BE599102A - - Google Patents

Info

Publication number
BE599102A
BE599102A BE599102DA BE599102A BE 599102 A BE599102 A BE 599102A BE 599102D A BE599102D A BE 599102DA BE 599102 A BE599102 A BE 599102A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of BE599102A publication Critical patent/BE599102A/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/112Cellulosic
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/117Free radical
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/118Initiator containing with inhibitor or stabilizer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
BE599102D 1960-01-27 BE599102A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US4856A US3036915A (en) 1960-01-27 1960-01-27 Photopolymerizable compositions and elements

Publications (1)

Publication Number Publication Date
BE599102A true BE599102A (ja)

Family

ID=21712858

Family Applications (1)

Application Number Title Priority Date Filing Date
BE599102D BE599102A (ja) 1960-01-27

Country Status (4)

Country Link
US (1) US3036915A (ja)
BE (1) BE599102A (ja)
FR (1) FR1286749A (ja)
GB (1) GB913965A (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE592557A (ja) * 1959-07-01
BE604100A (ja) * 1960-06-03
US3376138A (en) * 1963-12-09 1968-04-02 Gilano Michael Nicholas Photosensitive prepolymer composition and method
US3376139A (en) * 1966-02-01 1968-04-02 Gilano Michael Nicholas Photosensitive prepolymer composition and method
US4001015A (en) * 1970-10-09 1977-01-04 Badische Anilin- & Soda-Fabrik Aktiengesellschaft Method for the production of printing plates using photosensitive compositions
JPS5555344A (en) * 1978-10-20 1980-04-23 Toray Ind Inc Lithographic printing plate
GB8709050D0 (en) * 1987-04-15 1987-05-20 Autotype Int Ltd Negative-working photoresists
JP3362797B2 (ja) 1993-04-30 2003-01-07 東洋紡績株式会社 印刷原版用感光性樹脂積層体
WO1997026586A1 (en) * 1996-01-12 1997-07-24 M.A. Hanna Company Composition for the manufacture of flexographic printing plates
US6413699B1 (en) 1999-10-11 2002-07-02 Macdermid Graphic Arts, Inc. UV-absorbing support layers and flexographic printing elements comprising same
US7507525B2 (en) * 2005-05-10 2009-03-24 Fujifilm Corporation Polymerizable composition and lithographic printing plate precursor
US7592790B2 (en) * 2006-04-19 2009-09-22 System General Corp. Start-up circuit with feedforward compensation for power converters

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2757089A (en) * 1954-01-05 1956-07-31 Du Pont Phytic acid sensitizer for silver halide emulsions
NL219906A (ja) * 1956-08-14
US2927023A (en) * 1956-08-27 1960-03-01 Du Pont Photopolymerizable compositions

Also Published As

Publication number Publication date
FR1286749A (fr) 1962-03-09
US3036915A (en) 1962-05-29
GB913965A (en) 1962-12-28

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