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Publication of BE710028ApublicationCriticalpatent/BE710028A/xx
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F7/004—Photosensitive materials
G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
C—CHEMISTRY; METALLURGY
C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
C08F8/00—Chemical modification by after-treatment
C—CHEMISTRY; METALLURGY
C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
C08F8/00—Chemical modification by after-treatment
C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
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Chemical & Material Sciences
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General Chemical & Material Sciences
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Health & Medical Sciences
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Chemical Kinetics & Catalysis
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Medicinal Chemistry
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Polymers & Plastics
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Organic Chemistry
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Physics & Mathematics
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Spectroscopy & Molecular Physics
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General Physics & Mathematics
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Compositions Of Macromolecular Compounds
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Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications
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