AU7049698A - (e.g. ink or varnish) composition polymerisable and/or crosslinkable under radiation exposure by cationic and/or radical process, with an organic matrix base, of a diluent and a photoinitiator - Google Patents

(e.g. ink or varnish) composition polymerisable and/or crosslinkable under radiation exposure by cationic and/or radical process, with an organic matrix base, of a diluent and a photoinitiator

Info

Publication number
AU7049698A
AU7049698A AU70496/98A AU7049698A AU7049698A AU 7049698 A AU7049698 A AU 7049698A AU 70496/98 A AU70496/98 A AU 70496/98A AU 7049698 A AU7049698 A AU 7049698A AU 7049698 A AU7049698 A AU 7049698A
Authority
AU
Australia
Prior art keywords
photoinitiator
varnish
diluent
cationic
ink
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU70496/98A
Inventor
Stefan Breunig
Jean-Marc Frances
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rhodia Chimie SAS
Original Assignee
Rhodia Chimie SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rhodia Chimie SAS filed Critical Rhodia Chimie SAS
Publication of AU7049698A publication Critical patent/AU7049698A/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22—Di-epoxy compounds
    • C08G59/24—Di-epoxy compounds carbocyclic
    • C08G59/245—Di-epoxy compounds carbocyclic aromatic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Wood Science & Technology (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Epoxy Resins (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Paints Or Removers (AREA)
AU70496/98A 1997-03-25 1998-03-20 (e.g. ink or varnish) composition polymerisable and/or crosslinkable under radiation exposure by cationic and/or radical process, with an organic matrix base, of a diluent and a photoinitiator Abandoned AU7049698A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR9703916 1997-03-25
FR9703916A FR2761368B1 (en) 1997-03-25 1997-03-25 COMPOSITION (E.G. INK OR VARNISH) POLYMERIZABLE AND / OR CROSSLINKABLE BY CATIONIC AND / OR RADICAL ARRAY, BASED ON ORGANIC MATRIX, SILICONE DILUENT AND PHOTO-PRIMER
PCT/FR1998/000566 WO1998043134A1 (en) 1997-03-25 1998-03-20 (e.g. ink or varnish) composition polymerisable and/or crosslinkable under radiation exposure by cationic and/or radical process, with an organic matrix base, of a diluent and a photoinitiator

Publications (1)

Publication Number Publication Date
AU7049698A true AU7049698A (en) 1998-10-20

Family

ID=9505365

Family Applications (1)

Application Number Title Priority Date Filing Date
AU70496/98A Abandoned AU7049698A (en) 1997-03-25 1998-03-20 (e.g. ink or varnish) composition polymerisable and/or crosslinkable under radiation exposure by cationic and/or radical process, with an organic matrix base, of a diluent and a photoinitiator

Country Status (4)

Country Link
EP (1) EP0970405A1 (en)
AU (1) AU7049698A (en)
FR (1) FR2761368B1 (en)
WO (1) WO1998043134A1 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4553442B2 (en) * 2000-03-09 2010-09-29 日立化成工業株式会社 Bissulfonium borate compound and process for producing the same
US6918984B2 (en) 2002-06-24 2005-07-19 Loctite (R&D) Limited Photocurable adhesive compositions, reaction products of which have low halide ion content
FR2849446B1 (en) * 2002-12-26 2006-07-28 Rhodia Chimie Sa ANTI-SOIL VARNISH, METHOD OF APPLYING THE VARNISH TO A SILICONE SUPPORT AND SUPPORT THUS PROCESSED
FR2904321B1 (en) * 2006-07-25 2008-09-05 Rhodia Recherches Et Technologies Sas POLYMERIZABLE AND / OR CROSS-LINKABLE COMPOSITION UNDER CATIONIC AND / OR RADICAL IRRADIATION
JP5254632B2 (en) * 2008-02-07 2013-08-07 富士フイルム株式会社 Ink composition, inkjet recording method, printed matter, and molded printed matter
US8309633B2 (en) 2008-07-17 2012-11-13 Henkel Ireland Ltd. Low temperature, cationically curable compositions with improved cure speed and toughness
DE102019123000A1 (en) 2019-08-27 2021-03-04 Ferro Gmbh Printing substance for coating glass surfaces
CN113980245B (en) * 2021-12-01 2023-12-29 福建蓝海黑石新材料科技有限公司 Lemon alkenyl silicon-containing cycloaliphatic epoxy resin and preparation and application methods thereof

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4547431A (en) * 1983-06-20 1985-10-15 General Electric Company Ultraviolet radiation-curable silicone controlled release compositions
CA2008848A1 (en) * 1989-03-30 1990-09-30 Karen D. Riding Epoxysiloxane cure promoters and accelerators for cationic uv cure systems
US5229251A (en) * 1991-04-29 1993-07-20 International Business Machines Corp. Dry developable photoresist containing an epoxide, organosilicon and onium salt
US5217805A (en) * 1991-10-15 1993-06-08 Minnesota Mining And Manufacturing Company Uv-curable silicon release compositions
EP0624827A1 (en) * 1993-05-12 1994-11-17 Ciba-Geigy Ag Method of making micropatterns
JPH08301954A (en) * 1995-04-28 1996-11-19 Toray Dow Corning Silicone Co Ltd Curable release agent composition

Also Published As

Publication number Publication date
FR2761368A1 (en) 1998-10-02
EP0970405A1 (en) 2000-01-12
FR2761368B1 (en) 2005-10-21
WO1998043134A1 (en) 1998-10-01

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