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IT380674A
(US06521211-20030218-C00004.png)
*
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1939-02-22 |
|
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|
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US2463180A
(en)
*
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1943-04-29 |
1949-03-01 |
Bell Telephone Labor Inc |
Method and apparatus for making mosaic targets for electron beams
|
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US2724057A
(en)
*
|
1944-01-21 |
1955-11-15 |
Westinghouse Electric Corp |
Ionic centrifuge
|
|
US2428868A
(en)
*
|
1944-05-01 |
1947-10-14 |
Rca Corp |
Apparatus for producing hardened optical coatings by electron bombardment
|
|
US2420724A
(en)
*
|
1944-09-21 |
1947-05-20 |
Bausch & Lomb |
Method of depositing films of material
|
|
US2434930A
(en)
*
|
1944-12-01 |
1948-01-27 |
Bell Telephone Labor Inc |
Method and apparatus for ionic discharge coating
|
|
US2434931A
(en)
*
|
1944-12-01 |
1948-01-27 |
Bell Telephone Labor Inc |
Method and apparatus for ionic discharge coating
|
|
US2423051A
(en)
*
|
1945-09-05 |
1947-06-24 |
Ruben Samuel |
Selenium depositing machine
|
|
US2527747A
(en)
*
|
1946-01-03 |
1950-10-31 |
Margaret N Lewis |
Apparatus for coating articles by thermal evaporation
|
|
US2562358A
(en)
*
|
1946-02-21 |
1951-07-31 |
William C Huebner |
Apparatus for making sheet or web material
|
|
US2615822A
(en)
*
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1946-02-21 |
1952-10-28 |
William C Huebner |
Method of making sheet or web material
|
|
US2702523A
(en)
*
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1947-06-09 |
1955-02-22 |
Rene J Prestwood |
Apparatus for vapor coating base material in powder form
|
|
US2577894A
(en)
*
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1948-01-16 |
1951-12-11 |
Carlyle W Jacob |
Electronic signal recording system and apparatus
|
|
US2600129A
(en)
*
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1948-07-17 |
1952-06-10 |
Charles H Richards |
Apparatus for producing a stream of electrically charged multimolecular particles
|
|
US2584660A
(en)
*
|
1949-09-24 |
1952-02-05 |
Eastman Kodak Co |
Vacuum coating process and apparatus therefor
|
|
CH311812A
(de)
*
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1951-11-05 |
1955-12-15 |
Zeiss Carl Fa |
Aufdampfeinrichtung.
|
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US2753800A
(en)
*
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1952-03-24 |
1956-07-10 |
Ohio Commw Eng Co |
Production of printing plates
|
|
US2932588A
(en)
*
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1955-07-06 |
1960-04-12 |
English Electric Valve Co Ltd |
Methods of manufacturing thin films of refractory dielectric materials
|
|
US2996418A
(en)
*
|
1957-06-05 |
1961-08-15 |
Gen Motors Corp |
Method and apparatus for vapor depositing thin films
|
|
US3071533A
(en)
*
|
1958-09-11 |
1963-01-01 |
Varo Mfg Co Inc |
Deposition control means
|
|
US3277865A
(en)
*
|
1963-04-01 |
1966-10-11 |
United States Steel Corp |
Metal-vapor source with heated reflecting shield
|
|
US3305473A
(en)
*
|
1964-08-20 |
1967-02-21 |
Cons Vacuum Corp |
Triode sputtering apparatus for depositing uniform coatings
|
|
US3419487A
(en)
*
|
1966-01-24 |
1968-12-31 |
Dow Corning |
Method of growing thin film semiconductors using an electron beam
|
|
US3492215A
(en)
*
|
1967-02-27 |
1970-01-27 |
Bendix Corp |
Sputtering of material simultaneously evaporated onto the target
|
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US3491015A
(en)
*
|
1967-04-04 |
1970-01-20 |
Automatic Fire Control Inc |
Method of depositing elemental material from a low pressure electrical discharge
|
|
US3625848A
(en)
*
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1968-12-26 |
1971-12-07 |
Alvin A Snaper |
Arc deposition process and apparatus
|
|
US3684268A
(en)
*
|
1970-04-17 |
1972-08-15 |
Optical Coating Laboratory Inc |
Source for evaporating materials
|
|
US3913520A
(en)
*
|
1972-08-14 |
1975-10-21 |
Precision Thin Film Corp |
High vacuum deposition apparatus
|
|
US4176311A
(en)
*
|
1976-12-23 |
1979-11-27 |
General Electric Company |
Positive ion smoke detector using a tungsten wire preheated in hydrogen to increase sensitivity
|
|
US4351855A
(en)
*
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1981-02-24 |
1982-09-28 |
Eduard Pinkhasov |
Noncrucible method of and apparatus for the vapor deposition of material upon a substrate using voltaic arc in vacuum
|
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DE3842919C2
(de)
*
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1988-12-21 |
1995-04-27 |
Calor Emag Elektrizitaets Ag |
Schaltstück für einen Vakuumschalter
|
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CA2065581C
(en)
*
|
1991-04-22 |
2002-03-12 |
Andal Corp. |
Plasma enhancement apparatus and method for physical vapor deposition
|
|
KR100754404B1
(ko)
*
|
2006-05-25 |
2007-08-31 |
삼성전자주식회사 |
확산튜브와, 확산공정용 도펀트 소스 및 상기 확산튜브와도펀트 소스를 이용한 확산방법
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US20120090544A1
(en)
*
|
2010-10-18 |
2012-04-19 |
Kim Mu-Gyeom |
Thin film deposition apparatus for continuous deposition, and mask unit and crucible unit included in thin film deposition apparatus
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KR101207719B1
(ko)
*
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2010-12-27 |
2012-12-03 |
주식회사 포스코 |
건식 코팅 장치
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