AU4995297A - Sub-micron patterning using optical lithography - Google Patents

Sub-micron patterning using optical lithography

Info

Publication number
AU4995297A
AU4995297A AU49952/97A AU4995297A AU4995297A AU 4995297 A AU4995297 A AU 4995297A AU 49952/97 A AU49952/97 A AU 49952/97A AU 4995297 A AU4995297 A AU 4995297A AU 4995297 A AU4995297 A AU 4995297A
Authority
AU
Australia
Prior art keywords
sub
optical lithography
micron patterning
patterning
micron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU49952/97A
Inventor
Natale M. Ceglio
Andrew M. Hawryluk
Daniel G. Stearns
Stephen P. Vernon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of California
Original Assignee
University of California
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of California filed Critical University of California
Publication of AU4995297A publication Critical patent/AU4995297A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AU49952/97A 1996-10-22 1997-10-21 Sub-micron patterning using optical lithography Abandoned AU4995297A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US73482696A 1996-10-22 1996-10-22
US08734826 1996-10-22
PCT/US1997/019157 WO1998018049A1 (en) 1996-10-22 1997-10-21 Sub-micron patterning using optical lithography

Publications (1)

Publication Number Publication Date
AU4995297A true AU4995297A (en) 1998-05-15

Family

ID=24953225

Family Applications (1)

Application Number Title Priority Date Filing Date
AU49952/97A Abandoned AU4995297A (en) 1996-10-22 1997-10-21 Sub-micron patterning using optical lithography

Country Status (2)

Country Link
AU (1) AU4995297A (en)
WO (1) WO1998018049A1 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7242464B2 (en) 1999-06-24 2007-07-10 Asml Holdings N.V. Method for characterizing optical systems using holographic reticles
US6934038B2 (en) 2000-02-15 2005-08-23 Asml Holding N.V. Method for optical system coherence testing
US7751030B2 (en) 2005-02-01 2010-07-06 Asml Holding N.V. Interferometric lithographic projection apparatus
US7440078B2 (en) 2005-12-20 2008-10-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method using interferometric and maskless exposure units
US7561252B2 (en) 2005-12-29 2009-07-14 Asml Holding N.V. Interferometric lithography system and method used to generate equal path lengths of interfering beams
US8264667B2 (en) 2006-05-04 2012-09-11 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method using interferometric and other exposure
US7952803B2 (en) 2006-05-15 2011-05-31 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8934084B2 (en) 2006-05-31 2015-01-13 Asml Holding N.V. System and method for printing interference patterns having a pitch in a lithography system
US7443514B2 (en) 2006-10-02 2008-10-28 Asml Holding N.V. Diffractive null corrector employing a spatial light modulator

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4947413A (en) * 1988-07-26 1990-08-07 At&T Bell Laboratories Resolution doubling lithography technique
US5343292A (en) * 1990-10-19 1994-08-30 University Of New Mexico Method and apparatus for alignment of submicron lithographic features
US5717218A (en) * 1994-12-28 1998-02-10 International Business Machines Corporation Focal plane phase-shifting lithography

Also Published As

Publication number Publication date
WO1998018049A1 (en) 1998-04-30

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