BE627302A - - Google Patents
Info
- Publication number
- BE627302A BE627302A BE627302DA BE627302A BE 627302 A BE627302 A BE 627302A BE 627302D A BE627302D A BE 627302DA BE 627302 A BE627302 A BE 627302A
- Authority
- BE
- Belgium
Links
Classifications
-
- H10P95/00—
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
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- H10P14/6334—
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- H10P14/6686—
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- H10P14/69215—
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- H10P14/6923—
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- H10P32/14—
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- H10P32/141—
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- H10P32/171—
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- H10P32/174—
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Formation Of Insulating Films (AREA)
- Weting (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US167341A US3200019A (en) | 1962-01-19 | 1962-01-19 | Method for making a semiconductor device |
| US420523A US3340445A (en) | 1962-01-19 | 1964-12-23 | Semiconductor devices having modifier-containing surface oxide layer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BE627302A true BE627302A (en:Method) |
Family
ID=26863069
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BE627302D BE627302A (en:Method) | 1962-01-19 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3340445A (en:Method) |
| BE (1) | BE627302A (en:Method) |
| DE (1) | DE1444520B2 (en:Method) |
| GB (1) | GB1013985A (en:Method) |
| NL (2) | NL141709B (en:Method) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1014830A (en) * | 1972-11-15 | 1977-08-02 | Klaus C. Wiemer | Method of forming doped dielectric layers utilizing reactive plasma deposition |
| EP0030798B1 (en) * | 1979-12-17 | 1983-12-28 | Hughes Aircraft Company | Low temperature process for depositing oxide layers by photochemical vapor deposition |
| DE102008019402A1 (de) | 2008-04-14 | 2009-10-15 | Gebr. Schmid Gmbh & Co. | Verfahren zur selektiven Dotierung von Silizium sowie damit behandeltes Silizium-Substrat |
| DE102009041546A1 (de) * | 2009-03-27 | 2010-10-14 | Bosch Solar Energy Ag | Verfahren zur Herstellung von Solarzellen mit selektivem Emitter |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL189769C (nl) * | 1953-12-30 | Amp Akzo Corp | Werkwijze voor het handhaven van badoplossingen voor het stroomloos afzetten van koper op substraatplaten in inrichtingen uit metaal. | |
| US3145328A (en) * | 1957-04-29 | 1964-08-18 | Raytheon Co | Methods of preventing channel formation on semiconductive bodies |
| US2989424A (en) * | 1958-03-31 | 1961-06-20 | Westinghouse Electric Corp | Method of providing an oxide protective coating for semiconductors |
| US2899344A (en) * | 1958-04-30 | 1959-08-11 | Rinse in | |
| US3001896A (en) * | 1958-12-24 | 1961-09-26 | Ibm | Diffusion control in germanium |
| US3040218A (en) * | 1959-03-10 | 1962-06-19 | Hoffman Electronics Corp | Constant current devices |
| US3070466A (en) * | 1959-04-30 | 1962-12-25 | Ibm | Diffusion in semiconductor material |
| US2981877A (en) * | 1959-07-30 | 1961-04-25 | Fairchild Semiconductor | Semiconductor device-and-lead structure |
| US3085033A (en) * | 1960-03-08 | 1963-04-09 | Bell Telephone Labor Inc | Fabrication of semiconductor devices |
-
0
- NL NL287925D patent/NL287925A/xx unknown
- BE BE627302D patent/BE627302A/xx unknown
-
1962
- 1962-12-21 GB GB48391/62A patent/GB1013985A/en not_active Expired
-
1963
- 1963-01-11 DE DE19631444520 patent/DE1444520B2/de active Pending
- 1963-01-18 NL NL63287925A patent/NL141709B/xx unknown
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1964
- 1964-12-23 US US420523A patent/US3340445A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| NL141709B (nl) | 1974-03-15 |
| GB1013985A (en) | 1965-12-22 |
| DE1444520B2 (de) | 1971-06-16 |
| NL287925A (en:Method) | |
| DE1444520A1 (de) | 1968-11-07 |
| US3340445A (en) | 1967-09-05 |