CA1023826A - Method to establish the end point during the delineation of oxides on semiconductor surfaces and apparatus therefor - Google Patents

Method to establish the end point during the delineation of oxides on semiconductor surfaces and apparatus therefor

Info

Publication number
CA1023826A
CA1023826A CA208,522A CA208522A CA1023826A CA 1023826 A CA1023826 A CA 1023826A CA 208522 A CA208522 A CA 208522A CA 1023826 A CA1023826 A CA 1023826A
Authority
CA
Canada
Prior art keywords
delineation
oxides
establish
end point
point during
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA208,522A
Other languages
French (fr)
Other versions
CA208522S (en
Inventor
Jan P. Hoekstra
Frederick H. Dill
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Priority to CA208,522A priority Critical patent/CA1023826A/en
Application granted granted Critical
Publication of CA1023826A publication Critical patent/CA1023826A/en
Expired legal-status Critical Current

Links

CA208,522A 1974-09-05 1974-09-05 Method to establish the end point during the delineation of oxides on semiconductor surfaces and apparatus therefor Expired CA1023826A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CA208,522A CA1023826A (en) 1974-09-05 1974-09-05 Method to establish the end point during the delineation of oxides on semiconductor surfaces and apparatus therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA208,522A CA1023826A (en) 1974-09-05 1974-09-05 Method to establish the end point during the delineation of oxides on semiconductor surfaces and apparatus therefor

Publications (1)

Publication Number Publication Date
CA1023826A true CA1023826A (en) 1978-01-03

Family

ID=4101053

Family Applications (1)

Application Number Title Priority Date Filing Date
CA208,522A Expired CA1023826A (en) 1974-09-05 1974-09-05 Method to establish the end point during the delineation of oxides on semiconductor surfaces and apparatus therefor

Country Status (1)

Country Link
CA (1) CA1023826A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4208240A (en) * 1979-01-26 1980-06-17 Gould Inc. Method and apparatus for controlling plasma etching

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4208240A (en) * 1979-01-26 1980-06-17 Gould Inc. Method and apparatus for controlling plasma etching

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