CA173790S - Mask - Google Patents
MaskInfo
- Publication number
- CA173790S CA173790S CA173790F CA173790F CA173790S CA 173790 S CA173790 S CA 173790S CA 173790 F CA173790 F CA 173790F CA 173790 F CA173790 F CA 173790F CA 173790 S CA173790 S CA 173790S
- Authority
- CA
- Canada
- Prior art keywords
- mask
- elevation view
- view
- variant
- bottom plan
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Abstract
The design is the shape, configuration, pattern, and ornamentation, of the entirety of the MASK as shown in solid lines in the drawings. The portions shown in stippled lines do not form part of the design. Drawings of the design are included, in which: Figure 1a is a top elevation view of a first variant of a MASK; Figure 1b is a rear elevation view of the MASK of Figure 1a; Figure 1c is a side elevation view of one side of the MASK of Figure 1a; Figure 1d is a front elevation view of the MASK of Figure 1a; Figure 1e is a side elevation view of the other side of the MASK of Figure 1a; Figure 1f is a bottom plan view of the MASK of Figure 1a; Figure 2a is a top elevation view of a second variant of a MASK; Figure 2b is a rear elevation view of the MASK of Figure 2a; Figure 2c is a side elevation view of one side of the MASK of Figure 2a; Figure 2d is a front elevation view of the MASK of Figure 2a; Figure 2e is a side elevation view of the other side of the MASK of Figure 2a; Figure 2f is a bottom plan view of the MASK of Figure 2a; Figure 3a is a top elevation view of a third variant of a MASK; Figure 3b is a rear elevation view of the MASK of Figure 3a; Figure 3c is a side elevation view of one side of the MASK of Figure 3a; Figure 3d is a front elevation view of the MASK of Figure 3a; Figure 3e is a side elevation view of the other side of the MASK of Figure 3a; Figure 3f is a bottom plan view of the MASK of Figure 3a; Figure 4a is a top elevation view of a fourth variant of a MASK; Figure 4b is a rear elevation view of the MASK of Figure 4a; Figure 4c is a side elevation view of one side of the MASK of Figure 4a; Figure 4d is a front elevation view of the MASK of Figure 4a; Figure 4e is a side elevation view of the other side of the MASK of Figure 4a; and Figure 4f is a bottom plan view of the MASK of Figure 4a.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CA173790F CA173790S (en) | 2017-03-22 | 2017-03-22 | Mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CA173790F CA173790S (en) | 2017-03-22 | 2017-03-22 | Mask |
Publications (1)
Publication Number | Publication Date |
---|---|
CA173790S true CA173790S (en) | 2018-01-30 |
Family
ID=61094159
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA173790F Active CA173790S (en) | 2017-03-22 | 2017-03-22 | Mask |
Country Status (1)
Country | Link |
---|---|
CA (1) | CA173790S (en) |
-
2017
- 2017-03-22 CA CA173790F patent/CA173790S/en active Active
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