AU544060B2 - Accelerated diazo sensitised - Google Patents

Accelerated diazo sensitised

Info

Publication number
AU544060B2
AU544060B2 AU73121/81A AU7312181A AU544060B2 AU 544060 B2 AU544060 B2 AU 544060B2 AU 73121/81 A AU73121/81 A AU 73121/81A AU 7312181 A AU7312181 A AU 7312181A AU 544060 B2 AU544060 B2 AU 544060B2
Authority
AU
Australia
Prior art keywords
sensitised
diazo
accelerated
diazo sensitised
accelerated diazo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
AU73121/81A
Other languages
English (en)
Other versions
AU7312181A (en
Inventor
Eugene Golda
Alan Wilkes
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polychrome Corp
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polychrome Corp filed Critical Polychrome Corp
Publication of AU7312181A publication Critical patent/AU7312181A/en
Application granted granted Critical
Publication of AU544060B2 publication Critical patent/AU544060B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU73121/81A 1980-07-28 1981-07-20 Accelerated diazo sensitised Ceased AU544060B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US17322980A 1980-07-28 1980-07-28
US173229 1980-07-28

Publications (2)

Publication Number Publication Date
AU7312181A AU7312181A (en) 1982-02-04
AU544060B2 true AU544060B2 (en) 1985-05-16

Family

ID=22631087

Family Applications (1)

Application Number Title Priority Date Filing Date
AU73121/81A Ceased AU544060B2 (en) 1980-07-28 1981-07-20 Accelerated diazo sensitised

Country Status (9)

Country Link
JP (1) JPS57118239A (cs)
AU (1) AU544060B2 (cs)
DE (1) DE3129501A1 (cs)
DK (1) DK335681A (cs)
FR (1) FR2487534A1 (cs)
GB (1) GB2080964B (cs)
IT (1) IT1171405B (cs)
NL (1) NL8103455A (cs)
SE (1) SE8104565L (cs)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0172583A3 (en) * 1984-08-24 1987-11-04 Nec Corporation Method of x-ray lithography
CA1285418C (en) * 1985-07-18 1991-07-02 Robert A. Owens Pre-exposure method for increased sensitivity in high contrast resist development
JP2511658B2 (ja) * 1986-09-09 1996-07-03 コニカ株式会社 耐刷力および耐薬品性が優れた感光性印刷版の製造方法
FR2697646B1 (fr) * 1992-11-03 1995-01-13 Digipress Sa Procédé pour la préparation de compositions photosensibles à base de résines polymérisables et dispositif pour l'exécution de ce procédé.
IL106619A0 (en) * 1993-08-08 1993-12-08 Scitex Corp Ltd Apparatus and method for exposing a photosensitive substrate
DE69612867T3 (de) * 1995-11-24 2006-11-23 Kodak Polychrome Graphics Co. Ltd., Norwalk Hydrophilierter träger für flachdruckplatten und verfahren zu seiner herstellung
GB9624224D0 (en) 1996-11-21 1997-01-08 Horsell Graphic Ind Ltd Planographic printing
GB9702568D0 (en) * 1997-02-07 1997-03-26 Horsell Graphic Ind Ltd Planographic printing
US6357351B1 (en) 1997-05-23 2002-03-19 Kodak Polychrome Graphics Llc Substrate for planographic printing
GB9710552D0 (en) 1997-05-23 1997-07-16 Horsell Graphic Ind Ltd Planographic printing
US6293197B1 (en) 1999-08-17 2001-09-25 Kodak Polychrome Graphics Hydrophilized substrate for planographic printing

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1064100A (en) * 1964-03-04 1967-04-05 Warren S D Co Improved photolithographic coating containing a diazonium salt
DE1447955C3 (de) * 1965-01-02 1978-10-05 Hoechst Ag, 6000 Frankfurt Verfahren zur Herstellung einer vorsensibilisierten Druckplatte
GB1328782A (en) * 1967-11-15 1973-09-05 Howson Algraphy Ltd Printing plates
US3899332A (en) * 1972-09-11 1975-08-12 Lith Kem Corp Printing plate and method of making the same
ZA739244B (en) * 1973-04-19 1974-11-27 Grace W R & Co Preparation of printing of pattern plates
DE2534795C3 (de) * 1975-08-04 1978-05-24 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zur Herstellung von Strukturen aus Positiv-Fotolackschichten

Also Published As

Publication number Publication date
NL8103455A (nl) 1982-02-16
IT8148940A0 (it) 1981-07-21
GB2080964A (en) 1982-02-10
DK335681A (da) 1982-01-29
SE8104565L (sv) 1982-01-29
IT1171405B (it) 1987-06-10
DE3129501A1 (de) 1982-05-27
JPS6356531B2 (cs) 1988-11-08
GB2080964B (en) 1984-08-30
JPS57118239A (en) 1982-07-23
FR2487534A1 (fr) 1982-01-29
AU7312181A (en) 1982-02-04

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