BR112014008047A2 - módulo de comando para implantador iônico em modo de imersão em plasma - Google Patents

módulo de comando para implantador iônico em modo de imersão em plasma

Info

Publication number
BR112014008047A2
BR112014008047A2 BR112014008047A BR112014008047A BR112014008047A2 BR 112014008047 A2 BR112014008047 A2 BR 112014008047A2 BR 112014008047 A BR112014008047 A BR 112014008047A BR 112014008047 A BR112014008047 A BR 112014008047A BR 112014008047 A2 BR112014008047 A2 BR 112014008047A2
Authority
BR
Brazil
Prior art keywords
pole
control module
whose
immersion
core
Prior art date
Application number
BR112014008047A
Other languages
English (en)
Inventor
Torregrosa Frank
Roux Laurent
Original Assignee
Ion Beam Services
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ion Beam Services filed Critical Ion Beam Services
Publication of BR112014008047A2 publication Critical patent/BR112014008047A2/pt

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/24—Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
    • H01J37/243—Beam current control or regulation circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32311—Circuits specially adapted for controlling the microwave discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32412—Plasma immersion ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32422—Arrangement for selecting ions or species in the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H01J37/32972—Spectral analysis
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R19/00—Arrangements for measuring currents or voltages or for indicating presence or sign thereof
    • G01R19/0046—Arrangements for measuring currents or voltages or for indicating presence or sign thereof characterised by a specific application or detail not covered by any other subgroup of G01R19/00
    • G01R19/0061—Measuring currents of particle-beams, currents from electron multipliers, photocurrents, ion currents; Measuring in plasmas

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Plasma Technology (AREA)
  • Physical Vapour Deposition (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Hybrid Cells (AREA)

Abstract

resumo patente de invenção: "módulo de comando para implantador iônico em modo de imersão em plasma". a presente invenção refere-se a um módulo de comando para implantador iônico, comportando uma alimentação, essa alimentação compreendendo: - um gerador elétrico (ht), cujo polo positivo é ligado à massa; - um primeiro interruptor (sw1), cujo primeiro polo é ligado ao polo negativo do gerador (ht) e cujo segundo polo é ligado ao núcleo de saída (s) dessa alimentação; - um segundo interruptor (sw2), cujo primeiro polo é ligado ao núcleo de saída (s) e cujo segundo polo é ligado a um núcleo de neutralização (n). além disso, esse módulo de comando compreende um circuito de medida de corrente (amp) que escoa entre o segundo polo desse segundo interruptor (sw2) e esse núcleo de neutralização (n). a invenção visa também a um implantador iônico munido desse módulo de comando.
BR112014008047A 2011-10-04 2012-10-03 módulo de comando para implantador iônico em modo de imersão em plasma BR112014008047A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1103003A FR2980911B1 (fr) 2011-10-04 2011-10-04 Module de commande pour implanteur ionique
PCT/FR2012/000391 WO2013050670A1 (fr) 2011-10-04 2012-10-03 Module de commande pour implanteur ionique en mode immersion plasma

Publications (1)

Publication Number Publication Date
BR112014008047A2 true BR112014008047A2 (pt) 2017-04-11

Family

ID=47263396

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112014008047A BR112014008047A2 (pt) 2011-10-04 2012-10-03 módulo de comando para implantador iônico em modo de imersão em plasma

Country Status (11)

Country Link
US (1) US9035269B2 (pt)
EP (1) EP2764530B1 (pt)
JP (1) JP6039674B2 (pt)
KR (1) KR101963745B1 (pt)
CN (1) CN103930967B (pt)
BR (1) BR112014008047A2 (pt)
FR (1) FR2980911B1 (pt)
RU (1) RU2616599C2 (pt)
SG (1) SG11201400913WA (pt)
TW (1) TWI532085B (pt)
WO (1) WO2013050670A1 (pt)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2981193B1 (fr) * 2011-10-06 2014-05-23 Ion Beam Services Procede de commande d'un implanteur ionique en mode immersion plasma.
EP2915220B1 (en) * 2012-10-30 2016-09-07 Eaton Industries (Netherlands) B.V. Medium voltage connection
US9962533B2 (en) 2013-02-14 2018-05-08 William Harrison Zurn Module for treatment of medical conditions; system for making module and methods of making module
FR3045206B1 (fr) * 2015-12-10 2020-01-03 Ion Beam Services Procede de commande pour un implanteur fonctionnant en immersion plasma

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5354381A (en) * 1993-05-07 1994-10-11 Varian Associates, Inc. Plasma immersion ion implantation (PI3) apparatus
US6237527B1 (en) 1999-08-06 2001-05-29 Axcelis Technologies, Inc. System for improving energy purity and implant consistency, and for minimizing charge accumulation of an implanted substrate
US6433553B1 (en) * 1999-10-27 2002-08-13 Varian Semiconductor Equipment Associates, Inc. Method and apparatus for eliminating displacement current from current measurements in a plasma processing system
WO2002025694A2 (en) * 2000-09-18 2002-03-28 Axcelis Technologies, Inc. System and method for controlling sputtering and deposition effects in a plasma immersion implantation device
FR2871934B1 (fr) 2004-06-16 2006-09-22 Ion Beam Services Sa Alimentation d'implanteur ionique prevue pour une limitation de l'effet de charge
US7531469B2 (en) * 2004-10-23 2009-05-12 Applied Materials, Inc. Dosimetry using optical emission spectroscopy/residual gas analyzer in conjunction with ion current
US20100155600A1 (en) * 2008-12-23 2010-06-24 Varian Semiconductor Equipment Associates, Inc. Method and apparatus for plasma dose measurement
US9309594B2 (en) * 2010-04-26 2016-04-12 Advanced Energy Industries, Inc. System, method and apparatus for controlling ion energy distribution of a projected plasma
US9685297B2 (en) * 2012-08-28 2017-06-20 Advanced Energy Industries, Inc. Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system

Also Published As

Publication number Publication date
KR20140086971A (ko) 2014-07-08
WO2013050670A1 (fr) 2013-04-11
RU2014111556A (ru) 2015-11-10
EP2764530B1 (fr) 2019-11-20
JP6039674B2 (ja) 2016-12-07
KR101963745B1 (ko) 2019-03-29
CN103930967A (zh) 2014-07-16
TWI532085B (zh) 2016-05-01
SG11201400913WA (en) 2014-08-28
US9035269B2 (en) 2015-05-19
US20140353525A1 (en) 2014-12-04
EP2764530A1 (fr) 2014-08-13
TW201334037A (zh) 2013-08-16
JP2014535129A (ja) 2014-12-25
FR2980911B1 (fr) 2013-11-22
FR2980911A1 (fr) 2013-04-05
RU2616599C2 (ru) 2017-04-18
CN103930967B (zh) 2017-04-19

Similar Documents

Publication Publication Date Title
BR112014032920A2 (pt) método e dispositivo oftálmico para cura galvânica de um olho
BR112012030269A2 (pt) sistema de soldagem de arco curto
BR112014018419A8 (pt) Lente oftálmica energizada que inclui componentes integrados empilhados
BR112014008047A2 (pt) módulo de comando para implantador iônico em modo de imersão em plasma
BR112015012237A2 (pt) aparelho de fonte de alimentação veicular
BRPI1014501A2 (pt) "controle de um dispositivo inversor para suportar um sistema ca"
BRPI1010878A2 (pt) circuito e método de coleta de potência para fontes de alimentação cc acopladas em série
WO2015006656A3 (en) Integrative light-powered light-monitoring system
BR112014019687A8 (pt) Sistema de energia cc para alimentar uma embarcação
BR112013003956A2 (pt) aparelho e processo de eliminação de corrente invasiva magnetizante
BR112012027761A2 (pt) sistema de controle de gerador elétrico
BR112015017027A2 (pt) instrumento cirúrgico motorizado
BR112014017664A2 (pt) detecção de presença de usuário de dispositivo de computação
BR112012028465A2 (pt) manipulador de instrumento de sistema cirúrgico
BR112012009508A2 (pt) sistema de alinhamento da polia
BR112013014691A8 (pt) Acionador para fornecer energia para acionar pelo menos uma fonte de luz e método para acionar pelo menos uma fonte de luz
BRPI0913432A2 (pt) máquina de corrente alternada do tipoo que gera eletricidade ou é acionada por uma corrente elétrica
BR112015010397A2 (pt) aparelho de controle para veículo e veículo
BR112013007799A2 (pt) regulador de circuito de corrente elevada de alta voltagem
BR112014028724A2 (pt) conversor para uma máquina elétrica
BR112012031489A2 (pt) circuito de fonte de alimentação para um sistema de degelo de aeronave
BR102012032684B8 (pt) Aeronave e processo de gestão em tempo real de energia a bordo de uma aeronave
BR112012027738A2 (pt) ferramenta elétrica
BR112014001014A2 (pt) fonte de luz de led e método para gerar luz fazendo uso de uma tira de led
BR112015027694A2 (pt) Circuito de correção do fator de potência, método de tabulação para controlar um circuito de correção do fator de potência e método instantâneo para controlar um circuito de correção do fator de potência

Legal Events

Date Code Title Description
B11A Dismissal acc. art.33 of ipl - examination not requested within 36 months of filing
B11Y Definitive dismissal - extension of time limit for request of examination expired [chapter 11.1.1 patent gazette]