AU8355698A - Focusing method, exposure method, and aligner - Google Patents

Focusing method, exposure method, and aligner

Info

Publication number
AU8355698A
AU8355698A AU83556/98A AU8355698A AU8355698A AU 8355698 A AU8355698 A AU 8355698A AU 83556/98 A AU83556/98 A AU 83556/98A AU 8355698 A AU8355698 A AU 8355698A AU 8355698 A AU8355698 A AU 8355698A
Authority
AU
Australia
Prior art keywords
aligner
focusing
exposure
exposure method
focusing method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU83556/98A
Inventor
Yuji Imai
Masayuki Murayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU8355698A publication Critical patent/AU8355698A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU83556/98A 1997-07-22 1998-07-22 Focusing method, exposure method, and aligner Abandoned AU8355698A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP21138297 1997-07-22
JP9-211382 1997-07-22
PCT/JP1998/003259 WO1999005707A1 (en) 1997-07-22 1998-07-22 Focusing method, exposure method, and aligner

Publications (1)

Publication Number Publication Date
AU8355698A true AU8355698A (en) 1999-02-16

Family

ID=16605046

Family Applications (1)

Application Number Title Priority Date Filing Date
AU83556/98A Abandoned AU8355698A (en) 1997-07-22 1998-07-22 Focusing method, exposure method, and aligner

Country Status (2)

Country Link
AU (1) AU8355698A (en)
WO (1) WO1999005707A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003168641A (en) * 2001-12-03 2003-06-13 Mitsubishi Electric Corp Method of manufacturing semiconductor device capable of managing exposure condition and semiconductor device manufactured thereby

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3453818B2 (en) * 1993-11-08 2003-10-06 株式会社ニコン Apparatus and method for detecting height position of substrate
JP3520881B2 (en) * 1995-07-03 2004-04-19 株式会社ニコン Exposure equipment
JP3269343B2 (en) * 1995-07-26 2002-03-25 キヤノン株式会社 Best focus determination method and exposure condition determination method using the same

Also Published As

Publication number Publication date
WO1999005707A1 (en) 1999-02-04

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