CA2075651A1 - Compositions d'appret anti-photodegradation pour electrodeposition - Google Patents
Compositions d'appret anti-photodegradation pour electrodepositionInfo
- Publication number
- CA2075651A1 CA2075651A1 CA 2075651 CA2075651A CA2075651A1 CA 2075651 A1 CA2075651 A1 CA 2075651A1 CA 2075651 CA2075651 CA 2075651 CA 2075651 A CA2075651 A CA 2075651A CA 2075651 A1 CA2075651 A1 CA 2075651A1
- Authority
- CA
- Canada
- Prior art keywords
- light stabilizer
- substrate
- composition
- applying
- primer composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 title abstract 6
- 238000001782 photodegradation Methods 0.000 title 1
- 239000004611 light stabiliser Substances 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 3
- 238000000034 method Methods 0.000 abstract 2
- SBOJXQVPLKSXOG-UHFFFAOYSA-N o-amino-hydroxylamine Chemical compound NON SBOJXQVPLKSXOG-UHFFFAOYSA-N 0.000 abstract 2
- 150000001412 amines Chemical class 0.000 abstract 1
- OSIVCXJNIBEGCL-UHFFFAOYSA-N bis(2,2,6,6-tetramethyl-1-octoxypiperidin-4-yl) decanedioate Chemical group C1C(C)(C)N(OCCCCCCCC)C(C)(C)CC1OC(=O)CCCCCCCCC(=O)OC1CC(C)(C)N(OCCCCCCCC)C(C)(C)C1 OSIVCXJNIBEGCL-UHFFFAOYSA-N 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 230000032798 delamination Effects 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
Landscapes
- Paints Or Removers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Biological Depolymerization Polymers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US07/745,797 US5260135A (en) | 1991-07-26 | 1991-08-16 | Photodegradation-resistant electrodepositable primer compositions |
| US745,797 | 1991-08-16 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CA2075651A1 true CA2075651A1 (fr) | 1993-02-17 |
| CA2075651C CA2075651C (fr) | 1999-01-26 |
Family
ID=24998301
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA 2075651 Expired - Fee Related CA2075651C (fr) | 1991-08-16 | 1992-08-10 | Compositions d'appret anti-photodegradation pour electrodeposition |
Country Status (2)
| Country | Link |
|---|---|
| CA (1) | CA2075651C (fr) |
| MX (1) | MX9204689A (fr) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0576943A1 (fr) * | 1992-06-30 | 1994-01-05 | Basf Corporation | Procédé d'enduction d'un substrat métallique |
| WO1995000594A2 (fr) * | 1993-06-23 | 1995-01-05 | Ppg Industries, Inc. | Compositions pour appret electrodeposable resistant a la degradation photochimique |
-
1992
- 1992-08-10 CA CA 2075651 patent/CA2075651C/fr not_active Expired - Fee Related
- 1992-08-13 MX MX9204689A patent/MX9204689A/es unknown
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0576943A1 (fr) * | 1992-06-30 | 1994-01-05 | Basf Corporation | Procédé d'enduction d'un substrat métallique |
| WO1995000594A2 (fr) * | 1993-06-23 | 1995-01-05 | Ppg Industries, Inc. | Compositions pour appret electrodeposable resistant a la degradation photochimique |
| WO1995000594A3 (fr) * | 1993-06-23 | 1995-02-23 | Ppg Industries Inc | Compositions pour appret electrodeposable resistant a la degradation photochimique |
Also Published As
| Publication number | Publication date |
|---|---|
| MX9204689A (es) | 1994-06-30 |
| CA2075651C (fr) | 1999-01-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EEER | Examination request | ||
| MKLA | Lapsed |