AU4180399A - Reflective optical imaging systems with balanced distortion - Google Patents

Reflective optical imaging systems with balanced distortion

Info

Publication number
AU4180399A
AU4180399A AU41803/99A AU4180399A AU4180399A AU 4180399 A AU4180399 A AU 4180399A AU 41803/99 A AU41803/99 A AU 41803/99A AU 4180399 A AU4180399 A AU 4180399A AU 4180399 A AU4180399 A AU 4180399A
Authority
AU
Australia
Prior art keywords
optical imaging
imaging systems
reflective optical
balanced distortion
balanced
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU41803/99A
Inventor
Henry N. Chapman
Russell M. Hudyma
David R. Shafer
Donald W. Sweeney
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of California
Original Assignee
University of California
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/027,281 external-priority patent/US5973826A/en
Priority claimed from US09/094,420 external-priority patent/US6226346B1/en
Application filed by University of California filed Critical University of California
Publication of AU4180399A publication Critical patent/AU4180399A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
AU41803/99A 1998-02-20 1999-02-19 Reflective optical imaging systems with balanced distortion Abandoned AU4180399A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US09027281 1998-02-20
US09/027,281 US5973826A (en) 1998-02-20 1998-02-20 Reflective optical imaging system with balanced distortion
US09094420 1998-06-09
US09/094,420 US6226346B1 (en) 1998-06-09 1998-06-09 Reflective optical imaging systems with balanced distortion
PCT/US1999/003767 WO1999042902A2 (en) 1998-02-20 1999-02-19 Reflective optical imaging systems with balanced distortion

Publications (1)

Publication Number Publication Date
AU4180399A true AU4180399A (en) 1999-09-06

Family

ID=26702270

Family Applications (1)

Application Number Title Priority Date Filing Date
AU41803/99A Abandoned AU4180399A (en) 1998-02-20 1999-02-19 Reflective optical imaging systems with balanced distortion

Country Status (2)

Country Link
AU (1) AU4180399A (en)
WO (1) WO1999042902A2 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1930771A1 (en) 2006-12-04 2008-06-11 Carl Zeiss SMT AG Projection objectives having mirror elements with reflective coatings
DE102009047179B8 (en) 2009-11-26 2016-08-18 Carl Zeiss Smt Gmbh projection lens
US9726859B1 (en) 2014-03-16 2017-08-08 Navitar Industries, Llc Optical assembly for a wide field of view camera with low TV distortion
US10545314B1 (en) 2014-03-16 2020-01-28 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with low lateral chromatic aberration
US9995910B1 (en) 2014-03-16 2018-06-12 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with high MTF
US9494772B1 (en) 2014-03-16 2016-11-15 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low field curvature
US9091843B1 (en) 2014-03-16 2015-07-28 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low track length to focal length ratio
US10386604B1 (en) 2014-03-16 2019-08-20 Navitar Industries, Llc Compact wide field of view digital camera with stray light impact suppression
US9316820B1 (en) 2014-03-16 2016-04-19 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low astigmatism
US9316808B1 (en) 2014-03-16 2016-04-19 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with a low sag aspheric lens element
US10139595B1 (en) 2014-03-16 2018-11-27 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with low first lens diameter to image diagonal ratio
CN113050362B (en) * 2019-12-27 2024-04-26 中芯国际集成电路制造(上海)有限公司 Optical proximity correction method and mask

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5063586A (en) * 1989-10-13 1991-11-05 At&T Bell Laboratories Apparatus for semiconductor lithography
US5315629A (en) * 1990-10-10 1994-05-24 At&T Bell Laboratories Ringfield lithography
JPH04333011A (en) * 1991-05-09 1992-11-20 Nikon Corp Reflective reduction projection optical device
US5353322A (en) * 1992-05-05 1994-10-04 Tropel Corporation Lens system for X-ray projection lithography camera
US5805365A (en) * 1995-10-12 1998-09-08 Sandia Corporation Ringfield lithographic camera

Also Published As

Publication number Publication date
WO1999042902A2 (en) 1999-08-26
WO1999042902A3 (en) 1999-10-14

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase