AU5257696A - Gas-impermeable, chemically inert container structure for fo od and volatile substances and the method and apparatus prod ucing the same - Google Patents
Gas-impermeable, chemically inert container structure for fo od and volatile substances and the method and apparatus prod ucing the sameInfo
- Publication number
- AU5257696A AU5257696A AU52576/96A AU5257696A AU5257696A AU 5257696 A AU5257696 A AU 5257696A AU 52576/96 A AU52576/96 A AU 52576/96A AU 5257696 A AU5257696 A AU 5257696A AU 5257696 A AU5257696 A AU 5257696A
- Authority
- AU
- Australia
- Prior art keywords
- impermeable
- gas
- same
- chemically inert
- volatile substances
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D23/00—Details of bottles or jars not otherwise provided for
- B65D23/02—Linings or internal coatings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
- C08J7/123—Treatment by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
- C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/206—Filters comprising particles embedded in a solid matrix
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Plasma & Fusion (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Laminated Bodies (AREA)
- Chemical Vapour Deposition (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US42153695A | 1995-04-13 | 1995-04-13 | |
PCT/US1996/003815 WO1996033098A2 (en) | 1995-04-13 | 1996-03-21 | Gas-impermeable, chemically inert container structure and method of producingthe same |
US421536 | 1999-10-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
AU5257696A true AU5257696A (en) | 1996-11-07 |
Family
ID=23670949
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU52576/96A Abandoned AU5257696A (en) | 1995-04-13 | 1996-03-21 | Gas-impermeable, chemically inert container structure for fo od and volatile substances and the method and apparatus prod ucing the same |
Country Status (3)
Country | Link |
---|---|
AU (1) | AU5257696A (en) |
IL (1) | IL117653A0 (en) |
WO (1) | WO1996033098A2 (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5384924A (en) * | 1992-08-03 | 1995-01-31 | Mallinckrodt Medical, Inc. | Warming blanket having multiple inlets |
FR2814382B1 (en) * | 2000-09-28 | 2003-05-09 | Cebal | METHOD FOR DEPOSITING AN INTERNAL COATING IN A PLASTIC CONTAINER |
US6514870B2 (en) * | 2001-01-26 | 2003-02-04 | Applied Materials, Inc. | In situ wafer heat for reduced backside contamination |
DE10139305A1 (en) * | 2001-08-07 | 2003-03-06 | Schott Glas | Composite material made of a substrate material and a barrier layer material |
DE10258680B4 (en) * | 2002-08-07 | 2008-09-11 | Schott Ag | Producing a composite material with a biodegradable plastic substrate and at least one coating |
DE10258678B4 (en) * | 2002-12-13 | 2004-12-30 | Schott Ag | Fast process for the production of multilayer barrier layers |
DE10242086A1 (en) * | 2002-09-11 | 2004-04-15 | Sig Technology Ltd. | Containers for packaging products, device for processing plastic and methods for producing containers |
JP2005280718A (en) * | 2004-03-26 | 2005-10-13 | Yoshino Kogyosho Co Ltd | Synthetic resin container having high gas barrier property |
DE102006048658B4 (en) | 2006-10-14 | 2014-03-27 | Khs Corpoplast Gmbh | PICVD coating for plastic containers and process for their manufacture |
DE102019107660A1 (en) * | 2019-03-26 | 2020-10-01 | Krones Ag | Method and device for coating containers |
CN112030134A (en) * | 2020-07-22 | 2020-12-04 | 深圳市八六三新材料技术有限责任公司 | Barrier container based on microwave plasma chemical vapor deposition |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4292342A (en) * | 1980-05-09 | 1981-09-29 | Motorola, Inc. | High pressure plasma deposition of silicon |
FR2614317B1 (en) * | 1987-04-22 | 1989-07-13 | Air Liquide | PROCESS FOR PROTECTING POLYMERIC SUBSTRATE BY PLASMA DEPOSITION OF COMPOUNDS OF THE SILICON OXYNITRIDE TYPE AND DEVICE FOR IMPLEMENTING SAME. |
US5041303A (en) * | 1988-03-07 | 1991-08-20 | Polyplasma Incorporated | Process for modifying large polymeric surfaces |
JPH03236474A (en) * | 1989-11-02 | 1991-10-22 | Mitsubishi Heavy Ind Ltd | Method and device for forming hardened protective film on plastic surface |
DE4113221A1 (en) * | 1991-04-23 | 1992-10-29 | Leybold Ag | Flexible transparent polymer film for e.g. packaging - has barrier layer on one side, produced by deposition of layer of silicon oxide under reactive atmos., pref. hydrogen@ |
MX9303141A (en) * | 1992-05-28 | 1994-04-29 | Polar Materials Inc | METHODS AND DEVICES FOR DEPOSITING BARRIER COATINGS. |
-
1996
- 1996-03-21 WO PCT/US1996/003815 patent/WO1996033098A2/en active Application Filing
- 1996-03-21 AU AU52576/96A patent/AU5257696A/en not_active Abandoned
- 1996-03-26 IL IL11765396A patent/IL117653A0/en unknown
Also Published As
Publication number | Publication date |
---|---|
WO1996033098A3 (en) | 1996-12-12 |
WO1996033098A2 (en) | 1996-10-24 |
IL117653A0 (en) | 1996-07-23 |
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AU5257696A (en) | Gas-impermeable, chemically inert container structure for fo od and volatile substances and the method and apparatus prod ucing the same |