AU571190B2 - Light-sensitive composition and process for preparing a printing form - Google Patents

Light-sensitive composition and process for preparing a printing form

Info

Publication number
AU571190B2
AU571190B2 AU22169/83A AU2216983A AU571190B2 AU 571190 B2 AU571190 B2 AU 571190B2 AU 22169/83 A AU22169/83 A AU 22169/83A AU 2216983 A AU2216983 A AU 2216983A AU 571190 B2 AU571190 B2 AU 571190B2
Authority
AU
Australia
Prior art keywords
preparing
light
sensitive composition
printing form
printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
AU22169/83A
Other versions
AU2216983A (en
Inventor
Paul Stahlhofen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of AU2216983A publication Critical patent/AU2216983A/en
Application granted granted Critical
Publication of AU571190B2 publication Critical patent/AU571190B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
AU22169/83A 1982-12-13 1983-12-07 Light-sensitive composition and process for preparing a printing form Ceased AU571190B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3246106 1982-12-13
DE19823246106 DE3246106A1 (en) 1982-12-13 1982-12-13 LIGHT SENSITIVE MIXTURE, LIGHT SENSITIVE COPY MATERIAL MADE THEREOF, AND METHOD FOR PRODUCING A PRINT FORM FROM THE COPY MATERIAL

Publications (2)

Publication Number Publication Date
AU2216983A AU2216983A (en) 1984-06-21
AU571190B2 true AU571190B2 (en) 1988-04-14

Family

ID=6180546

Family Applications (1)

Application Number Title Priority Date Filing Date
AU22169/83A Ceased AU571190B2 (en) 1982-12-13 1983-12-07 Light-sensitive composition and process for preparing a printing form

Country Status (9)

Country Link
EP (1) EP0111274B1 (en)
JP (1) JPS59114535A (en)
AU (1) AU571190B2 (en)
BR (1) BR8306803A (en)
CA (1) CA1254787A (en)
DE (2) DE3246106A1 (en)
ES (1) ES8503863A1 (en)
FI (1) FI834528A (en)
ZA (1) ZA839215B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8500320A (en) * 1985-02-06 1986-09-01 Philips Nv METHOD FOR MANUFACTURING AN APPARATUS AND APPARATUS MADE WITH THE METHOD
DE3821585A1 (en) * 1987-09-13 1989-03-23 Hoechst Ag POSITIVELY WORKING RADIATION-SENSITIVE MIXTURE AND PRODUCTION OF RADIATION-SENSITIVE RECORDING MATERIAL FOR HIGH-ENERGY RADIATION
US4812522A (en) * 1987-12-04 1989-03-14 Shell Oil Company Molecularly miscible blends of polyketone with polyvinyl phenol
US5100768A (en) * 1989-05-09 1992-03-31 Kabushiki Kaisha Toshiba Photosensitive composition
DE4106356A1 (en) * 1991-02-28 1992-09-03 Hoechst Ag RADIATION-SENSITIVE POLYMERS WITH NAPHTHOQUINONE-2-DIAZIDE-4-SULFONYL GROUPS AND THEIR USE IN A POSITIVE WORKING RECORDING MATERIAL
US20020058199A1 (en) * 2000-09-08 2002-05-16 Shipley Company, L.L.C. Novel polymers and photoresist compositions comprising electronegative groups

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU8577282A (en) * 1981-07-14 1983-01-20 Hoechst A.G. Light-sensitive mixture and copying material prepared therefrom
AU2191483A (en) * 1982-12-09 1984-06-14 Hoechst A.G. Thermo-corsslinking light sensitive composition
AU546108B2 (en) * 1981-01-03 1985-08-15 Hoechst A.G. Naphthoquinonediazidesulfonic acid esters

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6053301B2 (en) * 1979-08-31 1985-11-25 冨士薬品工業株式会社 Positive photosensitive composition
JPS5730829A (en) * 1980-08-01 1982-02-19 Hitachi Ltd Micropattern formation method
DD206518A3 (en) * 1981-08-10 1984-01-25 Akad Wissenschaften Ddr METHOD FOR PRODUCING MICROSTRUCTURES

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU546108B2 (en) * 1981-01-03 1985-08-15 Hoechst A.G. Naphthoquinonediazidesulfonic acid esters
AU8577282A (en) * 1981-07-14 1983-01-20 Hoechst A.G. Light-sensitive mixture and copying material prepared therefrom
AU2191483A (en) * 1982-12-09 1984-06-14 Hoechst A.G. Thermo-corsslinking light sensitive composition

Also Published As

Publication number Publication date
DE3379079D1 (en) 1989-03-02
FI834528A0 (en) 1983-12-09
ZA839215B (en) 1984-08-29
AU2216983A (en) 1984-06-21
ES527970A0 (en) 1985-03-16
CA1254787A (en) 1989-05-30
EP0111274A3 (en) 1986-01-15
EP0111274A2 (en) 1984-06-20
BR8306803A (en) 1984-07-17
ES8503863A1 (en) 1985-03-16
FI834528A (en) 1984-06-14
EP0111274B1 (en) 1989-01-25
JPS59114535A (en) 1984-07-02
DE3246106A1 (en) 1984-06-14

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