CA1017988A - Unit power optical projection and scanning photographic exposure apparatus - Google Patents

Unit power optical projection and scanning photographic exposure apparatus

Info

Publication number
CA1017988A
CA1017988A CA260,881A CA260881A CA1017988A CA 1017988 A CA1017988 A CA 1017988A CA 260881 A CA260881 A CA 260881A CA 1017988 A CA1017988 A CA 1017988A
Authority
CA
Canada
Prior art keywords
exposure apparatus
unit power
optical projection
power optical
photographic exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA260,881A
Inventor
William H. Newell
Harold S. Hemstreet
David A. Markle
Abe Offner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Biosystems Inc
Original Assignee
Perkin Elmer Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Perkin Elmer Corp filed Critical Perkin Elmer Corp
Priority to CA260,881A priority Critical patent/CA1017988A/en
Application granted granted Critical
Publication of CA1017988A publication Critical patent/CA1017988A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
CA260,881A 1973-03-09 1976-09-10 Unit power optical projection and scanning photographic exposure apparatus Expired CA1017988A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CA260,881A CA1017988A (en) 1973-03-09 1976-09-10 Unit power optical projection and scanning photographic exposure apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US33986073A 1973-03-09 1973-03-09
CA260,881A CA1017988A (en) 1973-03-09 1976-09-10 Unit power optical projection and scanning photographic exposure apparatus

Publications (1)

Publication Number Publication Date
CA1017988A true CA1017988A (en) 1977-09-27

Family

ID=25668362

Family Applications (1)

Application Number Title Priority Date Filing Date
CA260,881A Expired CA1017988A (en) 1973-03-09 1976-09-10 Unit power optical projection and scanning photographic exposure apparatus

Country Status (1)

Country Link
CA (1) CA1017988A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112684657A (en) * 2020-12-24 2021-04-20 四川长虹电器股份有限公司 Method for collimating solid-state light-emitting chip or chip array light source

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112684657A (en) * 2020-12-24 2021-04-20 四川长虹电器股份有限公司 Method for collimating solid-state light-emitting chip or chip array light source
CN112684657B (en) * 2020-12-24 2022-02-01 四川长虹电器股份有限公司 Method for collimating solid-state light-emitting chip or chip array light source

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