AU4298100A - Liquid supply unit and purging method in the liquid supply unit - Google Patents
Liquid supply unit and purging method in the liquid supply unitInfo
- Publication number
- AU4298100A AU4298100A AU42981/00A AU4298100A AU4298100A AU 4298100 A AU4298100 A AU 4298100A AU 42981/00 A AU42981/00 A AU 42981/00A AU 4298100 A AU4298100 A AU 4298100A AU 4298100 A AU4298100 A AU 4298100A
- Authority
- AU
- Australia
- Prior art keywords
- supply unit
- liquid supply
- purging method
- purging
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/02—Cleaning pipes or tubes or systems of pipes or tubes
- B08B9/027—Cleaning the internal surfaces; Removal of blockages
- B08B9/032—Cleaning the internal surfaces; Removal of blockages by the mechanical action of a moving fluid, e.g. by flushing
- B08B9/0321—Cleaning the internal surfaces; Removal of blockages by the mechanical action of a moving fluid, e.g. by flushing using pressurised, pulsating or purging fluid
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4402—Reduction of impurities in the source gas
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Filling Or Discharging Of Gas Storage Vessels (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/EP2000/003750 WO2001076779A1 (en) | 2000-04-07 | 2000-04-07 | Liquid supply unit and purging method in the liquid supply unit |
Publications (1)
Publication Number | Publication Date |
---|---|
AU4298100A true AU4298100A (en) | 2001-10-23 |
Family
ID=8163924
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU42981/00A Abandoned AU4298100A (en) | 2000-04-07 | 2000-04-07 | Liquid supply unit and purging method in the liquid supply unit |
Country Status (2)
Country | Link |
---|---|
AU (1) | AU4298100A (en) |
WO (1) | WO2001076779A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2857283B1 (en) * | 2003-07-09 | 2005-09-02 | Soitec Silicon On Insulator | PLATELET CLEANING DEVICE HAVING AN ISOLATION CIRCUIT FOR THE CONCENTRATION MONITOR. |
JP2022118634A (en) * | 2021-02-02 | 2022-08-15 | 東京エレクトロン株式会社 | Powder conveying device, gas supply device and method for removing powder |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03193880A (en) * | 1989-08-03 | 1991-08-23 | Mikakutou Seimitsu Kogaku Kenkyusho:Kk | Method and device for forming film at high rate by microwave plasma cvd under high pressure |
JP3122311B2 (en) * | 1994-06-29 | 2001-01-09 | 東京エレクトロン株式会社 | Apparatus for supplying liquid material to film forming chamber and method of using the same |
-
2000
- 2000-04-07 AU AU42981/00A patent/AU4298100A/en not_active Abandoned
- 2000-04-07 WO PCT/EP2000/003750 patent/WO2001076779A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2001076779A1 (en) | 2001-10-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |