BE748215A - METHOD FOR REDUCING INTERDIFFUSION SPEEDS BETWEEN THIN FILM COMPONENTS - Google Patents

METHOD FOR REDUCING INTERDIFFUSION SPEEDS BETWEEN THIN FILM COMPONENTS

Info

Publication number
BE748215A
BE748215A BE748215DA BE748215A BE 748215 A BE748215 A BE 748215A BE 748215D A BE748215D A BE 748215DA BE 748215 A BE748215 A BE 748215A
Authority
BE
Belgium
Prior art keywords
speeds
thin film
film components
interdiffusion
reducing
Prior art date
Application number
Other languages
French (fr)
Inventor
H C Theuerer
P A Turner
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of BE748215A publication Critical patent/BE748215A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physical Vapour Deposition (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
BE748215D 1969-04-04 1970-03-31 METHOD FOR REDUCING INTERDIFFUSION SPEEDS BETWEEN THIN FILM COMPONENTS BE748215A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US81342169A 1969-04-04 1969-04-04

Publications (1)

Publication Number Publication Date
BE748215A true BE748215A (en) 1970-08-31

Family

ID=25212323

Family Applications (1)

Application Number Title Priority Date Filing Date
BE748215D BE748215A (en) 1969-04-04 1970-03-31 METHOD FOR REDUCING INTERDIFFUSION SPEEDS BETWEEN THIN FILM COMPONENTS

Country Status (7)

Country Link
US (1) US3751293A (en)
BE (1) BE748215A (en)
DE (1) DE2015457B2 (en)
FR (1) FR2042936A5 (en)
GB (1) GB1306113A (en)
NL (1) NL145285B (en)
SE (1) SE364317B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4407871A (en) * 1980-03-25 1983-10-04 Ex-Cell-O Corporation Vacuum metallized dielectric substrates and method of making same
US4431711A (en) * 1980-03-25 1984-02-14 Ex-Cell-O Corporation Vacuum metallizing a dielectric substrate with indium and products thereof

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE575275A (en) * 1958-02-03 1900-01-01
US3063858A (en) * 1959-07-22 1962-11-13 Nat Res Corp Vapor source and processes for vaporizing iron, nickel and copper
US3402073A (en) * 1964-08-04 1968-09-17 Texas Instruments Inc Process for making thin film circuit devices

Also Published As

Publication number Publication date
US3751293A (en) 1973-08-07
NL7004622A (en) 1970-10-06
DE2015457A1 (en) 1970-10-08
GB1306113A (en) 1973-02-07
FR2042936A5 (en) 1971-02-12
NL145285B (en) 1975-03-17
SE364317B (en) 1974-02-18
DE2015457B2 (en) 1972-02-10

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Legal Events

Date Code Title Description
RE20 Patent expired

Owner name: WESTERN ELECTRIC CY INC.

Effective date: 19900331