BR7102639D0 - PROCESS TO PRODUCE A PRIMARY BRIGHTNESS PROMOTER FOR ACID GALVANIZATION BATHS WITH TINY IMPREGNATED WATER ACID SOLUTION AND PROCESS FOR ELECTRODEPOSITION OF BRIGHT TIN IMPREGNATED - Google Patents
PROCESS TO PRODUCE A PRIMARY BRIGHTNESS PROMOTER FOR ACID GALVANIZATION BATHS WITH TINY IMPREGNATED WATER ACID SOLUTION AND PROCESS FOR ELECTRODEPOSITION OF BRIGHT TIN IMPREGNATEDInfo
- Publication number
- BR7102639D0 BR7102639D0 BR2639/71A BR263971A BR7102639D0 BR 7102639 D0 BR7102639 D0 BR 7102639D0 BR 2639/71 A BR2639/71 A BR 2639/71A BR 263971 A BR263971 A BR 263971A BR 7102639 D0 BR7102639 D0 BR 7102639D0
- Authority
- BR
- Brazil
- Prior art keywords
- impregnated
- electrodeposition
- tiny
- promoter
- produce
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/30—Electroplating: Baths therefor from solutions of tin
- C25D3/32—Electroplating: Baths therefor from solutions of tin characterised by the organic bath constituents used
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
- C07D307/34—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D307/38—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms
- C07D307/40—Radicals substituted by oxygen atoms
- C07D307/46—Doubly bound oxygen atoms, or two oxygen atoms singly bound to the same carbon atom
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US3526170A | 1970-05-06 | 1970-05-06 |
Publications (1)
Publication Number | Publication Date |
---|---|
BR7102639D0 true BR7102639D0 (en) | 1973-04-19 |
Family
ID=21881579
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR2639/71A BR7102639D0 (en) | 1970-05-06 | 1971-04-30 | PROCESS TO PRODUCE A PRIMARY BRIGHTNESS PROMOTER FOR ACID GALVANIZATION BATHS WITH TINY IMPREGNATED WATER ACID SOLUTION AND PROCESS FOR ELECTRODEPOSITION OF BRIGHT TIN IMPREGNATED |
Country Status (11)
Country | Link |
---|---|
US (1) | US3634212A (en) |
JP (1) | JPS5524512B1 (en) |
BR (1) | BR7102639D0 (en) |
CA (1) | CA988452A (en) |
DE (1) | DE2122263C2 (en) |
ES (1) | ES390675A1 (en) |
FR (1) | FR2088388B1 (en) |
GB (1) | GB1311424A (en) |
NL (1) | NL7106161A (en) |
SE (1) | SE375340B (en) |
ZA (1) | ZA712389B (en) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4844780A (en) * | 1988-02-17 | 1989-07-04 | Maclee Chemical Company, Inc. | Brightener and aqueous plating bath for tin and/or lead |
US5750017A (en) * | 1996-08-21 | 1998-05-12 | Lucent Technologies Inc. | Tin electroplating process |
US6670071B2 (en) * | 2002-01-15 | 2003-12-30 | Quallion Llc | Electric storage battery construction and method of manufacture |
US6838114B2 (en) * | 2002-05-24 | 2005-01-04 | Micron Technology, Inc. | Methods for controlling gas pulsing in processes for depositing materials onto micro-device workpieces |
US6821347B2 (en) * | 2002-07-08 | 2004-11-23 | Micron Technology, Inc. | Apparatus and method for depositing materials onto microelectronic workpieces |
US6955725B2 (en) | 2002-08-15 | 2005-10-18 | Micron Technology, Inc. | Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces |
US6818249B2 (en) * | 2003-03-03 | 2004-11-16 | Micron Technology, Inc. | Reactors, systems with reaction chambers, and methods for depositing materials onto micro-device workpieces |
US7335396B2 (en) * | 2003-04-24 | 2008-02-26 | Micron Technology, Inc. | Methods for controlling mass flow rates and pressures in passageways coupled to reaction chambers and systems for depositing material onto microfeature workpieces in reaction chambers |
US7344755B2 (en) * | 2003-08-21 | 2008-03-18 | Micron Technology, Inc. | Methods and apparatus for processing microfeature workpieces; methods for conditioning ALD reaction chambers |
US7235138B2 (en) * | 2003-08-21 | 2007-06-26 | Micron Technology, Inc. | Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces |
US7422635B2 (en) * | 2003-08-28 | 2008-09-09 | Micron Technology, Inc. | Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces |
US7056806B2 (en) * | 2003-09-17 | 2006-06-06 | Micron Technology, Inc. | Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces |
US7282239B2 (en) * | 2003-09-18 | 2007-10-16 | Micron Technology, Inc. | Systems and methods for depositing material onto microfeature workpieces in reaction chambers |
US7323231B2 (en) * | 2003-10-09 | 2008-01-29 | Micron Technology, Inc. | Apparatus and methods for plasma vapor deposition processes |
US7581511B2 (en) * | 2003-10-10 | 2009-09-01 | Micron Technology, Inc. | Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes |
US7647886B2 (en) * | 2003-10-15 | 2010-01-19 | Micron Technology, Inc. | Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers |
US7258892B2 (en) * | 2003-12-10 | 2007-08-21 | Micron Technology, Inc. | Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD deposition |
US7906393B2 (en) * | 2004-01-28 | 2011-03-15 | Micron Technology, Inc. | Methods for forming small-scale capacitor structures |
US7584942B2 (en) * | 2004-03-31 | 2009-09-08 | Micron Technology, Inc. | Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers |
US20050249873A1 (en) * | 2004-05-05 | 2005-11-10 | Demetrius Sarigiannis | Apparatuses and methods for producing chemically reactive vapors used in manufacturing microelectronic devices |
US8133554B2 (en) * | 2004-05-06 | 2012-03-13 | Micron Technology, Inc. | Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces |
US7699932B2 (en) * | 2004-06-02 | 2010-04-20 | Micron Technology, Inc. | Reactors, systems and methods for depositing thin films onto microfeature workpieces |
US7156470B1 (en) * | 2004-06-28 | 2007-01-02 | Wright James P | Wheel trim hub cover |
US20060165873A1 (en) * | 2005-01-25 | 2006-07-27 | Micron Technology, Inc. | Plasma detection and associated systems and methods for controlling microfeature workpiece deposition processes |
US20060237138A1 (en) * | 2005-04-26 | 2006-10-26 | Micron Technology, Inc. | Apparatuses and methods for supporting microelectronic devices during plasma-based fabrication processes |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1544726A (en) * | 1924-08-28 | 1925-07-07 | Us Smelting Refining & Mining | Electrolytic refining of metals |
FR1392257A (en) * | 1964-04-29 | 1965-03-12 | Friedr Blasberg G M B H | Brightening agent for the electrolytic separation of high-gloss tin deposits from acidic aqueous solutions of tin salts, and its use |
NL128321C (en) * | 1965-02-13 |
-
1970
- 1970-05-06 US US35261A patent/US3634212A/en not_active Expired - Lifetime
-
1971
- 1971-04-14 ZA ZA712389A patent/ZA712389B/en unknown
- 1971-04-23 JP JP2662471A patent/JPS5524512B1/ja active Pending
- 1971-04-28 ES ES390675A patent/ES390675A1/en not_active Expired
- 1971-04-30 BR BR2639/71A patent/BR7102639D0/en unknown
- 1971-05-04 SE SE7105758A patent/SE375340B/xx unknown
- 1971-05-05 DE DE2122263A patent/DE2122263C2/en not_active Expired
- 1971-05-05 GB GB1338471*[A patent/GB1311424A/en not_active Expired
- 1971-05-05 NL NL7106161A patent/NL7106161A/xx active Search and Examination
- 1971-05-05 CA CA112,203A patent/CA988452A/en not_active Expired
- 1971-05-06 FR FR7116345A patent/FR2088388B1/fr not_active Expired
Also Published As
Publication number | Publication date |
---|---|
ES390675A1 (en) | 1974-03-16 |
US3634212A (en) | 1972-01-11 |
NL7106161A (en) | 1971-11-09 |
DE2122263C2 (en) | 1981-12-03 |
ZA712389B (en) | 1972-01-26 |
CA988452A (en) | 1976-05-04 |
FR2088388A1 (en) | 1972-01-07 |
GB1311424A (en) | 1973-03-28 |
JPS5524512B1 (en) | 1980-06-30 |
DE2122263A1 (en) | 1971-12-09 |
SE375340B (en) | 1975-04-14 |
FR2088388B1 (en) | 1975-07-04 |
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