AU3983989A - Stripping composition using n-cyclohexyl-2-pyrrolidone - Google Patents
Stripping composition using n-cyclohexyl-2-pyrrolidoneInfo
- Publication number
- AU3983989A AU3983989A AU39839/89A AU3983989A AU3983989A AU 3983989 A AU3983989 A AU 3983989A AU 39839/89 A AU39839/89 A AU 39839/89A AU 3983989 A AU3983989 A AU 3983989A AU 3983989 A AU3983989 A AU 3983989A
- Authority
- AU
- Australia
- Prior art keywords
- pyrrolidone
- cyclohexyl
- stripping composition
- stripping
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D9/00—Chemical paint or ink removers
- C09D9/005—Chemical paint or ink removers containing organic solvents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US21993788A | 1988-07-15 | 1988-07-15 | |
US219937 | 1988-07-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
AU3983989A true AU3983989A (en) | 1990-02-05 |
Family
ID=22821339
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU39839/89A Abandoned AU3983989A (en) | 1988-07-15 | 1989-07-12 | Stripping composition using n-cyclohexyl-2-pyrrolidone |
Country Status (2)
Country | Link |
---|---|
AU (1) | AU3983989A (en) |
WO (1) | WO1990000579A1 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4227742A1 (en) * | 1992-08-21 | 1994-02-24 | Basf Ag | Thermoplastic bonding agent mixture |
JP4314320B2 (en) * | 2002-04-10 | 2009-08-12 | 三菱電機株式会社 | Method for manufacturing compound semiconductor device |
US8309502B2 (en) | 2009-03-27 | 2012-11-13 | Eastman Chemical Company | Compositions and methods for removing organic substances |
US8444768B2 (en) | 2009-03-27 | 2013-05-21 | Eastman Chemical Company | Compositions and methods for removing organic substances |
US8614053B2 (en) | 2009-03-27 | 2013-12-24 | Eastman Chemical Company | Processess and compositions for removing substances from substrates |
US20120073607A1 (en) * | 2010-09-27 | 2012-03-29 | Eastman Chemical Company | Polymeric or monomeric compositions comprising at least one mono-amide and/or at least one diamide for removing substances from substrates and methods for using the same |
US9029268B2 (en) | 2012-11-21 | 2015-05-12 | Dynaloy, Llc | Process for etching metals |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3796602A (en) * | 1972-02-07 | 1974-03-12 | Du Pont | Process for stripping polymer masks from circuit boards |
US4276186A (en) * | 1979-06-26 | 1981-06-30 | International Business Machines Corporation | Cleaning composition and use thereof |
US4453984A (en) * | 1982-06-30 | 1984-06-12 | International Business Machines Corporation | Method for removing electrically conductive paste from a screening mask |
US4791043A (en) * | 1983-12-20 | 1988-12-13 | Hmc Patents Holding Co., Inc. | Positive photoresist stripping composition |
US4617251A (en) * | 1985-04-11 | 1986-10-14 | Olin Hunt Specialty Products, Inc. | Stripping composition and method of using the same |
-
1989
- 1989-07-12 WO PCT/US1989/003037 patent/WO1990000579A1/en unknown
- 1989-07-12 AU AU39839/89A patent/AU3983989A/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
WO1990000579A1 (en) | 1990-01-25 |
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