CA2079195A1 - Method and additive for stabilizing degreasing compositions based on halogenated solvents - Google Patents
Method and additive for stabilizing degreasing compositions based on halogenated solventsInfo
- Publication number
- CA2079195A1 CA2079195A1 CA002079195A CA2079195A CA2079195A1 CA 2079195 A1 CA2079195 A1 CA 2079195A1 CA 002079195 A CA002079195 A CA 002079195A CA 2079195 A CA2079195 A CA 2079195A CA 2079195 A1 CA2079195 A1 CA 2079195A1
- Authority
- CA
- Canada
- Prior art keywords
- composition
- weight
- stabilization according
- group
- methyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 86
- 239000002904 solvent Substances 0.000 title claims abstract description 32
- 238000000034 method Methods 0.000 title claims abstract description 23
- 239000000654 additive Substances 0.000 title claims abstract description 19
- 230000000996 additive effect Effects 0.000 title claims abstract description 11
- 238000005238 degreasing Methods 0.000 title claims abstract description 9
- 230000000087 stabilizing effect Effects 0.000 title claims abstract description 9
- CCEFMUBVSUDRLG-UHFFFAOYSA-N limonene-1,2-epoxide Chemical compound C1C(C(=C)C)CCC2(C)OC21 CCEFMUBVSUDRLG-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229910052751 metal Inorganic materials 0.000 claims abstract description 6
- 239000002184 metal Substances 0.000 claims abstract description 6
- 150000001875 compounds Chemical class 0.000 claims description 19
- 239000003381 stabilizer Substances 0.000 claims description 17
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 claims description 13
- 239000004593 Epoxy Substances 0.000 claims description 12
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 claims description 12
- 150000001298 alcohols Chemical class 0.000 claims description 11
- 125000004432 carbon atom Chemical group C* 0.000 claims description 11
- -1 nitrogen-containing heterocyclic compound Chemical class 0.000 claims description 11
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 10
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 9
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 7
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 150000004982 aromatic amines Chemical class 0.000 claims description 7
- 125000004971 nitroalkyl group Chemical group 0.000 claims description 7
- 229920006395 saturated elastomer Polymers 0.000 claims description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 6
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical group CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 claims description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 6
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 claims description 6
- 125000002950 monocyclic group Chemical group 0.000 claims description 6
- 125000003367 polycyclic group Polymers 0.000 claims description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 claims description 5
- 150000002825 nitriles Chemical class 0.000 claims description 5
- MCSAJNNLRCFZED-UHFFFAOYSA-N nitroethane Chemical compound CC[N+]([O-])=O MCSAJNNLRCFZED-UHFFFAOYSA-N 0.000 claims description 5
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 claims description 5
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 claims description 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 4
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 claims description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 4
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 claims description 4
- ACIAHEMYLLBZOI-ZZXKWVIFSA-N Unsaturated alcohol Chemical compound CC\C(CO)=C/C ACIAHEMYLLBZOI-ZZXKWVIFSA-N 0.000 claims description 4
- 125000001931 aliphatic group Chemical group 0.000 claims description 4
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 claims description 4
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 claims description 4
- 229940043279 diisopropylamine Drugs 0.000 claims description 4
- 150000002148 esters Chemical class 0.000 claims description 4
- 150000002576 ketones Chemical class 0.000 claims description 4
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 4
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 claims description 4
- RBACIKXCRWGCBB-UHFFFAOYSA-N 1,2-Epoxybutane Chemical compound CCC1CO1 RBACIKXCRWGCBB-UHFFFAOYSA-N 0.000 claims description 3
- GELKGHVAFRCJNA-UHFFFAOYSA-N 2,2-Dimethyloxirane Chemical compound CC1(C)CO1 GELKGHVAFRCJNA-UHFFFAOYSA-N 0.000 claims description 3
- QZXUQPKFNQQQAJ-UHFFFAOYSA-N 2-ethyl-2-methyloxirane Chemical class CCC1(C)CO1 QZXUQPKFNQQQAJ-UHFFFAOYSA-N 0.000 claims description 3
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 claims description 3
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 claims description 3
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 claims description 3
- 150000001412 amines Chemical class 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 claims description 3
- 150000002391 heterocyclic compounds Chemical class 0.000 claims description 3
- 150000002989 phenols Chemical class 0.000 claims description 3
- OBHGERGYDUQIGE-UHFFFAOYSA-N 1,1,1,2,2,3,3,4,5,5,5-undecachloropentane Chemical compound ClC(C(C(C(C(Cl)(Cl)Cl)(Cl)Cl)(Cl)Cl)Cl)(Cl)Cl OBHGERGYDUQIGE-UHFFFAOYSA-N 0.000 claims description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 claims description 2
- BMVXCPBXGZKUPN-UHFFFAOYSA-N 1-hexanamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 claims description 2
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 claims description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 claims description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 claims description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 claims description 2
- CEBKHWWANWSNTI-UHFFFAOYSA-N 2-methylbut-3-yn-2-ol Chemical compound CC(C)(O)C#C CEBKHWWANWSNTI-UHFFFAOYSA-N 0.000 claims description 2
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 claims description 2
- BNDRWEVUODOUDW-UHFFFAOYSA-N 3-Hydroxy-3-methylbutan-2-one Chemical compound CC(=O)C(C)(C)O BNDRWEVUODOUDW-UHFFFAOYSA-N 0.000 claims description 2
- HNVRRHSXBLFLIG-UHFFFAOYSA-N 3-hydroxy-3-methylbut-1-ene Chemical compound CC(C)(O)C=C HNVRRHSXBLFLIG-UHFFFAOYSA-N 0.000 claims description 2
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 claims description 2
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 claims description 2
- 229940093476 ethylene glycol Drugs 0.000 claims description 2
- 229960005150 glycerol Drugs 0.000 claims description 2
- 235000011187 glycerol Nutrition 0.000 claims description 2
- 125000005842 heteroatom Chemical group 0.000 claims description 2
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 claims description 2
- 229940011051 isopropyl acetate Drugs 0.000 claims description 2
- GWYFCOCPABKNJV-UHFFFAOYSA-M isovalerate Chemical compound CC(C)CC([O-])=O GWYFCOCPABKNJV-UHFFFAOYSA-M 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- DPBLXKKOBLCELK-UHFFFAOYSA-N pentan-1-amine Chemical compound CCCCCN DPBLXKKOBLCELK-UHFFFAOYSA-N 0.000 claims description 2
- 229950000688 phenothiazine Drugs 0.000 claims description 2
- 229960004063 propylene glycol Drugs 0.000 claims description 2
- 235000013772 propylene glycol Nutrition 0.000 claims description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 2
- 150000005619 secondary aliphatic amines Chemical class 0.000 claims description 2
- 150000003510 tertiary aliphatic amines Chemical class 0.000 claims description 2
- 230000006641 stabilisation Effects 0.000 claims 14
- 238000011105 stabilization Methods 0.000 claims 14
- 239000000306 component Substances 0.000 claims 10
- HIZVCIIORGCREW-UHFFFAOYSA-N 1,4-dioxene Chemical compound C1COC=CO1 HIZVCIIORGCREW-UHFFFAOYSA-N 0.000 claims 1
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical class CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 claims 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 claims 1
- 150000002739 metals Chemical class 0.000 abstract 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 5
- XMGQYMWWDOXHJM-UHFFFAOYSA-N limonene Chemical compound CC(=C)C1CCC(C)=CC1 XMGQYMWWDOXHJM-UHFFFAOYSA-N 0.000 description 5
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical class C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 5
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- YKYONYBAUNKHLG-UHFFFAOYSA-N propyl acetate Chemical compound CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 4
- OXHNLMTVIGZXSG-UHFFFAOYSA-N 1-Methylpyrrole Chemical compound CN1C=CC=C1 OXHNLMTVIGZXSG-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 150000002170 ethers Chemical class 0.000 description 3
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 150000002924 oxiranes Chemical class 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- SYBYTAAJFKOIEJ-UHFFFAOYSA-N 3-Methylbutan-2-one Chemical compound CC(C)C(C)=O SYBYTAAJFKOIEJ-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 150000001491 aromatic compounds Chemical class 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 229940087305 limonene Drugs 0.000 description 2
- 235000001510 limonene Nutrition 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 2
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 2
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- MGSRCZKZVOBKFT-UHFFFAOYSA-N thymol Chemical compound CC(C)C1=CC=C(C)C=C1O MGSRCZKZVOBKFT-UHFFFAOYSA-N 0.000 description 2
- RHUYHJGZWVXEHW-UHFFFAOYSA-N 1,1-Dimethyhydrazine Chemical compound CN(C)N RHUYHJGZWVXEHW-UHFFFAOYSA-N 0.000 description 1
- QPBYBLZYMNWGMO-UHFFFAOYSA-N 2,2,3-trimethyloxirane Chemical compound CC1OC1(C)C QPBYBLZYMNWGMO-UHFFFAOYSA-N 0.000 description 1
- UDDGYNNPOKTCHY-UHFFFAOYSA-N 2,3-bis(trifluoromethyl)but-2-enedinitrile Chemical group FC(F)(F)C(C#N)=C(C#N)C(F)(F)F UDDGYNNPOKTCHY-UHFFFAOYSA-N 0.000 description 1
- QWQNFXDYOCUEER-UHFFFAOYSA-N 2,3-ditert-butyl-4-methylphenol Chemical class CC1=CC=C(O)C(C(C)(C)C)=C1C(C)(C)C QWQNFXDYOCUEER-UHFFFAOYSA-N 0.000 description 1
- FXNDIJDIPNCZQJ-UHFFFAOYSA-N 2,4,4-trimethylpent-1-ene Chemical group CC(=C)CC(C)(C)C FXNDIJDIPNCZQJ-UHFFFAOYSA-N 0.000 description 1
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- PLXBWEPPAAQASG-UHFFFAOYSA-N 2-(Dimethylamino)acetonitrile Chemical compound CN(C)CC#N PLXBWEPPAAQASG-UHFFFAOYSA-N 0.000 description 1
- LVPZSMIBSMMLPI-UHFFFAOYSA-N 2-(diethylamino)acetonitrile Chemical compound CCN(CC)CC#N LVPZSMIBSMMLPI-UHFFFAOYSA-N 0.000 description 1
- MTKGPLGETVCLCF-UHFFFAOYSA-N 2-(methylamino)propanenitrile Chemical compound CNC(C)C#N MTKGPLGETVCLCF-UHFFFAOYSA-N 0.000 description 1
- JCLSEQJEXYHVTC-UHFFFAOYSA-N 2-amino-2-methylbutanenitrile Chemical compound CCC(C)(N)C#N JCLSEQJEXYHVTC-UHFFFAOYSA-N 0.000 description 1
- FFNVQNRYTPFDDP-UHFFFAOYSA-N 2-cyanopyridine Chemical compound N#CC1=CC=CC=N1 FFNVQNRYTPFDDP-UHFFFAOYSA-N 0.000 description 1
- QVTPWONEVZJCCS-UHFFFAOYSA-N 2-formylbenzonitrile Chemical compound O=CC1=CC=CC=C1C#N QVTPWONEVZJCCS-UHFFFAOYSA-N 0.000 description 1
- UKTHULMXFLCNAV-UHFFFAOYSA-N 2-hex-5-enyloxirane Chemical compound C=CCCCCC1CO1 UKTHULMXFLCNAV-UHFFFAOYSA-N 0.000 description 1
- JXPDNDHCMMOJPC-UHFFFAOYSA-N 2-hydroxybutanedinitrile Chemical compound N#CC(O)CC#N JXPDNDHCMMOJPC-UHFFFAOYSA-N 0.000 description 1
- BKOOMYPCSUNDGP-UHFFFAOYSA-N 2-methylbut-2-ene Chemical group CC=C(C)C BKOOMYPCSUNDGP-UHFFFAOYSA-N 0.000 description 1
- SWBDKCMOLSUXRH-UHFFFAOYSA-N 2-nitrobenzonitrile Chemical compound [O-][N+](=O)C1=CC=CC=C1C#N SWBDKCMOLSUXRH-UHFFFAOYSA-N 0.000 description 1
- NKTDTMONXHODTI-UHFFFAOYSA-N 2-pentyne Chemical compound CCC#CC NKTDTMONXHODTI-UHFFFAOYSA-N 0.000 description 1
- WSNAAHWRJMRVCU-UHFFFAOYSA-N 2-tert-butyl-3,4-dimethylphenol Chemical class CC1=CC=C(O)C(C(C)(C)C)=C1C WSNAAHWRJMRVCU-UHFFFAOYSA-N 0.000 description 1
- PPJYSSNKSXAVDB-UHFFFAOYSA-N 3,3',5,5'-tetraiodothyroacetic acid Chemical compound IC1=CC(CC(=O)O)=CC(I)=C1OC1=CC(I)=C(O)C(I)=C1 PPJYSSNKSXAVDB-UHFFFAOYSA-N 0.000 description 1
- NDVLTZFQVDXFAN-UHFFFAOYSA-N 3-(2-cyanoethylsulfanyl)propanenitrile Chemical compound N#CCCSCCC#N NDVLTZFQVDXFAN-UHFFFAOYSA-N 0.000 description 1
- BBDKZWKEPDTENS-UHFFFAOYSA-N 4-Vinylcyclohexene Chemical compound C=CC1CCC=CC1 BBDKZWKEPDTENS-UHFFFAOYSA-N 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- VUXKVKAHWOVIDN-UHFFFAOYSA-N Cyclohexyl formate Chemical class O=COC1CCCCC1 VUXKVKAHWOVIDN-UHFFFAOYSA-N 0.000 description 1
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- 206010036086 Polymenorrhoea Diseases 0.000 description 1
- 239000005844 Thymol Substances 0.000 description 1
- 229920004482 WACKER® Polymers 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 150000007824 aliphatic compounds Chemical class 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- KVNRLNFWIYMESJ-UHFFFAOYSA-N butyronitrile Chemical compound CCCC#N KVNRLNFWIYMESJ-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 150000001896 cresols Chemical class 0.000 description 1
- 239000010730 cutting oil Substances 0.000 description 1
- ZWAJLVLEBYIOTI-UHFFFAOYSA-N cyclohexene oxide Chemical compound C1CCCC2OC21 ZWAJLVLEBYIOTI-UHFFFAOYSA-N 0.000 description 1
- FWFSEYBSWVRWGL-UHFFFAOYSA-N cyclohexene oxide Natural products O=C1CCCC=C1 FWFSEYBSWVRWGL-UHFFFAOYSA-N 0.000 description 1
- 239000013527 degreasing agent Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- 238000005108 dry cleaning Methods 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- MPXPIDURTPPYSY-UHFFFAOYSA-N ethynyl propanoate Chemical class CCC(=O)OC#C MPXPIDURTPPYSY-UHFFFAOYSA-N 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000002429 hydrazines Chemical class 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- LDHQCZJRKDOVOX-IHWYPQMZSA-N isocrotonic acid Chemical class C\C=C/C(O)=O LDHQCZJRKDOVOX-IHWYPQMZSA-N 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- RUVINXPYWBROJD-UHFFFAOYSA-N para-methoxyphenyl Natural products COC1=CC=C(C=CC)C=C1 RUVINXPYWBROJD-UHFFFAOYSA-N 0.000 description 1
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 1
- BYYYEOMMIGRDST-UHFFFAOYSA-N prop-1-ynyl acetate Chemical class CC#COC(C)=O BYYYEOMMIGRDST-UHFFFAOYSA-N 0.000 description 1
- JADOFECNZGDUSZ-UHFFFAOYSA-N prop-2-ynyl butanoate Chemical class CCCC(=O)OCC#C JADOFECNZGDUSZ-UHFFFAOYSA-N 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical class CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- PCCVSPMFGIFTHU-UHFFFAOYSA-N tetracyanoquinodimethane Chemical compound N#CC(C#N)=C1C=CC(=C(C#N)C#N)C=C1 PCCVSPMFGIFTHU-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229960000790 thymol Drugs 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C17/00—Preparation of halogenated hydrocarbons
- C07C17/38—Separation; Purification; Stabilisation; Use of additives
- C07C17/42—Use of additives, e.g. for stabilisation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
- C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
- C23G5/028—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons
- C23G5/02854—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons characterised by the stabilising or corrosion inhibiting additives
- C23G5/02861—Oxygen-containing compounds
- C23G5/0288—Epoxy compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Detergent Compositions (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
A B S T R A C T
METHOD AND ADDITIVE FOR STABILIZING DEGREASING
COMPOSITIONS BASED ON HALOGENATED SOLVENTS
The invention provides a method for stabilizing compo-sitions based on halogenated solvents such as those used for degreasing metals, which consists in adding limonene epoxide in an amount of 0.01 to 5% by weight to said compositions, and the stabilized compositions thus obtained.
METHOD AND ADDITIVE FOR STABILIZING DEGREASING
COMPOSITIONS BASED ON HALOGENATED SOLVENTS
The invention provides a method for stabilizing compo-sitions based on halogenated solvents such as those used for degreasing metals, which consists in adding limonene epoxide in an amount of 0.01 to 5% by weight to said compositions, and the stabilized compositions thus obtained.
Description
~7~
METHOD AND ADDITIVE FOR STABILIZING DEGREASING
COMPOSITIONS BASED ON HALOGENATED SOLVENTS
BACKGROUND OF THE INVENTION
Field of the invention The present invention relates to a me-thod for stabiliæ-ing compositions based on halogenated solvents and to ad-ditives employed ~or this purpose. It also relates to the compositions thus obtained, that contain said additives, and to the use of said compositions in the degreasing and clean-ing of metal parts. The invention also xelates to a method for obtaining stabili~ed compo~itions of halogenated solvents of formula CnHzFpCly, in which 1 < n < 6, p > 0, y ~ 1, z ~
0, as well as to the additives employed for this purpose, the compositions that are thus obtained and containing said additives, and the abovesaid application of said compos-itions.
Halogenated solvents, for example, methylene chloride, trichloroethylene, perchloroethylene, 1,1,1-trichloroethane, are widely used in industry. 1,1,1 trichloroethane (or methyl-chloroform) in particular, is employed for ob-taining aerosols, for dry cleaning purposes and for degreasing and/or cleaning metal parts or components which have for example been wetted by cuttiny oils. The problem that the use of chlorinated and/or 1uorinated organic solvents, in particu-lar 1,1,1 trichloroethane, poses is their tendsncy to decom-pose in the presence of lightweight me-tals and alloys there-of. This particular problem hence limits their use as a degreasing and/or cleaning agent for metal parts in aluminum, magnesium or alloys thereof. It is known that 1,1,1-tri-chloroethane, in the presence of a scratched or rubbed , .
METHOD AND ADDITIVE FOR STABILIZING DEGREASING
COMPOSITIONS BASED ON HALOGENATED SOLVENTS
BACKGROUND OF THE INVENTION
Field of the invention The present invention relates to a me-thod for stabiliæ-ing compositions based on halogenated solvents and to ad-ditives employed ~or this purpose. It also relates to the compositions thus obtained, that contain said additives, and to the use of said compositions in the degreasing and clean-ing of metal parts. The invention also xelates to a method for obtaining stabili~ed compo~itions of halogenated solvents of formula CnHzFpCly, in which 1 < n < 6, p > 0, y ~ 1, z ~
0, as well as to the additives employed for this purpose, the compositions that are thus obtained and containing said additives, and the abovesaid application of said compos-itions.
Halogenated solvents, for example, methylene chloride, trichloroethylene, perchloroethylene, 1,1,1-trichloroethane, are widely used in industry. 1,1,1 trichloroethane (or methyl-chloroform) in particular, is employed for ob-taining aerosols, for dry cleaning purposes and for degreasing and/or cleaning metal parts or components which have for example been wetted by cuttiny oils. The problem that the use of chlorinated and/or 1uorinated organic solvents, in particu-lar 1,1,1 trichloroethane, poses is their tendsncy to decom-pose in the presence of lightweight me-tals and alloys there-of. This particular problem hence limits their use as a degreasing and/or cleaning agent for metal parts in aluminum, magnesium or alloys thereof. It is known that 1,1,1-tri-chloroethane, in the presence of a scratched or rubbed , .
2 0 ~
aluminum surface is unstable and decomposes in a fairly shortperiod of time forming a black tar-like slurry the compos-ition of which is practically uncontrollable. A change in pH accompanies this decomposition, becoming basic or acid as a function of the cutting oil used, hydrochloric acid being formed in the lat-ter of -the two cases. Moreoverr whenever a chlorinated or fluorinated organic solvent in the form of a thin film is subjected to pressure between two sheets of aluminum, the pronounced tendency of the solvent to decompose is enhanced. D0composition in the vapor phase also takes place during hot degreasing operations. Numerous additives have hence been pu~ forward for the purpose of preventing or at least minimising decomposition of these solvents, leading to -their becoming colored, to the formation of undesirable by-products and to loss of their solvent properties.
The various additives proposed for stabilizing halogen-ated solvents can be nitro-alkanes, saturated or unsaturated alcohols, ethers, nitriles, esters, phenolic derivatives, epoxy derivatives and mixtures thereof. Epoxy derivatives are currently used, alone or mixed with other stabilizers known in the art. Butylene oxide is the stabilizer that is most frequently used at present, on account of its price.
Several compound have been proposed as a replacement for butylene oxide, including particular epoxy compounds.
Prior art EP-A-044 111 (Solvay) describes stabilizing composi-tions of halogenated solvents containing 2-methyl-2,3-epoxy-butane. Wacker Chemie has proposed several epoxy compounds suitable for replacing butylene oxide. These include, for example: cyclohexene oxide, 4-vinyl-cyclohexene, 7,8-epoxy-octene. Conventionally, the epoxy compounds employed are selected from: epoxypropane, epoxybutane, 2-methyl-epoxy-propanes, 2-methylepoxybutanes and epichlorhydrine.
No publication teaches nor sugges-ts the particular use of the epoxy compounds according to the invention, nor the 2 ~ g ~
unexpected and surprising results that come about from their use.
SUMMARY OF THE INVENTION
- The invention hence provides an additive for stabiliz~
ing a halogenated solvent composition of formula CnHzFpCly, in which 1 < n < 6, p > 0. y ~ 1,z > 0. said additive contain-ing from O.0001 to 16.5% by weigh-t of limonene epoxide.
The expression 'llimonene epoxide" as employed in the present invention means the 1,2 epoxide of limonene, in other words this means that the epoxy function is carried by the double bond located on the cycle~
In one preferred embodiment, the additives includes one at least of the following co-stabilizers:
a) a C2 to C7 epoxy compound different from limonene epox-ide,b) a C1 to C7 saturated alcohol, c) a C3 to C6 unsaturated alcohol, d) a Cl to C4 nitro-alkane, e) mono- or poly-cyclic internal ether, ~0 f) a C3 to C10 aliphatic or an aromatic amine, g) a nitrogen-containing heterocyclic compound.
In a preferred embodiment, the components a), b), c), d), e), f) and g) are present in respective amounts of:
a) 0-~ to 16.50 ~ b) 0.001 to 16.50 ;~ c) 0.001 to 16.50 ` d) 0.001 to 10.00 e) O.OOl to 16.50 f) O to 3.33%
g) O to 3.33%
by weight based on the weight of said additive.
The invention also provides a method for stabilizing a composition based on halogenated solvents of formula CnHzFpCly, in which 1 < n < 6, p > 0. y > 1,z > 0 comprising the addition to said solvents of 0.01~ to 5~ by weight, based 2~79~ ~
on the weight o~ the solvents of limonene epoxide. The meth-od pre~erably consists in the addition to said solvents of an amount of 0.2~ to 3% by weight, based on the weight of said solvents, of limonen~ epoxide.
In a preferred embodiment, the composition addi-tionally contains at least one of the ~ollowing co-stabilizers:
a) a Cz to C7 epoxy compound different from limonene epox-ide, b) a C1 to C7 saturated alcohol, c) a C3 to C6 unsaturated alcohol, d) Cl to C4 nitro-alkane e) mono- or poly-cyclic internal ether, f) a C3 to C10 aliphatic or an aromatic amine, g) a nitrogen-containing heterocyclic compound.
The C2 to C7 epoxy compound dif~erent from limonene epoxide makes up 0 to 5~ and preferably ~rom 0% to 3% by weight, based on the weight of said composit~on and is seleot~
ed from the group comprising: epoxypropane, epoxybutane, 2-methyl-epoxypropanes, 2-methyl-epoxybutanes, epichlorhy-drine and mixtures thereo~.
The C1 to C7 saturated alcohols make up from 0.1 to 5~, preferably 0.5 to 3.5~ by weight o the composition. Examples o~ such saturated alcohols are: methanol, ethanol, propanol, isopropanol, butanol-l, butanol-2, tertiary butylic alcohol, pentanols such as tertiary amylic alcohol, methylcellosolve, ethylcellosolve, propylcellosolve, butylcellosolve, glycer-ine, ethyleneglycol, propyleneglycol, 2-hydroxy-2-methyl-3-butanone, 3,3-dimethoxy-2-methylbutanol-2 and 3-amino-2-methyl-butanol-2. Preferred saturated alcohols are: propanol, ter-tiary and secondary butanol and tertiary pentanol. Tertiarybutanol is the saturated alcohol that is particularly preferred.
The C3 to C6 unsaturated alcohols are added in an amount of 0.1 to 3~, preferably 0.3 to 3~ by weight, to said compo-sition based on the weight thereof. Preferred unsaturated alcohols are: allylic alcohol, 2-methyl-3-butene-2-ol and 2 ~
2-methyl-3-butyne-2-ol.
The Cl to C4 nitro-alkanes are added in an amount of from 0.1 to 3%, preferably from 0.5 to 1.5~ hy weight of said composition. Preferred nitroalkanes are: nitromethane, nitro-ethane, nitropropane-l or -2 and mixtures thereof. Nitro methane and/or nitroethane are particularly preferred.
The internal ethers make up O.l to 5~- and preferably 0.5 to 2.5% by weight of said composition. Suitable internal ethers for use as co-stabilizers comprise: mono- or poly-cyclic ethers, optionally containing other hetero-atoms, containing ons or several saturated or unsaturated optionally substituted cycles having 5 or 6 carbon atoms such as 1,3-dioxanne, 1,4-dioxanne, 1,3,5-trioxanne, 1,3-dioxolanne, dio~ene, dioxadiene, thioxanne, oxazole, tetrahydrofuranne, or diphenyl oxide. The preferred ether is 1,3,5-trioxanne~
The C3 to C10 aliphatic or aromatic amines are, present in an amount of from 0 to 1~ by weight, preferably from 0.005 to 0.1% by weight, based on the weight of the composition.
Sui-table amines are those having 3 to lO substituted or un-substituted carbon atoms such as secondary and tertiary ali-phatic amines and aromatic amines such as aniline optionally substituted by C1 to C4 alkyl groups or chlorine atoms.
Preferred amines are triethylamine, diisopropylamine, amyl-amine, hexylamine. Diisopropylamine is particularly pre-ferred.
The nitrogen-containing heterocyclic compounds are present in an amount of from O to 1~, preferably 0.005 to 0.1% by weight based on the weight of the composition.
Suitable compounds are those having 4 to 12 carbon atoms and 1 to 2 nitrogen atoms in their molecule, such as pyridine, the plcolines, phenothiazine, morpholine, pyrrole and pyrrol-idine and derivatives thereof substituted by alkyl groups on the nitrogen atom. Preferred heterocyclic compounds are N-met~ylmorpholine, diisopropylamine, pyrrolidone and N-methylpyrrole. Particularly preferred heterocyclic compounds ' 2 ~ 7 ~
are N-methylmorpholine and N-methylpyrrole.
The compositions stabilized in accordance with the present invention are halogenated solvent compositions. They have the formula CnHzFpCly, in which 1 < n ~ 6, p > 0. y > 1, z > 0. The number z can be zero or non-zero, as a function of the degree of substitution or unsaturation of the carbon chain; z is thus adjusted so as to preserve the carbon's tetravalency. Examples of such solvents are: 1,1,1-trichloro-ethane, trichloroethylene, perchloroethylene, methylene chloride, and mixtures thereof. The preferred solvent is l,1,1-trichloroethane.
Compositions stabilized according to the present in-venti~n can also contain other conventional co-stabilizers such as esters, nitriles, ketones, phenolic compounds and olefinic compounds, and can be present in an amount o up to 5% by weight, based on the weight of the composition.
Esters that can be employed as co-stabilizers are sat~
urated or unsaturated mono~ and di-esters having 2 to 8 car-bon atoms, optionally substituted by halogens or hydroxyl ~roups, such as ethyl, propyl, isopropyl, butyl, sec-butyl, tert-butyl, amyl, hexyl and cyclohexyl formates; methyl, ethyl, propyl, isopropyl, butyl, amyl, ethynyl or propynyl acetates; methyl, ethyl, propyl, isopropyl, butyl, amyl and ethynyl propionates; methyl, ethyl, propyl, isopropyl and 2-propynyl butyrates; methyl, ethyl, propyl, isopropyl, butyl, sec-butyl and tert-butyl acrylates and methacrylates;
methyl and ethyl cro~onates and isocrotonates; ethyl and methyl sorbiates; ethyl diformate and ethyl diacetate.
Unsubstituted mono-esters having 4 to 6 carbon atoms give good results. Excellent results have been obtained with ethyl acetate, isobutyl acetate, n-propyl acetate, methyl methacrylate and n-butyl acetate. Methyl methacrylate, ~thyl acetate and n-propyl acetate have shown themselves to be particularly appropriate.
Nitriles that are suitable for use as co-stabilizers 20791g~
comprise saturated or unsaturated optionally subs-titu-ted aliphatic or aromatic compounds having 2 to 7 carbon atoms such as acatonitrile, propionitrile, acrylonitrile, butyro-nitrile, methacrylonitrile, malonitrile, benzonitrile, di-methylaminoacetonitrile, methylaminopropionitrile, dimethyl-aminopropionitrils, diethylaminoacetonitrile, methylethyl-aminoacetonitrile, thiodipropionitrile, tetrac~anoethylene, tetracyanoquinodimethane, tetracyanodithiine, 1,2-dicyano-1,2-bis(trifluoromethyl)ethylene, cyanobenzaldehyde, nitro-benzonitrile, cyanopyridine. O~ the above, acetonitrile,propionitrile and acrylonitrile are the preferred nitriles.
Ketones suitable for use as co-stabilizers comprise substituted or unsubstituted ketones having 3 to 7 carbon atoms, such as for example acetone, methylethyl ketone, di-ethyl ketone, methylpropyl ketone, methylisopropyl ketone,1-(2-furyl)propanone, 3-hydro~y-2,5-hexane-dione, ~-methyl-2-hydroxy-4-pentanone, etc.
Phenolic compounds conventionally employed as co-stabilizers can carry one or several hydroxyl groups bound to a benzenic ring which can already be optionally substituted by alkyl groups. Preferred compounds are phenol and alkyl derivatives thereof such as thymol, cresols, paramethoxy-phenyl, methyl-di-tert-butylphenols and dimethyl-tert-butyl-phenols. Phenol, ~hymol and p-methoxyphenol are particularly preferred.
Olefinic compounds that can be used as co-stabilizers are in general compounds having one or several double bonds in the molecule and 4 to lO carbon atoms. Of these, tertiary amylene and diisobutylene are the preferred compounds.
Other compounds and notably alkoxyalcanes such as al-koxyethanes, nitrates such as alkyl nitrates having 1 to 5 carbon atoms in the alkyl moeity, quinones such as hydro-qulnone, anthraquinones, hydrazines such as dimethyl-hydrazine, and aromatic compounds such as toluene, can also be employed as co-stabilizers.
l g 5 The following examples are provided by way of illus-tration of the present invention and should in no case be considered as limiting the scope thereof.
Example 1 A l,1,1-trichloroethane composition that included the following stabilizers was prepared:
by weight . limonene epo~ide......... ~................. 0.91 . tertiary butylic alcohol ........... 2.2 10 . methyl-2-butyne~3-ol-2 ............. ~. 0.86 . nitromethane .............................. 0.51 . nitroethane ............................... 0.81 . N-methylmorpholins ........................ 0.005 The resulting composition was subjected to successive distillations which consisted in distilling it 4 times in succession and only collecting the first 90~ by volume that passed over at each distillation. A scratch test in ac-cordance with ASTM D 2943-71 T was carried out on aluminum plates using each one of the 4 distillates.
The aim of this scratch test was to determine the abil-ity of the association of stabiliæers in the l,1,1-trichloro-ethane to prevent deterioration of the chlorinated solvent in the presence of aluminum and of alloys thereof. It consisted of taking a piece of grade AA 1100 (ASTM standard) cleaned and degreased metal, immersing it in 50 cm3 of stabilized l,1,1-trichloroethane, at ambient temperature, and scratching it using a mild steel rod. After a sufficient period of time had elapsed (1 hour) to allow any potential reaction to take place, the presence or absence of bubbles, the color of the solvent and the possible presence of dark resinous matter was noted. The 1,1,1-trichloroethane was properly stabil-ized and no reaction was observed.
The above composition passed this test without any trace of reaction being observed on the aluminum plates.
In order to test the compositlon's ability to trap ., ~
2 ~
hydrochloric acid, the composition was subjected to the Acid Acceptance Test in accordance with ASTM D 2942. Acid ac-ceptance measured in NaOH weight equivalent was 0.240.
The composition was subjected to the co~called BAM
test, this being a test for which the conditlons applied to chlorinated compounds are drastic. No exothermicity was observed, and the composition fully sa-tisfied the B~M test (6 batches). The composition is hence particularly stable.
Example 2 A composition based on 1,1,1-trichloroethane containing the following was tested:
b~ weight . limonene epoxide ......................... 0.74 . butylene oxide............................ 0.1 . methyl-2-butyne-3-ol-2 ...... ~............. 0.86 . nitromethane ............................. 0.51 . nitroethane ................. ~. 0.81 . N-meth~lmorpholine ....................... 0.0085 This composition passed all the above tests. The mea-sured acid acceptance was 0.24.
Example 3 A trichloroeth~lene-based composition was prepared which contained the following additives:
~ b~ weight . limonene epoxide ......................... 0.84 . triethylamine ............................ ~.0075 . N-methylpyrrole .... n ~ O~ 030 . isopropyl acetate ........................ 0.28 . Di-isobutylene ........................... 0.28 This composition was tested on aluminum using the fol-lowing procedure: lOOml of composition, lOOml of toluene, 18g of aluminum and 0.7g aluminum chloride were introduced into a flask refrigerated at its upper end and subjected to reflux boiling for 9 hours, left to stand for 15 hours and again sub;ected to reflux conditions for 9 hours. No reaction 20~:l95 exotharmicity was observed and the composition was hence perfectly stable.
Example 4 A composition based on l,1,1-trichloroethane and con-taining the following additives was prepared and tested:
by weight . limonene epoxide .......................... 0.91 . tertiary butylic alcohol .................. 2.2 . methyl-2-butyne-3-d-2 ..................... 0.86 . 1,3-dioxolanne ............................ 1.42 . N-methylmorpholine .... ~................... 0.005 The measured acid acceptance value was 0.24. There was no reaction from thP scratch test when this composition was used; it is hence stable.
Example 5 (comparative tast) :
The composition used in ~xample 1 was tested again, but this time replaaing the O.91g of limonene epoxide by 0.45g of butylene oxide. The molar contents of both were hence sub-stantially the same, equal to 0.0064 and 0.0063 respectively.
Both compositions were then subjected to a hydrolysis test at equal molar contents. The comparative test was aarried out as follows: 50ml of composition and 50ml of water were intro-duced into a flask and boiled with reflux being ensured by a refrigerant. A 5 ml sample was taken in order to determine the acid acceptance using the me~hod described in ASTM D
2g42. The results are given in the table below:
- i ¦ TIME (h) ¦ 0 ¦ 2 ¦ 3 ¦ 4 30 1 - _ Composition as per example 1 1 0~215 1 0.203 1 0.170 1 0.144 ¦ Composition with l l l l l 35 ¦ butylene oxide ¦ 0.218 ¦ 0.138 ¦ 0.077 ¦ 0.014 ¦
11 2~91 ~
The results given in the table clearly show that the composition based on limonene epoxide is more stable than the composition based on butylene oxide.
The invention is obviously not limited to the case of the examples provided above by way of illustration of the invention, but should be considered to include all variations thereof available to those skilled in the art.
2n
aluminum surface is unstable and decomposes in a fairly shortperiod of time forming a black tar-like slurry the compos-ition of which is practically uncontrollable. A change in pH accompanies this decomposition, becoming basic or acid as a function of the cutting oil used, hydrochloric acid being formed in the lat-ter of -the two cases. Moreoverr whenever a chlorinated or fluorinated organic solvent in the form of a thin film is subjected to pressure between two sheets of aluminum, the pronounced tendency of the solvent to decompose is enhanced. D0composition in the vapor phase also takes place during hot degreasing operations. Numerous additives have hence been pu~ forward for the purpose of preventing or at least minimising decomposition of these solvents, leading to -their becoming colored, to the formation of undesirable by-products and to loss of their solvent properties.
The various additives proposed for stabilizing halogen-ated solvents can be nitro-alkanes, saturated or unsaturated alcohols, ethers, nitriles, esters, phenolic derivatives, epoxy derivatives and mixtures thereof. Epoxy derivatives are currently used, alone or mixed with other stabilizers known in the art. Butylene oxide is the stabilizer that is most frequently used at present, on account of its price.
Several compound have been proposed as a replacement for butylene oxide, including particular epoxy compounds.
Prior art EP-A-044 111 (Solvay) describes stabilizing composi-tions of halogenated solvents containing 2-methyl-2,3-epoxy-butane. Wacker Chemie has proposed several epoxy compounds suitable for replacing butylene oxide. These include, for example: cyclohexene oxide, 4-vinyl-cyclohexene, 7,8-epoxy-octene. Conventionally, the epoxy compounds employed are selected from: epoxypropane, epoxybutane, 2-methyl-epoxy-propanes, 2-methylepoxybutanes and epichlorhydrine.
No publication teaches nor sugges-ts the particular use of the epoxy compounds according to the invention, nor the 2 ~ g ~
unexpected and surprising results that come about from their use.
SUMMARY OF THE INVENTION
- The invention hence provides an additive for stabiliz~
ing a halogenated solvent composition of formula CnHzFpCly, in which 1 < n < 6, p > 0. y ~ 1,z > 0. said additive contain-ing from O.0001 to 16.5% by weigh-t of limonene epoxide.
The expression 'llimonene epoxide" as employed in the present invention means the 1,2 epoxide of limonene, in other words this means that the epoxy function is carried by the double bond located on the cycle~
In one preferred embodiment, the additives includes one at least of the following co-stabilizers:
a) a C2 to C7 epoxy compound different from limonene epox-ide,b) a C1 to C7 saturated alcohol, c) a C3 to C6 unsaturated alcohol, d) a Cl to C4 nitro-alkane, e) mono- or poly-cyclic internal ether, ~0 f) a C3 to C10 aliphatic or an aromatic amine, g) a nitrogen-containing heterocyclic compound.
In a preferred embodiment, the components a), b), c), d), e), f) and g) are present in respective amounts of:
a) 0-~ to 16.50 ~ b) 0.001 to 16.50 ;~ c) 0.001 to 16.50 ` d) 0.001 to 10.00 e) O.OOl to 16.50 f) O to 3.33%
g) O to 3.33%
by weight based on the weight of said additive.
The invention also provides a method for stabilizing a composition based on halogenated solvents of formula CnHzFpCly, in which 1 < n < 6, p > 0. y > 1,z > 0 comprising the addition to said solvents of 0.01~ to 5~ by weight, based 2~79~ ~
on the weight o~ the solvents of limonene epoxide. The meth-od pre~erably consists in the addition to said solvents of an amount of 0.2~ to 3% by weight, based on the weight of said solvents, of limonen~ epoxide.
In a preferred embodiment, the composition addi-tionally contains at least one of the ~ollowing co-stabilizers:
a) a Cz to C7 epoxy compound different from limonene epox-ide, b) a C1 to C7 saturated alcohol, c) a C3 to C6 unsaturated alcohol, d) Cl to C4 nitro-alkane e) mono- or poly-cyclic internal ether, f) a C3 to C10 aliphatic or an aromatic amine, g) a nitrogen-containing heterocyclic compound.
The C2 to C7 epoxy compound dif~erent from limonene epoxide makes up 0 to 5~ and preferably ~rom 0% to 3% by weight, based on the weight of said composit~on and is seleot~
ed from the group comprising: epoxypropane, epoxybutane, 2-methyl-epoxypropanes, 2-methyl-epoxybutanes, epichlorhy-drine and mixtures thereo~.
The C1 to C7 saturated alcohols make up from 0.1 to 5~, preferably 0.5 to 3.5~ by weight o the composition. Examples o~ such saturated alcohols are: methanol, ethanol, propanol, isopropanol, butanol-l, butanol-2, tertiary butylic alcohol, pentanols such as tertiary amylic alcohol, methylcellosolve, ethylcellosolve, propylcellosolve, butylcellosolve, glycer-ine, ethyleneglycol, propyleneglycol, 2-hydroxy-2-methyl-3-butanone, 3,3-dimethoxy-2-methylbutanol-2 and 3-amino-2-methyl-butanol-2. Preferred saturated alcohols are: propanol, ter-tiary and secondary butanol and tertiary pentanol. Tertiarybutanol is the saturated alcohol that is particularly preferred.
The C3 to C6 unsaturated alcohols are added in an amount of 0.1 to 3~, preferably 0.3 to 3~ by weight, to said compo-sition based on the weight thereof. Preferred unsaturated alcohols are: allylic alcohol, 2-methyl-3-butene-2-ol and 2 ~
2-methyl-3-butyne-2-ol.
The Cl to C4 nitro-alkanes are added in an amount of from 0.1 to 3%, preferably from 0.5 to 1.5~ hy weight of said composition. Preferred nitroalkanes are: nitromethane, nitro-ethane, nitropropane-l or -2 and mixtures thereof. Nitro methane and/or nitroethane are particularly preferred.
The internal ethers make up O.l to 5~- and preferably 0.5 to 2.5% by weight of said composition. Suitable internal ethers for use as co-stabilizers comprise: mono- or poly-cyclic ethers, optionally containing other hetero-atoms, containing ons or several saturated or unsaturated optionally substituted cycles having 5 or 6 carbon atoms such as 1,3-dioxanne, 1,4-dioxanne, 1,3,5-trioxanne, 1,3-dioxolanne, dio~ene, dioxadiene, thioxanne, oxazole, tetrahydrofuranne, or diphenyl oxide. The preferred ether is 1,3,5-trioxanne~
The C3 to C10 aliphatic or aromatic amines are, present in an amount of from 0 to 1~ by weight, preferably from 0.005 to 0.1% by weight, based on the weight of the composition.
Sui-table amines are those having 3 to lO substituted or un-substituted carbon atoms such as secondary and tertiary ali-phatic amines and aromatic amines such as aniline optionally substituted by C1 to C4 alkyl groups or chlorine atoms.
Preferred amines are triethylamine, diisopropylamine, amyl-amine, hexylamine. Diisopropylamine is particularly pre-ferred.
The nitrogen-containing heterocyclic compounds are present in an amount of from O to 1~, preferably 0.005 to 0.1% by weight based on the weight of the composition.
Suitable compounds are those having 4 to 12 carbon atoms and 1 to 2 nitrogen atoms in their molecule, such as pyridine, the plcolines, phenothiazine, morpholine, pyrrole and pyrrol-idine and derivatives thereof substituted by alkyl groups on the nitrogen atom. Preferred heterocyclic compounds are N-met~ylmorpholine, diisopropylamine, pyrrolidone and N-methylpyrrole. Particularly preferred heterocyclic compounds ' 2 ~ 7 ~
are N-methylmorpholine and N-methylpyrrole.
The compositions stabilized in accordance with the present invention are halogenated solvent compositions. They have the formula CnHzFpCly, in which 1 < n ~ 6, p > 0. y > 1, z > 0. The number z can be zero or non-zero, as a function of the degree of substitution or unsaturation of the carbon chain; z is thus adjusted so as to preserve the carbon's tetravalency. Examples of such solvents are: 1,1,1-trichloro-ethane, trichloroethylene, perchloroethylene, methylene chloride, and mixtures thereof. The preferred solvent is l,1,1-trichloroethane.
Compositions stabilized according to the present in-venti~n can also contain other conventional co-stabilizers such as esters, nitriles, ketones, phenolic compounds and olefinic compounds, and can be present in an amount o up to 5% by weight, based on the weight of the composition.
Esters that can be employed as co-stabilizers are sat~
urated or unsaturated mono~ and di-esters having 2 to 8 car-bon atoms, optionally substituted by halogens or hydroxyl ~roups, such as ethyl, propyl, isopropyl, butyl, sec-butyl, tert-butyl, amyl, hexyl and cyclohexyl formates; methyl, ethyl, propyl, isopropyl, butyl, amyl, ethynyl or propynyl acetates; methyl, ethyl, propyl, isopropyl, butyl, amyl and ethynyl propionates; methyl, ethyl, propyl, isopropyl and 2-propynyl butyrates; methyl, ethyl, propyl, isopropyl, butyl, sec-butyl and tert-butyl acrylates and methacrylates;
methyl and ethyl cro~onates and isocrotonates; ethyl and methyl sorbiates; ethyl diformate and ethyl diacetate.
Unsubstituted mono-esters having 4 to 6 carbon atoms give good results. Excellent results have been obtained with ethyl acetate, isobutyl acetate, n-propyl acetate, methyl methacrylate and n-butyl acetate. Methyl methacrylate, ~thyl acetate and n-propyl acetate have shown themselves to be particularly appropriate.
Nitriles that are suitable for use as co-stabilizers 20791g~
comprise saturated or unsaturated optionally subs-titu-ted aliphatic or aromatic compounds having 2 to 7 carbon atoms such as acatonitrile, propionitrile, acrylonitrile, butyro-nitrile, methacrylonitrile, malonitrile, benzonitrile, di-methylaminoacetonitrile, methylaminopropionitrile, dimethyl-aminopropionitrils, diethylaminoacetonitrile, methylethyl-aminoacetonitrile, thiodipropionitrile, tetrac~anoethylene, tetracyanoquinodimethane, tetracyanodithiine, 1,2-dicyano-1,2-bis(trifluoromethyl)ethylene, cyanobenzaldehyde, nitro-benzonitrile, cyanopyridine. O~ the above, acetonitrile,propionitrile and acrylonitrile are the preferred nitriles.
Ketones suitable for use as co-stabilizers comprise substituted or unsubstituted ketones having 3 to 7 carbon atoms, such as for example acetone, methylethyl ketone, di-ethyl ketone, methylpropyl ketone, methylisopropyl ketone,1-(2-furyl)propanone, 3-hydro~y-2,5-hexane-dione, ~-methyl-2-hydroxy-4-pentanone, etc.
Phenolic compounds conventionally employed as co-stabilizers can carry one or several hydroxyl groups bound to a benzenic ring which can already be optionally substituted by alkyl groups. Preferred compounds are phenol and alkyl derivatives thereof such as thymol, cresols, paramethoxy-phenyl, methyl-di-tert-butylphenols and dimethyl-tert-butyl-phenols. Phenol, ~hymol and p-methoxyphenol are particularly preferred.
Olefinic compounds that can be used as co-stabilizers are in general compounds having one or several double bonds in the molecule and 4 to lO carbon atoms. Of these, tertiary amylene and diisobutylene are the preferred compounds.
Other compounds and notably alkoxyalcanes such as al-koxyethanes, nitrates such as alkyl nitrates having 1 to 5 carbon atoms in the alkyl moeity, quinones such as hydro-qulnone, anthraquinones, hydrazines such as dimethyl-hydrazine, and aromatic compounds such as toluene, can also be employed as co-stabilizers.
l g 5 The following examples are provided by way of illus-tration of the present invention and should in no case be considered as limiting the scope thereof.
Example 1 A l,1,1-trichloroethane composition that included the following stabilizers was prepared:
by weight . limonene epo~ide......... ~................. 0.91 . tertiary butylic alcohol ........... 2.2 10 . methyl-2-butyne~3-ol-2 ............. ~. 0.86 . nitromethane .............................. 0.51 . nitroethane ............................... 0.81 . N-methylmorpholins ........................ 0.005 The resulting composition was subjected to successive distillations which consisted in distilling it 4 times in succession and only collecting the first 90~ by volume that passed over at each distillation. A scratch test in ac-cordance with ASTM D 2943-71 T was carried out on aluminum plates using each one of the 4 distillates.
The aim of this scratch test was to determine the abil-ity of the association of stabiliæers in the l,1,1-trichloro-ethane to prevent deterioration of the chlorinated solvent in the presence of aluminum and of alloys thereof. It consisted of taking a piece of grade AA 1100 (ASTM standard) cleaned and degreased metal, immersing it in 50 cm3 of stabilized l,1,1-trichloroethane, at ambient temperature, and scratching it using a mild steel rod. After a sufficient period of time had elapsed (1 hour) to allow any potential reaction to take place, the presence or absence of bubbles, the color of the solvent and the possible presence of dark resinous matter was noted. The 1,1,1-trichloroethane was properly stabil-ized and no reaction was observed.
The above composition passed this test without any trace of reaction being observed on the aluminum plates.
In order to test the compositlon's ability to trap ., ~
2 ~
hydrochloric acid, the composition was subjected to the Acid Acceptance Test in accordance with ASTM D 2942. Acid ac-ceptance measured in NaOH weight equivalent was 0.240.
The composition was subjected to the co~called BAM
test, this being a test for which the conditlons applied to chlorinated compounds are drastic. No exothermicity was observed, and the composition fully sa-tisfied the B~M test (6 batches). The composition is hence particularly stable.
Example 2 A composition based on 1,1,1-trichloroethane containing the following was tested:
b~ weight . limonene epoxide ......................... 0.74 . butylene oxide............................ 0.1 . methyl-2-butyne-3-ol-2 ...... ~............. 0.86 . nitromethane ............................. 0.51 . nitroethane ................. ~. 0.81 . N-meth~lmorpholine ....................... 0.0085 This composition passed all the above tests. The mea-sured acid acceptance was 0.24.
Example 3 A trichloroeth~lene-based composition was prepared which contained the following additives:
~ b~ weight . limonene epoxide ......................... 0.84 . triethylamine ............................ ~.0075 . N-methylpyrrole .... n ~ O~ 030 . isopropyl acetate ........................ 0.28 . Di-isobutylene ........................... 0.28 This composition was tested on aluminum using the fol-lowing procedure: lOOml of composition, lOOml of toluene, 18g of aluminum and 0.7g aluminum chloride were introduced into a flask refrigerated at its upper end and subjected to reflux boiling for 9 hours, left to stand for 15 hours and again sub;ected to reflux conditions for 9 hours. No reaction 20~:l95 exotharmicity was observed and the composition was hence perfectly stable.
Example 4 A composition based on l,1,1-trichloroethane and con-taining the following additives was prepared and tested:
by weight . limonene epoxide .......................... 0.91 . tertiary butylic alcohol .................. 2.2 . methyl-2-butyne-3-d-2 ..................... 0.86 . 1,3-dioxolanne ............................ 1.42 . N-methylmorpholine .... ~................... 0.005 The measured acid acceptance value was 0.24. There was no reaction from thP scratch test when this composition was used; it is hence stable.
Example 5 (comparative tast) :
The composition used in ~xample 1 was tested again, but this time replaaing the O.91g of limonene epoxide by 0.45g of butylene oxide. The molar contents of both were hence sub-stantially the same, equal to 0.0064 and 0.0063 respectively.
Both compositions were then subjected to a hydrolysis test at equal molar contents. The comparative test was aarried out as follows: 50ml of composition and 50ml of water were intro-duced into a flask and boiled with reflux being ensured by a refrigerant. A 5 ml sample was taken in order to determine the acid acceptance using the me~hod described in ASTM D
2g42. The results are given in the table below:
- i ¦ TIME (h) ¦ 0 ¦ 2 ¦ 3 ¦ 4 30 1 - _ Composition as per example 1 1 0~215 1 0.203 1 0.170 1 0.144 ¦ Composition with l l l l l 35 ¦ butylene oxide ¦ 0.218 ¦ 0.138 ¦ 0.077 ¦ 0.014 ¦
11 2~91 ~
The results given in the table clearly show that the composition based on limonene epoxide is more stable than the composition based on butylene oxide.
The invention is obviously not limited to the case of the examples provided above by way of illustration of the invention, but should be considered to include all variations thereof available to those skilled in the art.
2n
Claims (21)
1.- An additive for stabilizing a halogenated solvent composition of formula CnHzFpCly, in which 1 ? n ? 6, p ? 0.
y ? 1,z ? 0. said additive containing from 0.0001 to 16.5% by weight of limonene epoxide.
y ? 1,z ? 0. said additive containing from 0.0001 to 16.5% by weight of limonene epoxide.
2.- An additive according to claim 1, wherein it additionally contains one of the the following co-stabilizers:
a) a C2 to C7 epoxy compound different from limonene epoxide, b) a C1 to C7 saturated alcohol, c) a C3 to C6 unsaturated alcohol, d) a C1 to C4 nitro-alkane e) a mono- or poly-cyclic internal ether, f) a C3 to C10 aliphatic or an aromatic amine, g) a nitrogen-containing heterocyclic compound.
a) a C2 to C7 epoxy compound different from limonene epoxide, b) a C1 to C7 saturated alcohol, c) a C3 to C6 unsaturated alcohol, d) a C1 to C4 nitro-alkane e) a mono- or poly-cyclic internal ether, f) a C3 to C10 aliphatic or an aromatic amine, g) a nitrogen-containing heterocyclic compound.
3.- An additive according to claim 1, wherein compon-ents a), b), c), d), e), f) and g) are present in respective amounts of:
a) 0% to 16.50%
b) 0.001 to 16.50%
c) 0.001 to 16.50%
d) 0.001 to 10.00%
e) 0.001 to 16.50%
f) 0 to 3.33%
g) 0 to 3.33%
by weight based on the weight of said additive.
a) 0% to 16.50%
b) 0.001 to 16.50%
c) 0.001 to 16.50%
d) 0.001 to 10.00%
e) 0.001 to 16.50%
f) 0 to 3.33%
g) 0 to 3.33%
by weight based on the weight of said additive.
4.- A method for stabilizing a composition based on halogenated solvents of formula CnHzFpCly, in which 1 ? n ?
6, p ? 0. y ? 1,z ? 0 comprising the addition to said sol-vents of 0.01% to 5% by weight, based on the weight of said solvents of limonene epoxide.
6, p ? 0. y ? 1,z ? 0 comprising the addition to said sol-vents of 0.01% to 5% by weight, based on the weight of said solvents of limonene epoxide.
5.- A method for composition stabilization according to claim 4, comprising the addition to said solvents of an amount of 0.2% to 3% by weight, based on the weight of said solvents of limonene epoxide.
6.- A method for composition stabilization according to claim 4, wherein it includes the addition to said composition of at least one of the the following co-stabilizers:
a) a C2 to C7 epoxy compound different from limonene epoxide, b) a C1 to C7 saturated alcohol, c) a C3 to C6 unsaturated alcohol, d) a C1 to C4 nitro-alkane, e) a mono- or poly-cyclic internal ether, f) a C3 to C10 aromatic or aliphatic amine, g) a nitrogen-containing heterocyclic compound.
a) a C2 to C7 epoxy compound different from limonene epoxide, b) a C1 to C7 saturated alcohol, c) a C3 to C6 unsaturated alcohol, d) a C1 to C4 nitro-alkane, e) a mono- or poly-cyclic internal ether, f) a C3 to C10 aromatic or aliphatic amine, g) a nitrogen-containing heterocyclic compound.
7.- A method for composition stabilization according to claim 6, wherein components a), b), c), d), e), f) and g) are added in respective amounts of:
a) 0% to 5%
b) 0.1 to 5%
c) 0.1 to 5%
d) 0.1 to 3%
e) 0.1 to 5%
f) 0.001 to 1%
g) 0 to 1%
based on the weight of said composition.
a) 0% to 5%
b) 0.1 to 5%
c) 0.1 to 5%
d) 0.1 to 3%
e) 0.1 to 5%
f) 0.001 to 1%
g) 0 to 1%
based on the weight of said composition.
8.- A method for composition stabilization according to claim 6, wherein component a) constitutes from 0% to 3% by weight of said composition and is selected from the group comprising: epoxypropane, epoxybutane, 2-methyl-epoxypropane, 2-methyl-epoxybutanes, epichlorhydrine and mixtures thereof.
9.- A method for composition stabilization according to claim 6, wherein component b) makes up from 0.5 to 3.5% by weight of said composition and is selected from the group comprising: methanol, ethanol, propanol, isopropanol, butanol-1, butanol-2, tertiary butylic alcohol, pentanols such as tertiary amylic alcohol, methylcellosolve, ethyl-cellosolve, propylcellosolve, butylcellosolve, glycerine, ethyleneglycol, propyleneglycol, 2-hydroxy-2-methyl-3-butanone, 3,3-dimethoxy-2-methylbutanol-2 and 3-amino-2-methylbutanol-2.
10.- A method for composition stabilization according to claim 9, wherein component b) is selected from the group comprising propanol, tertiary and secondary butanol and ter-tiary pentanol and mixtures thereof.
11.- A method for composition stabilization according to claim 6, wherein component c) is added in an amount of 0.3 to 3% by weight to said composition and is selected from the group comprising: allylic alcohol, 2-methyl-3-butene-2-ol, 2-methyl-3-butyne-2-ol and mixtures thereof.
12.- A method for composition stabilization according to claim 6, wherein component d) is added in an amount of from 0.5 to 1.5% by weight of said composition and is selected from the group comprising: nitromethane, nitroethane, nitro-propane-1, nitropropane-2 and mixtures thereof.
13.- A method for composition stabilization according to claim 6, wherein component e) is added in an amount of from 0.5 to 2.5% by weight of said composition and is selected from the group comprising: mono- or poly-cyclic ethers, op-tionally containing other heteroatoms, containing one or several saturated or unsaturated optionally substituted cycles having 5 or 6 carbon atoms and preferably comprising 1,3-dioxanne, 1,4-dioxanne, 1;3,5-trioxanne, 1,3-dioxolanne, dioxene, dioxadiene, thioxanne, oxazole, tetrahydrofuranne, or diphenyl oxide.
14.- A method for composition stabilization according to claim 6, wherein component f) is added in an amount of from 0.005 to 0.1% by weight based on the weight of said composi-tion and is selected from the group comprising the secondary and tertiary aliphatic amines and aromatic amines such as aniline optionally substituted by C1 to C4 alkyl groups or chlorine atoms.
15.- A method for composition stabilization according to claim 14, wherein said amine is selected from the group com-prising: triethylamine, diisopropylamine, amylamine, hexyl-amine.
16.- A method for composition stabilization according to claim 6, wherein component g) is added in an amount of from 0.005 to 0.1% by weight based on the weight of said composi-tion and is selected from the group of heterocyclic compounds having 4 to 12 carbon atoms and 1 to 2 nitrogen atoms in
17 their molecule, such as pyridine, the picolines, phenothiaz-ine, morpholine, pyrrole and pyrrolidine and derivatives thereof substituted by alkyl groups on the nitrogen atom.
17.- A method for composition stabilization according to claim 4, wherein it includes the addition to said solvents of at least one other conventional co-stabilizer selected from the group comprising esters, nitriles, ketones, phenolic compounds and olefinic compounds, in an amount of up to 5% by weight, based on the weight of said composition.
17.- A method for composition stabilization according to claim 4, wherein it includes the addition to said solvents of at least one other conventional co-stabilizer selected from the group comprising esters, nitriles, ketones, phenolic compounds and olefinic compounds, in an amount of up to 5% by weight, based on the weight of said composition.
18.- A method for composition stabilization according to claim 17, wherein said conventional co-stabilizers comprise isopropyl acetate and/or di-isobutylene.
19.- A stabilized halogenated solvent composition of formula CnHzFpCly, in which 1 ? n ? 6, p ? 0. y ? 1, z ? 0, obtained using the method according to any one of claims 4 to 18.
20.- A stabilized composition in accordance with claim 19, wherein said solvent is selected from the group compris-ing: 1,1,1-trichloroethane, trichloroethylene, perchloro-ethylene, methylene chloride, and mixtures thereof.
21.- Use of a stabilized composition in accordance with claim 19 or 20 for degreasing and/or cleaning metal parts.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9111907 | 1991-09-27 | ||
FR9111907 | 1991-09-27 |
Publications (1)
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CA2079195A1 true CA2079195A1 (en) | 1993-03-28 |
Family
ID=9417353
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CA002079195A Abandoned CA2079195A1 (en) | 1991-09-27 | 1992-09-25 | Method and additive for stabilizing degreasing compositions based on halogenated solvents |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP0534829A1 (en) |
JP (1) | JPH07196545A (en) |
KR (1) | KR930005950A (en) |
CA (1) | CA2079195A1 (en) |
FI (1) | FI924318L (en) |
NO (1) | NO923715L (en) |
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FR2861390B1 (en) * | 2003-10-24 | 2006-01-21 | Arkema | STABILIZATION OF TRANS-1,2-DICHLORETHYLENE |
AT522091B1 (en) * | 2019-03-21 | 2020-08-15 | Steger Heinrich | Method for producing a dental prosthesis |
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NL274140A (en) * | 1961-03-13 | 1964-09-10 | ||
FR2486967A1 (en) * | 1980-07-15 | 1982-01-22 | Solvay | STABILIZED COMPOSITIONS OF 1,1,1-TRICHLOROETHANE |
US4418231A (en) * | 1981-08-07 | 1983-11-29 | Ppg Industries, Inc. | Corrosion inhibited solvent compositions |
-
1992
- 1992-09-18 EP EP92402574A patent/EP0534829A1/en not_active Withdrawn
- 1992-09-24 NO NO92923715A patent/NO923715L/en unknown
- 1992-09-25 KR KR1019920017549A patent/KR930005950A/en not_active Ceased
- 1992-09-25 CA CA002079195A patent/CA2079195A1/en not_active Abandoned
- 1992-09-25 FI FI924318A patent/FI924318L/en not_active Application Discontinuation
- 1992-09-28 JP JP4282452A patent/JPH07196545A/en active Pending
Also Published As
Publication number | Publication date |
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FI924318A0 (en) | 1992-09-25 |
JPH07196545A (en) | 1995-08-01 |
KR930005950A (en) | 1993-04-20 |
NO923715D0 (en) | 1992-09-24 |
EP0534829A1 (en) | 1993-03-31 |
FI924318A7 (en) | 1993-03-28 |
FI924318L (en) | 1993-03-28 |
NO923715L (en) | 1993-03-29 |
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