AU5762100A - Alignment of low-energy electron beams using magnetic fields - Google Patents

Alignment of low-energy electron beams using magnetic fields

Info

Publication number
AU5762100A
AU5762100A AU57621/00A AU5762100A AU5762100A AU 5762100 A AU5762100 A AU 5762100A AU 57621/00 A AU57621/00 A AU 57621/00A AU 5762100 A AU5762100 A AU 5762100A AU 5762100 A AU5762100 A AU 5762100A
Authority
AU
Australia
Prior art keywords
alignment
low
magnetic fields
electron beams
energy electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU57621/00A
Inventor
Tai-Hon Philip Chang
Andres Fernandez
Lawrence P. Muray
James P. Spallas
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Etec Systems Inc
Original Assignee
Etec Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Etec Systems Inc filed Critical Etec Systems Inc
Publication of AU5762100A publication Critical patent/AU5762100A/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30433—System calibration
    • H01J2237/30438—Registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
AU57621/00A 1999-06-22 2000-06-22 Alignment of low-energy electron beams using magnetic fields Abandoned AU5762100A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US33845699A 1999-06-22 1999-06-22
US09338456 1999-06-22
PCT/US2000/017334 WO2000079566A1 (en) 1999-06-22 2000-06-22 Alignment of low-energy electron beams using magnetic fields

Publications (1)

Publication Number Publication Date
AU5762100A true AU5762100A (en) 2001-01-09

Family

ID=23324884

Family Applications (1)

Application Number Title Priority Date Filing Date
AU57621/00A Abandoned AU5762100A (en) 1999-06-22 2000-06-22 Alignment of low-energy electron beams using magnetic fields

Country Status (2)

Country Link
AU (1) AU5762100A (en)
WO (1) WO2000079566A1 (en)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3169068B2 (en) * 1997-12-04 2001-05-21 日本電気株式会社 Electron beam exposure method and semiconductor wafer
US6008060A (en) * 1998-04-14 1999-12-28 Etec Systems, Inc. Detecting registration marks with a low energy electron beam

Also Published As

Publication number Publication date
WO2000079566A1 (en) 2000-12-28

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase