BE642103A - - Google Patents

Info

Publication number
BE642103A
BE642103A BE642103A BE642103A BE642103A BE 642103 A BE642103 A BE 642103A BE 642103 A BE642103 A BE 642103A BE 642103 A BE642103 A BE 642103A BE 642103 A BE642103 A BE 642103A
Authority
BE
Belgium
Application number
BE642103A
Inventor
Thorndike C New
Robert W Dolan
Original Assignee
Westinghouse Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Westinghouse Electric Corp filed Critical Westinghouse Electric Corp
Publication of BE642103A publication Critical patent/BE642103A/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/36Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the concentration or distribution of impurities in the bulk material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/16Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
    • H01L29/167Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table further characterised by the doping material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/20Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
    • H01L29/207Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds further characterised by the doping material

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Thyristors (AREA)
BE642103A 1963-01-04 1964-01-03 BE642103A (US20110009641A1-20110113-C00256.png)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US249530A US3249831A (en) 1963-01-04 1963-01-04 Semiconductor controlled rectifiers with a p-n junction having a shallow impurity concentration gradient

Publications (1)

Publication Number Publication Date
BE642103A true BE642103A (US20110009641A1-20110113-C00256.png) 1964-05-04

Family

ID=22943874

Family Applications (1)

Application Number Title Priority Date Filing Date
BE642103A BE642103A (US20110009641A1-20110113-C00256.png) 1963-01-04 1964-01-03

Country Status (4)

Country Link
US (1) US3249831A (US20110009641A1-20110113-C00256.png)
BE (1) BE642103A (US20110009641A1-20110113-C00256.png)
FR (1) FR1378697A (US20110009641A1-20110113-C00256.png)
GB (1) GB1018399A (US20110009641A1-20110113-C00256.png)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3324359A (en) * 1963-09-30 1967-06-06 Gen Electric Four layer semiconductor switch with the third layer defining a continuous, uninterrupted internal junction
US3331000A (en) * 1963-10-18 1967-07-11 Gen Electric Gate turn off semiconductor switch having a composite gate region with different impurity concentrations
BR6462522D0 (pt) * 1963-10-28 1973-05-15 Rca Corp Dispositivos semicondutores e processo de fabrica-los
US3389024A (en) * 1964-05-12 1968-06-18 Licentia Gmbh Method of forming a semiconductor by diffusion through the use of a cobalt salt
GB1030670A (en) * 1964-12-02 1966-05-25 Standard Telephones Cables Ltd Semiconductor devices
US3341749A (en) * 1964-08-10 1967-09-12 Ass Elect Ind Four layer semiconductor devices with improved high voltage characteristics
US3354006A (en) * 1965-03-01 1967-11-21 Texas Instruments Inc Method of forming a diode by using a mask and diffusion
US3642544A (en) * 1965-08-02 1972-02-15 Ibm Method of fabricating solid-state devices
GB1158585A (en) * 1965-12-06 1969-07-16 Lucas Industries Ltd Gate Controlled Switches
US3475235A (en) * 1966-10-05 1969-10-28 Westinghouse Electric Corp Process for fabricating a semiconductor device
GB1209310A (en) * 1967-04-11 1970-10-21 Lucas Industries Ltd High voltage n-p-n transistors
US3879230A (en) * 1970-02-07 1975-04-22 Tokyo Shibaura Electric Co Semiconductor device diffusion source containing as impurities AS and P or B
NL162512C (nl) * 1970-02-07 1980-05-16 Tokyo Shibaura Electric Co Halfgeleiderinrichting en werkwijze voor de vervaar- diging ervan.
US3858238A (en) * 1970-02-07 1974-12-31 Tokyo Shibaura Electric Co Semiconductor devices containing as impurities as and p or b and the mehtod of manufacturing the same
DE2104752B2 (de) * 1971-02-02 1975-02-20 Philips Patentverwaltung Gmbh, 2000 Hamburg Verfahren zum Herstellen einer Halbleiter-Kapazitätsdiode
US3798084A (en) * 1972-08-11 1974-03-19 Ibm Simultaneous diffusion processing
US3793093A (en) * 1973-01-12 1974-02-19 Handotai Kenkyu Shinkokai Method for producing a semiconductor device having a very small deviation in lattice constant
DE2506102C3 (de) * 1975-02-13 1982-03-25 Siemens AG, 1000 Berlin und 8000 München Halbleitergleichrichter
JPS5942989B2 (ja) * 1977-01-24 1984-10-18 株式会社日立製作所 高耐圧半導体素子およびその製造方法
JPS5624972A (en) * 1979-08-07 1981-03-10 Mitsubishi Electric Corp Thyristor
IT1214808B (it) * 1984-12-20 1990-01-18 Ates Componenti Elettron Tico e semiconduttore processo per la formazione di uno strato sepolto e di una regione di collettore in un dispositivo monoli
US7833473B2 (en) * 2004-07-30 2010-11-16 General Electric Company Material for storage and production of hydrogen, and related methods and apparatus
JP2014236093A (ja) * 2013-05-31 2014-12-15 サンケン電気株式会社 シリコン系基板、半導体装置、及び、半導体装置の製造方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2811653A (en) * 1953-05-22 1957-10-29 Rca Corp Semiconductor devices
NL98710C (US20110009641A1-20110113-C00256.png) * 1954-02-27
US2936256A (en) * 1954-06-01 1960-05-10 Gen Electric Semiconductor devices
DE1012696B (de) * 1954-07-06 1957-07-25 Siemens Ag Halbleiteruebergang zwischen Zonen verschiedenen Leitungstypus und Verfahren zur Herstellung des UEberganges
NL204025A (US20110009641A1-20110113-C00256.png) * 1955-03-23
US2806983A (en) * 1956-06-01 1957-09-17 Gen Electric Remote base transistor
US2862840A (en) * 1956-09-26 1958-12-02 Gen Electric Semiconductor devices
US2981874A (en) * 1957-05-31 1961-04-25 Ibm High speed, high current transistor
US2959719A (en) * 1957-06-29 1960-11-08 Sony Corp Semiconductor device
US3065392A (en) * 1958-02-07 1962-11-20 Rca Corp Semiconductor devices
NL111773C (US20110009641A1-20110113-C00256.png) * 1958-08-07
US3043725A (en) * 1958-11-06 1962-07-10 Texas Instruments Inc Photo transistor
US3099591A (en) * 1958-12-15 1963-07-30 Shockley William Semiconductive device
US3025192A (en) * 1959-01-02 1962-03-13 Norton Co Silicon carbide crystals and processes and furnaces for making them
NL122784C (US20110009641A1-20110113-C00256.png) * 1959-04-15
US2993818A (en) * 1959-04-23 1961-07-25 Texas Instruments Inc Method for growing semiconductor crystals
US3070466A (en) * 1959-04-30 1962-12-25 Ibm Diffusion in semiconductor material
NL250955A (US20110009641A1-20110113-C00256.png) * 1959-08-05
DE1103389B (de) * 1959-10-14 1961-03-30 Siemens Ag Schaltanordnung mit einer Vierschichthalbleiteranordnung
US3124862A (en) * 1959-12-14 1964-03-17 Alloy double-diffused semiconductor

Also Published As

Publication number Publication date
GB1018399A (en) 1966-01-26
FR1378697A (fr) 1964-11-13
US3249831A (en) 1966-05-03

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