BR7908672A - Processo de posicao de filmes a partir da fase vapor - Google Patents

Processo de posicao de filmes a partir da fase vapor

Info

Publication number
BR7908672A
BR7908672A BR7908672A BR7908672A BR7908672A BR 7908672 A BR7908672 A BR 7908672A BR 7908672 A BR7908672 A BR 7908672A BR 7908672 A BR7908672 A BR 7908672A BR 7908672 A BR7908672 A BR 7908672A
Authority
BR
Brazil
Prior art keywords
positioning process
steam phase
film positioning
steam
film
Prior art date
Application number
BR7908672A
Other languages
English (en)
Inventor
V Baranauskas
Original Assignee
Brasilia Telecom
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Brasilia Telecom filed Critical Brasilia Telecom
Priority to BR7908672A priority Critical patent/BR7908672A/pt
Priority to PCT/BR1980/000013 priority patent/WO1981001529A1/en
Publication of BR7908672A publication Critical patent/BR7908672A/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation by radiant heating of the substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
BR7908672A 1979-11-30 1979-11-30 Processo de posicao de filmes a partir da fase vapor BR7908672A (pt)

Priority Applications (2)

Application Number Priority Date Filing Date Title
BR7908672A BR7908672A (pt) 1979-11-30 1979-11-30 Processo de posicao de filmes a partir da fase vapor
PCT/BR1980/000013 WO1981001529A1 (en) 1979-11-30 1980-11-26 Chemical vapour deposition process with lazer heating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
BR7908672A BR7908672A (pt) 1979-11-30 1979-11-30 Processo de posicao de filmes a partir da fase vapor

Publications (1)

Publication Number Publication Date
BR7908672A true BR7908672A (pt) 1981-06-30

Family

ID=4018922

Family Applications (1)

Application Number Title Priority Date Filing Date
BR7908672A BR7908672A (pt) 1979-11-30 1979-11-30 Processo de posicao de filmes a partir da fase vapor

Country Status (2)

Country Link
BR (1) BR7908672A (pt)
WO (1) WO1981001529A1 (pt)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5864368A (ja) * 1981-10-12 1983-04-16 Inoue Japax Res Inc 化学メツキ方法
DE3472574D1 (en) * 1983-10-14 1988-08-11 Hitachi Ltd Process for forming an organic thin film
FR2578095B1 (fr) * 1985-02-28 1988-04-15 Avitaya Francois D Procede et dispositif de depot par croissance epitaxiale d'un materiau dope
US4859496A (en) * 1986-09-02 1989-08-22 Matsushita Electric Industrial Co., Ltd. Method of producing an electrically-conductive transparent film
US4843031A (en) * 1987-03-17 1989-06-27 Matsushita Electric Industrial Co., Ltd. Method of fabricating compound semiconductor laser using selective irradiation
JPH073909B2 (ja) * 1987-09-08 1995-01-18 三菱電機株式会社 半導体レーザの製造方法
US5145714A (en) * 1990-10-30 1992-09-08 Mcnc Metal-organic chemical vapor deposition for repairing broken lines in microelectronic packages

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1900116C3 (de) * 1969-01-02 1978-10-19 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zum Herstellen hxxochreiner, aus Silicium bestehender einkristalliner Schichten
FR2232613A1 (en) * 1973-06-07 1975-01-03 Poudres & Explosifs Ste Nale Deposition from vapour phase using laser heating - boron cpds. obtd. on silica, carbon or tungsten substrates
NL165134B (nl) * 1974-04-24 1980-10-15 Nippon Telegraph & Telephone Werkwijze voor de vervaardiging van een staaf als tussenprodukt voor de vervaardiging van een optische vezel en werkwijze voor de vervaardiging van een optische vezel uit zulk een tussenprodukt.
US4027053A (en) * 1975-12-19 1977-05-31 Motorola, Inc. Method of producing polycrystalline silicon ribbon
US4107349A (en) * 1977-08-12 1978-08-15 The United States Of America As Represented By The Secretary Of The Army Method of adjusting the frequency of piezoelectric resonators

Also Published As

Publication number Publication date
WO1981001529A1 (en) 1981-06-11

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