AU5532194A - Doping of highly tetrahedral diamond-like amorphous carbon - Google Patents

Doping of highly tetrahedral diamond-like amorphous carbon

Info

Publication number
AU5532194A
AU5532194A AU55321/94A AU5532194A AU5532194A AU 5532194 A AU5532194 A AU 5532194A AU 55321/94 A AU55321/94 A AU 55321/94A AU 5532194 A AU5532194 A AU 5532194A AU 5532194 A AU5532194 A AU 5532194A
Authority
AU
Australia
Prior art keywords
doping
amorphous carbon
highly tetrahedral
tetrahedral diamond
diamond
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU55321/94A
Inventor
Gehan Anil Joseph Amaratunga
David Robert Mckenzie
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of AU5532194A publication Critical patent/AU5532194A/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/221—Ion beam deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48—Ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
AU55321/94A 1992-11-25 1993-11-25 Doping of highly tetrahedral diamond-like amorphous carbon Abandoned AU5532194A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB929224697A GB9224697D0 (en) 1992-11-25 1992-11-25 Doping of highly tetrahedral diamond-like amorphous carbon
GB9224697 1992-11-25
PCT/GB1993/002424 WO1994012680A1 (en) 1992-11-25 1993-11-25 Doping of highly tetrahedral diamond-like amorphous carbon

Publications (1)

Publication Number Publication Date
AU5532194A true AU5532194A (en) 1994-06-22

Family

ID=10725663

Family Applications (1)

Application Number Title Priority Date Filing Date
AU55321/94A Abandoned AU5532194A (en) 1992-11-25 1993-11-25 Doping of highly tetrahedral diamond-like amorphous carbon

Country Status (3)

Country Link
AU (1) AU5532194A (en)
GB (1) GB9224697D0 (en)
WO (1) WO1994012680A1 (en)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9226568D0 (en) * 1992-12-21 1993-02-17 Univ Hull Atomic beam coating of polymers
DE4434428A1 (en) * 1994-09-27 1996-03-28 Widia Gmbh Composite body, use of this composite body and method for its production
US6080470A (en) * 1996-06-17 2000-06-27 Dorfman; Benjamin F. Hard graphite-like material bonded by diamond-like framework
TW353758B (en) * 1996-09-30 1999-03-01 Motorola Inc Electron emissive film and method
RU2114210C1 (en) * 1997-05-30 1998-06-27 Валерий Павлович Гончаренко Process of formation of carbon diamond-like coat in vacuum
DE19922161A1 (en) 1998-05-18 1999-12-09 Fraunhofer Ges Forschung Anti-adhesion coating for e.g. soldering/welding tools and electric contacts
US6273488B1 (en) 1999-05-03 2001-08-14 Guardian Industries Corporation System and method for removing liquid from rear window of a vehicle
US6303225B1 (en) * 2000-05-24 2001-10-16 Guardian Industries Corporation Hydrophilic coating including DLC on substrate
US6447891B1 (en) * 1999-05-03 2002-09-10 Guardian Industries Corp. Low-E coating system including protective DLC
US6261693B1 (en) * 1999-05-03 2001-07-17 Guardian Industries Corporation Highly tetrahedral amorphous carbon coating on glass
US6461731B1 (en) * 1999-05-03 2002-10-08 Guardian Industries Corp. Solar management coating system including protective DLC
US6338901B1 (en) * 1999-05-03 2002-01-15 Guardian Industries Corporation Hydrophobic coating including DLC on substrate
EP1144987A1 (en) 1999-10-15 2001-10-17 Philips Electron Optics Method of determining the charge carrier concentration in materials, notably semiconductors
US6713179B2 (en) 2000-05-24 2004-03-30 Guardian Industries Corp. Hydrophilic DLC on substrate with UV exposure
GB2417490A (en) * 2004-08-27 2006-03-01 Nanofilm Technologies Int Tetrahedral amorphous carbon coating with pre-determined resistivity
JP4730159B2 (en) * 2006-03-20 2011-07-20 株式会社日立製作所 Sliding member and manufacturing method thereof
DE102009002320B4 (en) * 2009-04-09 2013-11-07 Hochschule für angewandte Wissenschaft und Kunst Fachhochschule Hildesheim/Holzminden/Göttingen Method for reducing the electrical contact resistance of a surface of a metallic body and apparatus for carrying out the method
US10370613B2 (en) 2014-10-24 2019-08-06 Parag Gupta Grey cast iron-doped diamond-like carbon coatings and methods for depositing same
CN114990476B (en) * 2022-05-17 2023-05-23 华南理工大学 Nitrogen-doped tetrahedral amorphous carbon film and preparation method and application thereof

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0760665B2 (en) * 1982-10-08 1995-06-28 株式会社日立製作所 Surface modification device
JPS5993869A (en) * 1982-11-19 1984-05-30 Sumitomo Electric Ind Ltd Structure coated with hard layer containing diamond
JPS60218464A (en) * 1984-04-13 1985-11-01 Nippon Telegr & Teleph Corp <Ntt> Manufacturing apparatus of thin film
JPH079059B2 (en) * 1986-01-31 1995-02-01 株式会社明電舍 Method for producing carbon thin film
JPS6353916A (en) * 1986-08-22 1988-03-08 Meidensha Electric Mfg Co Ltd Formation of semiconductor carbon thin film
JPS63186417A (en) * 1987-01-29 1988-08-02 Meidensha Electric Mfg Co Ltd Formation of semiconductor carbon thin film
JPS63203762A (en) * 1987-02-19 1988-08-23 Meidensha Electric Mfg Co Ltd Formation of thin semiconductor carbon film
US4822466A (en) * 1987-06-25 1989-04-18 University Of Houston - University Park Chemically bonded diamond films and method for producing same
US4987007A (en) * 1988-04-18 1991-01-22 Board Of Regents, The University Of Texas System Method and apparatus for producing a layer of material from a laser ion source
JPH03149186A (en) * 1989-11-04 1991-06-25 Toshiba Corp Metal bond tool

Also Published As

Publication number Publication date
WO1994012680A1 (en) 1994-06-09
GB9224697D0 (en) 1993-01-13

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