AU404154B2 - Improved method of epitaxially vapour depositing semiconductor material - Google Patents

Improved method of epitaxially vapour depositing semiconductor material

Info

Publication number
AU404154B2
AU404154B2 AU63323/65A AU6332365A AU404154B2 AU 404154 B2 AU404154 B2 AU 404154B2 AU 63323/65 A AU63323/65 A AU 63323/65A AU 6332365 A AU6332365 A AU 6332365A AU 404154 B2 AU404154 B2 AU 404154B2
Authority
AU
Australia
Prior art keywords
epitaxially
semiconductor material
improved method
depositing semiconductor
vapour depositing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
AU63323/65A
Other versions
AU6332365A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Application granted granted Critical
Publication of AU6332365A publication Critical patent/AU6332365A/en
Publication of AU404154B2 publication Critical patent/AU404154B2/en
Expired legal-status Critical Current

Links

AU63323/65A 1964-09-14 1965-08-26 Improved method of epitaxially vapour depositing semiconductor material Expired AU404154B2 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
USUS396,267 1964-09-14

Publications (2)

Publication Number Publication Date
AU6332365A AU6332365A (en) 1967-03-02
AU404154B2 true AU404154B2 (en) 1967-03-02

Family

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