BRPI0810414A2 - Saco em recipiente integralmente moldado por sopro que tem uma camada interna e uma camada externa feita do mesmo material e pré-forma para sua fabricação - Google Patents

Saco em recipiente integralmente moldado por sopro que tem uma camada interna e uma camada externa feita do mesmo material e pré-forma para sua fabricação

Info

Publication number
BRPI0810414A2
BRPI0810414A2 BRPI0810414-0A2A BRPI0810414A BRPI0810414A2 BR PI0810414 A2 BRPI0810414 A2 BR PI0810414A2 BR PI0810414 A BRPI0810414 A BR PI0810414A BR PI0810414 A2 BRPI0810414 A2 BR PI0810414A2
Authority
BR
Brazil
Prior art keywords
bag
manufacture
same material
fully formulated
layer made
Prior art date
Application number
BRPI0810414-0A2A
Other languages
English (en)
Inventor
Sarah Van Hove
Daniel Peirsman
Rudi Verpoorten
Original Assignee
Inbev Sa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Inbev Sa filed Critical Inbev Sa
Priority claimed from PCT/EP2008/054770 external-priority patent/WO2008129016A1/en
Publication of BRPI0810414A2 publication Critical patent/BRPI0810414A2/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
BRPI0810414-0A2A 2007-04-19 2008-04-18 Saco em recipiente integralmente moldado por sopro que tem uma camada interna e uma camada externa feita do mesmo material e pré-forma para sua fabricação BRPI0810414A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/785,745 US20080259298A1 (en) 2007-04-19 2007-04-19 Lithographic apparatus and device manufacturing method
PCT/EP2008/054770 WO2008129016A1 (en) 2007-04-19 2008-04-18 Integrally blow-moulded bag-in-container having an inner layer and the outer layer made of the same material and preform for making it

Publications (1)

Publication Number Publication Date
BRPI0810414A2 true BRPI0810414A2 (pt) 2014-10-14

Family

ID=39691234

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0810414-0A2A BRPI0810414A2 (pt) 2007-04-19 2008-04-18 Saco em recipiente integralmente moldado por sopro que tem uma camada interna e uma camada externa feita do mesmo material e pré-forma para sua fabricação

Country Status (4)

Country Link
US (1) US20080259298A1 (pt)
JP (1) JP4966410B2 (pt)
BR (1) BRPI0810414A2 (pt)
WO (1) WO2008130231A1 (pt)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011003928B4 (de) 2011-02-10 2012-10-31 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
US9594306B2 (en) * 2011-03-04 2017-03-14 Asml Netherlands B.V. Lithographic apparatus, spectral purity filter and device manufacturing method
DE102015221209A1 (de) 2015-10-29 2017-05-04 Carl Zeiss Smt Gmbh Optische Baugruppe mit einem Schutzelement und optische Anordnung damit
NL2028923B1 (en) * 2020-09-03 2024-02-07 Asml Netherlands Bv Pellicle membrane for a lithographic apparatus

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1008352C2 (nl) * 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
US7006595B2 (en) * 1998-05-05 2006-02-28 Carl Zeiss Semiconductor Manufacturing Technologies Ag Illumination system particularly for microlithography
EP0955641B1 (de) * 1998-05-05 2004-04-28 Carl Zeiss Beleuchtungssystem insbesondere für die EUV-Lithographie
DE10053587A1 (de) * 2000-10-27 2002-05-02 Zeiss Carl Beleuchtungssystem mit variabler Einstellung der Ausleuchtung
US6438199B1 (en) * 1998-05-05 2002-08-20 Carl-Zeiss-Stiftung Illumination system particularly for microlithography
DE19935404A1 (de) * 1999-07-30 2001-02-01 Zeiss Carl Fa Beleuchtungssystem mit mehreren Lichtquellen
US6195201B1 (en) * 1999-01-27 2001-02-27 Svg Lithography Systems, Inc. Reflective fly's eye condenser for EUV lithography
EP1202100A3 (de) * 2000-10-27 2005-04-06 Carl Zeiss SMT AG Beleuchtungssystem mit reduzierter Wärmebelastung
US20020090054A1 (en) * 2001-01-10 2002-07-11 Michael Sogard Apparatus and method for containing debris from laser plasma radiation sources
WO2002059905A2 (de) * 2001-01-26 2002-08-01 Carl Zeiss Smt Ag Schmalbandiger spektralfilter und seine verwendung
TW594847B (en) * 2001-07-27 2004-06-21 Canon Kk Illumination system, projection exposure apparatus and method for manufacturing a device provided with a pattern to be exposed
DE10138284A1 (de) * 2001-08-10 2003-02-27 Zeiss Carl Beleuchtungssystem mit genesteten Kollektoren
US7333178B2 (en) * 2002-03-18 2008-02-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7170587B2 (en) * 2002-03-18 2007-01-30 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN1273871C (zh) * 2002-03-18 2006-09-06 Asml荷兰有限公司 光刻装置和器件的制作方法
DE60312871T2 (de) * 2002-08-26 2007-12-20 Carl Zeiss Smt Ag Gitter basierter spektraler filter zur unterdrückung von strahlung ausserhalb des nutzbandes in einem extrem-ultraviolett lithographiesystem
DE10317667A1 (de) * 2003-04-17 2004-11-18 Carl Zeiss Smt Ag Optisches Element für ein Beleuchtungssystem
JP2004343082A (ja) * 2003-04-17 2004-12-02 Asml Netherlands Bv 凹面および凸面を含む集光器を備えたリトグラフ投影装置
US7061591B2 (en) * 2003-05-30 2006-06-13 Asml Holding N.V. Maskless lithography systems and methods utilizing spatial light modulator arrays
JP2006108521A (ja) * 2004-10-08 2006-04-20 Canon Inc Ｘ線発生装置及び露光装置
JP2006128342A (ja) * 2004-10-28 2006-05-18 Canon Inc 露光装置、光源装置及びデバイス製造方法
US7277158B2 (en) * 2004-12-02 2007-10-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7211810B2 (en) * 2004-12-29 2007-05-01 Asml Netherlands B.V. Method for the protection of an optical element, lithographic apparatus, and device manufacturing method
US7250620B2 (en) * 2005-01-20 2007-07-31 Infineon Technologies Ag EUV lithography filter
US7548302B2 (en) * 2005-03-29 2009-06-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20080100816A1 (en) * 2006-10-31 2008-05-01 Asml Netherlands B.V. Lithographic apparatus and method

Also Published As

Publication number Publication date
US20080259298A1 (en) 2008-10-23
JP4966410B2 (ja) 2012-07-04
JP2010525570A (ja) 2010-07-22
WO2008130231A1 (en) 2008-10-30

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Legal Events

Date Code Title Description
B15K Others concerning applications: alteration of classification

Ipc: B29B 11/14 (2006.01), B65D 23/02 (2006.01), B65D 8

B07A Application suspended after technical examination (opinion) [chapter 7.1 patent gazette]
B09B Patent application refused [chapter 9.2 patent gazette]
B12B Appeal against refusal [chapter 12.2 patent gazette]
B350 Update of information on the portal [chapter 15.35 patent gazette]