CA2190884A1 - Technique for manufacturing integrated optics devices - Google Patents
Technique for manufacturing integrated optics devicesInfo
- Publication number
- CA2190884A1 CA2190884A1 CA002190884A CA2190884A CA2190884A1 CA 2190884 A1 CA2190884 A1 CA 2190884A1 CA 002190884 A CA002190884 A CA 002190884A CA 2190884 A CA2190884 A CA 2190884A CA 2190884 A1 CA2190884 A1 CA 2190884A1
- Authority
- CA
- Canada
- Prior art keywords
- sample
- mask
- substrate
- slab
- optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/124—Geodesic lenses or integrated gratings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/12007—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/132—Integrated optical circuits characterised by the manufacturing method by deposition of thin films
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/136—Integrated optical circuits characterised by the manufacturing method by etching
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12083—Constructional arrangements
- G02B2006/12107—Grating
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
- G02B2006/12173—Masking
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Integrated Circuits (AREA)
Abstract
The present disclosure describes a method for fabrication of integrated optic waveguide devices utilizing photosensitive material on a variety of substrate materials. The method comprises the steps of a) making a sample that consists of a slab layer on a substrate; and b) depositing a thin layer of photosensitive material on the sample; and c) placing a photolithography mask, having an opening corresponding to an optical component, device circuit layout, on the photosensitive layer after the step (b); and d) exposing the sample with ultraviolet light to increase the refractive index of the photosensitive materials in the opening regions of the mask, and e) removing themask. The desired integrated optic component, device or circuit is formed in the slab layer due to an increase in the refractive index of the photosensitive layer on its top.
Description
A Technique for Manufacturing Integrated Optics Devices Field of The Invention This invention relates generally to the Integrated Optic Devices and particularly manufacturing of hybrid integrated circuits made of different materials.
s Background of the invention.
Optical signals are used for tr~n.cmi~.cion of information by means of optical fibers and are processed by optical devices in optics domain. Integrated optical (IO) devices are used for processing optical signals. The basis of integrated optic (IO) devices are optical waveguides that can guide the light. According to the laws of nature, light tends to stay prop~ting in the higher refractive index region of the propagation media. This is the o~el~lhlg principle of optical waveguides. An optical waveguide consists of at least two regions called core and cl~d-lin~ The light is guided in the core region the effective refractive index of which is slightly larger than the refractive index of the cl~d~ling~
Optical waveguides are in the forrn of 1) Slab waveguides, in which the core is sandwiched between two cl~d-~in~c above and below (see for example Fig. 1); 2) Channel waveguides, in which the core is surrounded by the cl;~d-1inf~ on four sides 3) Ridged waveguide, which is similar to the channel waveguide but the core is surrounded by air on three sides. Optical waveguides and devices are described, for example, in "Glass Integrated Optics": Ed. by S. I. Najafi, (Artech House, 92) and in "Guided-Wave 20 Optoelectronic " Ed. by Tamir et al (Plenum Press, 1995), which are incorporated here as references.
Channel waveguides are normally used in IO devices. Fabrication of a channel waveguide comprises steps of evaporation, photolithography, and etching or diffusion.
For example, to make a ridge or channel waveguide in a semiconductor substrate, one 2s has to first make a mask; then deposit a layer of m~Cl!ing material on the substrate; then coat this layer with a photoresist material; use photolithography to define the channel on the mask; etch the mask to define the channel in the mask; and etch the substrate to achieve a waveguide. Costly equipment such as evaporators~ reactive ion etchers, mask aligners and so on are needed. These processes are also very sensitive and the samples 30 must be handled very carefully in order to yield a functional device. Moreover devices made by these methods can show a high optical loss due either to the rough wall surface or to intrinsic loss of the material. Furthermore, it is very difficult to etch or diffuse in some materials to make integrated optics devices.
One sllccç~ful approach for making low-cost channel waveguides is to use the 3s photosensitivity effect in photosensitive materials such as sol-gel glasses. In this method the refractive index of the photosensitive material is increased by exposure to ultra violet - 2 1 90~84 - (W) radiation. This method is described in reference [S] for manufacturing silica-based waveguides using sol-gel. However, fabrication of channel waveguides in other materials is still very costly and time consuming. Moreover, making channel waveguides in some materials, such as PLZT, is very difficult because it is hard to etch them.
5 Therefore, there is a need in the art for a simpler fabrication technique with lower fabrication cost.
It is an object of this invention to provide a cost effective fabrication method for making channel waveguides on any substrate material using photosensitive materials such as sol-gel glasses.
o Summary of the invention The present invention provides a technique to make channel waveguides on variousmaterials using photosensitive materials such as sol-gel glasses. According to the present invention, there is provide a method for making optical waveguide devices comprising steps of 5 a) cleaning a substrate, having refractive index nl, by means of a cleaning agent;
b) placing a slab layer (12) on the substrate, said slab layer having refractive index n2 higher than refractive index of said substrate nl; and c) placing a layer (13) of a photosensitive material, such as sol-gel glass; having refractive index n3 lower than refractive index of said slab layer n2; and 20 d) pre-baking the said structure in section c; and e) placing a photolithography mask on top of the photosensitive material, having a window opening; and f) exposing the mask to ultra violet (UV) radiation so that W can penetrate through the opening window into the photosensitive material; and 2s g) removing the mask.
The refractive index of the photosensitive material, 13, under the opening window of the mask, is increased after said step (f). An increase in the refractive index of the said area increases the effective refractive index of the said slab 12 and therefore a channel waveguide is formed in the said slab layer under this area.
30 This technique requires fewer fabrication steps and does not use expensive equipment, said in the introduction. The method facilitate to fabricate low-cost, low-loss and robust integrated optic devices from both semiconductors and dielectric materials or any material that one desires to make a channel waveguide. In the following, a detailed description of method is described fully for a glass substrate. One can use the same 35 method for other substrate materials.
- Brief Description of Drawings:
Fig. 1 is a view in perspective of one embodiment of an optical slab layer on a substrate according to the present invention.
Fig. 2. is a view in perspective of one embodiment of the slab in Fig. 1 with a thin sol-gel film deposited on its top according to the present invention.
Fig. 3 is a view in perspective of one embodiment of the structure in Fig. 2 of the present o invention, covered by a contact mask, having a window open, exposing with an ultra violet light, according to the present invention.
Fig. 4 is a lateral cross section view of the optical waveguide made according to the present invention. Also there is shown the guided mode .
Fig. 5 is a view of one embodiment of an optical waveguide grating device.
Fig. 6. is a view of one embodiment of an optical waveguide grating device, according to the present invention.
Detailed Description:
The structure, its one embodiment is shown in Fig. 1 and is herein referred to as the sample. In Fig. 1 there is shown an embodiment of the sample that consists of a substrate and a slab layer, having refractive index n2, equal or larger than substrate's refractive index n,. Substrate and slab can be selected from various materials. The slab should be thick enough such that light cannot be guided in the slab itself in a pure optical mode.
In Fig. 2 there is shown an embodiment of the sample that is deposited with a thin film of photosensitive material having refractive index n3 lower than the refractive index of the slab n2. Depending on the photosensitive material, the sample is pre-baked.
In Fig. 3 there is shown an embodiment of the sample that is covered by a photolithography mask, having an opening corresponding to the layout of the designated optical circuit. Also shown in Fig. 3 is the exposure of the sample to ultraviolet light through an opening in a photolithography mask to increase the refractive index of the thin film where it is desired to have a channel waveguide in slab layer. The mask is removed after the exposure and the sample is post-baked.
In Fig 4. there is shown a lateral embodiment of the channel waveguide is made by the said fabrication method. Shown also in Fig. 4 is the shape of the guided optical mode 2 1 90~84 - under the photosensitive area, refractive index of which has been increased by the said ultraviolet exposure.
In a first embodiment of the sample shown in Fig. 1, 2, 3, and 4, the substrate is made of glass. The slab can be part of the ~ub~ le or separately deposited on the substrate. To 5 make a slab on a glass substrate one can employ ion exchange to produce a layer of slab with a refractive index n2 higher than the ~ubsll~le glass nl. The ion exchanged process has been described in reference 2. The deposition of photosensitive sol-gel can be done either by spin- or by dip-coating as explained in reference 5. The sample is pre-baked to promote solvent evaporation and to harden the deposited film. The film contains a 10 monomer that polymerizes when it is exposed to ultraviolet light, thus increasing locally the refractive index such that n4>n3. The sample is therefore exposed to ultraviolet light.
Finally, the sample is post-baked to stabilize the film. The increase in the refractive index of the sol-gel thin film augments the effective index in the slab layer and produces a channel waveguide.
In another embodiment of the sample shown in Fig. 1, 2, 3, and 4, the substrate is made of semiconductor, electro-optic material or any other desirable material, and the slab is made from the same material as substrate or any other material that one desires to make a channel waveguide device from. The photosensitive layer is sol-gel glass or other 20 photosensitive material.
Different integrated optic devices can be made with similar processes according to the present invention. Optical grating-~si~te~ devices are important constituents ofintegrated optic devices. In Fig. 5 there is shown one embodiment of a sample according 25 to the present invention. The embodiment comprises a substrate, a slab layer and a grating structure in the slab; said gratings being defined by the Bragg resonant equation which is:
2N (1) where A is the period of the gratings, ~ is wavelength of the intended o~ aling optical 30 signal, and N is the effective index of the channel waveguide in Fig. 5. A method for making the grating waveguide is described in the US patent by S. I. Najafi et al (1992) which is incorporated here as a reference. A mask with an straight opening, corresponding to an straight waveguide layout, is placed perpendicularly over the sample with grating in Fig. S; the sample is exposed with a UV radiation. Therefore a straight 35 channel waveguide with grating is formed. The said gating device might be used as an optical filter. In Fig. 6 there is shown a cross section view of one embodiment of the sample with a grating.
References:
1. S. I. Najafi, K. O. Hill, J. F. Curri, "Optical waveguide device and method for making such device," United States Patent, Patent number, 5,080,503, Date of Patent, Jan. 14, 1992.
5 2. "Introduction to Glass Integrated Optics", Editor: Najafi, Publisher: Artech House, Boston, 1992.
s Background of the invention.
Optical signals are used for tr~n.cmi~.cion of information by means of optical fibers and are processed by optical devices in optics domain. Integrated optical (IO) devices are used for processing optical signals. The basis of integrated optic (IO) devices are optical waveguides that can guide the light. According to the laws of nature, light tends to stay prop~ting in the higher refractive index region of the propagation media. This is the o~el~lhlg principle of optical waveguides. An optical waveguide consists of at least two regions called core and cl~d-lin~ The light is guided in the core region the effective refractive index of which is slightly larger than the refractive index of the cl~d~ling~
Optical waveguides are in the forrn of 1) Slab waveguides, in which the core is sandwiched between two cl~d-~in~c above and below (see for example Fig. 1); 2) Channel waveguides, in which the core is surrounded by the cl;~d-1inf~ on four sides 3) Ridged waveguide, which is similar to the channel waveguide but the core is surrounded by air on three sides. Optical waveguides and devices are described, for example, in "Glass Integrated Optics": Ed. by S. I. Najafi, (Artech House, 92) and in "Guided-Wave 20 Optoelectronic " Ed. by Tamir et al (Plenum Press, 1995), which are incorporated here as references.
Channel waveguides are normally used in IO devices. Fabrication of a channel waveguide comprises steps of evaporation, photolithography, and etching or diffusion.
For example, to make a ridge or channel waveguide in a semiconductor substrate, one 2s has to first make a mask; then deposit a layer of m~Cl!ing material on the substrate; then coat this layer with a photoresist material; use photolithography to define the channel on the mask; etch the mask to define the channel in the mask; and etch the substrate to achieve a waveguide. Costly equipment such as evaporators~ reactive ion etchers, mask aligners and so on are needed. These processes are also very sensitive and the samples 30 must be handled very carefully in order to yield a functional device. Moreover devices made by these methods can show a high optical loss due either to the rough wall surface or to intrinsic loss of the material. Furthermore, it is very difficult to etch or diffuse in some materials to make integrated optics devices.
One sllccç~ful approach for making low-cost channel waveguides is to use the 3s photosensitivity effect in photosensitive materials such as sol-gel glasses. In this method the refractive index of the photosensitive material is increased by exposure to ultra violet - 2 1 90~84 - (W) radiation. This method is described in reference [S] for manufacturing silica-based waveguides using sol-gel. However, fabrication of channel waveguides in other materials is still very costly and time consuming. Moreover, making channel waveguides in some materials, such as PLZT, is very difficult because it is hard to etch them.
5 Therefore, there is a need in the art for a simpler fabrication technique with lower fabrication cost.
It is an object of this invention to provide a cost effective fabrication method for making channel waveguides on any substrate material using photosensitive materials such as sol-gel glasses.
o Summary of the invention The present invention provides a technique to make channel waveguides on variousmaterials using photosensitive materials such as sol-gel glasses. According to the present invention, there is provide a method for making optical waveguide devices comprising steps of 5 a) cleaning a substrate, having refractive index nl, by means of a cleaning agent;
b) placing a slab layer (12) on the substrate, said slab layer having refractive index n2 higher than refractive index of said substrate nl; and c) placing a layer (13) of a photosensitive material, such as sol-gel glass; having refractive index n3 lower than refractive index of said slab layer n2; and 20 d) pre-baking the said structure in section c; and e) placing a photolithography mask on top of the photosensitive material, having a window opening; and f) exposing the mask to ultra violet (UV) radiation so that W can penetrate through the opening window into the photosensitive material; and 2s g) removing the mask.
The refractive index of the photosensitive material, 13, under the opening window of the mask, is increased after said step (f). An increase in the refractive index of the said area increases the effective refractive index of the said slab 12 and therefore a channel waveguide is formed in the said slab layer under this area.
30 This technique requires fewer fabrication steps and does not use expensive equipment, said in the introduction. The method facilitate to fabricate low-cost, low-loss and robust integrated optic devices from both semiconductors and dielectric materials or any material that one desires to make a channel waveguide. In the following, a detailed description of method is described fully for a glass substrate. One can use the same 35 method for other substrate materials.
- Brief Description of Drawings:
Fig. 1 is a view in perspective of one embodiment of an optical slab layer on a substrate according to the present invention.
Fig. 2. is a view in perspective of one embodiment of the slab in Fig. 1 with a thin sol-gel film deposited on its top according to the present invention.
Fig. 3 is a view in perspective of one embodiment of the structure in Fig. 2 of the present o invention, covered by a contact mask, having a window open, exposing with an ultra violet light, according to the present invention.
Fig. 4 is a lateral cross section view of the optical waveguide made according to the present invention. Also there is shown the guided mode .
Fig. 5 is a view of one embodiment of an optical waveguide grating device.
Fig. 6. is a view of one embodiment of an optical waveguide grating device, according to the present invention.
Detailed Description:
The structure, its one embodiment is shown in Fig. 1 and is herein referred to as the sample. In Fig. 1 there is shown an embodiment of the sample that consists of a substrate and a slab layer, having refractive index n2, equal or larger than substrate's refractive index n,. Substrate and slab can be selected from various materials. The slab should be thick enough such that light cannot be guided in the slab itself in a pure optical mode.
In Fig. 2 there is shown an embodiment of the sample that is deposited with a thin film of photosensitive material having refractive index n3 lower than the refractive index of the slab n2. Depending on the photosensitive material, the sample is pre-baked.
In Fig. 3 there is shown an embodiment of the sample that is covered by a photolithography mask, having an opening corresponding to the layout of the designated optical circuit. Also shown in Fig. 3 is the exposure of the sample to ultraviolet light through an opening in a photolithography mask to increase the refractive index of the thin film where it is desired to have a channel waveguide in slab layer. The mask is removed after the exposure and the sample is post-baked.
In Fig 4. there is shown a lateral embodiment of the channel waveguide is made by the said fabrication method. Shown also in Fig. 4 is the shape of the guided optical mode 2 1 90~84 - under the photosensitive area, refractive index of which has been increased by the said ultraviolet exposure.
In a first embodiment of the sample shown in Fig. 1, 2, 3, and 4, the substrate is made of glass. The slab can be part of the ~ub~ le or separately deposited on the substrate. To 5 make a slab on a glass substrate one can employ ion exchange to produce a layer of slab with a refractive index n2 higher than the ~ubsll~le glass nl. The ion exchanged process has been described in reference 2. The deposition of photosensitive sol-gel can be done either by spin- or by dip-coating as explained in reference 5. The sample is pre-baked to promote solvent evaporation and to harden the deposited film. The film contains a 10 monomer that polymerizes when it is exposed to ultraviolet light, thus increasing locally the refractive index such that n4>n3. The sample is therefore exposed to ultraviolet light.
Finally, the sample is post-baked to stabilize the film. The increase in the refractive index of the sol-gel thin film augments the effective index in the slab layer and produces a channel waveguide.
In another embodiment of the sample shown in Fig. 1, 2, 3, and 4, the substrate is made of semiconductor, electro-optic material or any other desirable material, and the slab is made from the same material as substrate or any other material that one desires to make a channel waveguide device from. The photosensitive layer is sol-gel glass or other 20 photosensitive material.
Different integrated optic devices can be made with similar processes according to the present invention. Optical grating-~si~te~ devices are important constituents ofintegrated optic devices. In Fig. 5 there is shown one embodiment of a sample according 25 to the present invention. The embodiment comprises a substrate, a slab layer and a grating structure in the slab; said gratings being defined by the Bragg resonant equation which is:
2N (1) where A is the period of the gratings, ~ is wavelength of the intended o~ aling optical 30 signal, and N is the effective index of the channel waveguide in Fig. 5. A method for making the grating waveguide is described in the US patent by S. I. Najafi et al (1992) which is incorporated here as a reference. A mask with an straight opening, corresponding to an straight waveguide layout, is placed perpendicularly over the sample with grating in Fig. S; the sample is exposed with a UV radiation. Therefore a straight 35 channel waveguide with grating is formed. The said gating device might be used as an optical filter. In Fig. 6 there is shown a cross section view of one embodiment of the sample with a grating.
References:
1. S. I. Najafi, K. O. Hill, J. F. Curri, "Optical waveguide device and method for making such device," United States Patent, Patent number, 5,080,503, Date of Patent, Jan. 14, 1992.
5 2. "Introduction to Glass Integrated Optics", Editor: Najafi, Publisher: Artech House, Boston, 1992.
3. "Guided-Wave Optoelectronics," Edited by T. Tamir, G. Griffel, and H. L. Bertoni., (Plemlm Press, New York), 1995.
4. G. Hewa~ o. H. Hatami-Hanza, and P.L. Chu, "Wavelength-Flattened Three Core Optical Coupler Power Splitters in Ion-Fx~h~n~ed Glass," in "Guided-Wave Optoelectronics", Edited by T. Tamir, G. Griffel, and H. L. Bertoni,, (Plenum Press, New York), PP.155-166, 1995.
5. C.Y.Li, J.Chisham, M.P,Andrews, S.I.Najafi, J.D.~r~n~ie, and N.Pey~h~lnb~rian, "Sol-~el -o,, ~ d optical coupler by ultraviolet light i~ .1i..g7" ~lectron. Lett. 31 (4), 1995, pp.
271-272.
271-272.
6. Procee-ling~ of the conre ~l~ce on Integrated Optics and Optoelectronics, SPIE vol. CR45, 1993.
7. Wang, S. Honkanen, S. I. Najafi, and A. Tervonen, "Loss characteristics of pUlasSi~ and silver double-ion-eYrh ~nged glass waveguides," J. Appl. Phys. 74 (3), 1993, pp. 1529-1533.
20 8. P. Coudray, J. Chisham, M. P. Andrews, and S. I. Najafi, "UV-light i.llplh,l~d sol-gel silica glass low loss waveguides for use at 1.55 mm," Opfical Engineering in press.
20 8. P. Coudray, J. Chisham, M. P. Andrews, and S. I. Najafi, "UV-light i.llplh,l~d sol-gel silica glass low loss waveguides for use at 1.55 mm," Opfical Engineering in press.
Claims (4)
1. A method of fabricating integrated optical devices comprising the steps of a) a sample consists of a substrate and slab layer;
b) said sample is deposited with a photosensitive material;
c) having a mask with an opening corresponding to the layout of the optical circuit;
d) covering the said sample in step (b) with the said mask in (c);
e) exposing the covered sample said in step (d) to ultraviolet light for the required time;
and f) removing the mask.
b) said sample is deposited with a photosensitive material;
c) having a mask with an opening corresponding to the layout of the optical circuit;
d) covering the said sample in step (b) with the said mask in (c);
e) exposing the covered sample said in step (d) to ultraviolet light for the required time;
and f) removing the mask.
2) In accordance to claim 1, a method for fabrication of a channel waveguide in a glass substrate comprising the steps of;
a) making a sample with a slab on the glass substrate by ion-exchange;
b) depositing the said sample in step (b) by a thin layer of photosensitive sol-gel glass;
c) pre-baking the sample in, for example ,100°C for 1 hour having a mask with an opening corresponding to layout of the optical circuit e) covering the said sample in step (b) with the said mask in (c);
f) exposing the covered sample said in step (d) with an ultraviolet light for the required time; and g) removing the mask and post-baking the sample h) cutting the sample edge and polishing for test and measurements
a) making a sample with a slab on the glass substrate by ion-exchange;
b) depositing the said sample in step (b) by a thin layer of photosensitive sol-gel glass;
c) pre-baking the sample in, for example ,100°C for 1 hour having a mask with an opening corresponding to layout of the optical circuit e) covering the said sample in step (b) with the said mask in (c);
f) exposing the covered sample said in step (d) with an ultraviolet light for the required time; and g) removing the mask and post-baking the sample h) cutting the sample edge and polishing for test and measurements
3. In accordance with claim 1 and 2, there is provided a fabrication method of integrated optic devices, wherein: said substrate made from semiconductor or electro-optical materials.
4. A device according to claim 1 and 2, wherein: a grating is made in the said slab layer, said gratings being defined by the Bragg resonant equation, which is:
where ~ is the period of said gratings, .lambda. is wavelength of the light signal, and N is the effective index of the channel waveguide.
where ~ is the period of said gratings, .lambda. is wavelength of the light signal, and N is the effective index of the channel waveguide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CA002190884A CA2190884A1 (en) | 1996-11-21 | 1996-11-21 | Technique for manufacturing integrated optics devices |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CA002190884A CA2190884A1 (en) | 1996-11-21 | 1996-11-21 | Technique for manufacturing integrated optics devices |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2190884A1 true CA2190884A1 (en) | 1998-05-21 |
Family
ID=4159288
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002190884A Abandoned CA2190884A1 (en) | 1996-11-21 | 1996-11-21 | Technique for manufacturing integrated optics devices |
Country Status (1)
| Country | Link |
|---|---|
| CA (1) | CA2190884A1 (en) |
-
1996
- 1996-11-21 CA CA002190884A patent/CA2190884A1/en not_active Abandoned
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