BE440927A - - Google Patents
Info
- Publication number
- BE440927A BE440927A BE440927DA BE440927A BE 440927 A BE440927 A BE 440927A BE 440927D A BE440927D A BE 440927DA BE 440927 A BE440927 A BE 440927A
- Authority
- BE
- Belgium
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/10—Lenses
- H01J37/12—Lenses electrostatic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/58—Arrangements for focusing or reflecting ray or beam
- H01J29/62—Electrostatic lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/10—Lenses
- H01J2237/12—Lenses electrostatic
- H01J2237/1205—Microlenses
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2313018X | 1940-05-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
BE440927A true BE440927A (it) |
Family
ID=7994521
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE440927D BE440927A (it) | 1940-05-08 |
Country Status (2)
Country | Link |
---|---|
US (1) | US2313018A (it) |
BE (1) | BE440927A (it) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR964837A (it) * | 1942-12-01 | 1950-08-25 | ||
US2421234A (en) * | 1944-08-31 | 1947-05-27 | Gen Electric | Electron lens assembly |
FR926604A (fr) * | 1946-03-12 | 1947-10-07 | Csf | Perfectionnements aux lentilles électrostatiques indépendantes |
US2455992A (en) * | 1947-01-25 | 1948-12-14 | Du Mont Allen B Lab Inc | Cathode-ray tube amusement device |
US2740913A (en) * | 1951-11-01 | 1956-04-03 | Itt | Electron gun |
US2845571A (en) * | 1953-04-17 | 1958-07-29 | Kazan Benjamin | Electrostatically focused traveling wave tube |
NL185815B (nl) * | 1954-03-11 | Bayer Ag | Werkwijze voor het bestrijden van micro-organismen alsmede gevormd voortbrengsel, geheel of ten dele bestaande uit materiaal, dat volgens deze werkwijze behandeld is. | |
US2925496A (en) * | 1954-10-20 | 1960-02-16 | Swift & Co | Apparatus for obtaining substantially uniform irradiation from a nonuni form source |
US3143681A (en) * | 1959-12-07 | 1964-08-04 | Gen Electric | Spiral electrostatic electron lens |
US3188465A (en) * | 1959-12-29 | 1965-06-08 | Kabushikikaisha Nihondenshi Ka | Two stage electron beam magnification device comprising plural adjustable magnetic lens system |
US4096386A (en) * | 1977-04-04 | 1978-06-20 | Taylor-Kincaid Company | Light reflecting electrostatic electron lens |
US4126781A (en) * | 1977-05-10 | 1978-11-21 | Extranuclear Laboratories, Inc. | Method and apparatus for producing electrostatic fields by surface currents on resistive materials with applications to charged particle optics and energy analysis |
US4370594A (en) * | 1978-11-29 | 1983-01-25 | Rca Corporation | Resistive lens structure for electron gun |
US4281270A (en) * | 1979-06-25 | 1981-07-28 | Rca Corporation | Precoated resistive lens structure for electron gun and method of fabrication |
FR2574978B1 (fr) * | 1984-12-14 | 1987-01-16 | Commissariat Energie Atomique | Dispositif d'irradiation de matiere par un faisceau electronique |
DE69633338T2 (de) * | 1996-11-19 | 2005-02-24 | Advantest Corp. | Elektrostatische Vorrichtung zur Einwirkung auf einen Korpuskularstrahl |
CN102598195B (zh) * | 2009-09-18 | 2015-09-16 | Fei公司 | 分布式离子源加速镜筒 |
WO2014068434A2 (en) * | 2012-10-31 | 2014-05-08 | Koninklijke Philips N.V. | Optical element with manipulated coating resistance |
-
0
- BE BE440927D patent/BE440927A/xx unknown
-
1940
- 1940-12-02 US US368271A patent/US2313018A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US2313018A (en) | 1943-03-02 |