AU6549294A - Method and apparatus for monitoring layer processing - Google Patents

Method and apparatus for monitoring layer processing

Info

Publication number
AU6549294A
AU6549294A AU65492/94A AU6549294A AU6549294A AU 6549294 A AU6549294 A AU 6549294A AU 65492/94 A AU65492/94 A AU 65492/94A AU 6549294 A AU6549294 A AU 6549294A AU 6549294 A AU6549294 A AU 6549294A
Authority
AU
Australia
Prior art keywords
layer processing
monitoring layer
monitoring
processing
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU65492/94A
Inventor
Robert M Carangelo
David G Hamblen
Philip W Morrison
Peter R Solomon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
On Line Technologies Inc
Original Assignee
On Line Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from PCT/US1993/006515 external-priority patent/WO1994002832A1/en
Application filed by On Line Technologies Inc filed Critical On Line Technologies Inc
Publication of AU6549294A publication Critical patent/AU6549294A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/60—Radiation pyrometry, e.g. infrared or optical thermometry using determination of colour temperature
    • G01J5/601—Radiation pyrometry, e.g. infrared or optical thermometry using determination of colour temperature using spectral scanning
AU65492/94A 1993-07-12 1994-02-10 Method and apparatus for monitoring layer processing Abandoned AU6549294A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
WOUS9306515 1993-07-12
PCT/US1993/006515 WO1994002832A1 (en) 1992-07-15 1993-07-12 Method and apparatus for monitoring layer processing
US08/116,295 US5403433A (en) 1992-07-15 1993-09-03 Method and apparatus for monitoring layer processing
PCT/US1994/001532 WO1995002813A1 (en) 1993-07-12 1994-02-10 Method and apparatus for monitoring layer processing
US116295 1998-07-16

Publications (1)

Publication Number Publication Date
AU6549294A true AU6549294A (en) 1995-02-13

Family

ID=26786873

Family Applications (1)

Application Number Title Priority Date Filing Date
AU65492/94A Abandoned AU6549294A (en) 1993-07-12 1994-02-10 Method and apparatus for monitoring layer processing

Country Status (2)

Country Link
AU (1) AU6549294A (en)
WO (1) WO1995002813A1 (en)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4905170A (en) * 1987-11-12 1990-02-27 Forouhi Abdul R Method and apparatus of determining optical constants of amorphous semiconductors and dielectrics
US5229303A (en) * 1989-08-29 1993-07-20 At&T Bell Laboratories Device processing involving an optical interferometric thermometry using the change in refractive index to measure semiconductor wafer temperature
US5091320A (en) * 1990-06-15 1992-02-25 Bell Communications Research, Inc. Ellipsometric control of material growth
US5213985A (en) * 1991-05-22 1993-05-25 Bell Communications Research, Inc. Temperature measurement in a processing chamber using in-situ monitoring of photoluminescence
US5220405A (en) * 1991-12-20 1993-06-15 International Business Machines Corporation Interferometer for in situ measurement of thin film thickness changes
US5313044A (en) * 1992-04-28 1994-05-17 Duke University Method and apparatus for real-time wafer temperature and thin film growth measurement and control in a lamp-heated rapid thermal processor

Also Published As

Publication number Publication date
WO1995002813A1 (en) 1995-01-26

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