CA1244526A - Multiple arc plasma device with continuous gas jet - Google Patents

Multiple arc plasma device with continuous gas jet

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Publication number
CA1244526A
CA1244526A CA000491573A CA491573A CA1244526A CA 1244526 A CA1244526 A CA 1244526A CA 000491573 A CA000491573 A CA 000491573A CA 491573 A CA491573 A CA 491573A CA 1244526 A CA1244526 A CA 1244526A
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Prior art keywords
anode
plasma
gas
flow
cathodes
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CA000491573A
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French (fr)
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Emil Pfender
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University of Minnesota
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University of Minnesota
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/32Plasma torches using an arc
    • H05H1/44Plasma torches using an arc using more than one torch
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J12/00Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
    • B01J12/002Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor carried out in the plasma state
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/08Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with moving particles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/16Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed
    • B05B7/22Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc
    • B05B7/222Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc using an arc
    • B05B7/226Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc using an arc the material being originally a particulate material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/131Wire arc spraying
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/32Plasma torches using an arc
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/32Plasma torches using an arc
    • H05H1/34Details, e.g. electrodes, nozzles
    • H05H1/36Circuit arrangements
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/32Plasma torches using an arc
    • H05H1/42Plasma torches using an arc with provisions for introducing materials into the plasma, e.g. powder, liquid
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0894Processes carried out in the presence of a plasma

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Electromagnetism (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Plasma Technology (AREA)

Abstract

MULTIPLE ARC PLASMA DEVICE WITH
CONTINUOUS GAS JET
ABSTRACT OF THE DISCLOSURE
A multiple cathode DC arc plasma generator arrangement is used in connection with a single anode for thermal arc plasma processing of materials. A nozzle is provided to introduce a gas in approximately the center of the multiple cathodes , towards the anode . The nozzle injects the gas into the center of the plasma column generated between the cathodes and anode to stabilize such column and affect the self-induced electrode jets. This provides control of the heat transfer to the anode and permits feeding of particulate matter into the core of the plasma column to enhance inflight processing (melting and/or chemical reaction) of the matter. A set of gas nozzles positioned radially about the anode may be employed for feeding of particulate matter at the anode surface.

Description

MULTIPLE ARC PLASMA DEVICE WITH
.
CONTINUOUS GAS JET
This invention was made with United States Government support under Grant ~umber CPE 82-00628 05 awarded by the National Science Foundation. The United States Government has certain rights in this invention.
BACKGROU~D OF THE I~VENTIO~
l. Field of the Invention.
The present invention relates to continuous plasma processing of materials, and more particularly to an apparatus and method for plasma processing which utilizes a gas injected in the center of a coalesced plasma column for obtaining desired heat transfer to the anode and/or particulate material processing.
2. Description of the Prior Art.
Thermal plasmas, formed by arcs between a cathode and an anode, generate high temperatures and have an extremely active nature, and thus have attracted the interest of metallurgists and chemical synthesists for years. High intensity arcs are used for welding, cutting, plasma spraying, lighting, interrupting high power circuits, melting and alloying, and producing ultra fine refractories in the form of particulate material. It is known that arc induced magnetohydrodynamic effects dominate a high intensity arc. Interaction of the arc current with the self magnetic fields gives rise to a pumping action, inducing jets or gas flows called a cathode jet and an anode jet. The action of such induced gas flows depends on the gap between the cathode and anode and on the current strength, and can 52~i;

substantiall~ affect the total heat transfer to the anode.
The present invention uses a multiple arc system, in the preferxed form. In conjunction with 05 the multiple arc system known electrical circuity is used as explained in an article by J.E. ~arry and R.
Knight entitled "Simultaneous Operation of Electric Arcs From The Same Supply", IEEE Trans Plasma Science, PS. 9(4) pp. ~48-254 (1981), and also in an article "Power Supply Design For Multiple Discharge Arc Processes", published in the 6th International Symposium on Plasma Chemistry, Symposium Proceedings, Volume 1, pp. 150-155 (1983).
Yet, problems persist in establishing a stable, coalesced DC arc using multiple cathodes and/or plasma torches, that can be controlled to (1) permit injection of particulates into the plasma region for processing and permit ejection of these particles radially outwardly at a position spaced from the anode and (2) control anodal heating. (As used herein, "plasma torch" shall mean a device consisting of a thin stick-type cathode surrounded by a tube shaped anode with a nozzle at one end. When suitable electric power is supplied to a plasma torch, a jet of plasmz is emitted from the opening of the nozzle.) Problems with heat dissipation over the surface of the anode also continue to exist. It is desirable to prevent localized extremely high temperature spots on the anode because hot spots cause detrimental evaporation of t~e anode material.
Even when liquid cooled anodes are utilized, evaporation is a problem.

f~4~

The Harry articles referred to above describe use of a plurality of cathodes spaced about a central axis for generating arcs in which plasma is formed, and U.S. Patent No. 3,989,512, issued 05 ~ovember 2, 1976 to Sayce also describes a plurality of separate nontransferred arc plasma torches arranged in spaced relation around a central axis for generating a column of plasma.
Background on plasma technology is also given in the article entitled "Plasma Technology And Its Application To Extractive Metallurgy" by S.M.L.
Hamblyn, Mineral Science Englneering, SCI. Engng, Vol. 9, No. 3, pp. 151-176 (July 1977~.
On Page 153 oE the Hamblyn article, in Figures 6 and 7, there is a three phase (AC) plasma system stabilized by using a direct current supply.
The arrangement forms a central plasma stream, and it is indicated that the device had a central gas flow along the plasma stream, to produce a homogeneous volume of plasma. The system was used mainly for experimental studies of heat transfer to refractory oxide in a fluidized bed reactor. The device in this article does not provide for a coalesced DC arc, such as is obtained with the three cathodes utilized with the present device, nor does it teach the use oE a gas stream for stablizing the arcs, and/or material particle injection and processing.
Additional work is set forth in the article of C. Sheer et al entitled "Invited Review:
Development And Application Of The High Intensity Convective Electrical Arc", Chem. Eng. Comm. Vol. 19, pp. 1-47 (1982), and in particular pages 17-27 include an explanation of a "cathode pump" that 5Z~i forms near a cathode tip. A single cathode is disclosed and in the article it is taught that particulate matter being introduced into the plasma is to some extent injected into the plasma~ but for 05 the most part travels in the fringes of the plasma, and thus the high temperature plasma core which is useful for processing is not fully utilized~
An additional patent which illustrates the general state of the art in plasma arc production of silicon nitride is U.S. Patent 4,206,190, issued June
3, 1980 to Harvey et al. This describes a plasma arc furnace used for forming particulate silicon nitride.
Arc pla~ma dissociation of zircon is described in an article by that title in Chemical Engineering, November 24, 1975. This just shows general applications of plasma technology.
Additional patents which illustrate use of plasma arcs and/or plasma generators are as follows:
U.S. Date Patent ~o. Inventor of Issue 3,313,908 R. Unger et al 04-11-67 3,496,280 D. Dukelow et al 02-17-70 3,573,090 J. Peterson 03-30-71 3,980,802 B. Paton et al 09-14-76
4,121,083 R. Smyth 10-17-78 4,141,694 S. Camacho 02-27-79 4,426,709 J. Fegerl et al 01-17-84 Although multiple cathode plasma generators are known in the prior art, several problems persist:
(1) lack of stability of the plasma column and a tendency for the column to randomly dance across the anode surface; (2) localized hot spots on the anode surface that cause unwanted evaporation of the anode, (3) maintaining high heat flows to the anode witho~t unwanted hot spots, (4) difficulty in overcoming the viscosity and thermal gradient effects of the plasma to inject particulate matter into the 05 plasma for processing; and (5) maintaining particulate matter within the plasma for sufficient times to ensure efficient and complete processing.
It is to the solution of these problems that this invention is directed.
SUMMARY ~F T~E INVENTION
A multiple source plasma generator arrange-mentl as shown by a multiple cathode arrangement, has the plasma creating members positioned about a central axis. A gas nozzle is centered along the axis for feeding inert or reactive gases and/or particulate material from the top of the device downward toward the target surface. In the case of a multiple cathode arrangement, the location of the gas nozzle would b~ in the area in which the multiple cathodes are located and the nozzle would be directed downward toward the anode. In a preferred form, the multiple arc arrangement is DC driven to provide a coalesced arc formed plasma column, and a flow of inert gas from the nozzle is directed through the column along its axis to enhance stability of the arc and to provide a means for continuous feeding of particulate matter into the plasma core for controlled processing of materials.
While it is well known that there is a self-induced pumping action (the cathode and anode jets described above) derived in the use of arcs generating plasma, the forced flow of gas in the present device in direction from the cathodes toward ~2L~ ~5~2~

the anode strongly affects the plasma flow. In the first embodiment of this invention, controlling the flow of the forced gas results in the creation of a bell shaped arc that has a substantial area of 05 contact ~ith the anode to provide enhanced heat transfer to the anode without creating localized hot spots.
Additionally, the forced f~ow of gas from the central nozzle may be used as a means for injecting particulate material into the core of the multiple arcs so that inflight processing, such as melting and/or chemical reactions of the materials, is confined within the plasma. This results in higher processing efficiencies, and better control over the operationsO
A second embodiment comprises use of the invention as an arc plasma reactor through utilization of the interaction between forced gas flows and self-induced gas flows that are created in this type of device. The ~orced gas flows are externally applied convective gas flows in either or both the areas of the anode or cathodes. The self-induced flows are an electromagnetic pumping effect of gas from the cathode to the anode, called a cathode jet, and from the anode to the cathode, called an anode jet. Through utilization of the interaction of these self-induced and forced flows, plasma processing can be enhanced, for example, for making fine powders from a variety of injected particulate material. The forced flow from the cathodes toward the anode, augmented by the cathode jets, may be used to counteract the anode jet and form a stagnation layer at a level between the ~ 2 ~ ~ 5~ ~;

cathodes and the anode. The stagnation region represents a region of high plasma temperature and relatively low gas velocities, which is ideally suited for plasma processing of particulate 05 material. As will be shown/ particulate material carried by the forced gas flows is entrained in the high temperature plasma and maintained in the stagnation region for a relatively long period of time to enhance proper formation of the process products. The processed particulate material is then discharged from the arc region laterally outwardly and can impinge against the sides of a furnace for collection. The forced gas can be inert or a reactant for processing the particulate material.
15In both embodiments of the invention, the interaction of the self magnetic fields of the arc leads to a coalescence of the individual arcs into a single arc column. The coalescence occurs at some dis_ance -from the cathodes, so cathode-anode spacing is controlled to insure such coalescence. By proper regulation of the forced gas flow, the stagnation layer will be at a location after the arcs have coalesced, and in a region which provides enhanced material processing.
While a similar stagnation effect can be realized from a single cathode using a single arc, it does not have the advantage of enhanced particle entrainment due to the off-axis temperature peaks produced as a result of the multiple cathode geometry. The multiple cathode arrangement provides for enhanced processing of particles.
The combination of forced gas flows and the anode and cathode jets, and the interaction of these flows, gives substantially better processing results and efficiencies than those heretofore obtained.
B~IEF DESC~IPTION OF T~E D~AWINGS
Figure 1 is a schematic representation of a 05 plasma generator of the present lnvention including a schematic representation of the electrical circuit used therewith, Figure 2 is a schematic side view of the device of the present invention showing the type of arc shape (bell shape) obtained with the forced gas flow used with the center nozzle for enhancing heat transfer to the anode;
Figure 3 is a representation of the device of the present invention showing the effects of reduced forced gas ~low that provides a stagnation area in the plasma column between the anode and cathode for plasma reactor use:
Figure 4 is a representation of the configuration of Figure 3 illustrating particulate processing when par~icles are injected through forced gas nozzles at both the anode and cathode ends of the plasma column:
Figure 5 is a graph depicting typical results of operations of a device of the present invention illustrating the anode heat dissipation in the presence of an anode jet dominated mode of operation as shown in Figure 3, and illustrating the transition to a forced gas and cathode jet dominated mode of operation as shown in Figure 2 at two arc lengths, which illustrates the type of attachment of an arc to an anode at a standard current of 100 amps and at different gas flows; and 9 _ Figure 6 is a graph representing the voltage characteristics of a device of the present invention at two different arc lengths, and at varying gas flows, plotting the voltage versus the gas flow with 05 a standard current of 100 amps.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
_ _ _ _ ~ _ Referring to Figure lt plasma forming means are indicated generally at 10, and in the form shown include an anode 11, and as shown in the preferred embodiment, a plurality of cathodes 12, 13 and 14 spaced from the anode a desired distance, and supported in a suitable manner (not shown). These can be supported in a frame that is suitably cooled, if necessary, and placed within the confines of a furnace, for example having walls indicated schematically at 20.
In the form shown, a power supply 21 provides power to anode 11 through a line 22 and shunt current resistor 23, and then to anode 11.
Each of the cathodes 12, 13 and 14 is connected to the negative terminal of the power supply 21 through a line 26, shunt current resistor 24, and stabilizing resistor 25, in series with the resistor 24.
Cathodes 12, 13 and 14 are connected in parallel through line 26 to the negative side of power supply 21.
The above identified electrical arrangement provides adequate stabilization of current flow for establishing an arc. The shunt current resistors provide a means of measuring current flow to monitor the operation of the device.
In use, the arcs are generally initiated using a high frequency spark at very close gaps, S~6 after which the cathodes can be moved away from the anode a desired amount to obtain the desired gap length.
The anode 11 preferably is copper or other 05 suitable material. For use in a plasma reactor it can be water cooled to prevent it from being consumed or evaporated during operation. However, with a different anode configuration than that shown in Figure 1, it is possible to maintain an uncooled molten anode inside a crucible. It is also possible to produce a coating on a substrate moving in the lateral ~irection which serves, at the same time, as an anode.
In the preferred form the three cathodes 12, 13 and 14 are positioned 120 apart around a central axis 30 at an included angle along the longitudinal axes of the cathodes of substantially 45, as shown in Figure 1. The central axis 30 is through the center of the anode 11, and the tips of the cathodes 12, 13 and 14 are spaced at a desired distance apart.
A gas nozzle indicated generally at 32 is centered along the central axis 30 and positioned in front of cathode 13. As shown in Figure 2, nozzle 32 has a central opening 31 through which suitable inert or reactive gases can be directed down into the core of the plasma formed.
As shown in Figure 2 in this forrn of the invention the cathodes 12, 13 and 14 include suitable cathode holders or supports 34 and cathode tips 33.
An arc is formed between the cathodes and the anode 35. For clarity, cathode 13 is not shown but is understood to be positioned behind nozzle 32 as shown in Figure 1. The plasma column 39 formed by the arc ~?~5~6 is controlled and stabilized by providing a flow o~
gas through the central opening 31 of the nozzle 32 from a gas source 37 at a desired flow rate controlled by a valve 38. Valve 3~ may be any 05 suitable valve which permits varying the rate of gas flow. An inert gas such as argon may be used, and this will form a core 40 of material generally as outlined in the dotted lines. The arcs from each of the cathodes 12, 13 and 14 will coalesce approximately one-third of the way from the cathodes to the anode 35, the exact location depending on system parameters including cathode/anode geometry, current flow, and forced gas flows, in the bell-s'naped form shown to broaden out thé area of contact of the arc on the anode. The coalesced arcs form the plasma column 39. The jet of gas coming from the nozzle 32 tends to stablize the plasma column 39 and keep it from dancing back and forth on the anode 35 as the arc is generated. The gas flow from the nozzle 32 will counteract the induced gas flow from the anode 35 toward the cathodes 12, 13 and 14, commonly known as the anode jet, and will assist or add to gas Elows from the cathodes 12, 13 and 14 to the anode 35, called the cathode jets.
In the form shown in Figure 2, the bell shaped end 39A of the plasma column 39 is obtained by having sufficient gas flow from the nozzle 32 along the core 40 of the plasma column 39 to overcome self-induced anode jets moving in direction from the anode 35 toward the cathodes 12, 13 and 14, and provide a net positive flow from the cathodes 12, 13 and 14 to the anode 35. This gas flow then spreads out along the surface of anode 35, forcing the plasma column L5~2~

to also spread. This results in the wide base of the plasma column which permits higher power arcs and hence greater heat transfer without orming an extr~mely hot, localized poin~ contaet of the arc to 05 the anode 35 which would cause excessive varporization of the anode material. l~e gas flowing from noz~le 32 may be inert for simple melting and~or vapori~ing processes (e.g. coating~ spherodization, etcO ) or ma~ be reactive for chemical transformations (e.gr reducti3n, coal gasification, etc.3 If desired, particles ~particulate matter~
from a particle source indicated at 41 can be intermixed with the sas from the gas source 37 This particulate matter is thus injected into the plasma coLumn 39 and is passed down throuyh the column core ~tO j. ~0 in~ermix with the plasma and che~ically react, or be heated in a desired manner. The particles can be carcied irl a gas stream from the source OL' dlspersed in any suitable manner. If desired, ~he particles can be processed in the plasma column 39 and then ei~her depositea as a coating on the material forminc the arlode 35 in the approximate area of contact between the plasma column and the anode or e~ected as shown by arrows 42.
I'hus, injecting a suitable column of gas along an axis positioned between a plurality oE
cat}lodes stabilizes the plasma column, and adjus~irlg the f~ow of such gas diffuses the plasma column at its base where it contacts the anode to provide a :~0 bell shapecl9 wide area of contact between the plasma and the anode~ In the form of the invention shown in Fl~ure 2, the self-induced flow of gases frorn the anode to t'ne cathodes that would occur in the case 7394r) 2~ 1 8 ~ 13 -of a constricted plasma column at the anode is overcome by the flow of the gas from the nozzle 32, augmented by the self-induced flow oE gas from the cathodes to the anode~ The flow from nozzle 32 can 05 be adjusted with valve 38 between the gas source and the nozzle 32 to provide the desired bell shape.
As shown, the nozzle 32 is a water cooled sleeve havlng a partition tube 46 surrounding the annular center tube 31, and the flow of water would be cool along the walls forming the center tube 31.
The water flows back out along the outer walls of the nozzle to keep the nozzle material from deteriorating in the high temperature environment of the furnace.
The same type of results can be obtained using a core gas flow for stabilization of plasma torch flows, if the cathodes are replaced with plasma torches. The anode 35 would remain an anode and the plasma jets from the torches would be flowing toward the surface oE the anode 35. Thus, the plasma torches would be operating in the transferred arc mode, wher the anodes of the torches are electrically disconnected after arc initiation. The use of a center inert gas core stabilizes the plasma flow, and provides for a wider area of contact of the plasma to the anode as well as providing the ability to control processiny of particles from a source by having better control of the time for processing and the temperatures.
In Figure 3 a form of plasma column particularly useful for plasma processing is shown which can be obtained by regulating the gas flows through the valve 38. Again in Figure 3, cathode 13 is not shown, but is positioned behind nozzle 32.

Self-induced gas entrainment ~rom the anode 47 occurs, as previously mentioned, wi-thout a flow of gas from the nozzle 32, so that there will be a convective effect upward from the anode 47 toward the 05 cathodes 12, 13 and 14 forming an "anode jet"
indicated at 52. The anode jet can dominate the plasma flow and even result in the plasma column extending upwardly above the ends of the cathodes 12, 13 and 14 in a direction away from the anode 47.
However, with the nozzle 32 in operation and the gas flow adjusted to a desired level, the plasma column indicated in this form of the invention at 50 will not extend abo~e the ends of the cathodes. The anode 47 will be water cooled in a conventional manner for use in the apparatus of Figure 3, which forms a plasma reactor. In the operating mode shown in Figure 3, gas flows from nozzle 32, augmented by the cathode ~et flows shown at 60, counteract the anode jet shown at 52. Where the flows meet, a stagnation area is formed and the gas flows radially outward into the surrounding atmosphere in the furnace. ~lis results in an annular disk of plasma positioned between the ends of the cathodes 12, 13 and 14 and the anode 47, for example in the disk-like stagnation zone indicated at 51. Essentially what occurs is that the forced gas flow from the nozzle 32 combined with the flow of the cathode jets 60 oppose the anode jet gas flow indicated by the arrows 52. Where the pressures equalize stagnation zone 51 results, causing an outflow of gases indicated by the arrows 53. This outflow is directed radially outward from around the circumference of the plasma column 50.
The stagnation zone 51 may be moved axially in ~2~

relation to the cathodes 12, 13 and 14 and anode 47 as desired by adjusting the parameters of operation including cathode/anode geometry, current flow, and forced gas flow. As used, the primary means of 05 controlling the location of the stagnation zone is through adjusting valve 38 to change the forced gas flow through nozzle 32. While in this mode of operation there is a small area of arc contact on the anode that causes localized heating, the anode is additionally cooled by the self induced anode flow 52 along the anode surface.
In the case where it is desired to use the device as an arc plasma reactor for chemical processing of fine powders, the axrangement shown in Figure 4 can be used to process particulate matter 54. Particulate matter from a particle source 41 is introduced into the gas flow in the nozzle 32 and is thereby carried down into the plasma column 50. At the same time small amounts of gas from self-induced flow at the anode will be moving upwardly as previously exp:Lained. Additional particles can be injected into the anode jet gas flow 52 from the anode to cathode with nozzles indicated at 56 lying parallel to the surface of anode 47. These additional particles then will move up into the plasma column 50 along with the self-induced anode jet flow so that the center core of the plasma column will be filled with particles 54 as illustrated in Figure 4. The particles 54 then will be capable of being processed by the plasma for a period of time that is longer than that which is possible without the stagnation æone 51 generated by the forced gas flow from nozzle 32 in combination with the cathode L/~ 5 ~ 6 jets 60 and anode jet 52. The process is used to cause the particles to change in character, for example, forming spheres from irregularly shaped particles. Additional chemical reactions can take 05 place or the particles can be broken into ~ine powders depending on the reaction with the plasma column. Further, the side walls 20 of the furnace will be bombarded with the processed particles 54A
and may be used to collect the materials being processed, utilizing both the forced gas flow from the nozzle 32 and the natural pumping action of the plasma column 50.
The particulate material is injected into the plasma column 50 by the pumping action of either or both the cathode jets ~0 and anode jet 52, aided by the forced gas flows in nozzles 32 and 56. These pumping actions and forced gas flows overcome the effect of the high temperature gradients, as well as the high viscosity of the plasma, which otherwise inhibit the injection of particles. The geometry of the multiple cathode arrangement as shown in Figure 4 also enhances the injection of particles by feeding particles into a region where they are constrained by the noncoalesced plasmas resulting from the individual cathodes and hence are injected into the coalesced plasma core. The pumping action also permits feeding particles in both directions from the cathode and the anode, and the processed product is ejected radiall~ at the stagnation region.
When desired, the heat dissipated at the anode can be made to increase significantly where there is a diffused bell attachment of the arc or plasma column, such as that shown in Figure 2.

7394D22 I ~4 - 17 ~
Alsor ~y controlling the forced gas flow from nozzle 32 the stagnation region or disk can be formed at a chosen location above the anode.
In Figure 5, heat transfer to the anode in 05 presence of an anode jet is plotted for two different arc lengths. One is a relatively short 5 millimeter arc length, and the other is a 40 millimeter arc length. Using the triple cathode arrangement with a current of 100 amps through each cathode, it can be seen that at a forced gas flow from nozzle 32 in the range of 14 grams per minute, and an arc length of 40 millimeters, there is a pronounced shift in the heat dissipation. The approximate location of the change from spot attachment of the arc (anode jet domlnated) to bell shaped attachment ~forced gas and cathode jet dominated) is indicated on Figure 5.
At shorter arc lengths, such as 5 millimeters, a forced gas flow from nozzle 32 in the range of 10 to 12 grams per minute resulted in a change from the spot attachment of the plasma column to the anode, as shown in Figure 3, to a diffused bell-shaped attachment, as shown in Figure 2. Again, a reasonable arc length is desired, and the voltage levels at 100 amps current ranged from approximately 13 volts for the five millimeter arc length, to about volts for the longer arc length of 40 millimeters. At arc lengths between these extremes the voltage is also between these values, and varies somewhat. Generally speaking, the shift from the spot attachment to the diffused bell type of attachment caused a shift in heat dissipation that was discernable and occurred at forced gas flows between 10 and 14 grams per minute from the nozzle
5 ~

32, This is with the current and voltage shown, and the triple cathode arrangement.
As shown in Figure 5~ at shoxter arc length the stagnation region is formed at lower gas flows.
05 The gas flows can be adjusted to obtain the desired results for a given arc length and a given arc current. Current also can be varied as desired to obtain the desired attachment point.
The labeling for the respective curves in Figure 5 shows that the heat flow to the anode commences to go up as the anode attachment area increases, and tnat the diffused bell attachment causes higher heat flows to the anode.
Figure 6 is a graph generally illustrating the effect of various gas flows from the nozzle 32 on the voltage levels to maintain a current of 100 amps to each of the cathodes. This shows the various voltage levels that are produced by the conditions illustrated in Figure 5, in presence of an anode jet, at particular currents for two different arc lengths and shows the approximate region, as marked on Figure 5, of formation of the diffuse bell attachment to the anode at different gas flows.
Experiments have shown that with a triple cathode the voltage will vary as current is changed.
When the current increases into the range of 80 amps, the arcs will coalesce and form one large arc column, as mentioned. The cold gas from the nozzle 32 will penetrate the plasma in the center, and will tend to cool the plasma in the core. This, however, has little effect on the arc conductancel and the arc voltages remain fairly stable from about 80 amps and higher in experimentation. Further, each of the cathodes draws substantially the same current, particularly where there is a coalesced arc.
With the invention it has been found that the greater the arc length, the higher the voltage.
05 With a cathode jet and forced gas dominated mode of operation, th~t is, with gas flows in nozzle 32 sufficient to overcome the anode jet, the optimum operating point, where the three arcs merge together and where the energy dissipation is also the lowest, generally is in the range of 80 to 100 amps and at a low voltage point. In this mode of operation the diffuse bell attachment occurs. The injected particles, when such particles are injected, will be best entrained into the hot plasma core at the point where the arcs coalesce.
The use of the three cathodes adds stability to the coalesced arc, and provides for a large plasma volume through which the particles may pass for treatment.
The arc voltage generally increases with increasing forced gas flow rate from nozzle 32 at each arc length. As the gas flow from the nozzle 32 increases, the cooling effect on the plasma becomes stronger. This cooling of the plasma increases the resistance of the arc and the arc voltage must rise to compensate. The voltage characteristics, generally speaking, of the triple cathode arc are similar to those found in conventional single cathode arcs, and because the forced gas from the nozzle 32 acts as an artificial cold cathode jet, the forced gas aids in the stabilizat:ion of the arc.
In the anode jet dominated mode of operation, before the diffuse bell attachment SA~

occurs, the flow from the anode to cathode c~uses the disk of plasma at the stagnation region 51 spaced from the anode. In Figure 5, the anode jet dominated mode is indicated at low gas flows for the different 05 arc lengths shown there, and the diffused bell attachment of the anode occurs where the greatest amount of heat is shown to be dissipated for a given amount of power. It should ~e noted that for some limited values of current, voltage, and distance of cathodes, the stagnation zone 51 shown in Figures 3 and 4 occurs as a result of the cathode jet alone without forced ~as flow through nozzle 32; however, the flow through nozzle 32 allows creation of the stagnation zone for a much greater rang~ of current, voltage, and distance of cathodes and in any event provides for greater control over the creation and location of the stagnation zone. The forced gas flow through nozzle 32 under typical operating conditions is approximately five times higher than the self-induced flow of the cathode jets.
The presence of a self-induced cathode jet depends in part upon the shape of the cathode tip. If the cathode tip is blunt, rather than a fine or sharp tip, the cathode jet is reduced and it is possible to operate in an anode jet dominated mode where the anode jet is in the full reverse flow. An anode jet flow, in the opposite direction of the electron flow, aids the positive ion flow. When the anode jet is forced downward toward the anode by the combination of the forced gas flow and cathode jets, the flow favors the electron flow, resulting in lower arc voltages. When an anode jet, and a flow in the reverse direction are impinging upon each other, a 7394~ 22 I 84 high potential drop is needed to push the particles through the stagnation layer.
The anode jet hinders heat transfer to the anode as a result of the flow along the anode and up 05 through the plasma column. Thus, from the view point of heat transfer to the anode, the anode jet mode should be avoided, and as shown in Figure 5, for example, a sufficient flow of gas from the cathode should be provided through the central core to provide the diffuse bell attachment to the anode.
~owever, when the flows are in the anode jet mode, and the forced flow through the nozzle 32 is selected to form a stagnation zone, the ability to inject particles at both the anode and through the central no7zle is present, and the processing of the particles in the stagnation zone at the plasma provides or greater length of time of particle processing, higher heats, and in many instances greater efficiency. The introduction of the forced gas down the central axis between the cathodes at a controlled rate provides a very stable arc under all conditions, and at selected forced gas flows will increase the anode heat transfer, and at othsr (lower) forced gas fiows can create a stagnation zone between the anode and cathode which results in enhanced conditions for processing of particulate matter. Thus, the flows from nozzle 32 for obtaining the operating mode shown in Figures 3 and 4 will be below the flow that causes bell attachment shown in Figure 2.
Varying the current provides an additional means of control over the formation and lo~ation of the stagnation zone~ Lower currents reduce the - 2~ -intensity of the cathode jets and hence will allow the stagnation zone to move somewhat closer to the cathodes; however, as noted above, the effect of the cathode jets are significantly less than the effect 05 of the forced flow of gas.
The position of the stagnation region can be adjusted by regulating the pressure through the cathode forced gas nozzle 32, as well as the anode forced gas nozzles 56.
10The carrier gas used for injection of particulate matter into the arc may be inert or it may represent a chemical reactant depending on the desired reaction in the plasma.
This device may be used for physical as well as for chemical processing. Physical processing may, for example, include spheroidization of irregularly shaped powder particles, production of ultrafine powders (for example silica~ and densification of conglomerates. Ch~mical processing includes the decomposition of compounds (for example toxic wastes), the synthesis of carbides, nitrides and refractory metal oxides, the production of chemical compounds and alloys using solids, liquids or gases as starting materials.
Radial ejection of the products from the hot plasma zone provides for a fast quench of the products which may be further enhanced by impingment of the products on water cooled walls or by entrainment of the products into water cooled channels.
The injection nozzles 56 project radially from the axis of the plasma column, and perhaps six or so equally spaced nozzles would be used around 5~;

- ~3 -the axis. The particles from nozzles 56 will generally be conveyed in a gaseous fluid in a Xnown manner.
While the device will worX with only one 05 cathode, the use of three cathodes provides for better control and better action. The device will also work with modifications including the height of the gas nozzle relative to the cathode tips, the rotation of the ~ntire multiple arc plasma torch assembly in any direction, and different anode geometries such as stick anodes, ring anodes, or anode crucibles. In a preferred embodiment of this invention, the particle injection occurs at a point equal to or below the cathode tips to prevent cathode degradation.
Although the present invention has been described with reference to preferred embodiments, workers skilled in the art will recognize that changes may be made in form and detail without departing from the spirit and scope of the invention.

Claims (14)

THE EMBODIMENTS OF THE INVENTION TO WHICH AN EXCLUSIVE
PROPERTY OR PRIVILEGE IS CLAIMED ARE DEFINED AS FOLLOWS:
1. A method of utilizing a plasma column directed toward a surface comprising the steps of:
forming a plasma column from a source comprising cathode means spaced from an anode surface so the plasma moves toward said anode surface along an axis substantially perpendicular to the anode surface;
injecting a flow of gas through a nozzle adjacent the cathode means with the gas flowing along said axis toward the anode surface, and regulating the flow of gas in relation to the spacing of the anode surface relative to the cathode means until the regulated gas flow opposes induced gas flow such that the plasma column spreads out radially in a stagnation zone substantially under control of the regulated gas flow in at least one location along the column between the anode surface and the cathode means, the stagnation zone having an area greater than the portion of the plasma column adjacent the cathode means.
2. The method of Claim 1 including the step of forming the plasma column by cathode means comprising three cathodes arranged around said axis and inclined with respect to said axis, the cathodes being spaced from the axis.
3. The method of Claim 2 including the further step of:
injecting particulate matter into the regulated flow of gas prior to the time that the regulated flow is injected into the plasma column to cause processing of particulate matter in the plasma column; and discharging the processed particles radially from the column at the level of the stagnation zone.
4. The method of Claim 3 including the further steps of injecting particles substantially parallel to said anode in a self-induced flow of gas formed by the base of the plasma column on the surface.
5. A method of using a plasma column directed in a first direction comprising the steps of:
forming a plasma column moving in the first direction toward a surface along an axis using a plurality of cathodes spaced laterally from the axis and from each other, orienting the cathodes relative to an anode spaced from the cathodes in the first direction and energizing the cathodes to simultaneously form an individual arc from each cathode, which individual arcs coalesce to form such plasma column;

injecting a flow of gas along the axis in the first direction through a nozzle spaced along the axis from the cathodes such that the nozzle is in a region where the plasma arcs forming the plasma column have not coalesced; and injecting particles into the gas flow to move in the first direction axially along and in the center portions of the plasma column, said particles being injected into the gas flow in a region where the arcs have not coalesced.
6. A method of utilizing a plasma column for heating material forming an anode surface comprising the steps of:
forming a plasma column moving toward an anode surface along an axis substantially perpendicular to the anode surface by placing a plurality of cathodes spaced laterally from the axis and spaced from the anode surface with the arcs coalesced between the cathodes and the anode surface to form such plasma column;
injecting a flow of gas through a nozzle adjacent the cathodes in direction toward the anode surface; and regulating the flow of gas in relation to the spacing of the anode surface relative to the cathodes until the plasma column flows toward the anode surface in counter action to induced gas flows and spreads out substantially under control of the gas flow along the anode surface radially from the axis to cause the coalesced arcs to attach to the anode surface over a heated area greater than the cross sectional area of the portion of the plasma column adjacent the cathodes, to thereby distribute heat from the arcs across such greater heated area of the anode surface.
7. The method of Claim 6, further comprising the step of regulating the flow of gas to increase the area of attachment of the arc to the anode surface from the area of attachment of the same arcs without such gas flow.
8. An apparatus for plasma processing comprising means forming a plasma stream directed toward a surface and forming a plasma column, said means comprising a plurality of sources of plasma centered on a central axis, a nozzle for gas flow centered on said central axis and directed in the same direction as the flow of plasma from the sources of plasma, and means for regulating flow of gas through said nozzle to provide a desired configuration to the plasma column formed.
9. The apparatus of Claim 8 wherein said means forming a plasma stream comprises at least three cathodes substantially equiangularly displaced about the central axis forming an arc with respect to an anode, said anode comprising said surface toward which the plasma stream is directed.
10. The apparatus of Claim 8 wherein said means forming a plasma stream comprises three sources of plasma arranged about the central axis at substantially 120° relative to each other.
11. The appartus as specified in Claim 9 wherein the surface is a heat dissipation surface, and said means for regulating flow of gas is adjusted to cause the gas flow in direction from the source of plasma toward the surface to be the dominant flows on the interior of the plasma stream, and to cause the stream to spread out over an area of said surface substantially larger than the area of the plasma column above the surface.
12. The apparatus as specified in Claim 10 wherein said means forming a plasma stream comprise an anode having said surface, and three cathodes spaced from said anode a desired amount to provide an arc and to create a self-induced flow of gas from the anode toward the cathode, said means for regulating being controlled to provide a flow of gas through the nozzle tending to overcome the self-induced gas flow to form a stagnation zone in the arc spaced from said surface of said anode and also spaced from said cathodes in direction toward said anode.
13. The apparatus as specified in Claim 12 wherein said cathodes are spaced from said anode a distance so that the arcs formed coalesce to form a single plasma column, and said nozzle directs a flow of gas through the center of the coalesced arcs, the gas flow through said nozzle being adjusted to provide a disk of plasma spaced from the anode, and also spaced from the cathodes and radiating from the coalsced arc, and surrounding the plasma column, and means for providing particles to said gas flow whereby said particles are discharged outwardly around said disk with the gas from said nozzle.
14. The apparatus as specified in Claim 9 wherein the cathode and anode are positioned and said flow of gas is adjusted to permit the arc to operate in an anode jet dominated mode, with flow of gas from the anode toward the cathode, and the flow of gas from said nozzle opposes the anode jet to form a discharge disk of plasma through the column of plasma between the cathode and the anode, and means to inject particles into the gas carried through the nozzle, and also into the anode jet flow.
CA000491573A 1984-09-27 1985-09-26 Multiple arc plasma device with continuous gas jet Expired CA1244526A (en)

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EP0286306B1 (en) * 1987-04-03 1993-10-06 Fujitsu Limited Method and apparatus for vapor deposition of diamond
EP0351847A3 (en) * 1988-07-21 1991-03-20 Nippon Steel Corporation Modular segmented cathode plasma generator
US4982067A (en) * 1988-11-04 1991-01-01 Marantz Daniel Richard Plasma generating apparatus and method
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FR2701267B1 (en) * 1993-02-05 1995-04-07 Schwob Yvan Process for the production of carbonaceous soot with defined microstructures.
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JPS62500290A (en) 1987-02-05

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