AU8777598A - Apparatus and method for processing an object - Google Patents
Apparatus and method for processing an objectInfo
- Publication number
- AU8777598A AU8777598A AU87775/98A AU8777598A AU8777598A AU 8777598 A AU8777598 A AU 8777598A AU 87775/98 A AU87775/98 A AU 87775/98A AU 8777598 A AU8777598 A AU 8777598A AU 8777598 A AU8777598 A AU 8777598A
- Authority
- AU
- Australia
- Prior art keywords
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
- H01L21/67086—Apparatus for fluid treatment for etching for wet etching with the semiconductor substrates being dipped in baths or vessels
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US90798197A | 1997-08-11 | 1997-08-11 | |
US08907981 | 1997-08-11 | ||
US12463298A | 1998-07-29 | 1998-07-29 | |
US09124632 | 1998-07-29 | ||
PCT/US1998/016586 WO1999008313A1 (en) | 1997-08-11 | 1998-08-10 | Apparatus and method for processing an object |
Publications (1)
Publication Number | Publication Date |
---|---|
AU8777598A true AU8777598A (en) | 1999-03-01 |
Family
ID=26822791
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU87775/98A Abandoned AU8777598A (en) | 1997-08-11 | 1998-08-10 | Apparatus and method for processing an object |
Country Status (2)
Country | Link |
---|---|
AU (1) | AU8777598A (en) |
WO (1) | WO1999008313A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6564469B2 (en) * | 2001-07-09 | 2003-05-20 | Motorola, Inc. | Device for performing surface treatment on semiconductor wafers |
JP4330959B2 (en) * | 2003-09-05 | 2009-09-16 | 株式会社東芝 | Semiconductor substrate cleaning method and cleaning apparatus, semiconductor substrate, and semiconductor device |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR0163362B1 (en) * | 1992-03-05 | 1999-02-01 | 이노우에 아키라 | Treatment bath for cleaning apparatus |
US5520205A (en) * | 1994-07-01 | 1996-05-28 | Texas Instruments Incorporated | Apparatus for wafer cleaning with rotation |
DE19541436C2 (en) * | 1995-11-07 | 1998-10-08 | Steag Micro Tech Gmbh | Plant for the treatment of objects in a process tank |
-
1998
- 1998-08-10 AU AU87775/98A patent/AU8777598A/en not_active Abandoned
- 1998-08-10 WO PCT/US1998/016586 patent/WO1999008313A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO1999008313A1 (en) | 1999-02-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |