AU8433575A - Method for making an etch-resistant stencil - Google Patents

Method for making an etch-resistant stencil

Info

Publication number
AU8433575A
AU8433575A AU84335/75A AU8433575A AU8433575A AU 8433575 A AU8433575 A AU 8433575A AU 84335/75 A AU84335/75 A AU 84335/75A AU 8433575 A AU8433575 A AU 8433575A AU 8433575 A AU8433575 A AU 8433575A
Authority
AU
Australia
Prior art keywords
etch
making
resistant stencil
stencil
resistant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
AU84335/75A
Other versions
AU491810B2 (en
Inventor
John Piascinski Ernest Edwin Dereschuk Joseph Iii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RCA Corp
Original Assignee
RCA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RCA Corp filed Critical RCA Corp
Application granted granted Critical
Publication of AU8433575A publication Critical patent/AU8433575A/en
Publication of AU491810B2 publication Critical patent/AU491810B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • ing And Chemical Polishing (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
AU84335/75A 1974-09-12 1975-08-27 Method for making an etch-resistant stencil Expired AU491810B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US50551174A 1974-09-12 1974-09-12
USUS505511 1974-09-12

Publications (2)

Publication Number Publication Date
AU8433575A true AU8433575A (en) 1977-03-24
AU491810B2 AU491810B2 (en) 1977-03-24

Family

ID=

Also Published As

Publication number Publication date
SU1175370A3 (en) 1985-08-23
GB1483307A (en) 1977-08-17
FR2284901A1 (en) 1976-04-09
DE2540562C2 (en) 1986-05-15
NL7510713A (en) 1976-03-16
BE833387A (en) 1975-12-31
FR2284901B1 (en) 1981-09-25
IT1042491B (en) 1980-01-30
ES440747A1 (en) 1977-04-01
DE2540562A1 (en) 1976-04-01
JPS5429297B2 (en) 1979-09-21
JPS5154766A (en) 1976-05-14
CA1061161A (en) 1979-08-28
ZA755685B (en) 1976-08-25

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