BE863120A - Polymeres de polyoxumethylene et articles realises en ces polymeres - Google Patents

Polymeres de polyoxumethylene et articles realises en ces polymeres

Info

Publication number
BE863120A
BE863120A BE184482A BE184482A BE863120A BE 863120 A BE863120 A BE 863120A BE 184482 A BE184482 A BE 184482A BE 184482 A BE184482 A BE 184482A BE 863120 A BE863120 A BE 863120A
Authority
BE
Belgium
Prior art keywords
polymers
polyoxumethylene
articles made
articles
polyoxumethylene polymers
Prior art date
Application number
BE184482A
Other languages
English (en)
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Publication of BE863120A publication Critical patent/BE863120A/fr

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2/00Addition polymers of aldehydes or cyclic oligomers thereof or of ketones; Addition copolymers thereof with less than 50 molar percent of other substances
    • C08G2/06Catalysts
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2/00Addition polymers of aldehydes or cyclic oligomers thereof or of ketones; Addition copolymers thereof with less than 50 molar percent of other substances
    • C08G2/08Polymerisation of formaldehyde
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2/00Addition polymers of aldehydes or cyclic oligomers thereof or of ketones; Addition copolymers thereof with less than 50 molar percent of other substances
    • C08G2/14Polymerisation of single aldehydes not provided for in groups C08G2/08 - C08G2/12
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387Polyamides or polyimides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
BE184482A 1977-01-21 1978-01-20 Polymeres de polyoxumethylene et articles realises en ces polymeres BE863120A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/760,934 US4075175A (en) 1977-01-21 1977-01-21 Preparation of photosensitive polyaldehydes

Publications (1)

Publication Number Publication Date
BE863120A true BE863120A (fr) 1978-07-20

Family

ID=25060617

Family Applications (1)

Application Number Title Priority Date Filing Date
BE184482A BE863120A (fr) 1977-01-21 1978-01-20 Polymeres de polyoxumethylene et articles realises en ces polymeres

Country Status (2)

Country Link
US (1) US4075175A (fr)
BE (1) BE863120A (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4467022A (en) * 1980-08-11 1984-08-21 Minnesota Mining And Manufacturing Company Imaging process and article employing photolabile, blocked surfactant
US4369244A (en) * 1980-08-11 1983-01-18 Minnesota Mining And Manufacturing Company Imaging process and article employing photolabile, blocked surfactant
US4478967A (en) * 1980-08-11 1984-10-23 Minnesota Mining And Manufacturing Company Photolabile blocked surfactants and compositions containing the same
US4599273A (en) * 1980-08-11 1986-07-08 Minnesota Mining And Manufacturing Co. Photolabile blocked surfactants and compositions containing the same
US4554238A (en) * 1984-03-20 1985-11-19 Minnesota Mining And Manufacturing Company Spectrally-sensitized imaging system
US4740600A (en) * 1984-05-10 1988-04-26 Minnesota Mining And Manufacturing Company Photolabile blocked surfactants and compositions containing the same
US4734481A (en) * 1986-01-16 1988-03-29 Ciba-Geigy Corporation Novel organometallic polymers
DE3702035A1 (de) * 1987-01-24 1988-08-04 Basf Ag Copolymerisate mit o-nitrocarbinolestergruppierungen und verfahren zur herstellung von zweilagenresisten sowie von halbleiterbauelementen

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3991033A (en) * 1975-01-30 1976-11-09 E. I. Du Pont De Nemours & Company Photosensitive and degradable polyoxymethylene polymers and their application in imaging

Also Published As

Publication number Publication date
US4075175A (en) 1978-02-21

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