BE569763A - - Google Patents
Info
- Publication number
- BE569763A BE569763A BE569763DA BE569763A BE 569763 A BE569763 A BE 569763A BE 569763D A BE569763D A BE 569763DA BE 569763 A BE569763 A BE 569763A
- Authority
- BE
- Belgium
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Phenolic Resins Or Amino Resins (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEK32598A DE1053930B (de) | 1957-08-01 | 1957-08-01 | Lichtempfindliches Material fuer die Herstellung von Druckplatten auf photomechanischem Wege |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BE569763A true BE569763A (US07122603-20061017-C00045.png) |
Family
ID=7219491
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BE569763D BE569763A (US07122603-20061017-C00045.png) | 1957-08-01 |
Country Status (8)
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0388484A1 (de) * | 1989-03-20 | 1990-09-26 | Siemens Aktiengesellschaft | Hochauflösender Photoresist |
| EP0388483A1 (de) * | 1989-03-20 | 1990-09-26 | Siemens Aktiengesellschaft | Verfahren zum Erzeugen einer Photoresiststruktur |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE593423A (US07122603-20061017-C00045.png) * | 1959-07-29 | |||
| NL130926C (US07122603-20061017-C00045.png) * | 1959-09-04 | |||
| US3149972A (en) * | 1960-08-16 | 1964-09-22 | Gen Aniline & Film Corp | Diazo and resinous coupler printing plates for photomechanical reproduction |
| NL132291C (US07122603-20061017-C00045.png) * | 1961-01-25 | |||
| BE620660A (US07122603-20061017-C00045.png) * | 1961-07-28 | |||
| DE3107109A1 (de) * | 1981-02-26 | 1982-09-09 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial |
| US4564575A (en) * | 1984-01-30 | 1986-01-14 | International Business Machines Corporation | Tailoring of novolak and diazoquinone positive resists by acylation of novolak |
| US5212042A (en) * | 1989-08-22 | 1993-05-18 | Fuji Photo Film Co., Ltd. | Positive type light-sensitive composition |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1981102A (en) * | 1932-08-10 | 1934-11-20 | Agfa Ansco Corp | Photographic material and process of making the same |
| CH307356A (de) * | 1951-08-08 | 1955-05-31 | Kalle & Co Ag | Lichtempfindliches Material für die photomechanische Reproduktion. |
| US2754209A (en) * | 1952-06-10 | 1956-07-10 | Azoplate Corp | Light-sensitive para quinone diazides for making printing plates |
| DE1003576B (de) * | 1955-02-25 | 1957-02-28 | Kalle & Co Ag | Aus Schichttraeger und lichtempfindlicher, wasserloeslicher oder wasserquellbarer Kolloidschicht bestehendes Material fuer die Herstellung von Gerbbildern |
| NL94867C (US07122603-20061017-C00045.png) * | 1955-02-25 |
-
0
- NL NL230099D patent/NL230099A/xx unknown
- NL NL103895D patent/NL103895C/xx active
- BE BE569763D patent/BE569763A/xx unknown
-
1957
- 1957-08-01 DE DEK32598A patent/DE1053930B/de active Pending
-
1958
- 1958-07-14 CH CH6171958A patent/CH370967A/de unknown
- 1958-07-22 SE SE6910/58A patent/SE310842B/xx unknown
- 1958-07-28 FR FR1210042D patent/FR1210042A/fr not_active Expired
- 1958-07-28 GB GB24189/58A patent/GB836341A/en not_active Expired
- 1958-07-28 US US751112A patent/US3050387A/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0388484A1 (de) * | 1989-03-20 | 1990-09-26 | Siemens Aktiengesellschaft | Hochauflösender Photoresist |
| EP0388483A1 (de) * | 1989-03-20 | 1990-09-26 | Siemens Aktiengesellschaft | Verfahren zum Erzeugen einer Photoresiststruktur |
Also Published As
| Publication number | Publication date |
|---|---|
| US3050387A (en) | 1962-08-21 |
| CH370967A (de) | 1963-07-31 |
| NL230099A (US07122603-20061017-C00045.png) | |
| NL103895C (US07122603-20061017-C00045.png) | |
| GB836341A (en) | 1960-06-01 |
| FR1210042A (fr) | 1960-03-04 |
| DE1053930B (de) | 1959-03-26 |
| SE310842B (US07122603-20061017-C00045.png) | 1969-05-12 |
