AU5707198A - Sputter cathode for application of radioactive material - Google Patents

Sputter cathode for application of radioactive material

Info

Publication number
AU5707198A
AU5707198A AU57071/98A AU5707198A AU5707198A AU 5707198 A AU5707198 A AU 5707198A AU 57071/98 A AU57071/98 A AU 57071/98A AU 5707198 A AU5707198 A AU 5707198A AU 5707198 A AU5707198 A AU 5707198A
Authority
AU
Australia
Prior art keywords
application
radioactive material
sputter cathode
sputter
cathode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU57071/98A
Inventor
Anthony J. Armini
Stephen N. Bunker
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Implant Sciences Corp
Original Assignee
Implant Sciences Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/769,240 external-priority patent/US5894133A/en
Application filed by Implant Sciences Corp filed Critical Implant Sciences Corp
Publication of AU5707198A publication Critical patent/AU5707198A/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Radiation-Therapy Devices (AREA)
AU57071/98A 1996-12-18 1997-12-15 Sputter cathode for application of radioactive material Abandoned AU5707198A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US08769240 1996-12-18
US08/769,240 US5894133A (en) 1996-12-18 1996-12-18 Sputter cathode for application of radioactive material
US86788897A 1997-06-03 1997-06-03
US08867888 1997-06-03
PCT/US1997/023377 WO1998027246A1 (en) 1996-12-18 1997-12-15 Sputter cathode for application of radioactive material

Publications (1)

Publication Number Publication Date
AU5707198A true AU5707198A (en) 1998-07-15

Family

ID=27118140

Family Applications (1)

Application Number Title Priority Date Filing Date
AU57071/98A Abandoned AU5707198A (en) 1996-12-18 1997-12-15 Sputter cathode for application of radioactive material

Country Status (2)

Country Link
AU (1) AU5707198A (en)
WO (1) WO1998027246A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2409924A (en) * 2004-01-06 2005-07-13 Psimedica Ltd Method of making a silicon-phosphorus composite

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5342283A (en) * 1990-08-13 1994-08-30 Good Roger R Endocurietherapy
JPH04168722A (en) * 1990-10-31 1992-06-16 Mitsubishi Electric Corp Manufacture of semiconductor element

Also Published As

Publication number Publication date
WO1998027246A1 (en) 1998-06-25

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