CA1052612A - Nitroso dimer-containing compositions and photoimaging process - Google Patents

Nitroso dimer-containing compositions and photoimaging process

Info

Publication number
CA1052612A
CA1052612A CA222,275A CA222275A CA1052612A CA 1052612 A CA1052612 A CA 1052612A CA 222275 A CA222275 A CA 222275A CA 1052612 A CA1052612 A CA 1052612A
Authority
CA
Canada
Prior art keywords
nitroso
free
composition
dimer
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA222,275A
Other languages
English (en)
French (fr)
Other versions
CA222275S (en
Inventor
George R. Nacci
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Application granted granted Critical
Publication of CA1052612A publication Critical patent/CA1052612A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
CA222,275A 1974-03-18 1975-03-17 Nitroso dimer-containing compositions and photoimaging process Expired CA1052612A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US45233874A 1974-03-18 1974-03-18

Publications (1)

Publication Number Publication Date
CA1052612A true CA1052612A (en) 1979-04-17

Family

ID=23796090

Family Applications (1)

Application Number Title Priority Date Filing Date
CA222,275A Expired CA1052612A (en) 1974-03-18 1975-03-17 Nitroso dimer-containing compositions and photoimaging process

Country Status (7)

Country Link
JP (1) JPS5724904B2 (de)
BE (1) BE826824A (de)
CA (1) CA1052612A (de)
DE (1) DE2511486C2 (de)
FR (1) FR2265117B2 (de)
GB (1) GB1481396A (de)
NL (1) NL7503127A (de)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE630740A (de) * 1962-04-09

Also Published As

Publication number Publication date
BE826824A (fr) 1975-09-18
NL7503127A (nl) 1975-09-22
DE2511486A1 (de) 1975-09-25
JPS5724904B2 (de) 1982-05-26
FR2265117B2 (de) 1980-03-14
JPS50129013A (de) 1975-10-11
DE2511486C2 (de) 1983-11-03
GB1481396A (en) 1977-07-27
FR2265117A2 (de) 1975-10-17

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