CA2238082C - Methods of inhibiting corrosion using halo-benzotriazoles - Google Patents
Methods of inhibiting corrosion using halo-benzotriazoles Download PDFInfo
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- CA2238082C CA2238082C CA 2238082 CA2238082A CA2238082C CA 2238082 C CA2238082 C CA 2238082C CA 2238082 CA2238082 CA 2238082 CA 2238082 A CA2238082 A CA 2238082A CA 2238082 C CA2238082 C CA 2238082C
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- halo
- corrosion
- tolyltriazole
- aqueous system
- inhibiting
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- 238000005260 corrosion Methods 0.000 title claims abstract description 54
- 230000007797 corrosion Effects 0.000 title claims abstract description 54
- 230000002401 inhibitory effect Effects 0.000 title claims description 26
- 238000000034 method Methods 0.000 title claims description 19
- 239000012964 benzotriazole Substances 0.000 claims description 24
- 238000011282 treatment Methods 0.000 claims description 23
- 239000000203 mixture Substances 0.000 claims description 21
- 239000010949 copper Substances 0.000 claims description 16
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 15
- 229910052736 halogen Inorganic materials 0.000 claims description 13
- 150000002367 halogens Chemical class 0.000 claims description 13
- 229910052802 copper Inorganic materials 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 10
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 6
- 238000011066 ex-situ storage Methods 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims description 4
- 229910019142 PO4 Inorganic materials 0.000 claims description 4
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical class OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims description 4
- 229910001431 copper ion Inorganic materials 0.000 claims description 4
- 150000002923 oximes Chemical class 0.000 claims description 4
- 235000021317 phosphate Nutrition 0.000 claims description 4
- 150000003013 phosphoric acid derivatives Chemical class 0.000 claims description 4
- 229920006243 acrylic copolymer Polymers 0.000 claims 3
- 239000003139 biocide Substances 0.000 claims 3
- 230000037427 ion transport Effects 0.000 claims 1
- CMGDVUCDZOBDNL-UHFFFAOYSA-N 4-methyl-2h-benzotriazole Chemical compound CC1=CC=CC2=NNN=C12 CMGDVUCDZOBDNL-UHFFFAOYSA-N 0.000 abstract description 41
- JAQDPDHEBZHQGA-UHFFFAOYSA-N 4-chloro-5-(2-methylphenyl)-2h-triazole Chemical compound CC1=CC=CC=C1C1=NNN=C1Cl JAQDPDHEBZHQGA-UHFFFAOYSA-N 0.000 abstract description 19
- 229910052801 chlorine Inorganic materials 0.000 abstract description 19
- 239000000460 chlorine Substances 0.000 abstract description 19
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract description 18
- KMBINRQMOHJGIH-UHFFFAOYSA-N 4-bromo-5-(2-methylphenyl)-2h-triazole Chemical compound CC1=CC=CC=C1C1=NNN=C1Br KMBINRQMOHJGIH-UHFFFAOYSA-N 0.000 abstract description 8
- 239000003112 inhibitor Substances 0.000 abstract description 7
- 239000000243 solution Substances 0.000 description 30
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 26
- WQYVRQLZKVEZGA-UHFFFAOYSA-N hypochlorite Inorganic materials Cl[O-] WQYVRQLZKVEZGA-UHFFFAOYSA-N 0.000 description 23
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 19
- 229910000554 Admiralty brass Inorganic materials 0.000 description 15
- 239000007787 solid Substances 0.000 description 13
- 239000000498 cooling water Substances 0.000 description 12
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 11
- 235000019645 odor Nutrition 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 239000005708 Sodium hypochlorite Substances 0.000 description 10
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 10
- 238000002474 experimental method Methods 0.000 description 8
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 7
- -1 sulfide ions Chemical class 0.000 description 7
- 150000003852 triazoles Chemical class 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 150000003851 azoles Chemical class 0.000 description 6
- 230000005764 inhibitory process Effects 0.000 description 6
- 230000001590 oxidative effect Effects 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 5
- 229910000881 Cu alloy Inorganic materials 0.000 description 5
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 5
- 229910052794 bromium Inorganic materials 0.000 description 5
- 229910000019 calcium carbonate Inorganic materials 0.000 description 5
- 238000001816 cooling Methods 0.000 description 5
- 239000002244 precipitate Substances 0.000 description 5
- 239000011541 reaction mixture Substances 0.000 description 5
- BAERPNBPLZWCES-UHFFFAOYSA-N (2-hydroxy-1-phosphonoethyl)phosphonic acid Chemical compound OCC(P(O)(O)=O)P(O)(O)=O BAERPNBPLZWCES-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 239000012670 alkaline solution Substances 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000006056 electrooxidation reaction Methods 0.000 description 4
- 239000002002 slurry Substances 0.000 description 4
- PZBQVZFITSVHAW-UHFFFAOYSA-N 5-chloro-2h-benzotriazole Chemical compound C1=C(Cl)C=CC2=NNN=C21 PZBQVZFITSVHAW-UHFFFAOYSA-N 0.000 description 3
- 229910001369 Brass Inorganic materials 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 238000005481 NMR spectroscopy Methods 0.000 description 3
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 3
- 239000010951 brass Substances 0.000 description 3
- 239000001569 carbon dioxide Substances 0.000 description 3
- 229910002092 carbon dioxide Inorganic materials 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 239000012467 final product Substances 0.000 description 3
- JGJLWPGRMCADHB-UHFFFAOYSA-N hypobromite Chemical compound Br[O-] JGJLWPGRMCADHB-UHFFFAOYSA-N 0.000 description 3
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- OMKIPAAHHCWOBN-UHFFFAOYSA-N 1-chloro-4-(2-methylphenyl)triazole Chemical compound CC1=CC=CC=C1C1=CN(Cl)N=N1 OMKIPAAHHCWOBN-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- 229910000640 Fe alloy Inorganic materials 0.000 description 2
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 2
- JRNVZBWKYDBUCA-UHFFFAOYSA-N N-chlorosuccinimide Chemical compound ClN1C(=O)CCC1=O JRNVZBWKYDBUCA-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 238000005660 chlorination reaction Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000004895 liquid chromatography mass spectrometry Methods 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- RYCLIXPGLDDLTM-UHFFFAOYSA-J tetrapotassium;phosphonato phosphate Chemical compound [K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])([O-])=O RYCLIXPGLDDLTM-UHFFFAOYSA-J 0.000 description 2
- PLGXRTUGMZEVII-UHFFFAOYSA-N 2-chloro-1h-pyrrole Chemical compound ClC1=CC=CN1 PLGXRTUGMZEVII-UHFFFAOYSA-N 0.000 description 1
- CRIAGZDVEWMBRY-UHFFFAOYSA-N 4,5-dichloro-2h-benzotriazole Chemical compound ClC1=CC=C2NN=NC2=C1Cl CRIAGZDVEWMBRY-UHFFFAOYSA-N 0.000 description 1
- SWRPQHMXGMUNKW-UHFFFAOYSA-N 4-(2,3-dichloro-6-methylphenyl)-2H-triazole Chemical compound ClC1=C(C(=C(C=C1)C)C=1N=NNC=1)Cl SWRPQHMXGMUNKW-UHFFFAOYSA-N 0.000 description 1
- DUKXWDHNEBYJJF-UHFFFAOYSA-N 4-(6-chloro-6-methylcyclohexa-2,4-dien-1-yl)-2h-triazole Chemical compound CC1(Cl)C=CC=CC1C1=CNN=N1 DUKXWDHNEBYJJF-UHFFFAOYSA-N 0.000 description 1
- IPIVUPVIFPKFTG-UHFFFAOYSA-N 4-butyl-2h-benzotriazole Chemical compound CCCCC1=CC=CC2=C1N=NN2 IPIVUPVIFPKFTG-UHFFFAOYSA-N 0.000 description 1
- NGKNMHFWZMHABQ-UHFFFAOYSA-N 4-chloro-2h-benzotriazole Chemical compound ClC1=CC=CC2=NNN=C12 NGKNMHFWZMHABQ-UHFFFAOYSA-N 0.000 description 1
- ZCFMGIGLXOKMJC-UHFFFAOYSA-N 5-butyl-2h-benzotriazole Chemical compound C1=C(CCCC)C=CC2=NNN=C21 ZCFMGIGLXOKMJC-UHFFFAOYSA-N 0.000 description 1
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 150000001565 benzotriazoles Chemical class 0.000 description 1
- 239000007844 bleaching agent Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000012320 chlorinating reagent Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 229910000366 copper(II) sulfate Inorganic materials 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 230000026030 halogenation Effects 0.000 description 1
- 238000005658 halogenation reaction Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000002906 microbiologic effect Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- OFPXSFXSNFPTHF-UHFFFAOYSA-N oxaprozin Chemical compound O1C(CCC(=O)O)=NC(C=2C=CC=CC=2)=C1C1=CC=CC=C1 OFPXSFXSNFPTHF-UHFFFAOYSA-N 0.000 description 1
- 238000010979 pH adjustment Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 1
- 230000003134 recirculating effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 239000013535 sea water Substances 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 229910052979 sodium sulfide Inorganic materials 0.000 description 1
- GRVFOGOEDUUMBP-UHFFFAOYSA-N sodium sulfide (anhydrous) Chemical compound [Na+].[Na+].[S-2] GRVFOGOEDUUMBP-UHFFFAOYSA-N 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000010414 supernatant solution Substances 0.000 description 1
- 229910001428 transition metal ion Inorganic materials 0.000 description 1
- 238000002211 ultraviolet spectrum Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
- Agricultural Chemicals And Associated Chemicals (AREA)
Abstract
The use of halo-benzotriazoles as corrosion inhibitors in aqueous systems is disclosed. Halo-benzotriazoles such as chloro-tolyltriazole and bromo-tolyltriazole were found to be more effective corrosion inhibitors than tolyltriazole in the presence of chlorine.
Description
METHODS OF INHIBITING CORROSION USING
HALO-BENZOTRIAZOLES
FIELD OF THE INVENTION
The present invention relates to the control of corrosion in aqueous systems. More particularly, the present invention relates to the inhibition of corrosion of steel and copper alloys in aqueous systems through application of halo-benzotriazoles to the aqueous system.
BACKGROUND OF THE INVENTION
The use of triazoles for inhibiting the corrosion of copper and iron alloys in a wide variety of aqueous and non-aqueous systems is well known. In industrial cooling water systems, benzotriazole and tolyltriazole are used most often. Tolyltriazole is generally preferred because of its lower cost. Triazoles are film forming materials that provide efficient coverage of metal or metal oxide surtaces in a system thereby providing protection against corrosive elements present in an aqueous system. In addition to the film forming tendency of various azoles, they also precipitate soluble, divalent copper ions. The precipitation prevents transport of copper ions to ferrous surfaces, where galvanic reactions between copper ions and iron atoms leads to pitting corrosion of the ferrous metal.
While the use of azoles for corrosion inhibition is widespread, there are drawbacks to their use, specifically with tolyltriazole. The most important drawbacks are experienced when azoles are used in combination with oxidizing halogens. Oxidizing halogens such as elemental chlorine, bromine, their hypohalous acids, or their alkaline solutions (i.e., solutions of hypochlorite or hypobromite ion) are the most common materials used to control microbiological growth in cooling water systems. When copper or iron alloys that have previously been protected with azoles are exposed to an oxidizing halogen, corrosion protection breaks down. After breakdown, it is difficult to form new protective films in tolyltriazole treated cooling systems that are being chlorinated, particularly continuously chlorinated. Very high dosages of tolyltriazole are frequently applied in an attempt to improve performance, often with limited success.
The degradation of protection of azole films in the presence of oxidizing halogens is well-documented in the literature. For example, R.
Holm, et al., concluded that hypochlorite penetrates an intact triazole film, leading to higher corrosion rates, and that secondly, hypochlorite attacks the prefilmed triazole surface, disrupting or degrading the film (53rd Annual Meeting of the International Water Conference, Paper No.
IWC-92-40, 1992). Lu, et al., also studied interactions of triazole films with hypochlorite on copper and copper alloy surfaces ("Effects of Halogenation on Yellow Metal Corrosion: Inhibition by Triazoles", Corrosion, 50, 422 (1994)). Lu, et al., concluded:
(a) prefilmed tolyltriazole on copper and brass surfaces undergoes decomposition during chlorination;
(b) the stability of prefilmed tolyltriazole on copper and brass to NaOCI was improved when tolyltriazole was added to the hypochlorite solution;
(c) clean (i.e., non-prefilmed) copper surfaces did not develop good protective films when placed in solutions containing mixtures of tolyltriazole and NaOCI.
Thus, the combination of tolyltriazole with NaOCI did not produce a composition capable of efficient film formation and corrosion inhibition.
The nature of the reaction products when azoles are exposed to oxidizing halogens in a cooling water system is not clear. The literature teaches that a compound is formed when chlorine and tolyltriazole are combined in cooling waters, and that it responds to analytical tests for chlorine. For example, Vanderpool, et al., state that chlorine reacts reversibly with tolyltriazole to produce N-chloro-tolyltriazole. They specifically state, "presumably this compound is not itself an inhibitor."
Rather, they teach that it is readily hydrolyzed to the original tolyltriazole and hypochlorous acid so that free tolyltriazole becomes available for corrosion inhibition ("Improving the Corrosion Inhibitor Efficiency of Tolyltriazole in the Presence of Chlorine and Bromine", NACE
Corrosionl87, Paper No. 157 (1987)). Hollander and May stated they were able to isolate 1-chloro-tolyltriazole from stored, more highly concentrated solutions, but they also teach that "at low concentrations (less than 10 mg/L) rapid hydrolysis made it impossible to isolate the chloro adducts." Based upon proton NMR analysis, the material Hollander and May isolated was chloro-tolyltriazole.
Another observation is that a very characteristic odor is present whenever tolyltriazole and chlorine are combined in cooling waters.
In contrast, the present authors have shown that chloro tolyltriazole does not respond to analytical tests for chlorine, despite extended boiling. And solutions of chloro-tolyltriazole, surprisingly, do not produce the characteristic odor. Thus chloro-tolyltriazole is clearly different from the tolyltriazole-chlorine reaction product that forms in-situ in cooling water systems.
There are also references in the literature to 5-chlorobenzotriazole (i.e., CAS number [94-97-3]). In "The Water Drop", Volume I No. 2, 1985, Puckorius & Associates state that chlorinated tolyltriazole is effective as a corrosion inhibitor and cite R.P. Carr as a reference. A literature review of published work by Carr indicates that he actually teaches that reactions between tolyltriazole and chlorine do not occur under cooling water conditions ("The Performance of Tolyltriazole in the Presence of Sodium Hypochlorite Under Simulated Field Conditions", NACE
Corrosion/83 Paper No. 283, 1983). In this Corrosion/83 paper, Carr does discuss the inhibiting action of a chloro-azole but it is a reference to earlier literature and specifically to the action of 5-chlorobenzotriazole and related aryl substituted azoles in sulfuric acid solutions ("Effects of Substituted Benzotriazole on the Electrochemical Behavior of Copper in H2S04", Wu et al., Corrosion, Volume 37, No. 4, 223 (1981 )). Since the 5 1985 Puckorius reference, there has been widespread use of tolyltriazole in chlorinated cooling systems with well established performance difficulties, indicating a continuing, unsolved problem in the art.
Other problems are well-known when tolyltriazole and oxidizing halogens are combined in cooling waters. These include a loss in the extent of precipitation of transition metal ions such as copper, thus leading to improved transport and galvanic corrosion, a change in the response of the standard spectrophotometric test for tolyltriazole, leading to unintentional overfeed, and the objectionable odor mentioned above.
This odor can be sensed even when the cooling water originally contained 1 ppm tolyltriazole, or less. Since cooling water often passes over cooling towers, evaporation and drift release the objectionable odor to the local environment.
The present inventors believe that the odorous material is N-chloro-tolyltriazole, that it forms OCI- reversibly with tolyltriazole in dilute solution, and that it is absent in the final product when the reaction is run in concentrated solution, i.e., tolyltriazole + OCI-~ N-chloro-tolyltriazole- (intermediate) -~ chloro-tolyltriazole. The present inventors have found no evidence of reversion of chloro-tolyltriazole to either the odorous intermediate or to tolyltriazole. Nor is there any evidence of reactions between hypochlorite and chloro-tolyltriazole in dilute aqueous solutions.
HALO-BENZOTRIAZOLES
FIELD OF THE INVENTION
The present invention relates to the control of corrosion in aqueous systems. More particularly, the present invention relates to the inhibition of corrosion of steel and copper alloys in aqueous systems through application of halo-benzotriazoles to the aqueous system.
BACKGROUND OF THE INVENTION
The use of triazoles for inhibiting the corrosion of copper and iron alloys in a wide variety of aqueous and non-aqueous systems is well known. In industrial cooling water systems, benzotriazole and tolyltriazole are used most often. Tolyltriazole is generally preferred because of its lower cost. Triazoles are film forming materials that provide efficient coverage of metal or metal oxide surtaces in a system thereby providing protection against corrosive elements present in an aqueous system. In addition to the film forming tendency of various azoles, they also precipitate soluble, divalent copper ions. The precipitation prevents transport of copper ions to ferrous surfaces, where galvanic reactions between copper ions and iron atoms leads to pitting corrosion of the ferrous metal.
While the use of azoles for corrosion inhibition is widespread, there are drawbacks to their use, specifically with tolyltriazole. The most important drawbacks are experienced when azoles are used in combination with oxidizing halogens. Oxidizing halogens such as elemental chlorine, bromine, their hypohalous acids, or their alkaline solutions (i.e., solutions of hypochlorite or hypobromite ion) are the most common materials used to control microbiological growth in cooling water systems. When copper or iron alloys that have previously been protected with azoles are exposed to an oxidizing halogen, corrosion protection breaks down. After breakdown, it is difficult to form new protective films in tolyltriazole treated cooling systems that are being chlorinated, particularly continuously chlorinated. Very high dosages of tolyltriazole are frequently applied in an attempt to improve performance, often with limited success.
The degradation of protection of azole films in the presence of oxidizing halogens is well-documented in the literature. For example, R.
Holm, et al., concluded that hypochlorite penetrates an intact triazole film, leading to higher corrosion rates, and that secondly, hypochlorite attacks the prefilmed triazole surface, disrupting or degrading the film (53rd Annual Meeting of the International Water Conference, Paper No.
IWC-92-40, 1992). Lu, et al., also studied interactions of triazole films with hypochlorite on copper and copper alloy surfaces ("Effects of Halogenation on Yellow Metal Corrosion: Inhibition by Triazoles", Corrosion, 50, 422 (1994)). Lu, et al., concluded:
(a) prefilmed tolyltriazole on copper and brass surfaces undergoes decomposition during chlorination;
(b) the stability of prefilmed tolyltriazole on copper and brass to NaOCI was improved when tolyltriazole was added to the hypochlorite solution;
(c) clean (i.e., non-prefilmed) copper surfaces did not develop good protective films when placed in solutions containing mixtures of tolyltriazole and NaOCI.
Thus, the combination of tolyltriazole with NaOCI did not produce a composition capable of efficient film formation and corrosion inhibition.
The nature of the reaction products when azoles are exposed to oxidizing halogens in a cooling water system is not clear. The literature teaches that a compound is formed when chlorine and tolyltriazole are combined in cooling waters, and that it responds to analytical tests for chlorine. For example, Vanderpool, et al., state that chlorine reacts reversibly with tolyltriazole to produce N-chloro-tolyltriazole. They specifically state, "presumably this compound is not itself an inhibitor."
Rather, they teach that it is readily hydrolyzed to the original tolyltriazole and hypochlorous acid so that free tolyltriazole becomes available for corrosion inhibition ("Improving the Corrosion Inhibitor Efficiency of Tolyltriazole in the Presence of Chlorine and Bromine", NACE
Corrosionl87, Paper No. 157 (1987)). Hollander and May stated they were able to isolate 1-chloro-tolyltriazole from stored, more highly concentrated solutions, but they also teach that "at low concentrations (less than 10 mg/L) rapid hydrolysis made it impossible to isolate the chloro adducts." Based upon proton NMR analysis, the material Hollander and May isolated was chloro-tolyltriazole.
Another observation is that a very characteristic odor is present whenever tolyltriazole and chlorine are combined in cooling waters.
In contrast, the present authors have shown that chloro tolyltriazole does not respond to analytical tests for chlorine, despite extended boiling. And solutions of chloro-tolyltriazole, surprisingly, do not produce the characteristic odor. Thus chloro-tolyltriazole is clearly different from the tolyltriazole-chlorine reaction product that forms in-situ in cooling water systems.
There are also references in the literature to 5-chlorobenzotriazole (i.e., CAS number [94-97-3]). In "The Water Drop", Volume I No. 2, 1985, Puckorius & Associates state that chlorinated tolyltriazole is effective as a corrosion inhibitor and cite R.P. Carr as a reference. A literature review of published work by Carr indicates that he actually teaches that reactions between tolyltriazole and chlorine do not occur under cooling water conditions ("The Performance of Tolyltriazole in the Presence of Sodium Hypochlorite Under Simulated Field Conditions", NACE
Corrosion/83 Paper No. 283, 1983). In this Corrosion/83 paper, Carr does discuss the inhibiting action of a chloro-azole but it is a reference to earlier literature and specifically to the action of 5-chlorobenzotriazole and related aryl substituted azoles in sulfuric acid solutions ("Effects of Substituted Benzotriazole on the Electrochemical Behavior of Copper in H2S04", Wu et al., Corrosion, Volume 37, No. 4, 223 (1981 )). Since the 5 1985 Puckorius reference, there has been widespread use of tolyltriazole in chlorinated cooling systems with well established performance difficulties, indicating a continuing, unsolved problem in the art.
Other problems are well-known when tolyltriazole and oxidizing halogens are combined in cooling waters. These include a loss in the extent of precipitation of transition metal ions such as copper, thus leading to improved transport and galvanic corrosion, a change in the response of the standard spectrophotometric test for tolyltriazole, leading to unintentional overfeed, and the objectionable odor mentioned above.
This odor can be sensed even when the cooling water originally contained 1 ppm tolyltriazole, or less. Since cooling water often passes over cooling towers, evaporation and drift release the objectionable odor to the local environment.
The present inventors believe that the odorous material is N-chloro-tolyltriazole, that it forms OCI- reversibly with tolyltriazole in dilute solution, and that it is absent in the final product when the reaction is run in concentrated solution, i.e., tolyltriazole + OCI-~ N-chloro-tolyltriazole- (intermediate) -~ chloro-tolyltriazole. The present inventors have found no evidence of reversion of chloro-tolyltriazole to either the odorous intermediate or to tolyltriazole. Nor is there any evidence of reactions between hypochlorite and chloro-tolyltriazole in dilute aqueous solutions.
SUMMARY OF THE INVENTION
The present inventors have discovered that halo-benzotriazoles such as chloro-tolyltriazole and bromo-tolyltriazole are more effective than tolyltriazole in inhibiting corrosion in aqueous systems. The halo-benzotriazoles are substantially more effective than tolyltriazole in the presence of chlorine. Furthermore, when chloro-tolyltriazole is exposed to chlorine, an objectionable odor does not form and the quantity of chlorine that is required to produce a residual in the aqueous system is reduced.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
The present inventors have discovered that halo-benzotriazoles such as chloro-tolyltriazole and bromo-tolyltriazole are more effective than tolyltriazole in inhibiting corrosion in aqueous systems. The halo-benzotriazoles are substantially more effective corrosion inhibitors than tolyltriazole in the presence of chlorine. The efficacy of the present invention is surprising given the prior knowledge that chlorination of an azole treated system leads to degradation of corrosion inhibition performance. Furthermore, the halo-benzotriazoles of the present invention are not subject to the formation of objectionable odors when exposed to chlorine as is tolyltriazole, the quantity of chlorine that is required to produce a residual in the aqueous system is notably reduced in comparison to systems treated with tolyltriazole, and the treatment is effective in the presence of sulfide ions.
It was discovered that the ex-situ preparation of a halo-benzotriazole provided a corrosion inhibitor which exhibited a surprising and unexpected activity when compared to a treatment comprising a mixture of a benzotriazole and a halogen. The results of the studies of the present invention clearly show that mere mixtures of a benzotriazole .
and a halogen in a cooling water system do not provide the corrosion inhibiting effect of the addition of a halo-benzotriazole prepared ex-situ.
As further evidence of the surprising activity of an ex-situ prepared halo-benzotriazole, the present inventors found that the chlorine demand of a system treated in accordance with the present invention was significantly reduced. Furthermore, in systems treated in accordance with the present invention the objectionable odor common to systems treated with a triazole and halogen was absent.
The halo-benzotriazoles of the present invention can include chloro-, fluoro-, bromo- and iodo- as well as haloalkyl (trifluoromethyl) benzotriazoles. Preferred are chloro-tolyltriazole and bromo-tolyltriazole.
The azole may include tolyltriazole, benzotriazole, butylbenzotriazole, mercaptobenzothiazole and the like. The preferred azole is tolyltriazole.
The preferred benzotriazole, tolyltriazole, is such that the preferred halo-benzotriazole is chloro-tolyltriazole or bromo-tolyltriazole. The preparation of the preferred chloro-tolyltriazole can be by any suitable means. Examples of preparation methods include but are not limited to reactions with hypochlorite, N-chlorosuccinimide, and other chlorinating agents. A method of forming chloro-tolyltriazole is through the reaction of tolyltriazole with hypochlorite, in which case the final reaction mixture is an alkaline solution that can be used with or without further modification. Alternatively, chloro-tolyltriazole can be formed through the reaction of tolyltriazole with hypochlorite in acetic acid solutions, (i.e., hypochlorous acid) and then isolated as a solid. For convenience of application, the solid can be redissolved in alcohols such as methanol or 2-propanol, aqueous solutions of alcohols or strong alkaline solutions such as sodium hydroxide or potassium hydroxide.
The preparation of bromo-tolyltriazole can be by any suitable means. Examples of preparation methods include but are not limited to reactions with hypobromite, bromine, and other brominating agents. A
method of forming bromo-tolyltriazole is through the reaction of tolyltria-zole with bromine in an aqueous solution and then isolating it as a solid.
For convenience of application, the solid can be dissolved in a strong alkaline solution such as sodium hydroxide or potassium hydroxide.
In treating an aqueous system in accordance with the present invention, the chloro-tolyltriazole (hereinafter CI-TTA) is preferably fed continuously to the water. A preferred treatment concentration ranges from about 0.5 to 10 parts per million, most preferably at about 3 parts per million. Continuous feed is not, however, a requirement. The chloro-tolyltriazole can be fed at a concentration sufficient to form a protective film and thereafter feed can be discontinued for extended periods of time.
The halo-benzotriazole treatment of the present invention can be used in combination with other corrosion and/or deposit inhibiting treatments known in the art including but not limited to phosphates, phosphonates, acrylic homo- and copolymers, chelants, and oximes.
The present invention will now be further described with reference to a number of specific examples which are to be regarded solely as illustrative and not as restricting the scope of the present invention.
Examples Example 1 The preparation of the solid samples was as follows:
Tolyltriazole (hereinafter TTA) (30 g, 0.225 mol) was dissolved in aqueous acetic acid (60 mL, 1:1 ratio) by heating to 32°C. Sodium hypochlorite (366 g, 5.25% sodium hypochlorite as a bleach solution) was added while maintaining the reaction temperature at ~ 20°C.
Following the addition, the reaction mixture was stirred at room temperature for 24 hours. A sticky precipitate formed during this time.
The solid was filtered and taken into methylene chloride. The solid that did not dissolve was filtered and identified as a mixture of CI-TTA with minor amounts of TTA and dichloro-tolyltriazole (di-CI-TTA). The methylene chloride was removed to obtain a yellow solid which was identified as a mixture of CI-TTA with minor amounts of di-CI-TTA.
Unless noted, this latter solid was used in the following Examples.
Example 2 A slurry of TTA (50 g, 0.376 mol) in 25 g of water was warmed to 35°C. Sodium hypochlorite (27.9 g, 0.376 mol, added as 226.8 g of a 12.3% sodium hypochlorite solution) was added over a period of 2 hours.
After the addition, the reaction was kept at 45°C for one hour.
During the addition the pH of the reaction mixture increased to 12 and the solids dissolved. The final product was analyzed by ~ H and ~3C NMR and LC-UV and found to be composed of 81.9% CI-TTA, 8.8% residual TTA, and 9.3% di-CI-TTA based on the relative areas in the UV spectra.
On dilution to 1 to 100 ppm azole, with or without pH adjustment to about 7.2, there was no odor from the halo-benzotriazole solution of the present invention.
5 Example 3 In the schemes below, TTA was present at 100 ppm, in contrast to Example 2 where the initial slurry contained about 200,000 ppm. "x"
denotes a stoichiometric ratio.
Scheme 1 pH=7 slow TTA+1.1xNaOCI<---------->odorous solution --------->CI-TTA(ppt odorous) Scheme 2 pH=11.8 pH=8.2 TTA+1.1xNaOCI<------------->solution, no odor----------->CI-TTA(ppt odorous) Example 4 CI-TTA, prepared as a solid according to Example 1, was dissolved in methanol and charged to a simulated cooling water solution. The solution contained 319 ppm Ca (calculated as CaC03), 7 ppm Mg (calculated as CaC03), 190 ppm NaHC03, 882 ppm Na2S04, 1184 ppm NaCI, 5 ppm CI-TTA, and 2.4 ppm of hydroxyethylidene diphosphonic acid (HEDP). Hypochlorite was absent. The solution was maintained at 120°F by an admiralty brass heater tube and at pH=7.2 to 7.5 by a pH
controller equipped to feed sulfuric acid on demand. The solution was recirculated past the heater and past both admiralty and copper/nickel alloy corrosion rate meters (CRM). After 1 hour the solution was drained and replaced by an identical solution with no CI-TTA. This solution was fed to overflow which replenished the system with fresh solution at a rate , of about 4% by volume per hour. This system was maintained under these conditions continuously until the bright admiralty tube was tarnished, at which point the experiment was terminated. Comparisons were made to identical experiments with TTA and benzotriazole.
TABLEI
Admiralty Tube Appearance Pretreatment 40 hours 94 hours 336 hours CI-TTA Bright Bright Tarnished TTA Bright Tarnished Benzotriazole Tarnished TABLE II
Admiralty CuINi Corrosion Rate (mpy) Corrosion Rate (mpy) Pretreatment 40 hrs. 94 hrs. 336 hrs. 40 hrs. 94 hrs. 336 hrs.
C I-TTA 0. 2 0. 3 0. 5 0. 7 0.4 0. 8 TTA <0.1 2.2 * N/A 5.2 Benzotriazole 1.3 * * 2.0 *Experiment previously terminated.
Example 5 Corrosion tests were carried out in the apparatus described in Example 4 with water containing 500 ppm Ca, 250 ppm Mg, 25 ppm Malk, 15 ppm o-P04, 3 ppm tetrapotassium pyrophosphate, 10 ppm of a 3:1, low molecular weight, acrylic acid/allyl 2-hydroxypropyl sulfonate ether copolymer, 2.4 ppm HEDP, a 3ppm of either CI-TTA or TTA. The pH was maintained at 7.2 with a blended mixture of air and carbon dioxide at 120°
F for 18 hours. Electrochemical corrosion rates were measured using admiralty brass (ADM) and low carbon steel (LCS) working electrodes. All tests also had both admiralty and LCS coupons in contact with the solution. The method differed from Example 4 in that the azole was fed continuously at 3 ppm during these experiments. The azole was supplied by dissolving the solid in potassium hydroxide solution and then diluting it into the feedwater for the system. Each experiment was duplicated: once with an admiralty brass heated tube, and once with a low carbon steel heated tube. Corrosion rates were measured as in Example 4 from admiralty and LCS working electrodes, and by weight changes of admiralty and LCS coupons. Rates for the coupons were measured for the initial day of each run, and a "differential" rate was calculated for the remaining days of the run by offsetting the initial rate from the overall rate.
TABLE III
CRM Corrosion Rates: Values at end of six days (mpy) LCS Heated Surface ADM Heated Surface CI-TTA TTA CI-TTA TTA
LCS 0.2 0.4 0.45 0.75 ADM 0.00 0.00 0.05 0.07 TABLE IV
Gravimetric Coupon Corrosion Rates (mpy) (First day and differential rates) LCS Heated Surface ADM Heated Surface CI-TTA TTA CI-TTA TTA
Day 1 LCS 4.6 3.0 3.4 2.9 Day 6 LCS (diff.) 0.25 0.33 0.25 0.25 Day 1 ADM 1.9 2.1 1.6 1.8 Day 6 ADM (diff.) 0.00 0.20 0.00 0.10 Example 6 The method of Example 5 was followed, except a solution of sodium hypochlorite was added after 20 hours and continued for an additional 72 hours. The feed rate of the sodium hypochlorite was controlled to produce a "chlorine residual" of about 0.1 to 0.3 ppm as C12 using a standard DPD
spectrophotometric test on the recirculating water. For the experiment with CI-TTA, the feed rate of the sodium hypochlorite was about 30% of that , required for TTA. For TTA, the characteristic odor was detected immediately after the first hypochlorite was added. With CI-TTA, there was no odor upon initiating hypochlorite addition, and only a trace was sensed just prior to concluding the four day run.
TABLE V
CRM Corrosion Rates: Values at 90 hour mark (mpy) LCS Heated Surface CI-TTA TTA
LCS 0.5 2.3 ADM 0.06 0.02 TABLE VI
Gravimetric Corrosion Rates (mpy) LCS Heated Surface CI-TTA TTA
Day 2 to 4 LCS 1.1 2.6 Day 4 LCS (diff.) 0.4 1.4 Day2to4ADM 1.1 1.2 Day 4 ADM (diff.) 0.15 0.85 Example 7 Solutions of azole at 6 ppm were made in deionized water, and the 5 pH was adjusted to 7Ø Cu+2 ion was added (0.1 ppm from cupric sulfate) and the pH was again adjusted to 7Ø A sample was digested with nitric acid, analyzed for copper, and a second sample was filtered (0.2 micron pore size), digested, and analyzed for copper. The ratio was expressed as "% soluble Cu":
TABLE VII
Sample % Soluble Cu TTA+N a0 C I 90 Example 8 Admiralty brass corrosion coupons and working electrodes were coated with a sulfide layer by exposing the metal to a sodium sulfide solution for 18 hours. These samples were rinsed and dried. Corrosion tests were carried out in aqueous solutions in stirred beakers containing 500 ppm Ca, 250 ppm Mg, 25 ppm Malk, 15 ppm o-P04, 3 ppm tetra-potassium pyrophosphate, 10 ppm of a 3:1, low molecular weight, acrylic acid/allyl 2-hydroxypropyl sulfonate ether copolymer, 2.4 ppm HEDP, and the pH was maintained at 7.2 with a blended mixture of air and carbon dioxide at 120°F for 18 hours. Electrochemical corrosion rates were meas-ured using admiralty brass or low carbon steel working electrodes. All tests also had both admiralty and LCS coupons in contact with the solution.
Each solution was tested with and without addition of sodium hypochlorite (added after 1 hour exposure). In a separate, but otherwise identical experiment, clean low carbon steel working electrodes were used in place of the sulfide-exposed admiralty brass, but the sulfide-exposed brass coupons were present as a source of copper. At the conclusion of the experiment, a sample of the supernatant solution was taken and analyzed for copper. Analyses were taken with and without filtration through a 0.2 micron membrane filter.
TABLE VIII
Admiralty Low Carbon Brass Steel NaOCI Corrosion Corrosion Copper (ppm) Azole (ppm) Rate (mpy) Rate (mpy) Unfiltered Filtered none 0 1.01 5.4 0.354 0.103 3 ppm TTA 0 0.07 1.2 0.014 0.014 3 ppm CI-TTA 0 0.06,0.05 1.0 0.005 0.004 none 2.0 2.09 5.2 0.417 0.059 3 ppm TTA 2.0 0.45 2.6 0.133 0.066 3 ppm CI-TTA 2.0 0.13 1.7 0.086 0.039 Example 9 A synthetic sea water was formulated from deionized water plus 1010 ppm Ca as CaC03, 5226 ppm Mg (as CaC03), 18971 ppm CI, 2660 ppm S04, 117 ppm M-alkalinity (as CaC03), 5 ppm azole (see below), and the pH was maintained at 7.8 with a blended mixture of air and carbon dioxide at 100°F.
Admiralty brass electrodes were exposed to this medium for 1 hour and then they were transferred to identical water with no azole present.
Electrochemical corrosion rates were measured for 18 hours.
TABLE IX
Mean Electrochemical Azole Corrosion Rate (mpy) Benzotriazole 40 5-Butylbenzotriazole 15 Tolyltriazole 6 Chloro-tolyltriazole 3.2 Example 10 Sodium hypochlorite (12.2%, 204.9 g, 0.336 mol) was added over 90 minutes to a stirring slurry of benzotriazole (40 g, 0.336 mol) in 30 g of water at room temperature. Following the addition, the reaction mixture was held at 45-50°C for one hour. Upon cooling, a precipitate formed. A
clear yellow solution was obtained after adjusting the pH to 11. The final product was analyzed by LC/MS and ~3C and ~H NMR and found to be composed of 54.6% chloro-benzotriazole (CI-BZT), 23.9% residual benzotriazole, and 21.5% di-chloro-benzotriazole (di-CI-BZT).
Example 11 Bromine (12.5 g, 0.078 mol) was added to a stirring slurry of TTA
(10 g, 0.075 mol) in 66 g of water in a reactor protected from light, while maintaining the temperature at <25°C. After the addition, the reaction mixture was held at 35-40°C for one hour. Upon cooling, adjusting the pH
to 11-12 did not produce a clear solution. The small amount of precipitate that formed upon standing was removed by filtration, the pH of the filtrate was adjusted to neutral, and the resulting precipitate filtered. This solid was characterized by LC/MS and ~ 3C and ~ H NMR and found to be composed of 90.5% bromo-tolyltriazole (Br-TTA), 4.9% residual TTA, and 4.2% di-bromo-TTA.
Example 12 The method of Example 8 was followed, using samples from Examples 2, 11 and 12 at 1 to 4 ppm total actives. The following were the 18 hour averaged electrochemical corrosion rates:
TABLE X
Average Conc. Corrosion Azole (ppm) Source NaOCI Rate (mpy) CI-BZT 1 Ex.11 none 0.21 2 0.09 4 0.03 CI-BZT 1 Ex. 11 2 ppm 0.55 2 0.25 4 0.09 CI-TTA 1 Ex.2 none 0.14 2 0.09 4 0.08 CI-TTA 1 Ex. 2 2 ppm 0.58 2 0.24 4 0.09 Br-TTA 1 Ex.12 none 0.17 2 0.11 4 0.07 Br-TTA 1 Ex. 12 2 ppm 0.45 2 0.16 4 0.09 TTA 1 none 0.13 2 0.14 4 (n/a) TTA 1 2 ppm (n/a) 2 0.45 4 0.27 The above t the halo-benzotriazoles examples of the show tha present ion inhibitorseven in the presence invention are effective corros of chlorine.
While the present invention has been described with respect to particular embodiments thereof, it is apparent that numerous other forms and modifications of this invention will be obvious to those skilled in the art. The appended claims and this invention generally should be 5 construed to cover all such obvious forms and modifications which are within the true spirit and scope of the present invention.
The present inventors have discovered that halo-benzotriazoles such as chloro-tolyltriazole and bromo-tolyltriazole are more effective than tolyltriazole in inhibiting corrosion in aqueous systems. The halo-benzotriazoles are substantially more effective than tolyltriazole in the presence of chlorine. Furthermore, when chloro-tolyltriazole is exposed to chlorine, an objectionable odor does not form and the quantity of chlorine that is required to produce a residual in the aqueous system is reduced.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
The present inventors have discovered that halo-benzotriazoles such as chloro-tolyltriazole and bromo-tolyltriazole are more effective than tolyltriazole in inhibiting corrosion in aqueous systems. The halo-benzotriazoles are substantially more effective corrosion inhibitors than tolyltriazole in the presence of chlorine. The efficacy of the present invention is surprising given the prior knowledge that chlorination of an azole treated system leads to degradation of corrosion inhibition performance. Furthermore, the halo-benzotriazoles of the present invention are not subject to the formation of objectionable odors when exposed to chlorine as is tolyltriazole, the quantity of chlorine that is required to produce a residual in the aqueous system is notably reduced in comparison to systems treated with tolyltriazole, and the treatment is effective in the presence of sulfide ions.
It was discovered that the ex-situ preparation of a halo-benzotriazole provided a corrosion inhibitor which exhibited a surprising and unexpected activity when compared to a treatment comprising a mixture of a benzotriazole and a halogen. The results of the studies of the present invention clearly show that mere mixtures of a benzotriazole .
and a halogen in a cooling water system do not provide the corrosion inhibiting effect of the addition of a halo-benzotriazole prepared ex-situ.
As further evidence of the surprising activity of an ex-situ prepared halo-benzotriazole, the present inventors found that the chlorine demand of a system treated in accordance with the present invention was significantly reduced. Furthermore, in systems treated in accordance with the present invention the objectionable odor common to systems treated with a triazole and halogen was absent.
The halo-benzotriazoles of the present invention can include chloro-, fluoro-, bromo- and iodo- as well as haloalkyl (trifluoromethyl) benzotriazoles. Preferred are chloro-tolyltriazole and bromo-tolyltriazole.
The azole may include tolyltriazole, benzotriazole, butylbenzotriazole, mercaptobenzothiazole and the like. The preferred azole is tolyltriazole.
The preferred benzotriazole, tolyltriazole, is such that the preferred halo-benzotriazole is chloro-tolyltriazole or bromo-tolyltriazole. The preparation of the preferred chloro-tolyltriazole can be by any suitable means. Examples of preparation methods include but are not limited to reactions with hypochlorite, N-chlorosuccinimide, and other chlorinating agents. A method of forming chloro-tolyltriazole is through the reaction of tolyltriazole with hypochlorite, in which case the final reaction mixture is an alkaline solution that can be used with or without further modification. Alternatively, chloro-tolyltriazole can be formed through the reaction of tolyltriazole with hypochlorite in acetic acid solutions, (i.e., hypochlorous acid) and then isolated as a solid. For convenience of application, the solid can be redissolved in alcohols such as methanol or 2-propanol, aqueous solutions of alcohols or strong alkaline solutions such as sodium hydroxide or potassium hydroxide.
The preparation of bromo-tolyltriazole can be by any suitable means. Examples of preparation methods include but are not limited to reactions with hypobromite, bromine, and other brominating agents. A
method of forming bromo-tolyltriazole is through the reaction of tolyltria-zole with bromine in an aqueous solution and then isolating it as a solid.
For convenience of application, the solid can be dissolved in a strong alkaline solution such as sodium hydroxide or potassium hydroxide.
In treating an aqueous system in accordance with the present invention, the chloro-tolyltriazole (hereinafter CI-TTA) is preferably fed continuously to the water. A preferred treatment concentration ranges from about 0.5 to 10 parts per million, most preferably at about 3 parts per million. Continuous feed is not, however, a requirement. The chloro-tolyltriazole can be fed at a concentration sufficient to form a protective film and thereafter feed can be discontinued for extended periods of time.
The halo-benzotriazole treatment of the present invention can be used in combination with other corrosion and/or deposit inhibiting treatments known in the art including but not limited to phosphates, phosphonates, acrylic homo- and copolymers, chelants, and oximes.
The present invention will now be further described with reference to a number of specific examples which are to be regarded solely as illustrative and not as restricting the scope of the present invention.
Examples Example 1 The preparation of the solid samples was as follows:
Tolyltriazole (hereinafter TTA) (30 g, 0.225 mol) was dissolved in aqueous acetic acid (60 mL, 1:1 ratio) by heating to 32°C. Sodium hypochlorite (366 g, 5.25% sodium hypochlorite as a bleach solution) was added while maintaining the reaction temperature at ~ 20°C.
Following the addition, the reaction mixture was stirred at room temperature for 24 hours. A sticky precipitate formed during this time.
The solid was filtered and taken into methylene chloride. The solid that did not dissolve was filtered and identified as a mixture of CI-TTA with minor amounts of TTA and dichloro-tolyltriazole (di-CI-TTA). The methylene chloride was removed to obtain a yellow solid which was identified as a mixture of CI-TTA with minor amounts of di-CI-TTA.
Unless noted, this latter solid was used in the following Examples.
Example 2 A slurry of TTA (50 g, 0.376 mol) in 25 g of water was warmed to 35°C. Sodium hypochlorite (27.9 g, 0.376 mol, added as 226.8 g of a 12.3% sodium hypochlorite solution) was added over a period of 2 hours.
After the addition, the reaction was kept at 45°C for one hour.
During the addition the pH of the reaction mixture increased to 12 and the solids dissolved. The final product was analyzed by ~ H and ~3C NMR and LC-UV and found to be composed of 81.9% CI-TTA, 8.8% residual TTA, and 9.3% di-CI-TTA based on the relative areas in the UV spectra.
On dilution to 1 to 100 ppm azole, with or without pH adjustment to about 7.2, there was no odor from the halo-benzotriazole solution of the present invention.
5 Example 3 In the schemes below, TTA was present at 100 ppm, in contrast to Example 2 where the initial slurry contained about 200,000 ppm. "x"
denotes a stoichiometric ratio.
Scheme 1 pH=7 slow TTA+1.1xNaOCI<---------->odorous solution --------->CI-TTA(ppt odorous) Scheme 2 pH=11.8 pH=8.2 TTA+1.1xNaOCI<------------->solution, no odor----------->CI-TTA(ppt odorous) Example 4 CI-TTA, prepared as a solid according to Example 1, was dissolved in methanol and charged to a simulated cooling water solution. The solution contained 319 ppm Ca (calculated as CaC03), 7 ppm Mg (calculated as CaC03), 190 ppm NaHC03, 882 ppm Na2S04, 1184 ppm NaCI, 5 ppm CI-TTA, and 2.4 ppm of hydroxyethylidene diphosphonic acid (HEDP). Hypochlorite was absent. The solution was maintained at 120°F by an admiralty brass heater tube and at pH=7.2 to 7.5 by a pH
controller equipped to feed sulfuric acid on demand. The solution was recirculated past the heater and past both admiralty and copper/nickel alloy corrosion rate meters (CRM). After 1 hour the solution was drained and replaced by an identical solution with no CI-TTA. This solution was fed to overflow which replenished the system with fresh solution at a rate , of about 4% by volume per hour. This system was maintained under these conditions continuously until the bright admiralty tube was tarnished, at which point the experiment was terminated. Comparisons were made to identical experiments with TTA and benzotriazole.
TABLEI
Admiralty Tube Appearance Pretreatment 40 hours 94 hours 336 hours CI-TTA Bright Bright Tarnished TTA Bright Tarnished Benzotriazole Tarnished TABLE II
Admiralty CuINi Corrosion Rate (mpy) Corrosion Rate (mpy) Pretreatment 40 hrs. 94 hrs. 336 hrs. 40 hrs. 94 hrs. 336 hrs.
C I-TTA 0. 2 0. 3 0. 5 0. 7 0.4 0. 8 TTA <0.1 2.2 * N/A 5.2 Benzotriazole 1.3 * * 2.0 *Experiment previously terminated.
Example 5 Corrosion tests were carried out in the apparatus described in Example 4 with water containing 500 ppm Ca, 250 ppm Mg, 25 ppm Malk, 15 ppm o-P04, 3 ppm tetrapotassium pyrophosphate, 10 ppm of a 3:1, low molecular weight, acrylic acid/allyl 2-hydroxypropyl sulfonate ether copolymer, 2.4 ppm HEDP, a 3ppm of either CI-TTA or TTA. The pH was maintained at 7.2 with a blended mixture of air and carbon dioxide at 120°
F for 18 hours. Electrochemical corrosion rates were measured using admiralty brass (ADM) and low carbon steel (LCS) working electrodes. All tests also had both admiralty and LCS coupons in contact with the solution. The method differed from Example 4 in that the azole was fed continuously at 3 ppm during these experiments. The azole was supplied by dissolving the solid in potassium hydroxide solution and then diluting it into the feedwater for the system. Each experiment was duplicated: once with an admiralty brass heated tube, and once with a low carbon steel heated tube. Corrosion rates were measured as in Example 4 from admiralty and LCS working electrodes, and by weight changes of admiralty and LCS coupons. Rates for the coupons were measured for the initial day of each run, and a "differential" rate was calculated for the remaining days of the run by offsetting the initial rate from the overall rate.
TABLE III
CRM Corrosion Rates: Values at end of six days (mpy) LCS Heated Surface ADM Heated Surface CI-TTA TTA CI-TTA TTA
LCS 0.2 0.4 0.45 0.75 ADM 0.00 0.00 0.05 0.07 TABLE IV
Gravimetric Coupon Corrosion Rates (mpy) (First day and differential rates) LCS Heated Surface ADM Heated Surface CI-TTA TTA CI-TTA TTA
Day 1 LCS 4.6 3.0 3.4 2.9 Day 6 LCS (diff.) 0.25 0.33 0.25 0.25 Day 1 ADM 1.9 2.1 1.6 1.8 Day 6 ADM (diff.) 0.00 0.20 0.00 0.10 Example 6 The method of Example 5 was followed, except a solution of sodium hypochlorite was added after 20 hours and continued for an additional 72 hours. The feed rate of the sodium hypochlorite was controlled to produce a "chlorine residual" of about 0.1 to 0.3 ppm as C12 using a standard DPD
spectrophotometric test on the recirculating water. For the experiment with CI-TTA, the feed rate of the sodium hypochlorite was about 30% of that , required for TTA. For TTA, the characteristic odor was detected immediately after the first hypochlorite was added. With CI-TTA, there was no odor upon initiating hypochlorite addition, and only a trace was sensed just prior to concluding the four day run.
TABLE V
CRM Corrosion Rates: Values at 90 hour mark (mpy) LCS Heated Surface CI-TTA TTA
LCS 0.5 2.3 ADM 0.06 0.02 TABLE VI
Gravimetric Corrosion Rates (mpy) LCS Heated Surface CI-TTA TTA
Day 2 to 4 LCS 1.1 2.6 Day 4 LCS (diff.) 0.4 1.4 Day2to4ADM 1.1 1.2 Day 4 ADM (diff.) 0.15 0.85 Example 7 Solutions of azole at 6 ppm were made in deionized water, and the 5 pH was adjusted to 7Ø Cu+2 ion was added (0.1 ppm from cupric sulfate) and the pH was again adjusted to 7Ø A sample was digested with nitric acid, analyzed for copper, and a second sample was filtered (0.2 micron pore size), digested, and analyzed for copper. The ratio was expressed as "% soluble Cu":
TABLE VII
Sample % Soluble Cu TTA+N a0 C I 90 Example 8 Admiralty brass corrosion coupons and working electrodes were coated with a sulfide layer by exposing the metal to a sodium sulfide solution for 18 hours. These samples were rinsed and dried. Corrosion tests were carried out in aqueous solutions in stirred beakers containing 500 ppm Ca, 250 ppm Mg, 25 ppm Malk, 15 ppm o-P04, 3 ppm tetra-potassium pyrophosphate, 10 ppm of a 3:1, low molecular weight, acrylic acid/allyl 2-hydroxypropyl sulfonate ether copolymer, 2.4 ppm HEDP, and the pH was maintained at 7.2 with a blended mixture of air and carbon dioxide at 120°F for 18 hours. Electrochemical corrosion rates were meas-ured using admiralty brass or low carbon steel working electrodes. All tests also had both admiralty and LCS coupons in contact with the solution.
Each solution was tested with and without addition of sodium hypochlorite (added after 1 hour exposure). In a separate, but otherwise identical experiment, clean low carbon steel working electrodes were used in place of the sulfide-exposed admiralty brass, but the sulfide-exposed brass coupons were present as a source of copper. At the conclusion of the experiment, a sample of the supernatant solution was taken and analyzed for copper. Analyses were taken with and without filtration through a 0.2 micron membrane filter.
TABLE VIII
Admiralty Low Carbon Brass Steel NaOCI Corrosion Corrosion Copper (ppm) Azole (ppm) Rate (mpy) Rate (mpy) Unfiltered Filtered none 0 1.01 5.4 0.354 0.103 3 ppm TTA 0 0.07 1.2 0.014 0.014 3 ppm CI-TTA 0 0.06,0.05 1.0 0.005 0.004 none 2.0 2.09 5.2 0.417 0.059 3 ppm TTA 2.0 0.45 2.6 0.133 0.066 3 ppm CI-TTA 2.0 0.13 1.7 0.086 0.039 Example 9 A synthetic sea water was formulated from deionized water plus 1010 ppm Ca as CaC03, 5226 ppm Mg (as CaC03), 18971 ppm CI, 2660 ppm S04, 117 ppm M-alkalinity (as CaC03), 5 ppm azole (see below), and the pH was maintained at 7.8 with a blended mixture of air and carbon dioxide at 100°F.
Admiralty brass electrodes were exposed to this medium for 1 hour and then they were transferred to identical water with no azole present.
Electrochemical corrosion rates were measured for 18 hours.
TABLE IX
Mean Electrochemical Azole Corrosion Rate (mpy) Benzotriazole 40 5-Butylbenzotriazole 15 Tolyltriazole 6 Chloro-tolyltriazole 3.2 Example 10 Sodium hypochlorite (12.2%, 204.9 g, 0.336 mol) was added over 90 minutes to a stirring slurry of benzotriazole (40 g, 0.336 mol) in 30 g of water at room temperature. Following the addition, the reaction mixture was held at 45-50°C for one hour. Upon cooling, a precipitate formed. A
clear yellow solution was obtained after adjusting the pH to 11. The final product was analyzed by LC/MS and ~3C and ~H NMR and found to be composed of 54.6% chloro-benzotriazole (CI-BZT), 23.9% residual benzotriazole, and 21.5% di-chloro-benzotriazole (di-CI-BZT).
Example 11 Bromine (12.5 g, 0.078 mol) was added to a stirring slurry of TTA
(10 g, 0.075 mol) in 66 g of water in a reactor protected from light, while maintaining the temperature at <25°C. After the addition, the reaction mixture was held at 35-40°C for one hour. Upon cooling, adjusting the pH
to 11-12 did not produce a clear solution. The small amount of precipitate that formed upon standing was removed by filtration, the pH of the filtrate was adjusted to neutral, and the resulting precipitate filtered. This solid was characterized by LC/MS and ~ 3C and ~ H NMR and found to be composed of 90.5% bromo-tolyltriazole (Br-TTA), 4.9% residual TTA, and 4.2% di-bromo-TTA.
Example 12 The method of Example 8 was followed, using samples from Examples 2, 11 and 12 at 1 to 4 ppm total actives. The following were the 18 hour averaged electrochemical corrosion rates:
TABLE X
Average Conc. Corrosion Azole (ppm) Source NaOCI Rate (mpy) CI-BZT 1 Ex.11 none 0.21 2 0.09 4 0.03 CI-BZT 1 Ex. 11 2 ppm 0.55 2 0.25 4 0.09 CI-TTA 1 Ex.2 none 0.14 2 0.09 4 0.08 CI-TTA 1 Ex. 2 2 ppm 0.58 2 0.24 4 0.09 Br-TTA 1 Ex.12 none 0.17 2 0.11 4 0.07 Br-TTA 1 Ex. 12 2 ppm 0.45 2 0.16 4 0.09 TTA 1 none 0.13 2 0.14 4 (n/a) TTA 1 2 ppm (n/a) 2 0.45 4 0.27 The above t the halo-benzotriazoles examples of the show tha present ion inhibitorseven in the presence invention are effective corros of chlorine.
While the present invention has been described with respect to particular embodiments thereof, it is apparent that numerous other forms and modifications of this invention will be obvious to those skilled in the art. The appended claims and this invention generally should be 5 construed to cover all such obvious forms and modifications which are within the true spirit and scope of the present invention.
Claims (12)
1. A method of inhibiting corrosion of metal surfaces contacted by an aqueous system being treated with a halogen comprising adding to said aqueous system being treated with a halogen an amount effective for the purpose of inhibiting corrosion of a halo-benzotriazole prepared ex-situ said aqueous system in combination with at least one other aqueous system treatment material.
2. The method of claim 1 wherein said other aqueous system treatment material comprises corrosion inhibiting treatments, deposit inhibiting treatments and mixtures thereof.
3. The method of claim 2 wherein said corrosion inhibiting treatment, deposit inhibiting treatments and mixtures thereof comprise phosphates, phosphonates, acrylic monopolymers, acrylic copolymers, chelants, oximes, biocides and mixtures thereof.
4. The method of claim 1 wherein said halo-benzotriazole comprises mono-halo-benzotriazoles, di-halo-benzotriazoles and. mixtures thereof.
5. A method of forming a corrosion inhibiting layer on a metal surface in contact with an aqueous system being treated with a halogen comprising adding to said aqueous system an amount effective for the purpose of inhibiting corrosion of a halo-benzotriazole prepared ex-situ said aqueous system in combination with at least one other aqueous system treatment material.
6. The method of claim 5 wherein said other aqueous system treatment material comprises corrosion inhibiting treatments, deposit inhibiting treatments and mixtures thereof.
7. A method of claim 6 wherein said corrosion inhibiting treatments, deposit inhibiting treatments and mixtures thereof comprise phosphates, phosphonates, acrylic monopolymers, acrylic copolymers, chelants, oximes, biocides and mixtures thereof.
8. The method of claim 5 wherein said halo-benzotriazole comprises mono-halo-benzotriazoles, di-halo-benzotriazoles and mixtures thereof.
9. A method of inhibiting copper ion transport in an aqueous system being treated with a halogen in contact with metal surfaces including copper comprising adding to said aqueous system an amount effective for the purpose of inhibiting corrosion of a halo-benzotriazole prepared ex-situ said aqueous system in combination with at least one other aqueous system treatment material.
10. The method of claim 9 wherein said other aqueous system treatment material comprises corrosion inhibiting treatments, deposit inhibiting treatments and mixtures thereof.
11. The method of claim 10 wherein said corrosion inhibiting treatments, deposit inhibiting treatments and mixtures thereof comprise phosphates, phosphonates, acrylic monopolymers, acrylic copolymers, chelants, oximes, biocides and mixtures thereof.
12. The method of claim 9 wherein said halo-benzotriazole comprises mono-halo-benzotriazoles, di-halo-benzotriazoles and mixtures thereof.
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