CA1239785A - Jauge de hauteur capacitive pour dispositif de localisation de la position d'un reticule d'appareil de lithographie a faisceau electronique - Google Patents

Jauge de hauteur capacitive pour dispositif de localisation de la position d'un reticule d'appareil de lithographie a faisceau electronique

Info

Publication number
CA1239785A
CA1239785A CA000467015A CA467015A CA1239785A CA 1239785 A CA1239785 A CA 1239785A CA 000467015 A CA000467015 A CA 000467015A CA 467015 A CA467015 A CA 467015A CA 1239785 A CA1239785 A CA 1239785A
Authority
CA
Canada
Prior art keywords
measuring
capacitor
signal
substrate
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA000467015A
Other languages
English (en)
Inventor
John R. Shambroom
Alan P. Sliski
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Control Data Corp
Original Assignee
Control Data Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/589,902 external-priority patent/US4539835A/en
Application filed by Control Data Corp filed Critical Control Data Corp
Priority to CA000552419A priority Critical patent/CA1250139A/fr
Application granted granted Critical
Publication of CA1239785A publication Critical patent/CA1239785A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
CA000467015A 1984-03-14 1984-11-05 Jauge de hauteur capacitive pour dispositif de localisation de la position d'un reticule d'appareil de lithographie a faisceau electronique Expired CA1239785A (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CA000552419A CA1250139A (fr) 1984-03-14 1986-11-20 Appareil d'etalonnage de calibres de hauteur capacitifs

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/589,902 US4539835A (en) 1983-10-28 1984-03-14 Calibration apparatus for capacitance height gauges
US589,902 1984-03-14

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CA000552419A Division CA1250139A (fr) 1984-03-14 1986-11-20 Appareil d'etalonnage de calibres de hauteur capacitifs

Publications (1)

Publication Number Publication Date
CA1239785A true CA1239785A (fr) 1988-08-02

Family

ID=24360024

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000467015A Expired CA1239785A (fr) 1984-03-14 1984-11-05 Jauge de hauteur capacitive pour dispositif de localisation de la position d'un reticule d'appareil de lithographie a faisceau electronique

Country Status (1)

Country Link
CA (1) CA1239785A (fr)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009011781A1 (fr) * 2007-07-13 2009-01-22 Cyberoptics Semiconductor, Inc. Dispositif et procédé de compensation des variations de mesure de capteur capacitif provoquées par les conditions environnementales d'un environnement de traitement de semi-conducteur
WO2009047073A1 (fr) * 2007-10-05 2009-04-16 Robert Bosch Gmbh Dispositif détecteur pour détermination capacitive de distance
US7804306B2 (en) 2006-02-21 2010-09-28 CyterOptics Semiconductor, Inc. Capacitive distance sensing in semiconductor processing tools
US8823933B2 (en) 2006-09-29 2014-09-02 Cyberoptics Corporation Substrate-like particle sensor
CN112397363A (zh) * 2020-09-28 2021-02-23 西安增材制造国家研究院有限公司 一种电子枪束斑校对装置及校对方法
CN114624532A (zh) * 2022-03-14 2022-06-14 华东交通大学 一种耐杂散电流腐蚀的电网检测设备

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7804306B2 (en) 2006-02-21 2010-09-28 CyterOptics Semiconductor, Inc. Capacitive distance sensing in semiconductor processing tools
US8823933B2 (en) 2006-09-29 2014-09-02 Cyberoptics Corporation Substrate-like particle sensor
WO2009011781A1 (fr) * 2007-07-13 2009-01-22 Cyberoptics Semiconductor, Inc. Dispositif et procédé de compensation des variations de mesure de capteur capacitif provoquées par les conditions environnementales d'un environnement de traitement de semi-conducteur
WO2009047073A1 (fr) * 2007-10-05 2009-04-16 Robert Bosch Gmbh Dispositif détecteur pour détermination capacitive de distance
US8659407B2 (en) 2007-10-05 2014-02-25 Robert Bosch Gmbh Sensor device for capacitively ascertaining distance
CN112397363A (zh) * 2020-09-28 2021-02-23 西安增材制造国家研究院有限公司 一种电子枪束斑校对装置及校对方法
CN112397363B (zh) * 2020-09-28 2022-08-30 西安增材制造国家研究院有限公司 一种电子枪束斑校对装置及校对方法
CN114624532A (zh) * 2022-03-14 2022-06-14 华东交通大学 一种耐杂散电流腐蚀的电网检测设备

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Legal Events

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