CA1005673A - Positive printing plate incorporating diazoquinone - Google Patents

Positive printing plate incorporating diazoquinone

Info

Publication number
CA1005673A
CA1005673A CA185,999A CA185999A CA1005673A CA 1005673 A CA1005673 A CA 1005673A CA 185999 A CA185999 A CA 185999A CA 1005673 A CA1005673 A CA 1005673A
Authority
CA
Canada
Prior art keywords
diazoquinone
printing plate
positive printing
plate incorporating
incorporating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA185,999A
Other languages
English (en)
Other versions
CA185999S (en
Inventor
Constantine C. Petropoulos
Joseph A. Arcesi
Raymond W. Ryan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Application granted granted Critical
Publication of CA1005673A publication Critical patent/CA1005673A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
CA185,999A 1972-12-22 1973-11-16 Positive printing plate incorporating diazoquinone Expired CA1005673A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US31758572A 1972-12-22 1972-12-22

Publications (1)

Publication Number Publication Date
CA1005673A true CA1005673A (en) 1977-02-22

Family

ID=23234356

Family Applications (1)

Application Number Title Priority Date Filing Date
CA185,999A Expired CA1005673A (en) 1972-12-22 1973-11-16 Positive printing plate incorporating diazoquinone

Country Status (6)

Country Link
JP (1) JPS5630849B2 (US07122547-20061017-C00273.png)
BE (1) BE809031A (US07122547-20061017-C00273.png)
CA (1) CA1005673A (US07122547-20061017-C00273.png)
FR (1) FR2211677B1 (US07122547-20061017-C00273.png)
GB (1) GB1442797A (US07122547-20061017-C00273.png)
IT (1) IT1000552B (US07122547-20061017-C00273.png)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
JPS61206293A (ja) * 1985-03-08 1986-09-12 日本ペイント株式会社 回路板の製造方法
US4732837A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
US5035976A (en) * 1986-05-02 1991-07-30 Hoechst Celanese Corporation Photosensitive article having phenolic photosensitizers containing quinone diazide and acid halide substituents
US4732836A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
EP0287212B1 (en) * 1987-03-12 1994-12-28 Mitsubishi Chemical Corporation Positive photosensitive planographic printing plate
DE3731439A1 (de) * 1987-09-18 1989-03-30 Hoechst Ag Strahlungsempfindliches gemisch und hieraus hergestelltes kopiermaterial
JPH07119374B2 (ja) * 1987-11-06 1995-12-20 関西ペイント株式会社 ポジ型感光性カチオン電着塗料組成物

Also Published As

Publication number Publication date
FR2211677B1 (US07122547-20061017-C00273.png) 1977-08-12
FR2211677A1 (US07122547-20061017-C00273.png) 1974-07-19
JPS49126403A (US07122547-20061017-C00273.png) 1974-12-04
BE809031A (fr) 1974-06-21
DE2364178A1 (de) 1974-07-11
DE2364178B2 (de) 1976-01-15
GB1442797A (en) 1976-07-14
JPS5630849B2 (US07122547-20061017-C00273.png) 1981-07-17
IT1000552B (it) 1976-04-10

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