AU6066401A - Photosensitive resin composition and photosensitive material using the same - Google Patents

Photosensitive resin composition and photosensitive material using the same

Info

Publication number
AU6066401A
AU6066401A AU60664/01A AU6066401A AU6066401A AU 6066401 A AU6066401 A AU 6066401A AU 60664/01 A AU60664/01 A AU 60664/01A AU 6066401 A AU6066401 A AU 6066401A AU 6066401 A AU6066401 A AU 6066401A
Authority
AU
Australia
Prior art keywords
photosensitive
same
resin composition
photosensitive resin
photosensitive material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU60664/01A
Inventor
Katsumasa Kikkawa
Shihoko Komatsu
Tetsuzo Miki
Naohiro Tarumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hodogaya Chemical Co Ltd
Original Assignee
Hodogaya Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hodogaya Chemical Co Ltd filed Critical Hodogaya Chemical Co Ltd
Publication of AU6066401A publication Critical patent/AU6066401A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
AU60664/01A 2000-06-02 2001-05-30 Photosensitive resin composition and photosensitive material using the same Abandoned AU6066401A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000-166045 2000-06-02
JP2000166045A JP2006171015A (en) 2000-06-02 2000-06-02 Photosensitive resin composition and photosensitive material using same
PCT/JP2001/004570 WO2001095032A1 (en) 2000-06-02 2001-05-30 Photosensitive resin composition and photosensitive material using the same

Publications (1)

Publication Number Publication Date
AU6066401A true AU6066401A (en) 2001-12-17

Family

ID=18669423

Family Applications (1)

Application Number Title Priority Date Filing Date
AU60664/01A Abandoned AU6066401A (en) 2000-06-02 2001-05-30 Photosensitive resin composition and photosensitive material using the same

Country Status (3)

Country Link
JP (1) JP2006171015A (en)
AU (1) AU6066401A (en)
WO (1) WO2001095032A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4912934B2 (en) * 2007-03-28 2012-04-11 富士フイルム株式会社 Photosensitive composition, image recording material, and image recording method
EP3392709A1 (en) * 2017-04-21 2018-10-24 Agfa Nv A lithographic printing plate precursor

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3479185A (en) * 1965-06-03 1969-11-18 Du Pont Photopolymerizable compositions and layers containing 2,4,5-triphenylimidazoyl dimers
JPS6294842A (en) * 1985-10-21 1987-05-01 Hodogaya Chem Co Ltd Photosensitive composition
JP2571113B2 (en) * 1988-12-29 1997-01-16 富士写真フイルム株式会社 Photopolymerizable composition
JP2764769B2 (en) * 1991-06-24 1998-06-11 富士写真フイルム株式会社 Photopolymerizable composition
JP3480116B2 (en) * 1995-04-21 2003-12-15 日立化成工業株式会社 Manufacturing method of photosensitive material and relief pattern

Also Published As

Publication number Publication date
WO2001095032A1 (en) 2001-12-13
JP2006171015A (en) 2006-06-29

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase