to the invention.
Such formulations are known to the person skilled in the art and are both thermally cured and UV-cured. Such formulations can be found, for example, in US 5 922 473.
The powder coating formulations may also comprise UV-absorbers in addition to the photo-initiators according to the invention. Suitable examples thereof are listed below.
The photopolymerisable mixtures may comprise various additives (D) in addition to the pho-toinitiator. Examples thereof are thermal inhibitors, the purpose of which is to prevent pre-mature polymerisation, for example hydroquinone, hydroquinone derivatives, p-methoxyphenol, [3-naphthol and sterically hindered phenols, for example 2,6-di(tert-butyl)-p-cresol. In order to increase stability to dark storage, it is possible, for example, to use copper compounds, such as copper naphthenate, stearate or octoate, phosphorus compounds, for example triphenylphosphine, tributylphosphine, triethyl phosphite, triphenyl phosphite or tribenzyl phosphite, quaternary ammonium compounds, for example tetramethylammonium chloride or trimethylbenzylammonium chloride, or hydroxylamine derivatives, for example N-i diethylhydroxylamine. In order to exclude atmospheric oxygen during polymerisation, it is possible to add paraffin or similar wax-like substances that, being insufficiently soluble in the polymer, migrate to the surface at the beginning of the polymerisation and form a transparent surface layer which prevents the ingress of air. Equally possible is the application of an oxy-gen-impermeable layer. UV-Absorbers, for example of the hydroxyphenyl-benzotriazole, hy-droxyphenyl-benzophenone, oxalic acid amide or hydroxyphenyl-s-triazine type, may be added as light stabilisers. Individual compounds or mixtures of those compounds may be used with or without the use of sterically hindered amines (HALS).
Examples of such UV-absorbers and light stabilisers are 1. 2-(2'-Hydroxyphenyl)benzotriazoles, for example 2-(2'-hydroxy-5'-methylphenyl)benzo-triazole, 2-(3',5'-di-tert-butyl-2'-hydroxyphenyl)benzotriazole, 2-(5'-tert-butyl-2'-hydroxy-phe-nyl)benzotriazole, 2-(2'-hydroxy-5'-(1,1,3,3-tetramethylbutyl)phenyl)benzotriazole, 2-(3',5'-di-tert-butyl-2'-hydroxyphenyl)-5-chloro-benzotriazole, 2-(3'-tert-butyl-2'-hydroxy-5'-methylphe-nyl)-5-chloro-benzotriazole, 2-(3'-sec-butyl-5'-tert-butyl-2'-hydroxyphenyl)benzo-triazole, 2-(2'-hydroxy-4'-octyloxyphenyl)benzotriazole, 2-(3',5'-di-tert-amyl-2'-hydroxy-phenyl)benzotri-azole, 2-(3',5'-bis-(a,a-dimethylbenzyl)-2'-hydroxyphenyl)benzotriazole, 2-(3'-tert-butyl-2'-hy-droxy-5'-(2-octyloxycarbonylethyl)phenyl)-5-chloro-benzotriazole, 2-(3'-tert-butyl-5'-[2-(2-eth-ylhexyloxy)-carbonylethyl]-2'-hydroxyphenyl)-5-chloro-benzotriazole, 2-(3'-tert-butyl-2'-hydr-oxy-5'-(2-methoxycarbonylethyl)phenyl)-5-chloro-benzotriazole, 2-(3'-tert-butyl-2'-hydroxy-5'-(2-methoxycarbonylethyl)phenyl)benzotriazole, 2-(3'-tert-butyl-2'-hydroxy-5'-(2-octyloxycarbo-nylethyl)phenyl)benzotriazole, 2-(3'-tert-butyl-5'-[2-(2-ethylhexyl-oxy)carbonylethyl]-2'-hydrox-yphenyl)benzotriazole, 2-(3'-dodecyl-2'-hydroxy-5'-methyl-phenyl)benzotriazole, 2-(3'-tert-bu-tyl-2'-hydroxy-5'-(2-isooctyloxycarbonylethyl)-phenyl-benzotriazole, 2,2'-methylene-bis[4-(1,-1,3,3-tetramethylbutyl)-6-benzotriazol-2-yl-phenol]; the transesterification product of 2-[3'-tert-butyl-5'-(2-methoxycarbonylethyl)-2'-hydroxyphenyl]-2H-benzotriazole with polyethylene gly-col 300; [R-CH2CH2-COO-CH2CH2]2- where R = 3'-tert-butyl-4'-hydroxy-5'-2H-benzotriazol-2-ylphenyl, 2-[2'-hydroxy-3'-(a,a-dimethylbenzyl)-5'-(1,1,3,3-tetramethylbutyl)-phenylJbenz-otriazole; 2-[2'-hydroxy-3'-(1,1,3,3-tetramethylbutyl)-5'-(a,a-dimethylbenzyl)-phenyl]benzotri-azole.
2. 2-Hydroxybenzophenones, for example the 4-hydroxy, 4-methoxy, 4-octyloxy, 4-decyloxy, 4-dodecyloxy, 4-benzyloxy, 4,2',4'-trihydroxy and 2'-hydroxy-4,4'-dimethoxy derivatives.
3. Esters of substituted and unsubstituted benzoic acids, as for example 4-tert-butyl-phenyl salicylate, phenyl salicylate, octylphenyl salicylate, dibenzoyl resorcinol, bis(4-tert-butylben-zoyl) resorcinol, benzoyl resorcinol, 2,4-di-tert-butylphenyl 3,5-di-tert-butyl-4-hydroxybenzo-ate, hexadecyl 3,5-di-tert-butyl-4-hydroxybenzoate, octadecyl 3,5-di-tert-butyl-4-hydroxyben-zoate, 2-methyl-4,6-di-tert-butylphenyl 3,5-di-tert-butyl-4-hydroxybenzoate.
4. Acrylates, for example ethyl a-cyano-[i,[3-diphenylacrylate, isooctyl a-cyano-[i,[i-diphenyl-acrylate, methyl a-methoxycarbonylcinnamate, methyl a-cyano-a-methyl-p-methoxy-cinna-mate, butyl a-cyano-[i-methyl-p-methoxy-cinnamate, methyl a-methoxycarbonyl-p-methoxy-cinnamate and N-([i-methoxycarbonyl-~-cyanovinyl)-2-methylindoline.
5. Sterically hindered amines, for example bis(2,2,6,6-tetramethyl-4-piperidyl)sebacate, bis-(2,2,6,6-tetramethyl-4-piperidyl)succinate, bis(1,2,2,6,6-pentamethyl-4-piperidyl)-sebacate, bis(1-octyloxy-2,2,6,6-tetramethyl-4-piperidyl)sebacate, bis(1,2,2,6,6-yenta-methyl-4-piperid-yl) n-butyl-3,5-di-tert-butyl-4-hydroxybenzylmalonate, the condensate of 1-(2-hydroxyethyl)-2,2,6,6-tetramethyl-4-hydroxypiperidine and succinic acid, linear or cyclic condensates of N,N'-bis(2,2,6,6-tetramethyl-4-piperidyl)hexamethylenediamine and 4-tert-octylamino-2,6-di-chloro-1,3,5-triazine, tris(2,2,6,6-tetramethyl-4-piperidyl)nitrilotriacetate, tetrakis(2,2,6,6-tetra-methyl-4-piperidyl)-1,2,3,4-butane-tetracarboxylate, 1,1'-(1,2-ethane-diyl)-bis(3,3,5,5-tetra-methylpiperazinone), 4-benzoyl-2,2,6,6-tetramethylpiperidine, 4-stearyl-oxy-2,2,6,6-tetrame-thylpiperidine, bis(1,2,2,6,6-pentamethylpiperidyl)-2-n-butyl-2-(2-hydroxy-3,5-di-tert-butylben-zyl)malonate, 3-n-octyl-7,7,9,9-tetramethyl-1,3,8-triazaspiro-[4.5]decane-2,4-dione, bis(1-oct-yloxy-2,2,6,6-tetramethylpiperidyl)sebacate, bis(1-octyloxy-2,2,6,6-tetramethylpiperidyl)suc-cinate, linear or cyclic condensates of N,N'-bis-(2,2,6,6-tetramethyl-4-piperidyl)hexamethyle-nediamine and 4-morpholino-2,6-dichloro-1,3,5-triazine, the condensate of 2-chloro-4,6-bis-(4-n-butylamino-2,2,6,6-tetramethylpiperidyl)-1,3,5-triazine and 1,2-bis(3-aminopropylamino)-ethane, the condensate of 2-chloro-4,6-di-(4-n-butylamino-1,2,2,6,6-pentamethylpiperidyl)-1,3,5-triazine and 1,2-bis(3-aminopropyl-amino)ethane, 8-acetyl-3-dodecyl-7,7,9,9-tetrame-thyl-1,3,8-triazaspiro[4.5]decane-2,4-dione, 3-dodecyl-1-(2,2,6,6-tetramethyl-4-piperidyl)pyr-rolidine-2,5-dione, 3-dodecyl-1-(1,2,2,6,6-pentamethyl-4-piperidyl)pyrrolidine-2,5-dione, a mixture of 4-hexadecyloxy- and 4-stearyloxy-2,2,6,6-tetramethylpiperidine, a condensation product of N,N'-bis(2,2,6,6-tetramethyl-4-piperidyl)hexamethylenediamine and 4-cyclohexyl-amino-2,6-dichloro-1,3,5-triazine, a condensation product of 1,2-bis(3-aminopropylamino)eth-ane and 2,4,6-trichloro-1,3,5-triazine as well as 4-butylamino-2,2,6,6-tetramethylpiperidine (CAS Reg. No. [136504-96-6]); N-(2,2,6,6-tetramethyl-4-piperidyl)-n-dodecylsuccinimide, N-(1,2,2,6,6-pentamethyl-4-piperidyl)-n-dodecylsuccinimide, 2-undecyl-7,7,9,9-tetramethyl-1-oxa-3,8-diaza-4-oxo-spiro(4,5]decane, a reaction product of 7,7,9,9-tetramethyl-2-cyclounde-cyl-1-oxa-3,8-diaza-4-oxospiro[4,5]decane and epichlorohydrin, 1,1-bis(1,2,2,6,6-pentame-thyl-4-piper-idyloxycarbonyl)-2-(4-methoxyphenyl)ethene, N,N'-bis-formyl-N,N'-bis(2,2,6,6-te-tra-methyl-4-piperidyl)hexamethylenediamine, diester of 4-methoxy-methylene-malonic acid with 1,2,2,6,6-pentamethyl-4-hydroxypiperidine, poly[methylpropyl-3-oxy-4-(2,2,6,6-tetrame-thyl-4-piperidyl)]siloxane, reaction product of malefic acid anhydride-a-olefin-copolymer with 2,2,6,6-tetramethyl-4-aminopiperidine or 1,2,2,6,6-pentamethyl-4-aminopiperidine.
6. Oxamides, for example 4,4'-dioctyloxyoxanilide, 2,2'-diethoxyoxanilide, 2,2'-dioctyloxy-5,5'-di-tert-butoxanilide, 2,2'-didodecyloxy-5,5'-di-tert-butoxanilide, 2-ethoxy-2'-ethyloxanilide, N,N'-bis(3-dimethylaminopropyl)oxamide, 2-ethoxy-5-tert-butyl-2'-ethoxanilide and its mixture with 2-ethoxy-2'-ethyl-5,4'-di-tert-butoxanilide, mixtures of o- and p-methoxy-disubstituted ox-anilides and mixtures of o- and p-ethoxy-disubstituted oxanilides.
7. 2-(2-Hydroxyphenyl)-1,3,5-triazines, for example 2,4,6-tris(2-hydroxy-4-octyloxyphenyl)-1,3,5-triazine, 2-(2-hydroxy-4-octyloxyphenyl)-4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine, 2-(2,4-dihydroxyphenyl)-4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine, 2,4-bis(2-hydroxy-4-propyl-oxyphenyl)-6-(2,4-dimethylphenyl)-1,3,5-triazine, 2-(2-hydroxy-4-octyloxyphenyl)-4,6-bis(4-methylphenyl)-1,3,5-triazine, 2-(2-hydroxy-4-dodecyloxyphenyl)-4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine, 2-(2-hydroxy-4-tridecyloxyphenyl)-4,6-bis{2,4-dimethylphenyl)-1,3,5-triazine, 2-(2-hydroxy-4-(2-hydroxy-3-butyloxy-propoxy)phenyl]-4,6-bis(2,4-dimethyl)-1,3,5-triazine, 2-[2-hydroxy-4-(2-hydroxy-3-octyloxy-propyloxy)phenyl]-4,6-bis(2,4-dimethyl)-1,3,5-triazine, 2-[4-(dodecyloxy/tridecyloxy-2-hydroxypropoxy)-2-hydroxy-phenyl]-4,6-bis(2,4-dimethyl-phenyl)-1,3,5-triazine, 2-[2-hydroxy-4-(2-hydroxy-3-dodecyloxy-propoxy)phenyl]-4,6-bis(2,4-dimethyl-phenyl)-1,3,5-triazine, 2-(2-hydroxy-4-hexyloxy)phenyl-4,6-diphenyl-1,3,5-triazine, 2-(2-hy-droxy-4-methoxyphenyl)-4,6-diphenyl-1,3,5-triazine, 2,4,6-tris[2-hydroxy-4-(3-butoxy-2-hy-droxy-propoxy)phenyl]-1,3,5-triazine, 2-(2-hydroxyphenyl)-4-(4-methoxyphenyl)-6-phenyl-1,3,5-triazine, 2-{2-hydroxy-4-[3-(2-ethylhexyl-1-oxy)-2-hydroxypropyloxy]phenyl}-4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine.
8. Phosphites and phosphonites, for example triphenyl phosphite, diphenyl alkyl phosphites, phenyl dialkyl phosphites, tris(nonylphenyl) phosphite, trilauryl phosphite, trioctadecyl phos-phate, distearyl pentaerythritol diphosphite, tris(2,4-di-tert-butylphenyl) phosphate, diisodecyl pentaerythritol diphosphite, bis(2,4-di-tert-butylphenyl) pentaerythritol diphosphite, bis(2,6-di-tert-butyl-4-methylphenyl)-pentaerythritol diphosphite, diisodecyloxypentaerythritol diphos-phite, bas(2,4-di-tert-butyl-6-methylphenyl)pentaerythritol diphosphite, bis(2,4,6-tris(tert-butyl-phenyl)pentaerythritol diphosphite, tristearyl sorbitol triphosphite, tetrakis(2,4-di-tert-butyl-phenyl) 4,4'-biphenylene diphosphonite, 6-isooctyloxy-2,4,8,10-tetra-tert-butyl-12H-dibenz-[d,g]-1,3,2-dioxaphosphocine, bas(2,4-di-tert-butyl-6-methylphenyl) methyl phosphate, bis(2,4-di-tert-butyl-6-methylphenyl) ethyl phosphate, 6-fluoro-2,4,8,10-tetra-tert-butyl-12-methyl-di-benz[d,g]-1,3,2-dioxaphosphocine, 2,2',2"-nitrilo[triethyltris(3,3',5,5'-tetra-tert-butyl-1,1'-biphe-nyl-2,2'-diyl)phosphite], 2-ethylhexyl(3,3',5,5'-tetra-tert-butyl-1,1'-biphenyl-2,2'-diyl)phosphite, 5-butyl-5-ethyl-2-(2,4,6-tri-tert-butylphenoxy)-1,3,2-dioxaphosphirane.
Additives customary in the art, such as antistatics, flow improvers, levelling agents and ad-hesion promoters, may also be used.
The photoinitiators of formula I provided with siloxane radicals can also serve as flow im-provers since they are oriented towards the surface and influence the surface properties by way of the siloxane radical. It is also possible to add further flow improvers customary in the art. Examples thereof are siloxane compounds and fluorohydrocarbon compounds, such as are widely available commercially.
The invention relates also to the use of compounds of formula I as flow improvers, optionally in combination with other customary flow improvers.
Flow is defined, according to DIN 55945, as "the ability, to a greater or lesser degree, of a still liquid paint to level out, by itself, any unevenness arising during its application" (see J.
Bielemann, Lackadditive, VCH Weinheim 1998, Chapter 6). The flow of a coating composi-tion is highly dependent upon its flow behaviour and its surface tension. The term "flow im-prover" is used to denote a substance that, by lowering the viscosity andlor the surface ten-sion, enables wet coatings to become evenly flowing films. In the case of powder coating compositions, flow improvers also lower the melt viscosity and the glass transition tempera-ture, and they also act as de-gassing agents. The use of flow improvers eliminates flow and surface faults that impair the overall appearance of the coating. Flow and surface faults in-clude, inter alia, orange peel effect, structure formation, scratching, fisheye formation, sensi-tivity to draught, substrate wetting problems, brush application marks, run formation, stip-pling, pinholes, etc.. The use of the compounds according to the invention as flow improvers enables the surface tension to be lowered. The surface tension can be calculated by deter-mining the wetting angle of a drop of liquid on a surface (contact angle measurement).
In order to accelerate the photopolymerisation it is possible to add as further additives (D) amines, for example triethanolamine, N-methyl-diethanolamine, p-dimethylaminobenzoic acid ethyl ester or Michler's ketone. The action of the amines can be enhanced by the addi-tion of aromatic ketones of the benzophenone type. Amines that can be used as oxygen capture agents are, for example, substituted N,N-dialkylanilines, as described in EP 339841.
Further accelerators, co-initiators and auto-oxidizers are thiols, thin ethers, disulfides and phosphines, as described, for example, in EP 438123 and GB 2180358.
It is also possible to add to the compositions according to the invention chain-transfer rea-gents customary in the art, examples of which are mercaptans, amines and benzothiazole.
Photopolymerisation can also be accelerated by adding as further additives (D) photosensi-tisers that shift or broaden the spectral sensitivity. These include especially aromatic car-bonyl compounds, such as benzophenone and thioxanthone, especially also isopropylthiox-anthone, anthraquinone and 3-acylcoumarin derivatives, terphenyls, styryl ketones, and 3-(aroylmethylene)-thiazolines, camphorquinone, and also eosin, rhodamine and erythrosine dyes.
The above-mentioned amines may, for example, also be regarded as photosensitisers.
The curing process, especially in the case of pigmented compositions (for example composi-tions pigmented with titanium dioxide) may also be assisted by the use of an additional addi-tive (D) that is a component that forms free radicals under thermal conditions, for example an azo compound, such as 2,2'-azobis(4-methoxy-2,4-dimethylvaleronitrile), a triazene, diazo-sulfide, pentaazadiene or a peroxy compound, such as a hydrogen peroxide or peroxycar-bonate, for example tert-butyl hydroperoxide, as described, for example, in EP
245639.
The compositions may also comprise as further additives (D), for example, a photoreducible dye, for example xanthene, benzoxanthene, benzothioxanthene, thiazine, pyronine, porphy-rin or acridine dyes, andlor a radiation-cleavable trihalomethyl compound.
Similar composi-tions are described, for example, in EP 445624.
Further customary additives (D) are - depending upon the intended use -optical brighteners, fillers, for example kaolin, talcum, barytes, gypsum, chalk or silicate-like fillers, pigments, dyes, wetting agents and flow improvers.
For the curing of thick and pigmented coatings it is suitable to add glass microbeads or pul-verised glass fibres, as described, for example, in US 5013768.
The formulations may also comprise colourants and/or white or coloured pigments. De-pending upon the intended use, both inorganic and organic pigments may be used. Such additives are known to the person skilled in the art; some examples thereof are titanium di-oxide pigments, for example of the rutile or anatase type, carbon black, zinc oxide, such as zinc white, iron oxides, such as iron oxide yellow, iron oxide red, chromium yellow, chromium green, nickel titanium yellow, ultramarine blue, cobalt blue, bismuth vanadate, cadmium yel-low and cadmium red. Examples of organic pigments are mono- and bis-azo pigments, and metal complexes thereof, phthalocyanine pigments, polycyclic pigments, such as perylene, anthraquinone, thioindigo, quinacridone and triphenylmethane pigments, and diketo-pyrrolo-pyrrole, isoindolinone, for example tetrachloroisoindolinone, isoindoline, dioxazine, benzimi-dazolone and quinophthalone pigments.
The pigments may be used individually or in admixture in the formulations.
Depending upon the intended use, the pigments are added to the formulations in amounts customary in the art, for example in an amount of from 1 to 60 % by weight, or from 10 to 30 by weight, based on the total weight.
The formulations may, for example, also comprise organic colourants of a wide variety of classes, examples of which are azo dyes, methine dyes, anthraquinone dyes and metal complex dyes. Customary concentrations are, for example, from 0.1 to 20 %, especially from 1 to 5 %, based on the total weight.
The choice of additives will depend upon the field of use in question and upon the properties desired for that field. The additives (D) described above are customary in the art and are ac-cordingly used in amounts customary in the art.
In certain cases it may be advantageous to use mixtures of two or more of the photoinitiators of formula I; for example it is advantageous to use mixtures formed directly during prepara-tion. It is, of course, also possible to use mixtures with known photoinitiators (E), for example mixtures with camphorquinone, benzophenone, benzophenone derivatives, acetophenone, acetophenone derivatives, such as a-hydroxycycloalkylphenylketones or 2-hydroxy-2-methyl-1-phenyl-propanone, dialkoxyacetophenones, a-hydroxy- or a-amino-acetophenones, for ex-ample (4-methylthiobenzoyl)-1-methyl-1-morpholino-ethane, (4-morpholino-benzoyl)-1-benzyl-1-dimethylamino-propane, 4-aroyl-1,3-dioxolanes, benzoin alkyl ethers and benzil ketals, for example benzil dimethyl ketal, phenyl glyoxalates and derivatives thereof, dimeric phenyl glyoxalates, peresters, for example benzophenone tetracarboxylic acid peresters, as described, for example, in EP 126541, monoacylphosphine oxides, for example (2,4,6-trimethylbenzoyl)-phenyl-phosphine oxide, bisacylphosphine oxides, for example bis(2,6-dimethoxybenzoyl)-(2,4,4-trimethyl-pent-1-yl)phosphine oxide, bis(2,4,6-trimethyibenzoyl)-phenyl-phosphine oxide or bis(2,4,6-trimethylbenzoyl)-(2,4-dipentoxyphenyl)phosphine ox-ide, trisacylphosphine oxides, halomethyltriazines, for example 2-[2-(4-methoxy-phenyl)-vinyl]-4,6-bis-trichloromethyl-[1,3,5]triazine, 2-(4-methoxy-phenyl)-4,6-bis-trichloromethyl-[1,3,5]triazine, 2-(3,4-dimethoxy-phenyl)-4,6-bis-trichloro-methyl-[1,3,5]triazine, 2-methyl-4,6-bis-trichloromethyl-[1,3,5]triazine, hexaarylbisimidazole/co-initiator systems, for example or-tho-chlorohexaphenyl-bisimidazole together with 2-mercaptobenzothiazole, ferrocenium compounds or titanocenes, for example dicyclopentadienyl-bis(2,6-difluoro-3-pyrrolo-phenyl)titanium or borate photoinitiators.
When the photoinitiators according to the invention are used in hybrid systems, that is to say in systems that are both free-radically and cationically curable, in addition to the free-radical hardeners of formula I and optionally further free-radical hardeners there are used cationic photoinitiators, for example benzoyl peroxide (other suitable peroxides are described in US 4950581, column 19, lines 17-25), aromatic sulfonium, phosphonium or iodonium salts, as described, for example, in US 4950581, column 18, line 60 to column 19, line 10.
The photopolymerisable compositions contain the photoinitiator advantageously in an amount of from 0.05 to 15 % by weight, preferably from 0.1 to 5 % by weight, based on the composition. The amount of photoinitiator indicated relates to the sum of all the photoinitia-tors added when mixtures thereof are used, that is to say either to the photoinitiator (B) or to the photoinitiators (B) + (E).
The photopolymerisable compositions may be used for a variety of purposes, for example as printing inks, as clear lacquer, as white surface-coating compositions, as colour-pigmented surface-coating compositions, for example for wood or metal, as powder coating composi-tions, as paint, inter alia, for paper, wood, metal or plastics, as daylight-curable paint for marking structures and roads, for photographic reproduction processes, for holographic re-cording materials, for image recording processes or for the production of printing plates that are to be developed with organic solvents or using aqueous/alkaline media, in the production of masks for screen-printing, as dental filling compounds, as adhesives, as pressure-sensitive adhesives, as laminating resins, as etch resists or permanent resists, liquid films and dry films, as photostructurable dielectrics, and as solder masks for electronic circuits, as resists in the manufacture of colour filters for any type of screen or for producing structures in the manufacturing process of plasma displays and electroluminescent displays, in the manufacture of optical switches, optical gratings (interference gratings), in the manufacture of three-dimensional articles by means of bulk curing (UV-curing in transparent moulds) or using the stereolithography process, as described, for example, in US 4575330, in the manufacture of composites (e.g. styrene polyesters that may optionally include glass fibres andlor other fibres and other adjuvants) and other thick-layered compositions, in the coating or sealing of electronic components or as coatings for optical fibres. The compositions are also suitable for the manufacture of optical lenses, for example contact lenses or Fresnel lenses, and also in the manufacture of medical apparatus, aids or implants.
The compositions can also be used in the manufacture of gels having thermotropic proper-ties, as described, for example, in DE 19700064 and EP 678 534.
The compounds of formula I can also be used as initiators for emulsion, bead or suspension polymerisations or as initiators of a polymerisation for fixing the orientation states of liquid crystalline monomers and oligomers, and as initiators for fixing dyes on organic materials.
The photocurable compositions according to the invention are suitable, for example, as coating materials for all kinds of substrates, for example wood, textiles, paper, ceramics, glass, plastics, such as polyesters, polyethylene terephthalate, polyolefins or cellulose ace-tate, especially in the form of films, and metals such as AI, Cu, Ni, Fe, Zn, Mg or Co and GaAs, Si or Si02, to which a protective layer is to be applied or an image is to be applied by image-wise exposure.
The coating of the substrates can be effected by applying a liquid composition, a solution or suspension to the substrate. The choice of solvent and the concentration are governed chiefly by the nature of the composition and by the coating method. The solvent should be inert, that is to say it should not enter into any chemical reaction with the components and it should be capable of being removed again upon drying after the coating operation. Exam-ples of suitable solvents are ketones, ethers and esters, such as methyl ethyl ketone, isobu-tyl methyl ketone, cyclopentanone, cyclohexanone, N-methylpyrrolidone, dioxane, tetrahy-drofuran, 2-methoxyethanol, 2-ethoxyethanol, 1-methoxy-2-propanol, 1,2-dimethoxyethane, ethyl acetate, n-butyl acetate and ethyl 3-ethoxy-propionate.
The formulation is applied uniformly to a substrate by known coating methods, for example by spin-coating, immersion, knife coating, curtain pouring, brush application or spraying, es-pecially by electrostatic spraying and reverse-roll coating, and by electrophoretic deposition.
It is also possible to apply the photosensitive layer to a temporary flexible support and then coat the final substrate by transferring the layer by lamination.
The amount applied (layer thickness) and the type of substrate (layer support) are dependent upon the desired field of use. The dry layer thickness range generally includes values from about 0.1 pm to more than 100 p.m, preferably from 0.02 to 2 cm.
A further field of use for photocuring is in metal coating, for example in the surface-coating of metal sheets and tubes, cans or bottle closures, and photocuring on plastics coatings, for example of PVC-based floor or wall coverings.
Examples of photocuring of paper coatings are the application of a colourless surface-coating to labels, record sleeves or book covers.
The photosensitivity of the compositions according to the invention generally ranges from about 200 nm to about 600 nm (UV field). Suitable radiation is present, for example, in sun-light or light from artificial light sources. Accordingly, a large number of widely varying types of light sources may be used. Point sources and also planiform radiators (lamp carpets) are suitable. Examples thereof include: carbon arc lamps, xenon arc lamps, medium-, high- and low-pressure mercury arc lamps, doped where appropriate with metal halides (metal halide lamps), microwave-excited metal vapour lamps, excimer lamps, superactinic fluorescent tubes, fluorescent lamps, argon incandescent lamps, flashlamps, photographic flood lights, light-emitting diodes (LED), electron beams and X-rays. The distance between the lamp and the substrate to be irradiated can vary according to the intended use and upon the type and strength of the lamp, and may be, for example, from 2 cm to 150 cm. Laser light sources, for example excimer lasers, such as Krypton F lasers for irradiation at 248 nm, are especially suitable. Lasers in the visible range can also be used.
As already mentioned, in the process according to the invention curing can be effected solely by irradiation with electromagnetic radiation, but, depending upon the composition of the formulation to be cured, thermal curing before, during or after the irradiation is advantageous.
The thermal curing is carried out according to methods known to the person skilled in the art.
Curing is generally carried out in an oven, for example a circulating-air oven, on a hotplate or by irradiation with IR lamps. Curing at room temperature without aids is also possible, de-pending upon the binder system used. The curing temperatures are generally from room temperature to 150°C, for example from 25°C to 150°C or from 50°C to 150°C. In the case of powder coating compositions or "coil coat" surface-coatings, the curing temperatures may even be higher, for example up to 350°C.
According to the invention, when the formulation comprises thermally curable components (C) it is also possible to add thermal drying or curing catalysts as additional additives (D) to the formulation. Examples of possible drying catalysts, or thermal curing catalysts, are or-ganic metal compounds, amines and/or phosphines. Organic metal compounds are, for ex-ample, metal carboxylates, especially those of the metals Pb, Mn, Co, Zn, Zr or Cu, or metal chelates, especially those of the metals AI, Ti or Zr, or organometal compounds, for example organotin compounds. Examples of metal carboxylates are the stearates of Pb, Mn or Zn, the octoates of Co, Zn or Cu, the naphthenates of Mn and Co or the corresponding linoleates or tallates. Examples of metal chelates are the aluminium, titanium or zirconium chelates of acetylacetone, ethyl acetylacetate, salicylaldehyde, salicylaldoxime, o-hydroxyacetophenone or ethyl trifluoroacetylacetate and the alkoxides of those metals. Examples of organotin compounds are dibutyltin oxide, dibutyltin dilaurate and dibutyltin dioctoate.
Examples of amines are especially tertiary amines, for example tributylamine, triethanolamine, N-methyl-diethanolamine, N-dimethylethanolamine, N-ethylmorpholine, N-methylmorpholine or diaza-bicyclooctane (triethylenediamine) and salts thereof. Further examples are quaternary am-monium salts, for example trimethylbenzylammonium chloride. Phosphines, for example triphenylphosphine, can also be used as curing catalyst. Suitable catalysts are also de-scribed, for example, in J. Bielemann, Lackadditive, Wiley-VCH Verlag GmbH, Weinheim, 1998, pages 244-247. Examples thereof are carboxylic acids, such as p-toluenesulfonic acid, dodecylbenzenesulfonic acid, dinonylnaphthalenesulfonic acid and dinonylnaphthale-nedisulfonic acid. Latent or blocked sulfonic acids may, for example, also be used, it being possible for the blocking of the acid to be ionic or non-ionic.
Such catalysts are used in concentrations customary in the art and known to the person skilled in the art.
The invention relates also to a process for the photopolymerisation of non-volatile mono-meric, oligomeric or polymeric compounds having at least one ethylenically unsaturated dou-ble bond, in which process a composition as described above is irradiated with electromag-netic radiation in the range of from 200 nm to 600 nm.
The invention relates also to the use of the above-described composition and to a process for the preparation of pigmented and non-pigmented surface-coatings, powder coating com-positions, composites and glass fibre cable coatings.
The invention relates also to a coated substrate that is coated on at least one surface with a composition as described above.
The following Examples illustrate the invention further, but it is not intended to limit the inven-tion to the Examples. As in the remainder of the description and in the claims, unless other-wise indicated, parts and percentages relate to weight. Where mention is made of alkyl radi-cals having more than three carbon atoms without reference to the isomer, it is always the n-isomers that are intended.
Example A: Preparation of the photoinitiator unit A-1: Preparation of phenyl isobutyrate ~~'C~H cHs ii O
In a flask equipped with a thermometer, cooling device and dropping funnel, 176.6 g of phe-nol are cooled to 5°C under nitrogen. Over the course of 40 minutes, 250 g of iso-butylic acid chloride are added dropwise, and the solution is stirred at 5°C
for one hour. The tem-perature is increased to room temperature and stirring is continued for 2 hours. The mixture is distilled (bp = 95-100°C (20 mbar)) and 298 g of the pure product are obtained (97 %).
'H-NMR (CDC13) [ppm]: 7.39 (m, 2 H arom.); 7.22 (m, 1 H arom.); 7.10 (m, 2 H
arom.); 3.54 (q x q, J = 6.99, 1 H); 1.33 (d, J = 7.00, 6 H, 2 CH3).
_ CH3 A-2: Preparation of 1-(4-hydroxyphenyl)-2-methyl-1-propanone Ho ~ / ~ H'cH
In a flask equipped with a thermometer, cooling device and dropping funnel, 580.8 g of alu-minium chloride are added to 1 litre of chlorobenzene at 0-5°C under nitrogen. The mixture is stirred at room temperature for 45 minutes. 298 g of the product prepared as described in A.1 are added dropwise over the course of 45 minutes, the temperature being maintained at 20-25°C. The resulting suspension is stirred at room temperature for 2 days. The mixture is poured into a mixture of ice (3 kg) and hydrochloric acid (450 ml) and extracted with toluene.
The organic phases are washed with salt water. After drying over MgS04 and filtration, the solvent is removed in vacuo. 1 litre of water is added to the residue, and the pH value of the solution is raised to 14 with 30 % sodium hydroxide solution, whilst maintaining the tem-perature at 20°C. The solution is extracted with ethyl acetate. The aqueous phase is cooled to 0°C and the pH value is adjusted to 0 with concentrated hydrochloric acid, the organic phase is dried over MgS04 and filtered and the solvent is removed in vacuo, resulting in a liquid which solidifies in a freezer. The pure product is obtained in the form of a white solid (213 g, 71 %).
'H-NMR (CDC13) [ppm]: 7.90 (m, 2 H arom.); 6.94 (m, 2 H arom.); 3.54 (q x q, J
= 6.84, 1 H);
1.20 (d, J = 6.82, 6 H, 2 CH3).
A-3: Preparation of 2-hydroxy-1-(4-hydroxy- o cH3 phenyl)-2-methyl-1-propanone Ho / ~ c~-~-off A solution of 213 g of the product prepared in A.2 in 475 ml of dioxane is cooled to 0°C.
228 g of bromine are added dropwise over the course of one hour, whilst maintaining the temperature at 10-15°C. The orange-coloured mixture is stirred at room temperature for 2 hours. The solution is poured into water (5.4 litres) and extracted with ethyl acetate. After drying the organic phases over MgSOa and filtering, the solvent is removed in vacuo, result-ing in a brown oil. 3 litres of water are added to the oil, and the beige-coloured emulsion that forms is treated with 650 g of 30 % sodium hydroxide solution. The mixture is stirred at room temperature for 3 hours. 293 ml of concentrated HCI are then added to adjust the pH value of the solution to 7. The resulting white suspension is stirred at 0°C
for 4 hours and at room temperature overnight. The mixture is then cooled to 5°C and filtered.
The crystals are washed with water and dried in vacuo at 40°C. Initially 137.8 g are obtained in the form of dirty-white crystals. A further 47.8 g of a contaminated compound are obtained from the ex-tracted mother liquor. Both products are purified in toluene and 135 g (58 %) of pure product and 27 g (12 %) of a product that is not quite pure are isolated.
'H-NMR (DMSOds) [ppm]: 10.23 (s, OH); 8.12 (m, 2 H arom.); 6.79 (m, 2 H
arom.); 5.59 (s, OH); 1.37 (s, 6 H, 2 CH3). Microanalysis: calc.: C 66.65; H 6.71; found: C
65.60; H 6.52.
A_4: Preparation of 2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone (A4a) and 2-methyl-2-(2-propenyloxy)-1-[4-(2-propenyloxy)phenyl]-1-propanone (A4b) O CHs H2C=C-C-O ~ ~ C-C-OH (A4a) HZC C C-O ~ ~ CI-C-O-H-H CH2 (A4b) H H2 CH3 z A solution of 75 g of the compound prepared as described in A.3 in 300 ml of dimethyl sul-foxide (DMSO) is added over the course of one hour, at room temperature under argon, to a suspension of NaH (20 g; 55-60 % in oil) in 950 ml of DMSO. The solution is stirred for 15 minutes at room temperature and for a further 15 minutes at 35-40°C.
A solution of 38.7 ml of allyl bromide in 75 ml of DMSO is added over the course of 15 minutes and the resulting mixture is heated at 45°C for 30 minutes. The orange-coloured mixture is poured into an ice/water mixture (2.5 litres) and extracted with tert-butyl methyl ether. The organic phases are washed with water and dried over magnesium sulphate. Filtration, removal of the solvent by evaporation and chromatography (eluant hexane/ethyl acetate 5:1 to 4:1 ) yield 2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone (53 g, 58 %) in the form of a slightly yellowish solid and 2-methyl-2-(2-propenyloxy)-1-[4-(2-propenyloxy)phenyl]-1-propanone (17.6 g; 16 %) in the form of an oil.
A4a: 2-Hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone:
U.V. (CH3CN) max. at 273 nm (e 16 482). IR (KBr film, cm-'): 3452 (OH); 1663 (CO). 'H-NMR (CDCI3) [ppm]: 8.02 (m, 2 H arom.); 6.92 (m, 2 H arom.); 6.01 (m, 1 H, allyl); 5.37 (m, 2 H, allyl); 4.60 (m, 2 H, CH2-O); 4.28 (s, OH); 1.62 (s, 6 H, 2 CH3). '3C-NMR
(CDCI3) [ppm]:
162.5 (Carom-); 132.5 (CH allyl); 132.4 Carom.); 118.3 (CH2 allyl); 114.4 Carom.); 75.8 (C(CH3)20H); 69.0 (CH2-O-Ph); 28.8 (CH3). Microanalysis: calc.: C 70.89; H
7.32; found:
C 70.86; H 7.42 A4b: 2-Methyl-2-(2-propenyloxy)-1-[4-(2-propenyloxy)phenyl]-1-propanone U.V. (CH3CN) max. at 275 nm (e 16 467). 'H-NMR (CDC13) [ppm]: 8.30 (m, 2 H
arom.); 6.92 (m, 2 H arom.); 6.05 (m, 1 H, allyl); 5.80 (m, 1 H, allyl); 5.45-5.08 (m, 4 H, allyl); 4.60 (m, 2 H, CH2-O); 3.82 (m, 2 H, CH2-O); 1.54 (s, 6 H, 2 CH3).
C CI C
Example B: Preparation of a catalyst ~ \ ~C' Pt C
CI
A mixture of 20 ml of freshly distilled styrene and 1 g of platinum(II) chloride is stirred at room temperature for 40 hours. The orange-coloured suspension is filtered and the resulting solid is washed with toluene and hexane.
'H-NMR (DMSO-ds) : 7.35 (m, 5 H arom.); 6.72 (dd, J = 10.9, J = 17.6, 1 H, Ph-CH); 5.81 (d, J = 17.6, 1 H); 5.25 (d, J = 10.8, 1 H). Microanalysis: calc: C 40.52; H 3.40;
found: C 40.45;
H 3.03.
H3C-Si-CH3 0 _ ~ CH3 Example 1: H3C-Si--{CH2)3 O ~ ~ C-C-OH
H3C-Si-CH3 (n = 1, m = p = 0, x = 1, R, ~ R5~ Rs, R~, Rs, Rs~ R,o, R~s~ R,a = CH3, Y = -(CH2)s-O-~ x = OH) A mixture of one equivalent of 2-hydroxy-2-methyl-1-(4-(2-propenyloxy)phenyl]-1-propanone and one equivalent of 1,1,1,3,5,5,5-heptamethyltrisiloxane in toluene is heated at 90°C for 18 hours in the presence of 0.012 equivalent (120 ppm, based on the Pt content) of a Pt catalyst supported by aluminium oxide. The mixture is then filtered and the resulting solution is treated with activated carbon. Filtration and removal of the solvent by evaporation yield the compound quantitatively in the form of an oil.
U.V. (CH3CN) max. at 274 nm (E 16 299). ~ H-NMR (CDCI3) b [ppm]: 8.02 (m, 2 H, ArH); 6.94 (m, 2 H, ArH); 4.30 (s, OH); 3.99 (m, 2 H, Ph-OCHZ); 1.83 (m, 2 H, Ph-OCH2-CHz); 1.59 (s, 6 H, 2 CH3); 0.58 (m, 2 H, CHZ-Si); 0.05 (s, 21 H, 7 Si-CH3). m/z (EI) 427 (M+-15); according to the mass spectrum, small amounts of further compounds are also present: 647 (M+-15);
605 (M+-15); 385 (M+-15); 220 {M+); 180 (M+).
Title product M = 442 CH3 i Hs CH3 H3C-Si-CH3 CH3 H3C-Si-CH3 H3C-O -CH3 O CH3 Ip H3C-Si-CH3 p CH O
~I I I ~ ~I) I 3 I
H3C-Si-(CHZ)3 O ~ ~ C-C-O-Si-CH3 ~ H3C-O -O ~ / C-CH O-Si-CH3 s M = 662 CH3 O H3C-Si-CH3 3 O
H C Si-CH H3C=Si-CH3 CH M = 620 HsC-Si-CH3 H C-Si-CH
O CHa O GHa CH3 _ _ H3C-Si-O ~ ~ C-C-OH , HZC=H-H-O ~ / C-C-OH ~ HO ~ / C-C-OH
4 CH3 2 CHs M = 180 CH3 H3C-Si-CH3 M = 400 M = 220 A sample is purified by flash chromatography and a product of M = 442 and 85 %
purity (determined by gas chromatography) is obtained. Impurity remains as a result of the product of M = 400.
U.V. (CH3CN) max. at 274 nm (s 16 761 ).
H3C-Si-CH3 H3C-Si-CH3 Example 2: H3C-Si-(CH2)3 O ~ ~ C-C-O-(CH2)3 Si-CH3 H3C-Si-CH3 H3C-Si-CH3 (x = 2; n = 1; m, p = 0; R,, Rs, Rs, R~, t'~s, Rs, Rio, Ris, R,4 = CH3; Y, X~
_ -(CH2)a-O-) The compound of Example 2 is prepared according to the method described in Example 1, using 1 molar equivalent of 2-methyl-2-(2-propenyloxy)-1-[4-(2-propenyloxy)phenyl]-1-propanone and 2 molar equivalents of 1,1,1,3,5,5,5-heptamethyltrisiloxane.
U.V. (CH3CN) max. at 275 nm (E 14 666). 1 H-NMR (CDCI3) 8 [ppm]: 8.30 (m, 2 H, arom.);
6.87 (m, 2 H, arom.); 3.98 (m, 2 H, Ph-OCHZ); 3.23 (m, 2 H, Ph-C(O)-C(CH3)2-OCH ); 1.80 (m, 2 H, Ph-OCH2-Cue); 1.54 (m, 2 H, Ph-C(O)-C(CH3)2-O-CH2-CHz); 1.50 (s, 6 H, 2 CH3);
0.60 (m, 2 H, CH2-Si); 0.34 (m, 2 H, CHz-Si); 0.10 (m, 42 H, 14 Si-CH3). mlz (CI) : 705 {MH+);
according to the mass spectrum, small amounts of further compounds are also present: 663 (MH+); 621 (MH+); 443 (MH+); 401 (MH+); 459 (MH+); 265 (MH+); 239 (MH+).
M = 662, M = 620, M = 442, M = 400 cf. the structures shown in Example 1. The values MH+
= 459, 265 and 239 are to be assigned to different siloxane chains.
CH3 CH3 CH3 ~ ~ ~ Hs Example 3: H C-Si-O-Si-O-Si-(CH ) O ~ ~ C-C-OH
3 CH3 CH3 CH3 z 3 CH
(x, n, p = 1; m = 0~ R,, A,, Rs, R4, Rs, Rs, Rio, R,3, R,4 = CH3; Y = -(CH2)s-O-~ X = OH) The compound of Example 3 is obtained according to the method described in Example 1, reacting 1 molar equivalent of 2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone and 1 molar equivalent of 1,1,3,3,5,5,5-heptamethyltrisiloxane.
U.V. (CH3CN) max. at 274 nm (E 24 989). 'H-NMR (CDCI3) 8 [ppm]: 7.94 (m, 2 H
atom.);
6.81 (m, 2 H atom.); 4.34 (OH); 3.91 (m, 2 H, Ph-OCH2); 1.80 (m, 2 H, Ph-OCH2-CHz); 1.55 (s, 6 H, 2 CH3); 0.57 (m, 2 H, CH2-Si); 0.01 (m, 21 H, 7 Si-CH3). m/z (EI) (%
ratio determined ' by GC-MS): 663 (MH+)(18 %); 443 (MH+)(57 %); 441 (MH+)(3 %); 401 (MH+)(3 %);
221 (MH+)(8); 181 (MH+)(8 %).
Title product M = 442 CH CH CH _ O CH3 CH3 CH3 CH3 3 ~ 3 ~ 3 ~~ i ~ I
H3C-Si-O-Si-O-Si-(CH2)3 O ~ ~ C-C-O-$i-O-Si-O-Si-CH3 CH3 CH3 CH3 CHs ICH3 CH3 CH3 M = 662 H2C H H2 O ~ ~ C) CH O $i O Si-O- ~ i-CH3 , M = 440 3 'CH3 CH3 CH3 CH3 CH3 CH3 ~ ~ i H3 H3c-~Si-o-si-o-si-o ~ / c-c-off , M = 220 and M = 180 cf. Example 1.
M = 400 A sample is purified by flash chromatography and the pure product of M = 442 is isolated.
U.V. (CH3CN) max. at 274 nm (e 27 180).
H3C-Si-CH3 _ O CH
~ /(CH2)3 O ~ ~ C-C-OH
H3C-Si CH
Example 4: 0 H3C-Si - O CH3 O \ (CH2)3 O ~ ~ C-C-OH
H3C-Si-CH3 CH3 (n = 2~ x = 1 ~ m, p = 0; R,, Rs, Rs, R~, Ra, Rs, R,o, R,s, R,a = CH3; Y = -(CH2)s-O-; X = OH) A mixture of 2 molar equivalents of 2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone and 1 molar equivalent of 1,1,1,3,5,7,7,7-octamethyltetrasiloxane in 50 ml of tolu-ene is heated for 18 hours at 60°C in the presence of 0.01 equivalent of a styrene/platinum dichloride complex (prepared as described in Example B). A further 0.1 equivalent of the catalyst is added, and the mixture is heated again for 22 hours. Filtration is then carried out over diatomaceous earth ("Celite"). Removal of the solvent by evaporation yields a brown t oil, which is taken up in ethyl acetate and treated with activated carbon.
Filtration and re-moval of the solvent by evaporation yield the desired product in a quantitative yield in the form of a yellow oil.
U.V. (CH3CN) max. at 274 (E 22 657). 'H-NMR (CDC13) 8 [ppm]: 7.91 (m, 4 H
arom.); 6.83 (m, 4 H arom.); 4.21-3.85 (m, 4 H, 2 Ph-OCH2); 1.76 (m, 4 H, 2 Ph-OCH2-CHz);
1.52 (br. s, 12 H, 4 CH3); 0.95 (m, 2 H, CH2-Si); 0.55 (m, 2 H, CH2-Si); 0.01 (m, 24 H, 8 Si-CH3). mlz (EI) 707 (M+-15); 221 (MH+). Title product: M = 722; M = 220 cf. Example 1.
_ O CH3 H3C-SH3 (CHZ)3 O ~ ~ C-C-OH
O CHs Example 5: H3C-Si-CH3 O _ O CH3 H3C-Si-(CH2)3 O ~ ~ C-C-OH
(n = 2; p, x = 1; m = 0; R~, Rs, Rc, A,, A2, R,s, R,4 = CH3; Y = -(CH2)s-O-; X
= OH) The compound of Example 5 is obtained according to the method described in Example 1, using 2 molar equivalents of 2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone and 1 molar equivalent of 1,1,3,3,5,5-hexamethyltrisiloxane.
U.V. (CH3CN) max. at 274 (e 25 286). 'H-NMR (CDC13), 8 [ppm]: 7.97 (m, 4 H
arom.); 6.78 (m, 4 H arom.); 4.20 (OH), 3.95 (m, 4 H, 2 Ph-OCH2); 1.73 (m, 4 H, Ph-OCH2-CH
); 1.49 (s, 12 H, 4 CH3); 0.48 (m, 4 H, 2 CH2-Si); 0.01 (m, 18 H, 6 Si-CH3). m/z (CI) :
631 (M+-18); 613 (M+-(2 x 18)); 221 (MH+).
H3C _ O CH3 /(CH2)3 O ~ ~ C-C-OH
Example 6: H3~-Si CH3 H3C-Si _ O CH3 H3~ ~(CH2)3 O ~ ~ C-C-OH
(n = 2; x = 1; m, p = 0; R,, A,, A2, R,3, R,4 = CH3; Y = -(CH2)3-O-; X = OH) The compound of Example 6 is prepared according to the method described in Example 1, using 2 molar equivalents of 2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone and 1 molar equivalent of 1,1,3,3-tetramethyldisiloxane. According to the'H-NMR spectrum, approximately 50% of the 2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone (starting material, "sm") remain unreacted.
U.V. (CH3CN) max. at 274 (s 32 443). 'H-NMR (CDCI3) 8 [ppm]: 8.19 (m, 2 H
arom. sm);
7.97 (m, 4 H arom.); 6.78 (m, 4 H arom.); 5.99 (m, 1 H allyl sm); 5.31 (m; 2 H
allyl sm); 4.41 (m, 2 H allyl sm); 4.20 (br. s, OH); 3.95 (m, 4 H, 2 Ph-OCH2); 1.80 (m, 4 H, 2 Ph-OCH2-CHz);
1.56 (s, 12 H, 4 CH3); 0.56 (m, 4 H, 2 CH2-Si); 0.01 (m, 12 H, 4 Si-CH3). m/z (CI) : 707 (MH+);
575 (MH+); 533 (MH+); 491 (MH+); 221 (MH+); 181 (MH+). Title product: M = 574 H3C _ O CH CH CH
II I 3 I 3 ~ 3 _ O ~rHg /(CHz)3 O ~ ~ C-C-O-Si-O-Si-H H3 ~ ~O ~ ~ C-C-OH
I
H3C-Si _ O CH3 H3C-Si _ O CH3 H3C ~(CHZ)3 O ~ ~ C-C-OH H C ~(CHZ)3 O ~ ~ C-C-OH
M = 7O6 CH3 M = 532 CH3 _ O CH3 H3 ~ /O ~ ~ C-C-OH
H3C-Si CH3 o , M = 220 and M = 180 cf. Example 1.
I
H3C-Si _ O CH3 H3C ~ O ~ ~ C-C-OH
M = 490 HO-CH CI ~ ~ O
CH3 ICH2)s HsC_ ~ i-Ow CHs O ~ H3 Example 7: CH3 O~ S~-(CH2r0 ~ ~ C-C-OH
HO-C-C ~ ~ O-(CHZ)3-Si~O-Si-OCH CH3 H3C O CH3 ~ 3 ~ CH3 (CH2)3 O ~ ~ C-C-OH
(n = 4; x = 1; m, p = 0; A~+A2 = single bond; R,, R,3, R~4 = CH3; Y = -(CHZ)3-O-; X = OH) The compound of Example 7 is prepared according to the method described in Example 1, using 4 molar equivalents of 2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone and 1 molar equivalent of 2,4,6,8-tetramethylcyclotetrasiloxane. According to the 'H-NMR
spectrum, after the reaction the mixture still contains approximately 36 % 2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone (starting material, "sm").
U.V. (CH3CN) max. at 274 (~ 58 856). 'H-NMR (CDCI3) 8 [ppm]: 7.90 (m, 8 H
atom.); 6.77 (m, 8 H atom.); 5.9 (m, 1 H allyl sm); 5.25 (m, 2 H allyl sm); 4.41 (m, 2 H
allyl sm); 4.10 (m, OH); 3.90 (m, 8 H, 4 Ph-OCH2); 1.71 (m, 8 H, 4 Ph-OCH2-CHz); 1.47 (s, 24 H, 8 CH3); 0.54 (m, 8 H, 4 CH2-Si); 0.01 (m, 12 H, 4 Si-CH3). '3C-NMR (CDC13) 8 [ppm]: 202.5 (CO); 162.9, 162.5, 160.8 (Carom-O)~ 132.3-114.0 (atom.); 75.9 (C(CH3)20H); 70.2 (CH2-O-Ph); 28.6 (CH3);
22.7 (CH2-CH2-O-Ph); 13.0 (CH2-Si); -0.7 (CH3-Si); m/z (CI): 1121 (MH+); 943 (MH+); 901 (MH+); m/z 221 (MH+);
Title product: M = 1120 R~
I
H C-Si-O CH3 _ O CH3 43~~ S~-R2 ; R'=R2=R3= -(CH2)3 ~ ~ ~ C-C-OH ~ R4 = H; M = 900 R-Sip ~O CH3 O-Si-CH3 HO-CH3CI / \ O
CH3 ICHz)s H3C-Si-O~ CH3 CH p Si-(CH2)2CH3 HO-,C 3C ~ ~ O-(CHZ)3-SiwO-Si OCH
H3C O CH3 ~ 3 - ~ CH3 M = 942 (CH2)3 O ~ ~ C-C-OH
HO- ~(CHZ)3O ~ / O- ~HOH
O-(CH
) i -Si ~ /
Z
O
~ p CH
Example 8: CH3 H CH 3 C''S~ 1 CH
3 / p 3 _ CH
II\(CH
) ~ H3 ~l H' O 3 O ~ ~ C
i~-C z ~
~ -OH
O ~ i"_CH3O CH CH3 HO- i -C ~ / O'_-(CHz)3 CH3 (CHZ)3~~~ ~~ ~ _..
(n = 5; x = 1; m, p = 0; A~+A2= single bond; R~, R,3, R~4 = CH3; Y = -(CH2)3-O-; X = OH) The compound of Example 8 is obtained according to the method described in Example 1, using 5 molar equivalents of 2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone and 1 molar equivalent of 2,4,6,8,10-pentamethylcyclopentasiloxane.
U.V. (CH3CN) max. at 275 (s 61 882). 'H-NMR (CDCIg) 8 [ppm]: 7.87 (m, 10 H
arom.); 6.72 (m; 10 H arom.); 4.10 (m, OH); 3.7 (m, 10 H, 5 Ph-OCH2); 1.7-0.8 (m, 40 H, 5 Ph-OCH2-CHz and 10 CH3); 0.5 (m, 10 H, 5 CH2-Si); 0.01 (m, 15 H, 5 Si-CH3). m/z (CI) :
1401 (MH+); 1181 (MH+); 960 (MH+); 221 (MH+).
Title compound M = 1400 R' ~Si ~~R _ O CH
R~~i .o~Si.O R~ = R2 = R3 = R4 = -(CH2)3 0 \ / C-C-off , Rs = H, M = 1180;
CH
/SI~O SI~Ois3W
R 4~ R
_ O CH3 R' = R2 = R3 = -(cH2)3 0 ~ ~ c-c-off , R4 = R5 = H, M = 960; M = 220, cf.
Example 1.
CH3 i H3 i H3 CH3 i H3 O CH3 Example 9: H3C- i i-O Si-O i i-O i i-O i i-CH3 IN = -(CH2)3 O ~ / C-C-OH
n m P
(n = 0.8; m - 0.4; p = 23.75; x = 1; R,, R2, R3, Ra, R5, Rs, R~, R8, Rs, Rlo, R,s, R,a = CHs;
Y = -(CH2)3-O-; X = OH) The compound of Example 9 is obtained according to the method described in Example 1, using 29 molar equivalents of 2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone and 1 molar equivalent of methylhydrosiloxane / dimethylsiloxane copolymer having 6-7 mol % methylhydrosiloxane groups and a molecular weight of from 1900 to (HMS 071, Gelest, DE).
According to the'H-NMR spectrum, the product still contains approximately 33 %
2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone (starting material "sm"). The 'H-NMR
spectrum also shows that the content of methylhydrosiloxane groups is 5 %, of which 67 ' have been substituted by a photoinitiator group (IN), that is to say n =
0.83, m = 0.41, p =
23.75.
'H-NMR (CDCI3) 8 [ppm]: 7.94 (m, H arom.); 6.85 (m, H arom.); 5.95 (m, H allyl sm); 5.28 (m, H allyl sm); 4.52 (m, H allyl sm); 4.24 (m, OH); 3.90 (m, Ph-OCH2); 1.76 (m, Ph-OCH2-CHz); 1.55 (s, CH3); 0.56 (m, CH2-Si); 0.01 (m, Si-CH3). '3C-NMR (CDC13) : 202 (CO); 163 (Carom'); 132.3-114.0 Carom.); 70.5 (C(CH3)20H); 68.9 (CH2-O-Ph); 28.7 (CH3);
22.8 (CH2-CH2-O-Ph); 13.3 (CH2-Si); 1.1, 1.0, 0.8 (CH3-Si).
i H3 CHs i Ha CHa i H3 _ O CH
Example 10: H3c-si-o si-o i i-o i i-o si-cH3 IN = -(cH2)3 0 ~ / c-c-off n m P
The compound of Example 10 is prepared analogously to the method described in Exam-ple 1, using 1 molar equivalent (based on the Si-H groups) of 2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone and 1 molar equivalent of methylhydrosiloxane I dimethyl-siloxane copolymer with 1.78 mmollg(resin) of methylhydrosiloxane groups (VXL
Fluid, Witco).
'H-NMR (CDCI3) 8 [ppm]: 7.95 (m, H arom.); 6.8 (m, H arom.); 4.25 (m, OH); 3.9 (m, Ph-OCH2); 1.75 (m, Ph-OCH2-Cue); 1.5 (s, CH3); 0.55 (m, CH2-Si); 0.01 (m, Si-CH3).
I H3 CH3 ~ H3 ~ H3 CHs ~O CH3 Example 11: H3c-si-o si-o i i-o i ~-o si-cH3 IN = -(cH2>3 0 ~ / c-c-off n m P
The compound of Example 11 is prepared according to the method described in Example 1, using 1 molar equivalent (based on the Si-H groups) of 2-hydroxy-2-methyl-1-[4-(2-propenyl-oxy)phenyl]-1-propanone and 1 molar equivalent of methylhydrosiloxane/dimethylsiloxane copolymer with 7.05 mmol/g(resin) of methylhydrosiloxane groups (Y 12183, Witco).
'H-NMR (CDCI3) 8 [ppm]: 7.9 (m, H arom.); 6.75 (m, H arom.); 4.15 (m, OH);
3.85 (m, Ph-OCH2); 1.75 (m, Ph-OCH2-CHz); 1.45 (br. s, CH3); 0.55 (m, CH2-Si); 0.01 (m, Si-CH3).
i H3 ~ H3 i H3 ~ H3 ~ H3 _ O CH3 Example 12: H3c- ~ i-o s~-o i i-o i i-o si-cH3 IN = --ccH2>3 0 ~ / c-c-off n m P
The compound of Example 12 is prepared as described in Example 1, using 1 molar equiva-lent (based on Si-H groups) of 2-hydroxy-2-methyl-1-(4-(2-propenyloxy)phenyl]-1-propanone and 1 molar equivalent of methylhydrosiloxane/dimethylsiloxane copolymer with 15.62 mmollg(resin) of methylhydrosiloxane groups (Fluid L31, Witco).
According to the'H-NMR spectrum, the product still contains approximately 33 %
2-hydroxy-2-methyl-1-[4-(2-propenyloxy)phenyl]-1-propanone ( starting material "sm").
'H-NMR (CDC13) 8 [ppm]: 7.94 (m, H arom.); 6.85 (m, H arom.); 5.95 (m, H ally) sm); 5.25 (m, H allyl sm); 4.52 (m, H allyl sm); 4.22 (m, OH); 3.90 (m, Ph-OCH2); 1.65 (m, Ph-OCH2-CH ); 1.55 (s, CH3); 0.6 (m, CH2-Si); 0.01 (m, Si-CH3).
H3C-Si-CH3 C-C-OH
Example 13: H3C-Si-H~(CHZ)2 0 2 ~ ~ CH
H3C-Si-CH3 The compound of Example 13 is prepared according to the process described in Example 1, using 1 molar equivalent of 1-[4-(2-allyloxy-ethoxy)-phenyl]-2-hydroxy-2-methyl-propan-1-one and 1 molar equivalent of 1,1,1,3,5,5,5-heptamethyltrisiloxane.
U.V. (CH3CN) max. at 273 nm (E 13 811).'H-NMR (CDCI3): 7.96 (m, 2 H, arom.);
6.87 (m, 2 H, arom.); 4.38 (OH); 4.09 (m, 2 H, Ph-OCH2); 3.71 (m, 2 H, Ph-O(CH2)2-O-CH
); 3.40 (m, 2 H, Ph-OCH2C~); 1.53 (m, 2 H, Ph-O(CH2)2-OCH2-CH ); 1.53 (s, 6 H, 2 CH3);
0.38 (m, 2 H, CH2-Si); 0.01 (m, 21 H, 7 Si-CH3). mlz (EI and CI) : 486 (M+); according to the MS spectrum, small amounts of the following compounds are also present: 486 (M+) (second signal); 442 (M+); 264 (M+)(2 signals); 246 (M+); 238 (M+). The values M = 264 (second signal) and 238 are assigned to different siloxane chains.
CHs CHs HsC~Si-CHs HsC-Si-CHs _ O CHs O O H
HZC=C-C-O-C-C-O ~ / C-C-O-Si-CHs H3C-Si-O-C-C? _ O CHs H Hz Hz Hz CHs O ~ Hz O ~ / C-C-OH
i M = 486 HsC,Si-CHs HsC-Sip CHs (second signal) CHs CH3CHs M = 442 /~_ O CHs _ O CHz H C=C-C-O-C-C-O-( C-C-OH H C=C-C-O-C-C-O~C-C
z H Hz Hz Hz ~~/ CH z H Hz Hz Hz ~ / CHs M=264 M=246 CHs CHs H3C-Si-CHs H3C-Si-CHs i O _ O CHs O
i Example 14: H3C-Si-H-~(CHz)z-O 2 ~ / C-C-O-(CHz)3 Si-CH3 p z CHs O
H C-Si-CH
H3Cr-SI-CH3 3 ~ 3 CH3 CHs The compound of Example 14 is prepared as described in Example 1, using 1 molar equiva-lent of 2-allyloxy-1-[4-(2-allyloxy-ethoxy)-phenyl]-2-methyl-propan-1-one and 2 molar equivalents of 1,1,1,3,5,5,5-heptamethyltrisiloxane.
U.V. (CH3CN) max. at 276 nm (E 11 693). 'H-NMR (CDCI3): 8.24 (m, 2 H, arom.);
5.94 (m, 2 H, arom.); 4.09 (m, 2 H, Ph-OCH2); 3.71 (m, 2 H, Ph-O(CH2)2-O-CH ); 3.40 (m, 2 H, Ph-OCH2C~); 3.13 (m, 2 H, C(CH3)2-OCHz); 1.54 (m, 4 H, Ph-O(CH2)2-OCH2-CH and C(CH3)2-OCH2-CH ); 1.42 (s, 6 H, 2 CH3); 0.38 (m, 4 H, 2 CH2-Si); 0.01 (m, 42 H, 14 Si-CH3). m/z (EI
and CI) : 748 (M+); according to the MS spectrum, small amounts of compounds of 528 (M+);
and 486 (M+) are also present.
H3C-Si-CH3 H3C-Si-CH3 _ O O CH
H3C-O-(CH2)3-O-(CHz)2-O ~ ~ OC CHOC3H~ H3C-Si-(CHZ)3 O-(CH2)2 O ~ ~ C-C-OH
H C-Si-CH H3C-Si-CH3 M = 486 3 CH 3 M = 528 CHs H3C-Si-CH3 _ O CH3~--~
Example 15: H3C-O-(CHZ)3 O ~ ~ C Chi H3C-Si-CH3 The compound of Example 15 is prepared according to the method described in Example 1, using 1 molar equivalent of 1-(4-allyloxy-phenyl)-2-methyl-2-morpholin-4-yl-propan-1-one and 1 molar equivalent of 1,1,1,3,5,5,5-heptamethyltrisiloxane.
U.V. (CH3CN) max. at 273 nm (E 15 248). 'H-NMR (CDC13): 8.47 (m, 2 H, arom.);
6.79 (m, 2 H, arom.); 4.09 (t, 2 H, Ph-OCH2, J = 6); 3.58 (m, 4 H, N=(CH2-CHz)2=O);
2.46 (m, 4 H, N=(CH -CH2)2=O); 1.73 (m, 2 H, Ph-O-CH2CH2); 1.21 (s, 6 H, 2 CH3); 0.49 (m, 2 H, CH2-Si);
0.01 (m, 21 H, 7 Si-CH3). m/z (EI and CI) : 512 (MH+); according to the MS
spectrum, small amounts of compounds 512 (MH+)(second signal); 470 (MH+); and 265 (MH+) are also pres-ent. The value MH+ = 265 is assigned to a siloxane chain.
H3C-Si-CH3 H3C-Si-CH3 _ O CH ~ _ H3C Oi-H C CH2 O ~ ~ C-C- ~ H3C Oi O ~ ~ OC-C(HN~ O
O CHs V O, CH3 H3C-Si-CH3 H3C-Si-CH3 CH3 M = 512 (second signal) CH3 M = 470 CH3 CH3 _ O CH3 ~
Example 16: H3C-Si-O-Si-(CHZ)3 O ~ ~ C-C- V
The compound of Example 16 is prepared according to the method described in Example 1, using 1 molar equivalent of 1-(4-allyloxy-phenyl)-2-methyl-2-morpholin-4-yl-propan-1-one and 1 molar equivalent of 1,1,3,3,3-pentamethyldisiloxane.
U.V. (CH3CN) max. at 273 nm (s 14 281). 'H-NMR (CDCI3): 8.51 (m, 2 H, arom.);
6.79 (m, 2 H, arom.); 3.90 (t, 2 H, Ph-OCH2, J = 6); 3.60 (m, 4 H, N=(CH2-CH2)2=O);
2.48 (m, 4 H, N=(CHz-CH2)2=O); 1.77 (m, 2 H, Ph-O-CH2CH2); 1.23 (s, 6 H, 2 CH3); 0.56 (m, 2 H, CH2-Si);
0.01 (m, 15 H, 5 Si-CH3). m/z (EI and CI) : 438 (MH+) (CI); according to the MS spectrum, small amounts of compounds 396 (MH+); and 290 (MH+) are also present.
3 CH _ O CH ~ _ O CH3 H C SH O-Si 3 O C-C-N O H2C H-H-O ~ ~ C-C-N~ O
3 i CH3 CH3 CH3~ 2 CH3 M = 289 M = 395 H3C-Si-CH3 p - O CH3 Example 17: H3C-Si-(CH2)3 O-(CHZ)3 ~ ~ C-C-OH
O CHs H3C-Si'CH3 The compound of Example 17 is obtained according to the method described in Example 1, using 1 molar equivalent of 1-[4-(3-allyloxy-propyl)-phenyl]-2-hydroxy-2-methyl-propan-1-one and 1 molar equivalent of 1,1,1,3,5,5,5-heptamethyltrisiloxane.
U.V. (CH3CN) max. at 255 nm (s 13 289). 'H-NMR (CDC13): 7.89 (m, 2 H, arom.);
7.18 (m, 2 H, arom.); 3.30 (m, 4 H, Ph-(CH2)2-CH2-O-CH ); 2.63 (m, 2 H, Ph-CH2); 1.84 (m, 2 H, Ph-(CH2)3-O-CH2-CHz); 1.54 (s, 6 H, 2 CH3); 1.47 (m, 2 H, Ph-CH2-Cue); 0.38 (m, 2 H, CH2-Si);
0.01 (m, 21 H, 7 Si-CH3). m/z (EI and CI): 484 (M+); according to the mass spectrum, small amounts of 484 (M+) (second isomer); 338 (M+); 310 (M+ = 338 - 18); 262 (M+);
244 (M+ _ 262 - 18); 222 (M+); and 204 (M+ = 222 - 18) are also present.
Hs ~CH
CH3 O CH ~H - O CH3 H3C O~ H H O (CHZ)3 ~ / C CFiOH H3C-Si-(CH2)3 O-(CH2)3 ~ ~ C C OH
OH CHs H3C-~Si-CH3 M = 484 M = 338 _ O CH3 _ O CH
HZC=C-C-O-(CHZ)3 ~ ~ C-C-OH HO-(CH2)3 ~ ~ C-'C-OH
M = 262 M = 222 H3C-Si-CH3 H3C-Si-CHs p - O CH3 O
Example 18: H3C-Si-(CH2)3 O-(CH2)3 ~ ~ C C O (CH2)3 Si-CH3 O CHs O
H3C-$i'CHs H3C-Si-CH3 i The compound of Example 18 is prepared according to the method described in Example 1, using 1 molar equivalent of 2-allyloxy-1-[4-(3-allyloxy-propyl)-phenyl]-2-methyl-propan-1-one and 2 molar equivalents of 1,1,1,3,5,5,5-heptamethyltrisiloxane.
U.V. (CH3CN) max. at 256 nm (~ 9542).'H-NMR (CDC13): 8.14 (m, 2 H, arom.);
7.19 (m, 2 H, arom.); 3.30 (m, 4 H, Ph-(CH2)2-CH -O-CH2); 3.14 (m, 2 H, C(CH3)2-OCHz); 2.65 (m, 2 H, Ph-CH2); 1.82 (m, 2 H, Ph-(CH2)3-O-CH2-CH2); 1.48 (m, 2 H, C(CH3)2-OCH2-CH );
1.42 (s, 6 H, 2 CH3); 1.15 (m, 2H, Ph-CH2-CH ); 0.38 (m, 4 H, 2 CH2-Si); 0.01 (m, 42 H, 14 Si-CH3). m/z (EI
and CI) : 746 (M+); according to the MS spectrum, small amounts of compounds 484 (M+);
and 238 (M+) are also present. The value M = 238 is assigned to a siloxane chain.
H3C-Si-CH3 p _ p CH3 H3C-Si-(CH2)3 O-(CHZ)3 ~ ~ C-C-OH
O CHs HsC_Si.CHs CH3 M = 484 H3C-Si-CH3 p _ O CH3 Example 19: H3C-Si-(CHZ)3 O-(CH2)3 ~ ~ C-C-N O
HsC_$i.CHs The compound of Example 19 is prepared according to the method described in Example 1, using 1 molar equivalent of 1-[4-(3-allyloxy-propyl)-phenyl]-2-methyl-2-morpholin-4-yl-propan-1-one and 1 molar equivalent of 1,1,1,3,5,5,5-heptamethyltrisiloxane.
U.V. (CH3CN) max. at 253 nm (s 14 930). 'H-NMR (CDCI3): 8.38 (m, 2 H, arom.);
7.14 (m, 2 H, arom.); 3.60 (m, 4 H, N=(CH2-CHz)2=O); 3.30 (m, 4 H, Ph-(CH2)2-CH -O-CHI); 2.65 (t, 2 H, J = 6, Ph-CH2); 2.48 (m, 2 H, N=(CHz-CH2)2=O ); 1.83 (m, 2 H, Ph-CH2CHz);
1.51 (m, 2 H, Ph-(CH2)3-O-CH2-Cue); 1.21 (s, 6 H, 2 CH3); 0.38 (m, 2 H, CHZ-Si); 0.01 (m, 21 H, 7 Si-CH3). m/z (EI and CI) : 553 (M+); according to the mass spectrum, small amounts of the compounds of 333 (M+); 331 (M+); and 238 (M+) are also still present. The value M = 238 is assigned to a siloxane chain.
_ O CH3 ~ _ O CH3 ~--~
H~C3 O (CHZ)3 \ / C CHN~ HZC H H O (CHz)3 \ / C CH
M=333 M=331 H3C-Si-CH3 Examele 20: H3C OS~ i-(CH2)3 O-(CH2)Z O ~ / CO~
O HO
i H3C-Si-CH3 The compound of Example 20 is obtained according to the method described in Example 1, using 1 molar equivalent of [4-(2-allyloxy-ethoxy)-phenyl]-(1-hydroxy-cyclohexyl)-methanone and 1 molar equivalent of 1,1,1,3,5,5,5-heptamethyltrisiloxane.
U.V. (CH3CN) max. at 274 nm (>r 11 211). 'H-NMR (CDC13): 8.01 (m, 2 H, arom.);
6.87 (m, 2 H, arom.); 4.07 (m, 2 H, Ph-OCH2); 3.71 (m, 2 H, Ph-O(CH2)2-O-CH ); 3.40 (m, 2 H, Ph-OCH2CH2); 1.95 (m, 2 H, Ph-O-(CH2)2-OCH2-CH2); 1.68-1.20 {m, 11 H, -C6H»);
0.38 (m, 2 H, CHZ-Si); 0.01 (m, 21 H, 7 Si-CH3). m/z (EI and CI) : 526 (M+); according to the mass spec-trum, small amounts of the compounds 304 (M+)(2 signals); 264 (M+) and 238 (M+) are also present. The values M = 264 and 238 are assigned to siloxane chains.
_ o /~ ~ z)z HZC=C-C-O-(CH2)2 O ~ / C~ HO CH -O \ /
H HZ HO~ ~ .,O
M = 304 M = 304 HzC-H~H2 Example 21: Curing of a UV-curable clear lacquer A UV-curable clear lacquer is prepared by mixing the following components:
50.0 parts of a difunctional urethane acrylate (RT""Actylan 200, Akcros) 25.0 parts tripropylene glycol diacrylate (SR 306, Cray Valley) 15.0 parts trimethylolpropane triacrylate (UCB) 10.0 parts dipentaerythritol pentaacrylate (SR 399, Cray Valley) 2 % of the photoinitiator from Example 1 are added to the mixture. The mixture is applied to a white chipboard panel and is cured using a UV processor below two 80 W/cm lamps at a band speed of 3 mlmin. A non-sticky cured film approximately 50 ~m thick is obtained.
30 minutes after curing, the pendulum hardness according to Konig (DIN 53157) is deter-mined in seconds. The higher the value, the greater is the hardness of the crosslinked sur-face. The static water contact angle (8) is also determined. For that purpose there is used a Kruss G10 contact angle measuring system. In that procedure, after the formulation has been cured, a drop of water is applied thereto. The contact angle is determined from the equilibrium of forces at the three-phase interface (airlwaterlcoating). A
computer program matches the profile of the lying drop of water to a general conic section equation. The differ-ential of the equation at the base line gives the slope at the three-phase contact point and thus the contact angle. The greater the contact angle measured, the better are the moisture-resistance and scratch-resistance of the cured surface. (The following publications give fur-ther explanation of the determination of contact angles: "Contact Angle, Wettability, and Ad-hesion", Advances in Chemistry Series 43, Am. Chem. Soc. 1964; Kruss User Manual, Drop Shape Analysis, Kruss GmbH, Hamburg 1997; G. Hirsch "Bestimmung der Oberflach-enspannung von Festkorpern aus Randwinkelmessungen and ihre Bedeutung bei Benetzungsproblemen" Chemie-Ing.-Techn 40.Jahrg. 1968, Volume 13, 639-645.) The pendulum hardness measured is 130 s; the contact angle B is 81 °.
Example 22: Curing of a UVlthermally curable system (Dual Cure) A "Dual-Cure" clear lacquer is prepared by mixing the following components:
21.1 parts of a hydroxy-functional polyacrylate (RT""Desmophen LS 2009/1, Bayer AG) 32.3 parts of a urethane acrylate based on isocyanurate in 80 % butyl acetate (RTnnRoskydal FWO 2518C, Bayer AG) 0.3 part flow improver in 10 % xylene (RT""Baysilone OL 17, Bayer AG) 0.3 part flow improver (Rr""Modaflow, Monsanto) 26.0 parts 1-methoxy-2-propanol (Fluka Chemicals) 0.5 part flow improver (RT""Byk 306, Byk-Chemie) 11.2 parts urethane acrylate containing isocyanate groups (RT""Roskydal FWO
2545 E, Bayer AG) To the resulting mixture there are added 2.635 % of the photoinitiator from Example 1, 0.375 bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide (RT""Irgacure 819, Ciba Specialty Chemicals), 1.5 % of a mixture of 2-[4-[(2-hydroxy-3-dodecyloxypropyl)oxy]-2-hydroxy phenyl]-4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine and 2-[4-[(2-hydroxy-3-tridecyloxy-propyl) oxy]-2-hydroxyphenyl]-4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine (RT""Tinuvin 400) and 1 % of a mixture of bis(1,2,2,6,6-pentamethyl-4-piperidinyl)sebacate and 1-(methyl)-8-(1,2,2,6,6-pentamethyl-4-piperidinyl)-sebacate (Rr""Tinuvin 292, Ciba Specialty Chemicals). The mix-ture is applied to a white-coated aluminium sheet, air-dried for 5 minutes at room tempera-ture and heated on a hotplate for 10 minutes at 80°C. The irradiation is carried out thereafter using a UV processor below two 120 W/cm lamps at a band speed of 5 m/min. A
non-sticky cured film approximately 40 ~m thick is obtained. 45 minutes after curing, the pendulum hardness according to Konig (DIN 53157) is determined in seconds. The higher the value, the greater is the hardness of the crosslinked surface. The static water contact angle (8) is also determined, as described in Example 13, using a Kruss G10 contact angle measuring system. The greater the contact angle measured, the better are the moisture-resistance and scratch-resistance of the cured surface. The pendulum hardness measured is 85 s; the contact angle 8 is 92°.
Example 23: Siloxane-containing photoinitiator as flow improver A formulation is prepared by mixing the following components:
57.0 parts of a hexa-functional aliphatic urethane acrylate (made by UCB) 13.0 parts hexanediol diacrylate (made by UCB) 2 % of the compound from Example 13 are dissolved in the formulation. The formulation is then applied using a 100 mm slotted knife to a chipboard panel coated with white primer and the contact angle of the coating relative to water is determined (for a description of contact angle measurement, see Example 21 ). For that purpose a drop of water of a specific volume is applied to the coated surface and the angle 8 of a tangent to the contact surface of the drop relative to the surface is measured using a special lens system and a computer pro-gram. The greater the contact angle, the better is the flow of the coating on the substrate in question (in this case a white chipboard panel), that is to say the lower is the surface tension.
The contact angle 8 for the present formulation is 51.56°.
Claims (17)
1. A process for the preparation of coatings having scratch-resistant durable surfaces, in which (I) a photocurable formulation comprising (A) an ethylenically unsaturated polymerisable compound; and (B) a photoinitiator;
is prepared;
(11) that formulation is applied to a support; and (III) the formulation is cured either solely by irradiation with electromagnetic radiation of a wavelength of from 200 nm to 600 nm, or by irradiation with electromagnetic radiation of a wavelength of from 200 nm to 600 nm and by prior, simultaneous and/or subsequent action of heat;
in which process the formulation comprises as photoinitiator (B) at least one surface-active photoinitiator that is concentrated at the surface of the formulation.
is prepared;
(11) that formulation is applied to a support; and (III) the formulation is cured either solely by irradiation with electromagnetic radiation of a wavelength of from 200 nm to 600 nm, or by irradiation with electromagnetic radiation of a wavelength of from 200 nm to 600 nm and by prior, simultaneous and/or subsequent action of heat;
in which process the formulation comprises as photoinitiator (B) at least one surface-active photoinitiator that is concentrated at the surface of the formulation.
2. A process according to claim 1, wherein the surface-active photoinitiator (B) is a compound comprising a customary photocleavable photoinitiator molecule moiety (b1 ) and a molecule moiety (b2) that is incompatible with the formulation to be cured.
3. A process according to claim 2, wherein the photocleavable photoinitiator molecule moiety (b1 ) contains a group
4. A process according to claim 2, wherein the molecule moiety (b2) that is incompatible with the formulation to be cured is a siloxane radical.
5. A process according to claim 1, wherein the surface-active photoinitiator (B) is a compound of formula I, wherein the units of formulae la, 1b and/or 1c are arranged randomly or in blocks, and wherein n is a number from 1 to 1000, or, when the siloxane starting material is a mixture of oligomeric siloxanes, n may also be less than 1, but greater than 0;
m is a number from 0 to 100;
p is a number from 0 to 10 000;
x is the number 1 or 2;
A1 is C1-C18alkyl or a radical of formula A2 is C1,-C18alkyl or a radical of formula or A1, and A2 together are a single bond;
R1,R2,R3,R5,R6,R7,R8,R9 and R10 are each independently of the others C1-C18alkyl, phenyl, C2-C6hydroxyalkyl, C2-C6aminoalkyl or C5-C8cycloalkyl;
R4 is C1-C18alkyl; C1-C18alkyl substituted by hydroxy, C1-C12alkoxy, halogen, C3-C8cycloalkyl and/or by N(R11)(R12); or R4 is phenyl; phenyl substituted by C1-C12alkyl, C1-C12alkoxy, halogen, hydroxy and/or by N(R11)(R12); or R4 is C5-C8cycloalkyl;
R11 and R12 are each independently of the other hydrogen, C1-C12alkyl or C1-C12hydroxyalkyl, or R11 and R12 together are C2-C8alkylene, which may be interrupted by an oxygen atom;
IN when x is 1, is a radical of formula ~
IN when x is 2, is a radical of formula R13 and R14 are each independently of the other C1-C12alkyl, C2-C8alkenyl, C5-C8cycloalkyl, phenyl-C1-C3alkyl; or R13 and R14 together are C2-C8alkylene, C3-C9-oxaalkylene or C3-C9azaalkylene;
Y is -(CH2)a-,-(CH2)a-O-, -O-(CH2)a-O-. -(CH2)b-O-(CH2)a-, -(CH2)b-O-(CH2)a-O-, -(CH2)a-N(R12)-,-(CH2)b-O-(CH2)a N(R12)-, -(C2-C10alkenylene)-O-, -(C2-C10alkenylene)-N(R12)-, -(C2-C10alkenylene)-O-(CH2)a- O- or -(C2-C10alkenylene)-O-(CH2)a N(R12)- ;
a and b are each independently of the other a number from 0 to 10;
X is OR15 or N(R16)(R17);
R15 is hydrogen, C1-C4alkyl, C2-C8alkenyl or C1-C4alkanoyl;
R16 and R17 are each independently of the other hydrogen, C1-C12alkyl or C2-C6alkenyl; or R16 and R17 together are C4-C5alkylene and, together with the nitrogen atom to which they are bonded, form a 5- or 6-membered ring, which may be interrupted by O or by N(R12); and X1 is a radical -O-, -O-(CH2)a or -N(R12)-(CH2)a-.
m is a number from 0 to 100;
p is a number from 0 to 10 000;
x is the number 1 or 2;
A1 is C1-C18alkyl or a radical of formula A2 is C1,-C18alkyl or a radical of formula or A1, and A2 together are a single bond;
R1,R2,R3,R5,R6,R7,R8,R9 and R10 are each independently of the others C1-C18alkyl, phenyl, C2-C6hydroxyalkyl, C2-C6aminoalkyl or C5-C8cycloalkyl;
R4 is C1-C18alkyl; C1-C18alkyl substituted by hydroxy, C1-C12alkoxy, halogen, C3-C8cycloalkyl and/or by N(R11)(R12); or R4 is phenyl; phenyl substituted by C1-C12alkyl, C1-C12alkoxy, halogen, hydroxy and/or by N(R11)(R12); or R4 is C5-C8cycloalkyl;
R11 and R12 are each independently of the other hydrogen, C1-C12alkyl or C1-C12hydroxyalkyl, or R11 and R12 together are C2-C8alkylene, which may be interrupted by an oxygen atom;
IN when x is 1, is a radical of formula ~
IN when x is 2, is a radical of formula R13 and R14 are each independently of the other C1-C12alkyl, C2-C8alkenyl, C5-C8cycloalkyl, phenyl-C1-C3alkyl; or R13 and R14 together are C2-C8alkylene, C3-C9-oxaalkylene or C3-C9azaalkylene;
Y is -(CH2)a-,-(CH2)a-O-, -O-(CH2)a-O-. -(CH2)b-O-(CH2)a-, -(CH2)b-O-(CH2)a-O-, -(CH2)a-N(R12)-,-(CH2)b-O-(CH2)a N(R12)-, -(C2-C10alkenylene)-O-, -(C2-C10alkenylene)-N(R12)-, -(C2-C10alkenylene)-O-(CH2)a- O- or -(C2-C10alkenylene)-O-(CH2)a N(R12)- ;
a and b are each independently of the other a number from 0 to 10;
X is OR15 or N(R16)(R17);
R15 is hydrogen, C1-C4alkyl, C2-C8alkenyl or C1-C4alkanoyl;
R16 and R17 are each independently of the other hydrogen, C1-C12alkyl or C2-C6alkenyl; or R16 and R17 together are C4-C5alkylene and, together with the nitrogen atom to which they are bonded, form a 5- or 6-membered ring, which may be interrupted by O or by N(R12); and X1 is a radical -O-, -O-(CH2)a or -N(R12)-(CH2)a-.
6. A process according to claim 5, in which the surface-active photoinitiator (B) is a compound of formula I, wherein n is a number from 1 to 10, or, when the siloxane starting material is a mixture of oligomeric siloxanes, n may also be less than 1, but greater than 0;
m is a number from 0 to 25;
p is a number from 0 to 25;
A1 is C1-C4alkyl or a radical of formula A2 is C1-C4alkyl or a radical of formula or A1 and A2 together are a single bond;
R1, R2,R3,R5,R6,R7, R8,R9 and R10 are each independently of the others C1-C4alkyl;
R4 is C1-C4alkyl;
R13 and R14 are each independently of the other C1-C4alkyl; or R13 and R14 together are C2-C8alkylene;
Y is -(CH2)a- O-,-(CH2)b-O-(CH2)a- or -(CH2)b-O-(CH2)a-O- ;
a and b are each independently of the other the number 2 or 3;
R15 is hydrogen;
R16 and R17 together are C4-C5alkylene and together with the nitrogen atom to which they are bonded form a 6-membered ring interrupted by O; and X, is a radical -O-(CH2)a .
m is a number from 0 to 25;
p is a number from 0 to 25;
A1 is C1-C4alkyl or a radical of formula A2 is C1-C4alkyl or a radical of formula or A1 and A2 together are a single bond;
R1, R2,R3,R5,R6,R7, R8,R9 and R10 are each independently of the others C1-C4alkyl;
R4 is C1-C4alkyl;
R13 and R14 are each independently of the other C1-C4alkyl; or R13 and R14 together are C2-C8alkylene;
Y is -(CH2)a- O-,-(CH2)b-O-(CH2)a- or -(CH2)b-O-(CH2)a-O- ;
a and b are each independently of the other the number 2 or 3;
R15 is hydrogen;
R16 and R17 together are C4-C5alkylene and together with the nitrogen atom to which they are bonded form a 6-membered ring interrupted by O; and X, is a radical -O-(CH2)a .
7. A process according to claim 1, in which the photocurable formulation comprises as further component at least one thermally crosslinkable compound (C), and the curing of the formulation is carried out by irradiation with electromagnetic radiation of a wavelength of from 200 nm to 600 nm and by prior, simultaneous and/or subsequent action of heat.
8. A process according to claim 7, wherein the thermally crosslinkable compound (C) is a binder based on a polyacrylate with melamine or on a melamine derivative, or a system based on a polyacrylate polyol and/or polyester polyol with an unblocked polyisocyanate or polyisocyanurate.
9. A surface-active photoinitiator of formula
10. A photoinitiator mixture comprising and/or or a mixture comprising and/or or a mixture comprising or a mixture comprising or a mixture comprising compounds of formula wherein , compounds of formula IIIa wherein R1=R2=R3=
and R4= H, and/or compounds of formula IIIa wherein R1=R2=R3= and R4=-(CH2)2CH3;
or a mixture comprising compounds of formula IIIb (IIIb) wherein R1=R2=R3=R4= R5= , compounds of formula IIIb wherein R1=R2=R3=R4= and R5= H and/or compounds of formula IIIb wherein R1=R2=R3= and R4= R5 = H;
or a mixture comprising and/or or a mixture comprising or a mixture comprising or a mixture comprising or a mixture comprising or a mixture comprising
and R4= H, and/or compounds of formula IIIa wherein R1=R2=R3= and R4=-(CH2)2CH3;
or a mixture comprising compounds of formula IIIb (IIIb) wherein R1=R2=R3=R4= R5= , compounds of formula IIIb wherein R1=R2=R3=R4= and R5= H and/or compounds of formula IIIb wherein R1=R2=R3= and R4= R5 = H;
or a mixture comprising and/or or a mixture comprising or a mixture comprising or a mixture comprising or a mixture comprising or a mixture comprising
11. Use of compounds of formula I as surface-active photoinitiators for the photo-polymerisation of ethylenically unsaturated compounds or mixtures comprising such compounds.
12. A composition comprising (A) at least one ethylenically unsaturated free-radically photopolymerisable compound; and (B) at least one surface-active photoinitiator of formula I, provided that the composition does not contain any siloxane-modified resins in addition to the photoinitiator.
13. A composition comprising (A) at least one ethylenically unsaturated free-radically photopolymerisable compound;
(B) at least one surface-active photoinitiator of formula I, and (C) at least one thermally crosslinkable compound;
provided that the composition does not contain any siloxane-modified resins in addition to the photoinitiator.
(B) at least one surface-active photoinitiator of formula I, and (C) at least one thermally crosslinkable compound;
provided that the composition does not contain any siloxane-modified resins in addition to the photoinitiator.
14. A composition according to either claim 12 or claim 13, comprising in addition to components (A) and (B), or (A), (B) and (C), further additives (D) and/or additional photoinitiators (E).
15. A process according to claim 1 for the preparation of pigmented and non-pigmented surface-coatings, powder coating compositions, composites and glass fibre cable coatings.
16. A coated substrate that is coated on at least one surface with a composition according to claim 12 or claim 13.
17. Use of compounds of formula I as flow improvers, optionally in combination with other customary flow improvers.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH139899 | 1999-07-29 | ||
CH1398/99 | 1999-07-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
CA2314668A1 true CA2314668A1 (en) | 2001-01-29 |
Family
ID=4209500
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002314668A Abandoned CA2314668A1 (en) | 1999-07-29 | 2000-07-27 | Surface-active photoinitiators |
Country Status (5)
Country | Link |
---|---|
KR (1) | KR100681160B1 (en) |
AT (1) | ATE408462T1 (en) |
AU (1) | AU775747B2 (en) |
CA (1) | CA2314668A1 (en) |
DE (1) | DE50015360D1 (en) |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0117233B1 (en) * | 1983-02-18 | 1987-08-26 | Ciba-Geigy Ag | Coloured photo-curable mouldings |
DE3738567A1 (en) * | 1987-03-12 | 1988-09-22 | Merck Patent Gmbh | COREACTIVE PHOTOINITIATORS |
-
2000
- 2000-07-20 DE DE50015360T patent/DE50015360D1/en not_active Expired - Lifetime
- 2000-07-20 AT AT00810649T patent/ATE408462T1/en not_active IP Right Cessation
- 2000-07-27 CA CA002314668A patent/CA2314668A1/en not_active Abandoned
- 2000-07-28 AU AU48906/00A patent/AU775747B2/en not_active Ceased
- 2000-07-29 KR KR1020000044079A patent/KR100681160B1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE50015360D1 (en) | 2008-10-30 |
AU4890600A (en) | 2001-02-01 |
KR100681160B1 (en) | 2007-02-28 |
KR20010049943A (en) | 2001-06-15 |
AU775747B2 (en) | 2004-08-12 |
ATE408462T1 (en) | 2008-10-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6376568B1 (en) | Surface-active photoinitiators | |
EP1311627B1 (en) | Process for producing coatings using surface-accumulating photoinitiators | |
EP1341823B1 (en) | Surface-active photoinitiators | |
US20040033317A1 (en) | Surface-active photoinitators | |
KR20030022397A (en) | Surface-active photoinitiators | |
US6929828B2 (en) | Surface-active photoinitiators | |
EP1392779B1 (en) | Fluorinated-photoinitiators in dual cure resins | |
JP4222945B2 (en) | Surfactant siloxane photoinitiator | |
US20050119435A1 (en) | Surface-active photoinitiators | |
AU775747B2 (en) | Surface-active photoinitiators | |
MXPA00007392A (en) | Surface-active photoinitiator |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
EEER | Examination request | ||
FZDE | Discontinued |