AU5762100A - Alignment of low-energy electron beams using magnetic fields - Google Patents
Alignment of low-energy electron beams using magnetic fieldsInfo
- Publication number
- AU5762100A AU5762100A AU57621/00A AU5762100A AU5762100A AU 5762100 A AU5762100 A AU 5762100A AU 57621/00 A AU57621/00 A AU 57621/00A AU 5762100 A AU5762100 A AU 5762100A AU 5762100 A AU5762100 A AU 5762100A
- Authority
- AU
- Australia
- Prior art keywords
- alignment
- low
- magnetic fields
- electron beams
- energy electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/304—Controlling tubes
- H01J2237/30433—System calibration
- H01J2237/30438—Registration
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US33845699A | 1999-06-22 | 1999-06-22 | |
US09338456 | 1999-06-22 | ||
PCT/US2000/017334 WO2000079566A1 (en) | 1999-06-22 | 2000-06-22 | Alignment of low-energy electron beams using magnetic fields |
Publications (1)
Publication Number | Publication Date |
---|---|
AU5762100A true AU5762100A (en) | 2001-01-09 |
Family
ID=23324884
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU57621/00A Abandoned AU5762100A (en) | 1999-06-22 | 2000-06-22 | Alignment of low-energy electron beams using magnetic fields |
Country Status (2)
Country | Link |
---|---|
AU (1) | AU5762100A (en) |
WO (1) | WO2000079566A1 (en) |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3169068B2 (en) * | 1997-12-04 | 2001-05-21 | 日本電気株式会社 | Electron beam exposure method and semiconductor wafer |
US6008060A (en) * | 1998-04-14 | 1999-12-28 | Etec Systems, Inc. | Detecting registration marks with a low energy electron beam |
-
2000
- 2000-06-22 AU AU57621/00A patent/AU5762100A/en not_active Abandoned
- 2000-06-22 WO PCT/US2000/017334 patent/WO2000079566A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2000079566A1 (en) | 2000-12-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |