AU3360997A - Radiation curable resin composition for molding by polymerization in dies - Google Patents

Radiation curable resin composition for molding by polymerization in dies

Info

Publication number
AU3360997A
AU3360997A AU33609/97A AU3360997A AU3360997A AU 3360997 A AU3360997 A AU 3360997A AU 33609/97 A AU33609/97 A AU 33609/97A AU 3360997 A AU3360997 A AU 3360997A AU 3360997 A AU3360997 A AU 3360997A
Authority
AU
Australia
Prior art keywords
dies
polymerization
molding
resin composition
curable resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU33609/97A
Inventor
Keiko Kato
Toshihiko Takahashi
Masakatsu Ukon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Japan Fine Coatings Co Ltd
Koninklijke DSM NV
Original Assignee
Japan Fine Coatings Co Ltd
Japan Synthetic Rubber Co Ltd
DSM NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Fine Coatings Co Ltd, Japan Synthetic Rubber Co Ltd, DSM NV filed Critical Japan Fine Coatings Co Ltd
Publication of AU3360997A publication Critical patent/AU3360997A/en
Abandoned legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F10/00Homopolymers and copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond
    • C08F10/02Ethene
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F210/00Copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond
    • C08F210/16Copolymers of ethene with alpha-alkenes, e.g. EP rubbers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymerization Catalysts (AREA)
AU33609/97A 1996-07-08 1997-07-07 Radiation curable resin composition for molding by polymerization in dies Abandoned AU3360997A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP17780096A JPH1017635A (en) 1996-07-08 1996-07-08 Radiation-curable resin composition for cast polymerization
JP8-177800 1996-07-08
PCT/NL1997/000387 WO1998001479A1 (en) 1996-07-08 1997-07-07 Radiation curable resin composition for molding by polymerization in dies

Publications (1)

Publication Number Publication Date
AU3360997A true AU3360997A (en) 1998-02-02

Family

ID=16037316

Family Applications (1)

Application Number Title Priority Date Filing Date
AU33609/97A Abandoned AU3360997A (en) 1996-07-08 1997-07-07 Radiation curable resin composition for molding by polymerization in dies

Country Status (3)

Country Link
JP (1) JPH1017635A (en)
AU (1) AU3360997A (en)
WO (1) WO1998001479A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020099110A1 (en) * 1999-12-30 2002-07-25 Tyson Norlin Radiation-curable coating composition
DE10049669A1 (en) 2000-10-06 2002-04-11 Tesa Ag Process for the production of crosslinked acrylic hotmelt PSAs
JP4899572B2 (en) * 2006-03-27 2012-03-21 Jsr株式会社 Curable resin composition and antireflection film
US8632952B2 (en) 2007-11-20 2014-01-21 Hitachi Chemical Company, Ltd. Photosensitive resin composition, photosensitive resin cured matter, photosensitive resin film, photosensitive resin film cured matter and optical waveguide obtained by using the same
EP3056194B1 (en) 2013-10-09 2020-08-19 Shiseido Company, Ltd. Low-stringiness thickener and cosmetic material admixed with said thickener
CN112203636A (en) 2018-05-29 2021-01-08 株式会社资生堂 Hair cosmetic comprising block copolymer
US20210236411A1 (en) 2018-05-29 2021-08-05 Shiseido Company, Ltd. Block copolymer-containing inorganic particle dispersion for cosmetics

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1176018B (en) * 1984-04-12 1987-08-12 Lamberti Flli Spa ALIPHATIC POLYMERIC OR POLYMERIZABLE AROMATIC KETONES SUITABLE FOR USE AS A POLYMERIZATION PHOTO INITIATOR
DE3816304A1 (en) * 1988-05-13 1989-11-23 Merck Patent Gmbh PHOTOINITIATOR COPOLYMERS

Also Published As

Publication number Publication date
WO1998001479A1 (en) 1998-01-15
JPH1017635A (en) 1998-01-20

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