BE586561A - Couches de reproduction pour formes d'impression. - Google Patents

Couches de reproduction pour formes d'impression.

Info

Publication number
BE586561A
BE586561A BE586561A BE586561A BE586561A BE 586561 A BE586561 A BE 586561A BE 586561 A BE586561 A BE 586561A BE 586561 A BE586561 A BE 586561A BE 586561 A BE586561 A BE 586561A
Authority
BE
Belgium
Prior art keywords
printing forms
reproduction layers
reproduction
layers
printing
Prior art date
Application number
BE586561A
Other languages
English (en)
French (fr)
Original Assignee
Kalle Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle Ag filed Critical Kalle Ag
Publication of BE586561A publication Critical patent/BE586561A/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
BE586561A 1959-01-17 1960-01-14 Couches de reproduction pour formes d'impression. BE586561A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK36749A DE1120273B (de) 1959-01-17 1959-01-17 Lichtempfindliche Schichten fuer die photomechanische Herstellung von Druckformen

Publications (1)

Publication Number Publication Date
BE586561A true BE586561A (fr) 1960-07-14

Family

ID=7220787

Family Applications (1)

Application Number Title Priority Date Filing Date
BE586561A BE586561A (fr) 1959-01-17 1960-01-14 Couches de reproduction pour formes d'impression.

Country Status (8)

Country Link
US (1) US3130048A (US08088918-20120103-C00476.png)
BE (1) BE586561A (US08088918-20120103-C00476.png)
CH (1) CH383775A (US08088918-20120103-C00476.png)
DE (1) DE1120273B (US08088918-20120103-C00476.png)
FR (1) FR1252857A (US08088918-20120103-C00476.png)
GB (1) GB935452A (US08088918-20120103-C00476.png)
NL (2) NL129162C (US08088918-20120103-C00476.png)
SE (1) SE303093B (US08088918-20120103-C00476.png)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL130926C (US08088918-20120103-C00476.png) * 1959-09-04
GB1053866A (US08088918-20120103-C00476.png) * 1964-08-05
US3479182A (en) * 1965-05-12 1969-11-18 Simon L Chu Lithographic plates
GB1113759A (en) * 1965-12-17 1968-05-15 Fuji Photo Film Co Ltd Lithographic printing plates
US3647443A (en) * 1969-09-12 1972-03-07 Eastman Kodak Co Light-sensitive quinone diazide polymers and polymer compositions
US3920455A (en) * 1971-05-28 1975-11-18 Polychrome Corp Light-sensitive compositions and materials with O-naphthoquinone diazide sulfonyl esters
US4005437A (en) * 1975-04-18 1977-01-25 Rca Corporation Method of recording information in which the electron beam sensitive material contains 4,4'-bis(3-diazo-3-4-oxo-1-naphthalene sulfonyloxy)benzil
US4174222A (en) * 1975-05-24 1979-11-13 Tokyo Ohka Kogyo Kabushiki Kaisha Positive-type O-quinone diazide containing photoresist compositions
DE2742631A1 (de) * 1977-09-22 1979-04-05 Hoechst Ag Lichtempfindliche kopiermasse
DE3039926A1 (de) * 1980-10-23 1982-05-27 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial
DE3107109A1 (de) * 1981-02-26 1982-09-09 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial
US4587196A (en) * 1981-06-22 1986-05-06 Philip A. Hunt Chemical Corporation Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide
US4529682A (en) * 1981-06-22 1985-07-16 Philip A. Hunt Chemical Corporation Positive photoresist composition with cresol-formaldehyde novolak resins
US4377631A (en) * 1981-06-22 1983-03-22 Philip A. Hunt Chemical Corporation Positive novolak photoresist compositions
US4622283A (en) * 1983-10-07 1986-11-11 J. T. Baker Chemical Company Deep ultra-violet lithographic resist composition and process of using
IT1169682B (it) * 1983-11-08 1987-06-03 I M G Ind Materiali Grafici Sp Composizione per fotoriproduzioni
US4624908A (en) * 1985-04-15 1986-11-25 J. T. Baker Chemical Company Deep ultra-violet lithographic resist composition and process of using
DE3629122A1 (de) * 1986-08-27 1988-03-10 Hoechst Ag Verfahren zur herstellung eines o-naphthochinondiazidsulfonsaeureesters und diesen enthaltendes lichtempfindliches gemisch
DE3635303A1 (de) 1986-10-17 1988-04-28 Hoechst Ag Verfahren zur abtragenden modifizierung von mehrstufig aufgerauhten traegermaterialien aus aluminium oder dessen legierungen und deren verwendung bei der herstellung von offsetdruckplatten
JP2560266B2 (ja) * 1987-03-25 1996-12-04 日本合成ゴム株式会社 感放射線性樹脂組成物
DE3718416A1 (de) * 1987-06-02 1988-12-15 Hoechst Ag Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden, daraus hergestelltes aufzeichnungsmaterial und dessen verwendung
DE3729035A1 (de) * 1987-08-31 1989-03-09 Hoechst Ag Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes photolithographisches aufzeichnungsmaterial
DE4134526A1 (de) * 1990-10-18 1992-05-14 Toyo Gosei Kogyo Kk Positive photoresist-zusammensetzung und mustererzeugungsverfahren unter verwendung dieser zusammensetzung
US5362599A (en) * 1991-11-14 1994-11-08 International Business Machines Corporations Fast diazoquinone positive resists comprising mixed esters of 4-sulfonate and 5-sulfonate compounds
GB9326150D0 (en) * 1993-12-22 1994-02-23 Alcan Int Ltd Electrochemical roughening method
JP3278306B2 (ja) 1994-10-31 2002-04-30 富士写真フイルム株式会社 ポジ型フォトレジスト組成物
JP2007246417A (ja) 2006-03-14 2007-09-27 Canon Inc 感光性シランカップリング剤、表面修飾方法、パターン形成方法およびデバイスの製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB537696A (en) * 1940-01-03 1941-07-02 Kodak Ltd Improvements in and relating to colour-forming development and colour photographic elements
BE497135A (US08088918-20120103-C00476.png) * 1949-07-23
BE508016A (US08088918-20120103-C00476.png) * 1950-12-23
BE526866A (US08088918-20120103-C00476.png) * 1953-03-11

Also Published As

Publication number Publication date
NL129162C (US08088918-20120103-C00476.png)
SE303093B (US08088918-20120103-C00476.png) 1968-08-12
FR1252857A (fr) 1961-02-03
CH383775A (de) 1964-10-31
GB935452A (en) 1963-08-28
DE1120273B (de) 1961-12-21
NL247406A (US08088918-20120103-C00476.png)
US3130048A (en) 1964-04-21

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