BE754166A - LIGHT SENSITIVE LAYERS FOR PHOTOMECHANICAL REPRODUCTION - Google Patents

LIGHT SENSITIVE LAYERS FOR PHOTOMECHANICAL REPRODUCTION

Info

Publication number
BE754166A
BE754166A BE754166DA BE754166A BE 754166 A BE754166 A BE 754166A BE 754166D A BE754166D A BE 754166DA BE 754166 A BE754166 A BE 754166A
Authority
BE
Belgium
Prior art keywords
light sensitive
sensitive layers
photomechanical reproduction
photomechanical
reproduction
Prior art date
Application number
Other languages
French (fr)
Original Assignee
Schafler Armando B
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication date
Publication of BE754166A publication Critical patent/BE754166A/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • G03F7/021Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/52Compositions containing diazo compounds as photosensitive substances
    • G03C1/58Coupling substances therefor
BE754166D 1969-08-06 LIGHT SENSITIVE LAYERS FOR PHOTOMECHANICAL REPRODUCTION BE754166A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
MX11307769 1969-08-06

Publications (1)

Publication Number Publication Date
BE754166A true BE754166A (en) 1970-12-31

Family

ID=19745276

Family Applications (1)

Application Number Title Priority Date Filing Date
BE754166D BE754166A (en) 1969-08-06 LIGHT SENSITIVE LAYERS FOR PHOTOMECHANICAL REPRODUCTION

Country Status (6)

Country Link
BE (1) BE754166A (en)
DE (1) DE2038864A1 (en)
ES (1) ES382354A1 (en)
FR (1) FR2056611A5 (en)
NL (1) NL7011608A (en)
ZA (1) ZA705266B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56161537A (en) * 1980-05-16 1981-12-11 Kimoto & Co Ltd Photosensitive material and its developing method

Also Published As

Publication number Publication date
DE2038864A1 (en) 1971-02-18
ZA705266B (en) 1971-05-27
FR2056611A5 (en) 1971-05-14
NL7011608A (en) 1971-02-09
ES382354A1 (en) 1972-11-16

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