BE824024A - Element photopolymerisable utile comme reserve dans l'attaque par diffusion - Google Patents

Element photopolymerisable utile comme reserve dans l'attaque par diffusion

Info

Publication number
BE824024A
BE824024A BE152076A BE152076A BE824024A BE 824024 A BE824024 A BE 824024A BE 152076 A BE152076 A BE 152076A BE 152076 A BE152076 A BE 152076A BE 824024 A BE824024 A BE 824024A
Authority
BE
Belgium
Prior art keywords
reserve
element useful
attack
diffusion
photopolymerisable
Prior art date
Application number
BE152076A
Other languages
English (en)
French (fr)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE824024A publication Critical patent/BE824024A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
BE152076A 1974-01-02 1974-12-31 Element photopolymerisable utile comme reserve dans l'attaque par diffusion BE824024A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US43005274A 1974-01-02 1974-01-02

Publications (1)

Publication Number Publication Date
BE824024A true BE824024A (fr) 1975-06-30

Family

ID=23705873

Family Applications (1)

Application Number Title Priority Date Filing Date
BE152076A BE824024A (fr) 1974-01-02 1974-12-31 Element photopolymerisable utile comme reserve dans l'attaque par diffusion

Country Status (6)

Country Link
JP (1) JPS50102327A (en:Method)
BE (1) BE824024A (en:Method)
DE (1) DE2461728A1 (en:Method)
FR (1) FR2256436B1 (en:Method)
GB (1) GB1483391A (en:Method)
IT (1) IT1030957B (en:Method)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0356954A3 (en) * 1988-08-30 1991-05-08 E.I. Du Pont De Nemours And Company A plasticized polyvinyl alcohol release layer for a flexographic printing plate
DE3842028A1 (de) * 1988-12-14 1990-06-28 Basf Ag Photoresistfilm mit loeslicher zwischenschicht
US5536264A (en) 1993-10-22 1996-07-16 The Procter & Gamble Company Absorbent composites comprising a porous macrostructure of absorbent gelling particles and a substrate

Also Published As

Publication number Publication date
JPS50102327A (en:Method) 1975-08-13
FR2256436B1 (en:Method) 1979-01-05
DE2461728A1 (de) 1975-07-10
IT1030957B (it) 1979-04-10
GB1483391A (en) 1977-08-17
FR2256436A1 (en:Method) 1975-07-25

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