CA2037769A1 - Photoinitiator mixtures - Google Patents
Photoinitiator mixturesInfo
- Publication number
- CA2037769A1 CA2037769A1 CA 2037769 CA2037769A CA2037769A1 CA 2037769 A1 CA2037769 A1 CA 2037769A1 CA 2037769 CA2037769 CA 2037769 CA 2037769 A CA2037769 A CA 2037769A CA 2037769 A1 CA2037769 A1 CA 2037769A1
- Authority
- CA
- Canada
- Prior art keywords
- halogen
- phenyl
- weight
- parts
- substituted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 58
- 150000001875 compounds Chemical class 0.000 claims abstract description 31
- 239000012965 benzophenone Substances 0.000 claims abstract description 17
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 claims abstract description 13
- -1 biphenylyl Chemical group 0.000 claims description 89
- 229910052736 halogen Inorganic materials 0.000 claims description 43
- 150000002367 halogens Chemical group 0.000 claims description 43
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 41
- 125000001624 naphthyl group Chemical group 0.000 claims description 25
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 claims description 23
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 18
- 229910052739 hydrogen Inorganic materials 0.000 claims description 14
- 239000001257 hydrogen Substances 0.000 claims description 14
- 150000002431 hydrogen Chemical class 0.000 claims description 12
- 229910052760 oxygen Inorganic materials 0.000 claims description 12
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 11
- 239000001301 oxygen Substances 0.000 claims description 11
- 125000002373 5 membered heterocyclic group Chemical group 0.000 claims description 9
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 9
- 229910052757 nitrogen Inorganic materials 0.000 claims description 9
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 claims description 9
- 239000011593 sulfur Substances 0.000 claims description 9
- 229910052717 sulfur Inorganic materials 0.000 claims description 9
- 150000008366 benzophenones Chemical class 0.000 claims description 8
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 claims description 6
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 claims description 5
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 5
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 5
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 4
- 229910052698 phosphorus Inorganic materials 0.000 claims description 4
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 3
- ZEDSKTISNTXEQI-UHFFFAOYSA-N [(2,6-dichlorobenzoyl)-(4-propylphenyl)phosphoryl]-(2,6-dichlorophenyl)methanone Chemical compound C1=CC(CCC)=CC=C1P(=O)(C(=O)C=1C(=CC=CC=1Cl)Cl)C(=O)C1=C(Cl)C=CC=C1Cl ZEDSKTISNTXEQI-UHFFFAOYSA-N 0.000 claims description 3
- 239000003960 organic solvent Substances 0.000 claims description 3
- RGSFGYAAUTVSQA-UHFFFAOYSA-N pentamethylene Natural products C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 claims description 3
- 125000004817 pentamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 claims description 3
- 125000004437 phosphorous atom Chemical group 0.000 claims description 3
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 claims description 3
- 125000002030 1,2-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([*:2])C([H])=C1[H] 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 125000002529 biphenylenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C12)* 0.000 claims description 2
- 125000004956 cyclohexylene group Chemical group 0.000 claims description 2
- 125000005678 ethenylene group Chemical group [H]C([*:1])=C([H])[*:2] 0.000 claims description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims description 2
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims description 2
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims 14
- 125000000229 (C1-C4)alkoxy group Chemical group 0.000 claims 13
- 125000004642 (C1-C12) alkoxy group Chemical group 0.000 claims 5
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims 2
- 239000000049 pigment Substances 0.000 claims 1
- 239000012463 white pigment Substances 0.000 claims 1
- 210000003298 dental enamel Anatomy 0.000 abstract description 11
- 239000003999 initiator Substances 0.000 abstract description 4
- ZWVHTXAYIKBMEE-UHFFFAOYSA-N 2-hydroxyacetophenone Chemical compound OCC(=O)C1=CC=CC=C1 ZWVHTXAYIKBMEE-UHFFFAOYSA-N 0.000 abstract description 2
- 238000000016 photochemical curing Methods 0.000 abstract description 2
- 239000000178 monomer Substances 0.000 description 8
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 7
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- 238000009472 formulation Methods 0.000 description 5
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 239000004411 aluminium Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 3
- 229920006337 unsaturated polyester resin Polymers 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- 125000004098 2,6-dichlorobenzoyl group Chemical group O=C([*])C1=C(Cl)C([H])=C([H])C([H])=C1Cl 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 150000008365 aromatic ketones Chemical class 0.000 description 2
- 239000008199 coating composition Substances 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000004927 fusion Effects 0.000 description 2
- 238000007373 indentation Methods 0.000 description 2
- 239000000976 ink Substances 0.000 description 2
- 239000004611 light stabiliser Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- RPGWZZNNEUHDAQ-UHFFFAOYSA-N phenylphosphine Chemical compound PC1=CC=CC=C1 RPGWZZNNEUHDAQ-UHFFFAOYSA-N 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 238000011417 postcuring Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- VMHYWKBKHMYRNF-UHFFFAOYSA-N (2-chlorophenyl)-phenylmethanone Chemical compound ClC1=CC=CC=C1C(=O)C1=CC=CC=C1 VMHYWKBKHMYRNF-UHFFFAOYSA-N 0.000 description 1
- CSUUDNFYSFENAE-UHFFFAOYSA-N (2-methoxyphenyl)-phenylmethanone Chemical compound COC1=CC=CC=C1C(=O)C1=CC=CC=C1 CSUUDNFYSFENAE-UHFFFAOYSA-N 0.000 description 1
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 1
- KTDVNFPRWNZHMH-UHFFFAOYSA-N (4-butoxyphenyl)-phenylmethanone Chemical compound C1=CC(OCCCC)=CC=C1C(=O)C1=CC=CC=C1 KTDVNFPRWNZHMH-UHFFFAOYSA-N 0.000 description 1
- AXXBJTBURGGOFN-UHFFFAOYSA-N (4-chlorophenyl)-(1-hydroxycyclohexyl)methanone Chemical compound C=1C=C(Cl)C=CC=1C(=O)C1(O)CCCCC1 AXXBJTBURGGOFN-UHFFFAOYSA-N 0.000 description 1
- SWFHGTMLYIBPPA-UHFFFAOYSA-N (4-methoxyphenyl)-phenylmethanone Chemical compound C1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1 SWFHGTMLYIBPPA-UHFFFAOYSA-N 0.000 description 1
- WXPWZZHELZEVPO-UHFFFAOYSA-N (4-methylphenyl)-phenylmethanone Chemical compound C1=CC(C)=CC=C1C(=O)C1=CC=CC=C1 WXPWZZHELZEVPO-UHFFFAOYSA-N 0.000 description 1
- OVDYCAUPPUEIJO-UHFFFAOYSA-N (4-tert-butylphenyl)-diphenylphosphorylmethanone Chemical compound C1=CC(C(C)(C)C)=CC=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 OVDYCAUPPUEIJO-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- KOMNUTZXSVSERR-UHFFFAOYSA-N 1,3,5-tris(prop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical compound C=CCN1C(=O)N(CC=C)C(=O)N(CC=C)C1=O KOMNUTZXSVSERR-UHFFFAOYSA-N 0.000 description 1
- OZCMOJQQLBXBKI-UHFFFAOYSA-N 1-ethenoxy-2-methylpropane Chemical compound CC(C)COC=C OZCMOJQQLBXBKI-UHFFFAOYSA-N 0.000 description 1
- BUZMJVBOGDBMGI-UHFFFAOYSA-N 1-phenylpropylbenzene Chemical compound C=1C=CC=CC=1C(CC)C1=CC=CC=C1 BUZMJVBOGDBMGI-UHFFFAOYSA-N 0.000 description 1
- VOBUAPTXJKMNCT-UHFFFAOYSA-N 1-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound CCCCCC(OC(=O)C=C)OC(=O)C=C VOBUAPTXJKMNCT-UHFFFAOYSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- 125000005808 2,4,6-trimethoxyphenyl group Chemical group [H][#6]-1=[#6](-[#8]C([H])([H])[H])-[#6](-*)=[#6](-[#8]C([H])([H])[H])-[#6]([H])=[#6]-1-[#8]C([H])([H])[H] 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- YIJYFLXQHDOQGW-UHFFFAOYSA-N 2-[2,4,6-trioxo-3,5-bis(2-prop-2-enoyloxyethyl)-1,3,5-triazinan-1-yl]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCN1C(=O)N(CCOC(=O)C=C)C(=O)N(CCOC(=O)C=C)C1=O YIJYFLXQHDOQGW-UHFFFAOYSA-N 0.000 description 1
- 125000001340 2-chloroethyl group Chemical group [H]C([H])(Cl)C([H])([H])* 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- GTELLNMUWNJXMQ-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CCC(CO)(CO)CO GTELLNMUWNJXMQ-UHFFFAOYSA-N 0.000 description 1
- 125000002941 2-furyl group Chemical group O1C([*])=C([H])C([H])=C1[H] 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- MYISVPVWAQRUTL-UHFFFAOYSA-N 2-methylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3SC2=C1 MYISVPVWAQRUTL-UHFFFAOYSA-N 0.000 description 1
- KTALPKYXQZGAEG-UHFFFAOYSA-N 2-propan-2-ylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC=C3SC2=C1 KTALPKYXQZGAEG-UHFFFAOYSA-N 0.000 description 1
- 125000004105 2-pyridyl group Chemical group N1=C([*])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000000175 2-thienyl group Chemical group S1C([*])=C([H])C([H])=C1[H] 0.000 description 1
- 125000003349 3-pyridyl group Chemical group N1=C([H])C([*])=C([H])C([H])=C1[H] 0.000 description 1
- YDIYEOMDOWUDTJ-UHFFFAOYSA-N 4-(dimethylamino)benzoic acid Chemical compound CN(C)C1=CC=C(C(O)=O)C=C1 YDIYEOMDOWUDTJ-UHFFFAOYSA-N 0.000 description 1
- 125000004861 4-isopropyl phenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- VMRIVYANZGSGRV-UHFFFAOYSA-N 4-phenyl-2h-triazin-5-one Chemical compound OC1=CN=NN=C1C1=CC=CC=C1 VMRIVYANZGSGRV-UHFFFAOYSA-N 0.000 description 1
- 125000000339 4-pyridyl group Chemical group N1=C([H])C([H])=C([*])C([H])=C1[H] 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- XIKJESFMRFMGJK-UHFFFAOYSA-N COC1=C(C(=O)P(C2=CC=CC=C2)(C2=CC=CC=C2)=O)C(=CC=C1)OC.ClC1=C(C(=O)P(C2=CC=CC=C2)(C2=CC=CC=C2)=O)C(=CC=C1)Cl.CC1=C(C(=O)P(C2=CC=CC=C2)(C2=CC=CC=C2)=O)C(=CC(=C1)C)C.CC1=C(C(=O)P(C2=CC=CC=C2)(C2=CC=CC=C2)=O)C(=CC=C1)C Chemical compound COC1=C(C(=O)P(C2=CC=CC=C2)(C2=CC=CC=C2)=O)C(=CC=C1)OC.ClC1=C(C(=O)P(C2=CC=CC=C2)(C2=CC=CC=C2)=O)C(=CC=C1)Cl.CC1=C(C(=O)P(C2=CC=CC=C2)(C2=CC=CC=C2)=O)C(=CC(=C1)C)C.CC1=C(C(=O)P(C2=CC=CC=C2)(C2=CC=CC=C2)=O)C(=CC=C1)C XIKJESFMRFMGJK-UHFFFAOYSA-N 0.000 description 1
- GXGJIOMUZAGVEH-UHFFFAOYSA-N Chamazulene Chemical group CCC1=CC=C(C)C2=CC=C(C)C2=C1 GXGJIOMUZAGVEH-UHFFFAOYSA-N 0.000 description 1
- 239000005749 Copper compound Substances 0.000 description 1
- 239000004971 Cross linker Substances 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- VSCYSXBQCDNELJ-UHFFFAOYSA-N [(4-chlorophenyl)-(2,6-dichlorobenzoyl)phosphoryl]-(2,6-dichlorophenyl)methanone Chemical compound C1=CC(Cl)=CC=C1P(=O)(C(=O)C=1C(=CC=CC=1Cl)Cl)C(=O)C1=C(Cl)C=CC=C1Cl VSCYSXBQCDNELJ-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- FHLPGTXWCFQMIU-UHFFFAOYSA-N [4-[2-(4-prop-2-enoyloxyphenyl)propan-2-yl]phenyl] prop-2-enoate Chemical compound C=1C=C(OC(=O)C=C)C=CC=1C(C)(C)C1=CC=C(OC(=O)C=C)C=C1 FHLPGTXWCFQMIU-UHFFFAOYSA-N 0.000 description 1
- CIUQDSCDWFSTQR-UHFFFAOYSA-N [C]1=CC=CC=C1 Chemical class [C]1=CC=CC=C1 CIUQDSCDWFSTQR-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- 230000002152 alkylating effect Effects 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- WURBFLDFSFBTLW-UHFFFAOYSA-N benzil Chemical compound C=1C=CC=CC=1C(=O)C(=O)C1=CC=CC=C1 WURBFLDFSFBTLW-UHFFFAOYSA-N 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- DRDRZHJTTDSOPK-UHFFFAOYSA-N bis(2-chlorophenyl)methanone Chemical compound ClC1=CC=CC=C1C(=O)C1=CC=CC=C1Cl DRDRZHJTTDSOPK-UHFFFAOYSA-N 0.000 description 1
- AJCHRUXIDGEWDK-UHFFFAOYSA-N bis(ethenyl) butanedioate Chemical compound C=COC(=O)CCC(=O)OC=C AJCHRUXIDGEWDK-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 239000011093 chipboard Substances 0.000 description 1
- 125000000068 chlorophenyl group Chemical group 0.000 description 1
- 150000001880 copper compounds Chemical class 0.000 description 1
- WJTCGQSWYFHTAC-UHFFFAOYSA-N cyclooctane Chemical group C1CCCCCCC1 WJTCGQSWYFHTAC-UHFFFAOYSA-N 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004663 dialkyl amino group Chemical group 0.000 description 1
- 125000004915 dibutylamino group Chemical group C(CCC)N(CCCC)* 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- XVKKIGYVKWTOKG-UHFFFAOYSA-N diphenylphosphoryl(phenyl)methanone Chemical compound C=1C=CC=CC=1P(=O)(C=1C=CC=CC=1)C(=O)C1=CC=CC=C1 XVKKIGYVKWTOKG-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- BLCTWBJQROOONQ-UHFFFAOYSA-N ethenyl prop-2-enoate Chemical compound C=COC(=O)C=C BLCTWBJQROOONQ-UHFFFAOYSA-N 0.000 description 1
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- KTWOOEGAPBSYNW-UHFFFAOYSA-N ferrocene Chemical class [Fe+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 KTWOOEGAPBSYNW-UHFFFAOYSA-N 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- PYGSKMBEVAICCR-UHFFFAOYSA-N hexa-1,5-diene Chemical group C=CCCC=C PYGSKMBEVAICCR-UHFFFAOYSA-N 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- NUKZAGXMHTUAFE-UHFFFAOYSA-N hexanoic acid methyl ester Natural products CCCCCC(=O)OC NUKZAGXMHTUAFE-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 150000002443 hydroxylamines Chemical class 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- FTWUXYZHDFCGSV-UHFFFAOYSA-N n,n'-diphenyloxamide Chemical compound C=1C=CC=CC=1NC(=O)C(=O)NC1=CC=CC=C1 FTWUXYZHDFCGSV-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- DASJFYAPNPUBGG-UHFFFAOYSA-N naphthalene-1-sulfonyl chloride Chemical class C1=CC=C2C(S(=O)(=O)Cl)=CC=CC2=C1 DASJFYAPNPUBGG-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000003261 o-tolyl group Chemical group [H]C1=C([H])C(*)=C(C([H])=C1[H])C([H])([H])[H] 0.000 description 1
- MPQXHAGKBWFSNV-UHFFFAOYSA-N oxidophosphanium Chemical class [PH3]=O MPQXHAGKBWFSNV-UHFFFAOYSA-N 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- CKFPWZPBRHQASN-UHFFFAOYSA-N phenyl-(4-propan-2-ylphenyl)methanone Chemical compound C1=CC(C(C)C)=CC=C1C(=O)C1=CC=CC=C1 CKFPWZPBRHQASN-UHFFFAOYSA-N 0.000 description 1
- HUCRPDCCPSDJHT-UHFFFAOYSA-N phenyl-(4-propoxyphenyl)methanone Chemical compound C1=CC(OCCC)=CC=C1C(=O)C1=CC=CC=C1 HUCRPDCCPSDJHT-UHFFFAOYSA-N 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 150000003856 quaternary ammonium compounds Chemical class 0.000 description 1
- 238000003847 radiation curing Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 150000003549 thiazolines Chemical class 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- XHGIFBQQEGRTPB-UHFFFAOYSA-N tris(prop-2-enyl) phosphate Chemical compound C=CCOP(=O)(OCC=C)OCC=C XHGIFBQQEGRTPB-UHFFFAOYSA-N 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
- C07F9/5337—Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Molecular Biology (AREA)
- Biochemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Polymerisation Methods In General (AREA)
- Polymerization Catalysts (AREA)
- Paints Or Removers (AREA)
Abstract
Photoinitiator mixtures Abstract of the Disclosure Photoinitiator mixtures comprising a) 100 parts of a mono- or diacylphosphine oxide, b) 10-70 parts of an .alpha.-hydroxyacetophenone, and c) 10-70 parts of a benzophenone are effective initiators for photopolymerisations of ethylenically unsaturated compounds.
They are particularly suitable for photocuring white enamels.
They are particularly suitable for photocuring white enamels.
Description
Photoinitiator mixtures The present invention relates to photoinitiato~ mixtures comprising three components and to photocurable mixtures containing such a photoinitiator mixture.
Acylphosphine oxides are disclosed as highly effective photoinitiators in EP-A-7086 und EP-A-7508. Recently, diacylphosphine oxides have been proposed for this utility (q.v.
(EP-A-184 095). As stated in EP-A-7508, page 13, the effectiveness of the acylphosphine oxides can be further enhanced by combining them with other photoinitiators, especially aromatic ketones. Typical examples of such co-initiators are benzil dimethylketal a-hydroxyisobutyrophenone, diethoxyacetophenone, benzophenone, 2-methyl-thioxanthone, 2-isopropylthioxanthone and 2-chlorothioxanthone. The addition of tertiary amines can effect a further acceleration. Mixtures of such phosphine oxides with aromatic ketones, aromatic disulfides or naphthalenesulfonyl chlorides, especially with benzil ketals, benzoin ethers or benzoin esters are cited in EP-A-7086, claims 6 and 7.
It has now been found that the etfectiveness of the mono- and diacylphosphine oxides can be further enhanced by combining them with two o~her different photoinitiators, one of which is an a-hydroxyacetophenone and the other is a benzophenone. Such a photoinitiator mixture is particularly suitable for photocuring pigmented rnatelials, " especially white enamels.
Accordingly, the invention relates to a photoinitiator mixture comprising ., ~.
a) 100 parts by weight of a compound of formula I, O O
,., 11 11 `i R~--P--C--R3 'il . R2 ., wherein Rl is Cl-C18alkyl, Cl-C4alkyl which is substituted by halogen or Cl-C6aLkoxy, or .j is Cs-C8cycloalkyl, C7-Cgphenylalkyl, phenyl, naphthyl or biphenylyl, or phenyl, naphthyl ., ~ .: .... . .. ., .. ~.. . . . . . . . . . . .
,,: . . . . . . . . . . .
Acylphosphine oxides are disclosed as highly effective photoinitiators in EP-A-7086 und EP-A-7508. Recently, diacylphosphine oxides have been proposed for this utility (q.v.
(EP-A-184 095). As stated in EP-A-7508, page 13, the effectiveness of the acylphosphine oxides can be further enhanced by combining them with other photoinitiators, especially aromatic ketones. Typical examples of such co-initiators are benzil dimethylketal a-hydroxyisobutyrophenone, diethoxyacetophenone, benzophenone, 2-methyl-thioxanthone, 2-isopropylthioxanthone and 2-chlorothioxanthone. The addition of tertiary amines can effect a further acceleration. Mixtures of such phosphine oxides with aromatic ketones, aromatic disulfides or naphthalenesulfonyl chlorides, especially with benzil ketals, benzoin ethers or benzoin esters are cited in EP-A-7086, claims 6 and 7.
It has now been found that the etfectiveness of the mono- and diacylphosphine oxides can be further enhanced by combining them with two o~her different photoinitiators, one of which is an a-hydroxyacetophenone and the other is a benzophenone. Such a photoinitiator mixture is particularly suitable for photocuring pigmented rnatelials, " especially white enamels.
Accordingly, the invention relates to a photoinitiator mixture comprising ., ~.
a) 100 parts by weight of a compound of formula I, O O
,., 11 11 `i R~--P--C--R3 'il . R2 ., wherein Rl is Cl-C18alkyl, Cl-C4alkyl which is substituted by halogen or Cl-C6aLkoxy, or .j is Cs-C8cycloalkyl, C7-Cgphenylalkyl, phenyl, naphthyl or biphenylyl, or phenyl, naphthyl ., ~ .: .... . .. ., .. ~.. . . . . . . . . . . .
,,: . . . . . . . . . . .
2~37~3 or biphenylyl which are each substituted by one or more identical ~r different members of the group consisting of halogen, Cl-Cl2alkyl and/or Cl-CI2aLtcoxy, or is a monovalent, 5-or 6-membered heterocyclic radical which contains nitrogen, oxygen or sulfur, R2 is phenyl, naphthyl or biphenylyl, or phenyl, naphthyl or biphenylyl which are each substituted by one or more identical or different members of the group consisting of halogen, Cl-Cl2alkyl and/or Cl-Cl2alkoxy, or is a monovalent, 5- or 6-membered heterocyclic radical which contains nitrogen, oxygen or sulfur, or is Cl-Cl8alkoxy, phenoxy or phenoxy which is substituted by halogen, Cl-C4aLkyl or Cl-C4alkoxy, or is benzyloxy, cyclohexyloxy or a -CO-R4 group, or R2 and Rl, together with the phosphorus atom, form a ring, R3 is Cl-C18alkyl, Cl-C4aL~yl which is substiluted by halogen or Cl-C6alkoxy, or is .
Cs-C8-cycloalkyl, C7-Cgphenylalkyl, phenyl, naphthyl or biphenylyl, or phenyl, naphthyl or biphenylyl which are each substituted by one more identical or different members selected from the group consisting of halogen, Cl-CI2alkyl and/or Cl-Cl2aLkoxy, or is a monovalent, 5- or 6-membered heterocyclic radical which contains nitrogen, oxygen or sulfur, or is a group O O
. Il 11 --X--C~P--Rl wherein X is C2-C8alkylene, cyclohexylene, or phenylene or biphenylene which are each .
unsubstituted or substituted by halogen, Cl-C4alkyl or Cl-C4aL~coxy, and R4 is Cl-Cl8aLkyl, Cl-C4alkyl which is substituted by halogen or Cl-C4alkoxy, or is C5-C8cycloaLIcyl, C7-CgphenylaL~cyl, phenyl, naphthyl or biphenylyl, or phenyl, naphthyl or biphenylyl which are each substituted by one more identical or different members ; selected from the group consisting of halogen, Cl-Cl2alkyl and/or Cl-C12alkoxy, or is a monovalent, 5- or 6-membered heterocyclic radical which contains nitrogen, oxygen or sulfur, or R4 and R3, when taken together, are C2-Cl2aLtsylene, vinylene or o-phenylene, ..
b) lO-70 parts by weight of compound of formula II, R~ CllC_OH 11 , R7 R9 ., -... .
,. . . `. ,, : ..
." '' '~'` ,' ' "~ ", . - .'',' :'.
wherein R6 and R7 are each independently of the other hydrogen, Cl-CI8alkyl, phenyl9 Cl-C~8alkoxy, phenoxy, Cl-Cl8alkylthio, phenylthio, C2-C8diaLlcylamino, piperidino, morpholino or halogen, and R8 and Rg are each independently of the other Cl-C6alkyl, C3-C6alkenyl, C7-Cgphenylalkyl or cyclohexyl, or R8 and Rg, when taken together, are C4-C6alkylene, and c) 10-70 parts by weight of a compound of formula III, ~ ¦¦ ~R~ 3 wherein Rl 1, Rl2 and Rl3 are each independently of one another hydrogen, Cl-Cl2alkyl, Cl-C4-alkoxy, Cl-C4alkylthio, halogen or C2-C6alkoxycarbonyl, or a mixture of such benzophenone derivatives.
The substituents Rl, R3, R4, R6, R7, R8, Rg, Rl" Rl2 or Rl3 defined as alkyl may be unbranched or branched alkyl. Such aLkyl groups are typically methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, tert-butyl, n-pentyl, isopentyl, n-hexyl, 2-ethybutyl, n-octyl, isooctyl, 1,1,3,3-tetramethylbutyl, 2-ethylhexyl, nonyl, decyl, undecyl, dodecyl, tetradecyl, hexadecyl or octadecyl.
.
Rl, R3 or R4 as Cl-C4aLkyl which is substituted by halogen or Cl-C6alkoxy may bechlc)romethyl, trichloromethyl, trifluoromethyl, 2-chloroethyl, 2-me~hoxyethyl, - 2-ethoxypropyl, 2-butoxyethyl or 2-hexyloxyethyl.
:
Rl or R3 as Cs-C8cycloalkyl is preferably cyclohexyl. Rl, R3, R8 or Rg as C7-Cgphenylalkyl is preferably benzyl. R8 or R9 as C3-C6alkenyl is preferably allyl.
Rl, R2, R3 or R4 as phenyl, naphthyl or biphenylyl which are each substituted by one or more identica1 or different members selected from the group consisting of halogen, !'i Cl-CI2alkyl and/or Cl-Cl2alkoxy may be chlorophenyl, 2t4-dichlorophenyl, 2,6-dichlorophenyl, 2,4,6-trichlorophenyl, 4-tolyl, 2-tolyl, 2,4-xylyl, '', .
., -,, -, - .. . . : :: : .. : : . .
: : ~ : - : : . . , :: :
,. ~ : . ~ . . .
~ ~ , . . . . .
20377~9 . . .
2,4,6-trimethylphenyl, 4-isopropylphenyl, 4-tert-butylphenyl, 4-octylphenyl, 4-dodecylphenyl, 4-methoxyphenyl, 2,4-dimethoxyphenyl, 2,4,6-trimethoxyphenyl, 2-chloro-6-methoxyphenyl, 4-ethoxyphenyl, 4-isopropoxyphenyl, 4-hexyloxyphenyl, 1,3-dichloro-2-naphthyl, 1,3-dimethoxy-2-naphthyl, 2,8-dimethoxy-1-naphthyl, 2,8-di-- methyl-1-naphthyl, 4'-chloro-4-biphenylyl or 4'-ethoxy-4-biphenylyl. The preferred significance is a substituted phenyl radical.
Rl, R2, R3 or R4 as a a monovalent, 5- or 6-membered heterocyclic radical which contains nitrogen, oxygen or sulfur may be a 2-, 3- or 4-pyridyl, 2,4-dimethyl-3-pyridyl, 2-furyl, 2,4-dimethoxy-3-furyl, 2-thienyl or 2,4-dimethoxy-3-thienyl.
: , Rll, Rl2 and R13 as Cl-C4alkoxy or Cl-C4alkylthio are preferably methoxy, ethoxy or methylthio. R2, R6 or R7 as Cl-C18aLlcoxy may be methoxy, ethoxy, isopropoxy, tert-butoxy, hexyloxy, octyloxy or dodecyloxy. R6 and R7 as Cl-CI8alkylthio preferably Cl-C4alkylthio.
R2 as subsdtuted phenoxy may be 4-chlorophenoxy, 2,4-dichlorphenoxy, 2,4,6-trichlorophenoxy~ 4-tolyloxy, 2,6-dimethylphenoxy, 2,4,6-trimethylphenoxy,3-methoxyphenoxy or 4-ethoxyphenoxy.
R6 or R7 as C2-C~dialkylamino may be dimethylatnino, diethylamino, dipropylamino or dibutylamino.
Rll, Rl2 or Rl3 as C2-C6alkoxycarbonyl may preferably be methoxycarbonyl or ethoxycarbonyl.
,.i :~j X as C2-C8alkylen may be 1,2-ethylene, trimethylene, tetramethylene, pentamethylene, ''Jj hexamethylene or octamethylene, or may also be a branched aLkylene group such as ;i 1,2-propylene, diethylmethylene or 2,2-dimethyl~rimethylene. R4 and R3 together as C2-C12alkylene may preferably be dimethylene or trimethylene which may be substituted ~; ~ by aL~cyl groups.
,'~
R8 and Rg together as C4-C6alkylene may preferably be tetramethylene or pentamethylene.
A ring formed by R2 and R1 together with the phosphorus atom is preferably a 5- or ~membered ring. The ring may contain oxygen and can be fused with benzene rings.
~:, :~ .. : : - , - . .. . . .- . ...
' - - ~ - ~
..
, . : , . .
.. . .
... .. . . .
... . . .
Preferred photoinitiator mixtures comprise a) 100 parts by weight of a compound of formula I, wherein Rl is phenyl, naphthyl or biphenylyl which are each unsubstituted or substituted by halogen, Cl-C4aLkyl or Cl-C4alkoxy, R2 is phenyl, naphthyl or biphenylyl which are each unsubstituted or substituted by halogen, Cl-C4aLIcyl or Cl-C4alkoxy or is a -CO-R4 group, R3 and R4 are each independently of the other Cl-CI2aLkyl, cyclohexyl, benzyl, phenyl, naphthyl or biphenylyl, or phenyl, naphthyl or biphenylyl which are each substituted by one more identical or different groups selected from the group consisting of halogen, Cl-C4alkyl and/or Cl-C4alkoxy, b) 20-70 parts by weight of a compound of formula II, wherein R6 and R7 are eachindependently of the other hydrogen, Cl-CI2alkyl, phenyl, Cl-CI2alkoxy, phenoxy or halogen, and R8 and Rg are each independently of the other Cl-C4alkyl, allyl or benzyl, or R8 and R9, when taken together, are C4-C6alkylene, and c) 10-60 parts by weight of a compound of folmula III, wherein Rll, Rl~ and Rl3 are each independently of one another hydrogen, Cl-C6alkyl, Cl-C4alkoxy or halogen, or a mixture of alkylated benzophenones.
Particularly preferred photoinitiator mixtures comprise -: ~ a) 100 parts by weight of a compound of formula I, wherein Rl is unsubstituted phenyl or phenyl which is substituted by halogen, Cl-C4aLkyl or Cl-C4aL~coxy, R2 is unsubstituted phenyl or phenyl which is substituted by halogen, Cl-C4aLkyl or Cl-C4alkoxy, or is a -CO-R4 group, ~' R3 and R4 are each independently of the other unsubstituted phenyl or phenyl which is substituted by halvgen, Cl-C4alkyl and/or Cl-C4alkoxy, b) 30-60 parts by weight of a compound of formula lI, wherein R6 and R7 are each independently of the other hydrogen, Cl-CI2aL'cyl, Cl-C4aL1coxy or halogen, R8 and R9 are each independently of the other Cl-C4alkyl, or R8 and R9, when taken :. together, are tetramethylene or pentamethylene, and c) 20-60 parts by weight of a compound of formula III, wherein Rll and Rl2 are hydrogen and Rl3 is hydrogen, Cl-C4alkyl, Cl-C4alkoxy or halogen, or a mixture of methylated benzophenones.
; :' ~ .
-- . . . , ",, . ; ,., - . - - . - . . . . . .
: .~, . . . - . . - . , ~ . . . - ~, . .. .
.: . :: .-: ~ : - : : . : :
2~377~
The following compounds are representative examples of compounds suitable for use as component (a):
isobu~royldiphenylphosphine oxide pivaloyldiphenylphosphine oxide benzoyldiphenylphosphine oxide p-toluyldiphenylphosphine oxide p-tert-butylbenzoyldiphenylphosphine oxide a-naphthoyldiphenylphosphine oxide 2,6-dimethylbenzoyldiphenylphosphine oxide 2,6-dimethoxybenzoyldiphenylphosphine oxide 2,4,6-trimethylbenzoyldiphenylphosphine oxide 2,6-dichlorobenzoyldiphenylphosphine oxide 1,3-dimethyl-2-naphthoyldiphenylphosphine oxide 1,3-dichloro-2-naphthoyldiphenylphosphine oxide 2,4-dimethylfuran-3-carbonyldiphenylphosphine oxide 2,4,6-trimethylpyridine-3-carbonyldiphenylphosphinje oxide 2,6-dimethoxybenzoyldiphenylenephosphine oxide 2,6-dichlorobenzoylditolylphosphine oxide methylpivaloylphenylphosphinate methyl-2,4-dimethylbenzoylphenylphosphinate bist2,6-dichlorobenzoyl)phenylphosphine oxide bis(2,6-dichlorobenzoyl)-4-chlorophenylphosphine oxide bis(2,6-dichlorobenzoyl~-4-t-butylphenylphosphine oxide bis(2,6-dichlorobenzoyl)-1-naphthylphosphine oxide bis(2,6-dimethylbenzoyl)phenylphosphine oxide bis(2,6-dimethylbenzoyl)-4-tolylphosphine oxide bis(2,6-dimethoxybenzoyl)phenylphosphine oxide :
bis(2,6-dimethoxybenzoyl)-2-naphthylphosphine oxide bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide bis(2,4,6-~imethylbenzoyl)-4-methoxyphenylphosphine oxide ~is(2-methyl-1-naphthoyl)phenylphosphine oxide bis(2,6-dichlorobenzoyl)-4-propylphenylphosphine oxide.
Compounds especially prefe~ed for use as component a) are 2,4,6-trimethylbenzoyldiphenylphosphine oxide and bis(2,6-dichlorobenzoyl)-4-propyl-phenylphosphine oxide.
.
.
.
. .
- , . , . . - -.
, ,'- . . . .
2~37~69 The following compounds are representa~ive examples of compounds suitable for use as component (b):
a-hydroxyisobutyrophenone p-isopropyl-a-hydroxyisobutyrophenone p-t-butyl-c~-hydroxyisobutyrophenone p-octyl-o~-hydroxyisobutyrophenone p-dodecyl-~-hydroxyisobutyrophenone p-chloro-a-hydroxyisobutyrophenone p-bromo-a-hydroxyisobutyrophenone p-methoxy-a-hydroxyisobutyrophenone p-ethoxy-oc-hydroxyisobutyrophenone 3,4-dimethyl-~-hydroxyisobutyrophenone 3,4-dimethoxy-a-hydroxyisobutyrophenone 3-chloro-a-hydroxyisobutyrophenone a-hydroxy-o~-methylbutyrophenone a-hydroxy-a-ethylbutyrophenone l -benzoylcyclopentanol I -benzoylcyclohexanol 1-(4-chlorobenzoyl)cyclohexanol.
Component b) is most preferably 1-benzoylcyclohexanol.
, The following compounds are representative examples of compounds suitable for use as component (c):
benzophenone, 4-methylbenzophenone, 2,4-dime~hylbenzophenone, 4-isopropylbenzo-phenone, 2-chlorobenzophenone, 2,2'-dichlorobenzophenone, 2-methoxybenzophenone,4-methoxybenzophenone, 4-propoxybenzophenone or 4-butoxybenzophenone. Mixtures of benzophenone derivatives may also be used, technical alkylating mixtures of benzophenone or benzophenone derivatives which are position isomers. Component c) is most preferably benzophenone.
Especially preferred are mixtures of 100 parts by weight of 2,4,6-trimethylbenzoyl-di-phenylphosphine oxide, 30-60 parts by weight of l-benzoylcyclohexanol and 20-40 parts by weight of benzophenone. These mixtures are liquid or low melting, and are therefore particularly suitable for use in liquid photopolymerisable systems.
:, .
, .' ~ ..
. . . . . . . . . .
2037~
The photoinitiators may also contain organic solvents. It is possible to make the mixtures liquid and to regulate their viscosity by the addition of such solvents. Relatively small amounts of solvent suf~lce for this purpose, preferably 5-50 parts by weight per 100 parts by weight of photocurable mixture. Typical examples of suitable solvents are isopropanol, methyl ethyl ketone, butyl acetate or propylene carbonate.
The described mixtures can be used in the practice of this invention as photoinitiators for the photopolymerisation of ethylenically unsaturated compounds or mixtures whichcontain such compounds. The unsaturated compounds can contain one or more olefinic double bonds. They may be low molecular (monomeric) or high molecular (oligomeric) compounds. Monomers containing one double bond are, typically, alkylacrylates orhydroxyalkylacrylates or hydroxyalkylmethacrylates, for exarnple methyl acrylate, ethyl acrylate, butyl acrylate, 2-ethylhexyl acrylate or 2-hydroxyethyl acrylate, isobornyl acrylate, methyl acrylate or ethyl methacrylate. Further examples of such monomers are acrylonitrile, acrylamide, methacrylamide, N-substituted (meth)acrylamides9 vinyl esters such as vinyl acetate, vinyl ethers such as isobutyl vinyl ether, styrene, alkylstyrenes and halostyrenes, N-vinylpyrrolidone, vinyl chloride or vinylidene chloride.
.. . .
~ Monomers containing several double bonds are, typically, ethylene glycol, propylene '' -',!'j glycol, neopentyl glycol, hexamethylene glycol, or bisphenol A diacrylate, 4,4'-bis(2-acryloyloxyethoxy)diphenylpropane, trimethylolpropane triacrylate, pentaerythritol triacrylate or tetraacrylate, vinyl acrylate, divinyl benzene, divinyl succinate, diallyl ~tll phthalate, triallyl phosphate, triallyl isocyanurate or tris(2-acryloyloxyethyl)isocyanurate.
:~ Typical examples of high molecular (oligomeric) polyunsaturated compounds are acrylated epoxy resins, acrylated polyethers, acrylated polyurethanes or acrylated poly-esters. Further examples of unsaturated oligomers are unsaturated polyester resins, which are normally prepared from maleic acid, phthalic acid and one or more diols, and which have molecular weights of ca. 500 to 3000. Such unsaturated oligomers may also be refeIred to as prepolymers.
:~ ' `~1 Often two-component mixtures of a prepolymer with a polyunsaturated monomer, or three-component mixtures which additionally contain a mono-unsaturated monomer, are used. The prepolymer in this case chiefly determines the properties of the coating film. By va~ying it, the skilled person is able to influence the properties of the cured film. The polyunsaturated monomer acts as crosslinker which makes the coating film insoluble. The .
,, , . ,, . ~ , .. . . . . . . . .
~" 2~3~76~
mono-unsaturated monomer acts as reactive diluent with aid of which the viscosity is lowered without haYing to use a solvent.
Such two- and three-componellt systems based on a prepolymer are used for p~inting inks as well as for coating compositions, photoresists or other photocurable materials. Single component systems based on photocurable prepolymers are also often used as binders for printing inks.
Unsaturated polyester resins are normally used in two-component systems together with a mono-unsaturated monomer, preferably with styrene. Speci~lc single component systems are often used for photoresists, for example the polymaleimides, polychalcones or polyimides disclosed in DE-OS 2 308 830.
The unsaturated compounds can also be used in admixture with non-photopolymerisable film-forming components. These components may typically be physically drying polymers or their solutions in organic solvents, such as nitrocellulose or cellulose acetobutyrate.
'rhey may also, however, be chemically curable or therrnocurable resins such as polyisocyanates, polyepoxides or melamine resins. The concomitant use of thermocurable resins is important for use in so-called hybrid systems which are photopGlymerised in a first step and crosslinked by a a thermal aftertreatment in a second step.
The invention thus also relates to photocurable mixtures comprising at least oneethylenically unsaturated compound and, as photoinitiator, a rnixture of a) 100 parts by weight of a compound of formula I, b) 10-70 parts of a compound of formula II, and c) 10-70 parts by weight of a compound of foIrnula III.
." .
in addition to the photoinitiator, the photopolymerisable mixtures may further contain different additives. Such additives are typically thermal inhibitors for preventing a premature polymerisation, for example hydroquinone or sterically hindered phenols.
Copper compounds, phosphorus compounds, quaternary ammonium compounds or hydroxylamines may be used to increase storage stability in the dark. Paraffin or similar wax-like substances which, at the start of polymerisation, migrate to the surface, can be added to exclude atmospheric oxygen. Minor amounts of UV absorbers$ such as those of the benzotriazole, benzophenone, hydroxyphenyltriazine or oxalanilide type, may be added as light stabilisers. Better still is the addition of light stabilisers which do not absorb UV light, for example sterically hindered amines (HALS).
!
/
~ .
~ .
' ' , ~ ' ' 20377~ 9 ~o -Amines may be added to accelerate the photopolymerisation, for example triethanolamine, N-methyl-diethanolamine, p-dimethylaminobenzoate or Michler's ketone. The photopolymerisation can further be accelerated by the addition of photosensitisers which displace or broaden the specral sensitivity. These photosensitisers are preferably aromatic carbonyl compounds such as thioxanthone, anthraquinone and 3-acylcoumarin derivatives as well as 3-(aroylmethylene)thiazolines.
The photocurable compositions of the invention can be used for different purposes. Of primary importance is their use in pigmented coating materials. The mixtures areespecially useful in white enamels, by which are meant paints pigrnented with TiO2.
Further utilities are the radiation curing of photoresists and printed circuit boards, as w~
as the production of printing plates. Another utility is for exterior coats which undergo postcuring on the surface in daylight.
The photoinitiators are conveniently used for the indicated fields of application in amounts of 0.1 to 10 % by weight, prefeMbly ca. 0.5 to 5 % by weight, based on the photocurable mixture.
Photopolymerisation is effected by known techniques by irradiation with light which is rich in shortwave radiation. Suitable light sources are typically mercury medium-pressure, high-pressure and low-pressure lamps, superactinic fluorescent tubes, metal halide lamps or lasers, the maximum emissions of which are in the range from 250 to 450 nm. Where combinations with photosensitisers or ferrocene derivatives are used, it is also possible to use light of longer wavelength or laser beams of up to 600 nm.
A multistep irradiation with radiation sources of different intensity or of different spectral composition may in certain cases be useful. Thus, for example, the wipe resistance of the coating surface can be achieved by a primary exposure and the full cure of the coating composition by a second exposure.
i}
- The use of the photoinitiator mixtures of the invention is illustrated by fo310wing Examples, in which parts and percentages are by weight.
;~
xample 1 A white enamel formulation is prepared from : -i, ~ . .
i :. . . : .
. - . ~ : , . . : , . . .
-: ~ ~ . . - ~ .
- , 2~377~9 13.5 parts of Ebecryl~) 830 (polyester acrylate ex UCB, Belgium), 1.0 part of hexanediol diacrylate 0.5 part of trimethylolpropane trisacrylate, 5.0 parts of titanium dioxide (rutile).
The photoinitiator mixtures indicated in Table 1 are added to this formulation. Samples of the white enamel formulation are applied in a layer thickness of 200 ~lm to aluminium sheets which have been primed with a white coil coat.
.
- The enamel coats are irradiated in a PPG exposure apparatus with HG medium-pressure lamps (2 x 80 W/cm). The number of passes is determined which are necessary for effecting cure (wipe resistance) at a running speed of 10 mlrnin (column 1).
`' The full cure is assessed by means of the pendulum hardness test using the apparatus of Konig (DIN 53 157) and the results are reported in column 2. The samples are then irradiated for 16 hours with S 20 W lamps (Philips TL 05), and the pendulum hardness is again measured (column 3). A certain postcuring of all samples occurs.
.. ~, . . .
The yellowing which occurs during this 16 hours exposure is also determined by measuling the Yellowness Index (YI) in accordance with ASTM D 1925-70 before andafter this exposure (columns 4 and 5).
Finally, the 20 gloss (ASTM D 523) of the samples is measured using a multigloss device (column 6). The results are reported In the following Table.
:
~i! Table 1:
Initiator 1 2 3 4 5 6 ~; 1 % TPO + 0.5 % BCH + 0.5 % BZP 4 41 65 1.9 1.8 72 ;~ 1.20 % l E'O + 0.65 %BCH + 0.65 % BZP 4 53 91 1.9 1.6 75 1.5 % TPO + 0.5 % BCH + 0.5 % BZP 3 39 101 1.6 1.2 77 ;~ 1.5 % TPO + 0.75 % BCH + 0.75 ~o BZP 3 41 81 1.8 1.8 77 , .
'; 1: number of passes to effect wipe resistance ~;~t 2: pendulum hardness after wipe resistance (seconds) .
., . ~
. - . -- . . . . . .
2~37~
3: pendulum hardness after 16 h postcure (seconds) 4: Yellowness Index after wipe resistance 5: Yellowness Index aRer 16 h postcure 6: 20 gloss (%) TPO: 2,4,6-trimethylbenzoyldiphenylphosphine oxide BCH: l-benzoylcyclohexanol BZP: benzophenone Example 2:
A white enamel fo~nulation based on an unsaturated polyester resin and styrene, pigmented with TiO2, is blended with the amounts of photoinitiator indicated in Table 2 and applied to chip boards in a layer thickness of 150 ,um. The samples are precured for 2 minutes under four 40 watt lamps (Philips TL 03). The maximum running speed un~il the samples are wipe-resistant is determined using a 120 W/cm D lamp (ex Fusion Systems) in order to gauge the reactivity of the photoinitiator.
Immediately after the cure, the pendulum hardness is measured with the K~nig pendulum apparatus (DIN 53 157). The samples are then postcured for lS minutes with five 20 W
: lamps (Philips TL 05) and thereafter the pendulum hardness is measured once more.
Table 2 .i .~
r~ Photoinitiator Maxirnum Pendulum hardness (% by wt., based on white enamel runnlng speed immediate after postcure .. 1.5 % TPO 10 m/min 74 91 i 1.30 % TPO
. + 0.10 % BCH 10 m/min 91 112 ~ + 0.10 % BZP
'. .. __ . _ . 2.5 % TPO 30 m/min 66 90 :
.~ 1.30 % TPO
+ 0.60 % BCH 40 m/min 66 91 ,,jl! +0.60%BZP
Example 3:
The white enamel formulation of Example 1 is blended with the photoinitiators listed in Table 3 and applied in a layer thickness of 150 ,um to aluminium sheets which have been .
-. ~ . . . .
, ~ ~ , - ' ' ' :
2al~7769 primed with a white coil coating. The samples are irradiated first for 90 seconds with i~our 40 W-lamps (TL 03). The samples are then irradiated with a Fusion D lamp in two passes at a running speed of 3 m/min and finally irradiated in a further pass at 6 m/min with two 80 W/cm Hg medium pressure lamps (PPG apparatus).
The pendulum hardness of the samples is measured with the Konig pendulum apparatus (DIN 53 1~7) immediately after the cure, after 15 minutes and after 16 hours additional irradiation with four 40 W-lamps. The Yellowness Index is also measured immediately after the cure and after 16 hours further ilTadiation. Finally, the 20 and 60 gloss are measured immediately after the cure and after 16 'nours postcure. The results are reported in Table 3.
Table 3:
.
Initiator 1 2 3 4 5 6 7 _ __ _ 1.17 % TPO + 0.5 ~o BCH + 0.33 % BZP 146 158 195 2.1 0.6 65/87 65/86 1.33 % TPO + 0.33 %BCH + 0.33 % BZP 153 156 188 2.3 0.9 62/85 62/85 1.33 % P.DP + 0.33 ~o BClI + 0.33 % BZF 160 162 174 4.7 1.2 66/85 65/86 ` 1.17 % TPO + 0.5 % BCH + 0.33 % BZP
+ 0.42 % isopropan~l 147 167 190 2.0 0.6 66/86 65/87 1.17%TPO+0.5%BCH+0.33%BZP
+ 0.42 % propylene carbonate 147 156 186 2.4 0.6 76/90 76/90 1: pendulum hardness (sec) immediately after cure 2: pendulum hardness (sec) after 15 min postcure 3: pendulum hardness (sec) after 16 h postcure 4: Yellowness Index immediately after cure ; 5: Yellowness Index after 16 h postcure 6: 20/60 gloss immediately after cure (%) 7: 20/60 gloss after 16 h postcure (%) TPO: 2,4,6-trimethylbenzoyldiphenylphosphine oxide BDP: bis(2,6-dichlorobenzoyl~-4-propylphenylphosphine oxide ~, BCH: 1-benzoylcyclohexanol BZP: benzophenone :i :
.. . ' ! ' . . . . .
~03~6~
Example 4:
The white enamel formulation of Example 1 is blended with the photoinitiators listed in Table 3 and applied in a layer thickness of 200 llm to aluminium sheets which have been primed with a white coil coating. The samples are irradiated with a 80 W/em Hg medium-pressure lamp (Hanovia) in 8 passes at a running speed of 10 m/min.
The samples are subjected to the falling ball test according to Erichsen (D~ 53 156).
Table 4 shows the depth of the ball indentation at which the enamel finish remains undamaged. The deeper the indentation, the more elastic the finish.
Photoinitiators Erichsendepth . .
1.17%TPO+0.5%BCH+0.33%BZP 1.7mm 1.17%TPO+0.5%BCH+0.33%BZP
+ 0.42 % propylene carbonate l.S mm 1 %TPO+ 1 %BCH 1.2mm . .
.''' , ., , .
., "
, A
' . . ` ~ , : ' 1 ' ' ' ' ' , . . . . . . . .
.. , ' . ' , ; . ' ' ': . . , ' . ,
Cs-C8-cycloalkyl, C7-Cgphenylalkyl, phenyl, naphthyl or biphenylyl, or phenyl, naphthyl or biphenylyl which are each substituted by one more identical or different members selected from the group consisting of halogen, Cl-CI2alkyl and/or Cl-Cl2aLkoxy, or is a monovalent, 5- or 6-membered heterocyclic radical which contains nitrogen, oxygen or sulfur, or is a group O O
. Il 11 --X--C~P--Rl wherein X is C2-C8alkylene, cyclohexylene, or phenylene or biphenylene which are each .
unsubstituted or substituted by halogen, Cl-C4alkyl or Cl-C4aL~coxy, and R4 is Cl-Cl8aLkyl, Cl-C4alkyl which is substituted by halogen or Cl-C4alkoxy, or is C5-C8cycloaLIcyl, C7-CgphenylaL~cyl, phenyl, naphthyl or biphenylyl, or phenyl, naphthyl or biphenylyl which are each substituted by one more identical or different members ; selected from the group consisting of halogen, Cl-Cl2alkyl and/or Cl-C12alkoxy, or is a monovalent, 5- or 6-membered heterocyclic radical which contains nitrogen, oxygen or sulfur, or R4 and R3, when taken together, are C2-Cl2aLtsylene, vinylene or o-phenylene, ..
b) lO-70 parts by weight of compound of formula II, R~ CllC_OH 11 , R7 R9 ., -... .
,. . . `. ,, : ..
." '' '~'` ,' ' "~ ", . - .'',' :'.
wherein R6 and R7 are each independently of the other hydrogen, Cl-CI8alkyl, phenyl9 Cl-C~8alkoxy, phenoxy, Cl-Cl8alkylthio, phenylthio, C2-C8diaLlcylamino, piperidino, morpholino or halogen, and R8 and Rg are each independently of the other Cl-C6alkyl, C3-C6alkenyl, C7-Cgphenylalkyl or cyclohexyl, or R8 and Rg, when taken together, are C4-C6alkylene, and c) 10-70 parts by weight of a compound of formula III, ~ ¦¦ ~R~ 3 wherein Rl 1, Rl2 and Rl3 are each independently of one another hydrogen, Cl-Cl2alkyl, Cl-C4-alkoxy, Cl-C4alkylthio, halogen or C2-C6alkoxycarbonyl, or a mixture of such benzophenone derivatives.
The substituents Rl, R3, R4, R6, R7, R8, Rg, Rl" Rl2 or Rl3 defined as alkyl may be unbranched or branched alkyl. Such aLkyl groups are typically methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, tert-butyl, n-pentyl, isopentyl, n-hexyl, 2-ethybutyl, n-octyl, isooctyl, 1,1,3,3-tetramethylbutyl, 2-ethylhexyl, nonyl, decyl, undecyl, dodecyl, tetradecyl, hexadecyl or octadecyl.
.
Rl, R3 or R4 as Cl-C4aLkyl which is substituted by halogen or Cl-C6alkoxy may bechlc)romethyl, trichloromethyl, trifluoromethyl, 2-chloroethyl, 2-me~hoxyethyl, - 2-ethoxypropyl, 2-butoxyethyl or 2-hexyloxyethyl.
:
Rl or R3 as Cs-C8cycloalkyl is preferably cyclohexyl. Rl, R3, R8 or Rg as C7-Cgphenylalkyl is preferably benzyl. R8 or R9 as C3-C6alkenyl is preferably allyl.
Rl, R2, R3 or R4 as phenyl, naphthyl or biphenylyl which are each substituted by one or more identica1 or different members selected from the group consisting of halogen, !'i Cl-CI2alkyl and/or Cl-Cl2alkoxy may be chlorophenyl, 2t4-dichlorophenyl, 2,6-dichlorophenyl, 2,4,6-trichlorophenyl, 4-tolyl, 2-tolyl, 2,4-xylyl, '', .
., -,, -, - .. . . : :: : .. : : . .
: : ~ : - : : . . , :: :
,. ~ : . ~ . . .
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20377~9 . . .
2,4,6-trimethylphenyl, 4-isopropylphenyl, 4-tert-butylphenyl, 4-octylphenyl, 4-dodecylphenyl, 4-methoxyphenyl, 2,4-dimethoxyphenyl, 2,4,6-trimethoxyphenyl, 2-chloro-6-methoxyphenyl, 4-ethoxyphenyl, 4-isopropoxyphenyl, 4-hexyloxyphenyl, 1,3-dichloro-2-naphthyl, 1,3-dimethoxy-2-naphthyl, 2,8-dimethoxy-1-naphthyl, 2,8-di-- methyl-1-naphthyl, 4'-chloro-4-biphenylyl or 4'-ethoxy-4-biphenylyl. The preferred significance is a substituted phenyl radical.
Rl, R2, R3 or R4 as a a monovalent, 5- or 6-membered heterocyclic radical which contains nitrogen, oxygen or sulfur may be a 2-, 3- or 4-pyridyl, 2,4-dimethyl-3-pyridyl, 2-furyl, 2,4-dimethoxy-3-furyl, 2-thienyl or 2,4-dimethoxy-3-thienyl.
: , Rll, Rl2 and R13 as Cl-C4alkoxy or Cl-C4alkylthio are preferably methoxy, ethoxy or methylthio. R2, R6 or R7 as Cl-C18aLlcoxy may be methoxy, ethoxy, isopropoxy, tert-butoxy, hexyloxy, octyloxy or dodecyloxy. R6 and R7 as Cl-CI8alkylthio preferably Cl-C4alkylthio.
R2 as subsdtuted phenoxy may be 4-chlorophenoxy, 2,4-dichlorphenoxy, 2,4,6-trichlorophenoxy~ 4-tolyloxy, 2,6-dimethylphenoxy, 2,4,6-trimethylphenoxy,3-methoxyphenoxy or 4-ethoxyphenoxy.
R6 or R7 as C2-C~dialkylamino may be dimethylatnino, diethylamino, dipropylamino or dibutylamino.
Rll, Rl2 or Rl3 as C2-C6alkoxycarbonyl may preferably be methoxycarbonyl or ethoxycarbonyl.
,.i :~j X as C2-C8alkylen may be 1,2-ethylene, trimethylene, tetramethylene, pentamethylene, ''Jj hexamethylene or octamethylene, or may also be a branched aLkylene group such as ;i 1,2-propylene, diethylmethylene or 2,2-dimethyl~rimethylene. R4 and R3 together as C2-C12alkylene may preferably be dimethylene or trimethylene which may be substituted ~; ~ by aL~cyl groups.
,'~
R8 and Rg together as C4-C6alkylene may preferably be tetramethylene or pentamethylene.
A ring formed by R2 and R1 together with the phosphorus atom is preferably a 5- or ~membered ring. The ring may contain oxygen and can be fused with benzene rings.
~:, :~ .. : : - , - . .. . . .- . ...
' - - ~ - ~
..
, . : , . .
.. . .
... .. . . .
... . . .
Preferred photoinitiator mixtures comprise a) 100 parts by weight of a compound of formula I, wherein Rl is phenyl, naphthyl or biphenylyl which are each unsubstituted or substituted by halogen, Cl-C4aLkyl or Cl-C4alkoxy, R2 is phenyl, naphthyl or biphenylyl which are each unsubstituted or substituted by halogen, Cl-C4aLIcyl or Cl-C4alkoxy or is a -CO-R4 group, R3 and R4 are each independently of the other Cl-CI2aLkyl, cyclohexyl, benzyl, phenyl, naphthyl or biphenylyl, or phenyl, naphthyl or biphenylyl which are each substituted by one more identical or different groups selected from the group consisting of halogen, Cl-C4alkyl and/or Cl-C4alkoxy, b) 20-70 parts by weight of a compound of formula II, wherein R6 and R7 are eachindependently of the other hydrogen, Cl-CI2alkyl, phenyl, Cl-CI2alkoxy, phenoxy or halogen, and R8 and Rg are each independently of the other Cl-C4alkyl, allyl or benzyl, or R8 and R9, when taken together, are C4-C6alkylene, and c) 10-60 parts by weight of a compound of folmula III, wherein Rll, Rl~ and Rl3 are each independently of one another hydrogen, Cl-C6alkyl, Cl-C4alkoxy or halogen, or a mixture of alkylated benzophenones.
Particularly preferred photoinitiator mixtures comprise -: ~ a) 100 parts by weight of a compound of formula I, wherein Rl is unsubstituted phenyl or phenyl which is substituted by halogen, Cl-C4aLkyl or Cl-C4aL~coxy, R2 is unsubstituted phenyl or phenyl which is substituted by halogen, Cl-C4aLkyl or Cl-C4alkoxy, or is a -CO-R4 group, ~' R3 and R4 are each independently of the other unsubstituted phenyl or phenyl which is substituted by halvgen, Cl-C4alkyl and/or Cl-C4alkoxy, b) 30-60 parts by weight of a compound of formula lI, wherein R6 and R7 are each independently of the other hydrogen, Cl-CI2aL'cyl, Cl-C4aL1coxy or halogen, R8 and R9 are each independently of the other Cl-C4alkyl, or R8 and R9, when taken :. together, are tetramethylene or pentamethylene, and c) 20-60 parts by weight of a compound of formula III, wherein Rll and Rl2 are hydrogen and Rl3 is hydrogen, Cl-C4alkyl, Cl-C4alkoxy or halogen, or a mixture of methylated benzophenones.
; :' ~ .
-- . . . , ",, . ; ,., - . - - . - . . . . . .
: .~, . . . - . . - . , ~ . . . - ~, . .. .
.: . :: .-: ~ : - : : . : :
2~377~
The following compounds are representative examples of compounds suitable for use as component (a):
isobu~royldiphenylphosphine oxide pivaloyldiphenylphosphine oxide benzoyldiphenylphosphine oxide p-toluyldiphenylphosphine oxide p-tert-butylbenzoyldiphenylphosphine oxide a-naphthoyldiphenylphosphine oxide 2,6-dimethylbenzoyldiphenylphosphine oxide 2,6-dimethoxybenzoyldiphenylphosphine oxide 2,4,6-trimethylbenzoyldiphenylphosphine oxide 2,6-dichlorobenzoyldiphenylphosphine oxide 1,3-dimethyl-2-naphthoyldiphenylphosphine oxide 1,3-dichloro-2-naphthoyldiphenylphosphine oxide 2,4-dimethylfuran-3-carbonyldiphenylphosphine oxide 2,4,6-trimethylpyridine-3-carbonyldiphenylphosphinje oxide 2,6-dimethoxybenzoyldiphenylenephosphine oxide 2,6-dichlorobenzoylditolylphosphine oxide methylpivaloylphenylphosphinate methyl-2,4-dimethylbenzoylphenylphosphinate bist2,6-dichlorobenzoyl)phenylphosphine oxide bis(2,6-dichlorobenzoyl)-4-chlorophenylphosphine oxide bis(2,6-dichlorobenzoyl~-4-t-butylphenylphosphine oxide bis(2,6-dichlorobenzoyl)-1-naphthylphosphine oxide bis(2,6-dimethylbenzoyl)phenylphosphine oxide bis(2,6-dimethylbenzoyl)-4-tolylphosphine oxide bis(2,6-dimethoxybenzoyl)phenylphosphine oxide :
bis(2,6-dimethoxybenzoyl)-2-naphthylphosphine oxide bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide bis(2,4,6-~imethylbenzoyl)-4-methoxyphenylphosphine oxide ~is(2-methyl-1-naphthoyl)phenylphosphine oxide bis(2,6-dichlorobenzoyl)-4-propylphenylphosphine oxide.
Compounds especially prefe~ed for use as component a) are 2,4,6-trimethylbenzoyldiphenylphosphine oxide and bis(2,6-dichlorobenzoyl)-4-propyl-phenylphosphine oxide.
.
.
.
. .
- , . , . . - -.
, ,'- . . . .
2~37~69 The following compounds are representa~ive examples of compounds suitable for use as component (b):
a-hydroxyisobutyrophenone p-isopropyl-a-hydroxyisobutyrophenone p-t-butyl-c~-hydroxyisobutyrophenone p-octyl-o~-hydroxyisobutyrophenone p-dodecyl-~-hydroxyisobutyrophenone p-chloro-a-hydroxyisobutyrophenone p-bromo-a-hydroxyisobutyrophenone p-methoxy-a-hydroxyisobutyrophenone p-ethoxy-oc-hydroxyisobutyrophenone 3,4-dimethyl-~-hydroxyisobutyrophenone 3,4-dimethoxy-a-hydroxyisobutyrophenone 3-chloro-a-hydroxyisobutyrophenone a-hydroxy-o~-methylbutyrophenone a-hydroxy-a-ethylbutyrophenone l -benzoylcyclopentanol I -benzoylcyclohexanol 1-(4-chlorobenzoyl)cyclohexanol.
Component b) is most preferably 1-benzoylcyclohexanol.
, The following compounds are representative examples of compounds suitable for use as component (c):
benzophenone, 4-methylbenzophenone, 2,4-dime~hylbenzophenone, 4-isopropylbenzo-phenone, 2-chlorobenzophenone, 2,2'-dichlorobenzophenone, 2-methoxybenzophenone,4-methoxybenzophenone, 4-propoxybenzophenone or 4-butoxybenzophenone. Mixtures of benzophenone derivatives may also be used, technical alkylating mixtures of benzophenone or benzophenone derivatives which are position isomers. Component c) is most preferably benzophenone.
Especially preferred are mixtures of 100 parts by weight of 2,4,6-trimethylbenzoyl-di-phenylphosphine oxide, 30-60 parts by weight of l-benzoylcyclohexanol and 20-40 parts by weight of benzophenone. These mixtures are liquid or low melting, and are therefore particularly suitable for use in liquid photopolymerisable systems.
:, .
, .' ~ ..
. . . . . . . . . .
2037~
The photoinitiators may also contain organic solvents. It is possible to make the mixtures liquid and to regulate their viscosity by the addition of such solvents. Relatively small amounts of solvent suf~lce for this purpose, preferably 5-50 parts by weight per 100 parts by weight of photocurable mixture. Typical examples of suitable solvents are isopropanol, methyl ethyl ketone, butyl acetate or propylene carbonate.
The described mixtures can be used in the practice of this invention as photoinitiators for the photopolymerisation of ethylenically unsaturated compounds or mixtures whichcontain such compounds. The unsaturated compounds can contain one or more olefinic double bonds. They may be low molecular (monomeric) or high molecular (oligomeric) compounds. Monomers containing one double bond are, typically, alkylacrylates orhydroxyalkylacrylates or hydroxyalkylmethacrylates, for exarnple methyl acrylate, ethyl acrylate, butyl acrylate, 2-ethylhexyl acrylate or 2-hydroxyethyl acrylate, isobornyl acrylate, methyl acrylate or ethyl methacrylate. Further examples of such monomers are acrylonitrile, acrylamide, methacrylamide, N-substituted (meth)acrylamides9 vinyl esters such as vinyl acetate, vinyl ethers such as isobutyl vinyl ether, styrene, alkylstyrenes and halostyrenes, N-vinylpyrrolidone, vinyl chloride or vinylidene chloride.
.. . .
~ Monomers containing several double bonds are, typically, ethylene glycol, propylene '' -',!'j glycol, neopentyl glycol, hexamethylene glycol, or bisphenol A diacrylate, 4,4'-bis(2-acryloyloxyethoxy)diphenylpropane, trimethylolpropane triacrylate, pentaerythritol triacrylate or tetraacrylate, vinyl acrylate, divinyl benzene, divinyl succinate, diallyl ~tll phthalate, triallyl phosphate, triallyl isocyanurate or tris(2-acryloyloxyethyl)isocyanurate.
:~ Typical examples of high molecular (oligomeric) polyunsaturated compounds are acrylated epoxy resins, acrylated polyethers, acrylated polyurethanes or acrylated poly-esters. Further examples of unsaturated oligomers are unsaturated polyester resins, which are normally prepared from maleic acid, phthalic acid and one or more diols, and which have molecular weights of ca. 500 to 3000. Such unsaturated oligomers may also be refeIred to as prepolymers.
:~ ' `~1 Often two-component mixtures of a prepolymer with a polyunsaturated monomer, or three-component mixtures which additionally contain a mono-unsaturated monomer, are used. The prepolymer in this case chiefly determines the properties of the coating film. By va~ying it, the skilled person is able to influence the properties of the cured film. The polyunsaturated monomer acts as crosslinker which makes the coating film insoluble. The .
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~" 2~3~76~
mono-unsaturated monomer acts as reactive diluent with aid of which the viscosity is lowered without haYing to use a solvent.
Such two- and three-componellt systems based on a prepolymer are used for p~inting inks as well as for coating compositions, photoresists or other photocurable materials. Single component systems based on photocurable prepolymers are also often used as binders for printing inks.
Unsaturated polyester resins are normally used in two-component systems together with a mono-unsaturated monomer, preferably with styrene. Speci~lc single component systems are often used for photoresists, for example the polymaleimides, polychalcones or polyimides disclosed in DE-OS 2 308 830.
The unsaturated compounds can also be used in admixture with non-photopolymerisable film-forming components. These components may typically be physically drying polymers or their solutions in organic solvents, such as nitrocellulose or cellulose acetobutyrate.
'rhey may also, however, be chemically curable or therrnocurable resins such as polyisocyanates, polyepoxides or melamine resins. The concomitant use of thermocurable resins is important for use in so-called hybrid systems which are photopGlymerised in a first step and crosslinked by a a thermal aftertreatment in a second step.
The invention thus also relates to photocurable mixtures comprising at least oneethylenically unsaturated compound and, as photoinitiator, a rnixture of a) 100 parts by weight of a compound of formula I, b) 10-70 parts of a compound of formula II, and c) 10-70 parts by weight of a compound of foIrnula III.
." .
in addition to the photoinitiator, the photopolymerisable mixtures may further contain different additives. Such additives are typically thermal inhibitors for preventing a premature polymerisation, for example hydroquinone or sterically hindered phenols.
Copper compounds, phosphorus compounds, quaternary ammonium compounds or hydroxylamines may be used to increase storage stability in the dark. Paraffin or similar wax-like substances which, at the start of polymerisation, migrate to the surface, can be added to exclude atmospheric oxygen. Minor amounts of UV absorbers$ such as those of the benzotriazole, benzophenone, hydroxyphenyltriazine or oxalanilide type, may be added as light stabilisers. Better still is the addition of light stabilisers which do not absorb UV light, for example sterically hindered amines (HALS).
!
/
~ .
~ .
' ' , ~ ' ' 20377~ 9 ~o -Amines may be added to accelerate the photopolymerisation, for example triethanolamine, N-methyl-diethanolamine, p-dimethylaminobenzoate or Michler's ketone. The photopolymerisation can further be accelerated by the addition of photosensitisers which displace or broaden the specral sensitivity. These photosensitisers are preferably aromatic carbonyl compounds such as thioxanthone, anthraquinone and 3-acylcoumarin derivatives as well as 3-(aroylmethylene)thiazolines.
The photocurable compositions of the invention can be used for different purposes. Of primary importance is their use in pigmented coating materials. The mixtures areespecially useful in white enamels, by which are meant paints pigrnented with TiO2.
Further utilities are the radiation curing of photoresists and printed circuit boards, as w~
as the production of printing plates. Another utility is for exterior coats which undergo postcuring on the surface in daylight.
The photoinitiators are conveniently used for the indicated fields of application in amounts of 0.1 to 10 % by weight, prefeMbly ca. 0.5 to 5 % by weight, based on the photocurable mixture.
Photopolymerisation is effected by known techniques by irradiation with light which is rich in shortwave radiation. Suitable light sources are typically mercury medium-pressure, high-pressure and low-pressure lamps, superactinic fluorescent tubes, metal halide lamps or lasers, the maximum emissions of which are in the range from 250 to 450 nm. Where combinations with photosensitisers or ferrocene derivatives are used, it is also possible to use light of longer wavelength or laser beams of up to 600 nm.
A multistep irradiation with radiation sources of different intensity or of different spectral composition may in certain cases be useful. Thus, for example, the wipe resistance of the coating surface can be achieved by a primary exposure and the full cure of the coating composition by a second exposure.
i}
- The use of the photoinitiator mixtures of the invention is illustrated by fo310wing Examples, in which parts and percentages are by weight.
;~
xample 1 A white enamel formulation is prepared from : -i, ~ . .
i :. . . : .
. - . ~ : , . . : , . . .
-: ~ ~ . . - ~ .
- , 2~377~9 13.5 parts of Ebecryl~) 830 (polyester acrylate ex UCB, Belgium), 1.0 part of hexanediol diacrylate 0.5 part of trimethylolpropane trisacrylate, 5.0 parts of titanium dioxide (rutile).
The photoinitiator mixtures indicated in Table 1 are added to this formulation. Samples of the white enamel formulation are applied in a layer thickness of 200 ~lm to aluminium sheets which have been primed with a white coil coat.
.
- The enamel coats are irradiated in a PPG exposure apparatus with HG medium-pressure lamps (2 x 80 W/cm). The number of passes is determined which are necessary for effecting cure (wipe resistance) at a running speed of 10 mlrnin (column 1).
`' The full cure is assessed by means of the pendulum hardness test using the apparatus of Konig (DIN 53 157) and the results are reported in column 2. The samples are then irradiated for 16 hours with S 20 W lamps (Philips TL 05), and the pendulum hardness is again measured (column 3). A certain postcuring of all samples occurs.
.. ~, . . .
The yellowing which occurs during this 16 hours exposure is also determined by measuling the Yellowness Index (YI) in accordance with ASTM D 1925-70 before andafter this exposure (columns 4 and 5).
Finally, the 20 gloss (ASTM D 523) of the samples is measured using a multigloss device (column 6). The results are reported In the following Table.
:
~i! Table 1:
Initiator 1 2 3 4 5 6 ~; 1 % TPO + 0.5 % BCH + 0.5 % BZP 4 41 65 1.9 1.8 72 ;~ 1.20 % l E'O + 0.65 %BCH + 0.65 % BZP 4 53 91 1.9 1.6 75 1.5 % TPO + 0.5 % BCH + 0.5 % BZP 3 39 101 1.6 1.2 77 ;~ 1.5 % TPO + 0.75 % BCH + 0.75 ~o BZP 3 41 81 1.8 1.8 77 , .
'; 1: number of passes to effect wipe resistance ~;~t 2: pendulum hardness after wipe resistance (seconds) .
., . ~
. - . -- . . . . . .
2~37~
3: pendulum hardness after 16 h postcure (seconds) 4: Yellowness Index after wipe resistance 5: Yellowness Index aRer 16 h postcure 6: 20 gloss (%) TPO: 2,4,6-trimethylbenzoyldiphenylphosphine oxide BCH: l-benzoylcyclohexanol BZP: benzophenone Example 2:
A white enamel fo~nulation based on an unsaturated polyester resin and styrene, pigmented with TiO2, is blended with the amounts of photoinitiator indicated in Table 2 and applied to chip boards in a layer thickness of 150 ,um. The samples are precured for 2 minutes under four 40 watt lamps (Philips TL 03). The maximum running speed un~il the samples are wipe-resistant is determined using a 120 W/cm D lamp (ex Fusion Systems) in order to gauge the reactivity of the photoinitiator.
Immediately after the cure, the pendulum hardness is measured with the K~nig pendulum apparatus (DIN 53 157). The samples are then postcured for lS minutes with five 20 W
: lamps (Philips TL 05) and thereafter the pendulum hardness is measured once more.
Table 2 .i .~
r~ Photoinitiator Maxirnum Pendulum hardness (% by wt., based on white enamel runnlng speed immediate after postcure .. 1.5 % TPO 10 m/min 74 91 i 1.30 % TPO
. + 0.10 % BCH 10 m/min 91 112 ~ + 0.10 % BZP
'. .. __ . _ . 2.5 % TPO 30 m/min 66 90 :
.~ 1.30 % TPO
+ 0.60 % BCH 40 m/min 66 91 ,,jl! +0.60%BZP
Example 3:
The white enamel formulation of Example 1 is blended with the photoinitiators listed in Table 3 and applied in a layer thickness of 150 ,um to aluminium sheets which have been .
-. ~ . . . .
, ~ ~ , - ' ' ' :
2al~7769 primed with a white coil coating. The samples are irradiated first for 90 seconds with i~our 40 W-lamps (TL 03). The samples are then irradiated with a Fusion D lamp in two passes at a running speed of 3 m/min and finally irradiated in a further pass at 6 m/min with two 80 W/cm Hg medium pressure lamps (PPG apparatus).
The pendulum hardness of the samples is measured with the Konig pendulum apparatus (DIN 53 1~7) immediately after the cure, after 15 minutes and after 16 hours additional irradiation with four 40 W-lamps. The Yellowness Index is also measured immediately after the cure and after 16 hours further ilTadiation. Finally, the 20 and 60 gloss are measured immediately after the cure and after 16 'nours postcure. The results are reported in Table 3.
Table 3:
.
Initiator 1 2 3 4 5 6 7 _ __ _ 1.17 % TPO + 0.5 ~o BCH + 0.33 % BZP 146 158 195 2.1 0.6 65/87 65/86 1.33 % TPO + 0.33 %BCH + 0.33 % BZP 153 156 188 2.3 0.9 62/85 62/85 1.33 % P.DP + 0.33 ~o BClI + 0.33 % BZF 160 162 174 4.7 1.2 66/85 65/86 ` 1.17 % TPO + 0.5 % BCH + 0.33 % BZP
+ 0.42 % isopropan~l 147 167 190 2.0 0.6 66/86 65/87 1.17%TPO+0.5%BCH+0.33%BZP
+ 0.42 % propylene carbonate 147 156 186 2.4 0.6 76/90 76/90 1: pendulum hardness (sec) immediately after cure 2: pendulum hardness (sec) after 15 min postcure 3: pendulum hardness (sec) after 16 h postcure 4: Yellowness Index immediately after cure ; 5: Yellowness Index after 16 h postcure 6: 20/60 gloss immediately after cure (%) 7: 20/60 gloss after 16 h postcure (%) TPO: 2,4,6-trimethylbenzoyldiphenylphosphine oxide BDP: bis(2,6-dichlorobenzoyl~-4-propylphenylphosphine oxide ~, BCH: 1-benzoylcyclohexanol BZP: benzophenone :i :
.. . ' ! ' . . . . .
~03~6~
Example 4:
The white enamel formulation of Example 1 is blended with the photoinitiators listed in Table 3 and applied in a layer thickness of 200 llm to aluminium sheets which have been primed with a white coil coating. The samples are irradiated with a 80 W/em Hg medium-pressure lamp (Hanovia) in 8 passes at a running speed of 10 m/min.
The samples are subjected to the falling ball test according to Erichsen (D~ 53 156).
Table 4 shows the depth of the ball indentation at which the enamel finish remains undamaged. The deeper the indentation, the more elastic the finish.
Photoinitiators Erichsendepth . .
1.17%TPO+0.5%BCH+0.33%BZP 1.7mm 1.17%TPO+0.5%BCH+0.33%BZP
+ 0.42 % propylene carbonate l.S mm 1 %TPO+ 1 %BCH 1.2mm . .
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., "
, A
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.. , ' . ' , ; . ' ' ': . . , ' . ,
Claims (14)
1. A photoinitiator comprising a) 100 parts by weight of a compound of formula I, I
wherein R1 is C1-C18alkyl, C1-C4alkyl which is substituted by halogen or C1-C6alkoxy, or is C5-C8cycloalkyl, C7-C9phenylalkyl, phenyl, naphthyl or biphenylyl, or phenyl, naphthyl or biphenylyl which are each substituted by one or more identical or different members of the group consisting of halogen, C1-C12alkyl and/or C1-C12alkoxy, or is a monovalent, 5-or 6-membered heterocyclic radical which contains nitrogen, oxygen or sulfur, R2 is phenyl, naphthyl or biphenylyl, or phenyl, naphthyl or biphenylyl which are each substituted by one or more identical or different members of the group consisting of halogen, C1-C12alkyl and/or C1-C12alkoxy, or is a monovalent, 5- or 6-membered heterocyclic radical which contains nitrogen, oxygen or sulfur, or is C1-C18alkoxy, phenoxy or phenoxy which is substituted by halogen, C1-C4alkyl or C1-C4alkoxy, or is benzyloxy, cyclohexyloxy or a -CO-R4 group, or R2 and R1, together with the phosphorus atom, form a ring, R3 is C1-C18alkyl, C1-C4alkyl which is substituted by halogen or C1-C6alkoxy, or is C5-C8-cycloalkyl, C7-C9phenylalkyl, phenyl, naphthyl or biphenylyl, or phenyl, naphthyl or biphenylyl which are each substituted by one more identical or different members selected from the group consisting of halogen, C1-C12alkyl and/or C1-C12alkoxy, or is a monovalent, 5- or 6-membered heterocyclic radical which contains nitrogen, oxygen or sulfur, or is a group wherein X is C2-C8alkylene, cyclohexylene, or phenylene or biphenylene which are each unsubstituted or substituted by halogen, C1-C4alkyl or C1-C4alkoxy, and R4 is C1-C18alkyl, C1-C4alkyl which is substituted by halogen or C1-C4alkoxy, or is C5-C8cycloalkyl, C7-C9phenylalkyl, phenyl, naphthyl or biphenylyl, or phenyl, naphthyl or biphenylyl which are each substituted by one more identical or different members selected from the group consisting of halogen, C1-C12alkyl and/or C1-C12alkoxy, or is a monovalent, 5- or 6-membered heterocyclic radical which contains nitrogen, oxygen or sulfur, or R4 and R3, when taken together, are C2-C12alkylene, vinylene or o-phenylene, b) 10-70 parts by weight of compound of formula II, II
wherein R6 and R7 are each independently of the other hydrogen, C1-C18alkyl, phenyl, C1-C18alkoxy, phenoxy, C1-C18alkylthio, phenylthio, C2-C8dialkylamino, piperidino, morpholino or halogen, and R8 and R9 are each independently of the other C1-C6alkyl, C3-C6alkenyl, C7-C9phenylalkyl or cyclohexyl, or R8 and R9, when taken together, are C4-C6alkylene, and c) 10-70 parts by weight of a compound of formula III, III
wherein R11, R12 and R13 are each independently of one another hydrogen, C1-C12alkyl, C1-C4-alkoxy, C1-C4alkylthio, halogen or C2-C6alkoxycarbonyl, or a mixture of such benzophenone derivatives.
wherein R1 is C1-C18alkyl, C1-C4alkyl which is substituted by halogen or C1-C6alkoxy, or is C5-C8cycloalkyl, C7-C9phenylalkyl, phenyl, naphthyl or biphenylyl, or phenyl, naphthyl or biphenylyl which are each substituted by one or more identical or different members of the group consisting of halogen, C1-C12alkyl and/or C1-C12alkoxy, or is a monovalent, 5-or 6-membered heterocyclic radical which contains nitrogen, oxygen or sulfur, R2 is phenyl, naphthyl or biphenylyl, or phenyl, naphthyl or biphenylyl which are each substituted by one or more identical or different members of the group consisting of halogen, C1-C12alkyl and/or C1-C12alkoxy, or is a monovalent, 5- or 6-membered heterocyclic radical which contains nitrogen, oxygen or sulfur, or is C1-C18alkoxy, phenoxy or phenoxy which is substituted by halogen, C1-C4alkyl or C1-C4alkoxy, or is benzyloxy, cyclohexyloxy or a -CO-R4 group, or R2 and R1, together with the phosphorus atom, form a ring, R3 is C1-C18alkyl, C1-C4alkyl which is substituted by halogen or C1-C6alkoxy, or is C5-C8-cycloalkyl, C7-C9phenylalkyl, phenyl, naphthyl or biphenylyl, or phenyl, naphthyl or biphenylyl which are each substituted by one more identical or different members selected from the group consisting of halogen, C1-C12alkyl and/or C1-C12alkoxy, or is a monovalent, 5- or 6-membered heterocyclic radical which contains nitrogen, oxygen or sulfur, or is a group wherein X is C2-C8alkylene, cyclohexylene, or phenylene or biphenylene which are each unsubstituted or substituted by halogen, C1-C4alkyl or C1-C4alkoxy, and R4 is C1-C18alkyl, C1-C4alkyl which is substituted by halogen or C1-C4alkoxy, or is C5-C8cycloalkyl, C7-C9phenylalkyl, phenyl, naphthyl or biphenylyl, or phenyl, naphthyl or biphenylyl which are each substituted by one more identical or different members selected from the group consisting of halogen, C1-C12alkyl and/or C1-C12alkoxy, or is a monovalent, 5- or 6-membered heterocyclic radical which contains nitrogen, oxygen or sulfur, or R4 and R3, when taken together, are C2-C12alkylene, vinylene or o-phenylene, b) 10-70 parts by weight of compound of formula II, II
wherein R6 and R7 are each independently of the other hydrogen, C1-C18alkyl, phenyl, C1-C18alkoxy, phenoxy, C1-C18alkylthio, phenylthio, C2-C8dialkylamino, piperidino, morpholino or halogen, and R8 and R9 are each independently of the other C1-C6alkyl, C3-C6alkenyl, C7-C9phenylalkyl or cyclohexyl, or R8 and R9, when taken together, are C4-C6alkylene, and c) 10-70 parts by weight of a compound of formula III, III
wherein R11, R12 and R13 are each independently of one another hydrogen, C1-C12alkyl, C1-C4-alkoxy, C1-C4alkylthio, halogen or C2-C6alkoxycarbonyl, or a mixture of such benzophenone derivatives.
2. A photoinitiator mixture according to claim 1, comprising a) 100 parts by weight of a compound of formula I, wherein R1 is phenyl, naphthyl or biphenylyl which are each unsubstituted or substituted by halogen, C1-C4alkyl or C1-C4alkoxy, R2 is phenyl, naphthyl or biphenylyl which are each unsubstituted or substituted by halogen, C1-C4alkyl or C1-C4alkoxy or is a -CO-R4 group, R3 and R4 are each independently of the other C1-C12alkyl, cyclohexyl, benzyl, phenyl, naphthyl or biphenylyl, or phenyl, naphthyl or biphenylyl which are each substituted by one more identical or different groups selected from the group consisting of halogen, C1-C4alkyl and/or C1-C4alkoxy, b) 20-70 parts by weight of a compound of formula II, wherein R6 and R7 are eachindependently of the other hydrogen, C1-C12alkyl, phenyl, C1-C12alkoxy, phenoxy or halogen, and R8 and R9 are each independently of the other C1-C4alkyl, allyl or benzyl, or R8 and R9, when taken together, are C4-C6alkylene, and c) 10-60 parts by weight of a compound of formula III, wherein R11, R12 and R13 are each independently of one another hydrogen, C1-C6alkyl, C1-C4alkoxy or halogen, or a mixture of alkylated benzophenones.
3. A photoinitiator mixture according to claim 1, comprising a) 100 parts by weight of a compound of formula I, wherein R1 is unsubstituted phenyl or phenyl which is substituted by halogen, C1-C4alkyl or C1-C4alkoxy, R2 is unsubstituted phenyl or phenyl which is substituted by halogen, C1-C4alkyl or C1-C4alkoxy, or is a -CO-R4 group, R3 and R4 are each independently of the other unsubstituted phenyl or phenyl which is substituted by halogen, C1-C4alkyl and/or C1-C4alkoxy, b) 30-60 parts by weight of a compound of formula II, wherein R6 and R7 are each independently of the other hydrogen, C1-C12alkyl, C1-C4alkoxy or halogen, R8 and R9 are each independently of the other C1-C4alkyl, or R8 and R9, when taken together, are tetramethylene or pentamethylene, and c) 20-60 parts by weight of a compound of formula III, wherein R11 and R12 are hydrogen and R13 is hydrogen, C1-C4alkyl, C1-C4alkoxy or halogen, or a mixture of methylated benzophenones.
4. A photoinitiator mixture according to claim 1, wherein component a) is 2,4,6-trimethyl-benzoyldiphenylphosphine oxide.
5. A photoinitiator mixture according to claim 1, wherein component a) is bis(2,6-dichlorobenzoyl)-4-propylphenylphosphine oxide.
6. A photoinitiator mixture according to claim 1, wherein component b) is 1-benzoylcyclo-hexanol.
7. A photoinitiator mixture according to claim 1, wherein component c) is benzophenone.
8. A photoinitiator mixture according to claim 1, comprising 100 parts by weight of 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 30-60 parts by weight of 1-benzoylcyclohexanol and 20-40 parts by weight of benzophenone.
9. A photoinitiator mixture according to claim 1, containing 5-50 parts by weight of an organic solvent per 100 parts by weight of the mixture of a), b) and c).
10. A photoinitiator mixture according to claim 1, comprising 100 parts by weight of 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 35-50 parts by weight of 1-benzoylcyclohexanol, 25-35 parts by weight of benzophenone and 20-30 parts by weight of isopropanol.
11. A photocurable mixture comprising at least one ethylenically unsaturated photopolymerisable compound and, as photoinitiator, a mixture as claimed in claim 1.
12. A photocurable mixture according eo claim 11, which contains a pigment, preferably a white pigment.
13. A photocurable mixture according to claim 11, which contains 0.1 to 10 % by weight of a photoinitiator mixture as claimed in claim 1.
14. A photocurable mixture according to claim 11, which contains 0.5 to 5 % by weight of a photoinitiator mixture as claimed in claim 1.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH764/90-6 | 1990-03-09 | ||
CH76490 | 1990-03-09 |
Publications (1)
Publication Number | Publication Date |
---|---|
CA2037769A1 true CA2037769A1 (en) | 1991-09-10 |
Family
ID=4194630
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA 2037769 Abandoned CA2037769A1 (en) | 1990-03-09 | 1991-03-07 | Photoinitiator mixtures |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0446175A3 (en) |
JP (1) | JPH04220404A (en) |
CA (1) | CA2037769A1 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
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US6103453A (en) * | 1998-03-24 | 2000-08-15 | Basf Aktiengesellschaft | Photoinitiator blends |
US6284813B1 (en) | 1996-03-04 | 2001-09-04 | Ciba Specialty Chemicals Corp. | Alkylphenylbisacylphosphine oxides and photoinitiator mixtures |
US6361925B1 (en) | 1996-03-04 | 2002-03-26 | Ciba Specialty Chemicals Corporation | Photoinitiator mixtures and compositions with alkylphenylbisacylphosphine oxides |
US7173071B2 (en) | 2003-05-06 | 2007-02-06 | Ciba Specialty Chemicals Corporation | Photo-cured and stabilized coatings |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
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DE4115950A1 (en) * | 1991-05-16 | 1992-11-19 | Herberts Gmbh | Liquid mixtures of photoinitiators, process for their preparation and their use |
ZA941879B (en) * | 1993-03-18 | 1994-09-19 | Ciba Geigy | Curing compositions containing bisacylphosphine oxide photoinitiators |
CA2134156A1 (en) * | 1993-11-22 | 1995-05-23 | Thomas P. Klun | Coatable compositions, abrasive articles made therefrom, and methods of making and using same |
TW381106B (en) * | 1994-09-02 | 2000-02-01 | Ciba Sc Holding Ag | Alkoxyphenyl-substituted bisacylphosphine oxides |
US5707781A (en) * | 1995-05-05 | 1998-01-13 | Bayer Corporation | Photopolymerizable compositions having acyl or diacyl phosphine oxide and a fluorescent optical brightner |
ES2116892B1 (en) * | 1995-08-30 | 1999-04-01 | Ciba Geigy Ag | OXIDES OF BISACILFOSFINA SUBSTITUTED BY ALCOXIFENILO. |
SG53043A1 (en) * | 1996-08-28 | 1998-09-28 | Ciba Geigy Ag | Molecular complex compounds as photoinitiators |
DE19650562A1 (en) * | 1996-12-05 | 1998-06-10 | Basf Ag | Mixtures of photoinitiators containing acylphosphine oxides and benzophenone derivatives |
SE9904080D0 (en) | 1998-12-03 | 1999-11-11 | Ciba Sc Holding Ag | Fotoinitiatorberedning |
WO2002036729A1 (en) * | 2000-11-02 | 2002-05-10 | Unilever Plc | Fabric treatment composition |
KR20040015181A (en) * | 2001-04-27 | 2004-02-18 | 유씨비 소시에떼아노님 | Photo-initiator compositions |
EP1253155A1 (en) * | 2001-04-27 | 2002-10-30 | Ucb S.A. | Photo-initiator compositions |
US20090137771A1 (en) * | 2005-08-11 | 2009-05-28 | Satoshi Moriyama | Resin composition |
JP2008260924A (en) * | 2007-03-19 | 2008-10-30 | Nippon Telegr & Teleph Corp <Ntt> | Resin for optics |
GB0724863D0 (en) | 2007-12-21 | 2008-01-30 | Unilever Plc | Fabric treatment active |
MX2015006861A (en) * | 2012-11-30 | 2016-03-04 | H David Dean | Absorbant and reflecting biocompatible dyes for highly accurate medical implants. |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2909994A1 (en) * | 1979-03-14 | 1980-10-02 | Basf Ag | ACYLPHOSPHINOXIDE COMPOUNDS, THEIR PRODUCTION AND USE |
DE3114341A1 (en) * | 1981-04-09 | 1982-11-11 | Basf Ag, 6700 Ludwigshafen | ACYLPHOSPHINE COMPOUNDS, THEIR PRODUCTION AND USE |
US4563438A (en) * | 1983-05-06 | 1986-01-07 | Ciba Geigy Corporation | Liquid mixture of photoinitiators |
IT1228982B (en) * | 1989-03-07 | 1991-07-11 | Lamberti Flli Spa | WATER DISPERSIONS OF PHOTOS INITIATORS AND THEIR USE. |
-
1991
- 1991-02-28 EP EP19910810134 patent/EP0446175A3/en not_active Withdrawn
- 1991-03-07 CA CA 2037769 patent/CA2037769A1/en not_active Abandoned
- 1991-03-08 JP JP6912791A patent/JPH04220404A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6284813B1 (en) | 1996-03-04 | 2001-09-04 | Ciba Specialty Chemicals Corp. | Alkylphenylbisacylphosphine oxides and photoinitiator mixtures |
US6361925B1 (en) | 1996-03-04 | 2002-03-26 | Ciba Specialty Chemicals Corporation | Photoinitiator mixtures and compositions with alkylphenylbisacylphosphine oxides |
US6103453A (en) * | 1998-03-24 | 2000-08-15 | Basf Aktiengesellschaft | Photoinitiator blends |
US7173071B2 (en) | 2003-05-06 | 2007-02-06 | Ciba Specialty Chemicals Corporation | Photo-cured and stabilized coatings |
CN100415812C (en) * | 2003-05-06 | 2008-09-03 | 西巴特殊化学品控股有限公司 | Photo-cured and stabilized coatings |
Also Published As
Publication number | Publication date |
---|---|
EP0446175A2 (en) | 1991-09-11 |
JPH04220404A (en) | 1992-08-11 |
EP0446175A3 (en) | 1991-11-21 |
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