BE726354A - - Google Patents
Info
- Publication number
- BE726354A BE726354A BE726354DA BE726354A BE 726354 A BE726354 A BE 726354A BE 726354D A BE726354D A BE 726354DA BE 726354 A BE726354 A BE 726354A
- Authority
- BE
- Belgium
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Multimedia (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lenses (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US70345268A | 1968-02-06 | 1968-02-06 |
Publications (1)
Publication Number | Publication Date |
---|---|
BE726354A true BE726354A (es) | 1969-05-29 |
Family
ID=24825448
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE726354D BE726354A (es) | 1968-02-06 | 1968-12-31 |
Country Status (6)
Country | Link |
---|---|
US (1) | US3558222A (es) |
BE (1) | BE726354A (es) |
DE (1) | DE1904504A1 (es) |
FR (1) | FR1597089A (es) |
GB (1) | GB1233696A (es) |
NL (1) | NL6818181A (es) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4474465A (en) * | 1982-09-07 | 1984-10-02 | International Business Machines Corporation | Method and apparatus for making a mask conforming to a ceramic substrate metallization pattern |
NL8900991A (nl) * | 1989-04-20 | 1990-11-16 | Asm Lithography Bv | Apparaat voor het afbeelden van een maskerpatroon op een substraat. |
US6463184B1 (en) * | 1999-06-17 | 2002-10-08 | International Business Machines Corporation | Method and apparatus for overlay measurement |
-
1968
- 1968-02-06 US US703452A patent/US3558222A/en not_active Expired - Lifetime
- 1968-12-18 NL NL6818181A patent/NL6818181A/xx unknown
- 1968-12-24 FR FR1597089D patent/FR1597089A/fr not_active Expired
- 1968-12-31 BE BE726354D patent/BE726354A/xx unknown
-
1969
- 1969-01-29 GB GB1233696D patent/GB1233696A/en not_active Expired
- 1969-01-30 DE DE19691904504 patent/DE1904504A1/de not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
FR1597089A (es) | 1970-06-22 |
GB1233696A (es) | 1971-05-26 |
US3558222A (en) | 1971-01-26 |
DE1904504A1 (de) | 1969-08-28 |
NL6818181A (es) | 1969-08-08 |